US20220106688A1 - ELECTROLESS Ni-Fe ALLOY PLATING SOLUTION - Google Patents
ELECTROLESS Ni-Fe ALLOY PLATING SOLUTION Download PDFInfo
- Publication number
- US20220106688A1 US20220106688A1 US17/422,557 US201917422557A US2022106688A1 US 20220106688 A1 US20220106688 A1 US 20220106688A1 US 201917422557 A US201917422557 A US 201917422557A US 2022106688 A1 US2022106688 A1 US 2022106688A1
- Authority
- US
- United States
- Prior art keywords
- electroless
- alloy plating
- acid
- nickel
- mol
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 238000007747 plating Methods 0.000 title claims abstract description 310
- 229910003271 Ni-Fe Inorganic materials 0.000 title claims abstract description 192
- 229910045601 alloy Inorganic materials 0.000 title claims abstract description 189
- 239000000956 alloy Substances 0.000 title claims abstract description 189
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims abstract description 107
- VTLYFUHAOXGGBS-UHFFFAOYSA-N Fe3+ Chemical compound [Fe+3] VTLYFUHAOXGGBS-UHFFFAOYSA-N 0.000 claims abstract description 77
- 229910001447 ferric ion Inorganic materials 0.000 claims abstract description 77
- 239000008139 complexing agent Substances 0.000 claims abstract description 71
- 229910001453 nickel ion Inorganic materials 0.000 claims abstract description 62
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims abstract description 59
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 claims abstract description 58
- 229910001448 ferrous ion Inorganic materials 0.000 claims abstract description 49
- 239000003638 chemical reducing agent Substances 0.000 claims abstract description 24
- 229910052742 iron Inorganic materials 0.000 claims abstract description 22
- -1 iron ion Chemical class 0.000 claims abstract description 18
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 claims abstract description 15
- RUTXIHLAWFEWGM-UHFFFAOYSA-H iron(3+) sulfate Chemical compound [Fe+3].[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O RUTXIHLAWFEWGM-UHFFFAOYSA-H 0.000 claims abstract description 10
- 229910000360 iron(III) sulfate Inorganic materials 0.000 claims abstract description 10
- 229910021578 Iron(III) chloride Inorganic materials 0.000 claims abstract description 8
- LCPUDZUWZDSKMX-UHFFFAOYSA-K azane;hydrogen sulfate;iron(3+);sulfate;dodecahydrate Chemical compound [NH4+].O.O.O.O.O.O.O.O.O.O.O.O.[Fe+3].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O LCPUDZUWZDSKMX-UHFFFAOYSA-K 0.000 claims abstract description 4
- MSNWSDPPULHLDL-UHFFFAOYSA-K ferric hydroxide Chemical compound [OH-].[OH-].[OH-].[Fe+3] MSNWSDPPULHLDL-UHFFFAOYSA-K 0.000 claims abstract description 4
- 159000000014 iron salts Chemical class 0.000 claims abstract description 4
- LIKBJVNGSGBSGK-UHFFFAOYSA-N iron(3+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Fe+3].[Fe+3] LIKBJVNGSGBSGK-UHFFFAOYSA-N 0.000 claims abstract description 4
- JEIPFZHSYJVQDO-UHFFFAOYSA-N iron(III) oxide Inorganic materials O=[Fe]O[Fe]=O JEIPFZHSYJVQDO-UHFFFAOYSA-N 0.000 claims abstract description 4
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 claims description 23
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 claims description 21
- QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 claims description 19
- 235000004279 alanine Nutrition 0.000 claims description 19
- DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 claims description 18
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 claims description 18
- ACVYVLVWPXVTIT-UHFFFAOYSA-M phosphinate Chemical compound [O-][PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-M 0.000 claims description 16
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 claims description 15
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 12
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 claims description 12
- DBVJJBKOTRCVKF-UHFFFAOYSA-N Etidronic acid Chemical compound OP(=O)(O)C(O)(C)P(O)(O)=O DBVJJBKOTRCVKF-UHFFFAOYSA-N 0.000 claims description 11
- FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 claims description 10
- 239000004471 Glycine Substances 0.000 claims description 9
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 claims description 9
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 claims description 9
- WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 claims description 8
- 235000013922 glutamic acid Nutrition 0.000 claims description 8
- 239000004220 glutamic acid Substances 0.000 claims description 8
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 claims description 8
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 claims description 7
- CIWBSHSKHKDKBQ-JLAZNSOCSA-N Ascorbic acid Chemical compound OC[C@H](O)[C@H]1OC(=O)C(O)=C1O CIWBSHSKHKDKBQ-JLAZNSOCSA-N 0.000 claims description 6
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 claims description 6
- RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 claims description 6
