US5965776A - Alkoxyphenyl-substituted bisacylphosphine oxides - Google Patents

Alkoxyphenyl-substituted bisacylphosphine oxides Download PDF

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US5965776A
US5965776A US08/519,225 US51922595A US5965776A US 5965776 A US5965776 A US 5965776A US 51922595 A US51922595 A US 51922595A US 5965776 A US5965776 A US 5965776A
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phenyl
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David George Leppard
Manfred Kohler
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BASF Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/30—Phosphinic acids [R2P(=O)(OH)]; Thiophosphinic acids ; [R2P(=X1)(X2H) (X1, X2 are each independently O, S or Se)]
    • C07F9/32—Esters thereof
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00—Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02—Phosphorus compounds
    • C07F9/28—Phosphorus compounds with one or more P—C bonds
    • C07F9/50—Organo-phosphines
    • C07F9/53—Organo-phosphine oxides; Organo-phosphine thioxides
    • C07F9/5337—Phosphine oxides or thioxides containing the structure -C(=X)-P(=X) or NC-P(=X) (X = O, S, Se)
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/117—Free radical
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing

Definitions

  • the invention relates to alkoxyphenyl-substituted bisacylphosphine oxide compounds, to compositions comprising these compounds and to the use of the compounds as photoinitiators for the photopolymerization of ethylenically unsaturated compounds.
  • Bisacylphosphine oxide compounds are known as photoinitiators. Such compounds are described, for example, in GB-A 2 259 704 and in U.S. Pat. Nos. 4,792,632 and 4,868,091.
  • the compounds disclosed therein include, inter alia, bis(2,6-dichlorobenzoyl)-4-ethoxy-phenylphosphine oxide and bis(2,6-dichlorobenzoyl)-2,4-dimethoxyphenylphosphine oxide.
  • EP-A 446 175 discloses photoinitiator mixtures comprising mono- and bisacylphosphine oxides with a-hydroxy ketones and benzophenones.
  • bis(2,4,6-trimethylbenzoyl)-4methoxyphenylphosphine oxide is disclosed as a possible acylphosphine oxide component in such a mixture.
  • R 1 and R 2 are identical or different and are a radical of the formula II ##STR5## in which
  • R 4 and R 5 independently of one another are C 1 --C 12 alkyl or C 1 -C 12 alkoxy, and
  • R 6 , R 7 and R 8 independently of one another are hydrogen, C 1 --C 12 alkyl, C 1 -C 12 alkoxy or halogen,
  • R 3 is a radical of the fonnula III ##STR6## in which
  • R 9 is C 1 -C 20 alkyl, C 2 -C 20 alkyl which is interrupted by O, C 2 C 12 alkenoxy-substituted C 1 -C 4 alkyl, halogen-substituted C 1 -C 20 alkyl, C 5 -C 6 cycloalkyl, phenyl which is unsubstituted or is substituted with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, naphthyl which is unsubstituted or is substituted with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, phenyl-C 1 C 5 alkyl which is unsubstituted or is substituted on the phenyl ring with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, or is C 2 -C 12 alkenyl, --CF 3 ##STR7## in which
  • R 1 and R 2 are as defined above,
  • X is unsubstituted or --OR 13 -substituted C 1 -C 16 alkylene, C 2 -C 20 alkylene which is interrupted by O, or is C 4 -C 12 alkenylene or xylylene,
  • R 10 is hydrogen, C 1 -C 20 alkyl, C 2 -C 18 alkyl which is interrupted by O, or is C 2 -C 12 alkenyl, cyclopentyl, cyclohexyl, phenyl which is unsubstituted or is substituted with 1 or 2 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, or is --OR 9 ,
  • R 11 is hydrogen, C 1 -C 20 alkyl, C 2 -C 18 alkyl which is interrupted by O, or is C 2 -C 12 alkenyl, cyclopentyl, cyclohexyl, phenyl which is unsubstituted or is substituted with 1 or 2 C 1 - 4 alkyl and/or C 1 -C 4 alkoxy groups, or is --OR9, or is a radical of the formula VI ##STR8## or
  • R 9 and R 11 in the formula III together are --CH 2 CR 14 R 15 -- or --C(CH 3 ) 2 CH ⁇ CH--, or
  • R 10 and R 11 together with the atoms to which they are attached, form a benzene ring which is unsubstituted or substituted with 1 or 2 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups,
  • R 12 is hydrogen or --OR 9 ,
  • R 13 is C 1 -C 8 alkyl
  • R 14 and R 15 independently of one another are hydrogen, C 1 -C 8 alkyl, phenyl or --CH 2 OR 13 , or R 14 and R 15 , together with the carbon atom to which they attached, form a C 5 -C 6 cycloalkyl ring,
  • Y is a single bond, --CR 16 R 17 --, --NR 18 --, --S--, --SO 2 --, --(CH 2 ) m -- or --CH ⁇ CH--,
  • R 16 is hydrogen, methyl or ethyl
  • R 17 is hydrogen or C 1 -C 4 alkyl
  • R 18 is hydrogen, C 1 -C 12 alkyl or phenyl, and m is a number from 2-12, with the proviso that if the radical --OR 9 in the formula 43III is in the p-position of the phenyl ring and R 9 is methyl, at least one of the radicals R 10 , R 11 and R 12 is not hydrogen.
  • R 4 , R 5 , R 6 , R 7 and R 8 as C 1 -C 8 alkyl, especially C 1 -C 4 alkyl.
  • Examples are R 4 , R 5 , R 6 , R 7 and R 8 as C 1 -C 8 alkyl, especially C 1 -C 4 alkyl.
  • R 4 , R 5 , R 6 , R 7 , R 8 as C 1 -C 1 - 12 alkoxy are linear or branched radicals and are for example methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, pentyloxy, hexyloxy, heptyloxy, 2,4,4-trimethylpentyloxy, 2-ethylhexyloxy, octyloxy, nonyloxy, decyloxy or dodecyloxy, especially methoxy, ethoxy, propoxy, isopropoxy, n-butyloxy, sec-butyloxy, isobutyloxy, tert-butyloxy, preferably methoxy.
  • Halogen is fluorine, chlorine, bromine and iodine, especially chlorine and bromine, preferably chlorine.
  • C 1 -C 4 alkoxy substituents are methoxy, ethoxy, propoxy or butoxy, especially methoxy.
  • R 9 , R 10 and R 11 as C 1 -C 20 alkyl are linear or branched and are for example methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl, octyl, nonyl, decyl, dodecyl, tetradecyl, heptadecyl, octadecyl, nonadecyl or eicosyl.
  • Rg for example is C 1 -C 18 alkyl, especially C 1 -C 12 alkyl, preferably C 3 -C 12 alkyl, for example C 4 -C 12 alkyl.
  • R 9 is preferably methyl or isopropyl.
  • C 1 -C 20 alkyl is substituted with one or more halogens, then there are for example 1-3 or 1 or 2 halogen substituents on the alkyl radical.
  • R 9 as C 2 -C 20 alkyl which is interrupted one or more times by O is for example interrupted 1-9, e.g. 1-7 or 1 or 2 times, by O.
  • C 2-C 12 Alkenoxy substituents on R 9 as C 1 -C 4 alkyl are for example ethenyloxy, 2-propenyloxy, 2-methyl-2-propenyloxy, 1,1-dimethyl-2-propenyloxy, 1-butenyloxy, 2-butenyloxy, 3-butenyloxy, 5-hexenyloxy, 7-octenyloxy, 9-decenyloxy or 11-dodecenyloxy, especially 2-propenyloxy.
  • R 9 as C 5 -C 6 cycloalkyl is cyclopentyl or cyclohexyl, especially cyclohexyl.
  • R 9 as substituted phenyl or naphthyl is substituted from one to four times, for example one, two or three times, especially two or three times.
  • R 9 as substituted phenyl or naphthyl is substituted for example with linear or branched C 1 -C 4 alkyl such as methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl or t-butyl, or with linear or branched C 1 -C 4 alkoxy such as methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy or t-butoxy.
  • Preferred substituents for R 9 as phenyl or naphthyl are, in particular, methyl and methoxy.
  • R 9 as phenyl-C 1 -C 5 alkyl is for example benzyl, phenylethyl, ⁇ -methylbenzyl, phenylpentyl or ⁇ , ⁇ -dimethylbenzyl, especially benzyl.
  • Substituted phenyl-C 1 -C 5 alkyl is substituted from one to four times, for example one, two or three times, especially two or three times, on the phenyl ring.
  • C 1 -C 4 alkyl or C 1 -C 4 alkoxy substituents are linear or branched and examples are methyl, ethyl, propyl, n-butyl, t-butyl, especially methyl, methoxy, ethoxy, propoxy or butoxy, especially methoxy.
  • R 9 , R 10 and R 11 as C 2 -C 12 alkenyl may be mono- or polyunsaturated and are for example allyl, methallyl, 1,1-dimethylallyl, 1-butenyl, 3-butenyl, 2-butenyl, 1,3-pentadienyl, 5-hexenyl, 7-octenyl or 8-nonenyl, especially allyl.
  • X as C 1 --C 6 alkylene is linear or branched alkylene such as, for example, methylene, ethylene, propylene, 1-methylethylene, 1,1-dimethylethylene, butylene, 1-methylpropylene, 2-methylpropylene, pentylene, hexylene, heptylene, octylene, nonylene, decylene, dodecylene, tetradecylene or hexadecylene.
  • X is in particular
  • C 1 -C 12 alkylene for example ethylene, decylene, ##STR9## or
  • OR 13 -substituted C 1 -C 16 alkylene is for example ##STR10##
  • X is C 2 -C 2 -C 20 alkylene interrupted by --O--
  • X as C 4 -C 12 alkenylene may be mono- or polyunsaturated and is for example 1-butenylene, 3-butenylene, 2-butenylene, 1,3-pentadienylene, 5-hexenylene, 7-octenylene, 10-decenylene or 12-dodecenylene.
  • R 10 or R 11 are C 2 -C 1 -C 18 alkyl interrupted by O
  • substituents are preferably in the 2-, 4- or 2,4-position of the phenyl ring.
  • the substituents are linear or branched and are for example methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, t-butoxy.
  • Preferred substituents are methyl and methoxy.
  • the substituents are linear or branched and are for example methyl, ethyl, n-propyl, isopropyl, n-butyl, isobutyl, s-butyl, t-butyl, methoxy, ethoxy, n-propoxy, isopropoxy, n-butoxy, isobutoxy, s-butoxy, t-butoxy.
  • Preferred substituents are methyl and methoxy.
  • R 13 as C 1 -C 8 alkyl is linear or branched and is for example methyl, ethyl, n-propyl, isopropyl, n-butyl, iso-butyl, s-butyl, t-butyl, pentyl, hexyl, heptyl or octyl.
  • R 13 is in particular C 1 -C 4 alkyl.
  • R 14 and R 15 as C 1 -C8alkyl are linear or branched radicals and are for example methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl or octyl.
  • R 14 and R 15 is C 1 -C 6 alkyl, especially C 1 -C 4 alkyl.
  • R 18 is C 1 -C 12 alkyl
  • the radicals are linear or branched and are for example methyl, ethyl, propyl, isopropyl, n-butyl, sec-butyl, isobutyl, tert-butyl, pentyl, hexyl, heptyl, 2,4,4-trimethylpentyl, 2-ethylhexyl, octyl, nonyl, decyl or dodecyl.
