US8730723B2 - Structures and methods of high efficient bit conversion for multi-level cell non-volatile memories - Google Patents
Structures and methods of high efficient bit conversion for multi-level cell non-volatile memories Download PDFInfo
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- US8730723B2 US8730723B2 US13/417,655 US201213417655A US8730723B2 US 8730723 B2 US8730723 B2 US 8730723B2 US 201213417655 A US201213417655 A US 201213417655A US 8730723 B2 US8730723 B2 US 8730723B2
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C11/00—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor
- G11C11/56—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency
- G11C11/5621—Digital stores characterised by the use of particular electric or magnetic storage elements; Storage elements therefor using storage elements with more than two stable states represented by steps, e.g. of voltage, current, phase, frequency using charge storage in a floating gate
- G11C11/5642—Sensing or reading circuits; Data output circuits
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/04—Erasable programmable read-only memories electrically programmable using variable threshold transistors, e.g. FAMOS
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/26—Sensing or reading circuits; Data output circuits
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11C—STATIC STORES
- G11C16/00—Erasable programmable read-only memories
- G11C16/02—Erasable programmable read-only memories electrically programmable
- G11C16/06—Auxiliary circuits, e.g. for writing into memory
- G11C16/34—Determination of programming status, e.g. threshold voltage, overprogramming or underprogramming, retention
Definitions
- This invention relates to a scheme to resolve and convert Multi-Level Cell (MLC) Non-Volatile Memory (NVM) into multi-bits per NVM cell.
- MLC Multi-Level Cell
- NVM Non-Volatile Memory
- the MLC threshold voltages are divided into several threshold voltage groups containing multiple threshold voltage sub-groups.
- the multiple threshold voltage subgroups in each group are sensed and resolved by applying one correspondent gate voltage to each one of the main groups.
- the multi-bit information in NVM cells can be accurately and efficiently obtained.
- NVM Non-Volatile Memory
- EEPROM Electrically Erasable, Programmable Read-Only Memories
- NVM Non-Volatile Memory
- EEPROM Electrically Erasable, Programmable Read-Only Memories
- flash EEPROM may be regarded as a specifically configured EEPROM that may be erased only on a global or sector-by-sector basis.
- Data is stored in an EEPROM cell by modulating its threshold voltage, V th , of the Metal-Oxide-Semiconductor Field Effect Transistor (MOSFET) through the injection of charge carriers into the charge-storage layer from the channel of the MOSFET.
- MOSFET Metal-Oxide-Semiconductor Field Effect Transistor
- V th threshold voltage
- an accumulation of electrons in the floating gate, or in a dielectric layer above the FET channel region causes the MOSFET to exhibit a relatively high threshold voltage V th .
- SLC Single Level Cell
- multi-bit information stored in NVM cell is represented by the states of multiple NVM cell threshold voltage levels.
- the threshold voltage levels of MLC cells are sensed by applying a single gate voltage or multiple gate voltages to the gates of NVM cells with voltage biases on the source and drain electrodes of NVM cells, respectively.
- One conventional way of reading out bit information in MLC NVM cells is the single gate voltage scheme, where a constant gate voltage is applied to the gates of MLC NVM cells with biased source and drain. Since the response currents of NVM cells are the function of voltage difference between the applied gate voltage and threshold voltage of NVM cell, V g ⁇ V th , the states of MLC NVM cells can be determined by directly comparing the cell responding current with several preset reference currents. For the example of a two-bit MLC NVM cells in NOR-type flash, the threshold voltages of NVM cells are divided into four groups for representing (11), (10), (01), and (00) as shown in FIG. 1 .
- a constant gate voltage V a between the groups of threshold voltages of (01) and (00) is applied to the gates of MLC NVM cells.
- the NVM cell response currents are I D(11) >I D(10) >I D(01) >I D(00) for the voltage differences of V a ⁇ V th(11) >V a ⁇ V th(10) >V a ⁇ V th(01) >V a ⁇ V th(00) , where I D(11) , I D(10) , I D(01) , I D(00) , and V th(11) , V th(10) , V th(01) , V th(00) are the response currents and the threshold voltages for the four groups, respectively.
