US9044819B2 - Laser processing apparatus - Google Patents

Laser processing apparatus Download PDF

Info

Publication number
US9044819B2
US9044819B2 US13/677,787 US201213677787A US9044819B2 US 9044819 B2 US9044819 B2 US 9044819B2 US 201213677787 A US201213677787 A US 201213677787A US 9044819 B2 US9044819 B2 US 9044819B2
Authority
US
United States
Prior art keywords
laser beam
optical path
beam diameter
laser
focusing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active, expires
Application number
US13/677,787
Other languages
English (en)
Other versions
US20130134142A1 (en
Inventor
Hiroshi Morikazu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Disco Corp
Original Assignee
Disco Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Disco Corp filed Critical Disco Corp
Assigned to DISCO CORPORATION reassignment DISCO CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: MORIKAZU, HIROSHI
Publication of US20130134142A1 publication Critical patent/US20130134142A1/en
Application granted granted Critical
Publication of US9044819B2 publication Critical patent/US9044819B2/en
Active legal-status Critical Current
Adjusted expiration legal-status Critical

Links

Images

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/04Automatically aligning, aiming or focusing the laser beam, e.g. using the back-scattered light
    • B23K26/042Automatically aligning the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/06Shaping the laser beam, e.g. by masks or multi-focusing
    • B23K26/073Shaping the laser spot
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00Articles made by soldering, welding or cutting
    • B23K2101/36Electric or electronic devices
    • B23K2101/40Semiconductor devices
    • B23K2201/40

