US6171181B1 - Molded polishing pad having integral window - Google Patents

Molded polishing pad having integral window Download PDF

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Publication number
US6171181B1
US6171181B1 US09/375,962 US37596299A US6171181B1 US 6171181 B1 US6171181 B1 US 6171181B1 US 37596299 A US37596299 A US 37596299A US 6171181 B1 US6171181 B1 US 6171181B1
Authority
US
United States
Prior art keywords
region
polishing pad
phase
opaque
material formulation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US09/375,962
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English (en)
Inventor
John V. H. Roberts
Barry Scott Pinheiro
David B. James
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm and Haas Electronic Materials CMP Holdings Inc
Original Assignee
Rodel Holdings Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rodel Holdings Inc filed Critical Rodel Holdings Inc
Assigned to RODEL HOLDINGS, INC. reassignment RODEL HOLDINGS, INC. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: JAMES, DAVID B., PINHEIRO, BARRY SCOTT, ROBERTS, JOHN V.H.
Priority to US09/375,962 priority Critical patent/US6171181B1/en
Priority to JP2001516715A priority patent/JP4519385B2/ja
Priority to KR1020027002004A priority patent/KR100646887B1/ko
Priority to PCT/US2000/021776 priority patent/WO2001012387A1/en
Priority to TW089116116A priority patent/TW470688B/zh
Priority to EP00952699A priority patent/EP1210209A4/en
Priority to US09/666,418 priority patent/US6387312B1/en
Publication of US6171181B1 publication Critical patent/US6171181B1/en
Application granted granted Critical
Assigned to ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. reassignment ROHM AND HAAS ELECTRONIC MATERIALS CMP HOLDINGS, INC. CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). Assignors: RODEL HOLDINGS, INC.
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00—Lapping machines or devices; Accessories
    • B24B37/11—Lapping tools
    • B24B37/20—Lapping pads for working plane surfaces
    • B24B37/205—Lapping pads for working plane surfaces provided with a window for inspecting the surface of the work being lapped
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B24—GRINDING; POLISHING
    • B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
    • B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
    • B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
    • B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
    • B24D3/28—Resins or natural or synthetic macromolecular compounds

