US5311250A - Pellicle mounting apparatus - Google Patents

Pellicle mounting apparatus Download PDF

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Publication number
US5311250A
US5311250A US07/950,946 US95094692A US5311250A US 5311250 A US5311250 A US 5311250A US 95094692 A US95094692 A US 95094692A US 5311250 A US5311250 A US 5311250A
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US
United States
Prior art keywords
pellicle
pellicle frame
fluid
pressure
elastic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
US07/950,946
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English (en)
Inventor
Masaki Suzuki
Kentaro Shingo
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Assigned to MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. reassignment MATSUSHITA ELECTRIC INDUSTRIAL CO, LTD. ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: SHINGO, KENTARO, SUZUKI, MASAKI
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Publication of US5311250A publication Critical patent/US5311250A/en
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C65/00—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor
    • B29C65/02—Joining or sealing of preformed parts, e.g. welding of plastics materials; Apparatus therefor by heating, with or without pressure
    • B29C65/40—Applying molten plastics, e.g. hot melt
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70866—Environment aspects, e.g. pressure of beam-path gas, temperature of mask or workpiece
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/17—Surface bonding means and/or assemblymeans with work feeding or handling means
    • Y10T156/1702—For plural parts or plural areas of single part
    • Y10T156/1744—Means bringing discrete articles into assembled relationship