Definitions

  • the present invention relates to a laser processing apparatus having a parallelism adjusting function for bringing a laser beam oscillated by a laser oscillator into a parallel beam (collimated beam) in particular.
  • a plurality of crossing division lines called streets are formed on the front side of a substantially disk-shaped semiconductor wafer to thereby partition a plurality of regions where devices such as ICs and LSIs are respectively formed.
  • the semiconductor wafer is cut along the streets to thereby divide the regions where the devices are formed from each other, thus obtaining individual semiconductor chips.
  • an optical device wafer is provided by forming photodetectors such as photodiodes or light emitting devices such as laser diodes on the front side of a sapphire substrate.
  • the optical device wafer is also cut along the streets to obtain individual optical devices divided from each other, such as photodiodes and laser diodes, which are widely used in electric equipment.
  • a laser processing apparatus for laser-processing a workpiece such as a wafer includes a chuck table for holding the workpiece and laser beam applying means for applying a laser beam to the workpiece held on the chuck table.
  • the laser beam applying means includes a laser oscillator for oscillating a laser beam and focusing means for focusing the laser beam oscillated by the laser oscillator and applying the focused laser beam to the workpiece held on the chuck table (see Japanese Patent Laid-open No. 2006-51517, for example).
  • the laser processing apparatus for performing laser processing includes a chuck table for holding a workpiece and laser beam applying means for applying a laser beam to the workpiece held on the chuck table.
  • the laser beam applying means includes a laser oscillator for oscillating a laser beam and a focusing lens for focusing the laser beam oscillated by the laser oscillator.
  • the laser beam entering the focusing lens is preferably a parallel beam having a predetermined beam diameter.
  • the laser beam oscillated by the laser oscillator has a divergence angle. Therefore, beam adjusting means for bringing the laser beam oscillated by the laser oscillator into a parallel beam is provided between the laser oscillator and the focusing lens.
  • the beam adjusting means is adjusted by an operator in such a manner that an optical system is exposed and a detector for detecting the beam diameter of the laser beam is moved to two positions on an optical path leading to the focusing means, thereby detecting two beam diameters at the two positions. Then, the optical system is adjusted so that the two beam diameters detected above become equal to each other. Thus, the adjustment is made by the operator to cause a reduction in workability. Further, the laser beam to be directed to the focusing lens is not always a parallel beam, but it may be decreased in diameter with a convergence angle of about 0.1 degree.
  • the beam adjusting means is adjusted by the operator in such a manner that the optical system is exposed and the detector for detecting the beam diameter of the laser beam is moved to the two positions on the optical path leading to the focusing means, thereby detecting two beam diameters at the two positions. Then, the optical system is adjusted so that the two beam diameters detected above have a predetermined relation.
  • a laser processing apparatus including a chuck table for holding a workpiece; laser beam applying means for applying a laser beam to the workpiece held on the chuck table, the laser beam applying means having a laser oscillator for oscillating the laser beam and focusing means for focusing the laser beam oscillated by the laser oscillator; beam diameter adjusting means provided between the laser oscillator and the focusing means for adjusting the beam diameter of the laser beam oscillated by the laser oscillator; an optical path changing mirror for changing the optical path of the laser beam passed through the beam diameter adjusting means into an optical path toward the focusing means; mirror positioning means for selectively positioning the optical path changing mirror at an operative position where the laser beam passed through the beam diameter adjusting means is directed toward the focusing means and at an inoperative position where the laser beam passed through the beam diameter adjusting means is allowed to travel straight toward a detection path; optical attenuating means provided on the detection path for attenuating the laser beam directed to the detection path; imaging means for
  • the predetermined relation of the two beam diameters includes that the two beam diameters are equal to each other.
  • the laser processing apparatus includes the beam diameter adjusting means provided between the laser oscillator and the focusing means, the optical path changing mirror for changing the optical path of the laser beam passed through the beam diameter adjusting means into an optical path toward the focusing means, the mirror positioning means for selectively positioning the optical path changing mirror at the operative position where the laser beam passed through the beam diameter adjusting means is directed toward the focusing means and at the inoperative position where the laser beam passed through the beam diameter adjusting means is allowed to travel straight toward the detection path, the optical attenuating means provided on the detection path for attenuating the laser beam directed to the detection path, the imaging means for detecting the beam diameter of the laser beam attenuated by the optical attenuating means, the optical path length changing means for moving the imaging means along the detection path to thereby change an optical path length, and the control means for controlling the imaging means, the beam diameter adjusting means, and the optical path length changing means.
  • the control means operates the optical path length changing means to move the imaging means to the two positions where different optical path lengths are provided, next operates the imaging means at the two positions to detect the beam diameters of the laser beam at the two positions, and next controls the beam diameter adjusting means according to the two beam diameters detected above so that the two beam diameters have the predetermined relation. Accordingly, the operator is not required to conduct the work for correcting the laser beam oscillated by the laser oscillator to a parallel beam, thereby improving the workability.
  • FIG. 1 is a perspective view of a laser processing apparatus according to a preferred embodiment of the present invention
  • FIG. 2 is a schematic block diagram showing the configuration of laser beam applying means included in the laser processing apparatus shown in FIG. 1 ;
  • FIG. 3 is a block diagram of control means included in the laser processing apparatus shown in FIG. 1 .
  • FIG. 1 is a perspective view of a laser processing apparatus 1 according to a preferred embodiment of the present invention.
