WO1996035091A1 - Unibody crucible - Google Patents

Unibody crucible Download PDF

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Publication number
WO1996035091A1
WO1996035091A1 PCT/US1996/006267 US9606267W WO9635091A1 WO 1996035091 A1 WO1996035091 A1 WO 1996035091A1 US 9606267 W US9606267 W US 9606267W WO 9635091 A1 WO9635091 A1 WO 9635091A1
Authority
WO
WIPO (PCT)
Prior art keywords
orifice
section
crucible
base section
peripheral dimension
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
PCT/US1996/006267
Other languages
English (en)
French (fr)
Inventor
Paul E. Colombo
Robert F. Donadio
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Chorus Corp
Original Assignee
Chorus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=23718594&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=WO1996035091(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Chorus Corp filed Critical Chorus Corp
Priority to AT96915496T priority Critical patent/ATE224525T1/de
Priority to JP8533541A priority patent/JPH11504613A/ja
Priority to DE69623765T priority patent/DE69623765T2/de
Priority to AU57257/96A priority patent/AU5725796A/en
Priority to EP96915496A priority patent/EP0826131B1/en
Publication of WO1996035091A1 publication Critical patent/WO1996035091A1/en
Anticipated expiration legal-status Critical
Ceased legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27D—DETAILS OR ACCESSORIES OF FURNACES, KILNS, OVENS OR RETORTS, IN SO FAR AS THEY ARE OF KINDS OCCURRING IN MORE THAN ONE KIND OF FURNACE
    • F27D1/00—Casings; Linings; Walls; Roofs
    • F27D1/16—Making or repairing linings ; Increasing the durability of linings; Breaking away linings
    • F27D1/1636—Repairing linings by projecting or spraying refractory materials on the lining
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/515—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics
    • C04B35/58—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides
    • C04B35/583—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on non-oxide ceramics based on borides, nitrides, i.e. nitrides, oxynitrides, carbonitrides or oxycarbonitrides or silicides based on boron nitride
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/243—Crucibles for source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/01—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes on temporary substrates, e.g. substrates subsequently removed by etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/34—Nitrides
    • C23C16/342—Boron nitride
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
    • C30B23/02—Epitaxial-layer growth
    • C30B23/06—Heating of the deposition chamber, the substrate or the materials to be evaporated
    • C30B23/066—Heating of the material to be evaporated
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details specially adapted for crucible or pot furnaces
    • F27B14/10—Crucibles
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B14/00—Crucible or pot furnaces
    • F27B14/08—Details specially adapted for crucible or pot furnaces
    • F27B14/10—Crucibles
    • F27B2014/102—Form of the crucibles
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/13—Hollow or container type article [e.g., tube, vase, etc.]
    • Y10T428/131—Glass, ceramic, or sintered, fused, fired, or calcined metal oxide or metal carbide containing [e.g., porcelain, brick, cement, etc.]

