WO1995008766A1 - Immersion testing porous semiconductor processing components - Google Patents
Immersion testing porous semiconductor processing components Download PDFInfo
- Publication number
- WO1995008766A1 WO1995008766A1 PCT/US1994/007792 US9407792W WO9508766A1 WO 1995008766 A1 WO1995008766 A1 WO 1995008766A1 US 9407792 W US9407792 W US 9407792W WO 9508766 A1 WO9508766 A1 WO 9508766A1
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- component
- processing surface
- cover
- processing
- front face
- Prior art date
Links
- 238000012545 processing Methods 0.000 title claims abstract description 37
- 238000007654 immersion Methods 0.000 title claims abstract description 23
- 238000012360 testing method Methods 0.000 title claims abstract description 15
- 239000004065 semiconductor Substances 0.000 title abstract description 9
- 238000000034 method Methods 0.000 claims description 18
- 238000005477 sputtering target Methods 0.000 claims description 4
- 238000012876 topography Methods 0.000 claims description 2
- 238000007789 sealing Methods 0.000 claims 5
- 230000002093 peripheral effect Effects 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 238000004519 manufacturing process Methods 0.000 description 8
- 239000000463 material Substances 0.000 description 6
- 235000012431 wafers Nutrition 0.000 description 5
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
- 239000012530 fluid Substances 0.000 description 4
- 230000007547 defect Effects 0.000 description 3
- 239000011148 porous material Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- 229910052721 tungsten Inorganic materials 0.000 description 3
- 239000010937 tungsten Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 229910000831 Steel Inorganic materials 0.000 description 2
- 229910052771 Terbium Inorganic materials 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 239000010941 cobalt Substances 0.000 description 2
- 229910017052 cobalt Inorganic materials 0.000 description 2
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229920001971 elastomer Polymers 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000007689 inspection Methods 0.000 description 2
- 229910052742 iron Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 239000010959 steel Substances 0.000 description 2
- GZCRRIHWUXGPOV-UHFFFAOYSA-N terbium atom Chemical compound [Tb] GZCRRIHWUXGPOV-UHFFFAOYSA-N 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000002604 ultrasonography Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 229920002449 FKM Polymers 0.000 description 1
- 239000004809 Teflon Substances 0.000 description 1
- 229920006362 Teflon® Polymers 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- HJUFTIJOISQSKQ-UHFFFAOYSA-N fenoxycarb Chemical compound C1=CC(OCCNC(=O)OCC)=CC=C1OC1=CC=CC=C1 HJUFTIJOISQSKQ-UHFFFAOYSA-N 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000011022 operating instruction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 238000002601 radiography Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/22—Details, e.g. general constructional or apparatus details
- G01N29/26—Arrangements for orientation or scanning by relative movement of the head and the sensor
- G01N29/265—Arrangements for orientation or scanning by relative movement of the head and the sensor by moving the sensor relative to a stationary material
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N29/00—Investigating or analysing materials by the use of ultrasonic, sonic or infrasonic waves; Visualisation of the interior of objects by transmitting ultrasonic or sonic waves through the object
- G01N29/22—Details, e.g. general constructional or apparatus details
- G01N29/223—Supports, positioning or alignment in fixed situation
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/04—Wave modes and trajectories
- G01N2291/044—Internal reflections (echoes), e.g. on walls or defects
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/10—Number of transducers
- G01N2291/101—Number of transducers one transducer
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2291/00—Indexing codes associated with group G01N29/00
- G01N2291/26—Scanned objects
- G01N2291/263—Surfaces
- G01N2291/2632—Surfaces flat
Definitions
- the invention relates to testing of semiconductor fabrication components.
- High-precision manufacturing components are often tested for defects by manufacturers and consumers. Testing is most necessary where raw materials are expensive. Thus, for example, components used in semiconductor processing are frequently tested because the raw materials used in semiconductor manufacturing (new and partially processed wafers) are expensive.