  • the laser processing apparatus 1 shown in FIG. 1 includes a stationary base 2 , a chuck table mechanism 3 for holding a workpiece, the chuck table mechanism 3 being provided on the stationary base 2 so as to be movable in a feeding direction (X direction) shown by an arrow X, a laser beam applying unit supporting mechanism 4 provided on the stationary base 2 so as to be movable in an indexing direction (Y direction) shown by an arrow Y perpendicular to the X direction, and a laser beam applying unit 5 provided on the laser beam applying unit supporting mechanism 4 so as to be movable in a focal position adjusting direction (Z direction) shown by an arrow Z.
  • X direction feeding direction
  • Y direction indexing direction
  • Z direction focal position adjusting direction
  • the chuck table mechanism 3 includes a pair of guide rails 31 provided on the stationary base 2 so as to extend parallel to each other in the X direction, a first slide block 32 provided on the guide rails 31 so as to be movable in the X direction, a second slide block 33 provided on the first slide block 32 so as to be movable in the Y direction, a cover table 35 supported by a cylindrical member 34 standing on the second slide block 33 , and a chuck table 36 as workpiece holding means.
  • the chuck table 36 has a vacuum chuck 361 formed of a porous material. A workpiece such as a disk-shaped semiconductor wafer is adapted to be held under suction on the upper surface (holding surface) of the vacuum chuck 361 by operating suction means (not shown).
  • the chuck table 36 is rotatable by a pulse motor (not shown) provided in the cylindrical member 34 . Further, the chuck table 36 is provided with clamps 362 for fixing an annular frame to be hereinafter described.
  • the lower surface of the first slide block 32 is formed with a pair of guided grooves 321 for slidably engaging the pair of guide rails 31 mentioned above.
  • a pair of guide rails 322 are provided on the upper surface of the first slide block 32 so as to extend parallel to each other in the Y direction. Accordingly, the first slide block 32 configured as above is movable in the X direction along the guide rails 31 by the slidable engagement of the guided grooves 321 with the guide rails 31 .
  • the chuck table mechanism 3 further includes feeding means 37 for moving the first slide block 32 in the X direction along the guide rails 31 .
  • the feeding means 37 includes an externally threaded rod 371 extending parallel to the guide rails 31 so as to be interposed therebetween and a pulse motor 372 as a drive source for rotationally driving the externally threaded rod 371 .
  • the externally threaded rod 371 is rotatably supported at one end thereof to a bearing block 373 fixed to the stationary base 2 and is connected at the other end to the output shaft of the pulse motor 372 so as to receive the torque thereof.
  • the externally threaded rod 371 is engaged with a tapped through hole formed in an internally threaded block (not shown) projecting from the lower surface of the first slide block 32 at a central portion thereof. Accordingly, the first slide block 32 is moved in the X direction along the guide rails 31 by operating the pulse motor 372 to normally or reversely rotate the externally threaded rod 371 .
  • the lower surface of the second slide block 33 is formed with a pair of guided grooves 331 for slidably engaging the pair of guide rails 322 provided on the upper surface of the first slide block 32 as mentioned above. Accordingly, the second slide block 33 is movable in the Y direction along the guide rails 322 by the slidable engagement of the guided grooves 331 with the guide rails 322 .
  • the chuck table mechanism 3 further includes first indexing means 38 for moving the second slide block 33 in the Y direction along the guide rails 322 provided on the first slide block 32 .
  • the first indexing means 38 includes an externally threaded rod 381 extending parallel to the guide rails 322 so as to be interposed therebetween and a pulse motor 382 as a drive source for rotationally driving the externally threaded rod 381 .
  • the externally threaded rod 381 is rotatably supported at one end thereof to a bearing block 383 fixed to the upper surface of the first slide block 32 and is connected at the other end to the output shaft of the pulse motor 382 so as to receive the torque thereof.
  • the externally threaded rod 381 is engaged with a tapped through hole formed in an internally threaded block (not shown) projecting from the lower surface of the second slide block 33 at a central portion thereof. Accordingly, the second slide block 33 is moved in the Y direction along the guide rails 322 by operating the pulse motor 382 to normally or reversely rotate the externally threaded rod 381 .
  • the laser beam applying unit supporting mechanism 4 includes a pair of guide rails 41 provided on the stationary base 2 so as to extend parallel to each other in the Y direction and a movable support base 42 provided on the guide rails 41 so as to be movable in the Y direction.
  • the movable support base 42 is composed of a horizontal portion 421 slidably supported to the guide rails 41 and a vertical portion 422 extending vertically upward from the upper surface of the horizontal portion 421 . Further, a pair of guide rails 423 are provided on one side surface of the vertical portion 422 so as to extend parallel to each other in the Z direction.
  • the laser beam applying unit supporting mechanism 4 further includes second indexing means 43 for moving the movable support base 42 in the Y direction along the guide rails 41 .
  • the second indexing means 43 includes an externally threaded rod 431 extending parallel to the guide rails 41 so as to be interposed therebetween and a pulse motor 432 as a drive source for rotationally driving the externally threaded rod 431 .
  • the externally threaded rod 431 is rotatably supported at one end thereof to a bearing block (not shown) fixed to the stationary base 2 and is connected at the other end to the output shaft of the pulse motor 432 so as to receive the torque thereof.
  • the externally threaded rod 431 is engaged with a tapped through hole formed in an internally threaded block (not shown) projecting from the lower surface of the horizontal portion 421 at a central portion thereof. Accordingly, the movable support base 42 is moved in the Y direction along the guide rails 41 by operating the pulse motor 432 to normally or reversely rotate the externally threaded rod 431 .
  • the laser beam applying unit 5 includes a unit holder 51 and laser beam applying means 6 mounted to the unit holder 51 .
  • the unit holder 51 is formed with a pair of guided grooves 511 for slidably engaging the pair of guide rails 423 provided on the vertical portion 422 . Accordingly, the unit holder 51 is supported so as to be movable in the Z direction by the slidable engagement of the guided grooves 511 with the guide rails 423 .
  • the laser beam applying unit 5 further includes focal position adjusting means 53 for moving the unit holder 51 along the guide rails 423 in the Z direction.