- VZCYOOQTPOCHFL-OWOJBTEDSA-N Fumaric acid Chemical compound OC(=O)\C=C\C(O)=O VZCYOOQTPOCHFL-OWOJBTEDSA-N 0.000 claims description 6
- OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 6
- WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 claims description 6
- LCTONWCANYUPML-UHFFFAOYSA-N Pyruvic acid Chemical compound CC(=O)C(O)=O LCTONWCANYUPML-UHFFFAOYSA-N 0.000 claims description 6
- 229910021529 ammonia Inorganic materials 0.000 claims description 6
- 235000015165 citric acid Nutrition 0.000 claims description 6
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 claims description 5
- PIICEJLVQHRZGT-UHFFFAOYSA-N Ethylenediamine Chemical compound NCCN PIICEJLVQHRZGT-UHFFFAOYSA-N 0.000 claims description 5
- 235000011054 acetic acid Nutrition 0.000 claims description 5
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 claims description 5
- 239000001630 malic acid Substances 0.000 claims description 5
- 235000011090 malic acid Nutrition 0.000 claims description 5
- 239000004475 Arginine Substances 0.000 claims description 4
- ODKSFYDXXFIFQN-BYPYZUCNSA-P L-argininium(2+) Chemical compound NC(=[NH2+])NCCC[C@H]([NH3+])C(O)=O ODKSFYDXXFIFQN-BYPYZUCNSA-P 0.000 claims description 4
- FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 claims description 4
- ODKSFYDXXFIFQN-UHFFFAOYSA-N arginine Natural products OC(=O)C(N)CCCNC(N)=N ODKSFYDXXFIFQN-UHFFFAOYSA-N 0.000 claims description 4
- WJRBRSLFGCUECM-UHFFFAOYSA-N hydantoin Chemical compound O=C1CNC(=O)N1 WJRBRSLFGCUECM-UHFFFAOYSA-N 0.000 claims description 4
- 229940091173 hydantoin Drugs 0.000 claims description 4
- 239000004310 lactic acid Substances 0.000 claims description 4
- 235000014655 lactic acid Nutrition 0.000 claims description 4
- KERTUBUCQCSNJU-UHFFFAOYSA-L nickel(2+);disulfamate Chemical compound [Ni+2].NS([O-])(=O)=O.NS([O-])(=O)=O KERTUBUCQCSNJU-UHFFFAOYSA-L 0.000 claims description 4
- 235000006408 oxalic acid Nutrition 0.000 claims description 4
- ACVYVLVWPXVTIT-UHFFFAOYSA-N phosphinic acid Chemical compound O[PH2]=O ACVYVLVWPXVTIT-UHFFFAOYSA-N 0.000 claims description 4
- 150000003839 salts Chemical class 0.000 claims description 4
- 239000011975 tartaric acid Substances 0.000 claims description 4
- 235000002906 tartaric acid Nutrition 0.000 claims description 4
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 claims description 3
- HZAXFHJVJLSVMW-UHFFFAOYSA-N 2-Aminoethan-1-ol Chemical compound NCCO HZAXFHJVJLSVMW-UHFFFAOYSA-N 0.000 claims description 3
- UPPLJLAHMKABPR-UHFFFAOYSA-H 2-hydroxypropane-1,2,3-tricarboxylate;nickel(2+) Chemical compound [Ni+2].[Ni+2].[Ni+2].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O.[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O UPPLJLAHMKABPR-UHFFFAOYSA-H 0.000 claims description 3
- XXSPKSHUSWQAIZ-UHFFFAOYSA-L 36026-88-7 Chemical compound [Ni+2].[O-]P=O.[O-]P=O XXSPKSHUSWQAIZ-UHFFFAOYSA-L 0.000 claims description 3
- RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 claims description 3
- GSEJCLTVZPLZKY-UHFFFAOYSA-N Triethanolamine Chemical compound OCCN(CCO)CCO GSEJCLTVZPLZKY-UHFFFAOYSA-N 0.000 claims description 3
- MQRWBMAEBQOWAF-UHFFFAOYSA-N acetic acid;nickel Chemical compound [Ni].CC(O)=O.CC(O)=O MQRWBMAEBQOWAF-UHFFFAOYSA-N 0.000 claims description 3
- 235000010323 ascorbic acid Nutrition 0.000 claims description 3
- 239000011668 ascorbic acid Substances 0.000 claims description 3
- 229960005070 ascorbic acid Drugs 0.000 claims description 3
- RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 claims description 3
- KDYFGRWQOYBRFD-NUQCWPJISA-N butanedioic acid Chemical compound O[14C](=O)CC[14C](O)=O KDYFGRWQOYBRFD-NUQCWPJISA-N 0.000 claims description 3
- XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 claims description 3
- 239000001530 fumaric acid Substances 0.000 claims description 3
- 239000000174 gluconic acid Substances 0.000 claims description 3
- 235000012208 gluconic acid Nutrition 0.000 claims description 3
- 150000002815 nickel Chemical class 0.000 claims description 3
- 229940078494 nickel acetate Drugs 0.000 claims description 3
- 229910000008 nickel(II) carbonate Inorganic materials 0.000 claims description 3
- ZULUUIKRFGGGTL-UHFFFAOYSA-L nickel(ii) carbonate Chemical compound [Ni+2].[O-]C([O-])=O ZULUUIKRFGGGTL-UHFFFAOYSA-L 0.000 claims description 3
- 229940005657 pyrophosphoric acid Drugs 0.000 claims description 3
- 229940107700 pyruvic acid Drugs 0.000 claims description 3
- CMWCOKOTCLFJOP-UHFFFAOYSA-N titanium(3+) Chemical compound [Ti+3] CMWCOKOTCLFJOP-UHFFFAOYSA-N 0.000 claims description 3
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 claims description 3
- 238000000151 deposition Methods 0.000 description 77
- 230000008021 deposition Effects 0.000 description 77
- 238000000576 coating method Methods 0.000 description 53
- 239000011248 coating agent Substances 0.000 description 52
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 42
- 229910052708 sodium Inorganic materials 0.000 description 35
- 239000011734 sodium Substances 0.000 description 35