- One technique is x-ray radiography; in this technique the component is placed between an x-ray source and a sheet of photographic paper. The resulting image on the photographic paper can be used to detect voids in the manufactured component.
- a difficulty with this technique is that it does not detect other types of flaws in the component, e.g. , cracks and other mechanical flaws in welds.
- Another difficulty with this technique is that it requires elaborate physical manipulation of the component and photographic paper to obtain a useful image, and therefore is difficult to implement as an automated operation on a production line.
- a second testing technique is ultrasound testing; in this technique an ultrasonic transducer which generates ultrasonic energy is coupled to the component; ultrasonic energy reflected within the component is received by the transducer.
- a 2- or 3- dimensional CRT image of the internal structure of the component can be generated by moving the transducer into various locations across the surface of the component. The resulting image can be used to evaluate the strength of welds or other bonds in the component as well as locate voids or other imperfections.
- Ultrasound testing requires acoustic coupling between the ultrasonic transducer and the object under test.
- contact UT the transducer is firmly pressed against the object under test as the transducer travels across the surface of the component.
- a difficulty with this technique is that a relatively sophisticated control procedure must be used to maintain tight contact between the component and the transducer as the transducer follows the surface of the component. This can make it difficult to implement contact UT as an automated operation on a component production line.
- Immersion UT avoids this difficulty by immersing the component under test in a tank of liquid (typically, water) . Ultrasonic energy can then be coupled into the component without making physical contact between the component and the ultrasonic transducer. Because immersion UT does not involve elaborate or precise physical manipulation of the component, it is relatively easier to implement as an automated operation on a component production line.
- liquid typically, water
- a difficulty with immersion UT is that the immersion liquid may react with and contaminate the surface of the immersed component, particularly where the component is manufactured of a "porous" material (e.g.. Tungsten, Titanium, Iron, Terbium, Cobalt, Copper) .
- a "porous" material e.g.. Tungsten, Titanium, Iron, Terbium, Cobalt, Copper
- Semiconductor manufacturing components such as sputtering targets are often made of such porous materials and therefore cannot be tested using immersion UT.
- the invention features a method and apparatus for protecting a processing surface of a manufactured semiconductor component to permit immersion ultrasonic testing of the component.
- a cover plate is engaged to the component and sealed over the processing surface of the component, forming an acoustically reflective volume between the cover and the processing surface. Ultrasonic energy impinging on the component is reflected from this volume, collected, and used to generate an ultrasonic image of the component.
- the component is a sputtering target and the reflective volume is an air gap between the target and cover.
- the target and cover are typically disk-shaped, the target having a substantially concave processing surface and the cover having a substantially flat surface.
- the cover is engaged to the target by C-shaped clamps.
- Fig. l is a cross-sectional view of a cover 10 clamped to a target 12 of porous material by clamps 18 to permit immersion UT by transducer 22; ⁇
- Fig. 2 is a detail view of cover 10 of Fig. 1;
- Fig. 3A is a detail view of clamp 18 of Fig ⁇ 1;
- Fig. 3B is a detail of section 32 of clamp 18 of Fig. 3A;
- Fig. 3C is a detail of clamp screw 42 of Fig. 1;
- Fig. 4 is a print-out of an immersion UT scan performed with the apparatus of Fig. 1. Detailed Description of the Invention
- a cover 10 in accordance with the invention is sized to fight tightly over a processing surface of a processing component to be protected during immersion UT.
- the processing component is a target 12 for use .in a sputtering chamber (specifically, a target marketed by Materials Research Corporation of Orangeburg, New York under the trademark "RMX10", designed for use in processing chambers marketed by Materials Research Corporation under the trademark "ECLIPSE”).
- Target 12 comprises a metal backplate 14 laminated to a front section 16 of porous material (e.g.. Tungsten, Titanium, Iron, Terbium, Cobalt,
- front section 16 is placed in proximity to a wafer within a plasma processing chamber. Material is sputtered from front section 16 and deposits on the wafer, creating circuit elements on the wafer.
