WO1996006216A1 - Produit de depot en phase vapeur et son procede de production - Google Patents

Produit de depot en phase vapeur et son procede de production Download PDF

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Publication number
WO1996006216A1
WO1996006216A1 PCT/JP1994/001379 JP9401379W WO9606216A1 WO 1996006216 A1 WO1996006216 A1 WO 1996006216A1 JP 9401379 W JP9401379 W JP 9401379W WO 9606216 A1 WO9606216 A1 WO 9606216A1
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WO
WIPO (PCT)
Prior art keywords
thin film
vapor
layer
deposited
vapor deposition
Prior art date
Application number
PCT/JP1994/001379
Other languages
English (en)
Japanese (ja)
Inventor
Jiichiro Okumura
Takao Negishi
Original Assignee
Toray Industries, Inc.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP05972393A priority Critical patent/JP3232751B2/ja
Priority claimed from JP05972393A external-priority patent/JP3232751B2/ja
Application filed by Toray Industries, Inc. filed Critical Toray Industries, Inc.
Priority to EP94924397A priority patent/EP0731206B1/fr
Priority to US08/633,807 priority patent/US5744405A/en
Priority to DE69427766T priority patent/DE69427766T2/de
Priority to KR1019960702047A priority patent/KR100324085B1/ko
Priority to PCT/JP1994/001379 priority patent/WO1996006216A1/fr
Publication of WO1996006216A1 publication Critical patent/WO1996006216A1/fr

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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J7/00—Chemical treatment or coating of shaped articles made of macromolecular substances
    • C08J7/12—Chemical modification
    • C08J7/123—Treatment by wave energy or particle radiation
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/02—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements ultrasonic or sonic; Corona discharge
    • D06M10/025—Corona discharge or low temperature plasma
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/04—Physical treatment combined with treatment with chemical compounds or elements
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M10/00—Physical treatment of fibres, threads, yarns, fabrics, or fibrous goods made from such materials, e.g. ultrasonic, corona discharge, irradiation, electric currents, or magnetic fields; Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/04—Physical treatment combined with treatment with chemical compounds or elements
    • D06M10/08—Organic compounds
    • D06M10/10—Macromolecular compounds
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/77—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof
    • D06M11/79—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with silicon or compounds thereof with silicon dioxide, silicic acids or their salts
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M11/00—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising
    • D06M11/83—Treating fibres, threads, yarns, fabrics or fibrous goods made from such materials, with inorganic substances or complexes thereof; Such treatment combined with mechanical treatment, e.g. mercerising with metals; with metal-generating compounds, e.g. metal carbonyls; Reduction of metal compounds on textiles
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M15/00—Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment
    • D06M15/19—Treating fibres, threads, yarns, fabrics, or fibrous goods made from such materials, with macromolecular compounds; Such treatment combined with mechanical treatment with synthetic macromolecular compounds
    • D06M15/37—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M15/643—Macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds containing silicon in the main chain
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M23/00—Treatment of fibres, threads, yarns, fabrics or fibrous goods made from such materials, characterised by the process
    • D06M23/005—Applying monomolecular films on textile products like fibres, threads or fabrics
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/02—Natural fibres, other than mineral fibres
    • D06M2101/04—Vegetal fibres
    • D06M2101/06—Vegetal fibres cellulosic
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/02—Natural fibres, other than mineral fibres
    • D06M2101/10—Animal fibres
    • D06M2101/12—Keratin fibres or silk
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/18—Synthetic fibres consisting of macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/26—Polymers or copolymers of unsaturated carboxylic acids or derivatives thereof
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/32—Polyesters
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2101/00—Chemical constitution of the fibres, threads, yarns, fabrics or fibrous goods made from such materials, to be treated
    • D06M2101/16—Synthetic fibres, other than mineral fibres
    • D06M2101/30—Synthetic polymers consisting of macromolecular compounds obtained otherwise than by reactions only involving carbon-to-carbon unsaturated bonds
    • D06M2101/34—Polyamides
    • D—TEXTILES; PAPER
    • D06—TREATMENT OF TEXTILES OR THE LIKE; LAUNDERING; FLEXIBLE MATERIALS NOT OTHERWISE PROVIDED FOR
    • D06M—TREATMENT, NOT PROVIDED FOR ELSEWHERE IN CLASS D06, OF FIBRES, THREADS, YARNS, FABRICS, FEATHERS OR FIBROUS GOODS MADE FROM SUCH MATERIALS
    • D06M2200/00—Functionality of the treatment composition and/or properties imparted to the textile material
    • D06M2200/35—Abrasion, pilling or fibrillation resistance