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 34
- 238000000034 method Methods 0.000 description 34
- 239000003795 chemical substances by application Substances 0.000 description 33
- 230000008569 process Effects 0.000 description 27
- 239000000203 mixture Substances 0.000 description 24
- 239000003381 stabilizer Substances 0.000 description 24
- 239000003002 pH adjusting agent Substances 0.000 description 19
- 230000000536 complexating effect Effects 0.000 description 18
- 229910052759 nickel Inorganic materials 0.000 description 18
- 238000006243 chemical reaction Methods 0.000 description 16
- 239000006174 pH buffer Substances 0.000 description 16
- 230000001603 reducing effect Effects 0.000 description 15
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 14
- LJCNRYVRMXRIQR-OLXYHTOASA-L potassium sodium L-tartrate Chemical compound [Na+].[K+].[O-]C(=O)[C@H](O)[C@@H](O)C([O-])=O LJCNRYVRMXRIQR-OLXYHTOASA-L 0.000 description 14
- TVDSBUOJIPERQY-UHFFFAOYSA-N prop-2-yn-1-ol Chemical compound OCC#C TVDSBUOJIPERQY-UHFFFAOYSA-N 0.000 description 14
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 14
- 235000011006 sodium potassium tartrate Nutrition 0.000 description 14
- GDTSJMKGXGJFGQ-UHFFFAOYSA-N 3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound O1B([O-])OB2OB([O-])OB1O2 GDTSJMKGXGJFGQ-UHFFFAOYSA-N 0.000 description 12
- 229910017343 Fe2 (SO4)3 Inorganic materials 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 11
- AZUYLZMQTIKGSC-UHFFFAOYSA-N 1-[6-[4-(5-chloro-6-methyl-1H-indazol-4-yl)-5-methyl-3-(1-methylindazol-5-yl)pyrazol-1-yl]-2-azaspiro[3.3]heptan-2-yl]prop-2-en-1-one Chemical compound ClC=1C(=C2C=NNC2=CC=1C)C=1C(=NN(C=1C)C1CC2(CN(C2)C(C=C)=O)C1)C=1C=C2C=NN(C2=CC=1)C AZUYLZMQTIKGSC-UHFFFAOYSA-N 0.000 description 10
- VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 10
- 230000007423 decrease Effects 0.000 description 7
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 7
- 229910052797 bismuth Inorganic materials 0.000 description 6
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 description 6
- 229940095064 tartrate Drugs 0.000 description 6
- XOAAWQZATWQOTB-UHFFFAOYSA-N taurine Chemical compound NCCS(O)(=O)=O XOAAWQZATWQOTB-UHFFFAOYSA-N 0.000 description 6
- 230000000052 comparative effect Effects 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 4
- 229910052787 antimony Inorganic materials 0.000 description 4
- 230000008859 change Effects 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 239000001509 sodium citrate Substances 0.000 description 4
- HRXKRNGNAMMEHJ-UHFFFAOYSA-K trisodium citrate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O HRXKRNGNAMMEHJ-UHFFFAOYSA-K 0.000 description 4
- 235000019263 trisodium citrate Nutrition 0.000 description 4
- 229940038773 trisodium citrate Drugs 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- AEQDJSLRWYMAQI-UHFFFAOYSA-N 2,3,9,10-tetramethoxy-6,8,13,13a-tetrahydro-5H-isoquinolino[2,1-b]isoquinoline Chemical compound C1CN2CC(C(=C(OC)C=C3)OC)=C3CC2C2=C1C=C(OC)C(OC)=C2 AEQDJSLRWYMAQI-UHFFFAOYSA-N 0.000 description 3
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 3
- WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 3
- 238000007664 blowing Methods 0.000 description 3
- 238000000354 decomposition reaction Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000007772 electroless plating Methods 0.000 description 3
- 229910000889 permalloy Inorganic materials 0.000 description 3
- 230000035699 permeability Effects 0.000 description 3
- 229940098424 potassium pyrophosphate Drugs 0.000 description 3
- 238000001556 precipitation Methods 0.000 description 3
- 239000000176 sodium gluconate Substances 0.000 description 3
- 229940005574 sodium gluconate Drugs 0.000 description 3
- 235000012207 sodium gluconate Nutrition 0.000 description 3
- VGTPCRGMBIAPIM-UHFFFAOYSA-M sodium thiocyanate Chemical compound [Na+].[S-]C#N VGTPCRGMBIAPIM-UHFFFAOYSA-M 0.000 description 3
- LIBWRRJGKWQFSD-UHFFFAOYSA-M sodium;2-nitrobenzenesulfonate Chemical compound [Na+].[O-][N+](=O)C1=CC=CC=C1S([O-])(=O)=O LIBWRRJGKWQFSD-UHFFFAOYSA-M 0.000 description 3
- 229960003080 taurine Drugs 0.000 description 3
- RYCLIXPGLDDLTM-UHFFFAOYSA-J tetrapotassium;phosphonato phosphate Chemical compound [K+].[K+].[K+].[K+].[O-]P([O-])(=O)OP([O-])([O-])=O RYCLIXPGLDDLTM-UHFFFAOYSA-J 0.000 description 3
- SOBHUZYZLFQYFK-UHFFFAOYSA-K trisodium;hydroxy-[[phosphonatomethyl(phosphonomethyl)amino]methyl]phosphinate Chemical compound [Na+].[Na+].[Na+].OP(O)(=O)CN(CP(O)([O-])=O)CP([O-])([O-])=O SOBHUZYZLFQYFK-UHFFFAOYSA-K 0.000 description 3
- 229910052720 vanadium Inorganic materials 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
- KRKNYBCHXYNGOX-UHFFFAOYSA-K Citrate Chemical compound [O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O KRKNYBCHXYNGOX-UHFFFAOYSA-K 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- GJYJYFHBOBUTBY-UHFFFAOYSA-N alpha-camphorene Chemical compound CC(C)=CCCC(=C)C1CCC(CCC=C(C)C)=CC1 GJYJYFHBOBUTBY-UHFFFAOYSA-N 0.000 description 2