- Cover 10 is clamped to target 12 by clamps 18.
- cover 10 and target 12 are circular in shape, and four clamps 18 are arranged in approximately equal spacing around the perimeter of the target and cover to maintain tight contact (see, e.g.. Fig. 4) .
- An O-ring 20 placed between the cover 10 and target 12 forms a watertight seal, protecting the front section 16 from exposure to immersion fluid during im ersion UT.
- O-Ring 20 is preferably manufactured of rubber, such as rubber manufactured by E.I. duPont de Nemours & Co., Inc. of Wilmington, Delaware and sold under the trade name "VITON".
- An air cavity 22 is formed between the front section 16 of the target and the cover 10.
- the front section 16 of target 12 has a concave curved surface
- cover 10 has a flat surface, resulting in an air cavity 22 which is thickest near to the center of the target, and thinner near to the edges of the target.
- the surface topographies of the component and cover are not critical to proper operation, so long as there is a cavity between the component and the cover when the cover is seated on the component, or another element serving as an acoustic reflector as described below.
- Fig. 1 also illustrates a transducer unit 22 used for immersion UT positioned over the target/cover assembly.
- transducer unit 22 is ultrasonic flaw/thickness scope sold under the trade name "FTS MARK IV" by Staveley NDT Technologies - Sonic Systems of Trenton, New Jersey, and is installed in an immersion tank manufactured by Automation/Sperry (a unit of QualCorp) of Chatsworth, California.
- Transducer 22 emits ultrasonic waves (e.g., 10 MHz waves), illustrated by ray 24, in the direction of the target/cover assembly. Ultrasonic waves emitted by transducer 22 are carried by the immersion fluid and into the backplate 14 of the target. The waves are then carried through the target.
- ultrasonic waves e.g. 10 MHz waves
- Material imperfections, voids, cracks, or any other interfaces within the target will reflect a portion of the ultrasonic wave energy entering the target. At the same time, at least a portion of the energy will carry fully through the target, and reach the boundary between the target front section 16 and cavity 22.
- the acoustic impedance of cavity 22 is substantially higher than that of the immersion fluid or target 12; as a result, ultrasonic wave energy reaching cavity 22 is nearly completely reflected back into the target. At least some of the wave energy from each of these reflections reflects in the direction illustrated by ray 26. These reflected waves travel , back through the target 12, through the immersion fluid and into transducer 22.
- the magnitude and timing of the reflected waves are then processed to generate a two-dimensional image of the target, showing imperfections and material interfaces. Also, by scanning transducer 22 over the target, two-dimensional data gathered at different locations can be combined to produce a cross-sectional image of the target (see Fig. 4) .
- Fig. 2 illustrates cover 10 with greater detail, including relevant dimensions.
- Cover 10 may be manufactured from a single sheet of Teflon (e.g., sold in 12 inch by 12 inch by 1.5 inch sections by U.S. Plastics of Lima, Ohio as stock number 47494) , by turning the sheet on a lathe to form a solid cylinder (e.g., 11.060 inches in diameter and 1.42 inches thick) , and then removing a cylindrical center section 28 (e.g., .92 inches deep and 10.020 inches in diameter) . The resulting cover will fit snugly over the above-described target, leaving a cavity 22 to permit immersion UT imaging.
- Teflon e.g., sold in 12 inch by 12 inch by 1.5 inch sections by U.S. Plastics of Lima, Ohio as stock number 47494
- a solid cylinder e.g., 11.060 inches in diameter and 1.42 inches thick
- a cylindrical center section 28 e.g., .92 inches deep and 10.020 inches
- FIG. 3A illustrates the construction of clamp
- Section 32 is 1.080 inches long; section 34 is 3.125 inches long; section 36 is 2.200 inches long.
- the sections are held together by .100 inch gas tungsten arc welds 38 and 39, formed using .062 inch filler at 300 Amps and 4.3% gas flow at 8 P.S.I..
