US3878392A - Specimen analysis with ion and electrom beams - Google Patents

Specimen analysis with ion and electrom beams Download PDF

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Publication number
US3878392A
US3878392A US425457A US42545773A US3878392A US 3878392 A US3878392 A US 3878392A US 425457 A US425457 A US 425457A US 42545773 A US42545773 A US 42545773A US 3878392 A US3878392 A US 3878392A
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ions
mass
specimen
ion
electron beam
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Nelson C Yew
Wyman C Lane
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Etec Systems Inc
ETEC CORP
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ETEC CORP
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Priority to US425457A priority Critical patent/US3878392A/en
Priority to DE19742454826 priority patent/DE2454826A1/de
Priority to GB5209774A priority patent/GB1457975A/en
Priority to JP49144903A priority patent/JPS5093692A/ja
Priority to FR7441528A priority patent/FR2254788B3/fr
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Publication of US3878392A publication Critical patent/US3878392A/en
Assigned to MNC CREDIT CORP., 502 WASHINGTON AVE., STE. 700, TOWSON, MD reassignment MNC CREDIT CORP., 502 WASHINGTON AVE., STE. 700, TOWSON, MD SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ETEC, A CORP. OF NV
Assigned to ETEC, A CORP. OF NV reassignment ETEC, A CORP. OF NV ASSIGNMENT OF ASSIGNORS INTEREST. Assignors: PERKIN-ELMER CORPORATION, THE
Assigned to ETEC SYSTEMS, INC., A CORP. OF NV reassignment ETEC SYSTEMS, INC., A CORP. OF NV CHANGE OF NAME (SEE DOCUMENT FOR DETAILS). 8/30/90 Assignors: ETEC, A CORP. OF NV
Assigned to CONNECTICUT NATIONAL BANK, THE reassignment CONNECTICUT NATIONAL BANK, THE SECURITY INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: ETEC SYSTEMS, INC.
Assigned to ETEC, A CORP. OF NEVADA reassignment ETEC, A CORP. OF NEVADA RELEASED BY SECURED PARTY (SEE DOCUMENT FOR DETAILS). Assignors: MNC CREDIT CORP., A MD CORP.
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252—Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256—Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion

Definitions

  • ABSTRACT A method and apparatus employing ion and electron beams for chemically analyzing a specimen.
  • a specimen is mounted on a movable platform in an evacuated chamber and irradiated with an ion beam over a predetermined area of interest to liberate secondary ions.
  • the secondary ion spectrum is analyzed with a mass filter and display unit to provide a spectral distribution. Ions having a particular mass-to-charge ratio are selected for spatial distribution analysis and the mass filter is tuned to the selected mass-to-charge ratio.
  • the filtered beam of secondary ions passed through the mass filter is detected by an ion detector which generates a signal representative of secondary ion abundance at that mass-to-charge ratio.
  • the ion detector output signals are used to control the intensity or deflection of a CRT beam.
  • An independently generated electron beam is scanned over the specimen area irradiated by the ion beam and the CRT beam is swept in synchronism with the scanned electron beam.
  • the electron beam, scanned over the ion irradiated specimen area modulates the secondary ion yield at the point where both the electron beam and the ion beam are coincident on the specimen.
  • the resulting display is a two dimensional spatial distribution map of the species in the specimen to which the mass filter is tuned.
  • the filtered secondary ions encounter an ion detector which provides an output signal whose magnitude is representative of the intensity of the ion beam incident thereto.
  • This output signal is typically used to control the intensity of a cathode ray tube. or CRT. scanning beam which is scanned in synchronism with the ion beam.
  • the resulting display on the face of the CRT thus provides a spatial distribution plot of ion density as a function of location on the specimen.
  • the spatial resolution of the chemical specimen constituents is a function of the fineness of the primary ion beam.
  • the degree of resolution of the primary ion beam is directly dependent upon the complexity and size of the beam generation ion optics and deflection circuitry. In genera]. the finer the resolution desired. the more complicated. cumbersome and costly the ion optics and circuitry must be. In actuality. the cost of specimen analysis increases inordinately with the fineness of the resolution desired and. in many cases. is so great as to render the gathering of much-needed data economically prohibitive.
  • a further disadvantage inherent in known ion beam analysis techniques is the lower limit of resolution.
  • the minimum primary ion beam diameter practically obtainable with known systems is about 1 micron. Thus. where a finer resolution than that obtainable with this lower limit is required. ion beam analysis cannot furnish meaningful data and other techniques must be employed, usually with less satisfactory results.
  • the invention comprises a method and apparatus for providing a spatial map of secondary ion emission which provides a resolution which is substantially finer than that hitherto obtainable.
  • a beam of primary ions from a source is directed onto the surface of a specimen, with the primary ion beam covering the entire area of interest.
  • An electron beam from an electron-optical column is line scanned over the same area to interact with the secondary ions liberated from the specimen area by the primary ion beam.
  • the secondary ions are passed through a mass filter tuned to ions of a preselected mass-to-charge ratio. and the ions transmitted therethrough are detected by an ion detector. the output of which is used to control the intensity or deflection of the beam of a CRT display.
  • the CRT beam is scanned synchronously with the electron beam to provide a spatial distribution map of secondary ion intensity as a function of electron beam position.
  • FIG. 1 is a diagramatic view of a preferred embodiment of a system constructed according to the invention
  • FIG. 2 is a schematic diagram illustration the distribution frequency of elements of a specimen.
  • FIG. 3 is a schematic diagram illustrating the principle of the invention.
  • FIG. 1 illustrates a preferred embodiment of a system constructed according to the invention.
  • a housing 10 shown partly broken away provides a main specimen chamber 11 which can be evacuated by means of a vacuum pump 12 and valved conduit 13.
  • a specimen platform 14 mounted within chamber 11 is a specimen platform 14, commonly termed a stage. which provides a support surface for a specimen 15 to be investigated.
  • Stage 14 is provided with suitable mechanical connections indicated by broken lines 16-20 for enabling independent movement of stage 14 in the .v, v. and 2 directions. and tilting and rotation of stage 14 about the .r-y plane and the z axis, respectively, in response to the manipulation of control elements 21-25.
  • Elements 16-25 may comprise any suitable known mechanical arrangement for imparting the desired motion to stage 14. Since several such arrangements are known, details thereof have been omitted for clarity.
  • a source of primary ions 26, which may comprise a duo plasmatr'on ion source, a diode source. an RF source. or the like.
  • Ion beam source 26 is powered by a conventional ion gun power supply 27-which provides beam generation. focusing and alignment control signals.
