US7935552B2 - Ink composition and method of fabricating liquid crystal display device using the same - Google Patents

Ink composition and method of fabricating liquid crystal display device using the same Download PDF

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US7935552B2
US7935552B2 US12/613,961 US61396109A US7935552B2 US 7935552 B2 US7935552 B2 US 7935552B2 US 61396109 A US61396109 A US 61396109A US 7935552 B2 US7935552 B2 US 7935552B2
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Prior art keywords
phenol
ink composition
substrate
amino
weight
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US12/613,961
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US20100120181A1 (en
Inventor
Sung-Hee Kim
Soon-Sung Yoo
Jin-Wuk Kim
Byung-Geol Kim
Byung-Uk Kim
Ki-Beom Lee
Byong-Hoo Kim
Seung-Hyup Shin
Jun-Youg Song
Myoung-Soo Lee
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LG Display Co Ltd
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LG Display Co Ltd
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Assigned to LG DISPLAY CO., LTD. reassignment LG DISPLAY CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KIM, BYONG-HOO, KIM, BYUNG-UK, LEE, KI-BEOM, LEE, MYOUNG-SOO, SONG, JUN-YOUG, KIM, BYUNG-GEOL, KIM, JIN-WUK, KIM, SUNG-HEE, YOO, SOON-SUNG, SHIN, SEUNG-HYUP
Publication of US20100120181A1 publication Critical patent/US20100120181A1/en
Priority to US13/090,895 priority Critical patent/US20110224335A1/en
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Priority to US14/532,186 priority patent/US9169409B2/en
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    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C09D11/033—Printing inks characterised by features other than the chemical nature of the binder characterised by the solvent
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping

Definitions

  • the present invention relates to ink composition, and particularly, to an ink composition with high heat resistance for imprint lithography and roll printing, capable of forming accurate fine patterns, and a method of fabricating a liquid crystal display (LCD) device using the same.
  • ink composition and particularly, to an ink composition with high heat resistance for imprint lithography and roll printing, capable of forming accurate fine patterns, and a method of fabricating a liquid crystal display (LCD) device using the same.
  • LCD liquid crystal display
  • a liquid crystal display (LCD) device is to display images by using optical anisotropic property of liquid crystal.
  • the LCD device is excellent in resolution, color rendering property, image quality and the like, and thus widely being applied to notebooks, desktop monitors and the like.
  • the LCD device includes a color filter substrate, an array substrate, and a liquid crystal layer interposed between the color filter substrate and the array substrate.
  • An active matrix method which is a normally used driving method in the LCD device, is configured to drive liquid crystal of pixel units by employing amorphous silicon thin film transistors (a-Si TFTs) as switching devices.
  • a-Si TFTs amorphous silicon thin film transistors
  • FIG. 1 is a disassembled perspective view schematically showing a related art LCD device.
  • the LCD device includes a color filter substrate 5 , an array substrate 10 , and a liquid crystal layer 30 interposed between the color filter substrate 5 and the array substrate 10 .
  • the color filter substrate 5 is provided with a color filter C having a plurality of sub color filters 7 for rendering red (R), green (G) and blue (B) colors, a black matrix 6 for dividing between adjacent sub color filters 7 and blocking light transmitted through the liquid crystal layer 30 , and a transparent common electrode 8 for applying a voltage to the liquid crystal layer 30 .
  • the array substrate 10 is provided with a plurality of gate lines 16 and data lines 17 arranged in horizontal and vertical directions for defining a plurality of pixel regions P, thin film transistor T as switching devices formed at intersections between the gate lines 16 and the data lines 17 , and pixel regions 18 formed on the respective pixel regions P.
  • the color filter substrate 5 and the array substrate 10 having such structure are attached to face each other by a sealant (not shown) formed at an outer periphery of an image display region, thereby constructing an LCD panel.
  • the attachment between the color filter substrate 5 and the array substrate 10 may be implemented by an attachment key (not shown) formed either at the color filter substrate 5 or at the array substrate 10 .
