USD720707S1 - Reaction tube - Google Patents
Reaction tube Download PDFInfo
- Publication number
- USD720707S1 USD720707S1 US29/477,774 US201329477774F USD720707S US D720707 S1 USD720707 S1 US D720707S1 US 201329477774 F US201329477774 F US 201329477774F US D720707 S USD720707 S US D720707S
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- US
- United States
- Prior art keywords
- reaction tube
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- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Description
The broken lines shown in the drawings represent portions of the reaction tube that form no part of the claimed design.
Claims (1)
- We claim the ornamental design for a reaction tube, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2013014830 | 2013-06-28 | ||
| JP2013-014830 | 2013-06-28 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD720707S1 true USD720707S1 (en) | 2015-01-06 |
Family
ID=52117640
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/477,774 Active USD720707S1 (en) | 2013-06-28 | 2013-12-26 | Reaction tube |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD720707S1 (en) |
| TW (1) | TWD167985S (en) |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778458S1 (en) * | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en) * | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD843958S1 (en) * | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube |
| USD1003243S1 (en) * | 2021-06-28 | 2023-10-31 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
| USD1019583S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019581S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019582S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1051838S1 (en) * | 2020-03-12 | 2024-11-19 | Applied Materials, Inc. | Single-slot tubular cathode |
| USD1053156S1 (en) * | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1070797S1 (en) * | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
Citations (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD404368S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD407696S (en) * | 1997-08-20 | 1999-04-06 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| US20080090195A1 (en) * | 2006-10-13 | 2008-04-17 | Tokyo Electron Limited | Heat treatment apparatus |
| USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090194521A1 (en) * | 2008-01-31 | 2009-08-06 | Tokyo Electron Limited | Thermal processing furnace |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090250005A1 (en) * | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process |
| USD610559S1 (en) | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD655258S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD655262S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD655255S1 (en) * | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
| USD655682S1 (en) * | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
| USD661265S1 (en) * | 2010-05-19 | 2012-06-05 | Nippon Mektron, Ltd. | Flexible printed circuit board |
-
2013
- 2013-12-24 TW TW102308330F patent/TWD167985S/en unknown
- 2013-12-26 US US29/477,774 patent/USD720707S1/en active Active
Patent Citations (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD424024S (en) * | 1997-01-31 | 2000-05-02 | Tokyo Electron Limited | Quartz process tube |
| USD405429S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405430S (en) * | 1997-01-31 | 1999-02-09 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD417438S (en) * | 1997-01-31 | 1999-12-07 | Tokyo Electron Limited | Quartz outer tube |
| USD423463S (en) * | 1997-01-31 | 2000-04-25 | Tokyo Electron Limited | Quartz process tube |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD405431S (en) * | 1997-08-20 | 1999-02-09 | Tokyo Electron Ltd. | Tube for use in a semiconductor wafer heat processing apparatus |
| USD407696S (en) * | 1997-08-20 | 1999-04-06 | Tokyo Electron Limited | Inner tube for use in a semiconductor wafer heat processing apparatus |
| USD404368S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus |
| USD600659S1 (en) * | 2006-09-12 | 2009-09-22 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| USD586768S1 (en) * | 2006-10-12 | 2009-02-17 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20080090195A1 (en) * | 2006-10-13 | 2008-04-17 | Tokyo Electron Limited | Heat treatment apparatus |
| USD594488S1 (en) * | 2007-04-20 | 2009-06-16 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090194521A1 (en) * | 2008-01-31 | 2009-08-06 | Tokyo Electron Limited | Thermal processing furnace |
| USD611013S1 (en) * | 2008-03-28 | 2010-03-02 | Tokyo Electron Limited | Process tube for manufacturing semiconductor wafers |
| US20090250005A1 (en) * | 2008-04-03 | 2009-10-08 | Tokyo Electron Limited | Reaction tube and heat processing apparatus for a semiconductor process |
| USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD610559S1 (en) | 2008-05-30 | 2010-02-23 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD661265S1 (en) * | 2010-05-19 | 2012-06-05 | Nippon Mektron, Ltd. | Flexible printed circuit board |
| USD655255S1 (en) * | 2010-06-18 | 2012-03-06 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
| USD655682S1 (en) * | 2010-06-18 | 2012-03-13 | Hitachi Kokusai Electric Inc. | Boat of wafer processing apparatus |
| USD655258S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD655262S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
Cited By (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778458S1 (en) * | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en) * | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD843958S1 (en) * | 2017-08-10 | 2019-03-26 | Kokusai Electric Corporation | Reaction tube |
| USD1051838S1 (en) * | 2020-03-12 | 2024-11-19 | Applied Materials, Inc. | Single-slot tubular cathode |
| USD1003243S1 (en) * | 2021-06-28 | 2023-10-31 | Kokusai Electric Corporation | Heat insulator cover of semiconductor manufacturing apparatus |
| USD1053156S1 (en) * | 2022-03-15 | 2024-12-03 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1070797S1 (en) * | 2022-03-15 | 2025-04-15 | Kokusai Electric Corporation | Furnace for substrate processing apparatus |
| USD1019583S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019581S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019582S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD167985S (en) | 2015-05-21 |
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