  • lon gun 26 is so arranged in chamber 11 that the beam of primary ions 28 generated by gun 26 is emitted an an angle a be tween the beam axis and the reference plane. lf desired, ion gun 26 may be provided with a suitable mechanical arrangement for adjusting the angle a.
  • angle a depends primarily on the primary ion beam energy, the nature ofthe specimen under investigation and the type of analysis desired. and can best be determined on an empirical basis for a given application. In general, shallow angles are preferred to a minimum of about although values of a up to a limit of about 85 can provide good results.
  • the nature of the primary ion beam used in practicing the invention also depends upon the nature of the sample under investigation, the desired ion beam energy and the type of analysis desired.
  • suitable primary ion beams are argon, cesium, the halogens, helium, nitrogen and oxygen. Other types will occur to those skilled in the art.
  • a conventional quadrupole mass filter 33 powered by a mass filter control unit indicated by reference numeral 34 which comprises a conventional RF generator 35 and DC power supply 36.
  • Mass filter 33 may be operated in two modes: a narrow filter mode in which filter 33 is turned by the combination of control signals from control unit 34 to transmit only ions having a given mass-to-charge ratio, and a spectral mode in which the narrow transmission window normally provided during narrow filter mode is cyclically varied over a preselected range of mass-tocharge ratios.
  • a secondary ion detector 38 which may be a conventional electron multiplier, is mounted at the secondary ion beam output of mass filter 33, and is powered by a conventional ion detector power supply 39.
  • the output of ion detector 38 is coupled via an amplifier 40 to the beam intensity control element 41 of a standard cathode ray tube 42 and also to fixed contact 43 of a switch 44.
  • a conventional CRT power supply 45 provides beam generator signals to CRT 42.
  • a conventional electronoptical column 46 mounted on housing 10 is a conventional electronoptical column 46 powered by a standard column control unit 47.
  • Column control unit 47 provides beam generation, beam focusing and beam alignment control signals to electron optical column 46.
  • a sweep generator 48 provides raster type beam deflection scanning signals which are coupled to the deflection coils of electron-optical column 46.
  • the deflection scanning signals from sweep generator 48 are also coupled to a first pair of contacts 51, 52 of a double-pole, double-throw switch 50.
  • the alternate pair of contacts 53, 54 are coupled to the output signals from RF generator 35 and the blade contact 55 of switch 44.
  • blade 55 of switch 44 is mechanically linked to a pair of moveable blades 57, 58 of switch 50 so that blade 55 closes when blades 57,
  • Blades 57, 58 are moved to the left-hand position of FIG. 1. Blades 57, 58 are coupled to the deflection control elements of CRT 42. Thus. the deflection of the display beam of CRT 42 is alternately controlled by sweep generator 48, and the output signals from RF generator 35 and ion detector 38, depending on the position of switch 50.
  • the elements designated by reference numerals 10-14, 16-25, 42, 45, 46, 47 and 48 comprise conventional scanning electron microscope (SEM) elements, such as those found in the AUTOSCAN model Scanning Electron Microscope available from Etec Corporation of Hayward, Calif. Since these elements, and the other elements noted above as conventional, are all well-known, further details thereof have been omitted to avoid prolixity.
  • SEM scanning electron microscope
  • a specimen I5 is mounted on stage 14 and maneuvered to the desired target position by elements 16-25, after which chamber 11 is evacuated by pump 12 and valve 13.
  • Ion gun power supply 27 is then activated to cause ion gun 26 to generate a beam of primary ions 28 of the desired size and intensity.
  • Mass filter control unit 34 and ion detector power supply 39 are energized to activate mass filter 33 and ion detector 38.
  • CRT power supply 45 is activated and switch 50 is placed in the lefthand position (not illustrated).
  • Mass filter 33 is now operated in the spectral mode and the filter control signals generated by RF generator 35 and the output signals from ion detector 38 are coupled via switch contacts 43, 53, 54 and blades 55, 57, 58 to the deflection elements of CRT 42 so that the CRT beam is swept in the horizontal direction as a function of mass-to-charge ratio and in the vertical direction as a function of the beam intensity.
  • the resulting display shown in FIG. 2 is a spectral plot of intensity vs. mass-to-charge ratio of the secondary ions emitted from the area of specimen 15 subjected to the primary ion beam.
  • the location and the intensity of peaks 59 i give the relative distribution of various species of elements or compounds in the sample 15. From this display, a particular species of interest is selected for spatial distribution analysis.
  • mass filter control unit 34 is adjusted to operate mass filter 33 in the narrow filter mode. In this mode only those ions, whether positive or negative, having the preselected mass-to-charge ratio are permitted to pass to ion detector 38.
  • Switch 50 is next moved to the right-hand position illustrated in FIG. 1 and synchronous beam scanning is initiated by actuating sweep generator 48 and column control unit 47.