  • the fabrication of the LCD device includes plural times of a photolithography process required to produce the array substrate having TFTs.
  • the photolithography process conducted to form fine patterns using light is performed.
  • the photolithography process denotes a series of processes by which patterns printed on a mask are transferred on a thin film-deposited substrate so as to form desired patterns.
  • the photolithography process is implemented through a plurality of complicated processes including photoresist coating, alignment and exposure, development and the like.
  • a pattern-formed photomask is aligned with the thin film and then exposed to light.
  • the photomask used is divided into a preset transparent region and a blocking region. Light transmitted through the transparent region may chemically change the photoresist.
  • the chemical change in the photoresist may depend on a type of photoresist.
  • regions exposed to light become soluble in a developer solution.
  • regions exposed to light become insoluble in the developer solution.
  • the description will exemplarily be given herein of the case of using the positive photoresist.
  • the exposed regions of the photoresist are removed by a developer solution, thereby generating preset photoresist patterns on the thin film.
  • the thin film is etched to be conformable with the photoresist patterns and the rest of photoresist patterns are then removed, thereby making a preset form of thin film patterns.
  • a linewidth of a circuit or pattern is determined according to wavelength of light used in the exposure process. Considering the current technical standard, it is difficult to form fine patterns less than 70 nm on a substrate through the photolithography process due to light interference.
  • the imprint lithography is a method, initially invented by Stephen Chou et al. from the Princeton University in the United States, for carving nano-scaled patterns.
  • desired forms are previously made on a surface of inorganic material or polymer with relatively strong intensity and then fine patterns are formed as the previously made forms are affixed onto another material.
  • an inorganic material or polymer mold having desired fine patterns pre-formed thereon is attached onto a curable composition coated on a metallic film or an organic layer to be thermally cured or photocured, thereby forming patterns.
  • This method has advantages in a simple process and an effective fine pattern formation, compared to the existing photolithography.
  • the roll printing method has been disclosed, for example, in Korean Patent Application No. 2006-0005482 (Laid Open Application No. 10-2007-76292), entitled “roll printing apparatus and method of fabricating display device using the same.”
  • silicon polymer and cliché are used to transfer patterns directly on a substrate to desirably form fine patterns thereon, thereby forming the fine patterns.
  • a problem of disappearance of a metal substrate, which is to be protected upon etching process may be caused by a decrease in adhesive force between an ink composition and a substrate to desirably form patterns thereon.
  • the adhesive force between the substrate to desirably form patterns thereon and the ink composition is increased but a pattern linewidth and line interval formed by the ink composition runs down to occur deformation, which may cause an excessive defect, for example, defective patterns, resulting in limitation on a consecutive transfer of fine patterns and difficulty in an enhancement of accuracy of the fine patterns.
  • an object of the present invention is to provide a method of fabricating an LCD device by employing an imprint lithography and a roll printing, substituting the photolithography.
  • Another object of the present invention is to provide an ink composition for an imprint lithography and a roll printing, capable of enhancing pattern accuracy as well as uniformly retaining a linewidth and a line interval of the pattern by using a polymer resin and an additive both endurable even at a high temperature, and a method of fabricating an LCD device using the same.
  • an ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, wherein the ink composition is endurable even at a high temperature of 90-250° C.
  • a method of fabricating an LCD device including, preparing a mother substrate having a plurality of array substrates or a plurality of color filter substrates, performing an array process for the array substrate and a color filter process for the color filter substrates, forming an alignment layer on the surface of the mother substrate, performing rubbing of the mother substrate, attaching a pair of mother substrates having completely rubbed, and cutting the attached mother substrate into a plurality of unit liquid crystal display panels, wherein upon executing the array process and the color filter substrate, an imprint lithography and roll printing process is executed to form fine patterns, the imprint lithography and roll printing process using an ink composition consisting of 5-45% by weight of polymer resin, 5-45% by weight of additive added to retain thermal stability, and 50-90% by weight of organic solvent, the ink composition endurable even at a high temperature of 90-250° C.
