USD871608S1 - Gas ring for a plasma processing apparatus - Google Patents

Gas ring for a plasma processing apparatus Download PDF

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Publication number
USD871608S1
USD871608S1 US29/635,289 US201829635289F USD871608S US D871608 S1 USD871608 S1 US D871608S1 US 201829635289 F US201829635289 F US 201829635289F US D871608 S USD871608 S US D871608S
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Prior art keywords
processing apparatus
plasma processing
gas ring
view
ring
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US29/635,289
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English (en)
Inventor
Kouji Okuda
Motohiro Tanaka
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Hitachi High Tech Corp
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Hitachi High Technologies Corp
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Assigned to HITACHI HIGH-TECHNOLOGIES CORPORATION reassignment HITACHI HIGH-TECHNOLOGIES CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: OKUDA, KOUJI, TANAKA, MOTOHIRO
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Publication of USD871608S1 publication Critical patent/USD871608S1/en
Assigned to HITACHI HIGH-TECH CORPORATION reassignment HITACHI HIGH-TECH CORPORATION CHANGE OF NAME AND ADDRESS Assignors: HITACHI HIGH-TECHNOLOGIES CORPORATION
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US29/635,289 2017-07-31 2018-01-30 Gas ring for a plasma processing apparatus Active USD871608S1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JPD2017-16497F JP1598984S (enrdf_load_stackoverflow) 2017-07-31 2017-07-31
JP2017-016497 2017-07-31

Publications (1)

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USD871608S1 true USD871608S1 (en) 2019-12-31

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US29/635,289 Active USD871608S1 (en) 2017-07-31 2018-01-30 Gas ring for a plasma processing apparatus

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US (1) USD871608S1 (enrdf_load_stackoverflow)
JP (1) JP1598984S (enrdf_load_stackoverflow)
TW (1) TWD193438S (enrdf_load_stackoverflow)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD889335S1 (en) * 2018-10-03 2020-07-07 Vaughn C Jewell Disc
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD891923S1 (en) * 2017-11-12 2020-08-04 Yun Lin Container lid
USD917825S1 (en) * 2019-07-16 2021-04-27 Entegris, Inc. Wafer support ring
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD974910S1 (en) * 2020-02-04 2023-01-10 Wilson Sporting Goods Co. Tennis ball container overcap
USD1042374S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) * 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1062662S1 (en) * 2023-03-30 2025-02-18 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1063595S1 (en) * 2023-03-30 2025-02-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
US12293902B2 (en) 2018-01-19 2025-05-06 Applied Materials, Inc. Process kit for a substrate support
USD1079661S1 (en) * 2023-08-31 2025-06-17 Kokusai Electric Corporation Susceptor of semiconductor manufacturing apparatus

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IL318184A (en) 2022-07-08 2025-03-01 Tosoh Smd Inc Dynamic vacuum sealing system for physical vapor deposition applications

Citations (25)

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US5174775A (en) * 1991-10-23 1992-12-29 Amp Incorporated RF convertor and switch
US5486975A (en) * 1994-01-31 1996-01-23 Applied Materials, Inc. Corrosion resistant electrostatic chuck
USD447223S1 (en) * 1998-11-06 2001-08-28 Lindab Ab Sealing rings for ventilation ducts
USD465061S1 (en) * 2000-09-15 2002-10-29 Spa Electrics Pty. Ltd. Sealing ring
US20040004327A1 (en) * 2002-07-03 2004-01-08 Veiga Jose Carlos C. Gasket seal for flanges of piping and equipment, a method for manufacturing gasket seals, and a sealing ring for a gasket seal
USD494552S1 (en) * 2002-12-12 2004-08-17 Tokyo Electron Limited Exhaust ring for manufacturing semiconductors
USD515675S1 (en) * 2001-12-27 2006-02-21 Flow International Corporation Element for a superpressure static fluid seal
US20070050901A1 (en) * 2005-05-17 2007-03-08 Den-Lu Hung Sealing ring structure of a sinkhole
USD574934S1 (en) * 2007-07-17 2008-08-12 S & B Technical Products, Inc. Pipe gasket
USD631142S1 (en) * 2009-02-11 2011-01-18 Kmt Waterjet Systems Inc. Inner packing element for a high pressure seal
US7885530B1 (en) * 2008-07-23 2011-02-08 Irving E. Bushnell, III Manual focus driving ring
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD655401S1 (en) * 2009-08-10 2012-03-06 Nippon Valqua Industries, Ltd. Hybrid seal member
USD659175S1 (en) * 2010-08-17 2012-05-08 Ebara Corporation Sealing ring
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD672050S1 (en) * 2012-01-13 2012-12-04 Samsung Electronics Co., Ltd. Disk for a medical testing machine
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
US20140090554A1 (en) * 2012-09-28 2014-04-03 Air Products And Chemicals, Inc. Wear-Compensating Sealing Ring Assembly
USD730734S1 (en) * 2013-07-10 2015-06-02 Gino Rapparini Reinforcement ring for beverage capsule
USD743513S1 (en) * 2014-06-13 2015-11-17 Asm Ip Holding B.V. Seal ring
JP1545406S (enrdf_load_stackoverflow) 2015-06-16 2016-03-14
USD793572S1 (en) * 2015-06-10 2017-08-01 Tokyo Electron Limited Electrode plate for plasma processing apparatus
USD793976S1 (en) * 2013-05-15 2017-08-08 Ebara Corporation Substrate retaining ring
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition
USD811226S1 (en) * 2013-10-31 2018-02-27 Clariant Production (France) Sas Container

