WO1996035827A1 - Procede permettant de recycler une solution de decapage usee - Google Patents
Procede permettant de recycler une solution de decapage usee Download PDFInfo
- Publication number
- WO1996035827A1 WO1996035827A1 PCT/JP1995/001673 JP9501673W WO9635827A1 WO 1996035827 A1 WO1996035827 A1 WO 1996035827A1 JP 9501673 W JP9501673 W JP 9501673W WO 9635827 A1 WO9635827 A1 WO 9635827A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- copper
- etching
- extraction
- solution
- extraction solvent
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/46—Regeneration of etching compositions
Definitions
- a copper object is etched using an ammoniacal cupric chloride etchant, and a waste liquid generated at that time is continuously extracted using an extraction solvent for selectively extracting copper. Accordingly, the present invention relates to a method for reusing an etching solution.
- an alkaline type and an acidic type are selectively used depending on the type of a resist used.
- the ratio of the etching solution of the cheap acid tie of running cost is increasing at present.
- the present invention allows an alkaline etching solution to be extracted and regenerated with an extraction solvent, thereby enabling operation to be performed at a lower running cost than an acidic type etching solution.
- a metal having a corrosion resistance to ammonia alkali is mainly used on a necessary circuit (copper pattern) in a manufacturing process of a printed wiring board, for example, a solder plating film or a solder plating film. It is used as an anticorrosion film (etching resist) with a nickel plating film etc. to corrode and remove unnecessary copper.
- the etching solution consists of cupric chloride (copper ammonium chloride) with ammonia complex formed, ammonia water and a building bath solution mainly composed of ammonium chloride, and a replenisher mainly composed of ammonium chloride and ammonia water.
- cupric chloride copper ammonium chloride
- a replenisher mainly composed of ammonium chloride and ammonia water.
- various additives are added to prevent hang corrosion, enhance complexing power, improve etching accuracy, promote etching speed, and stabilize.
- Etching is performed using the oxidizing power of divalent copper as shown in equation (1).
- cuprous copper is etched by etching as shown in equation (1).
- the reduced copper is returned to cupric copper as shown in equation (2), and at the same time the copper concentration is reduced by dilution.
- the specific operation is achieved by mixing the etching waste liquid and the extraction solvent well.
- the former is characterized by adding this washing and removing step to remove chloride ions in view of the fact that chloride ions are extracted at the same time as the extraction of copper ions.
- the latter is contained in the washing water after etching.
- the purpose of this project is to add an extraction step for the purpose of recovering copper.
- the amount of chloride ion taken up can be reduced by selecting the extraction solvent, and the effect on the recovery by electrolysis after the back extraction is negligible. It is not considered necessary.
- the latter is advantageous for recovering copper in washing water, but passing it through the same cycle generates a large amount of copper hydroxide, which can cause a significant loss of overall balance.
- Specific problems include clogging of the piping route including the washing water extraction device and breakage of the etching solution washing pump.
- the present invention solves the above-mentioned problems, and provides a safer and more stable solvent extraction cycle so that a smooth etching operation can be performed. It is an object of the present invention to provide a method for reusing a waste solution of a tinting.
- the extraction solvent after back-extraction contains a small amount of sulfate through the genated layer, etc., generated by repeated contact of the extraction solvent with the etching solution for a long time, although it is trace. If this extraction solvent is reused as it is, this sulfate group easily moves into the Alri Retting solution. The problem is that if this sulfate is introduced into the etching solution, the etching rate may become unstable directly, or crystals may precipitate in the etching solution in the long term when the temperature drops. is there.
- this sulfate group contaminated during the back extraction is used for washing the extraction solvent after the back extraction to remove the sulfate group and then used again for extraction of the liquoring solution, which is stable for a long time.
- an alkaline etching solution can be used.
- a copper object is etched by using an ammoniacal cupric chloride etchant, and a waste liquid generated at that time is extracted by using an extraction solvent for selectively extracting copper.