  • polymer resin and additive both endurable even at a high temperature are used so as to constantly maintain pattern linewidth and line interval, which allows consecutive transfer of fine patterns, resulting in improvement of pattern accuracy, yield and process efficiency.
  • FIG. 1 is a disassembled perspective view schematically showing a related art LCD device
  • FIG. 2 is a table showing comparison results of ink compositions, fabricated using different additives, from first and second embodiments and first and second comparisons;
  • FIG. 3 is a table showing comparison results of each pattern transcription rate of the ink compositions from the first and second embodiments and the first and second comparisons of FIG. 2 ;
  • FIG. 4 is an optical microscopic photo showing a heat-treated surface of a fine pattern formed by using the ink composition fabricated in accordance with the first embodiment of the present invention
  • FIG. 5 is an optical microscopic photo showing a heat-treated surface of a fine pattern formed by using the ink composition fabricated in accordance with the second embodiment of the present invention
  • FIG. 6 is an optical microscopic photo showing a heat-treated surface of a fine pattern formed by using the ink composition fabricated in accordance with the first Comparison;
  • FIG. 7 is an optical microscopic photo showing a heat-treated surface of a fine pattern formed by using the ink composition fabricated in accordance with the second Comparison;
  • FIG. 8 is a flowchart sequentially showing a method of fabricating an LCD device using an ink composition in accordance with the present invention.
  • FIGS. 9A to 9D are sectional views sequentially showing a process of forming ink patterns using the ink composition in accordance with the present invention.
  • An ink composition in accordance with the preferred embodiments of the present invention may consist of 5-45% by weight of polymer resin, 5-45% by weight of additive and 50-90% by weight of organic solvent.
  • an additive which is capable of retaining thermal stability, is added such that the ink composition can have superior thermal endurance and pattern-forming capability. Also, the addition of the polymer and the additive allows an increase in a pattern transcription rate, thereby improving yield and process efficiency.
  • the polymer resin in accordance with the preferred embodiments of the present invention may include novolak resin, acryl resin and the like which are used for the typical ink composition.
  • the novolak resin may be a polymer which is compounded by reacting aromatic alcohol, such as meta cresol, para cresol, 2,3,5-trimethylphenol, 2,3-xylene, 3,5-xylene and the like with formaldehyde or paraporeumaldehide.
  • aromatic alcohol such as meta cresol, para cresol, 2,3,5-trimethylphenol, 2,3-xylene, 3,5-xylene and the like
  • formaldehyde or paraporeumaldehide may be one obtained by polymerizing kareuboksilsan unsaturated, aromatic monomers, acrylic monomers.
  • the polymer resin may preferably have a molecular weight of 2000-100000, more preferably, 2000-45000.
  • the polymer resin can serve as a pattern supporter and increase a pattern transcription rate, thus enhancing yield and improving process efficiency.
  • the additive in accordance with the preferred embodiments of the present invention may serve to control the thermal stability of the ink composition.
  • the additive may include pentaerythritol, methyl gallate, propyl gallate, lauryl gallate, octylgallate, metol, tyramine hydrochloride, 1-(3-hydroxyphenyl)piperazine, 4-bromo-2-(5-isoxazolyl)phenol, 4-(imidazole-1-yl)phenol, apigenin, 2-(4,5-dihydro-1H-imidazole-2-yl)phenol, 3-(4,5-dihydro-1H-imidazole-2-yl)phenol, 4-(4,5-dihydro-1H-imidazole-2-yl)phenol, 4-nitro-2-(1H-pyrazole-3-yl)phenol, 2-(2-hydroxyphenyl)-1H-benzimidazole, 4-(4-methyl-4,5-dihydro-1H-imidazole-2
  • the additive may be contained in the ink composition of the present invention, more preferably, 7-12.5% by weight of the additive may be contained in the ink composition.