- the currents for the groups of (11), (10), and (01) are the “on” currents while the current for group of (00) is the “near-on or off” current for the threshold voltage near the applied voltage V a as shown in FIG. 1 .
- Three reference currents are chosen in between the cell response currents of the four groups of NVM cells applied with the gate voltage V a . By comparing the cell response currents with the three reference currents under the condition of applying gate voltage V a to the gates of NVM cells, the threshold voltages of MLC NVM cells can be determined to be in the specific belonging group and consequently converted to the stored bit information by their representing state of the NVM cells.
- the resolvable threshold voltage range with a single applied gate voltage is around few volts for a typical NOR-type flash.
- Another conventional way of reading out bit information in MLC NVM cells is the varying step gate voltage scheme where multiple gate voltages are applied to the gates of MLC NVM cells.
- an applied gate voltage is greater than the threshold voltages of the NVM cells, the NVM cells are turned “on”, and while an applied gate voltage is less than the threshold voltages of the NVM cells the NVM cells are “off”.
- the “on” and “off” states are sensed by a “on” current regardless the amounts of the “on” currents from the voltage differences of the applied gate voltage and the cell threshold voltages.
- information coming out from the output of the sense amplifier for an NVM cell indicates that the threshold voltages of NVM cells are greater (or less) than the applied gate voltage.
- DAC Digital-to-Analog Converter
- the total 15-step gate voltage sequence to read out the storing bits in the MLC NVM cells requires more than several microseconds (>10 ⁇ 6 s) in contrast to about a hundred nanoseconds ( ⁇ 10 ⁇ 7 s) of a typical 2-bit per cell NOR-type MLC flash.
- the threshold voltages of NVM cells are programmed into “P ⁇ 1” threshold voltage levels and one erased threshold voltage level as indicated in FIG. 3 , where P is an integer.
- the number of bits per NVM cell in this device system is given by log 2 (P).
- the “N” multiple applied gate voltages correspondent to the “N” threshold voltage groups in the MLC NVM system are assigned to be the states of a first bit format, where the number of the bits is given by log 2 (N).
- the “M” threshold voltage states in each group are represented in a second bit format, where the number of bits is given by log 2 (M).
- log 2 (P) log 2 (N)+log 2 (M), where log 2 (N) ⁇ 0 and log 2 (M) ⁇ 0.
- “M+1” reference currents including the low and high reference current bounds are applied to resolve “M” threshold voltage levels of the MLC NVM within each threshold voltage group of “N” groups in respect to their correspondent gate voltages.
- I D V aj ⁇ V thk
- the NVM cell currents are “off”.
- the device threshold current defining the NVM cell “on” and “off” are chosen to be the low bound reference current. This low bound reference current is used to separate the target threshold voltage groups from higher threshold voltage levels in response to the applied gate voltage V aj .
- the NVM cells' “on” currents are further divided into “M” sub-groups by choosing “M ⁇ 1” reference currents in between the cells' response “on” currents with the applied gate voltage V aj .
- the high bound reference current is used to separate the target threshold voltage groups from lower threshold voltage levels in response to the applied gate voltage V aj .
- a gate switch enables the bits representing the “j” group (i.e., the target group) of NVM threshold voltages to write into the first part of read buffers (log 2 N bits) and the bits representing the states of “M” threshold voltage sub-groups to write into the second part of read buffers (log 2 M bits). Meanwhile the cells' response currents to the applied gate voltage V aj for the “M” states of the NVM threshold voltage levels are sensed and compared with the “M ⁇ 1” reference currents.
- the states of the NVM threshold voltage levels in the target group are converted into bits and ready to be written into the second part of the read buffers.
- FIG. 1 illustrates the threshold voltage level distribution and the single applied gate voltage for a 2-bit per cell MLC in the conventional NOR-type flash.
- FIG. 2 illustrates the threshold voltage level distribution and the multiple applied gate voltages for a 2-bit per cell MLC in the conventional NAND-type flash.
- FIG. 5 shows a schematic diagram for the embodiment in FIG. 4 .