  • the focal position adjusting means 53 includes an externally threaded rod (not shown) extending parallel to the guide rails 423 so as to be interposed therebetween and a pulse motor 532 as a drive source for rotationally driving this externally threaded rod. Accordingly, the unit holder 51 and the laser beam applying means 6 are moved in the Z direction along the guide rails 423 by operating the pulse motor 532 to normally or reversely rotate this externally threaded rod. In this preferred embodiment, when the pulse motor 532 is normally operated, the laser beam applying means 6 is moved upward, whereas when the pulse motor 532 is reversely operated, the laser beam applying means 6 is moved downward.
  • the laser beam applying means 6 includes a cylindrical casing 61 extending from the unit holder 51 in a substantially horizontal direction. As shown in FIG. 2 , the laser beam applying means 6 includes pulsed laser beam oscillating means 62 provided in the casing 61 and focusing means 63 provided in the casing 61 .
  • the focusing means 63 includes an objective focusing lens 631 for focusing a pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 .
  • the pulsed laser beam oscillating means 62 is composed of a pulsed laser oscillator 621 such as a YAG laser oscillator or a YVO4 laser oscillator and repetition frequency setting means 622 connected to the pulsed laser oscillator 621 .
  • the pulsed laser beam oscillating means 62 functions to oscillate a pulsed laser beam having a diameter of 3 mm in the embodiment of the drawings.
  • the focusing means 63 functions to apply the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 to a workpiece W held on the chuck table 36 .
  • the laser beam applying means 6 further includes beam diameter adjusting means 64 provided between the pulsed laser beam oscillating means 62 and the focusing means 63 for adjusting the beam diameter of the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 , an optical path changing mirror 65 for changing the optical path of the pulsed laser beam passed through the beam diameter adjusting means 64 into an optical path toward the focusing means 63 , and mirror positioning means 66 for selectively positioning the optical path changing mirror 65 at an operative position shown by a solid line in FIG. 2 and at an inoperative position shown by a phantom line in FIG. 2 .
  • the first lens 641 is provided on a support base 643 extending along the optical axis of the first lens 641 (in the horizontal direction as viewed in FIG. 2 ).
  • the second lens 642 is mounted on a movable base 644 provided on the support base 643 so as to be movable along the optical axis of the second lens 642 .
  • the beam diameter adjusting means 64 further includes moving means 645 for moving the movable base 644 mounting the second lens 642 thereon along the optical axis of the second lens 642 (in the horizontal direction as viewed in FIG. 2 ).
  • the moving means 645 includes an externally threaded rod 645 a extending parallel to the support base 643 and a pulse motor 645 b as a drive source for rotationally driving the externally threaded rod 645 a .
  • the externally threaded rod 645 a is rotatably supported at one end thereof to a bearing block 645 c fixed to the support base 643 and is connected at the other end to the output shaft of the pulse motor 645 b so as to receive the torque thereof.
  • the externally threaded rod 645 a is engaged with a tapped through hole formed in an internally threaded block 645 d mounted on the movable base 644 . Accordingly, the movable base 644 mounting the second lens 642 thereon is moved along the support base 643 by operating the pulse motor 645 b to normally or reversely rotate the externally threaded rod 645 a .
  • the amount of movement of the movable base 644 mounting the second lens 642 thereon per drive pulse to be applied to the pulse motor 645 b is set to 1 ⁇ m, for example.
  • the pulse motor 645 b of the moving means 645 is controlled by control means to be hereinafter described.
  • the optical path changing mirror 65 functions to change the optical path of the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 and passed through the beam diameter adjusting means 64 into an optical path directed downward toward the focusing means 63 as viewed in FIG. 2 .
  • the mirror positioning means 66 for selectively positioning the optical path changing mirror 65 at the operative position shown by the solid line in FIG. 2 and at the inoperative position shown by the phantom line in FIG. 2 is composed of a mirror supporting member 661 for supporting the optical path changing mirror 65 and moving means 662 for moving the mirror supporting member 661 in a vertical direction as viewed in FIG. 2 .
  • the moving means 662 includes a support base 662 a extending in the vertical direction, an externally threaded rod 662 b extending vertically parallel to the support base 662 a , and a pulse motor 662 c as a drive source for rotationally driving the externally threaded rod 662 b .
  • the externally threaded rod 662 b is rotatably supported at one end thereof to a bearing block 662 d fixed to the support base 662 a and is connected at the other end to the output shaft of the pulse motor 662 c so as to receive the torque thereof.
  • the externally threaded rod 662 b is engaged with a tapped through hole formed in an internally threaded block 662 e mounted on the mirror supporting member 661 .
  • the mirror supporting member 661 supporting the optical path changing mirror 65 is moved vertically along the support base 662 a by operating the pulse motor 662 c to normally or reversely rotate the externally threaded rod 662 b .
  • the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 and passed through the beam diameter adjusting means 64 is directed toward the focusing means 63 by the optical path changing mirror 65 .
  • the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 and passed through the beam diameter adjusting means 64 is allowed to travel straight toward a detection path 67 .
  • the laser beam applying means 6 further includes optical attenuating means 68 provided on the detection path 67 for attenuating the pulsed laser beam directed to the detection path 67 , imaging means 69 for detecting the beam diameter of the pulsed laser beam attenuated by the optical attenuating means 68 , and optical path length changing means 70 for moving the imaging means 69 along the detection path 67 to thereby change an optical path length.
  • the optical attenuating means 68 is composed of a beam attenuator 681 and an ND filter 682 and the imaging means 69 is configured by an imaging device (CCD), and an image signal output from the imaging means 69 is transmitted to control means to be hereinafter described.
  • the optical path length changing means 70 includes a movable base 71 on which the optical attenuating means 68 composed of the beam attenuator 681 and the ND filter 682 and the imaging means 69 are provided, a support base 72 for movably supporting the movable base 71 along the detection path 67 , and moving means 73 for moving the movable base 71 along the support base 72 .