  • the linewidths and line intervals of patterns are allowed to be constantly maintained, so as to improve accuracy of the patterns, which are to be desirably formed on a substrate, resulting in enhancement of yield and process efficiency.
  • the organic solvent in accordance with the preferred embodiments of the present invention may be an easily soluble solvent, which is useable, if necessary, in addition to the polymer resin and the additive.
  • the organic solvent may be a single solvent or a mixture of two or more types of solvents selected from the following solvents, examples of which may include acrylonitrile, acetonitrile, glycerol, dimethyl sulfoxide, nitromethane, dimethylformamide, phenol, N-methylpyrrolidone, pyridine perfluorotributylamine, perfluorodecalin, 2-butanone, methylene carbonate, types of alcohols including methanol, ethanol, ethylene glycol, triethyleneglycol, tetraethylene glycol, propylene glycol, propylene ethylene glycol, diethylene glycol, butanediol, benzyl alcohol, hexyl alcohol, allyl alcohol and the like, types of ethers including propylene carbonate, tetrahydrofuran, methoxy benzene, 1,4-dioxane, 1-methoxy-2-propanol, dibutyl ether, di
  • the 50-90% by weight of the organic solvent may be preferably contained in the ink composition, more preferably, 70-80% by weight of the organic solvent may be contained in the ink composition. Within the range, the organic solvent may contribute to the process efficiency as well as to the solubility.
  • the ink composition for the imprint lithography and the roll printing of the present invention may further include a surfactant, an adhesive sensitizer or visible compound.
  • the surfactant may prevent stains of ink material and hole marks which may occur on the silicon polymer, and ensure better coating performance.
  • the surfactant may include a silicon-based surfactant or a fluorine-based surfactant such as perfluoroalkyloligomer, and the content of the surfactant may occupy 0.01-3% by weight, preferably, 0.1-1.5% by weight of the total 100% by weight of the ink composition.
  • the adhesive sensitizer may be used for improving the property of adhesion to a lower layer, example of which may include a typical melanin crosslinking agent.
  • Examples of the melanin crosslinking agent may include a condensation product of urea and formaldehyde, a condensation product of melamine and formaldehyde, a type of methylol urea alkyl ether or a type of methylol melamine alkyl ether obtained from alcohol.
  • examples of the condensation product of urea and formaldehyde may include monomethylol urea, dimethylol urea and the like.
  • An example of the condensation product of melamine and formaldehyde may include hexamethylol melamine.
  • part of the condensation product of the melamine and formaldehyde may also be used as the melanin crosslinking agent.
  • the type of methylol urea alkyl ether may be obtained by reaction among the condensation product of urea and formaldehyde, part or all of methylol group and alcohol.
  • Examples of the types of methylol urea alkyl ethers may include monomethyl urea methyl ether, dimethyl urea methyl ether and the like.
  • the type of methylol melamine alkyl ether may be obtained by reaction among the condensation product of melamine and formaldehyde, part or all of methylol group and alcohol.
  • Examples of the types of methylol melamine alkyl ethers may include hexa methylol melamine hexa methyl ether, hexa methylol melamine hexa butyl ether and the like.
  • a compound in a structure that hydrogen atom of amino group of melamine is replaced with hydroxymethyl group and methoxymethyl group, a compound in a structure that hydrogen atom of amino group of melamine is replaced with butoxymethyl group and methoxymethyl group and the like may also be employed.
  • the type of methylol melamine alkyl ether may be preferably used.
  • the content of the adhesive sensitizer may preferably be 0.01-5% by weight, more preferably, 0.5-2.5% by weight of the total 100% by weight of the composition.
  • the ink composition in accordance with the preferred embodiments of the present invention can have superior adherence with a lower substrate, and may serve to later protect a metal layer, located at a lower portion of a pattern during an etching process.
  • the visible compound may ensure visibility of the ink composition by use of dye, pigment or photosensitive compound. Also, the visible compound may improve pattern transfer capability by being soluble in polymer resin and additionally facilitate ensuring of adhesive force with a substrate on which patterns are to be desirably formed.