- 235000011114 ammonium hydroxide Nutrition 0.000 description 2
- 235000009697 arginine Nutrition 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229940050410 gluconate Drugs 0.000 description 2
- HHLFWLYXYJOTON-UHFFFAOYSA-N glyoxylic acid Chemical compound OC(=O)C=O HHLFWLYXYJOTON-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 2
- 229910019931 (NH4)2Fe(SO4)2 Inorganic materials 0.000 description 1
- USFZMSVCRYTOJT-UHFFFAOYSA-N Ammonium acetate Chemical compound N.CC(O)=O USFZMSVCRYTOJT-UHFFFAOYSA-N 0.000 description 1
- 239000005695 Ammonium acetate Substances 0.000 description 1
- 208000035404 Autolysis Diseases 0.000 description 1
- 206010057248 Cell death Diseases 0.000 description 1
- RGHNJXZEOKUKBD-SQOUGZDYSA-M D-gluconate Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C([O-])=O RGHNJXZEOKUKBD-SQOUGZDYSA-M 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 235000019257 ammonium acetate Nutrition 0.000 description 1
- 229940043376 ammonium acetate Drugs 0.000 description 1
- 239000000908 ammonium hydroxide Substances 0.000 description 1
- BFNBIHQBYMNNAN-UHFFFAOYSA-N ammonium sulfate Chemical compound N.N.OS(O)(=O)=O BFNBIHQBYMNNAN-UHFFFAOYSA-N 0.000 description 1
- 229910052921 ammonium sulfate Inorganic materials 0.000 description 1
- 235000011130 ammonium sulphate Nutrition 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- NGPGDYLVALNKEG-UHFFFAOYSA-N azanium;azane;2,3,4-trihydroxy-4-oxobutanoate Chemical compound [NH4+].[NH4+].[O-]C(=O)C(O)C(O)C([O-])=O NGPGDYLVALNKEG-UHFFFAOYSA-N 0.000 description 1
- 229910000085 borane Inorganic materials 0.000 description 1
- 229910021538 borax Inorganic materials 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- YJROYUJAFGZMJA-UHFFFAOYSA-N boron;morpholine Chemical compound [B].C1COCCN1 YJROYUJAFGZMJA-UHFFFAOYSA-N 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000005237 degreasing agent Methods 0.000 description 1
- 239000013527 degreasing agent Substances 0.000 description 1
- YPTUAQWMBNZZRN-UHFFFAOYSA-N dimethylaminoboron Chemical compound [B]N(C)C YPTUAQWMBNZZRN-UHFFFAOYSA-N 0.000 description 1
- 235000011180 diphosphates Nutrition 0.000 description 1
- UQGFMSUEHSUPRD-UHFFFAOYSA-N disodium;3,7-dioxido-2,4,6,8,9-pentaoxa-1,3,5,7-tetraborabicyclo[3.3.1]nonane Chemical compound [Na+].[Na+].O1B([O-])OB2OB([O-])OB1O2 UQGFMSUEHSUPRD-UHFFFAOYSA-N 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 229940071106 ethylenediaminetetraacetate Drugs 0.000 description 1
- 229960004585 etidronic acid Drugs 0.000 description 1
- IMBKASBLAKCLEM-UHFFFAOYSA-L ferrous ammonium sulfate (anhydrous) Chemical compound [NH4+].[NH4+].[Fe+2].[O-]S([O-])(=O)=O.[O-]S([O-])(=O)=O IMBKASBLAKCLEM-UHFFFAOYSA-L 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- ZMZDMBWJUHKJPS-UHFFFAOYSA-N hydrogen thiocyanate Natural products SC#N ZMZDMBWJUHKJPS-UHFFFAOYSA-N 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000005764 inhibitory process Effects 0.000 description 1
- FBAFATDZDUQKNH-UHFFFAOYSA-M iron chloride Chemical compound [Cl-].[Fe] FBAFATDZDUQKNH-UHFFFAOYSA-M 0.000 description 1
- 229910000358 iron sulfate Inorganic materials 0.000 description 1
- BAUYGSIQEAFULO-UHFFFAOYSA-L iron(2+) sulfate (anhydrous) Chemical compound [Fe+2].[O-]S([O-])(=O)=O BAUYGSIQEAFULO-UHFFFAOYSA-L 0.000 description 1
- SQZYOZWYVFYNFV-UHFFFAOYSA-L iron(2+);disulfamate Chemical compound [Fe+2].NS([O-])(=O)=O.NS([O-])(=O)=O SQZYOZWYVFYNFV-UHFFFAOYSA-L 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 239000011591 potassium Substances 0.000 description 1
- 229910001380 potassium hypophosphite Inorganic materials 0.000 description 1
- CRGPNLUFHHUKCM-UHFFFAOYSA-M potassium phosphinate Chemical compound [K+].[O-]P=O CRGPNLUFHHUKCM-UHFFFAOYSA-M 0.000 description 1
- 229940048084 pyrophosphate Drugs 0.000 description 1
- 238000004445 quantitative analysis Methods 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000005096 rolling process Methods 0.000 description 1
- 230000028043 self proteolysis Effects 0.000 description 1
- 229910000029 sodium carbonate Inorganic materials 0.000 description 1
- 239000004328 sodium tetraborate Substances 0.000 description 1
- 235000010339 sodium tetraborate Nutrition 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- LESFYQKBUCDEQP-UHFFFAOYSA-N tetraazanium;2-[2-[bis(carboxylatomethyl)amino]ethyl-(carboxylatomethyl)amino]acetate Chemical compound N.N.N.N.OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O LESFYQKBUCDEQP-UHFFFAOYSA-N 0.000 description 1
- YWYZEGXAUVWDED-UHFFFAOYSA-N triammonium citrate Chemical compound [NH4+].[NH4+].[NH4+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O YWYZEGXAUVWDED-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/48—Coating with alloys
- C23C18/50—Coating with alloys with alloys based on iron, cobalt or nickel
Definitions
- the present invention relates to an electroless Ni—Fe alloy plating solution.
