US8989899B2 - Transfer system - Google Patents
Transfer system Download PDFInfo
- Publication number
- US8989899B2 US8989899B2 US13/607,806 US201213607806A US8989899B2 US 8989899 B2 US8989899 B2 US 8989899B2 US 201213607806 A US201213607806 A US 201213607806A US 8989899 B2 US8989899 B2 US 8989899B2
- Authority
- US
- United States
- Prior art keywords
- robot
- workpiece
- temperature
- hand
- transfer system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related, expires
Links
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67766—Mechanical parts of transfer devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J13/00—Controls for manipulators
- B25J13/08—Controls for manipulators by means of sensing devices, e.g. viewing or touching devices
- B25J13/087—Controls for manipulators by means of sensing devices, e.g. viewing or touching devices for sensing other physical parameters, e.g. electrical or chemical properties
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25J—MANIPULATORS; CHAMBERS PROVIDED WITH MANIPULATION DEVICES
- B25J9/00—Programme-controlled manipulators
- B25J9/02—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type
- B25J9/04—Programme-controlled manipulators characterised by movement of the arms, e.g. cartesian coordinate type by rotating at least one arm, excluding the head movement itself, e.g. cylindrical coordinate type or polar coordinate type
- B25J9/041—Cylindrical coordinate type
- B25J9/042—Cylindrical coordinate type comprising an articulated arm
- B25J9/043—Cylindrical coordinate type comprising an articulated arm double selective compliance articulated robot arms [SCARA]
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
- H01L21/67763—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading
- H01L21/67778—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations the wafers being stored in a carrier, involving loading and unloading involving loading and unloading of wafers
- H01L21/67781—Batch transfer of wafers
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68707—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a robot blade, or gripped by a gripper for conveyance
Landscapes
- Engineering & Computer Science (AREA)
- Robotics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Mechanical Engineering (AREA)
- Human Computer Interaction (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Manipulator (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012005332A JP5609896B2 (ja) | 2012-01-13 | 2012-01-13 | 搬送システム |
JP2012-005332 | 2012-01-13 |
Publications (2)
Publication Number | Publication Date |
---|---|
US20130184862A1 US20130184862A1 (en) | 2013-07-18 |
US8989899B2 true US8989899B2 (en) | 2015-03-24 |
Family
ID=48751249
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US13/607,806 Expired - Fee Related US8989899B2 (en) | 2012-01-13 | 2012-09-10 | Transfer system |
Country Status (5)
Country | Link |
---|---|
US (1) | US8989899B2 (ja) |
JP (1) | JP5609896B2 (ja) |
KR (1) | KR101503120B1 (ja) |
CN (1) | CN103203738B (ja) |
TW (1) | TWI495608B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2015098153A1 (ja) * | 2013-12-26 | 2015-07-02 | 川崎重工業株式会社 | エンドエフェクタおよび基板搬送ロボット |
WO2016038656A1 (ja) * | 2014-09-08 | 2016-03-17 | 株式会社安川電機 | ロボットシステムおよび搬送方法 |
JP7136067B2 (ja) * | 2019-11-27 | 2022-09-13 | 株式会社安川電機 | ロボットシステム |
CN116000955B (zh) * | 2023-03-23 | 2023-06-09 | 无锡展硕科技有限公司 | 一种具有偏压调节夹持功能的免损伤式机械手 |
Citations (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH04262555A (ja) | 1991-02-15 | 1992-09-17 | Tokyo Electron Ltd | 処理装置 |
US5297910A (en) * | 1991-02-15 | 1994-03-29 | Tokyo Electron Limited | Transportation-transfer device for an object of treatment |
JP2960151B2 (ja) | 1990-11-14 | 1999-10-06 | 積水化学工業株式会社 | Frp管継手成形用内型およびこの内型を用いたfrp管継手の成形・脱型方法 |
US6054181A (en) * | 1993-10-29 | 2000-04-25 | Tokyo Electron Limited | Method of substrate processing to form a film on multiple target objects |
JP2002110761A (ja) | 2000-05-04 | 2002-04-12 | Applied Materials Inc | 温度感知用途を有するロボット用装置及び方法 |
JP2002343847A (ja) | 2001-05-18 | 2002-11-29 | Nec Yamaguchi Ltd | ウェハ搬送装置 |
TW516154B (en) | 2000-12-15 | 2003-01-01 | Yaskawa Denki Seisakusho Kk | Robot for carrying substrates |
US20030035711A1 (en) | 2001-07-14 | 2003-02-20 | Ulysses Gilchrist | Centering double side edge grip end effector with integrated mapping sensor |
JP2003179119A (ja) | 2002-08-20 | 2003-06-27 | Yaskawa Electric Corp | 基板搬送用ロボット |
US20030190823A1 (en) * | 2002-04-05 | 2003-10-09 | Keeton Tony J. | Method of loading a wafer onto a wafer holder to reduce thermal shock |
JP2004356295A (ja) | 2003-05-28 | 2004-12-16 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
US6877946B2 (en) * | 2001-07-13 | 2005-04-12 | Axcelis Technologies, Inc. | Wafer transport apparatus |