  • diazide-based compounds namely, 2,3,4-trihydroxybenzophenone-1,2-napthoquinonediazide-5-sulfonate fabricated by esterifying trihydroxybenzophenone with 2-diazo-1-naphthol-5-sulfonic acid, 2,3,4,4-tetrahydroxybenzophenone-1,2-napthoquinonediazide-5-sulfonate fabricated by esterifying tetrahydroxybenzophenone with 2-diazo-1-naphthol-5-sulfonic acid, and the like, may be used individually or by being mixed together.
  • the content of the visible compound may preferably be 0.001-3.0% by weight, more preferably, 0.001-2.0% by weight of the total 100% by weight of the ink composition according to the preferred embodiments of the present invention.
  • the ink composition in accordance with the preferred embodiments of the present invention having such configuration may be applied to a pattern formation by use of an imprint lithography and a roll printing, so as to allow fine patterns to be accurately formed on a substrate.
  • the ink composition in accordance with the preferred embodiments of the present invention may include polymer resin and additive both endurable even at a high temperature of about 90-250° C., thereby ensuring superior transcription rate of fine patterns and allowing accurate formation of fine patterns.
  • Such improved properties will now be described in detail in comparison with comparison examples (hereinafter, referred to as ‘comparison’).
  • FIG. 2 is a table showing comparison results of ink compositions, fabricated using different additives, from first and second embodiments and first and second comparisons, wherein unit is percent by weight.
  • novolak resin, ethanol, silicon group and hexamethylol melamine hexamethyl ether were used respectively as polymer resin, organic solvent, surfactant and adhesive sensitizer, for each of which methyl gallate, propyl gallate, 2,4-dimethylphenol and rosin were used as additives.
  • total 100% by weight of each ink composition of the first and second embodiments and the first and second comparisons may consist of 10.0% by weight of polymer resin, 10.0% by weight of additive, 80.0% by weight of organic solvent, 1.0% by weight of surfactant and 3.0% by weight of adhesive sensitizer.
  • each ink composition of the first and second embodiments and the first and second comparisons was coated on silicon polymer with no pattern, and naturally dried for 10 seconds. Fine patterns were transferred on a target substrate while the silicon polymer rolled on a cliché. The transcription rate of the thusly obtained patterns was then measured.
  • FIG. 3 is a table showing comparison results of each pattern transcription rate of the ink compositions from the first and second embodiments and the first and second comparisons of FIG. 2 , wherein the pattern transcription rate is represented in the range of 0 ⁇ 100% according to whether patterns have been formed in 100 cells each having 1 ⁇ 1 mm in size.
  • the first and second embodiments showed 98% and 97% of pattern transcription rates, respectively, whereas the first and second comparisons showed 85% and 79% of pattern transcription rates.
  • each ink composition of the first and second embodiments using the additives with high thermal resistance showed more than 97% of superior pattern transcription rate.
  • each ink composition of the first and second embodiments and the first and second comparisons was coated on silicon polymer with no pattern, and naturally dried for a preset time. Fine patterns were transferred on the target substrate while the silicon polymer rolled on a cliché. After the fine patterns-transcribed substrate was thermally treated at a high temperature of 200° C. for 3 minutes, the accuracy of the pattern formation was checked by use of an optical microscope. The checked results can be seen in FIGS. 4 to 7 .
  • FIGS. 4 and 5 are optical microscopic photos each showing a thermally treated surface of a fine pattern formed by using the ink compositions each fabricated from the first and second embodiments according to the present invention.
  • FIGS. 6 and 7 are optical microscopic photos each showing a thermally treated surface of a fine pattern formed by using the ink compositions each fabricated from the first and second comparisons according to the present invention.
  • patterns are uniformly formed upon using each ink composition according to the first and second embodiments of the present invention. Accordingly, no pattern linewidth is changed before and after the thermal treatment, which thusly exhibits superior accuracy of the pattern formation.