Definitions

  • the present invention relates to a pellicle mounting apparatus for adhering one or two pellicle frames, on which a pellicle has been mounted, to one or both surfaces of a reticle glass for use in an exposing apparatus which is used in semi-conductor manufacturing or in liquid crystal display manufacturing by applying pressure to the pellicle frame or frames.
  • FIGS. 2A and 2B are a sectional view and a front view, respectively showing a product manufactured by a pellicle mounting apparatus.
  • the product comprises a reticle glass 1 having a reticle pattern 22 installed thereon, and pellicle frames 4 and 5 having pellicles 2 and 3 adhered thereto with adhesive layers 20.
  • An example of a conventional pellicle mounting apparatus is described below with reference to FIG. 10, which is a sectional view showing the conventional pellicle mounting apparatus.
  • the pellicles 2 and 3 are adhered to the pellicle frames 4 and 5, respectively.
  • the pellicle frames 4 and 5 are held by pressure members 7 and 8.
  • a suction bracket 6 mounted on a bearing 16 suctions a reticle glass 1 thereto through an opening 9 in a vacuum condition, thus holding it thereon.
  • the pressure member 8 is installed on a fixed bracket 10.
  • a movable bracket 11, on which the pressure member 7 is installed, is mounted on a bearing 17.
  • the bearings 16 and 17 are capable of moving along a guide rail 18.
  • a bearing 12 mounted on the movable bracket 11 is in contact with a spherical joint 13 fixed to a piston rod 21 of a pneumatic cylinder 15 mounted on a bracket 14.
  • the fixed bracket 10, the bracket 14, and the guide rail 18 are fixed to a base frame 19.
  • the adhesive layers 20 are formed on the pellicle frames 4 and 5.
  • the operation of the pellicle mount apparatus of the above construction is described below.
  • the piston rod 21 moves leftward, and as a result, the bearing 17 moves leftward along the guide rail 18 via the spherical joint 13, the bearing 12, and the movable bracket 11.
  • the pellicle frame 4 is brought into contact with the reticle glass 1, thus pressing the bearing 16 leftward along the guide rail 18. Consequently, the reticle glass 1 is brought into contact with the pellicle frame 5.
  • the reticle glass 1 is pressed by the pressure members 7 and 8 in opposite directions, thus being adhered to the pellicle frames 4 and 5 with the adhesive layers 20.
  • a pellicle mounting apparatus for adhering a pellicle frame to a surface of a reticle glass under pressure, comprising, a reticle glass support means for supporting the reticle glass, a pellicle frame support means for supporting the pellicle frame, an elastic pressure member provided on the pellicle frame support in contact with the pellicle frame along a periphery thereof, and having a sufficiently small reaction to deformation under pressure applied to the pellicle frame as compared with the pressure, and a pressurizing means for applying fluid pressure uniformly to the periphery of the pellicle frame via the elastic pressure member.
  • fluid pressure can be uniformly applied to the entire pellicle frame via the elastic pressure member.
  • the entire pellicle frame can be uniformly pressed against the reticle glass and thus uniformly adhered thereto.
  • FIG. 1A is a sectional view showing a pellicle mounting apparatus according to a first embodiment of the present invention, in which pellicle frames are be adhered to a reticle glass;
  • FIG. 1B is a sectional view showing the pellicle mounting apparatus of FIG. 1A where the pellicle frames have been adhered to the reticle glass;
  • FIGS. 2A and 2B are a sectional view and a front view, respectively, showing a product in which pellicle frames have been adhered to a reticle glass by the pellicle mounting apparatus of FIG. 1A;
  • FIG. 2C is a sectional view showing a product in which a pellicle frame has been adhered to a reticle glass
  • FIG. 3A is a view showing the construction of a holding plate and a tube filled with fluid of the pellicle mounting apparatus according to the first embodiment of the present invention
  • FIG. 3B is a view showing the construction of a holding plate and a tube filled with fluid of a pellicle mounting apparatus according to a second embodiment of the present invention
  • FIG. 4 is a partial sectional view showing a pellicle mounting apparatus according to a third embodiment of the present invention.
  • FIG. 5 is a partial sectional view showing a pellicle mounting apparatus according to a fourth embodiment of the present invention.
  • FIG. 6 is a partial sectional view showing a pellicle mounting apparatus according to a fifth embodiment of the present invention.
  • FIG. 7A and 7B are a partial front view and a partial sectional view showing a pellicle mounting apparatus according to a sixth embodiment of the present invention.
  • FIG. 8 is a sectional view showing a pellicle mounting apparatus according to another embodiment of the present invention.
  • FIG. 9 is a sectional view showing a pellicle mounting apparatus according to a still another embodiment of the present invention.
  • FIG. 10 is a sectional view showing a conventional pellicle mounting apparatus.
  • FIGS. 1A and 1B are sectional views showing a pellicle mounting apparatus according to the embodiment.
  • a reticle glass 1 having a reticle pattern 22 on one surface is suctioned to a suction bracket 26 through a vacuum suction opening 9 and held thereby.