  • the moving means 73 includes an externally threaded rod 731 extending parallel to the support base 72 and a pulse motor 732 as a drive source for rotationally driving the externally threaded rod 731 .
  • the externally threaded rod 731 is rotatably supported at one end thereof to a bearing block 733 fixed to the support base 72 and is connected at the other end to the output shaft of the pulse motor 732 so as to receive the torque thereof.
  • the externally threaded rod 731 is engaged with a tapped through hole formed in an internally threaded block 734 mounted on the movable base 71 . Accordingly, the movable base 71 mounting the optical attenuating means 68 and the imaging means 69 thereon is moved along the support base 72 by operating the pulse motor 732 to normally or reversely rotate the externally threaded rod 731 .
  • the pulse motor 732 of the moving means 73 thus configured is controlled by control means to be hereinafter described.
  • alignment means 60 for detecting a subject area to be laser-processed by the laser beam applying means 6 is provided on the casing 61 constituting the laser beam applying means 6 .
  • the alignment means 60 is configured by an imaging device (CCD) or the like, and an image signal output from the alignment means 60 is transmitted to control means to be hereinafter described.
  • the laser processing apparatus 1 shown in FIG. 1 further includes control means 8 shown in FIG. 3 .
  • the control means 8 is configured by a computer, and it includes a central processing unit (CPU) 81 for performing operational processing according to a control program, a read only memory (ROM) 82 preliminary storing the control program, a random access memory (RAM) 83 for storing the results of computation, etc., a counter 84 , an input interface 85 , and an output interface 86 . Detection signals from the alignment means 60 and the imaging means 69 are input into the input interface 85 of the control means 8 .
  • CPU central processing unit
  • ROM read only memory
  • RAM random access memory
  • control signals are output from the output interface 86 of the control means 8 to the pulse motor 372 constituting the feeding means 37 , the pulse motor 382 constituting the first indexing means 38 , the pulse motor 432 constituting the second indexing means 43 , the pulse motor 532 constituting the focal position adjusting means 53 , the pulsed laser beam oscillating means 62 of the laser beam applying means 6 , the pulse motor 645 b constituting the moving means 645 of the beam diameter adjusting means 64 , the pulse motor 662 c constituting the moving means 662 of the mirror positioning means 66 , and the pulse motor 732 constituting the moving means 73 of the optical path length changing means 70 .
  • the pulsed laser beam (having a diameter of 3 mm) oscillated by the pulsed laser beam oscillating means 62 is a parallel beam
  • the pulsed laser beam passed through the beam diameter adjusting means 64 becomes a parallel beam having a diameter of 6 mm provided that the first lens 641 and the second lens 642 are arranged as mentioned above.
  • the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 is a substantially parallel beam, but it tends to increase or decrease in diameter. Accordingly, in the case that the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 is not a parallel beam, it must be corrected to a parallel beam.
  • control means 8 operates the pulse motor 662 c constituting the moving means 662 of the mirror positioning means 66 to move the mirror supporting member 661 supporting the optical path changing mirror 65 to the inoperative position shown by the phantom line in FIG. 2 . Further, the control means 8 also operates the pulse motor 732 constituting the moving means 73 of the optical path length changing means 70 to move the imaging means 69 to a first detecting position shown by an arrow A in FIG. 2 . After thus moving the optical path changing mirror 65 to the inoperative position and moving the imaging means 69 to the first detecting position A, the control means 8 operates the pulsed laser beam oscillating means 62 to oscillate the pulsed laser beam.
  • the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 is passed through the beam diameter adjusting means 64 and led to the detection path 67 .
  • the pulsed laser beam is attenuated by the optical attenuating means 68 composed of the beam attenuator 681 and the ND filter 682 to finally reach the imaging means 69 .
  • the imaging means 69 images the light received and then transmits an image signal to the control means 8 .
  • the control means 8 temporarily stores in the random access memory (RAM) 83 the image signal transmitted from the imaging means 69 as a first detection signal DA.
  • RAM random access memory
  • control means 8 operates the pulse motor 732 constituting the moving means 73 of the optical path length changing means 70 to move the imaging means 69 to a second detecting position shown by an arrow B in FIG. 2 .
  • the control means 8 receives an image signal output from the imaging means 69 , and temporarily stores in the random access memory (RAM) 83 this image signal as a second detection signal DB.
  • RAM random access memory
  • the control means 8 After thus temporarily storing the first detection signal DA and the second detection signal DB in the random access memory (RAM) 83 , the control means 8 obtains a beam diameter ⁇ A according to the first detection signal DA and a beam diameter ⁇ B according to the second detection signal DB (beam diameter detecting step). Then, the control means 8 checks whether or not the beam diameter ⁇ A and the beam diameter ⁇ B are equal to each other or in a predetermined relation (for example, in a predetermined relation such that the pulsed laser beam passed through the beam diameter adjusting means 64 and led to the detection path 67 is reduced in diameter with a convergence angle of 0.1 degree).
  • the control means 8 determines that the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 is a parallel beam or in the predetermined relation, and then stops the operation of the pulsed laser beam oscillating means 62 . Further, the control means 8 operates the pulse motor 662 c constituting the moving means 662 of the mirror positioning means 66 to move the mirror supporting member 661 supporting the optical path changing mirror 65 to the operative position shown by the solid line in FIG. 2 .
  • the control means 8 checks whether or not the beam diameter ⁇ A is larger than the beam diameter ⁇ B. If the beam diameter ⁇ A is larger than the beam diameter ⁇ B, the control means 8 determines that the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 is increased in diameter. Accordingly, the control means 8 performs a diameter decreasing step to the beam diameter adjusting means 64 .
  • the diameter decreasing step is performed in the following manner.
  • the control means 8 operates the pulse motor 645 b constituting the moving means 645 of the beam diameter adjusting means 64 to move the movable base 644 mounting the second lens 642 thereon toward the first lens 641 (leftward as viewed in FIG. 2 ) by a distance of 1 mm, for example.