Definitions

  • the present invention relates to a vapor-deposited product and a method for producing the same, and more particularly, to a vapor-deposited product and a method for producing the same, which are capable of enhancing the adhesive force of a vapor-deposited thin film and are most suitable for application to a vapor-deposited thin film-forming fiber product or sheet.
  • the light interference thin film is directly deposited on the surface of the fiber exposed on the surface of the fabric.
  • the problem remains that the adhesive strength against friction and bending may be insufficient.
  • the object of the present invention is to focus on such problems and to improve the adhesive force of a textile product (fiber cloth) or a sheet-like material, and furthermore, a deposited thin film deposited on the surface of the product. In this case, it is necessary to impart excellent washing resistance, abrasion resistance and the like to the deposited product.
  • the vapor-deposited product of the present invention has a metal or inorganic substance at least on a part of the surface of an organic base material via an intermediate containing at least a silicone resin and silicon dioxide. It is composed of one having a deposited thin film.
  • the silicon dioxide contained in the above intermediate is optimally produced by plasma treatment.
  • the intermediate is plasma-treated from the surface, and the silicon dioxide generated by such plasma treatment can exist near the surface of the intermediate and is generated by plasma treatment, so that it is uniformly dispersed in a molecular order. It can be distributed and therefore has a high adhesion to the deposited thin film formed thereon.
  • the elemental composition of the intermediate is plasma-treated until at least one silicon atom per two carbon atoms in the vicinity of the deposited thin film, an extremely high adhesive strength can be obtained. .
  • the method for manufacturing a vapor-deposited product according to the present invention is to apply a silicon-based resin to the surface of an organic base material, to perform a plasma treatment on the surface, It consists of a method of forming a thin film containing a metal or inorganic substance on the surface by vapor deposition.
  • the method for producing a vapor-deposited product of the present invention comprises applying a silicone-based resin to the surface of an organic base material, heat-treating the silicone-based resin to form a silicone-based resin layer, It comprises a method of performing a plasma treatment and forming a thin film having a metal or an inorganic substance on the plasma treated surface by vapor deposition.
  • a silicone-based resin film is formed on the surface of the silk-based fabric (sheet-like material) by coating and dipping, and the silicone-based resin is heat-treated to form a silicone-based resin layer.
  • Plasma treatment more precisely low-temperature plasma treatment, activates the silicon-based resin (silicon dioxide is uniformly generated in the molecular order by the plasma treatment), A predetermined vapor-deposited thin film is formed on the layer by a vapor deposition process.
  • the silicone-based resin contains silicon dioxide in advance
  • the silicone-based resin is applied to the surface of the organic base material by applying, for example, dipping, and then dried.
  • a relatively high adhesive strength can be obtained by forming a vapor-deposited thin film by vapor-depositing an inorganic substance.
  • FIG. 1 is a schematic partial cross-sectional view showing an example of a vapor deposition product having an interference color manufactured by the method of the present invention.
  • FIG. 2 is a schematic partial cross-sectional view of a deposition product having an interference color according to another example different from FIG.
  • FIG. 3 is a schematic partial cross-sectional view of a vapor deposition product having an interference color according to yet another example.
  • ⁇ FIG. 4 is a schematic partial cross-sectional view of a vapor deposition product having an interference color according to still another example.
  • FIG. 2 is a schematic partial perspective view showing an example of a vapor-deposited product having a vapor-deposited thin film formed on the surface of each textile exposed on the surface of a textile product, particularly when the base material is a textile product.
  • FIG. 6 is a schematic partial cross-sectional view showing an example of a vapor deposition product using a transparent base material.