JP2009078805A (ja) | 2007-09-25 | 2009-04-16 | Wat Automotive Systems Ag | シート調節機能付き多種部品集積モジュール |
JP2011205044A (ja) | 2010-03-26 | 2011-10-13 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1263584C (zh) * | 2001-06-25 | 2006-07-12 | 林武秀 | 半导体或液晶晶片单片运送和转移装载系统 |
CN101627467B (zh) * | 2007-03-02 | 2011-04-27 | 株式会社大亨 | 搬送装置 |
JP4359640B2 (ja) * | 2007-09-25 | 2009-11-04 | 東京エレクトロン株式会社 | 基板搬送装置及びダウンフロー制御方法 |
-
2012
- 2012-01-13 JP JP2012005332A patent/JP5609896B2/ja not_active Expired - Fee Related
- 2012-09-10 US US13/607,806 patent/US8989899B2/en not_active Expired - Fee Related
- 2012-10-11 TW TW101137453A patent/TWI495608B/zh not_active IP Right Cessation
- 2012-10-23 KR KR1020120118063A patent/KR101503120B1/ko not_active IP Right Cessation
- 2012-10-23 CN CN201210405661.3A patent/CN103203738B/zh not_active Expired - Fee Related
Patent Citations (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2960151B2 (ja) | 1990-11-14 | 1999-10-06 | 積水化学工業株式会社 | Frp管継手成形用内型およびこの内型を用いたfrp管継手の成形・脱型方法 |
JPH04262555A (ja) | 1991-02-15 | 1992-09-17 | Tokyo Electron Ltd | 処理装置 |
US5297910A (en) * | 1991-02-15 | 1994-03-29 | Tokyo Electron Limited | Transportation-transfer device for an object of treatment |
US6054181A (en) * | 1993-10-29 | 2000-04-25 | Tokyo Electron Limited | Method of substrate processing to form a film on multiple target objects |
JP2002110761A (ja) | 2000-05-04 | 2002-04-12 | Applied Materials Inc | 温度感知用途を有するロボット用装置及び方法 |
TW516154B (en) | 2000-12-15 | 2003-01-01 | Yaskawa Denki Seisakusho Kk | Robot for carrying substrates |
JP2002343847A (ja) | 2001-05-18 | 2002-11-29 | Nec Yamaguchi Ltd | ウェハ搬送装置 |
US6877946B2 (en) * | 2001-07-13 | 2005-04-12 | Axcelis Technologies, Inc. | Wafer transport apparatus |
US6969227B2 (en) * | 2001-07-13 | 2005-11-29 | Axcolis Technologies, Inc. | Wafer transport apparatus |
JP2004535681A (ja) | 2001-07-14 | 2004-11-25 | ブルックス オートメーション インコーポレイテッド | 統合マッピングセンサを備えた中心位置決め用両側エッジグリップ・エンドエフェクタ |
US20030035711A1 (en) | 2001-07-14 | 2003-02-20 | Ulysses Gilchrist | Centering double side edge grip end effector with integrated mapping sensor |
US20030190823A1 (en) * | 2002-04-05 | 2003-10-09 | Keeton Tony J. | Method of loading a wafer onto a wafer holder to reduce thermal shock |
JP2003179119A (ja) | 2002-08-20 | 2003-06-27 | Yaskawa Electric Corp | 基板搬送用ロボット |
JP2004356295A (ja) | 2003-05-28 | 2004-12-16 | Dainippon Screen Mfg Co Ltd | 基板処理装置および基板処理方法 |
JP2009078805A (ja) | 2007-09-25 | 2009-04-16 | Wat Automotive Systems Ag | シート調節機能付き多種部品集積モジュール |
JP2011205044A (ja) | 2010-03-26 | 2011-10-13 | Tokyo Electron Ltd | 基板搬送装置及び基板処理装置 |
Non-Patent Citations (5)
Title |
---|
Chinese Office Action for corresponding CN Application No. 201210405661.3, 08-28-20104. |
Japanese Decision of a Patent Grant for corresponding JP Application No. 2012-005332, Aug. 5, 2014. |
Japanese Office Action for corresponding JP Application No. 2012-005332, Nov. 26, 2013. |
Korean Office Action for corresponding KR Application No. 10-2012-0118063, Jul. 3, 2014. |
Taiwanese Office Action for corresponding TW Application No. 101137453, Jan. 15, 2015. |
Also Published As
Publication number | Publication date |
---|---|
TW201331111A (zh) | 2013-08-01 |
KR20130083809A (ko) | 2013-07-23 |
TWI495608B (zh) | 2015-08-11 |
US20130184862A1 (en) | 2013-07-18 |
CN103203738B (zh) | 2015-09-30 |
JP2013145797A (ja) | 2013-07-25 |
KR101503120B1 (ko) | 2015-03-16 |
JP5609896B2 (ja) | 2014-10-22 |
CN103203738A (zh) | 2013-07-17 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AS | Assignment |
Owner name: KABUSHIKI KAISHA YASKAWA DENKI, JAPAN Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:ANDO, RYUJI;HINO, KAZUNORI;KATSUDA, SHINICHI;SIGNING DATES FROM 20120830 TO 20120903;REEL/FRAME:028922/0459 |
|
STCF | Information on status: patent grant |
Free format text: PATENTED CASE |
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MAFP | Maintenance fee payment |
Free format text: PAYMENT OF MAINTENANCE FEE, 4TH YEAR, LARGE ENTITY (ORIGINAL EVENT CODE: M1551); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY Year of fee payment: 4 |
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FEPP | Fee payment procedure |
Free format text: MAINTENANCE FEE REMINDER MAILED (ORIGINAL EVENT CODE: REM.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
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LAPS | Lapse for failure to pay maintenance fees |
Free format text: PATENT EXPIRED FOR FAILURE TO PAY MAINTENANCE FEES (ORIGINAL EVENT CODE: EXP.); ENTITY STATUS OF PATENT OWNER: LARGE ENTITY |
|
STCH | Information on status: patent discontinuation |
Free format text: PATENT EXPIRED DUE TO NONPAYMENT OF MAINTENANCE FEES UNDER 37 CFR 1.362 |
|
FP | Lapsed due to failure to pay maintenance fee |
Effective date: 20230324 |