Patent Citations (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5174775A (en) * 1991-10-23 1992-12-29 Amp Incorporated RF convertor and switch
US5486975A (en) * 1994-01-31 1996-01-23 Applied Materials, Inc. Corrosion resistant electrostatic chuck
USD447223S1 (en) * 1998-11-06 2001-08-28 Lindab Ab Sealing rings for ventilation ducts
USD465061S1 (en) * 2000-09-15 2002-10-29 Spa Electrics Pty. Ltd. Sealing ring
USD515675S1 (en) * 2001-12-27 2006-02-21 Flow International Corporation Element for a superpressure static fluid seal
US20040004327A1 (en) * 2002-07-03 2004-01-08 Veiga Jose Carlos C. Gasket seal for flanges of piping and equipment, a method for manufacturing gasket seals, and a sealing ring for a gasket seal
USD494552S1 (en) * 2002-12-12 2004-08-17 Tokyo Electron Limited Exhaust ring for manufacturing semiconductors
US20070050901A1 (en) * 2005-05-17 2007-03-08 Den-Lu Hung Sealing ring structure of a sinkhole
USD574934S1 (en) * 2007-07-17 2008-08-12 S & B Technical Products, Inc. Pipe gasket
US7885530B1 (en) * 2008-07-23 2011-02-08 Irving E. Bushnell, III Manual focus driving ring
USD631142S1 (en) * 2009-02-11 2011-01-18 Kmt Waterjet Systems Inc. Inner packing element for a high pressure seal
USD655401S1 (en) * 2009-08-10 2012-03-06 Nippon Valqua Industries, Ltd. Hybrid seal member
USD667561S1 (en) * 2009-11-13 2012-09-18 3M Innovative Properties Company Sample processing disk cover
USD638550S1 (en) * 2009-11-13 2011-05-24 3M Innovative Properties Company Sample processing disk cover
USD659175S1 (en) * 2010-08-17 2012-05-08 Ebara Corporation Sealing ring
USD699200S1 (en) * 2011-09-30 2014-02-11 Tokyo Electron Limited Electrode member for a plasma processing apparatus
USD672050S1 (en) * 2012-01-13 2012-12-04 Samsung Electronics Co., Ltd. Disk for a medical testing machine
US20140090554A1 (en) * 2012-09-28 2014-04-03 Air Products And Chemicals, Inc. Wear-Compensating Sealing Ring Assembly
USD793976S1 (en) * 2013-05-15 2017-08-08 Ebara Corporation Substrate retaining ring
USD730734S1 (en) * 2013-07-10 2015-06-02 Gino Rapparini Reinforcement ring for beverage capsule
USD811226S1 (en) * 2013-10-31 2018-02-27 Clariant Production (France) Sas Container
USD743513S1 (en) * 2014-06-13 2015-11-17 Asm Ip Holding B.V. Seal ring
USD793572S1 (en) * 2015-06-10 2017-08-01 Tokyo Electron Limited Electrode plate for plasma processing apparatus
JP1545406S (enrdf_load_stackoverflow) 2015-06-16 2016-03-14
USD810705S1 (en) * 2016-04-01 2018-02-20 Veeco Instruments Inc. Self-centering wafer carrier for chemical vapor deposition

Non-Patent Citations (5)

* Cited by examiner, † Cited by third party
Title
Isozaki et al., Design U.S. Appl. No. 29/635,287, filed Jan. 30, 2018.
Isozaki et al., Design U.S. Appl. No. 29/635,292, filed Jan. 30, 2018.
Isozaki et al., Design U.S. Appl. No. 29/635,296, filed Jan. 30, 2018.
Metal Gaskets Manufacturer. Online, published date unknown. Retrieved on Apr. 27, 2019 from URL: https://www.jaydeepsteels.com/metal-gaskets/. *
S-SiC Mechanical Components. Online, published date unknown. Retrieved on Apr. 27, 2019 from URL: http://caecsic.com/S-SiC.html. *

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD891923S1 (en) * 2017-11-12 2020-08-04 Yun Lin Container lid
US12293902B2 (en) 2018-01-19 2025-05-06 Applied Materials, Inc. Process kit for a substrate support
USD889335S1 (en) * 2018-10-03 2020-07-07 Vaughn C Jewell Disc
USD891636S1 (en) * 2018-10-25 2020-07-28 Hitachi High-Tech Corporation Ring for a plasma processing apparatus
USD917825S1 (en) * 2019-07-16 2021-04-27 Entegris, Inc. Wafer support ring
USD954986S1 (en) * 2019-10-18 2022-06-14 Hitachi High-Tech Corporation Electrode cover for a plasma processing device
USD974910S1 (en) * 2020-02-04 2023-01-10 Wilson Sporting Goods Co. Tennis ball container overcap
USD1042374S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Support pipe for an interlocking process kit for a substrate processing chamber
USD1055006S1 (en) * 2022-03-18 2024-12-24 Applied Materials, Inc. Support ring for an interlocking process kit for a substrate processing chamber
USD1042373S1 (en) 2022-03-18 2024-09-17 Applied Materials, Inc. Sliding ring for an interlocking process kit for a substrate processing chamber
USD1062662S1 (en) * 2023-03-30 2025-02-18 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1063595S1 (en) * 2023-03-30 2025-02-25 Samsung Electronics Co., Ltd. CMP (chemical mechanical planarization) retaining ring
USD1079661S1 (en) * 2023-08-31 2025-06-17 Kokusai Electric Corporation Susceptor of semiconductor manufacturing apparatus

Also Published As

Publication number Publication date
JP1598984S (enrdf_load_stackoverflow) 2018-03-05
TWD193438S (zh) 2018-10-11

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