- Ni—Fe alloys containing 35 to 80% by mass of Ni have high magnetic permeability and thus are used for applications such as magnetic field shielding materials, magnetic heads and wound magnetic cores.
- Ni—Fe alloys containing about 20% by mass of Fe are called PC permalloy and known as an excellent magnetic field shielding material having the highest magnetic permeability among the Ni—Fe alloys.
- Known methods for producing Ni—Fe alloy coating include rolling, sputtering, electroplating and electroless plating. Electroless plating is advantageous in that it is inexpensive, provides coating having uniform film thickness and excellent corrosion resistance and abrasion resistance, and can form coating on the surface of various types of materials.
- Patent Literature 1 discloses an electroless Ni—Fe alloy plating solution containing any of nickel sulfamate, nickel chloride and nickel sulfate as a nickel ion source, any of iron sulfamate, iron chloride and iron sulfate as an iron ion source and any of glycine, tartaric acid, malic acid, citric acid, ammonium tartrate, ammonium citrate, ammonium acetate and acetic acid as a complexing agent and any of dimethylaminoborane, morpholineborane, glyoxylic acid and ammonium hypophosphite as a reducing agent.
- Patent Literatures 2 and 3 and Non-patent literature 1 disclose an electroless Ni
- the iron ion sources in the electroless Ni—Fe alloy plating solutions disclosed in Patent Literatures 1 to 3 and Non-patent literature 1 are all a ferrous ion source which provides ferrous ions (divalent iron ions, Fe 2+ ).
- these electroless Ni—Fe alloy plating solutions contain a nickel complex and a ferrous (II) complex at the time of the initial make-up of plating bath.
- nickel complex and free nickel ions which do not form a complex are referred to as a “nickel ion” without distinction unless otherwise required.
- a ferrous (II) complex and free divalent iron ions which do not form a complex are referred to as a “ferrous ion” without distinction
- a ferric (III) complex and free trivalent iron ions which do not form a complex are referred to as a “ferric ion” without distinction.
- Patent Literature 1 Japanese Patent Application; Japanese Translation of PCT International Application Publication No. 2007-512430
- Patent Literature 2 Japanese Patent Application; Japanese Patent Laid-Open No. 2010-59512
- Patent Literature 3 Japanese Patent Application; Japanese Patent Laid-Open No. H07-66034
- Non Patent Literature 1 Takiguchi Masanori, “Applications of electroless permalloy plating for EMI shielding,” Journal of the Surface Finishing Society of Japan, the Surface Finishing Society of Japan, Oct. 30, 2009, Volume 40, Issue 1, pp. 40-41
- an object of the present invention is to provide an electroless Ni—Fe alloy plating solution with which continuous plating can be carried out in a stable manner.
- the present inventors have conducted intensive studies on the disadvantage of difficulty in continuous plating with conventional electroless Ni—Fe alloy plating solutions, and have arrived at the following invention.
- the electroless Ni—Fe alloy plating solution of the present invention is an electroless Ni—Fe alloy plating solution comprising a nickel ion source, an iron ion source, a complexing agent and a reducing agent, wherein the iron ion source is a ferric ion source.
- the ferric ion source be one or two or more iron salts selected from the group consisting of iron (III) sulfate, iron (III) chloride, iron alum, iron (III) oxide and iron (III) hydroxide.
- the content of the ferric ion be 0.001 to 1.0 mol/L at the time of the initial make-up of plating bath.
- the content of the ferrous ion be 0.1 mol/L or less at the time of the initial make-up of plating bath.
- the nickel ion source be one or two or more nickel salts selected from the group consisting of nickel chloride, nickel sulfate, nickel sulfamate, nickel hypophosphite, nickel citrate, nickel carbonate and nickel acetate.
- the complexing agent be one or two or more complexing agents selected from the group consisting of tartaric acid, citric acid, gluconic acid, pyrophosphoric acid, etidronic acid, alanine, glycine, glutamic acid, hydantoin, arginine, acetic acid, succinic acid, ascorbic acid, butyric acid, fumaric acid, pyruvic acid, lactic acid, malic acid, oxalic acid, ammonia, monoethanolamine, triethylenetetramine, triethanolamine, ethylenediamine, ethylenediaminetetraacetic acid and a salt thereof.
- the reducing agent be one or two or more reducing agents selected from the group consisting of hypophosphorous acid, hypophosphite, dimethylamineborane, titanium (III) and hydrazine.