  • the control means 8 operates the pulse motor 732 constituting the moving means 73 of the optical path length changing means 70 to move the imaging means 69 to the first detecting position A and the second detecting position B, respectively, and then perform the beam diameter detecting step at these positions A and B.
  • the control means 8 checks whether or not the beam diameter ⁇ A and the beam diameter ⁇ B obtained in this beam diameter detecting step are equal to each other or in the predetermined relation. If the beam diameter ⁇ A and the beam diameter ⁇ B are equal to each other or in the predetermined relation, the control means 8 determines that the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 has been corrected to a parallel beam or to have the predetermined relation. Then, the control means 8 stops the operation of the pulsed laser beam oscillating means 62 and operates the pulse motor 662 c constituting the moving means 662 of the mirror positioning means 66 to move the mirror supporting member 661 supporting the optical path changing mirror 65 to the operative position shown by the solid line in FIG. 2 .
  • the control means 8 operates the pulse motor 645 b constituting the moving means 645 of the beam diameter adjusting means 64 to move the movable base 644 mounting the second lens 642 thereon toward the first lens 641 (leftward as viewed in FIG. 2 ) by a distance of 100 ⁇ m, for example. Thereafter, the control means 8 similarly performs the beam diameter detecting step. In this manner, the diameter decreasing step and the beam diameter detecting step are repeated until the beam diameter ⁇ A and the beam diameter ⁇ B become equal to each other or have the predetermined relation.
  • the distance to be traveled by the movable base 644 mounting the second lens 642 thereon toward the first lens 641 is gradually reduced as to 10 ⁇ m for the third cycle of the diameter decreasing step and 1 ⁇ m for the fourth cycle of the diameter decreasing step.
  • the control means 8 determines that the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 is decreased in diameter. Accordingly, the control means 8 performs a diameter increasing step to the beam diameter adjusting means 64 .
  • the diameter increasing step is performed in the following manner. First, the control means 8 operates the pulse motor 645 b constituting the moving means 645 of the beam diameter adjusting means 64 to move the movable base 644 mounting the second lens 642 thereon away from the first lens 641 (rightward as viewed in FIG. 2 ) by a distance of 1 mm, for example.
  • the control means 8 After thus moving the second lens 642 away from the first lens 641 , the control means 8 operates the pulse motor 732 constituting the moving means 73 of the optical path length changing means 70 to move the imaging means 69 to the first detecting position A and the second detecting position B, respectively, and then perform the beam diameter detecting step at these positions A and B. Thereafter, the control means 8 checks whether or not the beam diameter ⁇ A and the beam diameter ⁇ B obtained in this beam diameter detecting step are equal to each other or in the predetermined relation.
  • the control means 8 determines that the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 has been corrected to a parallel beam or to have the predetermined relation. Then, the control means 8 stops the operation of the pulsed laser beam oscillating means 62 and operates the pulse motor 662 c constituting the moving means 662 of the mirror positioning means 66 to move the mirror supporting member 661 supporting the optical path changing mirror 65 to the operative position shown by the solid line in FIG. 2 .
  • the control means 8 operates the pulse motor 645 b constituting the moving means 645 of the beam diameter adjusting means 64 to move the movable base 644 mounting the second lens 642 thereon away from the first lens 641 (rightward as viewed in FIG. 2 ) by a distance of 100 ⁇ m, for example. Thereafter, the control means 8 similarly performs the beam diameter detecting step. In this manner, the diameter increasing step and the beam diameter detecting step are repeated until the beam diameter ⁇ A and the beam diameter ⁇ B become equal to each other or have the predetermined relation.
  • the distance to be traveled by the movable base 644 mounting the second lens 642 thereon away from the first lens 641 is gradually reduced as to 10 ⁇ m for the third cycle of the diameter increasing step and 1 ⁇ m for the fourth cycle of the diameter increasing step.
  • the diameter decreasing step or the diameter increasing step and the beam diameter detecting step are repeated until the beam diameter ⁇ A and the beam diameter ⁇ B become equal to each other or have the predetermined relation.
  • the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 can be corrected to a parallel beam or to have the predetermined relation.
  • the optical path changing mirror 65 is moved to the operative position shown by the solid line in FIG. 2 .
  • the pulsed laser beam corrected to a parallel beam or to have the predetermined relation can be focused by the focusing means 63 to perform the laser processing.
  • the laser processing apparatus in this preferred embodiment includes the beam diameter adjusting means 64 provided between the pulsed laser beam oscillating means 62 and the focusing means 63 , the optical path changing mirror 65 for changing the optical path of the pulsed laser beam passed through the beam diameter adjusting means 64 into an optical path toward the focusing means 63 , the mirror positioning means 66 for selectively positioning the optical path changing mirror 65 at the operative position where the pulsed laser beam passed through the beam diameter adjusting means 64 is directed toward the focusing means 63 and at the inoperative position where the pulsed laser beam passed through the beam diameter adjusting means 64 is allowed to travel straight toward the detection path 67 , the optical attenuating means 68 provided on the detection path 67 for attenuating the pulsed laser beam directed to the detection path 67 , the imaging means 69 for detecting the beam diameter of the pulsed laser beam attenuated by the optical attenuating means 68 , the optical path length changing means 70 for moving the imaging means 69 along the detection path 67 to thereby change an optical path
  • the control means 8 operates the optical path length changing means 70 to move the imaging means 69 to the two positions where different optical path lengths are provided, next operates the imaging means 69 to detect the beam diameters of the pulsed laser beam at the two positions, and next controls the beam diameter adjusting means 64 according to the two beam diameters detected above so that the two beam diameters become equal to each other or have the predetermined relation. Accordingly, the operator is not required to conduct the work for correcting the pulsed laser beam oscillated by the pulsed laser beam oscillating means 62 to a parallel beam or to have the predetermined relation, thereby improving the workability.