Definitions

  • This invention relates, generally, to apparatus used in the manufacture of
  • the invention relates to a crucible for a molecular beam epitaxy (MBE) effusion cell or source.
  • MBE molecular beam epitaxy
  • Molecular beam epitaxy is a growth process which involves the deposition of
  • MBE is widely used in compound semiconductor research and in the semiconductor device fabrication
  • Thermal effusion cells have a crucible which contains the effusion
  • the crucible is formed of gallium, arsenic, or other elements or compounds.
  • a plurality of cells are mounted, via ports, in the growth chamber.
  • One or more of the cells are actuated and generate a beam which is directed at a
  • Control of the beam is typically accomplished via shutters and/or valves.
  • shutters and/or valves In use,
  • the formed wafer is cooled, inspected, and processed for removal from the chamber.
  • Source crucibles are constructed of an inert material which is stable at high
  • a preferred material is pyrolytic boron nitride (PBN).
  • crucibles are typically formed by a chemical vapor deposition (CVD) process
  • Capacity relates to the ability of the crucible to hold an amount of material necessary for a particular MBE process. Greater capacity permits construction of
  • Uniformity may also be compositional. Uniformity has been achieved in
  • crucibles having a conic configuration throughout have limited capacity, exhibit depletion effects, and are prone to flux transients.
  • Oval defects are morphological defects present on the formed semiconductor
  • Source related oval defects are thought to be caused by spitting from the
  • Flux transients are particularly a problem in crucible designs having a conic
  • this invention to provide a crucible which maximizes capacity, uniformity and long
  • a unibody containment structure such as a crucible
  • the present invention provides a container comprising a rigid wall structure
  • the interior space having a first peripheral dimension
  • the second peripheral dimension being less than the first peripheral
  • Figure 1 is a perspective view, partially cut-away, of an MBE effusion cell
  • Figure 2 is a crossectional view of a portion of a dual filament effusion cell
  • Figure 3 is a perspective view of an embodiment of the unibody, monolithic
  • Figure 4 is a front view of the crucible shown in Figure 3.
  • Figure 5 is crossectional view of the crucible taken along line 5-5 of Figure 3.
  • Figure 6 is a top view of the crucible as shown in Figure 4.
  • Figure 7 is a bottom view of the crucible.
  • Figure 8 is a side view, partially in crossection, of the CVD mandrel assembly
  • Figure 9 is a side view, partially in crossection, of the top member of the
  • Figure 10 is a side view, partially in crossection, of the bottom member of the
  • Figure 11 is a side view of a center stud member of the mandrel assembly.
  • Figure 12 is a side view of a hanger member which is attached to the mandrel
  • Figure 13 is a crossectional view, taken along the center axis, of another
  • the crucible of the present invention is well suited for use in an MBE effusion
  • a typical MBE effusion cell 10 such as one manufactured
  • flange and support assembly 12 couples the effusion cell 10 to an MBE growth
  • the assembly 12 further supports the head assembly 11 at a
  • assembly 12 includes a cylindrical sealing flange 21 of a predetermined diameter, and
  • thermocouple lead 24 extend from the power connector 19 and thermocouple connector 20, respectively, through the flange 21 and to the head
  • the head assembly 11 includes a centrally interiorly disposed crucible
  • the filament 14 is preferably
  • the heat shield 15 is preferably
  • thermocouple 16 is connected to the exterior of the crucible 13 near its base.
  • thermocouple leads 24 are connected to the filament 14 and the thermocouple leads 24
  • the crucible 13 has a conical configuration with an outwardly oriented orifice 17 of a predetermined diameter with an annular lip
  • the crucible 13 is constructed of PBN, for example.
  • the effusion cell 10 may
  • Figure 2 shows another head assembly structure manufactured by EPI MBE
  • the heating system includes a first filament 28 for
  • the filaments 28 and 29 are
  • the crucible 27 comprises a cylindrical body 31 and a conical insert 32.
  • the cylindrical body 31 has straight or substantially straight walls with little or no positive draft (taper), and no negative
  • the walls of the body 31 define a predetermined interior volume which is
  • the crucible body 31 separates, and insulates to a certain extent, the tip filament 29 from the conical insert 33. This separation is believed to
  • the present invention integrates the
  • the invention further provides
  • the crucible 40 generally comprises a base section 41 and a conical
  • the crucible 40 is formed of an inert, corrosion resistant material.
  • a preferred material is PBN, such as Pyrosyl® sold by CVD Products, Inc. of Hudson. New Hampshire.
  • the preferred thickness of PBN for the crucible 40 is
  • the crucible 40 is constructed via a chemical
  • the crucible 40 embodiment shown is approximately 5.3
  • the base section 41 has a substantially cylindrical configuration with a side
  • wall 44 has a predetermined substantially uniform circumference and a predetermined
  • the diameter of the base section 41 shown is approximately 1.4 inches (3.5
  • the length base section 41 is approximately 2.9 inches (7.3 cm.).
  • draft wall 46 tapers inwardly (laterally) towards the central longitudinal axis (not
  • the negative draft wall 46 terminates at its outward end to define a
  • the second orifice 47 is a region of smallest diameter in
  • the crucible 40 is approximately 0.6 inches (1.5 cm.) in this embodiment.
  • the conical section 42 is defined by the portion of the crucible extending from the second orifice 47 to the periphery of the first orifice 43.