- the electroless Ni—Fe alloy plating solution of the present invention contains a nickel complex and a ferric (III) complex at the time of the initial make-up of plating bath. Part of the ferric ions in the electroless Ni—Fe alloy plating solution sometimes change to a ferrous ion. The ferrous ion does not inhibit the deposition reaction of Ni—Fe alloy from nickel ions and ferric ions. Thus, with the electroless Ni—Fe alloy plating solution, reduction of the deposition rate of Ni-Fe alloy can be suppressed even when the amount of ferrous ions is increased when continuous plating is performed. In other words, continuous plating can be performed in a stable manner when the electroless Ni—Fe alloy plating solution is used.
- FIG. 1 is a graph showing the relation among the number of times of plating, the deposition rate and the content of Fe in coating when continuous plating is performed using a conventional electroless Ni—Fe alloy plating solution.
- FIG. 2 is a graph showing the relation between the time of blowing air and the concentration of ferrous ions when air is blown into a conventional electroless Ni—Fe alloy plating solution.
- FIG. 3 is a graph showing the relation among the concentration of ferric ions, the deposition rate and the content of Fe in coating in a conventional electroless Ni—Fe alloy plating solution.
- FIG. 4 is a graph showing the relation among the number of times of plating, the deposition rate and the content of Fe in coating when continuous plating is performed using the electroless Ni—Fe alloy plating solution of Example 1a.
- FIG. 5 is a graph showing the relation among the concentration of ferrous ions, the deposition rate and the content of Fe in coating in the electroless Ni—Fe alloy plating solutions of Examples 2a to 2e.
- a plating solution having the composition shown in Table 1 was prepared as a conventional electroless Ni—Fe alloy plating solution (referred to as “Comparative Example 1”).
- Ferrous ammonium sulfate was used as the ferrous ion source.
- continuous plating was performed using the above electroless Ni—Fe alloy plating solution. More specifically, the continuous plating was performed as follows. First, a plating process was previously performed using the electroless Ni—Fe alloy plating solution for 30 minutes, and the concentration of the nickel ion, the ferrous ion and sodium hypophosphite, and the pH were measured before and after the plating process. Then, the amount of the components constituting the plating bath consumed per plating process was calculated. Subsequently, a procedure was repeated, including performing an actual plating process for 30 minutes, replenishing the components constituting the plating bath in an amount corresponding to the above amount consumed and performing a plating process again. The bath volume was 1 L, and the bath load was 1 dm 2 /L.
- FIG. 1 (a graph showing the relation among the “number of times of plating”, the “deposition rate” and the “content of Fe in the coating”).
- the horizontal axis of FIG. 1 shows the number of times of plating
- the left vertical axis shows the deposition rate
- the right vertical axis shows the content of Fe in the coating.
- the content of Fe in the coating is the total amount of Fe detected in the coating.
- the form of Fe in the coating is not distinguished.
- FIG. 2 a graph showing the relation between the “time of blowing air” and the “concentration of ferrous ions (Fe 2+ )”).
- FIG. 2 shows that as the time of blowing air becomes longer, the concentration of the ferrous ion in the electroless Ni—Fe alloy plating solution decreases. This suggests that part of the ferrous ions is changed to ferric ions due to dissolved oxygen.
- FIG. 3 a graph showing the relation between the “concentration of ferric ions (Fe 3+ ) in the electroless Ni—Fe alloy plating solution” and the “deposition rate”).
- FIG. 3 shows that as the amount of ferric ions in the electroless Ni—Fe alloy plating solution becomes larger, the deposition rate significantly decreases. In other words, the results suggest that ferric ions in the electroless Ni—Fe alloy plating solution inhibited the deposition reaction of Ni-Fe alloy from nickel ions and ferrous ions.
- the present inventors conducted further intensive studies and as a result have arrived at using ferric ions (Fe 3+ ) instead of ferrous ions (Fe 2+ ) in the deposition reaction of Ni—Fe alloy.
- the inventors then found that continuous plating can be performed in a stable manner using an electroless Ni—Fe alloy plating solution containing a nickel ion source and a ferric ion source. Based on this technical idea, the inventors have arrived at the present invention described below.
- the electroless Ni—Fe alloy plating solution of the present embodiment comprises a nickel ion source, an iron ion source, a complexing agent and a reducing agent, wherein the iron ion source is a ferric ion source, and nickel ions and ferric ions are used for the deposition reaction of a Ni—Fe alloy.
- the electroless Ni—Fe alloy plating solution is used, a Ni—Fe alloy coating in which the content of Ni is 65 to 99% by mass and the content of Fe is 1 to 35% by mass can be obtained.
- the electroless Ni—Fe alloy plating solution of the present invention contains a nickel ion source.
- Nickel ions supplied from the nickel ion source occurs mainly as a nickel complex in the electroless Ni—Fe alloy plating solution.
- the nickel ion source include one or two or more nickel salts selected from the group consisting of nickel chloride, nickel sulfate, nickel sulfamate, nickel hypophosphite, nickel citrate, nickel carbonate and nickel acetate.
- Nickel sulfate and nickel chloride are particularly preferred as the nickel ion source because they are highly soluble and provides stable deposition rates.
- the electroless Ni—Fe alloy plating solution contains the nickel ion source at preferably 0.001 to 1.0 mol/L, and more preferably 0.001 to 0.1 mol/L in terms of nickel.