- FIG. 7 shows a schematic diagram for the embodiment in FIG. 6 .
- FIG. 9 shows a schematic diagram for the embodiment in FIG. 8 .
- the present invention includes methods and schematics to achieve multi-bit reading in a single semiconductor NVM cell.
- the schematic diagram is shown in FIG. 5 , where two bit data buffers 510 and 512 are represented by Q 0 and Q 1 , i.e., (Q 0 Q 1 ) for the four threshold voltage groups.
- the data buffers 510 and 512 are written by bit datum from a status register 580 using a digital value to represent the two states of applied gate voltages and the result of level comparator 554 to identify the state of NVM cell 570 responding currents, respectively.
- Gate switches 520 and 522 for passing the one bit of applied gate-voltage status register data and one bit of level comparator result to the data buffers 510 and 512 are turned on by the logic condition that the NVM cells' response currents to the applied gate voltage V aj is within the range of the low bound reference R LB and the high bound reference R HB .
- the values of the applied gate voltage status register 580 are given by “1” for applying gate voltage V a0 and “0” for applying gate voltage V a1 , respectively.
- the level comparator 554 compares the NVM cells' response currents to an applied gate voltage V aj with a level reference current R L .
- the level comparator 554 is designed to output “high” (logic “1”) and “low” (logic “0”) for the cells' response currents greater and lower than the level reference current R L , respectively.
- the low bound comparator 550 is designed to output “high” (logic “1”) for cells' response currents greater than the low bound reference current R LB and the high bound comparator 552 is designed to output “high” (logic “1”) for cells' response currents less than the high bound reference current R HB .
- the output signals of the low bound comparator 550 and the high bound comparator 552 are fed into a logic “AND” gate 530 to control the gate switches 520 and 522 .
- the AND gate 530 switches “on” the gate switches 520 and 522 .
- the read sequence first applies gate voltage V a0 to the gates of NVM cells 570 and the value of the status register 580 is “1”. Since the response currents for the group of NVM threshold voltages (11) to the applied voltage V a0 are between the low and high bound reference currents and larger than the level reference current R L , Q 0 obtains the digital value “1” from the status register 580 and Q 1 obtains the digital value “1” from the output “1” of the level comparator 554 .
- the response currents to the applied voltage V a1 for the groups of NVM threshold voltages (11) and (01) are greater than the high bound reference current R HB .
- the gate switches 520 and 522 are “off”, and the status register 580 value (“0”) and the output “1” of the level comparator 554 cannot be over-written into Q 0 and Q 1 .
- Q 0 and Q 1 for groups (11) and (01) retain their previous values.
- the response currents to the applied voltage V a1 are between the low and high bound reference currents and larger than the level reference current R L .
- the gate switches 520 and 522 for the group (01) are switched “on”, Q 0 writes the digital value “0” from the status register 580 and Q 1 writes the digital value “1” from the output “1” of the level comparator 554 .
- the response currents to the applied voltage V a1 are between the low and high bound reference currents and less than the level reference current R L .
- the gate switches 520 and 522 are switched “on” for the group (00).
- Q 0 writes the digital value “0” from the status register 580 and Q 1 writes the digital value “0” from the output “0” of the level comparator 554 .
- the schematic diagram is shown in FIG. 7 , where three bit data buffers 710 , 712 , and 714 are represented by Q 0 , Q 1 , Q 2 , i.e., (Q 0 Q 1 Q 2 ) for the eight threshold voltage groups.
- the data buffers 710 , 712 and 714 are written by bit datum from the output node 781 of a one-bit status register 780 representing the two states of two applied gate voltages V aj , and from the two-bit output nodes 731 and 732 of three level comparators 754 , 756 , and 758 .
- Gate switches 720 , 722 , and 724 for passing the status register data and the two-bit outputs at the two-bit output nodes 731 and 732 of level comparators 754 , 756 , and 758 , to the data buffers 710 , 712 , and 714 are turned on by the logic condition that the NVM cells' response currents to an applied gate voltage are in the range of the low bound reference current R LB and the high bound reference current R HB .