  • R 18 is C 1 -C 8 alkyl, especially C 1 -C 4 alkyl.
  • R 14 and R 15 together with the carbon atom to which they are attached, form a C 5 -C 6 cycloalkyl ring, then this is a cyclohexyl or cyclopentyl ring.
  • Preferred compounds of the formula I are those which in formula III at least one ortho position of the phenyl ring is not occupied by hydrogen.
  • R 9 is C 1 -C 2 alkyl, C 2 -C 12 alkyl which is interrupted by O, C 1 -C 4 alkyl which is substituted with C 3 -C 8 alkenoxy, or is cyclopentyl, cyclohexyl, phenyl which is unsubstituted or substituted with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, benzyl which is unsubstituted or is substituted on the phenyl ring with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, or is C 3 -C 8 alkenyl, or R 9 is a radical of the formula IV or V, X is unsubstituted or --OR 13 -substituted C 1 -C 2 alkylene, C 3 -C 18 alkylene which is interrupted by O, or is C 4 -C 8 alkenylene
  • R 9 and R 10 in the formula III are together --CH 2 CH 2 --,
  • R 11 is hydrogen, C 1 -C 12 alkyl, C 3 -C 18 alkyl which is interrupted by O, or is C 3 -C 8 alkenyl, cyclopentyl, cyclohexyl, phenyl or --OR 9 , or is a radical of the formula VIa ##STR14##
  • Y is a single bond, --CR 16 Rl 17 -- or --S--,
  • R 13 is C 1 -C 4 alkyl
  • R 16 and R 17 are hydrogen or methyl.
  • R 10 is C 1 -C 12 alkyl, C 3 -C 18 alkyl which is interrupted by O, or is C 3 -C 8 alkenyl, cyclopentyl, cyclohexyl or phenyl, or
  • R 9 and R 10 in the formula IIIb are together --CH 2 CH 2 --, and
  • R 11 is hydrogen, C 1 -C 12 alkyl, C 3 -C 18 alkyl which is interrupted by O, or is C 3 -C 8 alkenyl, cyclopentyl, cyclohexyl, phenyl or --OR 9 .
  • R 9 is C 1 -C 8 alkyl, C 3 -C 12 alkyl which is interrupted once by --O--, or is cyclohexyl, phenyl, benzyl, allyl or a radical of the formula IVb or Vb ##STR20##
  • X is C 1 -C 8 alkylene, C 4 -C 8 alkylene which is interrupted by --O--, or is xylylene
  • R 11 is hydrogen, C 1 -C 12 alkyl, C 3 -C 18 alkyl which is interrupted by O, or is C 3 -C 8 alkenyl, cyclopentyl, cyclohexyl or phenyl
  • R 12 is hydrogen or --OR 9 .
  • R 9 is C 1 -C 8 alkyl, C 3 -C 8 alkyl which is interrupted by --O--, or is benzyl, allyl or a radical of the formula IVb or Vb
  • X is C 1 -C 4 alkylene
  • R 10 is C 1 -C 12 alkyl
  • R 11 is hydrogen or methyl
  • R 12 is hydrogen.
  • R 9 is C 3 -C 12 alkyl, especially C 4 -C 12 alkyl.
  • R 4 and R 5 independently of one another are C 1 -C 12 alkyl or C 1 -C 12 alkoxy
  • R 6 is hydrogen, C 1 -C 12 alkyl or C 1 -C 12 alkoxy
  • R 7 is hydrogen or C 1 -C 4 alkyl
  • R 8 is hydrogen.
  • R 4 and R 5 independently of one another are methyl or methoxy
  • R 6 is hydrogen or methyl
  • R 7 and R 8 are hydrogen.
  • R 1 and R 2 are identical, R 4 and R 5 are identical and are methyl or methoxy, R 6 is hydrogen or methyl, R 7 and R 8 are hydrogen, R 9 is C 1 -C 8 alkyl, methoxyethyl, ethoxyethyl, phenyl or benzyl, R 10 is hydrogen, C 1 -C 4 alkyl, especially methyl, or is --OR 9 , R 11 is hydrogen, C 1 -C 4 alkyl, especially methyl, or is --OR 9 , and R 12 is hydrogen.
  • R 4 and R 5 independently of one another are C 1 -C 4 alkyl or C 1 -C 4 alkoxy
  • R 6 is hydrogen, C 1 -C 4 alkyl or C 1 -C 4 alkoxy
  • R 7 is hydrogen or methyl
  • R 8 is hydrogen.
  • the compounds of the formula I according to the invention can be prepared, for example, by double acylation of a primary phosphine (X) with at least 2 equivalents of an acid chloride (XI) in the presence of at least two equivalents of a base and subsequent oxidation of the resulting diacylphosphine (XII), in accordance with the scheme: ##STR21##
  • R 1 , R 2 and R 3 are as defined in claim 1.
  • Suitable bases are tertiary amines, pyridine, alkali metals, lithium diisopropylamide, butyllithium, alkaline earth metal carbonates, alkali metal alcoholates or alkali metal hydrides.
  • the first step of the reaction is preferably carried out in solution.
  • Particularly suitable solvents are hydrocarbons, for example alkanes and alkane mixtures, cyclohexane, benzene, toluene or xylene. Depending on the solvent and on the starting materials used, the reaction is carried out at various temperatures. When using bases such as lithium diisopropylamide or butyllithium, it is advantageous to work at -40-0° C.
  • the reactions with tert-amines, alkali metals or alkali metal hydrides as bases are advantageously implemented, for example, at 10-120° C., preferably 20-80° C.
  • the phosphine (XII) can be isolated by evaporative concentration.
  • the crude reaction product can be used further without purification or else purified, for example, by crystallization.
  • the second step of the reaction can also be carried out without isolation of (XII), using the solution of the crude product.
  • Suitable oxidizing agents for the second step, in order to prepare the oxides are in particular hydrogen peroxide and organic peroxy compounds, for example peracetic acid or air.
  • reaction products can be purified by generally conventional methods, for example by crystallization or chromatography.
  • phosphines of the formula (X) (and correspondingly, those of the formulae X' and X" as well) can be prepared, for example, by hydrogenating the corresponding dichlorides (XIII) or phosphonic esters (XIV): ##STR23##
  • R' is for example methyl or ethyl.
  • the reactions are carried out under conditions which are generally known to those skilled in the art.
  • the hydrogenation with LiAlH 4 can also be found, for example, from Helv. Chim. Acta 96 (1966), 842.
  • the dichlorides (XIII) can be obtained, for example, by Grignard reaction of the corresponding brominated aromatic compounds (XV) with PCl 3 (cf. e.g. Helv. Chim. Acta 35 (1952), 1412): ##STR24##
  • R 9 , R 10 , R 11 and R 12 are as defined in claim 1.
  • the diesters of formula (XIV) can be prepared, for example, by reacting the brorninated aromatic compounds (XV) with a phosphorus triester (XVI). Such reactions are described for example in DE-C-1 810 431. ##STR25##
  • the brominated aromatic compounds (XV) are obtained by bromination reactions which are known in the prior art, for example by reacting alkoxylated aromatic compounds with N-bromosuccinimide or bromine/acetic acid.
  • the compounds of the formula I can be used as photoinitiators for the photopolymerization of ethylenically unsaturated compounds or of mixtures which comprise such compounds.
  • This use may also be practised in combination with another photoinitiator and/or with other additives.
  • the invention therefore also relates to photopolymerizable compositions comprising
  • composition may contain other additives in addition to component (b), and component (b) may be a mixture of photoinitiators of the formula I and other photoinitiators.
  • the unsaturated compounds may contain one or more olefinic double bonds. They may be of low molecular weight (monomeric) or of relatively high molecular weight (oligomeric). Examples of monomers containing a double bond are alkyl or hydroxyalkyl acrylates or methacrylates, for example methyl, ethyl, butyl, 2-ethylhexyl or 2-hydroxyethyl acrylate, isobomyl acrylate, methyl methacrylate or ethyl methacrylate. Silicone acrylates are also of interest.
  • acrylonitrile acrylamide, methacrylamide, N-substituted (meth)acrylamides
  • vinyl esters such as vinyl acetate
  • vinyl ethers such as isobutyl vinyl ether
  • styrene alkylstyrenes and halostyrenes
  • N-vinylpyrrolidone vinyl chloride or vinylidene chloride.
  • Examples of monomers containing two or more double bonds are the diacrylates of ethylene glycol, propylene glycol, neopentylglycol, hexamethylene glycol or bisphenol A, and also 4,4'-bis(2-acryloyloxyethoxy)diphenylpropane, trimethylolpropane triacrylate, pentaerythritol triacrylate or pentaerythritol tetraacrylate, vinyl acrylate, divinylbenzene, divinyl succinate, diallyl phthalate, triallyl phosphate, triallyl isocyanurate or tris(2-acryloylethyl) isocyanurate.
  • Examples of relatively high molecular weight (oligomeric) polyunsaturated compounds are acrylicized epoxy resins, and polyesters, polyurethanes and polyethers which are acrylicized or contain vinyl ether or epoxy groups.
  • Further examples of unsaturated oligomers are unsaturated polyester resins which are mostly prepared from maleic acid, phthalic acid and one or more diols and have molecular weights of from about 500 to 3000.
  • Combinations of vinyl ether group-containing oligomers and polymers as are described in WO 90/01512 are particularly highly suitable. However, copolymers of vinyl ether and maleic acid-functionalized monomers are also appropriate.
  • Such unsaturated oligomers can also be referred to as prepolymers.
  • esters of ethylenically unsaturated carboxylic acids and polyols or polyepoxides examples include esters of ethylenically unsaturated carboxylic acids and polyols or polyepoxides, and polymers containing ethylenically unsaturated groups in the chain or in side groups, for example unsaturated polyesters, polyamides and polyurethanes and copolymers thereof, polybutadiene and butadiene copolymers, polyisoprene and isoprene copolymers, polymers and copolymers containing (meth)acrylic groups in side chains, and mixtures of one or more such polymers.
  • unsaturated carboxylic acids are acrylic acid, methacrylic acid, crotonic acid, itaconic acid, cinnamic acid, and unsaturated fatty acids such as linolenic acid or oleic acid.
  • Acrylic acid and methacrylic acid are preferred.
  • Suitable polyols are aromatic and, in particular, aliphatic and cycloaliphatic polyols.
  • aromatic polyols are hydroquinone, 4,4'-dihydroxybiphenyl, 2,2-di(4-hydroxyphenyl)propane, and also novolaks and resols.
  • polyepoxides are those based on said polyols, especially aromatic polyols and epichlorohydrin.
  • Other suitable polyols include polymers and copolymers which contain hydroxyl groups in the polymer chain or in side groups, for example polyvinyl alcohol and copolymers thereof or hydroxyalkyl polymethacrylates or copolymers thereof.
  • Other suitable polyols are oligoesters containing hydroxyl end groups.
  • aliphatic and cycloaliphatic polyols are alkylenediols, preferably having 2 to 12 carbon atoms, such as ethylene glycol, 1,2- or 1,3-propanediol, 1,2-, 1,3- or 1,4-butanediol, pentanediol, hexanediol, octanediol, dodecanediol, diethylene glycol, triethylene glycol, polyethylene glycol having molecular weights of preferably from 200 to 1500, 1,3-cyclopentanediol, 1,2-, 1,3- or 1,4-cyclohexanediol, 1,4-dihydroxymethylcyclohexane, glycerol, tris-(,-hydroxyethyl)amine, trimethylolethane, trimethylolpropane, pentaerythritol, dipentaerythritol and sorbitol.