  • the conical section 42 is defined by the portion of the crucible extending from the second orifice 47 to the periphery of the first orifice 43.
  • the section in this embodiment is approximately 2.3 inches (5.8 cm.).
  • the wall 48 tapers outwardly (laterally) away from the central longitudinal axis of the crucible 40 at a preferred approximate angle of 9.0 degrees measured with respect to the central axis.
  • the annular lip 49 extends outwardly from the terminal edge of the wall 48 preferably
  • the first orifice has a preferred diameter of approximately 1.5
  • the annular lip 49 has a width of
  • the crucible 40 is typically oriented upwardly at
  • An element or compound is added to the crucible and heated by
  • the dual filament system for example, of an effusion source to form a melt 50.
  • an effusion source to form a melt 50.
  • the conical section 42 of the crucible 40 yields a level of thickness uniformity which matches that provided by conical crucibles. Additionally though, the design minimizes depletion effects. In all types of cells the beam equivalent pressure at a
  • the inner orifice 47 provided by the integral conical section 42 forms a thermal baffle between melt 50 and the shutter (not shown) improving hydrodynamic stability and reducing shutter-related transients.
  • the integrally formed conical section 42 enables optimal positioning of the tip filament of the dual filament heating system to minimize oval defect production.
  • one piece design crucible 90 is cylindrical and generally comprises a base section 91
  • the crucible 90 is preferably constructed of PBN via a vapor
  • This particular crucible 90 embodiment is approximately 8.1
  • the base section 91 has straight side walls 93 and a bottom wall 94 closing
  • Tapered wall 95 is disposed at the opposite end of the wall 93 and has a
  • Conical section 92 has a tapered wall 97 with a positive
  • the conical section 92 has a significantly reduced size (approximately 0.3 inches (0.7 cm.) axial length) in
  • unibody design permits construction of a crucible 90 which is essentially a "virtual crucible" in that it has a very small orifice or nozzle and enables placement of the effusion cell shutter very close to the source material or melt.
  • the shutter may also be made much smaller because of this.
  • the prior art teaches large orifices and requires a cell design wherein the shutter is large and is disposed a greater distance
  • the crucibles 40 and 90 described above are constructed by chemical vapor
  • Chemical vapor deposition is practiced, for example, by CVD Products.
  • PBN is produced by introducing gaseous boron trichloride
  • ammonia and a diluant into a growth chamber at a submillimeter pressure and a
  • the forming mandrel 55 is a four part assembly constructed of
  • graphite basically comprises a top member 56, a bottom member 57, and a center
  • top and bottom member 56 and 57 are separate components
  • top stud 59 which is connected to a
  • the bottom member 57 is formed of graphite, preferably a fine grained, high density, pre-purified graphite, and has a hollow, bored out center. Graphite begins to oxidize at approximately 300 degrees C. The dimensions of the bottom member 57
  • the member 57 is cylindrical and approximately 3.1 inches long and 1.3
  • the bottom edge 64 of the member 57 has a radius.
  • the top edge has a negative draft forming tapered neck 65 of angle "A", preferably 45
  • the diameter of the top end of the neck 65 is preferably
  • An axial bore 68 in the bottom member 57 is preferably
  • Axial bore 68 has a threaded upper
  • top member 56 is also hollow and formed of
  • top member 56 is also dependent of the dimensions of the crucible
  • the member 56 is curvilinear with a positive draft forming
  • 56 taper neck 73 has a length of approximately 2.1 inches, a bottom diameter of
  • neck 73 and base 74 is preferably radiused.
  • An axial bore 75 in the top member 56 is
  • Axial bore 75 has a threaded upper portion 60, which is 1.0 inch deep and 3/4-10
  • the center stud 58 is also hollow and constructed of graphite, preferably a fine grained, high density, pre-purified graphite.
  • the dimensions of the stud 58 are dependent upon the size and configuration of the
  • the stud 58 preferably has a length of approximately 1.5 inches, a threaded 3/8-16 UNC periphery , and an axial channel 80.
  • the stud 58 wall thickness (equal to one half the
  • outside diameter of the stud 58 body minus the bore 80 diameter is thick enough to
  • top or hanger stud 59 is preferably solid and
  • top and bottom member 56 With respect to the crucible 40 embodiment discussed
  • the stud 59 preferably has a length of approximately 4.5 inches and a threaded
  • the stud 59 has an axial bore 84 in one end which is 3/16
  • top member 56 a distance such that the lateral bore 85 remains on the exterior of the mandrel 55.
  • the bores 84 and 85 provide a venting means for the
  • the process of manufacturing the crucible of the present invention comprises the following steps. First, the top and bottom member 56 and 57 are mated by screwing them together with the center stud 58. Next, the hanger stud 59 is screwed
  • hanger stud 59 are oriented to vent pressure in the aligned axial channels 75 and 68 of
  • the resultant mandrel assembly 55 is placed in a CVD growth
  • the mandrel/container assembly is cooled.
  • the graphite materials of the forming mandrel 55 contract or shrink at a higher rate than does the PBN due to a high difference in
  • stud 58 is designed to fracture. The fracture allows the top and bottom members 56
  • predetermined period of time preferably approximately 40 hours, to oxidize the
  • Oxidization destroys the bottom member 57, which would
  • the method may be used to manufacture 18
  • structures may be constructed from a variety of compounds produced by chemical
  • crucible designs may be made using the aforementioned method, including but not