  • Pellicles 2 and 3 are adhered to pellicle frames 4 and 5 made of aluminum, respectively.
  • Adhesive layers 20 are adhered onto the surfaces of the pellicle frames 4 and 5.
  • the pellicle frames 4 and 5 are held by elastic pressure members 37 and 38, respectively, made of a material such as aluminum or hard rubber.
  • Each of the pressure members 37 and 38 has a sufficiently small reaction to deformation under the pressure applied to the pellicle frames 4 and 5 as compared with the pressure.
  • the suction bracket 26 has an opening 26a capable of penetrating through the pellicle frame 5 therethrough.
  • Fluids 40 and 41 preferably consisting of, incompressible fluid such as grease or oil are enclosed in tubes 42 and 43, shown in FIG. 3A, which tubes are very elastic.
  • the tubes 42 and 43 are held by grooves formed between holding plates 44 and 45 and between holding plates 46 and 47 in correspondence with the periphery of the pellicle frames 4 and 5, as shown in FIG. 3A.
  • the pressure members 37 and 38 are slidably held by the holding plates 44 and 46 and in contact with the tubes 42 and 43, respectively.
  • the pressure members 37 and 38 have rectangular frame-shaped projections 37a and 38a slidably inserted into holes 44a and 46a to contact the tubes 42 and 3, respectively.
  • the holding plates 47 and 45 are fixed to brackets 48 and 49, respectively.
  • the pressure members 37 and 38 are supported with bolts (not shown) onto the holding plates 44 and 46 so as to allow the above movement of the pressure members 37 and 38.
  • the holding plates 44 and 46 are fixed to the holding members 45 and 47.
  • the suction bracket 26 and the bracket 49 are each mounted on bearings 53 and 54 capable of moving along a guide rail 56.
  • a bearing 50 mounted on the bracket 49 is in contact with a spherical joint 51 fixed to a piston rod 52a of a pneumatic cylinder 52 installed on a bracket 55.
  • the brackets 48 and 55 and the guide rail 56 are fixed to a base frame 57.
  • the operation of the pellicle mount apparatus of the above construction is described below.
  • the piston rod 52a moves leftward, and consequently the bracket 49 moves leftward along the guide rail 56 through the bearing 54 by applying a leftward force to the bracket 49 from the piston rod 52a via the spherical joint 51 and the bearing 50.
  • the pellicle frame 4 is brought into contact with the reticle glass 1, thus pressing the suction bracket 26 leftward. Consequently, the bracket 26 moves leftward along the guide rail 56 through the bearing 53, thus bringing the reticle glass 1 into contact with the pellicle frame 5 as shown in FIG. 1B.
  • FIGS. 2A and 2B show a product manufactured by the pellicle mount apparatus.
  • FIG. 2C shows a product, also manufactured by the pellicle mounting apparatus, in which only the pellicle frame 4 has been adhered to a surface of the reticle glass 1.
  • the product shown in FIG. 2C is manufactured as follows: a dummy pellicle frame 5 on which the adhesive layer 20 is not formed is mounted on the pressure member 38, so that the dummy pellicle frame 5 serves as a pressure member for the reticle glass 1. Then, the same manufacturing operation as in FIGS. 2A and 2B is performed.
  • a pellicle mounting apparatus will be described below with reference to FIG. 3B.
  • Two plugs 60 are formed at both ends of the tube 42 filled with fluid, provided approximately entirely along the periphery of each pellicle frame, as shown in FIG. 3B.
  • the tube 42 of this configuration has the effect of uniformly applying pressure to the pellicle frames 4 and 5 through the elastic members 37 and 38, similarly to the tube 42 filled with fluid of the configuration as shown in FIG. 3A.
  • Pellicle mounting apparatus according to a third embodiment through a sixth embodiment of the present invention, which do not comprise a tube in the supporting unit for supporting the pellicle frame will be described below.
  • the supporting unit of the pellicle mounting apparatus of the third embodiment comprises holding plates 66 and 67 corresponding to the holding plates 44 and 45, and 46 and 47, as shown in FIG. 1.
  • An elastic sheet or sealing member 63 made of a thin metal pate and interposed between holding plates 66 and 67.
  • An elastic pressure member 62 having a rectangular frame-shaped projection 62a, is formed in correspondence with the periphery of the pellicle frame 4 and slidably penetrates through a rectangular frame-shaped hole 66a of the holding plate 66 to contact the elastic sheet 63.
  • a fluid 65 such as grease or oil
  • a fluid 65 is accommodated in a rectangular frame-shaped recess 67a of the holding plate 67 and opposes to the projection 62a through the elastic sheet 63.
  • Sealing members 64 prevent the fluid 65 from leaking out from the recess 67a.
  • the rectangular frame-shaped projection 62a has a sufficiently small reaction to deformation under pressure applied to the pellicle frame 4 as compared with the pressure.
  • the pellicle frames 4 and 5 are pressed against the reticle glass 1 with the pressure of the fluid 65 uniformly applied to the pellicle frames 4 and 5 along the periphery thereof through the elastic pressure 62 and the elastic sheet 63.
  • the pellicle frames 4 and 5 are uniformly adhered to the reticle glass 1 With the adhesive layers 20.
  • the supporting unit of the pellicle mounting apparatus of the fourth embodiment comprises holding plates 76 and 77 corresponding to the holding plates 44 and 45 and 46 and 47, as shown in FIG. 1.
