US3172734A - warren - Google Patents
warren Download PDFInfo
- Publication number
- US3172734A US3172734A US3172734DA US3172734A US 3172734 A US3172734 A US 3172734A US 3172734D A US3172734D A US 3172734DA US 3172734 A US3172734 A US 3172734A
- Authority
- US
- United States
- Prior art keywords
- crucible
- coil
- silicon
- zone
- hollow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000463 material Substances 0.000 claims description 34
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000012530 fluid Substances 0.000 claims description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 24
- 229910052710 silicon Inorganic materials 0.000 description 24
- 239000010703 silicon Substances 0.000 description 24
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 11
- 239000002184 metal Substances 0.000 description 10
- 229910052751 metal Inorganic materials 0.000 description 10
- 229910052802 copper Inorganic materials 0.000 description 9
- 239000010949 copper Substances 0.000 description 9
- 229910052709 silver Inorganic materials 0.000 description 8
- 239000004332 silver Substances 0.000 description 8
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 7
- 238000007670 refining Methods 0.000 description 7
- 239000012535 impurity Substances 0.000 description 6
- 238000002844 melting Methods 0.000 description 6
- 230000008018 melting Effects 0.000 description 6
- 229910052732 germanium Inorganic materials 0.000 description 5
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000004065 semiconductor Substances 0.000 description 5
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 239000007789 gas Substances 0.000 description 4
- 230000006698 induction Effects 0.000 description 4
- 239000012809 cooling fluid Substances 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 3
- 230000005672 electromagnetic field Effects 0.000 description 3
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
- 229910052737 gold Inorganic materials 0.000 description 3
- 239000010931 gold Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 238000011109 contamination Methods 0.000 description 2
- 229910002804 graphite Inorganic materials 0.000 description 2
- 239000010439 graphite Substances 0.000 description 2
- 230000001939 inductive effect Effects 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 238000005266 casting Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000000110 cooling liquid Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000011796 hollow space material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- XEBWQGVWTUSTLN-UHFFFAOYSA-M phenylmercury acetate Chemical compound CC(=O)O[Hg]C1=CC=CC=C1 XEBWQGVWTUSTLN-UHFFFAOYSA-M 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
Images
Classifications
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- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/02—Induction heating
- H05B6/22—Furnaces without an endless core
- H05B6/32—Arrangements for simultaneous levitation and heating
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J6/00—Heat treatments such as Calcining; Fusing ; Pyrolysis
- B01J6/005—Fusing
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/02—Silicon
- C01B33/021—Preparation
- C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
- C01B33/029—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of monosilane
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B35/00—Boron; Compounds thereof
- C01B35/02—Boron; Borides
- C01B35/023—Boron
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B34/00—Obtaining refractory metals
- C22B34/10—Obtaining titanium, zirconium or hafnium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B4/00—Electrothermal treatment of ores or metallurgical products for obtaining metals or alloys
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B41/00—Obtaining germanium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B60/00—Obtaining metals of atomic number 87 or higher, i.e. radioactive metals
- C22B60/02—Obtaining thorium, uranium, or other actinides
- C22B60/0204—Obtaining thorium, uranium, or other actinides obtaining uranium
- C22B60/0286—Obtaining thorium, uranium, or other actinides obtaining uranium refining, melting, remelting, working up uranium
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22B—PRODUCTION AND REFINING OF METALS; PRETREATMENT OF RAW MATERIALS
- C22B9/00—General processes of refining or remelting of metals; Apparatus for electroslag or arc remelting of metals
- C22B9/02—Refining by liquating, filtering, centrifuging, distilling, or supersonic wave action including acoustic waves
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/14—Crucibles or vessels
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/18—Heating of the molten zone the heating element being in contact with, or immersed in, the molten zone
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B13/00—Single-crystal growth by zone-melting; Refining by zone-melting
- C30B13/16—Heating of the molten zone
- C30B13/20—Heating of the molten zone by induction, e.g. hot wire technique
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/14—Heating of the melt or the crystallised materials
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F27—FURNACES; KILNS; OVENS; RETORTS
- F27B—FURNACES, KILNS, OVENS OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
- F27B3/00—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces
- F27B3/08—Hearth-type furnaces, e.g. of reverberatory type; Electric arc furnaces ; Tank furnaces heated electrically, with or without any other source of heat
- F27B3/085—Arc furnaces
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/20—Recycling
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P10/00—Technologies related to metal processing
- Y02P10/25—Process efficiency
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10S117/90—Apparatus characterized by composition or treatment thereof, e.g. surface finish, surface coating
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
- Y10T117/108—Including a solid member other than seed or product contacting the liquid [e.g., crucible, immersed heating element]
Definitions
- a molten zone may be caused to traverse the length of the crucible.