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Ceramic Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Chemical Vapour Deposition (AREA)
  • Saccharide Compounds (AREA)
  • Cookers (AREA)
  • Thermally Insulated Containers For Foods (AREA)
PCT/US1996/006267 1995-05-03 1996-05-03 Unibody crucible Ceased WO1996035091A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AT96915496T ATE224525T1 (de) 1995-05-03 1996-05-03 Einteiliger tiegel
JP8533541A JPH11504613A (ja) 1995-05-03 1996-05-03 単体るつぼ
DE69623765T DE69623765T2 (de) 1995-05-03 1996-05-03 Einteiliger tiegel
AU57257/96A AU5725796A (en) 1995-05-03 1996-05-03 Unibody crucible
EP96915496A EP0826131B1 (en) 1995-05-03 1996-05-03 Unibody crucible

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/433,033 US5820681A (en) 1995-05-03 1995-05-03 Unibody crucible and effusion cell employing such a crucible
US08/433,033 1995-05-03

Publications (1)

Publication Number Publication Date
WO1996035091A1 true WO1996035091A1 (en) 1996-11-07

Family

ID=23718594

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/US1996/006267 Ceased WO1996035091A1 (en) 1995-05-03 1996-05-03 Unibody crucible
PCT/US1996/006223 Ceased WO1996034994A1 (en) 1995-05-03 1996-05-03 Chemical vapor deposition method and apparatus

Family Applications After (1)

Application Number Title Priority Date Filing Date
PCT/US1996/006223 Ceased WO1996034994A1 (en) 1995-05-03 1996-05-03 Chemical vapor deposition method and apparatus

Country Status (7)

Country Link
US (3) US5820681A (https=)
EP (2) EP1215307A3 (https=)
JP (2) JPH11504613A (https=)
AT (1) ATE224525T1 (https=)
AU (2) AU5725796A (https=)
DE (1) DE69623765T2 (https=)
WO (2) WO1996035091A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0851042A3 (en) * 1996-12-27 1999-03-24 Shin-Etsu Chemical Co., Ltd. Crucible of pyrolytic boron nitride for molecular beam epitaxy
WO2000015883A1 (en) * 1998-09-15 2000-03-23 Coherent, Inc. Effusion cell and method of use in molecular beam epitaxy
US8512806B2 (en) 2008-08-12 2013-08-20 Momentive Performance Materials Inc. Large volume evaporation source