  • FIG. 7 is a schematic partial cross-sectional view of a vapor deposition product using a transparent substrate according to another example.
  • the silicone resin used in the present invention for example, methylhydrogen polysiloxane emulsion is used, and as the catalyst, for example, a zinc resin can be used.
  • the content of silicon in the methylhydridoenepolysiloxane emulsion is suitably about 2 to 10% by weight
  • the content of the zinc-based catalyst is suitably about 2 to 10% by weight. From the viewpoint of obtaining an effect of softening the texture of the vapor-deposited product, a method of using a melamine resin without using a catalyst can also be preferably employed.
  • the content of the silicone resin is approximately 2 to 10% by weight, and the total content of the melamine resin and the polyester resin is approximately 0! About 5% by weight is appropriate.
  • a catalyst for the melamine resin can be used.
  • the content of the catalyst in the methylhydrogenpolysiloxane emulsion is preferably about 0.02 to 0.4% by weight.
  • a dipping method can be cited, and an appropriate drawing ratio is about 20 to 60%. Also, applying the drying after, as the condition for curing, 1 6 0 ⁇ 1 8 0 e C , about 2 minutes continuous conditions are preferred. It is more preferable to cure after drying at 110 to 130.
  • Suitable conditions for the low-temperature plasma treatment include, for example, a degree of vacuum: 20 to 100 Pa, a discharge power: 2 to 7 KV, and a processing speed: about 5 to 3 OmZ.
  • the processing atmosphere may be air or a gas atmosphere such as oxygen or argon.
  • the surface to be treated may be a double-sided surface, or at least a surface to be subjected to a vapor deposition process.
  • the degree of low-temperature plasma treatment also needs to be changed depending on the chemical composition of the silicone-based resin, but from the viewpoint of effectiveness, the elemental composition of the silicone-based resin layer is at least in the vicinity of the deposited thin film with respect to carbon atoms 2 It is preferable to use at least one gay atom from the viewpoint of adhesiveness.
  • the substrate used in the present invention is not particularly limited as long as it is an organic substrate, and is, for example, a fiber cloth / sheet-like material.
  • Moth fabrics include synthetic fibers made of polyester, polyamide, polyacryl, rayon, etc., and fabrics made of natural fibers such as cotton and silk. it can.
  • the sheet-like material include a plastic film and paper.
  • the vapor-deposited thin film according to the present invention When the vapor-deposited thin film according to the present invention is formed on such a woven fabric, it has an interference color. Products can be obtained.
  • the interference color changes depending on the angle between the interference surface and the line of sight.
  • the base material is a strong twisted fabric, the drape property of the base material is high, and the supple movement of the cloth and the change of the interference color according to the movement give a new feeling of drape, resulting in a high ⁇ cloth.
  • the base material is uneven fabric, a deposited thin film is formed according to the unevenness, so that the interference color changes according to the unevenness, and a new sense of three-dimensional feeling is obtained, resulting in a high-quality fabric.
  • the interference color changes depending on the falling direction and movement of the bristles, resulting in a new sense of surface texture and a high ⁇ fabric.
  • the base material is a monofilament fabric
  • the fibers are thick and clear interference colors at one fork, and the fabric is generally transparent with a large space between the yarns. Therefore, a high-quality cloth with a new sensation that the color is dark and the cloth is transparent is obtained.
  • the vapor deposition material is not particularly limited, and includes metals, inorganic substances, and the like.
  • the metals used as the vapor deposition material are not particularly limited, and include Al, Au, Cr, Cu, Mg, Ni, Ti, Co, Pt, Si, etc., and oxidation of inorganic substances.
  • the object is not particularly limited, A 1 2 0 3, in 2 0 3, C r 2 0 3, MgO, S i O, S i 0 2, T i O, T i 0 2, I tO, Sn0 2 and the like
  • the nitride is not particularly limited, and examples thereof include A 1 N, Ti N, and Si 3 N 4 .
  • Other gF 2 can also be used.
  • the layer structure of the vapor-deposited thin film may be a single layer or a laminated structure.
  • a deposited thin film is deposited on a silicon-based resin containing silicon dioxide as described above, preferably on a silicon-based resin film that has been subjected to low-temperature plasma treatment.
