US3449505A - Method of and means for heat-treating refractory materials at high temperatures - Google Patents

Method of and means for heat-treating refractory materials at high temperatures Download PDF

Info

Publication number
US3449505A
US3449505A US551419A US3449505DA US3449505A US 3449505 A US3449505 A US 3449505A US 551419 A US551419 A US 551419A US 3449505D A US3449505D A US 3449505DA US 3449505 A US3449505 A US 3449505A
Authority
US
United States
Prior art keywords
plasma
heat
flux
axis
high temperatures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US551419A
Other languages
English (en)
Inventor
Wojciech Brzozowski
Michal Mikos
Janusz Niewiadomski
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from PL109197A external-priority patent/PL52367B1/pl
Application filed by Individual filed Critical Individual
Application granted granted Critical
Publication of US3449505A publication Critical patent/US3449505A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Images

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/26—Plasma torches
    • H05H1/32—Plasma torches using an arc

Definitions

  • the invention relates to a method of obtaining high temperatures in plasma furnaces and to a device for a1 plication of this method.
  • this device is simply named plasma furnace. It is based on the principle of a laminar plasma flux or of a laminar plasma column of an electric are moving over a generating surface of a cylinder.
  • the plasma furnace shown by way of example is a laboratory-type unit of a comparatively small capacity at maximum temperature, having a volume of about 1000-2000 cc. Nevertheless, according to the described principle also much greater units for industrial use may be built.
  • the described method has found its utilization, e.g., for spheroidization of uranium oxides and carbides, for fusion of uranium and plutonium carbides, etc.
  • FIG. 1 is an elevational view of a plasma furnace representing a first embodiment
  • FIG. 2 is a top view of the furnace of FIG. 1;
  • FIG. 3 is a view similar to FIG. 1, showing a second embodiment.
  • FIGS. 1 and 2 there is shown a first embodiment of a high-temperature plasma furnace.
  • a source of radiant heat for a crucible 7 is represented by a laminar plasma flux 2 emitted into a treatment chamber 13 from a plasmatron nozzle 1.
  • a laminar plasma flux 2 emitted into a treatment chamber 13 from a plasmatron nozzle 1.
  • R a circular orbit of radius centered on the axis of the crucible 7. which is shown as an upwardly open receptacle.
  • the laminar flux of plasma 2 moves then over the generating surface of a cylinder of radius R and heats up the crucible uni- 3,449,505 Patented June 10, 1969 formly from all sides.
  • the elongate plasma flux 2 is parrallel to the axis 12 of crucible 7 and chamber 13.
  • the plasmatron in its circular motion is driven by means of a mechanism shown in FIGS. 1 and 2: a motor 3 drives the furnace cover 4 in which the plasma generator is eccentrically positioned to perform the aforedescribed revolution of radius R.
  • the length of the radius R may be adjusted by means of the eccentric 5.
  • a guide 0 bar 10 prevents the plasmatron 1 from rotating around its own axis, except over a minor oscillatory range of up to 40 as indicated by the double-heated arrow in FIG. 2.
  • the temperature in the vicinity of the crucible 7 may be varied over a wide range, during the process of heating its contents, by the following measures: (a) by controlling the power applied to the plasmatron 1; (b) by changing the height H of the crucible 7; (c) by changing the radius R; and (d) by changing the speed of the plasma flux 2.
  • FIG. 3 there is shown a second embodiment of the plasma furnace in which the heating element is the laminar plasma column of an electric are 11 showing between plasmatron 1 and a ring-shaped anode 8 concentric with axis 12.
  • the heating element is the laminar plasma column of an electric are 11 showing between plasmatron 1 and a ring-shaped anode 8 concentric with axis 12.
  • the plasmatron also rotates in a circular orbit of radius R around the crucible center (i.e. the vertical axis 12 of the furnace chamber 13, and the revolving arc column 11 generating a cylinder of radius R assures an uniform temperature distribution in the vincinity of the crucible 7.
  • the plasma furnace according to the second embodiment aflords still higher temperatures around the crucible 7 than the embodiment of FIGS. 1 and 2.
  • Controlling of the temperature in the second embodiment of the invention is effected by (a) controlling the power applied to the plasmatron 1; (b) changing the radius R of the orbital path of the arcuate plasma 11. Radius R may be varied discontinuouly in steps, just after plasmatron 11 has been switched off; and (c) varying the speed of the plasmatron 1 along its orbit of radius R, e.g. between 10 and revolutions per minute.
  • a method of heat-treating a material at high temperatures comprising the steps of placing said material at a predetermined location in a chamber generating a plasma flux in said chamber substantially parallel to an axis in line with said location and at a distance R from said axis, and revolving said plasma flux about said axis in an orbit of radius R while subjecting said material to radiant heat from said flux.
  • a device for heat-treating a material at high temperatures comprising a treatment chamber, a receptacle in said chamber for material to be treated, a plasma generator adapted to produce an elongate plasma flux in said chamber, rotatable supporting means for said generator centered on an axis in line with said receptable, said generator being mounted at a location remote from said axis, and drive means for rotating said supporting means about said axis whereby said plasma flux revolves around said receptacle.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Furnace Details (AREA)
  • Crucibles And Fluidized-Bed Furnaces (AREA)
US551419A 1965-05-22 1966-05-19 Method of and means for heat-treating refractory materials at high temperatures Expired - Lifetime US3449505A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PL109197A PL52367B1 (de) 1965-05-22