  • the ink compositions having such properties in accordance with the embodiments of the present invention can be used for an imprint lithography and a roll printing, so as to allow forming of fine patterns, which are applied to information storage, compact sensors, photonic crystal and optical devices, micro-electro mechanical systems, display devices and semiconductors, which will hereinafter be described in detail through an exemplary method for fabricating an LCD device.
  • FIG. 8 is a flowchart sequentially showing a method of fabricating an LCD device using an ink composition in accordance with the present invention, which shows a method for fabricating an LCD device in case of forming a liquid crystal layer by a liquid crystal dropping method.
  • the present invention may not be limited to this method, but also applicable to a method for fabricating an LCD device in case of forming a liquid crystal layer by a liquid crystal injection method.
  • the fabrication process of the LCD device may be divided into a switching device array process of forming switching devices on a lower array substrate, a color filter process of forming color filters on an upper color filter substrate, and a cell process.
  • a plurality of gate lines and data lines which are arranged on the lower substrate to define pixel regions, and thin film transistors (TFTs) as switching devices connected to the gate lines and data lines are formed respectively at the pixel regions (S 101 ). Also, through the array process, a pixel electrode, which is connected to the TFTs for driving a liquid crystal layer responsive to a signal being applied via the TFTs, is formed.
  • TFTs thin film transistors
  • a color filter layer provided with red, green and blue sub filters rendering colors and a common electrode are formed on the upper substrate through the color filter process (S 103 ).
  • the lower substrate and the upper substrate each are configured as a large mother substrate.
  • a plurality of panel regions are formed on the large mother substrates, and the TFT as the switching device and the color filter layer are formed at each panel region.
  • FIGS. 9A to 9D are sectional views sequentially showing a process of forming ink patterns using an ink composition in accordance with the present invention, in which a roll printing process is exemplarily described.
  • the present invention may not be limited to the roll printing process, but also applicable to forming ink patterns through the imprint lithography.
  • a printing plate 101 having printing grooves 102 , which substantially have the same patterns to target ink patterns is prepared.
  • An ink 103 containing solvent is then provided on the printing plate 101 from an ink feeder 104 .
  • a roll printing apparatus is used for printing various ink patterns on a target substrate, and includes the printing plate 101 , the ink feeder 104 for providing the ink 103 on the printing plate 101 , and a transfer roller provided with a transfer sheet for transferring the ink 103 filled in the printing plate 101 onto the target substrate.
  • the printing plate 101 is provided with a plurality of printing grooves 102 for forming target ink patterns on an upper surface thereof, and each of the printing grooves 102 may substantially have the same shape to the target ink pattern.
  • the ink feeder 104 then coats the ink 103 on the printing plate 101 with a thickness of 0.5-10 ⁇ m by employing an appropriate method, for example, spin coating, roller coating, slit coating and the like.
  • the ink composition composing the ink 103 according to the embodiments of the present invention may consist of 5-45% by weight of polymer resin, 5-45% by weight of additive and 50-90% by weight of organic solvent.
  • 5-45% by weight of the additive by which a thermal stability is retained is added such that the ink composition can have excellent thermal resistance and pattern-forming capability.
  • the added additive can also increase a pattern transcription rate so as to improve yield and process efficiency.
  • the ink 103 coated on the printing plate 101 is filled in each printing groove 102 by using a blade 130 . That is, if the blade 130 is placed on the printing plate 101 provided with the ink 103 and moved in one direction in a contact state with the upper surface of the printing plate 101 , the ink 103 provided on the upper surface of the printing plate 101 is squeezed in the proceeding direction to be filled in the printing grooves 102 . Also, the ink 103 on the upper surface of the printing plate 101 excluding the printing grooves 102 is removed by the blade 130 .
  • a removal blade (not shown) for completely removing the remnant ink 103 on the upper surface of the printing plate 101 may further be provided.