- a content of the nickel ion source of less than 0.001 mol/L at the time of the initial make-up of plating bath is not preferred because the deposition rate of Ni-Fe alloy coating may excessively decrease.
- a content of the nickel ion source of more than 0.1 mol/L is not preferred because the content of Fe in the coating becomes lower than that in the intended composition and a coating having good surface properties cannot be obtained.
- the electroless Ni—Fe alloy plating solution of the present invention comprises a ferric ion source as an iron ion source.
- the ferric ion source supplies ferric ions (trivalent iron ion, Fe 3+ ), and is different from the ferrous ion source which has been used in conventional electroless Ni—Fe alloy plating solutions.
- the ferric ion supplied from the ferric ion source occurs mainly as a ferric (III) complex in the electroless Ni—Fe alloy plating solution.
- the ferric ion source include one or two or more iron salts selected from the group consisting of iron (III) sulfate, iron (III) chloride, iron alum, iron (III) oxide and iron (III) hydroxide. Iron (III) sulfate and iron (III) chloride are particularly preferred as the ferric ion source because they are highly soluble in plating bath and provide stable deposition rates.
- the electroless Ni—Fe alloy plating solution contains the ferrous ion source at preferably 0.001 to 1.0 mol/L, and more preferably 0.001 to 0.1 mol/L in terms of iron.
- a content of the ferric ion source of less than 0.001 mol/L at the time of the initial make-up of plating bath is not preferred because a Ni—Fe alloy coating in which the content of Fe is 1 to 35% by mass cannot be obtained, or because the deposition rate of Ni-Fe alloy coating may excessively decrease.
- a content of the ferric ion source of more than 0.1 mol/L is not preferred because deposition reaction may be inhibited and no coating may be formed.
- the ferric ion in the electroless Ni—Fe alloy plating solution is reduced by the action of the reducing agent described later, and part of the ferric ions is changed to ferrous ions.
- the content of the ferrous ion in the electroless Ni—Fe alloy plating solution at the time of the initial make-up of plating bath be 0.1 mol/L or less.
- a content of the ferrous ion at the time of the initial make-up of plating bath of more than 0.1 mol/ L is not preferred because the deposition reaction of Ni—Fe alloy from nickel ions and ferric ions may be inhibited.
- the electroless Ni—Fe alloy plating solution of the present invention contains, as a complexing agent, one or two or more selected from the group consisting of tartaric acid, citric acid, gluconic acid, pyrophosphoric acid, etidronic acid (1-hydroxyethane-1,1-diphosphonic acid, sodium salt, HEDP), alanine, glycine, glutamic acid, hydantoin, arginine, acetic acid, succinic acid, ascorbic acid, butyric acid, fumaric acid, pyruvic acid, lactic acid, malic acid, oxalic acid, ammonia, monoethanolamine, triethylenetetramine, triethanolamine, ethylenediamine (EDA), ethylenediaminetetraacetic acid (EDTA) and a salt thereof.
- a complexing agent one or two or more selected from the group consisting of tartaric acid, citric acid, gluconic acid, pyrophosphoric acid, et
- two or more complexing agents be used from the viewpoint of formation of a more stable complex and suppression of precipitation.
- the salts of ethylenediaminetetraacetic acid include tetraammonium ethylenediaminetetraacetate.
- a complexing agent capable of forming a stable complex with a nickel ion and a ferric ion. It is preferable to use one or more selected from the group consisting of alanine, glycine, glutamic acid, hydantoin, arginine, ethylenediamine, ethylenediaminetetraacetic acid and ethylenediaminetetraacetate as a first complexing agent suitable for forming a nickel complex.
- the first complexing agent is coordinated with a nickel ion and can form a stable nickel complex.
- a second complexing agent suitable for forming a ferric (III) complex it is preferable to use one or more selected from the group consisting of Rochelle salt, trisodium citrate, sodium gluconate, potassium pyrophosphate, etidronic acid, lactic acid, malic acid, acetic acid and oxalic acid as a second complexing agent suitable for forming a ferric (III) complex.
- the second complexing agent is coordinated with a ferric ion and can form a stable ferric (III) complex.
- a combination using alanine as the first complexing agent and Rochelle salt as the second complexing agent, and a combination using ammonia as the first complexing agent and citric acid and/or Rochelle salt as the second complexing agent are particularly preferred from the viewpoint of, for example, bath stability, suitable deposition rates and stability of content of Fe in coating.
- One of the first complexing agents and one of the second complexing agents may be used, respectively, and two or more of them may be used, and the latter case provides an effect of, for example, preventing precipitation.
- the preferred content of the complexing agent in the electroless Ni—Fe alloy plating solution at the time of the initial make-up of plating bath is related to not only the type of complexing agents but also the content of the nickel ion source and the ferric ion source.
- nickel sulfate or nickel chloride is used as the nickel ion source and its content is 0.06 mol/L in terms of nickel
- iron (III) sulfate is used as the ferric ion source and its content is 0.02 mol/L in terms of iron
- alanine is used as the first complexing agent and Rochelle salt is used as the second complexing agent
- ammonia is used as the first complexing agent and citric acid and/or Rochelle salt is used as the second complexing agent
- the content of the first complexing agent is preferably 0.04 to 0.5 mol/L
- the content of the second complexing agent is preferably 0.12 to 0.5 mol/L.
- a content of the respective complexing agents of less than the lower limit of the above range is not preferred because formation of a complex is insufficient, and nickel or iron is likely to be precipitated.
- a content of the respective complexing agents of more than the upper limit of the above range is not preferred because not only a significant effect cannot be obtained but also the resource is wasted.