  • the polyols may be partially or fully esterified by means of one or more unsaturated carboxylic acids, where the free hydroxyl groups in partial esters may be modified, for example etherified or esterified with other carboxylic acids.
  • esters are:
  • Further suitable components (a) are the amides of identical or different unsaturated carboxylic acids of aromatic, cycloaliphatic and aliphatic polyamines, preferably having 2 to 6, in particular 2 to 4, amino groups.
  • polyamines of this type are ethylenediamine, 1,2- or 1,3-propylenediamine, 1,2-, 1,3- or 1,4-butylenediamine, 1,5-pentylenediamine, 1,6-hexylenediamine, octylenediamine, dodecylenediamine, 1,4-diaminocyclohexane, isophoronediamine, phenylenediamine, bisphenylenediamine, di- ⁇ -aminoethyl ether, diethylenetriamine, triethylenetetramine, di( ⁇ -aminoethoxy) or di( ⁇ -aminopropoxy)ethane.
  • Suitable polyamines are polymers and copolymers which may contain additional amino groups in the side chain, and oligoamides containing amino end groups.
  • unsaturated amides of this type are: methylenebisacrylamide, 1,6-hexamethylenebisacrylamide, diethylenetriaminetrismethacrylamide, bis(methacrylamidopropoxy)ethane, ⁇ -methacrylamidoethyl methacrylate, and N-[( ⁇ -hydroxyethoxy)ethyl]acrylamide.
  • Suitable unsaturated polyesters and polyamides are derived, for example, from maleic acid and diols or diamines. Some of the maleic acid may be replaced by other dicarboxylic acids. They can be employed together with ethylenically unsaturated comonomers, for example styrene.
  • the polyesters and polyamides may also be derived from dicarboxylic acids and ethylenically unsaturated diols or diamines, in particular from relatively long chain compounds containing, for example, 6 to 20 carbon atoms.
  • Examples of polyurethanes are those built up from saturated or unsaturated diisocyanates and from unsaturated or saturated diols.
  • Polybutadiene and polyisoprene and copolymers thereof are known.
  • suitable comonomers are olefins such as ethylene, propene, butene, hexene, (meth)acrylate, acrylonitrile, styrene and vinyl chloride.
  • Polymers containing (meth)acrylate groups in the side chain are also known.
  • These may be, for example, products of the reaction of novolak-based epoxy resins with (meth)acrylic acid, homopolymers or copolymers of vinyl alcohol or hydroxyalkyl derivatives thereof which have been esterified using (meth)acrylic acid, or homopolymers and copolymers of (meth)acrylates which have been esterified using hydroxyalkyl (meth)acrylates.
  • the photopolymerizable compounds may be employed alone or in any desired mixtures. Preference is given to mixtures of polyol (meth)acrylates.
  • binders to the compositions according to the invention; this is particularly expedient if the photopolymerizable compounds are liquid or viscous substances.
  • the quantity of binder may be for example, 5-95% by weight, preferably 10-90% by weight and, in particular, 40-90% by weight, based on the overall solids content.
  • the binder is chosen depending on the field of application and on the properties required therefor, such as the facility for development in aqueous and organic solvent systems, adhesion to substrates and sensitivity to oxygen.
  • binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably 10,000-1,000,000.
  • suitable binders are polymers having a molecular weight of about 5000-2,000,000, preferably
  • the unsaturated compounds may also be used in mixtures with non-photopolymerizable film-forming components. These may be, for example, physically drying polymers or solutions thereof in organic solvents, for example nitrocellulose or cellulose acetobutyrate. However, they may also be chemically curable or heat-curable resins such as, for example, polyisocyanates, polyepoxides or melamine resins. The additional use of heat-curable resins is important for use in so-called hybrid systems, which are photopolymerized in a first step and crosslinked by thermal aftertreatment in a second step.
  • the photopolymerizable mixtures may contain various additives in addition to the photoinitiator.
  • thermal inhibitors which are intended to prevent premature polymerization, for example the hydroquinone, hydroquinine derivatives, p-methoxyphenol, ⁇ -naphthol or sterically hindered phenols such as 2,6-di(tert-butyl)-p-cresol.
  • the shelf life in the dark can be increased, for example, by using copper compounds such as copper naphthenate, copper stearate or copper octanoate, phosphorus compounds, for example triphenylphosphine, tributylphosphine, triethyl phosphite, triphenyl phosphite or tribenzyl phosphite, quaternary ammonium compounds, for example tetramethylammonium chloride or trimethylbenzylammonium chloride, or hydroxylamine derivatives, for example N-diethylhydroxylamine.
  • copper compounds such as copper naphthenate, copper stearate or copper octanoate
  • phosphorus compounds for example triphenylphosphine, tributylphosphine, triethyl phosphite, triphenyl phosphite or tribenzyl phosphite
  • quaternary ammonium compounds for example
  • paraffin or similar wax-like substances can be added; these migrate to the surface on commencement of the polymerization because of their low solubility in the polymer, and form a transparent surface layer which prevents the ingress of air.
  • Light stabilizers which can be added in small quantities are UV absorbers, for example those of the benzotriazole, benzophenone, oxalanilide or hydroxyphenyl-s-triazine type. These compounds can be employed individually or as mixtures, with or without the use of sterically hindered amines (HALS).
  • HALS sterically hindered amines
  • UV absorbers and light stabilizers examples are:
  • 2-(2'-Hydroxyhenyl)benzotriazoles for example 2-(2'-hydroxy-5'-methylphenyl)benzotriazole, 2-(3',5'-di-tert-butyl-2'-hydroxyphenyl)benzotriazole, 2-(5'-tert-butyl-2'-hydroxyphenyl)benzotriazole, 2-(2'-hydroxy-5'-(1,1,3,3-tetramethylbutyl)phenyl)benzotriazole, 2-(3',5'-di-tert-butyl-2'-hydroxyphenyl)-5-chlorobenzotriazole, 2-(3'-tert-butyl- 2'-hydroxy-5'-methylphenyl)-5-chlorobenzotriazole, 2-(3'-sec-butyl-5'-tert-butyl-2'-hydroxyphenyl)benzotriazole, 2-(2'-hydroxy-4'-octoxyphenyl)benzo
  • 2-Hydroxybenzophenones for example the 4-hydroxy, 4-methoxy, 4-octoxy, 4-decyloxy, 4-dodecyloxy, 4-benzyloxy, 4,2',4'-trihydroxy and 2'-hydroxy-4,4'-dimethoxy derivatives.
  • esters of unsubstituted or substituted benzoic acids for example 4-tert-butyl-phenyl salicylate, phenyl salicylate, octylphenyl salicylate, dibenzoylresorcinol, bis(4-tert-butylbenzoyl)resorcinol, benzoylresorcinol, 2,4-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzoate, hexadecyl 3,5-di-tert-butyl-4-hydroxybenzoate, octadecyl 3,5-di-tert-butyl-4-hydroxybenzoate, 2-methyl-4,6-di-tert-butylphenyl 3,5-di-tert-butyl-4-hydroxybenzoate.
  • Acrylates for example ethyl and isooctyl ⁇ -cyano- ⁇ , ⁇ -diphenylacrylate, methyl ⁇ -carbomethoxycinnamate, methyl and butyl ⁇ -cyano- ⁇ -methyl-p-methoxycinnamate, methyl ⁇ -carbomethoxy-p-methoxycinnamate and N-(,-carbomethoxy- ⁇ -cyanovinyl)-2-methylindoline.
  • Sterically hindered amines for example bis(2,2,6,6-tetramethylpiperidyl) sebacate, bis(2,2,6,6-tetramethylpiperidyl) succinate, bis(1,2,2,6,6-pentamethylpiperidyl) sebacate, bis(1,2,2,6,6-pentamethylpiperidyl) n-butyl-3,5-di-tert-butyl-4-hydroxybenzylmalonate, the product of the condensation of 1-hydroxyethyl-2,2,6,6-tetramethyl-4-hydroxypiperidine and succinic acid, the product of the condensation of N,N'-bis(2,2,6,6-tetramethyl-4-piperidyl)hexamethylenediamine and 4-tert-octylamino-2,6-dichloro-1,3,5-s-triazine, tris(2,2,6,6- tetramethyl-4-piperidyl) nitrilotriacetate, tetra
  • Oxalamides for example 4,4'-dioctyloxyoxanilide, 2,2'-diethoxyoxanilide, 2,2'-dioctyloxy-5,5'-di-tert-butyloxanilide, 2,2'-didodecyloxy-5,5'-di-tert-butyloxanilide, 2-ethoxy-2'-ethyloxanilide, N,N'-bis(3-dimethylaminopropyl)oxalamide, 2-ethoxy-5-tert-butyl-2'-ethyloxanilide and mixtures thereof with 2-ethoxy-2'-ethyl-5,4'-di-tert-butyloxanilide, and mixtures of o- and p-methoxy- and of o-and p-ethoxy-disubstituted oxanilides.
  • Phosphites and phosphonites for example triphenyl phosphite, diphenyl alkyl phosphites, phenyl dialkyl phosphites, tris(nonylphenyl) phosphite, trilauryl phosphite, trioctadecyl phosphite, distearyl pentaerythrityl diphosphite, tris(2,4-di-tert-butylphenyl) phosphite, diisodecylpentaerythrityl diphosphite, bis(2,4-di-tert-butylphenyl) pentaerythrityl diphosphite, bis(2,6-di-tert-butyl-4-methylphenyl) pentaerythrityl diphosphite, bisisodecyloxy-pentaerythrityl diphosphite, bis(2,4-d
  • amines such as, for example, triethanolamine, N-methyldiethanolamine, ethyl p-dimethylaminobenzoate or Michler's ketone.
  • the action of the amines can be intensified by the addition of aromatic ketones of the benzophenone type.
  • amines which can be used as oxygen scavengers are substituted N,N-dialkylanilines as described in EP-A-339 841.
  • the photopolymerization can also be accelerated by addition of photosensitizers which shift or broaden the spectral sensitivity.
  • photosensitizers which shift or broaden the spectral sensitivity.
  • aromatic carbonyl compounds such as benzophenone derivatives, thioxanthone derivatives, anthraquinone derivatives and 3-acylcoumarin derivatives and 3-(aroylmethylene)thiazolines, and also eosin, rhodanine and erythrosine dyes.
  • the curing process may be assisted, in particular, by compositions pigmented with TiO 2 , for example, but also by addition of a component which forms free radicals under thermal conditions, for example an azo compound such as 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile) or a peroxy compound such as a hydroperoxide or peroxycarbonate, for example t-butyl hydroperoxide, as described in EP-A 245 639, for example.
  • a component which forms free radicals under thermal conditions for example an azo compound such as 2,2'-azobis(4-methoxy-2,4-dimethylvaleronitrile) or a peroxy compound such as a hydroperoxide or peroxycarbonate, for example t-butyl hydroperoxide, as described in EP-A 245 639, for example.
  • compositions according to the invention may also contain a photoreducible dye, for example a xanthene, benzoxanthene, benzothioxanthene, thiazine, pyronine, porphyrin or acridine dyes, and/or a trihalomethyl compound which can be cleaved by radiation.
  • a photoreducible dye for example a xanthene, benzoxanthene, benzothioxanthene, thiazine, pyronine, porphyrin or acridine dyes, and/or a trihalomethyl compound which can be cleaved by radiation.
