USD954986S1 - Electrode cover for a plasma processing device - Google Patents

Electrode cover for a plasma processing device Download PDF

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Publication number
USD954986S1
USD954986S1 US29/731,604 US202029731604F USD954986S US D954986 S1 USD954986 S1 US D954986S1 US 202029731604 F US202029731604 F US 202029731604F US D954986 S USD954986 S US D954986S
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United States
Prior art keywords
processing device
plasma processing
electrode cover
view
electrode
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Active
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US29/731,604
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English (en)
Inventor
Shintarou Nakatani
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
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Hitachi High Tech Corp
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Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NAKATANI, SHINTAROU
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US29/731,604 2019-10-18 2020-04-16 Electrode cover for a plasma processing device Active USD954986S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2019-23330F JP1659287S (enrdf_load_stackoverflow) 2019-10-18 2019-10-18
JP2019-023330 2019-10-18

Publications (1)

Publication Number Publication Date
USD954986S1 true USD954986S1 (en) 2022-06-14

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US29/731,604 Active USD954986S1 (en) 2019-10-18 2020-04-16 Electrode cover for a plasma processing device

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US (1) USD954986S1 (enrdf_load_stackoverflow)
JP (1) JP1659287S (enrdf_load_stackoverflow)
TW (1) TWD210379S (enrdf_load_stackoverflow)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11996315B2 (en) 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1061905S1 (en) * 2023-05-17 2025-02-11 Shenzhen Fengyu Trading Co., Ltd. Protective cover for biosensor
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1071887S1 (en) * 2023-01-31 2025-04-22 Valqua, Ltd. Composite seal for semiconductor manufacturing device

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP1704964S (ja) 2021-04-19 2022-01-14 プラズマ処理装置用サセプタリング

Citations (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4579354A (en) * 1984-12-05 1986-04-01 Vassallo Research And Development Corporation Gasket
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD803917S1 (en) * 2015-06-16 2017-11-28 Hitachi Kokusai Electric, Inc. Heat reflector for substrate processing apparatus
USD804556S1 (en) * 2015-06-16 2017-12-05 Hitachi Kokusai Electric Inc. Heat reflector for substrate processing apparatus
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
JP1598998S (enrdf_load_stackoverflow) 2017-08-31 2018-03-05
USD827592S1 (en) * 2017-01-31 2018-09-04 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD830435S1 (en) * 2015-12-28 2018-10-09 Ntn Corporation Inner ring for tapered roller bearing
USD840364S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD868995S1 (en) * 2017-11-06 2019-12-03 Hitachi High-Technologies Corporation Gas diffusion plate for a plasma processing apparatus
USD871608S1 (en) * 2017-07-31 2019-12-31 Hitachi High-Technologies Corporation Gas ring for a plasma processing apparatus
USD871609S1 (en) * 2017-08-31 2019-12-31 Hitachi High-Technologies Corporation Electrode plate peripheral ring for a plasma processing apparatus
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD917026S1 (en) * 2019-09-12 2021-04-20 S & B Technical Products, Inc. Pipe sealing gasket
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber

Patent Citations (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4579354A (en) * 1984-12-05 1986-04-01 Vassallo Research And Development Corporation Gasket
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD770992S1 (en) * 2015-06-12 2016-11-08 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD803917S1 (en) * 2015-06-16 2017-11-28 Hitachi Kokusai Electric, Inc. Heat reflector for substrate processing apparatus
USD804556S1 (en) * 2015-06-16 2017-12-05 Hitachi Kokusai Electric Inc. Heat reflector for substrate processing apparatus
USD830435S1 (en) * 2015-12-28 2018-10-09 Ntn Corporation Inner ring for tapered roller bearing
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD827592S1 (en) * 2017-01-31 2018-09-04 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD840364S1 (en) * 2017-01-31 2019-02-12 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD871608S1 (en) * 2017-07-31 2019-12-31 Hitachi High-Technologies Corporation Gas ring for a plasma processing apparatus
JP1598998S (enrdf_load_stackoverflow) 2017-08-31 2018-03-05
USD868993S1 (en) * 2017-08-31 2019-12-03 Hitachi High-Technologies Corporation Electrode plate for a plasma processing apparatus
USD870314S1 (en) * 2017-08-31 2019-12-17 Hitachi High-Technologies Corporation Electrode cover for a plasma processing apparatus
USD871609S1 (en) * 2017-08-31 2019-12-31 Hitachi High-Technologies Corporation Electrode plate peripheral ring for a plasma processing apparatus
USD868995S1 (en) * 2017-11-06 2019-12-03 Hitachi High-Technologies Corporation Gas diffusion plate for a plasma processing apparatus
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD933725S1 (en) * 2019-02-08 2021-10-19 Applied Materials, Inc. Deposition ring for a substrate processing chamber
USD917026S1 (en) * 2019-09-12 2021-04-20 S & B Technical Products, Inc. Pipe sealing gasket

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
4″ Storz Pressure Gasket. Online, published date unknown. Retrieved on Feb. 20, 2022 from URL: https://www.firehosedirect.com/4-storz-pressure-gasket. *

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11996315B2 (en) 2020-11-18 2024-05-28 Applied Materials, Inc. Thin substrate handling via edge clamping
USD1038049S1 (en) * 2020-11-18 2024-08-06 Applied Materials, Inc. Cover ring for use in semiconductor processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1042374S1 (en) * 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1049067S1 (en) * 2022-04-04 2024-10-29 Applied Materials, Inc. Ring for an anti-rotation process kit for a substrate processing chamber
USD1066275S1 (en) 2022-04-04 2025-03-11 Applied Materials, Inc. Baffle for anti-rotation process kit for substrate processing chamber
USD1071887S1 (en) * 2023-01-31 2025-04-22 Valqua, Ltd. Composite seal for semiconductor manufacturing device
USD1061905S1 (en) * 2023-05-17 2025-02-11 Shenzhen Fengyu Trading Co., Ltd. Protective cover for biosensor

Also Published As

Publication number Publication date
JP1659287S (enrdf_load_stackoverflow) 2020-05-11
TWD210379S (zh) 2021-03-11

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