- the value of the applied gate voltage status register 780 is given by “1” for applying gate voltage V a0 and “0” for applying gate voltage V a1 , respectively.
- Three level comparators 754 , 756 , and 758 compares the NVM cells' response currents to an applied gate voltage V aj with three level reference currents, R L0 , R L1 , and R L2 , where R L0 >R L1 >R L2 .
- the level comparators 754 , 756 , and 758 are designed to output “high” (logic “1”) when the cells' response currents are greater than the level reference currents and vice versa.
- one of the output signals at the output nodes 741 and 742 of two level comparators 756 and 758 is passed to the input node 732 of gate switch 724 . If the threshold voltages of the NVM cells belong to the smaller threshold voltages groups (response currents larger than R L1 ), the output signal of level comparator 756 is passed to the input node 732 of switch 724 . The output signal of level comparator 758 is passed to the input node 732 of the switch 724 for the larger threshold voltage groups of the NVM cells (response currents less than R L1 ).
- the low bound comparator 750 is designed to output “high” (logic “1”) for cells' response currents greater than the low bound reference current R LB and the high bound comparator 752 is designed to output “high” (logic “1”) for cells' response current less than the high bound reference current R HB .
- the output signals of the low bound comparator 750 and the high bound comparator 752 are fed into a logic “AND” gate 730 to control the gate switches 720 , 722 and 724 .
- the AND gate 730 switches “on” the gate switches 720 , 722 , and 724 .
- the read sequence first applies gate voltage V a0 to the gates of NVM cells 770 and the value of the status register 780 is “1”. Since the responding currents for the target groups (111), (110), (101), and (100) of NVM threshold voltages to the applied voltage V a0 are between the low and high bound reference currents, the switches 720 , 722 , and 724 for passing the bit datum to Q 0 , Q 1 and Q 2 are turned “on” only for the target groups (111), (110), (101), and (100). Q 0 obtains the digital value “1” from the one bit applied gate-voltage status register 780 .
- the data buffer Q 1 obtains either “1” or “0” from the output signals of level comparators 756 with reference current R L0 for threshold voltage groups (11x) and (10x), respectively, where x indicates either “1” or “0”. Meanwhile at this applied voltage V a0 , the output signals of the level comparators 756 with reference current R L0 are “1” for group (111) and “0” for all other groups. The output signals of the level comparators 758 with reference R L2 are “1” for groups (111), (110), and (101), and “0” for all the other groups.
- the data buffer Q 2 obtains the digital value either from the output node 741 of the level comparators 756 , when the level comparator 754 generates an output value “1”, or from the output node 742 of the level comparator 758 , when the level comparator 754 generates an output value “0”, respectively.
- the data buffers Q 1 and Q 2 are written with “1” and “1” for group (111), “1” and “0” for group (110), “0” and “1” for group (101), and “0” and “0” for group (100).
- the outputs of three level comparators 754 , 756 , 758 are “0s”. Since the responding currents for NVM threshold voltage groups (0xx) with the applied gate voltage V a0 are smaller than the lower bound reference currents R LB , the switches 720 , 722 , and 724 are “off” to prevent passing the applied gate-voltage status bit and the output signals of level comparators 754 , 756 , and 758 to the data buffers Q 0 , Q 1 and Q 2 .
- the response currents to the applied voltage V a1 for the groups (111), (110), (101), and (100) of NVM threshold voltages are greater than the high bound reference current R HB .
- the gate switches 720 , 722 , and 724 are “off” and no datum can be over-written into Q 0 , Q 1 , and Q 2 .
- the buffers Q 0 , Q 1 , and Q 2 for the groups (111), (110), (101), and (100) of NVM threshold voltages retain their previous values at this applied gate voltage stage.
- the gate switches 720 , 722 , and 724 are “on” and ready to pass the status register bit “0” and the output signals of level comparators 754 , 756 , 758 into buffers Q 0 , Q 1 , and Q 2 .
- Q 0 is written to “0” by the bit in the status register 780 for applying gate voltage V a1 .
- Q 1 is written by the data from the output of level comparator 754 .