  • a photoreducible dye for example a xanthene, benzoxanthene, benzothioxanthene, thiazine, pyronine, porphyrin or acridine dyes, and/or a trihalomethyl compound which can be cleaved by radiation.
  • Thick and pigmented coatings can suitably be cured by the addition of glass microbeads or powdered glass fibres, as described in U.S. Pat. No. 5 013 768, for example.
  • the invention also relates to compositions comprising as component (a) at least one ethylenically unsaturated, photopolymerizable compound which is emulsified or dissolved in water.
  • Radiation-curable, aqueous prepolymer dispersions of this type are commercially available in many variations. This term is taken to mean a dispersion of water and at least one prepolymer dispersed therein.
  • concentration of the water in these systems is, for example, from 5 to 80% by weight, in particular from 30 to 60% by weight.
  • the radiation-curable prepolymer or prepolymer mixture is present, for example, in concentrations of from 95 to 20% by weight, in particular from 70 to 40% by weight.
  • the total of the percentages indicated for water and prepolymer in these compositions is in each case 100, to which are added the assistants and additives in various amounts depending on the application
  • the radiation-curable, water-dispersed, film-forming prepolymers which are frequently also dissolved, are, for aqueous prepolymer dispersions, monofunctional or polyfunctional ethylenicaly unsaturated prepolymers which are known per se, can be initiated by means of free radicals and contain, for example, from 0.01 to 1.0 mol of polymerizable double bonds per 100 g of prepolymer, and have an average molecular weight of, for example, at least 400, in particular from 500 to 10,000. Depending on the intended application, however, prepolymers having higher molecular weights may also be suitable.
  • polyesters containing polymerizable C--C double bonds and having a maximum acid number of 10 polyethers containing polymerizable C--C double bonds, hydroxyl-containing products of the reaction of a polyepoxide containing at least two epoxide groups per molecule with at least one ⁇ , ⁇ -ethylenically unsaturated carboxylic acid, polyurethane (meth)acrylates and ⁇ , ⁇ -ethylencally unsaturated acrylic copolymers containing acrylic radicals, as described in EP-A-12 339, are used. Mixtures of these prepolymers may also be used.
  • EP-A-33 896 which a re thioether adducts of polymerizable prepolymers having an average molecular weight of at least 600, a carboxyl group content of fro m 0.2 to 15% and a content of from 0.01 to 0.8 mol of polymerizable C--C double bonds per 100 g of prepolymer.
  • Other suitable aqueous dispersions based on specific alkyl (meth)acrylate polymers are described in EP-A-41 125, and suitable water-dispersible, radiation-curable prepolymers made from urethane acrylates are disclosed in DE-A-2 936 039.
  • These radiation-curable, aqueous prepolymer dispersions may contain, as further additives, dispersion assistants, emulsifiers, antioxidants, light stabilizers, dyes, pigments, fillers, for example talc, gypsum, silica, rutile, carbon black, zinc oxide and iron oxides, reaction accelerators, levelling agents, lubricants, wetting agents, thickeners, matting agents, antifoars and other assistants which are conventional in surface-coating technology.
  • Suitable dispersion assistants are water-soluble, high molecular weight organic compounds containing polar groups, for example polyvinyl alcohols, polyvinylpyrrolidone and cellulose ethers.
  • Emulsifiers which can be used are nonionic emulsifiers and possibly also ionic emulsifiers.
  • m ixtures of two or more of the photoinitiators according to the invention may be of advantage to use m ixtures of two or more of the photoinitiators according to the invention. It is of course also possible to use mixtures with known photoinitiators, for example mixtures with benzophenone, acetophenone derivatives, for example t-hydroxycycloaikylphenyl ketones, dialkoxyacetophenones, ⁇ -hydroxy- or ⁇ -aminoacetophenones, 4-aroyl- 1,3-dioxolanes, benzoin alkyl ethers and benzil ketals, monoacylphosphine oxides, bisacylphosphine oxides or titanocenes.
  • mixtures with known photoinitiators for example mixtures with benzophenone, acetophenone derivatives, for example t-hydroxycycloaikylphenyl ketones, dialkoxyacetophenones, ⁇ -hydroxy- or ⁇ -amino
  • cationic photoinitiators such as aromatic sulfonium or iodonium salts or cyclopentadienylareneiron(II) complex salts are used in addition to the free-radical curing agents according to the invention.
  • the photopolymerizable compositions contain the photoinitiator or the photoinitiator mixture (b) advantageously in a quantity of from 0.05 to 15% by weight, preferably from 0.1 to 5% by weight, based on the composition.
  • the invention also relates to compositions in which the additional photoinitiators are compounds of the formula (VII) ##STR26## or mixtures of compounds of the formulae (VII) and (VIII), in which
  • R 19 and R 20 independently of one another are hydrogen, C 1 -C 6 alkyl, phenyl, C 1 -C 16 alkoxy or --O(CH 2 CH 2 O)q--C 1 -C 1 - 16 alkyl, in which q is a number from 1-20, or R 19 and R 20 , together with the carbon atom to which they are attached, form a cyclohexyl ring,
  • R 21 is hydroxyl, C 1 -C 16 alkoxy or --O(CH 2 CH 2 O)q--C 1 -C 16 alkyl, where R 20 , R 21 and R 22 are not all simultaneously C 1 -C 16 alkoxy or --O(CH 2 CH 2 O)q--C 1 -C 16 alkyl,
  • R 22 is hydrogen, C 1 -C 18 alkyl, C 1 -C 18 alkoxy, --OCH 2 CH 2 --OR 23 , a group ##STR27## group ##STR28## in which 1 has a value from 2 to 10 and A is the radical ##STR29##
  • R 23 is hydrogen, ##STR30##
  • R 24 , R 25 and R 26 independently of one another are hydrogen or methyl.
  • R 22 as C 1 -C 18 alkyl and also R 20 and R 21 as C 1 -C 6 alkyl, may have the same meanings as those described for R 1 , up to the respective number of carbon atoms.
  • R 22 as C 1 -C 18 alkoxy is for example branched or unbranched alkoxy, for example methyloxy, ethyloxy, n-propyloxy, isopropyloxy, n-butyloxy, isobutyloxy, sec-butyloxy, tert-butyloxy, pentyloxy, hexyloxy, heptyloxy, octyloxy, 2,4,4trimethyl- 1-pentyloxy, 2-ethylhexyloxy, nonyloxy, decyloxy, dodecyloxy or octadecyloxy.
  • R 9 , R 20 and R 21 as C 1 -C 16 alkoxy may have the same meanings as those described for R 22 , up to the appropriate number of carbon atoms, and are preferably decyloxy, methoxy and ethoxy, especially methoxy and ethoxy.
  • the radical --O(CH 2 CH 2 O)q--C 1 -C 16 alkyl represents 1 to 20 successive ethylene oxide units whose chain ends in C 1 -C 16 alkyl. q is preferably 1 to 10, for example 1 to 8, especially 1 to 6.
  • the chain of ethylene oxide units is preferably terminated with a C 1 -C 10 alkyl, for example C 1 -C 8 alkyl, especially C 1 -C 4 alkyl.
  • compositions are those in which, in the formula (VII), R 20 and R 21 independently of one another are C 1 -C 6 alkyl, or together with the carbon atom to which they are attached form a cyclohexyl ring, and R 9 is hydroxyl.
  • compositions are those in which the proportion of compounds of the formula (I) in a mixture with compounds of the formulae (VII) and/or (VIII) is from 5 to 95%, preferably from 5 to 50%.
  • compositions comprising compounds of the formula (I) and a mixture of compounds of the formula (VIII), in which compounds of the formula (VIII) where R 25 and R 26 are both hydrogen and R 24 is methyl are present to the extent of 20%, and compounds of the formula (VIII) where R 25 , R 24 and R 26 are all methyl are present to the extent of 80%.
  • the photopolymerizable compositions can be used for various purposes, for example as printing inks, as varnishes or clearcoats, as white paints, for example for wood or metal, as coating subtances, inter alia, for paper, wood, metal or plastic, as dayight-curable coatings for buildings and roadmarking, for photographic reproduction processes, for holographic recording materials, for image recording processes or for the production of printing plates which can be developed using organic solvents or aqueous-alkaline media, for the production of masks for screen printing, as dental filling materials, as adhesives, as pressure-sensitive adhesives, as laminating resins, as etch resists or permanent resists and as solder masks for electronic circuits, for the production of three-dimensional articles by bulk curing (UV curing in transparent moulds) or by the stereolithography process, as described, for example, in U.S.
  • Pat. No. 4575 330 for the preparation of composite materials (for example styrenic polyesters, which may contain glass fibres and other assistants) and other thick-layer compositions, for the coating or encapsulation of electronic components or as coatings for optical fibres.
  • the compounds according to the invention may also be used as initiators for emulsion polymerizations, as initiators of a polymerization for the fixing of ordered states of liquid-crystalline mono- and oligomers, as initiators for the fixing of dyes to organic materials, and f or curing powder coatings.
  • mixtures of a prepolymer with polyunsaturated monomers are often used which also contain a monounsaturated monomer.
  • the prepolymer here is primarily responsible for the properties of the coating film, and variation thereof allows the person skilled in the art to influence the properties of the cured film.
  • the polyunsaturated monomer functions as a crosslinking agent which renders the coating film insoluble.
  • the monounsaturated monomer functions as a reactive diluent by means of which the viscosity is reduced without the need to use a solvent.
  • Unsaturated polyester resins are mostly used in two-component systems in conjunction with a monounsaturated monomer, preferably styrene.
  • a monounsaturated monomer preferably styrene.
  • specific one-component systems are frequently employed, for example polymaleimides, polychalcones or polyimides, as described in DE-A-23 08 830.
  • the compounds according to the invention and mixtures thereof may also be used as free-radical photoinitiators or photoinitiating systems for radiation-curable powder coatings.
  • the powder coatings may be based on solid resins and monomers containing reactive double bonds, for example maleates, vinyl ethers, acrylates, acrylamides and mixtures thereof.
  • a free-radically UV-curable powder coating can be formulated by mixing unsaturated polyester resins with solid acrylamides (e.g. methyl methacrylamidoglycolate) and with a free-radical photoinitiator according to the invention, as described, for example, in the paper "Radiation Curing of Powder Coating", Conference Proceedings, Radtech Europe 1993 by M. Wittig and Th. Gohmann.
  • free-radically UV-curable powder coatings can be formulated by mixing unsaturated polyester resins with solid acrylates, methacrylates or vinyl ethers and with a photoinitiator (or mixture of photoinitiators) according to the invention.
  • the powder coatings may also contain binders as described for example in DE-A-42 28 514 or EP-A-636 669.
  • the UV-curable powder coatings may also comprise white or coloured pigments.
  • rutile titanium dioxide can be employed in concentrations of up to 50% by weight in order to give a cured powder coating having good covering power.
  • the process normally comprises electrostatic or tribostatic spraying of the powder onto the substrate, for example of metal or wood, melting the powder by heating and, after a smooth film has been formed, radiation-curing of the coating using ultraviolet and/or visible light, for example with medium-pressure mercury lamps, metal halide lamps or xenon lamps.
  • a particular advantage of the radiation-curable powder coatings over their heat-curable counterparts is that the flow time after the melting of the powder particles can be selectively extended in order to ensure the formation of a smooth, high-gloss coating.
  • radiation-curable powder coatings can be formulated without the unwanted effects of a reduction in their lifetime so that they melt at relatively low temperatures. For this reason, they are also suitable as coatings for heat-sensitive substrates such as wood or plastics.