- an extraction solvent for selectively extracting copper.
- the etching solution regenerated by the extraction solvent is passed through an oil adsorbent or an oil-water separation membrane to remove the carry-out of the extraction solvent to the regenerated solution. I do.
- the etching liquid regenerated by the extraction solvent passes through the oil adsorbent or the oil-water separation membrane, the extracted extraction solvent is removed, so that the regenerated etching liquid can be accurately reused.
- the back-extracted aqueous solution of copper monosulfate is used in an electrolytic cell after passing through an oil adsorbent or an oil-water separation membrane in order to remove the carry-out of the extraction solvent to the regenerating solution. And is recovered as metallic copper.
- the back-extracted aqueous solution of copper monosulfate is circulated to the electrolytic cell via an intermediate tank provided with an oil absorbent in order to remove the carry-out of the extraction solvent to the regenerating solution.
- the back-extracted aqueous copper monosulfate solution removes the carry-in extraction solvent when passing through the oil adsorbent or the oil-water separation membrane, thus facilitating the recovery of metallic copper by electrolysis. I can do it.
- the mixed liquid in the step of continuously stirring and mixing the etching waste liquid and the extraction medium and then separating, in order to complete the separation in a short time, is brought close to the outlet of the separation tank. It is characterized in that it passes through a plurality of partition walls with holes having smaller diameters. By passing the mixed solution through a plurality of perforated partitions, the diameter of which decreases as it approaches the outlet of the separation tank, the particles of the extraction solvent collide with each other and the separation action is performed in a short time. I can do it.
- FIG. 1 shows the configuration of the entire system of the present invention based on the liquid circulation path.
- FIG 2 shows the mixer settler (MS-1) used in the extraction process.
- FIG. 3 shows the mixer settler (MS-2, MS-3) used in the back extraction and washing steps.
- FIG. 6 shows the liquid circulation path of the comparative example.
- Figure 7 shows the change in the sulfuric acid concentration of the etching solution with the number of operating months.
- Figure 8 shows the change in the etching speed (etch rate) with the number of operating months.
- FIG. 1 shows the configuration of the entire system of the present invention based on the liquid circulation path. The flow of each substance is performed continuously in a controlled manner.
- a waste liquid from the etching process and an extraction solvent that can selectively and efficiently extract copper are added to a mixer 'Settler (MS-1) while maintaining a constant flow rate ratio, and after stirring and mixing in the mixer section, In the settler section, the mixed solution is separated at low speed into a regenerated etching solution with reduced copper concentration and an extraction solution containing copper.
- an extraction solvent that can selectively extract copper use a diketone-based or oxime-based solvent reagent that contains, for example, a dilute solution of kerosene with a boiling point of about 200 ° C. It is preferred to do so.
- FIG 2 shows the mixer settler (MS-1) used here.
- the mixer “M” the mixed liquid that has been agitated and mixed passes through the filter 31 and flows into the settler portion S, which is a separation tank.
- the diameter of the settler portion S decreases as it approaches the outlet.
- a plurality of partitions 32 having a large number of holes are arranged at predetermined intervals.As a result of the confirmation test, fine particles of the separated extraction solvent are separated by passing through such partitions 32.
- a layer of the etching regenerating solution with a reduced copper concentration due to the separation and a layer of the extraction solvent containing copper on the upper side were confirmed. Are collected at the exit side.
- the regenerated etching solution is passed through an oil adsorbent to recover and remove a trace amount of the extraction solution, and then returned to the etching process and used for etching.
- the extracted solvent containing copper is transferred to MS-2.
- a certain ratio of the amount of the extraction solvent containing copper to the MS-2 after extraction Sulfuric acid aqueous solution (sulfuric acid / copper sulfate aqueous solution) is supplied to MS-2, and both are mixed in the mixer part, and then separated at low speed in the settler part connected to the mixer.
