USD600659S1 - Process tube for manufacturing semiconductor wafers - Google Patents
Process tube for manufacturing semiconductor wafers Download PDFInfo
- Publication number
- USD600659S1 USD600659S1 US29/273,613 US27361307F USD600659S US D600659 S1 USD600659 S1 US D600659S1 US 27361307 F US27361307 F US 27361307F US D600659 S USD600659 S US D600659S
- Authority
- US
- United States
- Prior art keywords
- semiconductor wafers
- manufacturing semiconductor
- process tube
- view
- tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 238000000034 method Methods 0.000 title claims description 3
- 239000004065 semiconductor Substances 0.000 title claims description 3
- 235000012431 wafers Nutrition 0.000 title claims description 3
Images
Description
The broken lines are shown for illustrative purpose only and form no part of the claimed design.
Claims (1)
- The ornamental design for a process tub for manufacturing semiconductor wafers, as shown and described.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006-024315 | 2006-09-12 | ||
| JP2006024315 | 2006-09-12 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| USD600659S1 true USD600659S1 (en) | 2009-09-22 |
Family
ID=41077356
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| US29/273,613 Expired - Lifetime USD600659S1 (en) | 2006-09-12 | 2007-03-09 | Process tube for manufacturing semiconductor wafers |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | USD600659S1 (en) |
| TW (1) | TWD124997S1 (en) |
Cited By (35)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD655262S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD655258S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD742339S1 (en) * | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en) * | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778457S1 (en) * | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778458S1 (en) * | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en) * | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD842823S1 (en) * | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD842824S1 (en) * | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD853979S1 (en) * | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
| USD901406S1 (en) * | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| US11542601B2 (en) * | 2016-02-09 | 2023-01-03 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and method of manufacturing semiconductor device |
| USD986826S1 (en) * | 2020-03-10 | 2023-05-23 | Kokusai Electric Corporation | Reaction tube |
| USD1019581S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019583S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019582S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1022904S1 (en) * | 2021-09-15 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1022906S1 (en) * | 2022-03-01 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1022907S1 (en) * | 2022-03-01 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1022905S1 (en) * | 2022-03-01 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1042340S1 (en) * | 2021-09-15 | 2024-09-17 | Kokusai Electric Corporation | Tubular reactor |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5618349A (en) * | 1993-07-24 | 1997-04-08 | Yamaha Corporation | Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity |
| USD404368S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
| US6251189B1 (en) * | 1999-02-18 | 2001-06-26 | Kokusai Electric Co., Ltd. | Substrate processing apparatus and substrate processing method |
| US20020014483A1 (en) * | 2000-07-06 | 2002-02-07 | Fujio Suzuki | Batch type heat treatment system, method for controlling same, and heat treatment method |
| US6538237B1 (en) * | 2002-01-08 | 2003-03-25 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus for holding a quartz furnace |
| USD520467S1 (en) * | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD521464S1 (en) * | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
-
2007
- 2007-03-09 US US29/273,613 patent/USD600659S1/en not_active Expired - Lifetime
- 2007-03-09 TW TW096301352F patent/TWD124997S1/en unknown
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5618349A (en) * | 1993-07-24 | 1997-04-08 | Yamaha Corporation | Thermal treatment with enhanced intra-wafer, intra-and inter-batch uniformity |
| USD406113S (en) * | 1997-01-31 | 1999-02-23 | Tokyo Electron Limited | Processing tube for use in a semiconductor wafer heat processing apparatus |
| USD404368S (en) * | 1997-08-20 | 1999-01-19 | Tokyo Electron Limited | Outer tube for use in a semiconductor wafer heat processing apparatus |