  • a strong adhesive force is exerted between the activated silicon-based resin film.
  • good adhesion was secured between the silicone resin film and the organic base material.
  • the deposition method is not particularly limited.
  • the base material is placed in a known thin film forming apparatus such as a vacuum deposition apparatus, a sputtering apparatus, or an ion plating apparatus, and the deposition thin film is formed under reduced pressure. The method is preferred.
  • the above-mentioned enhancement of the adhesive strength is achieved by forming a silicon-based resin film containing silicon dioxide, preferably a silicone-based resin film that has been subjected to low-temperature plasma treatment. High adhesive strength cannot be obtained. X-ray photoelectron spectroscopy can be used to analyze the atomic state of the silicon resin film surface. Also, P
  • the element composition (ratio of the number of atoms) analysis can be used Oje electron spectroscopy £ Furthermore, if after the deposition film formation, in combination with ion etching under digging film Getsutsu analysis Can be used.
  • a heat treatment at 1 7 0 hand over By performing such heat treatment, particularly the surface of the deposited thin film is oxidized to become an oxidized thin film, and the strength of the thin film is improved, and at the same time, the interference color of the textile fabric described later becomes more vivid, and a metallic luster can be obtained. It is preferred. Further, in order to protect the deposited thin film, after the deposition and heat treatment, a protective layer may be coated on the deposited thin film as necessary.
  • Table 1 shows the comparison between the durability when each resin was applied and the case with and without plasma treatment. Irrigation and abrasion resistance are obtained. However, silicon dioxide is not included in the silicone resin that has not been subjected to low-temperature plasma treatment. Table 1 shows a comparison between plasma treatment and heat treatment before vapor deposition.
  • the vapor deposition product of the present invention and the method for producing the same can be applied even when the vapor deposition thin film is an electromagnetic interference thin film, for example, a light interference thin film. That is, the present invention can be applied to a case where a moth fabric or a sheet having an interference color is obtained by depositing a light interference thin film.
  • the above-mentioned silicone resin film is formed, subjected to a low-temperature plasma treatment, and then a light interference thin film is deposited thereon.
  • This light interference thin film can adopt the following various ideas.
  • a transparent layer 3 is formed on a silicone resin film 2 on one or both sides of a base material 1 made of a fiber fabric or a sheet.
  • the c transparent metal compound thin film of the material provided by the transparent layer 3 months ⁇ deposition made of a transparent metal compound thin film for example, a 1 2 0 3, I n 2 0 3, C r 2 0 3, MgO, S i O , mention may be made of one at least selected S i 0 2, T i O , T i 0 2, a ] N, T i N, the S i N 4. Mg F 2 .
  • the reflected light R 2 on the surface of the transparent layer 3 and the reflected light R 3 on the back surface of the light R incident from the front side, namely, the transparent layer, Color is generated by interference with reflection at the boundary surface between the transparent layer and the adjacent substrate (or silicone resin film 2).
  • the thickness of the transparent layer 3 is preferably not less than 40 OA and not more than 50,000 A.
  • the light interference thin film may be formed by a two-layer structure in which a reflective layer 4 and a transparent layer 3 are sequentially laminated from the substrate 1 side.
  • the reflective layer 4 is composed of a metal thin film having an average reflectance of 60% or more (preferably 90% or more) in a visible light region.
  • the material of the reflective metal thin film include Al, Cu, Ag, Mg, T At least one kind selected from i, Ni, Co, Pt, Au, Cr, Pe, and Rh can be obtained.
  • Such a reflective layer 4 can also be provided by vapor deposition, and the thickness of the reflective metal thin film constituting the reflective layer 4 is preferably 50 OA or more. Also in this case, the thickness of the transparent layer 3 is preferably not less than 40 OA and not more than 500 OA.