Publications (1)

Publication Number Publication Date
US3449505A true US3449505A (en) 1969-06-10

Family

ID=19946353

Family Applications (1)

Application Number Title Priority Date Filing Date
US551419A Expired - Lifetime US3449505A (en) 1965-05-22 1966-05-19 Method of and means for heat-treating refractory materials at high temperatures

Country Status (7)

Country Link
US (1) US3449505A (de)
JP (1) JPS4821539B1 (de)
BE (1) BE681332A (de)
DE (1) DE1288708B (de)
GB (1) GB1144245A (de)
NL (1) NL6607010A (de)
SE (1) SE314753B (de)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3780201A (en) * 1973-02-06 1973-12-18 Vysoka Skola Banska Ostrava Plasma kiln
US3783167A (en) * 1971-02-16 1974-01-01 Tetronics Res Dev Co Ltd High temperature treatment of materials
USRE28570E (en) * 1971-02-16 1975-10-14 High temperature treatment of materials
US3932171A (en) * 1972-09-24 1976-01-13 Tetronics Research And Development Company Process for high temperature treatment of materials
US3936586A (en) * 1974-05-07 1976-02-03 Tetronics Research And Development Co. Ltd. Arc furnaces and to methods of treating materials in such furnaces

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NO790943L (no) * 1978-04-08 1979-10-09 Laporte Industries Ltd Oppvarmningsanordning basert paa elektrisk utladning
CH658545A5 (de) * 1982-09-10 1986-11-14 Balzers Hochvakuum Verfahren zum gleichmaessigen erwaermen von heizgut in einem vakuumrezipienten.

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2922869A (en) * 1958-07-07 1960-01-26 Plasmadyne Corp Plasma stream apparatus and methods
US3147329A (en) * 1955-07-26 1964-09-01 Union Carbide Corp Method and apparatus for heating metal melting furnaces

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3147329A (en) * 1955-07-26 1964-09-01 Union Carbide Corp Method and apparatus for heating metal melting furnaces
US2922869A (en) * 1958-07-07 1960-01-26 Plasmadyne Corp Plasma stream apparatus and methods

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3783167A (en) * 1971-02-16 1974-01-01 Tetronics Res Dev Co Ltd High temperature treatment of materials
USRE28570E (en) * 1971-02-16 1975-10-14 High temperature treatment of materials
US3932171A (en) * 1972-09-24 1976-01-13 Tetronics Research And Development Company Process for high temperature treatment of materials
US3780201A (en) * 1973-02-06 1973-12-18 Vysoka Skola Banska Ostrava Plasma kiln
US3936586A (en) * 1974-05-07 1976-02-03 Tetronics Research And Development Co. Ltd. Arc furnaces and to methods of treating materials in such furnaces

Also Published As

Publication number Publication date
JPS4821539B1 (de) 1973-06-29
DE1288708B (de) 1969-02-06
NL6607010A (de) 1966-11-23
BE681332A (de) 1966-10-31
GB1144245A (en) 1969-03-05
SE314753B (de) 1969-09-15

Similar Documents

Publication Publication Date Title
US3449505A (en) Method of and means for heat-treating refractory materials at high temperatures
GB775986A (en) Improvements in or relating to processes and apparatus for treating semi-conductor devices
CN106862562A (zh) 原料粉末处理方法、原料粉末处理装置和物体产生方法
GB1525394A (en) Heat treating apparatus and method
EP0807964B1 (de) Einrichtung zum behandeln flacher elemente mit einem plasmajet
US20220130567A1 (en) Electromagnetic heating for vitrification
EP0415858A3 (en) Plasma reactor for high-temperature treatment of materials
US3665139A (en) Device for epitactic precipitation of semiconductor material
JPH10504513A (ja) 基板の均一加熱用装置
US3300561A (en) Methods and devices for heating substances by means of radiant energy and plasma heat sources
JPH0467755B2 (de)
JPH01225704A (ja) 粉末の品質を改良する装置
US3684557A (en) Method for vacuum evaporation of high melting point non-metallic materials
US3124633A (en) Certificate of correction
JP2011206680A (ja) アスベストプラズマ溶融装置
JP2017505892A (ja) 溶融プラントのための金属材料を加熱および移送する装置および、その装置を備える溶融プラント
US3935058A (en) Zone melting process
US6761851B1 (en) Apparatus and method for hardening metal by varying the engagement between irradiation and metal
US6933509B1 (en) Apparatus and method using fractionated irradiation to harden metal
JPS57118635A (en) Manufacture of semiconductor device
CN113248114A (zh) 坩埚及用于其腔体的盖体、物料处理设备
JPH08166493A (ja) 収容容器の連続製造装置及び連続製造方法
SU725819A1 (ru) Устройство дл нанесени покрытий из металлических порошков
FR2303774A1 (fr) Procede et dispositif pour la preparation par fusion de materiaux cristallins a base d'oxydes de metaux refractaires
DE3067995D1 (en) A process and apparatus for recovering energy from molten slag