| USD405062S (en) * | 1997-08-20 | 1999-02-02 | Tokyo Electron Ltd. | Processing tube for use in a semiconductor wafer heat processing apparatus |
| US5948300A (en) * | 1997-09-12 | 1999-09-07 | Kokusai Bti Corporation | Process tube with in-situ gas preheating |
| US6251189B1 (en) * | 1999-02-18 | 2001-06-26 | Kokusai Electric Co., Ltd. | Substrate processing apparatus and substrate processing method |
| US20020014483A1 (en) * | 2000-07-06 | 2002-02-07 | Fujio Suzuki | Batch type heat treatment system, method for controlling same, and heat treatment method |
| US6538237B1 (en) * | 2002-01-08 | 2003-03-25 | Taiwan Semiconductor Manufacturing Co., Ltd | Apparatus for holding a quartz furnace |
| USD520467S1 (en) * | 2003-11-04 | 2006-05-09 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
| USD521464S1 (en) * | 2003-11-04 | 2006-05-23 | Tokyo Electron Limited | Process tube for semiconductor device manufacturing apparatus |
Cited By (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| USD618638S1 (en) * | 2008-05-09 | 2010-06-29 | Hitachi Kokusai Electric, Inc. | Reaction tube |
| USD655262S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD655258S1 (en) * | 2010-10-21 | 2012-03-06 | Tokyo Electron Limited | Side wall for reactor for manufacturing semiconductor |
| USD724551S1 (en) * | 2011-11-18 | 2015-03-17 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD725053S1 (en) * | 2011-11-18 | 2015-03-24 | Tokyo Electron Limited | Outer tube for process tube for manufacturing semiconductor wafers |
| USD720309S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD720308S1 (en) * | 2011-11-18 | 2014-12-30 | Tokyo Electron Limited | Inner tube for process tube for manufacturing semiconductor wafers |
| USD719114S1 (en) * | 2013-06-28 | 2014-12-09 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD720707S1 (en) * | 2013-06-28 | 2015-01-06 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD725055S1 (en) * | 2013-06-28 | 2015-03-24 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD739832S1 (en) * | 2013-06-28 | 2015-09-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD711843S1 (en) * | 2013-06-28 | 2014-08-26 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD742339S1 (en) * | 2014-03-12 | 2015-11-03 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD748594S1 (en) * | 2014-03-12 | 2016-02-02 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778458S1 (en) * | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD778457S1 (en) * | 2015-02-23 | 2017-02-07 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD772824S1 (en) * | 2015-02-25 | 2016-11-29 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD790490S1 (en) * | 2015-09-04 | 2017-06-27 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD791090S1 (en) * | 2015-09-04 | 2017-07-04 | Hitachi Kokusai Electric Inc. | Reaction tube |
| USD770993S1 (en) * | 2015-09-04 | 2016-11-08 | Hitachi Kokusai Electric Inc. | Reaction tube |
| US11542601B2 (en) * | 2016-02-09 | 2023-01-03 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and method of manufacturing semiconductor device |
| US11952664B2 (en) | 2016-02-09 | 2024-04-09 | Kokusai Electric Corporation | Substrate processing apparatus and method of manufacturing semiconductor device |
| USD842824S1 (en) * | 2017-08-09 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD842823S1 (en) * | 2017-08-10 | 2019-03-12 | Kokusai Electric Corporation | Reaction tube |
| USD853979S1 (en) * | 2017-12-27 | 2019-07-16 | Kokusai Electric Corporation | Reaction tube |
| USD901406S1 (en) * | 2019-03-20 | 2020-11-10 | Kokusai Electric Corporation | Inner tube of reactor for semiconductor fabrication |
| USD931823S1 (en) * | 2020-01-29 | 2021-09-28 | Kokusai Electric Corporation | Reaction tube |
| USD986826S1 (en) * | 2020-03-10 | 2023-05-23 | Kokusai Electric Corporation | Reaction tube |
| USD1022904S1 (en) * | 2021-09-15 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1042340S1 (en) * | 2021-09-15 | 2024-09-17 | Kokusai Electric Corporation | Tubular reactor |
| USD1022906S1 (en) * | 2022-03-01 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1022907S1 (en) * | 2022-03-01 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1022905S1 (en) * | 2022-03-01 | 2024-04-16 | Kokusai Electric Corporation | Tubular reactor |
| USD1019581S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019583S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
| USD1019582S1 (en) * | 2022-05-30 | 2024-03-26 | Kokusai Electric Corporation | Inner tube of reaction tube for semiconductor manufacturing equipment |
Also Published As
| Publication number | Publication date |
|---|---|
| TWD124997S1 (en) | 2008-09-21 |
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