  • the light R incident from the front side is reflected light R 2 on the transparent layer 3 surface and reflected light R 3 on the back surface, that is, Color is generated by interference between reflected light at the interface between the transparent layer 3 and the reflective layer 4.
  • the light interference thin film has a three-layer structure in which the reflective layer 4, the transparent layer 3, and the translucent layer 5 are sequentially laminated in this order from the substrate 1. It may be formed.
  • the translucent layer 5 is composed of, for example, a translucent metal thin film having an average reflectance in the visible light region of 60% or less.
  • a material of the translucent metal thin film Al, Cu, Ag, Mg, Ti, At least one kind selected from Ni, Co, Pt, In, Cr, Si, Au, and Au / Pt can be mentioned.
  • Such a translucent layer 5 can also be provided by vapor deposition, and the thickness of the translucent metal thin film constituting the translucent layer 5 is preferably 2 O A or more and 500 A or less. Also in this case, it is preferable that the thickness of the transparent layer 3 be 400 A or more and 500 A or less. Further, the thickness of the reflection layer 4 is preferably 500 A or more.
  • the light R incident from the front side is reflected on the surface of the translucent layer 5, the surface of the transparent layer 3, and the reflective layer.
  • the reflected light, R 2 , and R 3 are generated on the surface of No. 4 (the back surface of the transparent layer 3), and the reflected light R, and R 2 and R 3 interfere to produce an interference color.
  • the light interference thin film may be formed by a two-layer structure in which the transparent layer 3 and the translucent layer 5 are sequentially laminated from the substrate 1 side.
  • a substrate 1 by interference between mainly the reflected light R 2 and R 3, it is developed.
  • a protective film is coated on the surface of the optical interference thin film as necessary. It may be provided by a ring or the like. It is preferable that the protective film is substantially completely transparent so as not to impair the light incident on the light interference thin film and the color of the interference color from the light interference thin film. However, it may be colored.
  • FIG. 5 shows, for example, the light interference thin film of the embodiment shown in FIG. 3 provided on a base material 1 of a fiber product, and shows the surface in an enlarged manner.
  • the interference color by the light interference thin film can be seen through the substrate from the side of the base of the substrate.
  • a silicone resin layer formed on a transparent or translucent material
  • the transparent resin A transparent layer consisting of a substantially transparent thin film capable of forming a color by the interference between the reflected light on the surface of the layer and the reflected light on the back of the layer of light generated through the conductive fiber cloth;
  • a transparent moth fabric having an interference color, provided with a reflector for reflecting light generated by transmitting through the transparent layer.
  • a transparent or translucent silicone-based resin layer 15 containing silicon dioxide is provided on a transparent moth fabric 11, and a transparent layer 12 and a reflective layer 13 are provided thereon. Are sequentially provided. As shown in FIG. 7, a translucent layer 14 may be further provided between the silicone resin layer 15 and the transparent layer 12.
  • the interference base 1 1 RH reflected light R which Deki transmitted through the (transparent fiber cloth) and R 1 2, or reflected light R u, is R 1 2 and R 1 3 together
  • the interference color can be seen from the back side of the substrate 11.
  • Polyester filament yarn (vertical 50 denier x 18 filament, approximately round cross section fiber and horizontal 75 denier x 36 filament, approximately round cross section fiber) is plain woven (vertical 110 denier)
  • silicone was applied by a dipping method, followed by heat treatment at 160 to form a silicone resin.
  • low-temperature plasma treatment is applied, and A1 is coated on one side of the woven fabric to a thickness of 800 A.
  • a metal thin film was deposited by an induction heating vacuum deposition method.
  • the silicone resin used was methylhydridoenepolysiloxane emulsion, and a zinc-based catalyst was used.
  • the processing conditions by the dip method and the conditions of the plasma processing are as follows.
  • Example 1 the A1 vapor-deposited thin film was found to have enhanced adhesion to textiles against friction and bending.