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Laser Beam Processing (AREA)
  • Lasers (AREA)
US13/677,787 2011-11-30 2012-11-15 Laser processing apparatus Active 2033-08-27 US9044819B2 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2011-261578 2011-11-30
JP2011261578A JP5908705B2 (ja) 2011-11-30 2011-11-30 レーザー加工装置

Publications (2)

Publication Number Publication Date
US20130134142A1 US20130134142A1 (en) 2013-05-30
US9044819B2 true US9044819B2 (en) 2015-06-02

Family

ID=48465870

Family Applications (1)

Application Number Title Priority Date Filing Date
US13/677,787 Active 2033-08-27 US9044819B2 (en) 2011-11-30 2012-11-15 Laser processing apparatus

Country Status (5)

Country Link
US (1) US9044819B2 (zh)
JP (1) JP5908705B2 (zh)
KR (1) KR101957522B1 (zh)
CN (1) CN103128441B (zh)
TW (1) TWI590903B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111699069A (zh) * 2018-01-29 2020-09-22 百超激光有限公司 用于使电磁波束定形状的光学装置及其用途、束处理装置及其用途以及束处理方法

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6039898B2 (ja) * 2011-12-09 2016-12-07 株式会社ディスコ レーザー加工装置
JP6636756B2 (ja) * 2015-09-10 2020-01-29 株式会社東芝 光学装置及び加工装置
KR20180083548A (ko) * 2017-01-13 2018-07-23 제일엠텍(주) 편평도 측정에 의한 실시간 초점 조절 구조의 레이저 마킹 장치
JP7098284B2 (ja) * 2017-07-06 2022-07-11 株式会社ディスコ レーザー加工装置およびレーザー加工方法
CN111050978B (zh) * 2017-09-11 2022-05-17 松下知识产权经营株式会社 激光装置
JP7285694B2 (ja) * 2019-05-23 2023-06-02 株式会社ディスコ レーザー加工装置の光軸調整方法
JP2021089383A (ja) * 2019-12-05 2021-06-10 株式会社ディスコ レーザービーム調整機構およびレーザー加工装置
WO2022205082A1 (en) * 2021-03-31 2022-10-06 Yangtze Memory Technologies Co., Ltd. Laser system for dicing semiconductor structure and operation method thereof