  • the powder coating formulations may also contain UV absorbers. Appropriate examples have been listed above under items 1-8.
  • the photocurable compositions according to the invention are suitable, for example, as coating substances for substrates of all kinds, for example wood, textiles, paper, ceramic, glass, plastics such as polyesters, polyethylene terephthalate, polyolefins or cellulose acetate, especially in the form of films, and also metals such as Al, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or SiO 2 , on which it is desired to apply a protective coating or, by imagewise exposure, an image.
  • substrates of all kinds for example wood, textiles, paper, ceramic, glass, plastics such as polyesters, polyethylene terephthalate, polyolefins or cellulose acetate, especially in the form of films, and also metals such as Al, Cu, Ni, Fe, Zn, Mg or Co and GaAs, Si or SiO 2 , on which it is desired to apply a protective coating or, by imagewise exposure, an image.
  • the substrates can be coated by applying a liquid composition, a solution or suspension to the substrate.
  • a liquid composition a solution or suspension
  • the choice of the solvent and the concentration depend predominantly on the type of composition and the coating procedure.
  • the solvent should be inert: in other words it should not undergo any chemical reaction with the components and should be capable of being removed again after the coating operation, in the drying process.
  • suitable solvents are ketones, ethers and esters, such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahydrofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-dimethoxyethane, ethyl acetate, n-butyl acetate and ethyl 3-ethoxypropionate.
  • ketones such as methyl ethyl ketone, isobutyl methyl ketone, cyclopentanone, cyclohexanone, N-methylpyrrolidone, dioxane, tetrahydrofuran, 2-methoxyethanol, 2-ethoxyethanol, 1-methoxy-2-propanol, 1,2-dimethoxyethane, ethyl acetate, n-
  • the solution is applied evenly to a substrate, for example by spincoating, dip coating, knife coating, curtain coating, brushing, spraying, especially electrostatic spraying, and reverse roll coating. It is also possible to apply the photosensitive layer to a temporary, flexible support and then to coat the final substrate, for example a copper-laminated circuit board, by means of layer transfer via lamination.
  • the quantity applied (layer thickness) and the nature of the substrate (layer support) are functions of the desired application.
  • the range of coat thicknesses generally comprises values from about 0.1 ⁇ m to more than 10 ⁇ m.
  • the radiation-sensitive compositions according to the invention find application as negative resists which have a very high photosensitivity and can be developed in an aqueous-alkaline medium without swelling. They are suitable as photoresists for electronics (galvanoresists, etch resists and solder resists), the production of printing plates such as offset printing plates or screen printing formes, and can be used for chemical milling or as microresists in the production of integrated circuits. There is a correspondingly wide range of variation in the possible layer supports and the processing conditions for the coated substrates.
  • Examples of the layer supports for photographic information recordings are films made of polyester, cellulose acetate or plastic-coated papers; for offset printing plates, specially treated aluminium; for the production of printed circuits, copper-faced laminates; and for the production of integrated circuits, silicon wafers.
  • the layer thicknesses for photographic materials and offset printing plates are generally from about 0.5 ⁇ m to 10 ⁇ m, while for printed circuits they are from 0.4 ⁇ m to about 2 ⁇ m.
  • the solvent is generally removed by drying to leave a layer of the photoresist on the substrate.
  • imagewise exposure relates both to exposure through a photomask containing a predetermined pattern, for example a slide, exposure by a laser beam which is moved under control from a computer, for example, over the surface of the coated substrate, thereby generating an image, and irradiation with computer-controlled electron beams.
  • thermo treatment in which only the exposed parts are thermally cured.
  • the temperatures employed are generally 50-150° C. and preferably 80-130° C.; the duration of the thermal treatment is generally between 0.25 and 10 minutes.
  • the photocurable composition can also be used in a process for the production of printing plates or photoresists as described, for example, in DE-A-40 13 358. In this process the composition is exposed before, simultaneously with or after the imagewise irradiation, exposure being carried out for a short period with visible light at a wavelength of at least 400 nm without a mask.
  • the unexposed areas of the photoresist are removed using a developer in a manner known per se.
  • compositions according to the invention can be developed by aqueous-alkaline media.
  • Suitable aqueous-alkaline developer solutions are, in particular, aqueous solutions of tetraalkylammonium hydroxides or of alkali metal silicates, phosphates, hydroxides and carbonates.
  • Relatively small quantities of wetting agents and/or organic solvents may also be added, if desired, to these solutions.
  • Examples of typical organic solvents which may be added in small quantities to the developing liquids are cyclohexanone, 2-ethoxyethanol, toluene, acetone and mixtures of such solvents.
  • UV-curing is of considerable importance for printing inks, since the drying time of the binder is a crucial factor for the production rate of graphic products and should be in the order of fractions of seconds. UV-curable inks are important, in particular, for screen printing.
  • the mixtures according to the invention are also highly suitable for the production of printing plates, where, for example, mixtures of soluble, linear polyamides or styrene/butadiene or styrene/isoprene rubber, polyacrylates or polymethyl methacrylates containing carboxyl groups, polyvinyl alcohols or urethane acrylates are used with photopolymerizable monomers, for example acrylamides, methacrylamides, acrylates or methacrylates, and a photoinitiator. Films and plates made from these systems (wet or dry) are exposed through the negative (or positive) of the print original, and the uncured parts are subsequently washed out using a suitable solvent.
  • a suitable solvent for example, mixtures of soluble, linear polyamides or styrene/butadiene or styrene/isoprene rubber, polyacrylates or polymethyl methacrylates containing carboxyl groups, polyvinyl alcohols or urethane
  • a further area of application for photocuring is the coating of metals, for example in the coating of metal sheets and tubes, cans or bottle caps, and the photocuring of plastic coatings, for example PVC-based wall or floor coverings.
  • Examples of the photocuring of paper coatings are the colourless coating of labels, record sleeves or book covers.
  • the use of the compounds according to the invention for curing shaped articles made from composite compositions is likewise of interest.
  • the composite composition is made up of a self-supporting matrix material, for example a glass-fibre fabric, or else, for example, plant fibres [cf. K.-P. Mieck and T. Reussmann in Kunststoffe 85 (1995), 366-370], which is impregnated with the photocuring formulation.
  • Shaped articles which are produced from composite compositions, using the compounds according to the invention, are of high mechanical stability and resistance.
  • the compounds according to the invention can also be employed as photocuring agents in moulding, impregnating and coating compositions, as described, for example, in EP-A-7086.
  • compositions are fine coating resins on which stringent requirements are placed with respect to their curing activity and yellowing resistance, or fibre-reinforced mouldings such as planar or longitudinally or transversely corrugated light diffusing panels.
  • Processes for the production of such mouldings for example hand lay-up, spray lay-up, centrifugal or filament winding processes, are described by, for example P. H. Selden in "Glasfaserverstarkte Kunststoffe” [Glass fibre-reinforced plastics], page 610, Springer Verlag Berlin-Heidelberg-New York 1967.
  • articles for use which can be produced by this process are boats, chipboard or plywood panels coated on both sides with glass fibre-reinforced plastic, pipes, containers and the like.
  • moulding, impregnating and coating compositions are UP resin fine coatings for mouldings containing glass fibres (GRP), e.g. corrugated sheets and paper laminates. Paper laminates may also be based on urea or melamine resins. The fine coating is produced on a support (for example a film) prior to the production of the laminate.
  • the photocurable compositions according to the invention can also be used f or casting resins or for encapsulating articles such as electronic components and the like.
  • Curing em ploys medium-pressure mercury lamps as are conventional in UV curing. However, less intense lamps are also of particular interest, for example those of the type TL40W/03 or TL40W/05. The intensity of these lamps corresponds approximately to that of sunlight. Direct sunlight can also be used for curing.
  • a further advantage is that the composite composition can be removed from the light source in a partially cured, plastic state and can be deformed. Curing is subsequently carried out to completion.
  • the photocurable layer can also be applied by electrodeposition to metal. The exposed areas are crosslinked/polymeric and thus insoluble and remain on the support. If appropriate colouration is carried out, visible images are formed.
  • the support is a metallized layer, then the metal can be removed from the unexposed areas by etching after exposure and development or can be increased in thickness by electroplating. In this way, printed electronic circuits and photoresists can be produced.
  • the photosensitivity of the compositions according to the invention generally ranges from the UV region (about 200 nm) up to about 600 nm, and therefore spans a very wide range.
  • Suitable radiation comprises, for example, sunlight or light from artificial sources. Therefore, a large number of very different types of light source can be used. Both point sources and flat radiators (lamp carpets) are appropriate.
  • Examples are: carbon arc lamps, xenon arc lamps, medium-pressure, high-pressure and low-pressure mercury lamps, doped with metal halides if desired (metal halogen lamps), microwave-stimulated metal vapour lamps, excimer lamps, superactinic fluorescent tubes, fluorescent lamps, incandescent argon lamps, electronic flashlights, photographic flood lamps, electron beams and X-rays, produced by means of synchrotrons, or laser plasma.
  • the distance between the lamp and the substrate according to the invention which is to be exposed can vary depending on the application and on the type and/or power of the lamp, for example from between 2 cm and 150 cm.
  • laser light sources for example excimer lasers, such as krypton F lasers for exposure at 248 nm.
  • Lasers in the visible range may also be employed.
  • the high sensitivity of the materials according to the invention is very advantageous.
  • daylight or daylight-equivalent light sources refers to radiation of wavelength 300-500 nm.
  • radiation of wavelength 400-450 nm in particular, must be present for curing.
  • the curing effect is achieved by the action of lower-intensity radiation over a longer period.
  • Examples of such radiation are sunlight, and radiation sources which are equivalent to daylight.
  • Sunlight differs from the light from the artificial radiation sources which are usual and customary in UV curing in respect of its spectral composition and intensity.
  • the absorption characteristics and the radical-forming properties of the bisacylphosphine oxides employed in the process according to the invention are particularly suitable for utilizing sunlight as natural radiation source for the curing.
  • the dimeric bisacylphosphine oxides employed in the process according to the invention give tack-free surfaces within 1-30, in particular 1-15 minutes on irradiation with daylight or with daylight-equivalent light sources.
  • the radiation intensities of the radiation which can be utilized for curing are in the range of 25-35 W/cm 2 .
  • daylight-equivalent artificial light sources refers to low-intensity radiators such as, for instance, certain fluorescent lamps, e.g. the TL03, TLO5 or TL09 Philips special fluorescent lamps.
  • the invention therefore also relates to the use of compounds of the formula I in which R 3 is a group of the formula IIIb, ##STR31## in which
  • R 9 is C 1 -C 12 alkyl, C 2 -C 12 alkyl which is interrupted by O, or is C 1 -C 4 alkyl which is substituted with C 3 -C 8 alkenoxy, or is cyclopentyl, cyclohexyl, phenyl which is unsubstituted or is substituted with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, benzyl which is unsubstituted or is substituted on the phenyl ring with 1-4 C 1 -C 4 alkyl and/or C 1 -C 4 alkoxy groups, or is C 3 -C 8 alkenyl, or R 9 is a radical of the formula IV or V,
  • X is unsubstituted or --OR 13 -substituted C 1 -C 12 alkylene, C 3 -C, 8 alkylene which is interrupted by O, or is C 4 -C 8 alkenylene or xylylene,
  • R 10 is C 1 -C 12 alkyl, C 3 -C 18 alkyl which is interrupted by O, or is C 3 -C 8 alkenyl, cyclopentyl, cyclohexyl or phenyl, or
  • R 9 and R 10 in the formula IIIb are together --CH 2 CH 2 --
  • R 11 is hydrogen, C 1 -C 12 alkyl, C 3 -C 18 alkyl which is interrupted by 0, or is C 3 -C 8 alkenyl, cyclopentyl, cyclohexyl, phenyl or --OR 9 , and
  • R 13 is C 1 -C 4 alkyl, for the curing of ethylenically unsaturated compounds with daylight or daylight-equivalent light sources, and to a method of curing ethylenically unsaturated polymerizable compounds, which comprises adding to these compounds at least one photoinitiator of the formula I as defined above and carrying out irradiation with daylight or daylight-equivalent light sources.