  • the plasma treatment after the application of the silicone resin improved the washing resistance from 2 ⁇ to 5 ⁇ and the abrasion resistance from 1 ⁇ to 3 ⁇ .
  • the test conditions at this time are as follows.
  • Example 2 the surface of the silicon-based resin layer before and after the low-temperature plasma treatment was analyzed by X-ray photoelectron spectroscopy, and the atomic ratio of carbon atoms to gayon atoms and Si and S in silicon were determined. the ratio of the S i of i 0 2 shown in Table 2. The results showed that low-temperature plasma treatment significantly increased silicon dioxide in the silicone resin. It is thought that the silicon dioxide generated by this plasma treatment greatly contributes to the improvement of the adhesive strength.
  • X-ray photon spectroscopy is the measurement of the intensity of photons excited by X-rays radiated onto the sample surface and emitted from the surface as a function of kinetic energy, and then the photon spectrum is measured. What you get. It can be used for elemental analysis of substances, and also for composition analysis of substances based on the peak intensity ratio of core photoelectrons. In addition, since the binding energy value of the core photoelectron changes depending on the chemical bonding state even for the same element, state analysis can also be performed.
  • the analysis conditions of the X-ray photoelectron spectroscopy in this example are as follows.
  • High shrinkage polyester filament yarn 50 denier x 24 filaments, approximately round cross-section fiber, boiling water shrinkage about 20%
  • low shrinkage polyester filament yarn 50 denier x 48 filament, approximately triangular
  • the cross-section fiber and the boiling water shrinkage rate are about 7%
  • Book / inch, Thread about 100 books / inch
  • organization 2 pieces
  • a silicone resin was applied by a dipping method, and dried and cured.
  • plasma treatment from above a light interference thin film having a three-layer structure as shown in FIG. 3 was vapor-deposited on one surface of the yarn fabric with mixed yarn length by an induction heating vacuum vapor deposition method.
  • the processing conditions of the silicone resin by the dipping method and the plasma processing conditions are the same as those in Example 1.
  • the reflective layer is composed of A 1 and has a thickness of 800 A
  • the transparent layer is composed of S i 0 and has a thickness of 800 A, 100 A and 1200 persons, respectively.
  • the translucent layer was made of Cr and the thickness was 3 OA. After evaporation of the reflective layer, the transparent layer, and the translucent layer, a heat treatment was performed at 170 ° C. for 2 minutes, and a polydimethylpolysiloxane-based silicone was further coated thereon as a protective film. . C, heat-treated for 2 minutes.
  • the transparent layer having a thickness of 800 A has a deep color mainly composed of blue without falling off of both the intermediate layer and the upper layer.
  • a deep color mainly composed of green is obtained, and a color with a thickness of 1200 A is obtained with a depth of mainly yellow, and a color with a thickness of 150 A is colored red.
  • a deep color that was mainly used was obtained.
  • Example 2 by applying a plasma treatment after applying the silicone resin, the washing resistance was improved from grade 3 to grade 5 and the abrasion resistance from grade 2 to grade 4 was improved.
  • the test conditions at this time are as follows.
  • the resulting mixed yarn fabric with different yarn lengths has a complicated color change depending on the viewing angle, and the unevenness of the surface due to the mixed yarn length difference arrowhead yarn has a more three-dimensional appearance and a sense of confusion. High-quality colors with complex changes in color were obtained.
  • the presence of silicon dioxide, particularly silicon dioxide generated by the plasma treatment, in the intermediate results in an extremely high level between the substrate and the vapor deposition thin film. Adhesive strength can be obtained, and a vapor-deposited thin film is difficult to obtain, and a fiber product or a sheet-like material having excellent washing resistance and abrasion resistance can be obtained.
  • the vapor-deposited product of the present invention since the vapor-deposited thin film is adhered with an extremely high adhesive force, has high washing resistance and abrasion resistance, and is particularly useful for a textile product for forming a vapor-deposited thin film which is repeatedly washed and used repeatedly. It can be suitably applied to a sheet-like material.