- Copper dissolved in sulfuric acid in the form of copper sulfate is passed through an oil adsorbent in the form of an aqueous solution of copper sulfate monosulfate to remove the extraction solvent, and then transferred to an electrolytic cell where it is electrolyzed into metallic copper. And collected in valuable form.
- the recovered dilute sulfuric acid of metal copper (copper remaining as copper sulfate with a concentration of 10 to 15%) is used again in MS-2.
- Both the regenerated etchant and the sulfuric acid / copper sulfate aqueous solution used for the back extraction have passed through the oil adsorbent before going to the etching and electrolysis processes. If the etching speed is reduced and the extraction solvent is mixed into the electrodeposition tank for electrolysis, the electrodes become non-conductive and the electrolysis will not proceed.
- activated carbon can be used to prevent the extraction solvent from being mixed.However, activated carbon is very expensive, has a low adsorption amount for this purpose, and has a low adsorption rate, so oil adsorption or c towards the agent is superior, it may be passed through the oil-water separation membrane. As a matter of course, it is also possible to remove the extraction solvent mixed with the oil adsorbent in advance and then perform activated carbon filtration to operate more reliably while reducing the load of activated carbon.
- This washing process of the extraction solvent with MS-3 is a very important step in keeping the system operating stably for a long period of time.
- Water, hot water or dilute hydrochloric acid and, if necessary, an etchant composition are required. It is washed with a fixed amount of aqueous solution. In this process, The sulfates can be thoroughly washed and completely restored to the original extraction solvent.
- this washing step may be performed by spraying water onto the place where the extraction solvent is flowing on the surface of the flat or three-dimensional structure, which is advantageous because the installation area can be reduced.
- FIG 3 shows a mixer settler (MS-2) that performs back extraction and a water-jet type washing device (MS-3).
- MS-2 the extraction solvent and dilute sulfuric acid (copper sulfate sulfate aqueous solution) are stirred and mixed in the mixer section M as described above.
- MS-1 the mixture passes through the filter 41 and the separation tank. Flows into the settler part S.
- a plurality of partition walls 42 each having a large number of holes having a smaller diameter as approaching the outlet are arranged at predetermined intervals, as in the case of MS-1, so that separation is promoted.
- a layer of aqueous solution of copper sulfate monosulfate is formed on the lower side due to the separation, and a layer of the extraction solvent is formed on the upper side. While passing through 4, washing water is sprayed from above and mixed with the extraction solvent.
- the settler portion which is the separation tank of MS-3
- a plurality of partition walls 46 having holes whose diameters become smaller as they are closer to the outlet side as described above are also arranged.
- the lower washing water is pumped up by the pump 47 and used again as washing water.
- the upper extraction solvent which has been restored to its original state, is recovered and used again for the extraction of copper with MS-1.
- FIGS. 4 and 5 show an embodiment of an apparatus using the method for recycling an etching waste liquid according to the present invention.
- Reference numeral 1 denotes a regenerating etching solution storage tank.
- the regenerating etching solution is stored in a regenerating solution intermediate tank 14 and applied to the etching tank E.
- the waste liquid after the etching treatment is stored in the etching waste liquid storage tank 3 via the waste liquid intermediate tank 15 (the negative part is a construction bath liquid storage tank 16).
- the etching waste liquid is stored in the waste liquid intermediate tank 5 and mixed and separated in the etchant extraction / regeneration tank 6 (MS-1) as described above.
- the separated regenerated etchant is stored in the regenerated etchant recovery tank 7 and returned to the regenerated etchant storage tank 1.
- the extraction solvent is once stored in the recovery tank 8, it is mixed and separated in the back extraction tank 9 (MS-2) as described above, and the back-extracted solvent is recovered in the recovery tank 10, Further, washing is performed in the extraction solvent washing tank 11.
- the recovered washing water is reused through the circulation tank 12.