- Q 2 is written either from the output node 741 of level comparator 756 , when the level comparator 754 generates an output value “1” or from the output node 742 of level comparator 758 , when the level comparator 754 generates an output value “0”, respectively.
- the values of Q 0 , Q 1 , and Q 2 are “0”, “1”, and “1” for the group of NVM cell threshold voltages (011); the values of Q 0 , Q 1 , and Q 2 are “0”, “1”, and “0” for the group of NVM cell threshold voltages (010); the values of Q 0 , Q 1 , and Q 2 are “0”, “0”, and “1” for the group of NVM cell threshold voltages (001); the values of Q 0 , Q 1 , and Q 2 are “0”, “0”, and “0” for the group of NVM cell threshold voltages (000).
- the read sequence is completed.
- the data buffers 710 , 712 and 714 correctly present the storing bits in the probed MLC NVM cells.
- the time required to sense and determine the response current levels of NVM cells 770 for an applied gate voltage is about 30 nanoseconds.
- the total time to read out the 3-bit per MLC NVM is around 60 nanoseconds.
- the schematic diagram is shown in FIG.
- bit data buffers 910 , 912 , 914 , and 916 are represented by Q 0 , Q 1 , Q 2 , and Q 3 , i.e., (Q 0 Q 1 Q 2 Q 3 ) for the sixteen threshold voltage groups.
- the data buffers 910 , 912 , 914 and 916 are written by bit datum from the two-bit output nodes 981 and 982 of a two-bit status register 980 representing the four states of the four applied gate voltages V aj , and from the two-bit output nodes 931 and 932 of three level comparators 954 , 956 , and 958 .
- Gate switches 920 , 922 , 924 , and 926 for passing the two-bit status register datum and the two-bit data at the output nodes 931 and 932 of level comparators 954 , 956 , and 958 , to the data buffers 910 , 912 , 914 , and 916 are turned on by the logic condition that the cells' response currents to an applied gate voltage V aj are in the range of the low bound reference current R LB and the high bound reference current R HB .
- the value of the applied gate voltage status register 980 is given by “11” for applying gate voltage V a0 , “10” for applying gate voltage V a1 , “01” for applying gate voltage V a2 , and “00” for applying gate voltage V a2 .
- Three level comparators 954 , 956 , and 958 compares the cells' response currents to an applied gate voltage with three level reference currents, R L0 , R L1 , and R L2 , where R L0 >R L1 >R L2 .
- the level comparators 954 , 956 , and 958 are designed to output “high” (logic “1”) when the cells' response currents are greater than the level reference currents and vice versa.
- the output signal at either the node 941 or the node 942 is passed to the input node 932 of gate switch 926 . If the threshold voltages of the NVM cells 970 belong to the smaller threshold voltages groups (response currents larger than R L1 ), the output signal at the node 941 of the level comparator 956 is passed to the input node 932 of switch 926 . While the output signal at the node 942 of level comparator 958 is passed to the input node 932 of the switch 926 for the larger threshold voltage groups of the NVM cells (response currents less than R L1 ).
- the low bound comparator 950 is designed to output “high” (logic “1”) for cells' response current greater than the low bound reference current R LB and the high bound comparator 952 is designed to output “high” (logic “1”) for cells' response current less than the high bound reference current R HB .
- the output signals of the low bound comparator 950 and the high bound comparator 952 are fed into a logic “AND” gate 930 to control the gate switches 920 , 922 , 924 and 926 .
- the AND gate 930 switches “on” the gate switches 920 , 922 , 924 , and 926 .
- the read sequence first applies gate voltage V a0 to the gates of NVM cells 970 and the value of the status register 980 is “11”. Since the response currents for the target groups (1111), (1110), (1101), and (1100) of NVM threshold voltages to the applied voltage V a0 are between the low and high bound reference currents, the switches 920 , 922 , 924 , and 926 for passing the bit datum to Q 0 , Q 1 , Q 2 and Q 3 are turned “on” only for the groups (1111), (1110), (1101), and (1100). Q 0 and Q 1 write the digital value “11” from the two-bit applied gate-voltage status register 980 .