Landscapes

  • Engineering & Computer Science (AREA)
  • Textile Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Laminated Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)

Abstract

Produit de dépôt en phase vapeur comprenant une couche mince déposée en phase vapeur sur la surface d'un substrat organique par un agent intermédiaire comprenant au minimum de la résine silicone et du dioxide de silicium. L'invention porte également sur le procédé de réalisation de ce produit par dépôt en phase vapeur, selon lequel le dioxide de silicium est élaboré par traitement au plasma. Selon ce procédé, la couche mince déposée en phase vapeur a une force d'adhésion nettement améliorée et présente ainsi une excellente résistance au lavage et à l'abrasion.
PCT/JP1994/001379 1993-02-23 1994-08-22 Produit de depot en phase vapeur et son procede de production WO1996006216A1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
JP05972393A JP3232751B2 (ja) 1993-02-23 1993-02-23 蒸着製品の製造方法
EP94924397A EP0731206B1 (fr) 1994-08-22 1994-08-22 Produit de depot en phase vapeur et son procede de production
US08/633,807 US5744405A (en) 1994-08-22 1994-08-22 Product of vapor deposition and method of manufacturing same
DE69427766T DE69427766T2 (de) 1994-08-22 1994-08-22 Produkt hergestellt durch chemische dampfphasenabscheidung und verfahren zu seiner herstellung
KR1019960702047A KR100324085B1 (ko) 1994-08-22 1994-08-22 증착제품및그제조방법
PCT/JP1994/001379 WO1996006216A1 (fr) 1993-02-23 1994-08-22 Produit de depot en phase vapeur et son procede de production

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP05972393A JP3232751B2 (ja) 1993-02-23 1993-02-23 蒸着製品の製造方法
PCT/JP1994/001379 WO1996006216A1 (fr) 1993-02-23 1994-08-22 Produit de depot en phase vapeur et son procede de production

Publications (1)

Publication Number Publication Date
WO1996006216A1 true WO1996006216A1 (fr) 1996-02-29

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP1994/001379 WO1996006216A1 (fr) 1993-02-23 1994-08-22 Produit de depot en phase vapeur et son procede de production

Country Status (1)

Country Link
WO (1) WO1996006216A1 (fr)

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61186569A (ja) * 1985-02-13 1986-08-20 東レ株式会社 金属光沢繊維製品の製造方法
JPH0382881A (ja) 1989-08-22 1991-04-08 Toray Ind Inc 干渉色を有する繊維布帛およびその製法
JPH04316677A (ja) * 1991-04-11 1992-11-09 Kuraray Co Ltd 繊維シート及びその製造方法
JPH05214514A (ja) * 1991-09-12 1993-08-24 Kanebo Ltd 優れた色彩異方効果を発現する繊維構造物又はフィルム
JPH05331765A (ja) * 1991-06-18 1993-12-14 Kanebo Ltd 濃色効果に優れた色彩異方繊維またはフィルム
JPH06146167A (ja) * 1992-11-02 1994-05-27 Toray Ind Inc 干渉色を有する透明性繊維布帛およびその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61186569A (ja) * 1985-02-13 1986-08-20 東レ株式会社 金属光沢繊維製品の製造方法
JPH0382881A (ja) 1989-08-22 1991-04-08 Toray Ind Inc 干渉色を有する繊維布帛およびその製法
JPH04316677A (ja) * 1991-04-11 1992-11-09 Kuraray Co Ltd 繊維シート及びその製造方法
JPH05331765A (ja) * 1991-06-18 1993-12-14 Kanebo Ltd 濃色効果に優れた色彩異方繊維またはフィルム
JPH05214514A (ja) * 1991-09-12 1993-08-24 Kanebo Ltd 優れた色彩異方効果を発現する繊維構造物又はフィルム
JPH06146167A (ja) * 1992-11-02 1994-05-27 Toray Ind Inc 干渉色を有する透明性繊維布帛およびその製造方法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See also references of EP0731206A4 *

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