- Section 32 includes a threaded bore 40 which is tapped to accept a .25 inch - 20 bolt which serves as a clamp screw (see below) . As shown in Fig. 3B, the center of bore 40 is .300 inch away from the joint 38 between section 32 and section 34, thus providing sufficient clearance for a clamp screw.
- clamp screw 42 The details of clamp screw 42 are visible in Fig. 3C.
- a 1.375 inch long, .25 inch - 20 hexagonal head bolt 44 is threaded through bore 40.
- a .25 inch - 20 acorn nut 46 is screwed onto the end of bolt 44.
- nut 46 is prepared by removing the hexagonal nut surfaces from a standard acorn nut (e.g., with a belt sander) , leaving a nut 46 a smooth dome- shaped outer surface.
- the rounded surface of acorn nut 46 seats into existing bolt holes in the above-described target, thus achieving good clamping contact while minimizing damage to the backplate 14.
- Fig. 4 illustrates the clear cross-sectional imaging possible with the immersion UT arrangement shown in Fig. 1.
- Transducer 22 was set to scan the target/cover assembly at .030 inch increments. Defects -lo ⁇ in the target 12 will appear as white areas, and can be quickly located (there are no defects illustrated in Fig. 4) .
- immersion UT can be easily automated, components can be 100% tested at manufacturing facilities, and images such as Fig. 4 enclosed with the component packaging for customer assurance of quality.
Landscapes
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Investigating Or Analyzing Materials By The Use Of Ultrasonic Waves (AREA)
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU73599/94A AU7359994A (en) | 1993-09-21 | 1994-07-11 | Immersion testing porous semiconductor processing components |
JP50974495A JP3231329B2 (ja) | 1993-09-21 | 1994-07-11 | 多孔性半導体処理コンポネントの浸漬試験 |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US08/124,332 | 1993-09-21 | ||
US08/124,332 US6085591A (en) | 1993-09-21 | 1993-09-21 | Immersion testing porous semiconductor processing components |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1995008766A1 true WO1995008766A1 (en) | 1995-03-30 |
WO1995008766A9 WO1995008766A9 (en) | 1995-05-26 |
Family
ID=22414250
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/US1994/007792 WO1995008766A1 (en) | 1993-09-21 | 1994-07-11 | Immersion testing porous semiconductor processing components |
Country Status (5)
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6591680B2 (en) * | 2001-06-15 | 2003-07-15 | General Electric Company | System and method for ultrasonic immersion inspection of components |
US7181969B2 (en) * | 2002-07-16 | 2007-02-27 | Sonix, Inc. | Ultrasonic test chamber for tray production system and the like |
US7131333B2 (en) * | 2002-07-16 | 2006-11-07 | Sonix, Inc. | Pulse echo ultrasonic test chamber for tray production system |
US7013732B2 (en) * | 2003-02-19 | 2006-03-21 | Sonix, Inc. | Method and apparatus for temperature-controlled ultrasonic inspection |
US7661315B2 (en) * | 2004-05-24 | 2010-02-16 | Sonix, Inc. | Method and apparatus for ultrasonic scanning of a fabrication wafer |
US7249514B2 (en) * | 2004-11-30 | 2007-07-31 | The Boeing Company | Repositionable mask for ultrasonic inspection |
US7917317B2 (en) | 2006-07-07 | 2011-03-29 | Sonix, Inc. | Ultrasonic inspection using acoustic modeling |
WO2008097350A2 (en) * | 2006-08-22 | 2008-08-14 | Gregory Aberle | Top lock security holster |
US20080179360A1 (en) * | 2006-10-23 | 2008-07-31 | Lowe Michael V | Top lock security holster ii |