- the data buffer Q 2 obtains either “1” or “0” from the output signals of level comparators 954 with reference current R L1 for threshold voltage groups (111x) and (110x), respectively, where x indicates either “1” or “0”. Meanwhile at this applied voltage V a0 the output signals of the level comparators 956 are “1” for group (1111) and “0” for all other groups. The output signals of the level comparators 958 are “1” for groups (1111), (1110), and (1101), and “0” for all other groups.
- the data buffer Q 3 obtains the digital value either from the output signals of level comparators 956 , when level comparator 954 generates an output value “1”, or from the output signal of level comparator 958 , when level comparator 954 generates an output value “0”, respectively. Finally the data buffers Q 2 and Q 3 are written with “1” and “1” for group (1111), “1” and “0” for group (1110), “0” and “1” for group (1101), and “0” and “0” for group (1100), respectively.
- the output signals of level comparators 954 , 956 , and 958 for all other higher groups of (10xx), (01xx), and (00xx) are zero but not passed into the data buffers Q 2 and Q 3 .
- the response currents to the applied voltage V a1 for the groups (1111), (1110), (1101), and (1100) of NVM threshold voltages are greater than the high bound reference currents R HB .
- the gate switches 920 , 922 , 924 , and 926 are “off” and no datum can be over-written into the data buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- the data buffers Q 0 , Q 1 , Q 2 , and Q 3 for groups (1111), (1110), (1101), and (1100) of NVM threshold voltages retain their previous digital values at this applied gate voltage stage.
- the gate switches 920 , 922 , 924 and 926 are “on” and ready to pass the status register bits “ 10 ” and the output signals of level comparators 954 , 956 and 958 into buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- Q 0 and Q 1 are written to “10” by the bits of the two-bit status register 980 for applying gate voltage V a1 .
- Q 2 is written by the data from the output signal of level comparator 954 .
- Q 3 is written by the data either from the output signal of level comparator 956 , when the level comparator 954 generates an output value “1”, or from the output signal of level comparator 958 , when the level comparator 954 generates an output value “0”, respectively.
- the values of Q 0 , Q 1 , Q 2 , and Q 3 are “1”, “0”, “1” and “1” for the group of NVM cell threshold voltages (1011); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “1”, “0”, “1”, and “0” for the group of NVM cell threshold voltages (1010); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “1”, “0”, “0”, and “1” for the group of NVM cell threshold voltages (1001); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “1”, “0”, “0”, and “0” for the group of NVM cell threshold voltages (1000).
- the gate switches 920 , 922 , 924 and 926 are “off” and do not pass the datum into buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- the response currents to the applied voltage V a2 for the eight groups (11xx) and (10xx) of NVM threshold voltages are greater than the high bound reference currents R HB .
- the gate switches 920 , 922 , 924 and 926 are “off” and no datum can be over-written into the data buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- Q 0 , Q 1 , Q 2 , and Q 3 for eight groups (11xx) and (10xx) of NVM threshold voltages retain their previous digital values at this applied gate voltage stage.
- the gate switches 920 , 922 , 924 and 926 are “on” and ready to pass the status register bits “ 01 ” and the outputs of level comparators 954 , 956 and 958 into the data buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- the data buffers Q 0 and Q 1 are written to “01” by the bit of the two-bit status register 980 for applying gate voltage V a2 .
- Q 2 is written by the data from the output signal of level comparator 954 .
- Q 3 is written by the data either from the output signal of level comparator 956 , when the level comparator 954 generates an output value “1”, or from the output signal of level comparator 958 when the level comparator 954 generates an output value “0”.
- the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “1”, “1” and “1” for the group of NVM cell threshold voltages (0111); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “1”, “1”, and “0” for the group of NVM cell threshold voltages (0110); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “1”, “0”, and “1” for the group of NVM cell threshold voltages (0101); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “1”, “0”, and “0” for the group of NVM cell threshold voltages (0100).