Definitions

  • the invention relates to a polishing pad which is useful for creating a smooth, ultra-flat surface on such items as glass, semiconductors, dielectric/metal composites, and integrated circuits. More particularly, the invention relates to a molded polishing pad having a window which facilitates inspection of a workpiece and determination of a polishing endpoint by optical means.
  • CMP chemical-mechanical polishing
  • One problem associated with chemical-mechanical polishing is determining when the wafer has been polished to the desired degree of flatness.
  • Conventional methods for determining a polishing endpoint require that the polishing operation be stopped and that the wafer be removed from the polishing apparatus so that dimensional characteristics can be determined. Stopping the operation slows down wafer production. Further, if a critical wafer dimension is found to below a prescribed minimum, the wafer may be unusable, thereby leading to higher scrap rates and production costs.
  • In-process methods for determining polishing endpoint have also been developed.
  • One such method utilizes laser interferometry wherein light generated by a laser is used to measure a wafer dimension. See, for example, U.S. Pat. No. 5,413,941.
  • polishing pads have been developed with features that facilitate the determination of wafer dimensional characteristics by optical methods.
  • U.S. Pat. No. 5,605,760 discloses a polishing pad wherein at least a portion of the pad is transparent to laser light over a range of wavelengths.
  • the entire polishing pad is a transparent sheet which may be made out of any solid uniform polymer including polyurethanes, acrylics, polycarbonates, nylons and polyesters.
  • the polishing pad includes a transparent window piece in an otherwise opaque pad.
  • the window piece may be a rod or plug of transparent polymer material in a molded polishing pad.
  • the rod or plug may be insert molded within the polishing pad, or may be installed into a cutout in the polishing pad after the molding operation.
  • U.S. Pat. No. 5,893,796 also discloses a polishing pad having a window piece provided by a transparent plug.
  • the plug may be preformed as a solid insert that is molded into the pad.
  • the plug may be formed by pouring liquid polyurethane into a hole that has been cut into the polishing pad, and the polyurethane may be cured to form a transparent plug within the pad.
  • the prior art polishing pads having transparent window pieces have a number of disadvantages. Manufacturing steps are required to either install the window piece into a hole in the pad, or into the mold cavity in which the pad is produced. In some cases a hole to receive the window piece must be cut into the pad. Leakage of slurry between the pad and the window piece may be a problem. Also, since the window material is different than the pad material, the window and the pad may wear at different rates. This may lead to cracking or tearing of the pad around the window during polishing. There is a need for a polishing pad having a transparent window that overcomes these problems.
  • a polishing pad according to the invention comprises a one-piece molded article made of polymeric material.
  • the article has a region wherein the polymeric material is transparent, and an adjacent region wherein the polymeric material is opaque.
  • the polishing pad is useful for polishing a workpiece in conjunction with an optical detection system that can determine a polishing endpoint for the workpiece.
  • the transparent region of the polishing pad is sufficiently transmissive to permit incident radiation used for polishing endpoint detection to pass through the polishing pad.
  • the polishing pad is formed by solidifying a flowable polymeric material which at least initially has a uniform composition.
  • the polymeric material is processed during a molding operation to provide the transparent region and the adjacent opaque region.
  • Types of polymeric material suitable for making the polishing pad include a single semi-crystalline thermoplastic material, a blend of thermoplastic materials, and a reactive thermosetting polymer.
  • a method of making a polishing pad comprises:
  • FIG. 1 is a top plan view of a polishing pad according to the invention.
  • a polishing pad according to the invention as shown in FIG. 1 comprises a one-piece molded article 10 which is shaped as a substantially flat disk having opposite major surfaces.
  • One of the major surfaces is a polishing surface that is applied to a workpiece during polishing, and the other major surface is a back surface that is contacted by a platen on which the polishing pad is mounted, either directly or through an intermediate base pad.
  • the molded polishing pad is characterized by a region 12 wherein the polymeric material is transparent.
  • transparent it is meant that the region exhibits transmissivity on the order of 20% or more to an incident light beam having some wavelength in the range from infrared to ultra-violet, at least when the light beam is at an angle of incidence substantially normal to the surface of the polishing pad. It should be understood that the transparent region need not be totally transmissive, and that some scattering of incident light, particularly due to surface finish of the transparent region, is acceptable.
  • a region 14 of the polishing pad which is adjacent to the transparent region 12 is substantially opaque.
  • the entire polishing pad is opaque except for the transparent region 12 .
  • the polishing pad may comprise two or more transparent regions, in which case each of the transparent regions stands in contrast to an adjacent opaque region.
  • the opaque region 14 need not be completely opaque to incident light, particularly since the polishing pad is relatively thin, having a thickness dimension on the order of 0.050 to 0.080 inch. It is only required that the opaque region 14 be relatively less transmissive than the transparent region 12 .
  • the transparent region 12 is delineated by a boundary 13 that may have any desired configuration within the opaque region 14 . Since the transparent region 12 and the opaque region 14 are integrally molded from the same polymeric material formulation, the boundary 13 is merely a transition between regions having different light-transmissive properties, and as such the boundary 13 is not a distinct structure.
  • the pad is made by solidification of a flowable polymeric material, or a mixture of flowable polymeric materials, which initially is transparent and, at least prior to solidification, has a uniform composition.
  • the transparent region 12 is formed by processing the flowable polymeric material so that a portion of the polymeric material retains its transparency after solidification.
  • One type of polymeric material suitable for making the pad comprises semi-crystalline thermoplastic polymers. These polymers are generally transparent when in liquid phase but become opaque after curing because they contain both crystalline and amorphous phases, and the crystalline phase causes light-scattering which makes the polymer opaque. Crystallization occurs at temperatures between the melting temperature (T melt ) and the glass transition temperature (T g ) of the polymer, these being the upper and lower crystallization temperatures, respectively. If a semi-crystalline polymer is rapidly cooled from a temperature above T melt to a temperature below T g , crystallization can be minimized, and the polymer will remain amorphous and transparent. Alternatively, crystallization can be controlled by rapid cooling in order to keep the resulting crystallite to a size which is too small to scatter light, whereby the polymer will remain transparent.
  • a polishing pad according to the invention may be produced by molding a semi-crystalline polymeric material in a mold having a mold cavity, wherein the mold has a means for rapidly cooling the polymeric material in a section of the mold cavity.
  • the semi-crystalline polymeric material is delivered to the mold cavity in a liquid phase and is transparent.
  • a means for rapidly cooling the material may comprise a passageway in the mold which permits circulation of a cooling medium such as chilled water or air, thereby removing heat from a region of the polymeric material proximate to the passageway.
  • the polymeric material in this region is rapidly cooled from a temperature above T melt to a temperature below T g , thereby constraining the crystallization process as discussed above and retaining the transparency of the material in this region.
  • polymeric material for making the pad comprises a blend of two thermoplastic polymers. Again it is possible to control opacity by controlling cooling rates in different regions of the mold. Polymer blends typically have temperature ranges within which they are either miscible (single phase and transparent) or immiscible (incompatible and opaque). An example of such a system is poly(phenylene oxide)-polystyrene blends. These two polymers are completely miscible at elevated temperature. A slow cooling of the blend allows phase separation and opacity develops. However, rapid cooling will freeze-in the transparent single phase structure.
  • polymeric material comprises a reactive thermosetting polymer which forms phase separated micro-domains.
  • a polymer comprises a polyol and a polydiamine which are mixed and reacted with an isocyanate.
  • the following example describes the formation of a polishing pad having a transparent window in which a polymeric material comprising a reactive thermosetting polymer forms phase separated domains during pad formation.
  • the first stream comprises a mixture of a polymeric diol and a polymeric diamine, together with an amine catalyst.
  • the ratio of diol to diamine is variable over a wide range (5% to 95%) and is determined by the required physical properties of the final pad.
  • the molecular weights of the diol and diamine are not critical to this invention, and these also may be determined by the required physical properties of the pad.
  • the second stream comprises a diisocyanate, preferably diphenylmethanediisocyanate (MDI).
  • MDI diphenylmethanediisocyanate
  • the amount of diisocyanate used is such as to give a slight excess after complete reaction with the diol and diamine groups. This is standard practice to those skilled in the art of urethane manufacture.
  • the mixed streams are injected into a heated mold to form a phase separated polyurethane-urea polymeric material.
  • Overall mold temperature is between 50° and 120° C.
  • the mold is designed with an isolated temperature zone, on both sides of the mold, that has independent temperature control, corresponding to the shape and location of the desired transparent window.
  • the temperature of this zone is initially 20° to 50° C. lower than the temperature of the surrounding mold.
  • the reactive polymer gels.
  • the relatively cooler isolated temperature zone is heated to approximately the same temperature as the rest of the mold to complete polymerization of the part.
  • the part in the form of a net-shape pad, is subsequently demolded.
  • the pad is generally opaque but has a transparent window region corresponding to the relatively cooler zone in the mold cavity.
  • thermoplastic injection molding thermoset injection molding (often referred to as “reaction injection molding” or “RIM”), thermoplastic or thermoset injection blow molding, compression molding, or any similar-type process in which a flowable material is positioned and solidified.
  • RIM reaction injection molding
  • thermoplastic or thermoset injection blow molding thermoplastic or thermoset injection blow molding
  • compression molding or any similar-type process in which a flowable material is positioned and solidified.
  • a polishing pad according to the invention has a number of advantages.
  • the pad is molded as a one-piece article with an integral, transparent window, thereby reducing manufacturing steps and associated costs.
  • the possibility of slurry leakage around the window is eliminated.
  • the window is coplanar with the polishing surface so that a surface of the window can participate in the polishing. Since the window is made from the same polymer formulation as the rest of the pad, the window has the same physical properties as the pad. Therefore, the window has the same conditioning and polishing characteristics and the same hydrolytic stability as the pad. Further, thermal expansion mismatch between the pad and the window is avoided.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
US09/375,962 1999-08-17 1999-08-17 Molded polishing pad having integral window Expired - Lifetime US6171181B1 (en)