  • a transfer roller 150 having a transfer sheet 155 is rolled on the upper surface of the printing plate 101 filled with the ink 103 . Accordingly, the ink 103 filled in the printing grooves 102 is transferred onto the transfer sheet 155 of the transfer roller 150 .
  • the transfer roller 150 may be formed, for example, in a cylindrical shape, and its outer surface is covered with the transfer sheet 155 .
  • the transfer sheet 155 may be formed of a material, which has an excellent adhesive property with the ink 103 , for example, silicon with excellent hydrophilicity. Also, the transfer sheet 155 may have elasticity so as to facilitate ink transfer from the printing plate 101 and ink re-transfer onto the target substrate.
  • the transfer roller 150 is then rolled in one direction to retransfer the ink 103 , which has been transferred on the transfer sheet 155 , onto the target substrate 110 , thereby forming preset ink patterns 120 .
  • an interval between the transfer roller 150 and a lower frame may be adjustable such that the transfer sheet 155 covering the transfer roller 150 can contact the upper surface of the target substrate 110 while the transfer roller 150 is rotated.
  • the transfer sheet 155 of the transfer roller 150 does not have to certainly contact the upper surface of the target substrate 110 .
  • a distance, which is at least as short as the ink transferred onto the transfer sheet 155 from the printing plate 101 can contact the upper surface of the target substrate 110 should be maintained.
  • thermosetting process of performing a thermal treatment at a temperature of 90-200° C., or a combination of the photocuring and the thermosetting processes.
  • the thermal treatment is performed to evaporate solvent without pyrolyzing solid component contained in the ink composition.
  • concentration of the solvent it is preferable to minimize the concentration of the solvent through the thermal treatment and execute the thermal treatment until an ink layer with thickness less than 10 ⁇ m is left on a substrate.
  • Such a process may enhance adhesive property and chemical resistance between the ink layer and the substrate.
  • the process-completed substrate is then treated with an etching solution or gaseous plasma so as to process an exposed portion of the substrate.
  • the non-exposed portion of the substrate is protected by the ink layer.
  • the ink layer is removed by an appropriate stripper, thereby forming fine patterns on the substrate.
  • an alignment layer is printed on each of the upper substrate and the lower substrate.
  • the alignment layers are aligned with each other so as to provide an anchoring force or surface anchoring characteristics (that is, pretilt angle and alignment direction) to liquid crystal molecules of a liquid crystal layer interposed between the upper substrate and the lower substrate.
  • preset seal patterns are formed on the color filter substrate by use of sealant and simultaneously a liquid crystal layer is formed on the array substrate (S 105 and S 106 ) (see FIG. 8 ).
  • liquid crystal is dropped and dispensed through a dispenser on an image display region either of a first large mother substrate having a plurality of array substrates or a second large mother substrate having a plurality of color filter substrates, and the liquid crystal is uniformly distributed all over the image display region by pressure of attaching the first and second mother substrates, thereby forming the liquid crystal layer.
  • the seal patterns should be formed in form of a closed pattern covering the periphery of each pixel region such that the liquid crystal cannot be leaked out of the image display region.
  • liquid crystal may be dropped within a short time, compared to employing a vacuum injection method, and also the liquid crystal layer can be formed very fast even if the LCD panel becomes larger.
  • liquid crystal is dropped on a substrate as much as being needed upon employing the dropping method, an increase in fabricating cost of the LCD panel due to discard of high-priced liquid crystal can be prevented, resulting in strengthening competitiveness of products.
US12/613,961 2008-11-07 2009-11-06 Ink composition and method of fabricating liquid crystal display device using the same Expired - Fee Related US7935552B2 (en)

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US20100120181A1 (en) 2010-05-13
TWI398494B (zh) 2013-06-11
CN101735690B (zh) 2014-05-14
JP2010111871A (ja) 2010-05-20
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JP5437026B2 (ja) 2014-03-12
US20110224335A1 (en) 2011-09-15

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