  • the invention likewise relates to the use of compounds of the formula I for the curing of shaped articles made from composite compositions, and to a process of curing shaped articles made from composite compositions using the above-defined compounds of the formula I.
  • the invention also relates to the use of the composition according to the invention for the production of coating substances, in particular white paints for wood coatings and metal coatings, or clearcoats, for the production of coating materials pigmented with coloured pigments, for the production of clear or pigmented aqueous dispersions, for the production of powder coatings, for the production of printing inks, for the production of three-dimensional articles by bulk curing or stereolithography, for the production of dental filling compositions, for the production of composite materials, for the production of printing plates, for the production of masks for screen printing, for the production of photoresists for printed electronic circuits, for the production of adhesives, as a coating for optical fibres or as a coating or encapsulation of electronic components.
  • coating substances in particular white paints for wood coatings and metal coatings, or clearcoats, for the production of coating materials pigmented with coloured pigments, for the production of clear or pigmented aqueous dispersions, for the production of powder coatings, for the production of printing in
  • the invention additionally relates to a process for the photopolymerization of compounds containing ethylenically unsaturated double bonds, which comprises irradiating a composition as described above with light in the range from 200 to 600 nm.
  • this process is also used for the production of coating substances, especially white paints for wood coatings and metal coatings, or clear coating materials, for the production of powder coatings, for the production of coating materials for daylight-curable constructional coatings and road markings, for the production of composite materials, for the production of printing plates, for the production of masks for screen printing, for the production of photoresists for printed electronic circuits, for the production of adhesives, for the production of coatings for optical fibres, for the production of coatings or encapsulations of electronic components, and in the method of bulk curing or stereolithography.
  • the invention likewise relates to a coated substrate which is coated on at least one surface with a cured composition as described above, and to a process for the photographic production of relief images in which a coated substrate is subjected to imagewise exposure and then the unexposed areas are removed with a solvent.
  • the compounds according to the invention exhibit good stability to hydrolysis.
  • a further advantage is that they can be dissolved very readily in the mixtures to be polymerized, and are of only very low volatility.
  • the yellowing values of the compositions cured using the compounds according to the invention are low, and surfaces having good gloss values are obtained.
  • the compounds according to the invention are also highly suitable for the curing of relatively thick pigmented layers. Using the compounds according to the invention is it possible, for example, to cure layers up to 300 ⁇ m.
  • the maximum curable layer thicknesses are dependent on the concentration of TiO 2 . For example, TiO 2 contents of up to 50% are possible.
  • the compounds according to the invention are not very yellow themselves, and are therefore particularly suitable for use as initiators. Moreover, when irradiated the compounds according to the invention fade with particular rapidity, which is a factor in favour of their use as initiators, especially in polymerizable compositions which must not show any yellow coloration.
  • Example 1a 80 g of 1,3-dibutoxybenzene (0.36 mol) are dissolved at room temperature in 100 ml of carbon tetrachloride. 64.25 g of N-bromosuccinimide (0.36 mol) are introduced in portions over 30 minutes such that the temperature can be maintained between 20° C. and 30° C. When the addition is complete, the mixture is stirred at room temperature for 1 hour. The reaction mixture is filtered over kieselguhr and the solvent is removed completely by concentration. The crude product (110 g) is fractionated on a 10 cm Vigreux column at 10 -1 mbar. In this way, 65 g of 1-bromo-2,4-dibutoxybenzene with a boiling point of 112° C. at 10.1 mbar are obtained as a yellowish oil in 60% yield.
  • Examples 2a-18a The compounds of Examples 2a-18a are prepared by the same method as described in Example 1a.
  • the compounds are obtained in analogy to the method described in Example 1a.
  • the boiling point of compound 20a is 223° C., that of compound 21a is 131° C./10 mmHg.
  • Specific 1 H NMR shift values ⁇ for the compound 22a are: OCH 2 (triplet) 3.90 ppm, H m 6.36 ppm.
  • Compound 23a is commercially available (melting point 99° C.).
  • Specific 1 H NMR shift values 8 for the compound 24a are: H o (doublet) 3.75 ppm, H m (fine doublet) 6.47 ppm.
  • Specific 1 H NMR shift values 8 for the compound 25a are: OCH 3 3.80 ppm, H o 7.36 ppm, Hp 7.13 ppm.
  • Example 1b Under a stream of nitrogen, 61 g of 1-bromo-2,4-dibutoxybenzene (0.20 mol) are heated together with 2.50 g of nickel(II) chloride (0.019 mol) to 160° C., and 46.3 g of triethyl phosphite (0.278 mol) are added dropwise over the course of 1 1/2 hours. The ethyl bromide formed in this process is distilled off from the reaction mixture continuously. After addition is complete, the mixture is stirred at 160° C. for 1 hour. The reaction mixture is then cooled to room temperature, 50 ml of diethyl ether are added, the mixture is filtered through kieselguhr and the solvent is removed completely by concentration.
  • the crude product (82 g) is fractionated on a 10 cm Vigreux column at 10 -1 mbar. In this way, 42 g of diethyl (2,4-dibutoxyphenyl)phosphonate having a boiling point of 170° C. at 10 -1 mbar are obtained as a colourless oil in 60% yield.
  • Examples 2b-18b The compounds of Examples 2b-18b are prepared by the same method as described in Example 1b. The compounds and their boiling points are compiled in Table 2. ##STR34##
  • the compounds are obtained in analogy to the method described in Example 1b.
  • the melting point of compound 23a is 60° C.
  • Example 1c Under a nitrogen atmosphere and with exclusion of moisture, 8.23 g of lithium aluminium hydride (0.217 mol) are suspended in 180 ml of diethyl ether, and at -10° C. 25.80 g of diethyl (2,4-dibutoxyphenyl)phosphonate (0.072 mol) are added dropwise over the course of 1 1/2 hours. The reaction mixture is then stirred overnight at room temperature. At a temperature of between 0° and 5° C., hydrolysis is carried out with 8.0 g of water and then with 8.0 g of 15% strength NaOH and 24 g of water, carefully and with vigorous stirring, to produce a bulky precipitate.
  • Examples 2c-18c and 20c-25c The compounds are prepared by the same method as described in Example 1c. They are obtained as oils and used subsequently without further purification or characterization.
  • Example 1 Under a nitrogen atmosphere and with exclusion of moisture, 16.20 g of diisopropylamine (0.16 mol) are dissolved in 50 ml of tetrahydrofuran, and 100 ml of butyllithium (1.6 M in hexane (0.16 mol)) are added dropwise with stirring at between -10° C. and 10° C. over the course of 20 minutes. The freshly prepared lithium diisopropylamide (LDA) is added dropwise over the course of 90 minutes at between -40° C. and -30° C.
  • LDA lithium diisopropylamide
  • Examples 2-19 The compounds of Examples 32-19 are prepared in analogy to the method described in Example 1 using the corresponding starting materials of the formulae 2c to 19c. In order to prepare the compound of Example 19, 2,6-dimethoxybenzoyl chloride is used instead of 2,4,6-trimethylbenzoyl chloride. The compounds and their physical data are compiled in Table 4 below. ##STR38##
  • Example 25 Preparation of bis(2,4,6-trimethylbenzoyl)-2-methoxyphenylphosphine oxide The title compound is obtained by the method described in Example 1 using the compound of Example 20c as starting material, and has a melting point of 168° C. Elemental analysis:
  • Example 21c The title compound is obtained by the method described in Example 1 using the compound of Example 21c as starting material, and has a melting point of 161° C. Elemental analysis:
  • Example 27 Preparation of bis[2,4,6-trimethylbenzoyl]-[3-i-butyl-5-t-butyl-2-methoxyphenyl]phosphine oxide
  • the title compound is obtained by the method described in Example 1 using the compound of Example 25c as starting material, and has a melting point ⁇ 20° C. Elemental analysis:
  • Example 28 Photoinitiator according to the invention in a clearcoat A UV-curable clearcoat is prepared by mixing
  • Example 29 Photoinitiator according to the invention in a white paint
  • a UV-curable white paint is prepared by mixing
  • the paint is applied to a chipboard panel using a 150 ⁇ m slotted doctor knife and then then cured. Curring is carried out by conveying the sample, on a conveyor belt which moves at a speed of 3 m/min, beneath a 120 W/cm fusion D lamp and a 80 W/cm medium-pressure mercury lamp (Hanovia, USA). The panel is subsequently after-exposed using fluorescent lamps of the Philips TL40OW/03 type for 15 minutes.
  • the Konig pendulum hardness (PH) (DIN 53157) and the Yellowness Index (YI) in accordance with ASTM D 1925-70 are determined. The higher the pendulum hardness, the more reactive the initiator. The lower the lower the yellowing. The results are reproduced in Table 6.
  • Example 30 Photinitiator according to the invention in a white paint
  • a UV-curable white paint is prepared by mixing
  • Example 31 Curing of a white formulation with sunlight A white paint formulation is prepared from
  • Example 31 The white paint formulation of Example 31 is applied to chipboard panels in coats 1 mm thick and curing is then carried out beneath two 80 W/cm medium-pressure mercury lamps (Aetek, USA) at a belt speed of 10 m/min. The upper, cured coat is then separated from the liquid substrate, washed with acetone and dried. The coat thickness of the resulting coating film is measured. The results are compiled in Table 8.
  • Example 3 Curing of a laminated composite composition A formulation is prepared from
  • a lamina comprising 6 layers of a glass fibre mat, and the above formulation are firmly compressed.
  • the weight ratio of glass fibre mat to formulation is 1:1.
  • the assembly is then exposed for one minute under lamps of the TL40W/03 type (Philips), in the course of which the composition is partially cured. It is then heated in an oven at 170° C. for 30 minutes, in the course of which complete curing takes place to give a highly stable composite composition.
  • ®Irganox 565 antioxidant; Ciba-Geigy, Switzerland
  • ®Ceres Black pigment, Sudan Black No. 86015; Fluka, Switzerland
  • HDDA 1,6-hexanediol diacrylate
  • ®Cariflex TR 1107 block polymer of polyisoprene and polystyrene; Shell Chemie, Netherlands
  • the dropwise addition of the HDDA solution made up beforehand is commenced. This dropwise addition lasts for about 15 min. Thereafter, the entire formulation is homogenized on the calender at 100° C. for a further 15 min. After removal from the calender, the coarse sheet is placed between two Teflon sheets and cooled at a pressure of 100 kp/cm 2 in a water-cooled press.
  • 70 g of the sheet are enclosed in a 2 mm thick pressing frame between two 76 ⁇ m polyester films and pressed to give 2 mm thick plates, by first heating the "sandwich" for one minute without applying pressure between the faces of a second press, preheated to 90° C., and then pressing it for 10 min at a pressure of 200 kp/cm 2 .