- the washed extraction solvent is stored once in the recovery tank 13 and then reused in the etch extraction regeneration tank 6 (MS-1). Is done.
- the aqueous solution of sulfuric acid and copper sulfate separated in the back extraction tank 9 (MA-2) is sent to the electrodeposition tanks 20 and 21 via the oil adsorbent 19, and the voltage is adjusted by the rectifiers 24 and 25 to perform electrolysis. Is performed, and metallic copper is recovered.
- the aqueous solution returned from the electrodeposition tanks 20 and 21 passes through the electrodeposition tank relay tank 18 and is reused in the reverse extraction tank 9 (MS-2).
- a new etching solution containing ammonia water is stored in the ammonia water storage tank 2 and, if necessary, is supplied to the etching tank E via the ammonia water intermediate tank 17 or the new liquid preparation tank 4. After that, it is captured in the recycled etching liquid storage tank 1.
- no washing step means that the extraction solvent back-extracted in MS-2 is reused in MS-1 without washing with MS-3, as shown by the broken line in Figure 1. It is. Also, “only washing after extraction” refers to the case where extraction is performed in MS-1, the extraction solvent is washed, and then back extraction is performed, as shown as a comparative example in FIG. .
- the etching rate and accuracy are reduced within a short period of three months, and the entire amount of the expensive etching solution is reduced. It has been replaced.
- the etching rate decreases with the number of days of use, as shown in Fig. 8.
- the introduction of the washing step after the back extraction prevents the sulfate from being mixed into the etching solution, so that the sulfuric acid concentration does not increase as shown in FIG.
- the etching rate has not decreased, it has become possible to continuously repeat stable etching and regeneration by extracting the solvent.
- the sulfate groups mixed in the extraction solvent during the back extraction are removed by washing after the back extraction, so that the sulfate groups are not brought into the etching solution. Therefore, the etching solution can be used stably over a long period of time.
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
- Extraction Or Liquid Replacement (AREA)
- Manufacture And Refinement Of Metals (AREA)
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR1019970700202A KR100264446B1 (ko) | 1995-05-12 | 1995-08-23 | 에칭폐액의 재이용방법 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP7/114830 | 1995-05-12 | ||
JP11483095A JP3392259B2 (ja) | 1995-05-12 | 1995-05-12 | エッチング廃液の再利用方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
WO1996035827A1 true WO1996035827A1 (fr) | 1996-11-14 |
Family
ID=14647767
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/JP1995/001673 WO1996035827A1 (fr) | 1995-05-12 | 1995-08-23 | Procede permettant de recycler une solution de decapage usee |
Country Status (3)
Country | Link |
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JP (1) | JP3392259B2 (ja) |