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* Cited by examiner, † Cited by third party
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US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
US6140624A (en) * 1999-07-02 2000-10-31 Advanced Ceramics Corporation Pyrolytic boron nitride radiation heater
AU2001227824A1 (en) * 2000-01-12 2001-07-24 Applied Epi, Inc. Ultra-low temperature effusion cell
JP2001220286A (ja) 2000-02-02 2001-08-14 Sharp Corp 分子線源および分子線エピタキシ装置
US7194197B1 (en) * 2000-03-16 2007-03-20 Global Solar Energy, Inc. Nozzle-based, vapor-phase, plume delivery structure for use in production of thin-film deposition layer
US6551405B1 (en) * 2000-09-22 2003-04-22 The Board Of Trustees Of The University Of Arkansas Tool and method for in situ vapor phase deposition source material reloading and maintenance
DE10056686B4 (de) * 2000-11-15 2005-09-29 Forschungsverbund Berlin E.V. Verdampferzelle und ein Verfahren zur Herstellung von Aufdampfschichten
JP2003002778A (ja) * 2001-06-26 2003-01-08 International Manufacturing & Engineering Services Co Ltd 薄膜堆積用分子線セル
US6926920B2 (en) * 2002-06-11 2005-08-09 Taiwan Semiconductor Manufacturing Co., Ltd Chemical vapor deposition (CVD) calibration method providing enhanced uniformity
JP4344631B2 (ja) * 2004-03-02 2009-10-14 長州産業株式会社 有機物薄膜堆積用分子線源
US20050232824A1 (en) * 2004-04-14 2005-10-20 Pangrcic Robert A High temperature electrolyte testing container
US20050229856A1 (en) * 2004-04-20 2005-10-20 Malik Roger J Means and method for a liquid metal evaporation source with integral level sensor and external reservoir
US7493691B2 (en) * 2004-05-20 2009-02-24 Honeywell International Inc. Co-molding metallic-lined phenolic components
JP4442558B2 (ja) * 2005-01-06 2010-03-31 三星モバイルディスプレイ株式會社 蒸発源の加熱制御方法，蒸発源の冷却制御方法および蒸発源の制御方法
US20060185599A1 (en) * 2005-02-22 2006-08-24 Bichrt Craig E Effusion Cell Valve
US7732737B2 (en) * 2005-10-11 2010-06-08 Kimberly-Clark Worldwide, Inc. Micro powered warming container
JP4673190B2 (ja) * 2005-11-01 2011-04-20 長州産業株式会社 薄膜堆積用分子線源とその分子線量制御方法
US20070218199A1 (en) * 2006-02-13 2007-09-20 Veeco Instruments Inc. Crucible eliminating line of sight between a source material and a target
US8747554B2 (en) * 2006-06-20 2014-06-10 Momentive Performance Materials Inc. Multi-piece ceramic crucible and method for making thereof
EP1967606A1 (en) * 2007-03-08 2008-09-10 Applied Materials, Inc. Evaporation crucible and evaporation apparatus with adapted evaporation characteristic
US20090169781A1 (en) * 2007-12-31 2009-07-02 Marc Schaepkens Low thermal conductivity low density pyrolytic boron nitride material, method of making, and articles made therefrom
JP5502069B2 (ja) 2008-04-15 2014-05-28 グローバル ソーラー エナジー インコーポレーテッド 薄膜太陽電池セルを製造するための装置および方法
US9187821B2 (en) * 2008-08-11 2015-11-17 Veeco Instruments Inc. Vacuum deposition sources having heated effusion orifices
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US5932294A (en) 1999-08-03
AU5636796A (en) 1996-11-21
EP1215307A3 (en) 2002-09-04
EP0826131B1 (en) 2002-09-18
WO1996034994A1 (en) 1996-11-07
US5800753A (en) 1998-09-01
EP1215307A2 (en) 2002-06-19
ATE224525T1 (de) 2002-10-15
JP5174137B2 (ja) 2013-04-03
US5820681A (en) 1998-10-13
JP2011079736A (ja) 2011-04-21
EP0826131A1 (en) 1998-03-04
EP0826131A4 (en) 1998-07-15
JPH11504613A (ja) 1999-04-27
AU5725796A (en) 1996-11-21
DE69623765D1 (de) 2002-10-24

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