  • the "sandwich” is then cooled in the first watercooled press to 15° C., for 10 min at a pressing pressure of 200 kp/cm 2 , and then cut out of the press frame.
  • a strip measuring 4 ⁇ 24 cm is cut out.
  • This strip is exposed stepwise in a BASF Nyloprint exposure unit fitted with 20 W Nyloprint 2051 tubes by moving a mask between 9 exposure steps each lasting 20 s.
  • This produces on the strip a curing pattern comprising ten sections, corresponding to the exposure times, 0, 20, 40, 60, 80, 100, 120, 140, 160 and 180 s.
  • the plate is rotated and a 1.5 cm broad central strip is covered in the lengthwise direction.
  • the entire structure is covered with a thin UV-transparent film, sucked against the exposure stage by means of a vacuum, and exposed for 6 minutes.
  • the exposed plate is developed by washing out the insufficiently crosslinked areas in a BASF Nyloprint circular washer at 20° C. using a washing solution comprising a 4:1 mixture of tetrachloroethylene and n-butanol.
  • the plate is dried for one hour at 80° C. in a convection oven, left for 5 minutes, dipped in a 0.4% strength bromine solution for fixing, and dipped for 10 s in an aqueous solution of 1.15% sodium thiosulfate/sodium carbonate for neutralization.
  • the plate is then rinsed with demineralized water for 30 s.
  • the central strip of the plate treated in this way is evaluated.
  • a piece of a plate sandwich produced as under a) is exposed over its entire surface for the exposure time determined under b) in order to form a plate base.
  • the plate is then rotated, the polyester film is removed and a test negative having 4 fields is applied. Exposure of the 4 test fields of the test negative is carried out in steps using a movable mask. The first field is exposed for 6 min, and the exposure time of fields 2-4 is increased by one minute from field to field.
  • the perforation depth of the finished printing plate is measured using the microscope, and the relief height using a layer thickness measuring device. The results are revealed in Table 9.
  • Example 35 Reactivity test in a clearcoat (etch resist) A photocurable composition is prepared by mixing the following components:
  • Portions of this composition are mixed with 0.4% or 1%, based on the overall quantity, of the photoinitiator according to the invention by stirring at 60° C. for one hour. All operations are carried out under red light.
  • the initiator-treated samples are applied to 300 ⁇ m aluminium foil using a 100 ⁇ m doctor knife. The thickness of the dry film is 60-70 ⁇ m. A 76 ⁇ m thick polyester film is applied to this film, and on top of the polyester film is placed a standardized test negative with 21 steps of different optical density (Stauffer wedge). The sample is covered with a second UV-transparent film and pressed onto a metal plate by means of vacuum.
  • Exposure takes place in a first test series for 5 seconds, in a second series for 10 seconds and then in a third series for 20 seconds, using an iron-doped Sylvania M061/5 kW lamp at a distance of 30 cm. After exposure, the films and the mask are removed and the exposed film is developed in ethanol for 10 seconds in an ultrasound bath at 23° C. Drying is then carried out in a convection oven at 40° C. for 5 minutes.
  • the sensitivity of the initiator system used is characterized by indicating the last wedge step which is imaged without tackiness. The higher the number of steps, the more sensitive the system tested.
  • Example 36 Photocuring of an acrylate mixture A photocurable composition is prepared by mixing the following components:
  • Portions of this composition are mixed in each case with 0.4% and 1%, based on the solids content, of photoinitiator. All operations are carried out under red light or yellow light.
  • the initiator-treated samples are applied in a thickness of 150 ⁇ m to 200 ⁇ m aluminium foil (10 ⁇ 15 cm).
  • the solvent is removed by heating at 60° C. in a convection over for 5 minutes.
  • a 76 ⁇ m thick polyester film is placed on the liquid layer, and a standardized test negative with 21 steps of different optical density (Stauffer wedge) is placed on this film. Over this assembly, a second polyester film is applied, and the resulting laminate is fixed on a metal plate.
  • the sample is then exposed with a MO61/5 kW lamp at a distance of 30 cm for 10 seconds in a first test series, 20 seconds in a second series and 40 seconds in a third series.
  • the films and the mask are removed, and the exposed layer is developed with a 0.85% aqueous solution of sodium carbonate for 120 seconds in an ultrasound bath, and then dried at 60° C. in a convection oven for 15 minutes.
  • the sensitivity of the initiator system used is characterized by indicating the last wedge step which is imaged without tack. The higher the number of steps, the more sensitive the system. In this context, an increase by two steps signifies approximately a doubling in the curing rate.
  • Table 11 The results are depicted in Table 11.
  • Example 37 Photocuring of a monomer-polymer mixture (reactivity test in a solder resist)
  • a photocurable composition is prepared by mixing the following components:
  • Portions of this composition are mixed in each case with 0.4% and 1%, based on the solids content, of the photoinitiator to be tested. All operations are carried out under red light.
  • the initiator-treated samples are applied in at a dry film thickness of 35 ⁇ m to a 200 ⁇ m aluminium foil (10 ⁇ 15 cm).
  • the solvent is removed by heating at 60° C. in a convection oven for 15 minutes.
  • a 76 ⁇ m thick polyester film is placed on the liquid layer, and a standardized test negative with 21 steps of different optical density (Stauffer wedge) is applied to this film.
  • the sample is covered with a second UV-transparent film and pressed by means of vacuum onto a metal plate.
  • the sample is then exposed with a MO61/5 kW lamp at a distance of 30 cm, for 10 seconds in a first test series, 20 seconds in a second test series and 40 seconds in a third test series. After exposure, the films and the mark are removed, the coated layer is developed with a 0.85% aqueous solution of sodium carbonate in an ultrasound bath for 240 seconds and then dried at 60° C. in a convection oven for 15 min.
  • the sensitivity of the initiator system used is characterized by indicating the last wedge step which is imaged without tack. The higher the number of steps, the more sensitive the system. In this context, an increase by two steps signifies approximately a doubling in the curing rate. The results are indicated in Table 12.

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* Cited by examiner, † Cited by third party
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WO2001044343A1 (fr) * 1999-12-17 2001-06-21 S & C Polymer Silicon- Und Composite Spezialitäten Gmbh Systeme photo amorceur pourvu d'amorçeurs a base de titanocene
US6486226B2 (en) 1999-12-08 2002-11-26 Ciba Specialty Chemicals Corporation Phosphine oxide photoinitiator systems and curable compositions with low color
US20030069531A1 (en) * 1999-02-24 2003-04-10 The Smith Truss Company Compression support sleeve
WO2003068785A1 (fr) * 2002-02-13 2003-08-21 Basf Aktiengesellschaft Derives de mono- et bisacylphosphine
US20040248855A1 (en) * 1998-11-30 2004-12-09 Leppard David George Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
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DE102009011536A1 (de) 2008-03-04 2009-09-10 Kabushiki Kaisha Shofu Photopolymerisierbare Dentalzusammensetzung mit verringerter Farbtonänderung vor und nach dem Aushärten
DE102009011537A1 (de) 2008-03-04 2009-09-10 Kabushiki Kaisha Shofu Photopolymerisierbare Dentalzusammensetzung mit durch ein Monomer unterdrückter Farbtonänderung
US20100168359A1 (en) * 2008-12-30 2010-07-01 Angelika Maria Domschke Tri-functional uv-absorbing compounds and use thereof
US7795349B2 (en) 1999-11-05 2010-09-14 Z Corporation Material systems and methods of three-dimensional printing
US20100258961A1 (en) * 2008-12-18 2010-10-14 Frank Chang Method for making silicone hydrogel contact lenses
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US20110063567A1 (en) * 2009-09-15 2011-03-17 Angelika Maria Domschke Prepolymers suitable for making ultra-violet absorbing contact lenses
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US8167999B2 (en) 2007-01-10 2012-05-01 3D Systems, Inc. Three-dimensional printing material system with improved color, article performance, and ease of use
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US8835525B2 (en) 2010-10-06 2014-09-16 Novartis Ag Chain-extended polysiloxane crosslinkers with dangling hydrophilic polymer chains
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US8993651B2 (en) 2010-10-06 2015-03-31 Novartis Ag Polymerizable chain-extended polysiloxanes with pendant hydrophilic groups
US9187601B2 (en) 2010-10-06 2015-11-17 Novartis Ag Water-processable silicone-containing prepolymers and uses thereof

Families Citing this family (44)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5261297A (en) * 1992-10-09 1993-11-16 Japan Electronic Control Systems Co., Ltd. Control system for automotive automatic transmission
SE520727C2 (sv) * 1996-03-04 2003-08-19 Ciba Sc Holding Ag Alkylfenylbisacylfosfinoxid och fotoinitiatorblandningar
GB9605712D0 (en) * 1996-03-19 1996-05-22 Minnesota Mining & Mfg Novel uv-curable compositions
DE69710657T3 (de) † 1996-08-23 2007-07-05 Showa Denko K.K. Photohärtbare Zusammensetzung und Härtungsverfahren
SG53043A1 (en) * 1996-08-28 1998-09-28 Ciba Geigy Ag Molecular complex compounds as photoinitiators
DE19650562A1 (de) * 1996-12-05 1998-06-10 Basf Ag Photoinitiatorgemische, enthaltend Acylphosphinoxide und Benzophenonderivate
US5922473A (en) * 1996-12-26 1999-07-13 Morton International, Inc. Dual thermal and ultraviolet curable powder coatings
EP0975693B2 (fr) * 1997-04-22 2006-01-18 Koninklijke DSM N.V. Composition de resine liquide durcissable
AU7457398A (en) * 1997-05-06 1998-11-27 Dsm N.V. Radiation-curable ink composition
US6130980A (en) * 1997-05-06 2000-10-10 Dsm N.V. Ribbon assemblies and ink coating compositions for use in forming the ribbon assemblies
US6359025B1 (en) 1997-05-16 2002-03-19 Dsm N.V. Radiation-curable liquid resin composition for coating optical fibers
ATE239063T1 (de) 1998-03-13 2003-05-15 Akzo Nobel Nv Nicht-wässriges überzugsmittel auf basis eines lufttrocknenden alkydharzes und eines photoinitiators
DE19812859A1 (de) * 1998-03-24 1999-09-30 Basf Ag Photoinitiatorgemische
US5925402A (en) * 1998-07-15 1999-07-20 Morton International, Inc. Method of forming a hidden identification using powder coating