GB0807955D0 (en) * | 2008-05-01 | 2008-06-11 | Airbus Uk Ltd | Ultrasound inspection method and apparatus |
KR101975741B1 (ko) * | 2009-11-13 | 2019-05-09 | 가부시키가이샤 한도오따이 에네루기 켄큐쇼 | 타깃 재료의 포장 방법 및 타깃의 장착 방법 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3337842A1 (de) * | 1982-10-26 | 1984-04-26 | Storz Instrument Co., St. Louis, Mo. | Ultraschallsonde |
SU1104412A1 (ru) * | 1982-03-31 | 1984-07-23 | Институт Прикладной Физики Ан Бсср | Датчик контрол работы ванны дл ультразвуковой обработки изделий |
SU1693532A1 (ru) * | 1989-06-16 | 1991-11-23 | Всесоюзный Теплотехнический Научно-Исследовательский Институт Им.Ф.Э.Дзержинского | Способ ультразвукового контрол швов аустенитных сварных соединений |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
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US3929006A (en) * | 1973-11-26 | 1975-12-30 | Western Electric Co | Measuring article thickness ultrasonically |
US4059098A (en) * | 1975-07-21 | 1977-11-22 | Stanford Research Institute | Flexible ultrasound coupling system |
DE2607485C3 (de) * | 1976-02-20 | 1978-09-28 | Mannesmann Ag, 4000 Duesseldorf | Verfahren zum Einstellen von Einschallwinkeln bei der US-Prüfung von Rohren, Bändern und gebogenen Blechen |
US4158308A (en) * | 1977-09-22 | 1979-06-19 | Automation Industries, Inc. | Time-variable bandwidth ultrasonic testing apparatus |
US4252022A (en) * | 1978-11-17 | 1981-02-24 | Westinghouse Electric Corp. | Detection, characterization and studying of flaws in work by acoustic imaging |
JPS60249944A (ja) * | 1984-05-28 | 1985-12-10 | 株式会社日立メディコ | 超音波探触子 |
JPH02193065A (ja) * | 1989-01-20 | 1990-07-30 | Canon Inc | 超音波装置 |
US5123281A (en) * | 1990-04-20 | 1992-06-23 | General Dynamics Corporation | Ultrasonic testing device |
US5406849A (en) * | 1992-07-31 | 1995-04-18 | The United States Of America, As Represented By The Secretary Of Commerce | Method and apparatus for detecting guided leaky waves in acoustic microscopy |
US5406850A (en) * | 1993-01-14 | 1995-04-18 | Tosoh Smd, Inc. | Method of non-destructively testing a sputtering target |
-
1993
- 1993-09-21 US US08/124,332 patent/US6085591A/en not_active Expired - Fee Related
-
1994
- 1994-07-11 AU AU73599/94A patent/AU7359994A/en not_active Abandoned
- 1994-07-11 JP JP50974495A patent/JP3231329B2/ja not_active Expired - Fee Related
- 1994-07-11 WO PCT/US1994/007792 patent/WO1995008766A1/en active Application Filing
- 1994-07-14 TW TW083106426A patent/TW252218B/zh active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SU1104412A1 (ru) * | 1982-03-31 | 1984-07-23 | Институт Прикладной Физики Ан Бсср | Датчик контрол работы ванны дл ультразвуковой обработки изделий |
DE3337842A1 (de) * | 1982-10-26 | 1984-04-26 | Storz Instrument Co., St. Louis, Mo. | Ultraschallsonde |
SU1693532A1 (ru) * | 1989-06-16 | 1991-11-23 | Всесоюзный Теплотехнический Научно-Исследовательский Институт Им.Ф.Э.Дзержинского | Способ ультразвукового контрол швов аустенитных сварных соединений |
Non-Patent Citations (2)
Title |
---|
DATABASE WPI Week 8509, Derwent World Patents Index; AN 85054626 * |
DATABASE WPI Week 9236, Derwent World Patents Index; AN 92298090 * |
Also Published As
Publication number | Publication date |
---|---|
TW252218B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1995-07-21 |
AU7359994A (en) | 1995-04-10 |
US6085591A (en) | 2000-07-11 |
JP3231329B2 (ja) | 2001-11-19 |
JPH09503055A (ja) | 1997-03-25 |
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