KR (1) | KR100264446B1 (ja) |
WO (1) | WO1996035827A1 (ja) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1840739B (zh) * | 2005-03-04 | 2010-09-29 | 法布罗技术有限公司 | 铜蚀刻剂的再生和硫酸铜的回收 |
CN104083902A (zh) * | 2014-07-24 | 2014-10-08 | 广西新天德能源有限公司 | 一种蚀刻废液萃取智能搅拌装置 |
CN108786178A (zh) * | 2018-07-18 | 2018-11-13 | 浙江格蕾斯生物科技有限公司 | 一种萃取液循环利用系统 |
CN110144590A (zh) * | 2019-05-31 | 2019-08-20 | 深圳市泓达环境科技有限公司 | 碱性含铜蚀刻废液再生及氨氮废水循环系统 |
CN111270239A (zh) * | 2020-03-27 | 2020-06-12 | Tcl华星光电技术有限公司 | 含铜酸性蚀刻液循环再生的方法 |
Families Citing this family (8)
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KR20000058364A (ko) * | 2000-05-02 | 2000-10-05 | 정진동 | 電子回路 보드의 銅腐蝕廢液의 스러지로부터 黃酸銅을推出하는 방법 |
KR100944039B1 (ko) * | 2008-02-20 | 2010-02-24 | (주)광양합금철 | 몰리브덴 제조 공정에서 발생된 폐수에 잔류하는몰리브덴과 구리의 회수 방법 |
CN102074491B (zh) * | 2010-11-30 | 2012-06-27 | 沈阳芯源微电子设备有限公司 | 带有可旋转底盘的化学液分类回收装置 |
CN103789769A (zh) * | 2014-01-14 | 2014-05-14 | 无锡市瑞思科环保科技有限公司 | 一种将pcb酸碱性蚀刻废液资源回收及再生的方法 |
CN104611703A (zh) * | 2014-12-26 | 2015-05-13 | 锦州清源嘉华环保科技有限公司 | Pcb蚀刻废液再生及重金属回收装置及回收方法 |
CN105506636A (zh) * | 2016-02-02 | 2016-04-20 | 深圳中能润德环保有限公司 | 一种萃取含铜废液的循环再生系统及方法 |
CN110408937A (zh) * | 2019-08-13 | 2019-11-05 | 安徽绿洲危险废物综合利用有限公司 | 一种碱性蚀刻氨回收利用系统 |
CN112080748A (zh) * | 2020-09-14 | 2020-12-15 | 深圳市祺鑫环保科技有限公司 | 酸性蚀刻废液的回收利用方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS52123903A (en) * | 1976-04-08 | 1977-10-18 | Duisburger Kupferhuette | Method of recovering useful components by solvent extraction of multicomponent system nonferroussmetallcontaining solution |
JPS5836677B2 (ja) * | 1976-01-16 | 1983-08-10 | 日本ソレックス株式会社 | 硫酸鉄溶液から硫酸及び含有金属を回収する方法 |
JPS6253592B2 (ja) * | 1978-05-02 | 1987-11-11 | Pyumetsukusu Inoachion Ab |
-
1995
- 1995-05-12 JP JP11483095A patent/JP3392259B2/ja not_active Expired - Fee Related
- 1995-08-23 WO PCT/JP1995/001673 patent/WO1996035827A1/ja active IP Right Grant
- 1995-08-23 KR KR1019970700202A patent/KR100264446B1/ko not_active IP Right Cessation
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5836677B2 (ja) * | 1976-01-16 | 1983-08-10 | 日本ソレックス株式会社 | 硫酸鉄溶液から硫酸及び含有金属を回収する方法 |
JPS52123903A (en) * | 1976-04-08 | 1977-10-18 | Duisburger Kupferhuette | Method of recovering useful components by solvent extraction of multicomponent system nonferroussmetallcontaining solution |
JPS6253592B2 (ja) * | 1978-05-02 | 1987-11-11 | Pyumetsukusu Inoachion Ab |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1840739B (zh) * | 2005-03-04 | 2010-09-29 | 法布罗技术有限公司 | 铜蚀刻剂的再生和硫酸铜的回收 |
CN104083902A (zh) * | 2014-07-24 | 2014-10-08 | 广西新天德能源有限公司 | 一种蚀刻废液萃取智能搅拌装置 |
CN108786178A (zh) * | 2018-07-18 | 2018-11-13 | 浙江格蕾斯生物科技有限公司 | 一种萃取液循环利用系统 |
CN110144590A (zh) * | 2019-05-31 | 2019-08-20 | 深圳市泓达环境科技有限公司 | 碱性含铜蚀刻废液再生及氨氮废水循环系统 |
CN111270239A (zh) * | 2020-03-27 | 2020-06-12 | Tcl华星光电技术有限公司 | 含铜酸性蚀刻液循环再生的方法 |
Also Published As
Publication number | Publication date |
---|---|
JP3392259B2 (ja) | 2003-03-31 |
KR100264446B1 (ko) | 2000-08-16 |
KR970704909A (ko) | 1997-09-06 |
JPH08311664A (ja) | 1996-11-26 |
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