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10213415A (ja) * 1997-01-28 1998-08-11 Fuji Xerox Co Ltd 光ビーム測定装置
JP2006051517A (ja) 2004-08-11 2006-02-23 Disco Abrasive Syst Ltd レーザー加工方法
US20070181546A1 (en) * 2003-10-17 2007-08-09 Gsi Lumonics Corporation Flexible scan field
US20090032510A1 (en) * 2005-06-01 2009-02-05 Phoeton Corp. Laser Processing Apparatus and Laser Processing Method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN85105136A (zh) * 1985-07-05 1986-12-31 西屋电气公司 用于激光焊接系统的光束调整系统
JPS6483394A (en) * 1987-09-25 1989-03-29 Toshiba Corp Laser beam machine
US4844574A (en) * 1988-07-05 1989-07-04 General Electric Company Optical fiber output coupler for a power laser
JP2970927B2 (ja) * 1990-05-23 1999-11-02 株式会社アマダ レーザビームのコリメート装置
JPH05281038A (ja) * 1992-03-30 1993-10-29 Hitachi Constr Mach Co Ltd パルスレーザ光の光強度分布測定装置
JP2000005893A (ja) * 1998-06-26 2000-01-11 Mitsubishi Heavy Ind Ltd レーザ加工装置
JP2007330995A (ja) * 2006-06-15 2007-12-27 Ricoh Co Ltd レーザ加工装置とレーザ加工方法とそれにより加工された液滴吐出ヘッド及び画像形成装置
JP5133568B2 (ja) * 2007-01-11 2013-01-30 株式会社ディスコ レーザー加工装置
JP5199789B2 (ja) * 2008-08-25 2013-05-15 株式会社ディスコ レーザー加工装置及びレーザー加工方法
JP5139922B2 (ja) * 2008-08-25 2013-02-06 株式会社ディスコ レーザー加工装置

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH10213415A (ja) * 1997-01-28 1998-08-11 Fuji Xerox Co Ltd 光ビーム測定装置
US20070181546A1 (en) * 2003-10-17 2007-08-09 Gsi Lumonics Corporation Flexible scan field
JP2006051517A (ja) 2004-08-11 2006-02-23 Disco Abrasive Syst Ltd レーザー加工方法
US20090032510A1 (en) * 2005-06-01 2009-02-05 Phoeton Corp. Laser Processing Apparatus and Laser Processing Method

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN111699069A (zh) * 2018-01-29 2020-09-22 百超激光有限公司 用于使电磁波束定形状的光学装置及其用途、束处理装置及其用途以及束处理方法
CN111699069B (zh) * 2018-01-29 2021-10-26 百超激光有限公司 用于使电磁波束定形状的光学装置及其用途、束处理装置及其用途以及束处理方法

Also Published As

Publication number Publication date
US20130134142A1 (en) 2013-05-30
JP5908705B2 (ja) 2016-04-26
TW201325794A (zh) 2013-07-01
JP2013111630A (ja) 2013-06-10
KR20130061061A (ko) 2013-06-10
CN103128441A (zh) 2013-06-05
CN103128441B (zh) 2016-03-02
KR101957522B1 (ko) 2019-03-12
TWI590903B (zh) 2017-07-11

Similar Documents

Publication Publication Date Title
US9044819B2 (en) Laser processing apparatus
US8124909B2 (en) Laser processing apparatus
TWI658664B (zh) Laser processing device
US9186749B2 (en) Laser processing apparatus
US8040520B2 (en) Device for detecting the edges of a workpiece, and a laser beam processing machine
US20120111840A1 (en) Laser processing apparatus
JP5243098B2 (ja) レーザー加工装置
US9656348B2 (en) Laser processing apparatus
US9656347B2 (en) Laser processing method for forming a laser processed hole in a work piece
US9421643B2 (en) Laser processing apparatus
KR102418418B1 (ko) 레이저 가공 장치
US9095931B2 (en) Laser processing method and laser processing apparatus
US9895768B2 (en) Laser processing apparatus
US9085046B2 (en) Laser beam applying mechanism and laser processing apparatus
JP5985896B2 (ja) ウエーハの加工方法およびレーザー加工装置
JP2010052014A (ja) レーザー加工装置
US9149886B2 (en) Modified layer forming method
US9289857B2 (en) Laser processing apparatus
US9289853B2 (en) Laser beam applying apparatus
JP6113477B2 (ja) ウエーハのレーザー加工方法およびレーザー加工装置
US20130115756A1 (en) Processing method for semiconductor wafer having passivation film on the front side thereof
JP2007190587A (ja) レーザー加工装置
JP2016096241A (ja) レーザー発振機構
JP2013119117A (ja) レーザー加工装置

Legal Events

Date Code Title Description
AS Assignment

Owner name: DISCO CORPORATION, JAPAN

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNOR:MORIKAZU, HIROSHI;REEL/FRAME:029304/0250

Effective date: 20121101

STCF Information on status: patent grant

Free format text: PATENTED CASE

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 4

MAFP Maintenance fee payment

Free format text: PAYMENT OF MAINTENANCE FEE, 8TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1552); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY

Year of fee payment: 8