- silicon or germanium in the form of granules or powder may be consolidated into the form of a rod.
- a rod of silicon or germanium may be refined in a similar way care being taken to observe the limitations in the width of the zone for impurities to be driven to the ends of the rod.
- the invention has been found to be highly successful in the treatment of silicon. It has been found that, although silicon very readily absorbs impurities when in the molten condition, no contamination of silicon occurs in the practice of the present invention.
- the metals copper, silver and gold are chosen for the material of the crucible because each of these metals has high electrical and thermal conductivity and does not react with the material being treated; silver is preferred because its electrical and also thermal conductivities are the highest of the three and because it can be most readily polished to reflect heat optically into the melt.
- FIG. 1 is a side view of one embodiment of apparatus according to the invention.
- FIG. 2 is a cross sectional view on the line 11 of FIG. 1, and in conjunction with the accompanying drawings in which:
- FIG. 4 is a cross sectional view of the line AA of FIG. 3.
- FIG. 5 is a diagrammatic view illustrating one manner of operation of the apparatus.
- the crucible should be so located with respect to the heating coil that the silicon lies below the centre of the coil and the reaction between the electromagnetic field of coil A and the field clue to currents induced in the wall of the crucible immediately adjacent to the silicon with the field induced in the molten zone of silicon lifts that zone upwards in the drawing.
- the crucible 1 It is convenient to place the crucible 1 within a tube 5 made of silica in order that the material in the crucible can be surrounded by a protective atmosphere, the induction heater 4 being exterior to the tube 5. The crucible 1 is then pushed or pulled, by means described later, so that the full length of the crucible 1 passes the coil 4.
- a protective gas such as argon is circulated through the silca tube 5 by flexible hose 18.
- the platform 10 carrying the crucible 1 within the protective gas atmosphere may be traversed past a stationary heating coil 4 to carry out the process of zone refining at any speed found necessary or desirable and by reversing the direction of rotation of the motor 16 passes of the silicon 7 may be given in alternate directions.
- Apparatus for processing fusible material comprising an open elongated hollow walled vessel of a substantially pure metal of high electrical and thermal conductivity which is substantially non-reactive with the material being treated, means for circulating cooling fluid through the hollow walls of said crucible, a heating coil surrounding a portion of said vessel, means for passing through said coil alternating current of such value as to melt a limited zone of said fusible material and means for causing relative movement between said coil and said crucible to melt successive limited zones of said material.