Priority Applications (7)

Application Number Priority Date Filing Date Title
US09/375,962 US6171181B1 (en) 1999-08-17 1999-08-17 Molded polishing pad having integral window
TW089116116A TW470688B (en) 1999-08-17 2000-08-10 Molded polishing pad having integral window
KR1020027002004A KR100646887B1 (ko) 1999-08-17 2000-08-10 일체식 창을 갖는 성형된 연마 패드의 제조방법
PCT/US2000/021776 WO2001012387A1 (en) 1999-08-17 2000-08-10 Molded polishing pad having integral window
JP2001516715A JP4519385B2 (ja) 1999-08-17 2000-08-10 一体化した窓を有する成形された研磨パッド
EP00952699A EP1210209A4 (en) 1999-08-17 2000-08-10 SINGLE PIECE MOLD POLISHING PAD WITH WINDOW
US09/666,418 US6387312B1 (en) 1999-08-17 2000-09-20 Molding a polishing pad having integral window

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US09/375,962 US6171181B1 (en) 1999-08-17 1999-08-17 Molded polishing pad having integral window

Related Child Applications (1)

Application Number Title Priority Date Filing Date
US09/666,418 Division US6387312B1 (en) 1999-08-17 2000-09-20 Molding a polishing pad having integral window

Publications (1)

Publication Number Publication Date
US6171181B1 true US6171181B1 (en) 2001-01-09

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US09/375,962 Expired - Lifetime US6171181B1 (en) 1999-08-17 1999-08-17 Molded polishing pad having integral window
US09/666,418 Expired - Lifetime US6387312B1 (en) 1999-08-17 2000-09-20 Molding a polishing pad having integral window

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Application Number Title Priority Date Filing Date
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Country Status (6)

Country Link
US (2) US6171181B1 (ja)
EP (1) EP1210209A4 (ja)
JP (1) JP4519385B2 (ja)
KR (1) KR100646887B1 (ja)
TW (1) TW470688B (ja)
WO (1) WO2001012387A1 (ja)

Cited By (72)

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US6524164B1 (en) * 1999-09-14 2003-02-25 Applied Materials, Inc. Polishing pad with transparent window having reduced window leakage for a chemical mechanical polishing apparatus
US6537134B2 (en) 2000-10-06 2003-03-25 Cabot Microelectronics Corporation Polishing pad comprising a filled translucent region
US20030109209A1 (en) * 2001-08-24 2003-06-12 Rogers Inoac Corporation Polishing pad
US20030180973A1 (en) * 2002-02-04 2003-09-25 Kurt Lehman Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool
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US20030194959A1 (en) * 2002-04-15 2003-10-16 Cabot Microelectronics Corporation Sintered polishing pad with regions of contrasting density
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