  • a fluid 75 such as grease or oil, is accommodated in a rectangular frame-shaped recess 77a of the holding plate 77.
  • An elastic pressure member 72 has a rectangular frame-shaped projection 72a formed in correspondence with the periphery of the pellicle frame 4 and slidably penetrating through a rectangular frame-shaped hole 76a of the holding plate 76 to contact the fluid 75 in the recess 77a.
  • An elastic sealing member 73 is made of an adhesive agent, such as rubber adhesive, adhered to the entire periphery of the projection 72a and hole 76a and sealing members 74 for preventing fluid 75 from leaking out from the recess 77a.
  • the rectangular frame-shaped projection 72a has a sufficiently small reaction to deformation under the pressure applied to the pellicle frame 4 as compared with the pressure.
  • the pellicle frames 4 and 5 are pressed against the reticle glass 1 with the pressure of the fluid 75 uniformly applied to the entire pellicle frames 4 and 5 along the periphery thereof via the elastic pressure member 72.
  • the pellicle frames 4 and 5 are uniformly adhered to the reticle glass 1 with the adhesive layers 20.
  • the pellicle mounting apparatus according to the fifth embodiment of the present invention will be described below with reference to FIG. 6.
  • the supporting unit of the pellicle mounting apparatus of the fifth embodiment comprises holding plates 86 and 87 corresponding to the holding plates 44 and 45 and 46 and 47 as shown in FIG. 1 and an elastic pressure member 82.
  • An elastic sheet 83 made of a material such as rubber is interposed between holding plates 86 and 87, and comprises a rectangular frame-shaped projection 84 formed in correspondence with the periphery of the pellicle frame 4 and slidably penetrates through a rectangular frame-shaped hole 86a of the holding plate 86 to contact the pressure member 82.
  • the rectangular frame-shaped projection 84 has a sufficiently small reaction to deformation under the pressure applied to the pellicle frame 4 as compared with the pressure.
  • the pellicle frames 4 and 5 are pressed against the reticle glass 1 with the pressure of the fluid 85 uniformly applied to the pellicle frames 4 and 5 along the periphery thereof via the elastic pressure member 82 and the elastic sheet 83.
  • the pellicle frames 4 and 5 are uniformly adhered to the reticle glass 1 with the adhesive layers 20.
  • the supporting unit of the pellicle mounting apparatus of the sixth embodiment comprises holding plates 96 and 97 corresponding to the holding plates 44 and 45, and 46 and 47, as shown in FIG. 1 and an elastic pressure member 92.
  • a plurality of pistons 93 are arranged in a rectangular frame shape formed in correspondence with the periphery of the pellicle frame 4, and slidably penetrate through holes 96a on the holding plate 96.
  • a fluid 95 such as grease or oil, is accommodated in a rectangular frame-shaped recess 97a of the holding plate 96. Sealing members 94 prevent the fluid 95 from leaking out from the recess 97a.
  • Each piston 93 has a sufficiently small reaction to deformation under the pressure applied to the pellicle frame 4 as compared with the pressure.
  • the pellicle frames 4 and 5 are pressed against the reticle glass 1 with the pressure of the fluid 95 uniformly applied to the pellicle frames 4 and 5 along the periphery thereof via the elastic pressure member 92 and the cylinders/pistons 93.
  • the pellicle frames 4 and 5 are uniformly adhered to the reticle glass 1 with the adhesive layers 20.
  • FIGS. 8 and 9 show a pellicle mounting apparatus according to other embodiments of the present invention.
  • the pressurizing mechanism of the pellicle mounting apparatus according to these embodiments includes the pressure members of the conventional apparatus shown in FIG. 10. That is, one of a pair of pressure members of the embodiments is constructed similarly to the pressure member 7 or 8 of the conventional pellicle mount apparatus shown in FIG. 10 and the other pressure member is constructed similarly to the pressure member 37 or 38 of the first embodiment.
  • the pellicle mounting apparatus according to these embodiments provides the effect of uniformly applying pressure to the pellicle frames 4 and 5 similarly to the pellicle mounting apparatus according to the first to sixth embodiments of the present invention.
  • the pressurizing mechanism of the pellicle mounting apparatus may be modified to apply fluid pressure to the elastic pressure member in a desired distribution.
  • the pressurizing mechanism of the pellicle mounting apparatus may be modified to apply pneumatic pressure instead of fluid pressure to the elastic pressure member in a desired distribution.
  • the pellicle mount apparatus comprises the elastic pressure member, which has a sufficiently small reaction to deformation under the pressure applied to the pellicle frame as compared with the pressure, and the pressurizing mechanism which applies fluid pressure uniformly to the periphery of the pellicle frame via the elastic pressure member.
  • the elastic pressure member which has a sufficiently small reaction to deformation under the pressure applied to the pellicle frame as compared with the pressure
  • the pressurizing mechanism which applies fluid pressure uniformly to the periphery of the pellicle frame via the elastic pressure member.