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Metallurgy (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Life Sciences & Earth Sciences (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Inorganic Chemistry (AREA)
- Geology (AREA)
- Environmental & Geological Engineering (AREA)
- Geochemistry & Mineralogy (AREA)
- Electromagnetism (AREA)
- General Engineering & Computer Science (AREA)
- Thermal Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Acoustics & Sound (AREA)
- Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Manufacture And Refinement Of Metals (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB7540/57A GB827676A (en) | 1957-03-07 | 1957-03-07 | Method and apparatus for heat treating semi-conductor material |
GB3627257A GB871156A (en) | 1957-11-21 | 1957-11-21 | Improvements in or relating to growing monocrystals of semiconductor material |
GB37764/57A GB889615A (en) | 1957-03-07 | 1957-12-04 | Method and apparatus for processing metals |
GB829558A GB871157A (en) | 1958-03-14 | 1958-03-14 | Improvements in or relating to apparatus for processing fusible materials |
GB949458A GB875592A (en) | 1958-03-25 | 1958-03-25 | Improvements in or relating to methods and apparatus for melting materials |
GB18772/58A GB899287A (en) | 1958-06-12 | 1958-06-12 | Method and apparatus for heat treating fusible material |
Publications (1)
Publication Number | Publication Date |
---|---|
US3172734A true US3172734A (en) | 1965-03-09 |
Family
ID=27546551
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US3172734D Expired - Lifetime US3172734A (en) | 1957-03-07 | warren |
Country Status (7)
Country | Link |
---|---|
US (1) | US3172734A (en)) |
BE (1) | BE565404A (en)) |
CH (3) | CH385794A (en)) |
DE (4) | DE1164982B (en)) |
FR (1) | FR1192712A (en)) |
GB (1) | GB889615A (en)) |
NL (7) | NL237042A (en)) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3796548A (en) * | 1971-09-13 | 1974-03-12 | Ibm | Boat structure in an apparatus for making semiconductor compound single crystals |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2512066B1 (fr) * | 1981-09-03 | 1986-05-16 | Cogema | Procede de separation physique d'une phase metallique et de scories dans un four a induction |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2686865A (en) * | 1951-10-20 | 1954-08-17 | Westinghouse Electric Corp | Stabilizing molten material during magnetic levitation and heating thereof |
US2719799A (en) * | 1952-11-13 | 1955-10-04 | Rca Corp | Zone melting furnace and method of zone melting |
US2768074A (en) * | 1949-09-24 | 1956-10-23 | Nat Res Corp | Method of producing metals by decomposition of halides |
US2785058A (en) * | 1952-04-28 | 1957-03-12 | Bell Telephone Labor Inc | Method of growing quartz crystals |
US2836412A (en) * | 1955-08-22 | 1958-05-27 | Titanium Metals Corp | Arc melting crucible |
US2870309A (en) * | 1957-06-11 | 1959-01-20 | Emil R Capita | Zone purification device |
US2872299A (en) * | 1954-11-30 | 1959-02-03 | Rca Corp | Preparation of reactive materials in a molten non-reactive lined crucible |
US2880117A (en) * | 1956-01-20 | 1959-03-31 | Electronique & Automatisme Sa | Method of manufacturing semiconducting materials |
US2897329A (en) * | 1957-09-23 | 1959-07-28 | Sylvania Electric Prod | Zone melting apparatus |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE518499C (de) * | 1926-11-02 | 1931-02-16 | Siemens & Halske Akt Ges | Verfahren zum Schmelzen schwerschmelzbarer Metalle, insbesondere von Tantal, Wolfram, Thorium oder Legierungen dieser Metalle in einem wassergekuehlten Behaelter |
DE536300C (de) * | 1929-09-04 | 1931-10-22 | Hirsch Kupfer Und Messingwerke | Verfahren und Vorrichtung zum Betriebe elektrischer Induktionsoefen |
DE903266C (de) * | 1941-04-05 | 1954-02-04 | Aeg | Elektrischer Induktionsofen zum Schmelzen von Magnesium und seinen Legierungen |