  • the electron beam generated by electron-optical column 46 and the CRT beam simultaneously scan the target area of interest and the CRT face, respectively, while the output of secondary ion detector 38 modulates the intensity of the CRT beam.
  • FIG. 3 illustrates the variation of detected secondary ion current with the electron beam position as the electron beam scans a line element 60 of the specimen target area.
  • the portion of specimen 15 subjected to the primary ion beam is indicated by the closed path denoted by reference numeral 61.
  • the shaded regions denoted by reference numerals 62, 64 represent regions having a concentration of the species of interest while the remaining unshaded area bounded by 6! is devoid of such concentrations.
  • the intensity of the secondary ion current is substantially constant.
  • the intensity ofthe detected secondary ion current rapidly decreases to a minimum and remains at this minimum level until the beam emerges from concentrated region 62 at point of the line.
  • the level of the secondary ion current increases to the original level and remains substantially uniform.
  • the CRT beam is synchronously swept by sweep generator 48 along a corresponding line 60 (FIG. 1) and modulated in intensity in accordance with the output from ion detector 38 amplified by amplifier 40.
  • the result is a swept line element 60' whose intensity varies as a function of the concentration of the species of interest in the corresponding scanned line 60 of the specimen.
  • CRT 42 displays a pictorial representation of the target area, which exhibits those regions having a concentration of the species under investigation as well-defined dark regions 62'. 64' on a lighter background. If desired, this intensity variation may be reversed by providing an inverter at the output of amplifier 40, so that regions 62, 64 appear light on a dark background.
  • regions 62, 64 are assumed to have a substantially uniform concentration of the particular species under investigation. As will be apparent to those skilled in the art. if the concentration is not uniform. the resulting display will exhibit intensity variations in regions of concentration which correspond identically to the variation in concentration over the specimen target area.
  • mass filter 33 may be tuned to pass secondary ions of a different mass-tocharge ratio and the process may be repeated.
  • the resolution of spatial distribution maps obtained in accordance with the invention is primarily a function of the scanning electron beam size, extremely fine resolution on the order of I00 Angstrom units can be obtained herewith. Further. since the primary ion beam need only be focused to the maximum width of the target area. typically on the order of 100 microns. extremely simple and inexpensive primaryion beam generation and focussing circuits can be employed without sacrificing the resolution of the system.
  • mass filter 33 may be operated in a combined spectral and narrow filter mode in which the narrow pass band of the filter is shifted at a slow rate compared to the synchronous scanning rate of the electron beam and the CRT beam to provide a composite image of the spatial distribution of two or more species ofinterest.
  • mass filter 33 may be operated in a discrete combined spectral-narrow filter mode in which the narrow 6 pass band of this element is shifted discretely in accordance withthe initially obtained spectral plot of intensity versus mass-to-charge ratio of the specimen under 6 investigation, with the stepping rate being substantially less than the scanning rate of the electron beam.
  • the various analog data signals obtained with the preferred embodiment.
  • a method of analyzing a specimen for elemental l5 constituents comprising the steps of:
  • the method of claim 1 further including the step of filtering said secondary ions to permit detection of secondary ions having substantially the same preselected mass-to-charge ratio.
  • step (c) of detecting includes the steps of:
  • step (b) of scanning is preceded by the step of determining the spectral distribution in mass-to-charge ratios of said 35 secondary ions emanating from said irradiated target area.
  • step of determining includes the steps of:
  • control signals representative of the variation of secondary ion current with position of said electron beam relative to said target area
  • step (f) of generating includes the step of passing said secondary ions through a mass filter tuned to reject substantially all secondary ions hot having a preselected mass-tocharge ratio so that only control signals representative of the variation of secondary ions having said preselected mass-to-charge ratio are generated.
  • a system for analyzing a specimen for elemental constituents comprising:
  • said detecting means includes filter means for preventing detection of secondary ions not having a preselected mass-to-charge ratio.
  • said detecting means includes means for synchronously scanning said electron beam and a recording element and means for modulating said recording element in accordance with said variation of said secondary ion current.
  • the system of claim 8 further including means for determining the spectral distribution in mass-to-charge ratios of said secondary ions liberated from said irradiated target area.
  • said spectral distribution determining means includes:

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Health & Medical Sciences (AREA)
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US425457A 1973-12-17 1973-12-17 Specimen analysis with ion and electrom beams Expired - Lifetime US3878392A (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
US425457A US3878392A (en) 1973-12-17 1973-12-17 Specimen analysis with ion and electrom beams
DE19742454826 DE2454826A1 (de) 1973-12-17 1974-11-19 Verfahren und vorrichtung zur probenanalyse mit ionen- und elektronenstrahlen
GB5209774A GB1457975A (en) 1973-12-17 1974-12-02 Specimen analysis with ion and electron beams
FR7441528A FR2254788B3 (fr) 1973-12-17 1974-12-17
JP49144903A JPS5093692A (fr) 1973-12-17 1974-12-17

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US425457A US3878392A (en) 1973-12-17 1973-12-17 Specimen analysis with ion and electrom beams

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JP (1) JPS5093692A (fr)
DE (1) DE2454826A1 (fr)
FR (1) FR2254788B3 (fr)
GB (1) GB1457975A (fr)

Cited By (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3942005A (en) * 1974-12-12 1976-03-02 Hitachi, Ltd. Electron scanning apparatus
US4088895A (en) * 1977-07-08 1978-05-09 Martin Frederick Wight Memory device utilizing ion beam readout
US4591984A (en) * 1981-08-10 1986-05-27 Tokyo Shibaura Denki Kabushiki Kaisha Radiation measuring device
US4645929A (en) * 1984-01-31 1987-02-24 Siemens Aktiengesellschaft Method and apparatus for the compensation of charges in secondary ion mass spectrometry (SIMS) of specimens exhibiting poor electrical conductivity
US4860224A (en) * 1985-05-21 1989-08-22 501 Tekscan Limited Surface analysis spectroscopy apparatus
EP0378077A2 (fr) * 1989-01-09 1990-07-18 Hitachi, Ltd. Dispositif et méthode d'analyse avec spectroscopie ionique de masse
US5014287A (en) * 1990-04-18 1991-05-07 Thornton Michael G Portable x-ray fluorescence spectrometer for environmental monitoring of inorganic pollutants
EP0265245A3 (fr) * 1986-10-21 1992-07-01 Matsushita Electric Industrial Co., Ltd. Méthode pour l'enregistrement effaçable et la lecture d'informations
US5162233A (en) * 1987-12-16 1992-11-10 Mitsubishi Denki Kabushiki Kaisha Method of detecting and analyzing impurities
DE4232509A1 (de) * 1992-09-29 1994-03-31 Holstein & Kappert Maschf Verfahren zur Bestimmung von Kontaminaten in Behältern
US5699797A (en) * 1992-10-05 1997-12-23 Dynamics Imaging, Inc. Method of investigation of microcirculation functional dynamics of physiological liquids in skin and apparatus for its realization
US5730133A (en) * 1994-05-20 1998-03-24 Dynamics Imaging, Inc. Optical functional mamoscope
US5747789A (en) * 1993-12-01 1998-05-05 Dynamics Imaging, Inc. Method for investigation of distribution of physiological components in human body tissues and apparatus for its realization
US5865167A (en) * 1991-12-17 1999-02-02 Dynamics Imaging, Inc. Method of living system organism diagnostics and apparatus for its realization
US5865743A (en) * 1994-02-23 1999-02-02 Dynamics Imaging, Inc. Method of living organism multimodal functional mapping
US6002958A (en) * 1992-12-24 1999-12-14 Dynamics Imaging, Inc. Method and apparatus for diagnostics of internal organs
US6192262B1 (en) 1994-02-23 2001-02-20 Dobi Medical Systems, Llc Method of living organism multimodal functional mapping
US6373070B1 (en) 1999-10-12 2002-04-16 Fei Company Method apparatus for a coaxial optical microscope with focused ion beam
US20030102436A1 (en) * 2000-03-20 2003-06-05 Gerard Benas-Sayag Column simultaneously focusing a particle beam and an optical beam
US20030165205A1 (en) * 2002-03-04 2003-09-04 Chu Jeffrey C. Detecting and measuring interference contained within a digital carrier
CN106950191A (zh) * 2017-02-28 2017-07-14 电子科技大学 配套检测样品在电子注激励下产生光谱特性的实验系统

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60221944A (ja) * 1985-03-28 1985-11-06 Shimadzu Corp 総合局所分析方法

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2356633A (en) * 1939-10-19 1944-08-22 Ardenne Manfred Von Electronic microscope
US2799779A (en) * 1955-02-01 1957-07-16 Leitz Ernst Gmbh Method and apparatus for obtaining ultramicroscopic images in an ion microscope
US3219817A (en) * 1961-11-09 1965-11-23 Trub Tauber & Co A G Electron emission microscope with means to expose the specimen to ion and electron beams
US3517191A (en) * 1965-10-11 1970-06-23 Helmut J Liebl Scanning ion microscope with magnetic sector lens to purify the primary ion beam
US3617739A (en) * 1969-07-23 1971-11-02 Inst Plasmaphysik Gmbh Ion lens to provide a focused ion, or ion and electron beam at a target, particularly for ion microprobe apparatus

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2356633A (en) * 1939-10-19 1944-08-22 Ardenne Manfred Von Electronic microscope
US2799779A (en) * 1955-02-01 1957-07-16 Leitz Ernst Gmbh Method and apparatus for obtaining ultramicroscopic images in an ion microscope
US3219817A (en) * 1961-11-09 1965-11-23 Trub Tauber & Co A G Electron emission microscope with means to expose the specimen to ion and electron beams
US3517191A (en) * 1965-10-11 1970-06-23 Helmut J Liebl Scanning ion microscope with magnetic sector lens to purify the primary ion beam
US3617739A (en) * 1969-07-23 1971-11-02 Inst Plasmaphysik Gmbh Ion lens to provide a focused ion, or ion and electron beam at a target, particularly for ion microprobe apparatus