- the gate switches 920 , 922 , 924 and 926 are “off” and do not pass the datum into buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- the response currents to the applied voltage V a3 for the twelve groups (11xx), (10xx), and (01xx) of NVM threshold voltages are greater than the high bound reference currents R HB .
- the gate switches 920 , 922 , 924 and 926 are “off” and no datum can be over-written into the data buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- the data buffers Q 0 , Q 1 , Q 2 , and Q 3 for twelve groups (11xx), (10xx), and (01xx) of NVM threshold voltages retain the previous digital values at this applied gate voltage stage.
- the gate switches 920 , 922 , 924 and 926 are “on” and ready to pass the status register bits “ 00 ” and the output signals of level comparators 954 , 956 and 958 into the data buffers Q 0 , Q 1 , Q 2 , and Q 3 .
- Q 0 and Q 1 are written to “00” by the bit of the two-bit status register 980 for applying gate voltage V a3 .
- Q 2 is written by the data from the output signal of level comparator 954 .
- Q 3 is written by the data either from the output signals of level comparator 956 , when the level comparator 954 generates an output value “1”, or from the output signal of level comparator 958 , when the level comparator 954 generates an output value “0”.
- the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “0”, “1” and “1” for the group of NVM cell threshold voltages (0011); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “0”, “1”, and “0” for the group of NVM cell threshold voltages (0010); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “0”, “0”, and “1” for the group of NVM cell threshold voltages (0001); the values of Q 0 , Q 1 , Q 2 , and Q 3 are “0”, “0”, “0”, and “0” for the group of NVM cell threshold voltages (0000).
- the read sequence is completed.
- the data buffers 910 , 912 , 914 and 916 correctly present the storing bits in the probed MLC NVM cells.
- the time required to sense and determine the response current levels of NVM cells 970 for an applied gate voltages is about 30 nanoseconds.
- the total time to read out the 4-bit per MLC NVM with 4 applied gate voltage is around 120 nanoseconds.
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US13/417,655 US8730723B2 (en) | 2012-03-12 | 2012-03-12 | Structures and methods of high efficient bit conversion for multi-level cell non-volatile memories |
KR1020130024213A KR101415390B1 (ko) | 2012-03-12 | 2013-03-07 | 멀티-레벨 셀 비휘발성 메모리들을 위한 고효율 비트 변환 방법들 및 구조들 |
CN201310074759.XA CN103310843B (zh) | 2012-03-12 | 2013-03-08 | 一种非挥发性内存结构及其数据值决定方法 |
TW102108246A TWI486956B (zh) | 2012-03-12 | 2013-03-08 | 多階儲存單元非揮發性記憶體之高效率位元轉換結構以及其方法 |
JP2013047763A JP5659257B2 (ja) | 2012-03-12 | 2013-03-11 | マルチレベルセル不揮発性メモリ(mlcnvm)の高効率ビット変換構造及びその方法 |
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JP6318575B2 (ja) * | 2013-11-21 | 2018-05-09 | 株式会社デンソー | 燃料噴射制御装置および燃料噴射システム |
CN107696613A (zh) * | 2017-09-22 | 2018-02-16 | 南通苏源化纤有限公司 | 一种含有嵌入绵纶长丝的锦纶高弹力高强度面料 |
US11342044B2 (en) | 2019-05-28 | 2022-05-24 | Nuvoton Technology Corporation | System and method for prioritization of bit error correction attempts |
US11475170B2 (en) | 2019-05-28 | 2022-10-18 | Nuvoton Technology Corporation | System and method for correction of memory errors |
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JP4338692B2 (ja) * | 2005-10-04 | 2009-10-07 | シャープ株式会社 | 半導体記憶装置および電子機器 |
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TW201337929A (zh) | 2013-09-16 |
JP5659257B2 (ja) | 2015-01-28 |
CN103310843A (zh) | 2013-09-18 |
JP2013191267A (ja) | 2013-09-26 |
CN103310843B (zh) | 2016-09-28 |
KR20130105385A (ko) | 2013-09-25 |
TWI486956B (zh) | 2015-06-01 |
KR101415390B1 (ko) | 2014-07-04 |
US20130235661A1 (en) | 2013-09-12 |
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