US2541764A (en) * | 1948-04-15 | 1951-02-13 | Battelle Development Corp | Electric apparatus for melting refractory metals |
BE510303A (en)) * | 1951-11-16 | |||
DE968582C (de) * | 1952-08-07 | 1958-03-06 | Telefunken Gmbh | Verfahren zur Bereitung einer Schmelze eines bei gewoehnlicher Temperatur halbleitenden Materials |
GB734973A (en) * | 1953-04-30 | 1955-08-10 | Gen Electric Co Ltd | Improvements in or relating to fractional fusion methods |
NL107897C (en)) * | 1953-05-18 | |||
DE975708C (de) * | 1953-08-12 | 1962-06-14 | Standard Elek K Lorenz Ag | Verdampfer zur Verdampfung von Metallen, insbesondere im Hochvakuum |
DE1007885B (de) * | 1955-07-28 | 1957-05-09 | Siemens Ag | Heizanordnung fuer Halbleiterkristall-Zieheinrichtungen, welche vorzugsweise nach dem Schmelzzonenverfahren arbeiten |
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0
- NL NL239559D patent/NL239559A/xx unknown
- NL NL114078D patent/NL114078C/xx active
- US US3172734D patent/US3172734A/en not_active Expired - Lifetime
- NL NL113928D patent/NL113928C/xx active
- NL NL236919D patent/NL236919A/xx unknown
- NL NL225605D patent/NL225605A/xx unknown
- NL NL233434D patent/NL233434A/xx unknown
- NL NL237042D patent/NL237042A/xx unknown
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1957
- 1957-12-04 GB GB37764/57A patent/GB889615A/en not_active Expired
-
1958
- 1958-02-15 CH CH5587358A patent/CH385794A/de unknown
- 1958-03-04 DE DEI14490A patent/DE1164982B/de active Pending
- 1958-03-05 FR FR1192712D patent/FR1192712A/fr not_active Expired
- 1958-03-05 BE BE565404D patent/BE565404A/xx unknown
- 1958-11-17 CH CH6623558A patent/CH416572A/de unknown
- 1958-11-24 DE DEI15671A patent/DE1191970B/de active Pending
- 1958-11-27 CH CH6663958A patent/CH435757A/de unknown
-
1959
- 1959-03-12 DE DEI16140A patent/DE1293934B/de active Pending
- 1959-06-10 DE DEI16553A patent/DE1226539B/de active Pending
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2768074A (en) * | 1949-09-24 | 1956-10-23 | Nat Res Corp | Method of producing metals by decomposition of halides |
US2686865A (en) * | 1951-10-20 | 1954-08-17 | Westinghouse Electric Corp | Stabilizing molten material during magnetic levitation and heating thereof |
US2785058A (en) * | 1952-04-28 | 1957-03-12 | Bell Telephone Labor Inc | Method of growing quartz crystals |
US2719799A (en) * | 1952-11-13 | 1955-10-04 | Rca Corp | Zone melting furnace and method of zone melting |
US2872299A (en) * | 1954-11-30 | 1959-02-03 | Rca Corp | Preparation of reactive materials in a molten non-reactive lined crucible |
US2836412A (en) * | 1955-08-22 | 1958-05-27 | Titanium Metals Corp | Arc melting crucible |
US2880117A (en) * | 1956-01-20 | 1959-03-31 | Electronique & Automatisme Sa | Method of manufacturing semiconducting materials |
US2870309A (en) * | 1957-06-11 | 1959-01-20 | Emil R Capita | Zone purification device |
US2897329A (en) * | 1957-09-23 | 1959-07-28 | Sylvania Electric Prod | Zone melting apparatus |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3796548A (en) * | 1971-09-13 | 1974-03-12 | Ibm | Boat structure in an apparatus for making semiconductor compound single crystals |
Also Published As
Publication number | Publication date |
---|---|
DE1164982B (de) | 1964-03-12 |
DE1293934B (de) | 1969-04-30 |
NL225605A (en)) | 1900-01-01 |
NL233434A (en)) | 1900-01-01 |
DE1191970B (de) | 1965-04-29 |
DE1226539B (de) | 1966-10-13 |
GB889615A (en) | 1962-02-21 |
BE565404A (en)) | 1958-09-05 |
FR1192712A (fr) | 1959-10-28 |
CH416572A (de) | 1966-07-15 |
NL236919A (en)) | 1900-01-01 |
CH435757A (de) | 1967-05-15 |
CH385794A (de) | 1964-12-31 |
NL239559A (en)) | 1900-01-01 |
NL113928C (en)) | 1900-01-01 |
NL237042A (en)) | 1900-01-01 |
NL114078C (en)) | 1900-01-01 |
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