USD600659S1 - Process tube for manufacturing semiconductor wafers - Google Patents

Process tube for manufacturing semiconductor wafers Download PDF

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Publication number
USD600659S1
USD600659S1 US29/273,613 US27361307F USD600659S US D600659 S1 USD600659 S1 US D600659S1 US 27361307 F US27361307 F US 27361307F US D600659 S USD600659 S US D600659S
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US
United States
Prior art keywords
semiconductor wafers
manufacturing semiconductor
process tube
view
tube
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US29/273,613
Inventor
Hiroyuki Matsuura
Koichi Shimada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Tokyo Electron Ltd
Original Assignee
Tokyo Electron Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Electron Ltd filed Critical Tokyo Electron Ltd
Assigned to TOKYO ELECTRON LIMITED reassignment TOKYO ELECTRON LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MATSUURA, HIROYUKI, SHIMADA, KOICHI
Application granted granted Critical
Publication of USD600659S1 publication Critical patent/USD600659S1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

FIG. 1 is a perspective view of the design for a process tube for manufacturing semiconductor wafers in accordance with the invention;
FIG. 2 is a front view thereof;
FIG. 3 is a rear view thereof;
FIG. 4 is a top view thereof;
FIG. 5 is a bottom view thereof;
FIG. 6 is a right side view thereof;
FIG. 7 is a left side view thereof;
FIG. 8 is a sectional view thereof along line 88 of FIG. 4;
FIG. 9 is a sectional view thereof along line 99 of FIG. 4;
FIG. 10 is a sectional view thereof along line 1010 of FIG. 4; and,
FIG. 11 is a sectional view thereof along line 1111 of FIG. 2.
The broken lines are shown for illustrative purpose only and form no part of the claimed design.

Claims (1)

  1. The ornamental design for a process tub for manufacturing semiconductor wafers, as shown and described.
US29/273,613 2006-09-12 2007-03-09 Process tube for manufacturing semiconductor wafers Expired - Lifetime USD600659S1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006024315 2006-09-12

Publications (1)

Publication Number Publication Date
USD600659S1 true USD600659S1 (en) 2009-09-22

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Family Applications (1)

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US29/273,613 Expired - Lifetime USD600659S1 (en) 2006-09-12 2007-03-09 Process tube for manufacturing semiconductor wafers

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Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
USD742339S1 (en) * 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD748594S1 (en) * 2014-03-12 2016-02-02 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD790490S1 (en) * 2015-09-04 2017-06-27 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
USD842823S1 (en) * 2017-08-10 2019-03-12 Kokusai Electric Corporation Reaction tube
USD842824S1 (en) * 2017-08-09 2019-03-12 Kokusai Electric Corporation Reaction tube
USD853979S1 (en) * 2017-12-27 2019-07-16 Kokusai Electric Corporation Reaction tube
USD901406S1 (en) * 2019-03-20 2020-11-10 Kokusai Electric Corporation Inner tube of reactor for semiconductor fabrication
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
US11542601B2 (en) * 2016-02-09 2023-01-03 Hitachi Kokusai Electric Inc. Substrate processing apparatus and method of manufacturing semiconductor device
USD986826S1 (en) * 2020-03-10 2023-05-23 Kokusai Electric Corporation Reaction tube
USD1019581S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019583S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1022905S1 (en) * 2022-03-01 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1022907S1 (en) * 2022-03-01 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1022906S1 (en) * 2022-03-01 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1022904S1 (en) * 2021-09-15 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1042340S1 (en) * 2021-09-15 2024-09-17 Kokusai Electric Corporation Tubular reactor

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
USD742339S1 (en) * 2014-03-12 2015-11-03 Hitachi Kokusai Electric Inc. Reaction tube
USD748594S1 (en) * 2014-03-12 2016-02-02 Hitachi Kokusai Electric Inc. Reaction tube
USD778458S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD778457S1 (en) * 2015-02-23 2017-02-07 Hitachi Kokusai Electric Inc. Reaction tube
USD772824S1 (en) * 2015-02-25 2016-11-29 Hitachi Kokusai Electric Inc. Reaction tube
USD770993S1 (en) * 2015-09-04 2016-11-08 Hitachi Kokusai Electric Inc. Reaction tube
USD790490S1 (en) * 2015-09-04 2017-06-27 Hitachi Kokusai Electric Inc. Reaction tube
USD791090S1 (en) * 2015-09-04 2017-07-04 Hitachi Kokusai Electric Inc. Reaction tube
US11542601B2 (en) * 2016-02-09 2023-01-03 Hitachi Kokusai Electric Inc. Substrate processing apparatus and method of manufacturing semiconductor device
US11952664B2 (en) 2016-02-09 2024-04-09 Kokusai Electric Corporation Substrate processing apparatus and method of manufacturing semiconductor device
USD842824S1 (en) * 2017-08-09 2019-03-12 Kokusai Electric Corporation Reaction tube
USD842823S1 (en) * 2017-08-10 2019-03-12 Kokusai Electric Corporation Reaction tube
USD853979S1 (en) * 2017-12-27 2019-07-16 Kokusai Electric Corporation Reaction tube
USD901406S1 (en) * 2019-03-20 2020-11-10 Kokusai Electric Corporation Inner tube of reactor for semiconductor fabrication
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
USD986826S1 (en) * 2020-03-10 2023-05-23 Kokusai Electric Corporation Reaction tube
USD1022904S1 (en) * 2021-09-15 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1042340S1 (en) * 2021-09-15 2024-09-17 Kokusai Electric Corporation Tubular reactor
USD1022905S1 (en) * 2022-03-01 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1022907S1 (en) * 2022-03-01 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1022906S1 (en) * 2022-03-01 2024-04-16 Kokusai Electric Corporation Tubular reactor
USD1019581S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019582S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment
USD1019583S1 (en) * 2022-05-30 2024-03-26 Kokusai Electric Corporation Inner tube of reaction tube for semiconductor manufacturing equipment

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