US6569602B1 (en) * 1998-10-05 2003-05-27 E. I. Du Pont De Nemours And Company Ionization radiation imageable photopolymer compositions
SE9904080D0 (sv) 1998-12-03 1999-11-11 Ciba Sc Holding Ag Fotoinitiatorberedning
SE9900935D0 (sv) 1999-03-16 1999-03-16 Pharmacia & Upjohn Bv Macromolecular compounds
DE19961347A1 (de) * 1999-12-17 2001-06-21 S & C Polymer Silicon & Compos Photoinitiatorsystem mit Acylphosphinoxid-Initiatoren
GB2360283B (en) * 2000-02-08 2002-08-21 Ciba Sc Holding Ag Monoacylarylphosphines and acylphosphine oxides and sulphides
GB2365430B (en) * 2000-06-08 2002-08-28 Ciba Sc Holding Ag Acylphosphine photoinitiators and intermediates
CA2422156A1 (fr) * 2000-09-14 2002-03-21 Ciba Specialty Chemicals Holding Inc. Photo-initiateurs a l'oxyde d'acylphosphine dans des resines de coulee au methacrylate
DE60129571D1 (de) 2000-09-15 2007-09-06 Isp Investments Inc Polymerzusammensetzung
US6737216B2 (en) 2000-12-08 2004-05-18 E.I. Du Pont De Nemours And Company Laser engravable flexographic printing element and a method for forming a printing plate from the element
GB0118936D0 (en) * 2001-08-02 2001-09-26 Unilever Plc Improvements relating to colour-safe fabric treatment compositions
GB0205276D0 (en) * 2002-03-06 2002-04-17 Unilever Plc Bleaching composition
KR100481079B1 (ko) * 2002-10-02 2005-04-07 삼성전자주식회사 김치냉장고
WO2005021634A2 (fr) * 2003-02-20 2005-03-10 Texas Research International, Inc. Compositions a sechage ultraviolet destinees a la reparation de composites
US20050217572A1 (en) * 2004-03-30 2005-10-06 Ming-Wan Young Ultraviolet particle coating systems and processes
CN100541327C (zh) * 2004-05-21 2009-09-16 明德国际仓储贸易(上海)有限公司 液晶显示元件散乱层光阻组成物
DE502005006753D1 (de) 2005-08-01 2009-04-16 Ivoclar Vivadent Ag Photopolymerisierbare Dentalmaterialien mit Bisacylphosphinoxiden als Initiator
DE102006050153A1 (de) 2006-10-25 2008-05-08 Ivoclar Vivadent Ag Mikroverkapselte Photoinitiatoren und deren Verwendung für Dentalmaterialien
JP5066376B2 (ja) * 2007-02-27 2012-11-07 株式会社タムラ製作所 プリント配線板用のソルダーレジスト組成物およびプリント配線板
US9207373B2 (en) 2007-04-10 2015-12-08 Stoncor Group, Inc. Methods for fabrication and highway marking usage of agglomerated retroreflective beads
KR100830561B1 (ko) * 2007-10-09 2008-05-22 재단법인서울대학교산학협력재단 다기능성 액정화합물 및 이들의 제조방법 그리고 이로부터얻어진 미세패턴
GB0724863D0 (en) 2007-12-21 2008-01-30 Unilever Plc Fabric treatment active
WO2010025165A1 (fr) * 2008-08-28 2010-03-04 Dow Global Technologies Inc. Composés contenant du phosphore et compositions polymères les comprenant
US20100276059A1 (en) * 2009-04-30 2010-11-04 Dong Tian UVV curable coating compositions and method for coating flooring and other substrates with same
US9248468B2 (en) 2010-01-15 2016-02-02 Texas Research International, Inc. Ultraviolet light curing compositions for composite repair
DE102012212429A1 (de) 2012-07-16 2014-01-16 Voco Gmbh Dentalhandgerät, Verfahren und Verwendung desselben zum Aushärten lichthärtbaren Materials
CN108541260A (zh) * 2015-04-29 2018-09-14 塔吉特Gdl公司 不含聚氯乙烯的装饰性表面覆盖物
WO2018047484A1 (fr) * 2016-09-07 2018-03-15 富士フイルム株式会社 Photo-initiateur, composition polymérisable, procédé d'impression à jet d'encre et composé d'oxyde d'acylphosphine
JP7180068B2 (ja) * 2017-11-09 2022-11-30 株式会社リコー 硬化型液体組成物、硬化物、硬化物の製造方法及び硬化物の製造装置
DE102019122174A1 (de) 2019-08-19 2021-02-25 Voco Gmbh Dentale polymerisierbare Zusammensetzung auf der Basis kondensierter Silane
CN115873356B (zh) * 2022-12-21 2024-02-06 金发科技股份有限公司 一种高电镀性能的苯乙烯基组合物及其制备方法

Citations (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0184095A2 (fr) * 1984-11-27 1986-06-11 ESPE Stiftung & Co Produktions- und Vertriebs KG Bisacylphosphinoxides, leur préparation et utilisation
EP0262629A2 (fr) * 1986-10-01 1988-04-06 Ciba-Geigy Ag Composition photopolymérisable pour enregistrement, en particulier pour l'obtention de plaques d'impression et plaques en relief
US4962144A (en) * 1988-12-30 1990-10-09 General Electric Company Composition
EP0446175A2 (fr) * 1990-03-09 1991-09-11 Ciba-Geigy Ag Mélange de photoinitiateurs
US5100929A (en) * 1988-11-04 1992-03-31 Espe Stiftung & Co. Produktion- Und Vertriebs Kg (polyene-polythiol) dental compositions curable with visible light
GB2259704A (en) * 1991-09-23 1993-03-24 Ciba Geigy Ag Alkylbisacylphosphine oxides
US5534559A (en) * 1993-03-18 1996-07-09 Ciba-Geigy Corporation Daylight curing compositions containing bisacylphosphine oxide photoinitiators
EP0551608B1 (fr) * 1992-01-14 1998-04-08 General Electric Company Mélange à base de polyestercarbonate et produits en forme de plaques ou de films formés à partir de celui-ci

Patent Citations (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4737593A (en) * 1984-11-27 1988-04-12 Fabrik Pharmazeutischer Praparate Bisacylphosphine oxides, the preparation and use thereof
US4792632A (en) * 1984-11-27 1988-12-20 Espe Fabrik Pharmazeutischer Praparate Gmbh Bisacylphosphine oxides, the preparation and use thereof
EP0184095A2 (fr) * 1984-11-27 1986-06-11 ESPE Stiftung & Co Produktions- und Vertriebs KG Bisacylphosphinoxides, leur préparation et utilisation
EP0262629A2 (fr) * 1986-10-01 1988-04-06 Ciba-Geigy Ag Composition photopolymérisable pour enregistrement, en particulier pour l'obtention de plaques d'impression et plaques en relief
US4868091A (en) * 1986-10-01 1989-09-19 Basf Aktiengesellschaft Photopolymerizable recording material, in particular for the production of printing plates and relief plates
US5100929A (en) * 1988-11-04 1992-03-31 Espe Stiftung & Co. Produktion- Und Vertriebs Kg (polyene-polythiol) dental compositions curable with visible light
US4962144B1 (en) * 1988-12-30 1998-03-24 Gen Electric Composition
US4962144A (en) * 1988-12-30 1990-10-09 General Electric Company Composition
EP0446175A2 (fr) * 1990-03-09 1991-09-11 Ciba-Geigy Ag Mélange de photoinitiateurs
DE4231579A1 (de) * 1991-09-23 1993-03-25 Ciba Geigy Ag Alkyl-bisacylphosphinoxide
AU2525192A (en) * 1991-09-23 1993-04-01 Ciba Specialty Chemicals Holding Inc. Alkylbisacylphosphine oxides
GB2259704A (en) * 1991-09-23 1993-03-24 Ciba Geigy Ag Alkylbisacylphosphine oxides
EP0551608B1 (fr) * 1992-01-14 1998-04-08 General Electric Company Mélange à base de polyestercarbonate et produits en forme de plaques ou de films formés à partir de celui-ci
US5534559A (en) * 1993-03-18 1996-07-09 Ciba-Geigy Corporation Daylight curing compositions containing bisacylphosphine oxide photoinitiators

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
Derwent Abstract 91 269010/37 of EP A 446175. *
Derwent Abstract 91-269010/37 of EP-A-446175.
Standard Test Method for Yellowness Index of Plastics ASTM Designation: D 1925 70 (1988). *
Standard Test Method for Yellowness Index of Plastics ASTM Designation: D 1925--70 (1988).

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7332537B2 (en) * 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
US7094931B2 (en) 1998-11-30 2006-08-22 Ciba Specialty Chemicals Corporation Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
US20040248855A1 (en) * 1998-11-30 2004-12-09 Leppard David George Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
US7214830B2 (en) 1998-11-30 2007-05-08 Ciba Specialty Chemicals Corporation Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
US6888031B1 (en) * 1998-11-30 2005-05-03 Ciba Specialty Chemicals Corporation Process for the preparation of acylphosphines, acyl oxides and acyl sulfides
US20030069531A1 (en) * 1999-02-24 2003-04-10 The Smith Truss Company Compression support sleeve
US7795349B2 (en) 1999-11-05 2010-09-14 Z Corporation Material systems and methods of three-dimensional printing
US6486226B2 (en) 1999-12-08 2002-11-26 Ciba Specialty Chemicals Corporation Phosphine oxide photoinitiator systems and curable compositions with low color
US20030119932A1 (en) * 1999-12-08 2003-06-26 Walid Al-Akhdar Novel phosphine oxide photoinitiator systems and curable compostions with low color
US6777459B2 (en) 1999-12-08 2004-08-17 Ciba Specialty Chemicals Corporation Phosphine oxide photoinitiator systems and curable compositions with low color
US6880296B1 (en) 1999-12-17 2005-04-19 S & C Polymer Silicon- Und Composite-Spezialitaten Gmbh Photoinitiator system with titanocene initiators
AU773637B2 (en) * 1999-12-17 2004-05-27 S & C Polymer Silicon- Und Composite-Spezialitaten Gmbh Photoinitiator system with titanocene initiators
WO2001044343A1 (fr) * 1999-12-17 2001-06-21 S & C Polymer Silicon- Und Composite Spezialitäten Gmbh Systeme photo amorceur pourvu d'amorçeurs a base de titanocene
WO2003068785A1 (fr) * 2002-02-13 2003-08-21 Basf Aktiengesellschaft Derives de mono- et bisacylphosphine
DE112006003798T5 (de) 2006-03-13 2009-04-30 Kabushiki Kaisha Shofu Campherchinon-Derivat mit Acylphosphinoxid-Gruppe, Photopolymerisationskatalysator und Photo-/chemischer Polymerisationskatalysator sowie härtbare Zusammensetzung die dieses Derivat enthält
US7905951B2 (en) 2006-12-08 2011-03-15 Z Corporation Three dimensional printing material system and method using peroxide cure
US8157908B2 (en) 2006-12-08 2012-04-17 3D Systems, Inc. Three dimensional printing material system and method using peroxide cure
US8167999B2 (en) 2007-01-10 2012-05-01 3D Systems, Inc. Three-dimensional printing material system with improved color, article performance, and ease of use
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
US8506862B2 (en) 2007-02-22 2013-08-13 3D Systems, Inc. Three dimensional printing material system and method using plasticizer-assisted sintering
DE102009011537A1 (de) 2008-03-04 2009-09-10 Kabushiki Kaisha Shofu Photopolymerisierbare Dentalzusammensetzung mit durch ein Monomer unterdrückter Farbtonänderung
DE102009011536A1 (de) 2008-03-04 2009-09-10 Kabushiki Kaisha Shofu Photopolymerisierbare Dentalzusammensetzung mit verringerter Farbtonänderung vor und nach dem Aushärten
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DE102009011536B4 (de) * 2008-03-04 2019-03-21 Kabushiki Kaisha Shofu Photopolymerisierbare Dentalzusammensetzung mit weniger Änderung im Farbton vor und nach dem Härten
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US20100168359A1 (en) * 2008-12-30 2010-07-01 Angelika Maria Domschke Tri-functional uv-absorbing compounds and use thereof
US8324256B2 (en) 2008-12-30 2012-12-04 Novartis Ag Tri-functional UV-absorbing compounds and use thereof
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AT402298B (de) 1997-03-25
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SE510489C2 (sv) 1999-05-31
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AU3028695A (en) 1996-05-09
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US5767169A (en) 1998-06-16
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ATA147195A (de) 1996-08-15

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