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3942005A (en) * 1974-12-12 1976-03-02 Hitachi, Ltd. Electron scanning apparatus
US4088895A (en) * 1977-07-08 1978-05-09 Martin Frederick Wight Memory device utilizing ion beam readout
US4591984A (en) * 1981-08-10 1986-05-27 Tokyo Shibaura Denki Kabushiki Kaisha Radiation measuring device
US4645929A (en) * 1984-01-31 1987-02-24 Siemens Aktiengesellschaft Method and apparatus for the compensation of charges in secondary ion mass spectrometry (SIMS) of specimens exhibiting poor electrical conductivity
US4860224A (en) * 1985-05-21 1989-08-22 501 Tekscan Limited Surface analysis spectroscopy apparatus
EP0265245A3 (fr) * 1986-10-21 1992-07-01 Matsushita Electric Industrial Co., Ltd. Méthode pour l'enregistrement effaçable et la lecture d'informations
US5162233A (en) * 1987-12-16 1992-11-10 Mitsubishi Denki Kabushiki Kaisha Method of detecting and analyzing impurities
EP0378077A2 (fr) * 1989-01-09 1990-07-18 Hitachi, Ltd. Dispositif et méthode d'analyse avec spectroscopie ionique de masse
EP0378077A3 (fr) * 1989-01-09 1991-04-24 Hitachi, Ltd. Dispositif et méthode d'analyse avec spectroscopie ionique de masse
US5014287A (en) * 1990-04-18 1991-05-07 Thornton Michael G Portable x-ray fluorescence spectrometer for environmental monitoring of inorganic pollutants
US5865167A (en) * 1991-12-17 1999-02-02 Dynamics Imaging, Inc. Method of living system organism diagnostics and apparatus for its realization
DE4232509A1 (de) * 1992-09-29 1994-03-31 Holstein & Kappert Maschf Verfahren zur Bestimmung von Kontaminaten in Behältern
US5699797A (en) * 1992-10-05 1997-12-23 Dynamics Imaging, Inc. Method of investigation of microcirculation functional dynamics of physiological liquids in skin and apparatus for its realization
US6002958A (en) * 1992-12-24 1999-12-14 Dynamics Imaging, Inc. Method and apparatus for diagnostics of internal organs
US5747789A (en) * 1993-12-01 1998-05-05 Dynamics Imaging, Inc. Method for investigation of distribution of physiological components in human body tissues and apparatus for its realization
US6192262B1 (en) 1994-02-23 2001-02-20 Dobi Medical Systems, Llc Method of living organism multimodal functional mapping
US5865743A (en) * 1994-02-23 1999-02-02 Dynamics Imaging, Inc. Method of living organism multimodal functional mapping
US5730133A (en) * 1994-05-20 1998-03-24 Dynamics Imaging, Inc. Optical functional mamoscope
US6373070B1 (en) 1999-10-12 2002-04-16 Fei Company Method apparatus for a coaxial optical microscope with focused ion beam
US20030102436A1 (en) * 2000-03-20 2003-06-05 Gerard Benas-Sayag Column simultaneously focusing a particle beam and an optical beam
US20060097198A1 (en) * 2000-03-20 2006-05-11 Gerard Benas-Sayag Column simultaneously focusing a particle beam and an optical beam
US7297948B2 (en) 2000-03-20 2007-11-20 Credence Systems Corporation Column simultaneously focusing a particle beam and an optical beam
US20030165205A1 (en) * 2002-03-04 2003-09-04 Chu Jeffrey C. Detecting and measuring interference contained within a digital carrier
US7639761B2 (en) * 2002-03-04 2009-12-29 Glowlink Communications Technology, Inc. Detecting and measuring interference contained within a digital carrier
US20100046672A1 (en) * 2002-03-04 2010-02-25 Chu Jeffrey C System for and Method of Detecting Interference in a Communication System
CN106950191A (zh) * 2017-02-28 2017-07-14 电子科技大学 配套检测样品在电子注激励下产生光谱特性的实验系统
CN106950191B (zh) * 2017-02-28 2019-11-05 电子科技大学 配套检测样品在电子注激励下产生光谱特性的实验系统

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Publication number Publication date
DE2454826A1 (de) 1975-06-19
GB1457975A (en) 1976-12-08
JPS5093692A (fr) 1975-07-25
FR2254788B3 (fr) 1977-09-16
FR2254788A1 (fr) 1975-07-11

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