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Toxicology (AREA)
  • Mechanical Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Lining Or Joining Of Plastics Or The Like (AREA)
  • Joining Of Glass To Other Materials (AREA)
US07/950,946 1991-09-27 1992-09-25 Pellicle mounting apparatus Expired - Fee Related US5311250A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP3248790A JP2814785B2 (ja) 1991-09-27 1991-09-27 ペリクル接着装置
JP3-248790 1991-09-27

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US5311250A true US5311250A (en) 1994-05-10

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US07/950,946 Expired - Fee Related US5311250A (en) 1991-09-27 1992-09-25 Pellicle mounting apparatus

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JP (1) JP2814785B2 (ja)
KR (1) KR970001694B1 (ja)

Cited By (17)

* Cited by examiner, † Cited by third party
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US5419972A (en) * 1993-09-02 1995-05-30 Shin-Etsu Chemical Co., Ltd. Frame-supported pellicle for dustproof protection of photomask
US5953107A (en) * 1997-03-07 1999-09-14 Taiwan Semiconductor Manufacturing Company, Ltd. Mask pellicle remove tool
US6055040A (en) * 1992-07-13 2000-04-25 Intel Corporation Pellicle frame
US6619359B2 (en) 2001-02-16 2003-09-16 Brooks Automation, Inc. Pellicle mounting apparatus
US6639650B2 (en) * 1999-12-21 2003-10-28 Shin-Etsu Chemical Co., Ltd. Light exposure method, light exposure apparatus, pellicle and method for relieving warpage of pellicle membrane
US6654077B1 (en) * 2000-01-18 2003-11-25 Aurora Systems, Inc. Precision surface mount for a display device
US6734445B2 (en) * 2001-04-23 2004-05-11 Intel Corporation Mechanized retractable pellicles and methods of use
WO2005003863A2 (de) * 2003-07-07 2005-01-13 Dynamic Microsystems Semiconductor Equipment Gmbh Vorrichtung und verfahren zum bearbeiten einer maskenvorlage für die halbleiterherstellung
US6862817B1 (en) * 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
US20050157288A1 (en) * 2003-11-26 2005-07-21 Sematech, Inc. Zero-force pellicle mount and method for manufacturing the same
KR100596025B1 (ko) 2005-12-07 2006-07-03 권선용 펠리클 프레임용 지그어셈블리
US20100190095A1 (en) * 2009-01-26 2010-07-29 Taiwan Semiconductor Manufacturing Co., Ltd. Pellicle mounting method and apparatus
CN101268349B (zh) * 2003-10-06 2010-11-24 凸版光掩膜公司 在光掩模上自动安装薄膜组件的系统和方法
US20120067500A1 (en) * 2009-07-22 2012-03-22 Tadashi Nishioka Device for fabricating liquid crystal display and method for fabricating liquid crystal display
EP2455810A3 (en) * 2010-11-19 2014-08-06 Shin-Etsu Chemical Co., Ltd. Method of adhering a lithographic pellicle and adhering apparatus therefor
US20140253898A1 (en) * 2013-03-11 2014-09-11 Taiwn Semiconductor Manufacturing Company Ltd. Pellicle mounting system and method
US20220155675A1 (en) * 2019-02-28 2022-05-19 Asml Netherlands B.V. Apparatus for assembly of a reticle assembly

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Publication number Priority date Publication date Assignee Title
KR100624643B1 (ko) * 2005-09-09 2006-09-15 민경준 페리클 접착장치
KR100742176B1 (ko) * 2006-01-27 2007-07-24 주식회사 피케이엘 페리클 부착장치
KR100837282B1 (ko) 2007-06-14 2008-06-12 삼성전자주식회사 비휘발성 메모리 장치, 그것을 포함하는 메모리 시스템,그것의 프로그램 방법 및 읽기 방법
KR101357305B1 (ko) 2007-08-29 2014-01-28 삼성전자주식회사 펠리클 부착 장치 및 이를 이용한 펠리클 부착 방법
WO2009044483A1 (ja) * 2007-10-05 2009-04-09 Asahi Kasei Emd Corporation ペリクル貼付装置のペリクル加圧機構
JP5600921B2 (ja) * 2009-10-19 2014-10-08 凸版印刷株式会社 ペリクル貼付装置

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US4443098A (en) * 1982-12-21 1984-04-17 General Signal Corporation Pellicle mounting fixture
US4637713A (en) * 1985-09-27 1987-01-20 Scss Instruments, Inc. Pellicle mounting apparatus
US4897966A (en) * 1986-08-19 1990-02-06 Japan Silicon Co., Ltd. Polishing apparatus

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JPS6238468A (ja) * 1985-08-13 1987-02-19 Oki Electric Ind Co Ltd ペリクル装着装置
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US4443098A (en) * 1982-12-21 1984-04-17 General Signal Corporation Pellicle mounting fixture
US4637713A (en) * 1985-09-27 1987-01-20 Scss Instruments, Inc. Pellicle mounting apparatus
US4897966A (en) * 1986-08-19 1990-02-06 Japan Silicon Co., Ltd. Polishing apparatus

Cited By (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6055040A (en) * 1992-07-13 2000-04-25 Intel Corporation Pellicle frame
US5419972A (en) * 1993-09-02 1995-05-30 Shin-Etsu Chemical Co., Ltd. Frame-supported pellicle for dustproof protection of photomask
US5953107A (en) * 1997-03-07 1999-09-14 Taiwan Semiconductor Manufacturing Company, Ltd. Mask pellicle remove tool
US6317197B1 (en) 1997-03-07 2001-11-13 Taiwan Semiconductor Manufacturing Company Mask pellicle remove tool
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KR930006866A (ko) 1993-04-22
JPH0588358A (ja) 1993-04-09
KR970001694B1 (ko) 1997-02-13
JP2814785B2 (ja) 1998-10-27

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