- the electroless Ni—Fe alloy plating solution of the present invention contains one or two or more selected from the group consisting of hypophosphorous acid, hypophosphite, dimethylamineborane, titanium (III) and hydrazine as a reducing agent.
- hypophosphites include sodium hypophosphite, potassium hypophosphite and ammonium hypophosphite.
- Sodium hypophosphite is particularly preferred as the reducing agent because little autolysis occurs and thus controlling its concentration is easy.
- a Ni—Fe alloy containing phosphorus derived from sodium hypophosphite Ni—Fe—P alloy
- the preferred content of the reducing agent in the electroless Ni—Fe alloy plating solution at the time of the initial make-up of plating bath is related to not only the type of complexing agents but also the content of the nickel ion and the ferric ion.
- nickel sulfate is used as the nickel ion source and its content is 0.06 mol/L in terms of nickel
- iron (III) sulfate is used as the ferric ion source and its content is 0.02 mol/L in terms of iron
- sodium hypophosphite is used as the reducing agent
- the content of sodium hypophosphite is preferably 0.05 to 0.5 mol/L.
- a content of sodium hypophosphite of less than 0.05 mol/L is not preferred because sufficient reducing action cannot be obtained, and thus the deposition rate becomes extremely low, or deposition may not occur.
- a content of sodium hypophosphite of more than 0.5 mol/L is not preferred because decomposition of the bath may occur.
- the electroless Ni—Fe alloy plating solution of the present invention may contain a pH adjuster, a pH buffer, a stabilizer and the like in addition to the above components.
- pH adjuster ammonia, ammonium hydroxide, sodium hydroxide, potassium hydroxide, tetramethylammonium hydroxide and the like may be used as a pH adjuster for the electroless Ni—Fe alloy plating solution of the present invention.
- pH buffer sodium tetraborate, sodium carbonate, boric acid and the like may be used as a pH buffer for the electroless Ni—Fe alloy plating solution of the present invention.
- Stabilizer bismuth, lead, antimony, vanadium, thiourea, sodium thiocyanate, sodium nitrobenzenesulfonate (MBS) and 2-propyn-1-ol and the like may be used as a stabilizer for the electroless Ni-Fe alloy plating solution of the present invention.
- the electroless Ni—Fe alloy plating solution of the present invention can be prepared by adding the components described above to water and mixing them by stirring.
- a nickel complex and a ferric (III) complex to be present in the electroless Ni—Fe alloy plating solution in a stable manner, it is preferable to form a stable nickel complex and a stable ferric (III) complex previously.
- a complexing agent to pure water first, and for example, the first complexing agent, the second complexing agent, a nickel ion source and a ferric ion source are added to pure water, and then a pH buffer, a reducing agent, a stabilizer, a pH adjuster and the like are added.
- the pH of the electroless Ni-Fe alloy plating solution be adjusted to pH 6 to 13 by adding a pH adjuster when a sulfuric acid bath is used.
- a pH of less than 6 is not preferred because the deposition rate becomes extremely low or deposition may not occur.
- a pH of more than 13 is not preferred because decomposition of the bath may occur.
- Bath temperature the bath temperature for the electroless Ni—Fe alloy plating solution of the present invention in the plating process is preferably 25° C. or higher, more preferably 40 to 100° C.
- a bath temperature of lower than 40° C. is not preferred because the deposition rate becomes extremely low or deposition may not occur.
- a bath temperature of higher than 100° C. is not preferred because the deposition rate becomes extremely high, control of film thickness of coating is difficult, and thus a coating having good surface properties cannot be obtained.
- a coating can be formed at a deposition rate of 0.1 to 30 ⁇ m/ hour with the electroless Ni—Fe alloy plating solution of the present invention by adjusting the pH and the bath temperature.
- a deposition rate of less than 0.1 ⁇ m/ hour is not preferred because the time of immersion needs to be extended in order to obtain a coating having a desired film thickness, and thus industrial productivity cannot be achieved.
- a deposition rate of more than 30 ⁇ m/ hour is not preferred because a coating having good surface properties cannot be obtained, and decomposition of the bath is likely to occur.
- the deposition rate can be mainly controlled by concentrations of metals, bath temperature and pH.
- the method of plating using the electroless Ni—Fe alloy plating solution of the present embodiment is performed by dipping objects in the electroless Ni—Fe alloy plating solution.
- the object to be plated is not particularly limited as long as the catalytic treatment described later can be done.
- a conductor such as metal, and a non-conductor such as resin and glass may be used.
- an object having any shape, such as plate, film and a molded article may be adopted as the object to be plated.
- a coating made of Ni—Fe alloy can be formed on the surface of the object to be plated by the plating method.
- the composition of the resulting coating includes, for example, 65 to 95% by mass of Ni and 1 to 35% by mass of Fe.
- sodium hypophosphite is used as a reducing agent, a coating made of a Ni—Fe alloy containing 0.1 to 7% by mass of P may be formed.
- a coating made of Ni—Fe coating formed using the electroless Ni—Fe alloy plating solution of the present embodiment has high magnetic permeability and is suitable for applications such as magnetic field shielding materials, magnetic heads and wound magnetic cores.
- the electroless Ni—Fe alloy plating solution of the present embodiment contains a nickel complex and a ferric (III) complex at the time of the initial make-up of plating bath. Part of the ferric ions is changed to ferrous ions by the action of the reducing agent as deposition reaction proceeds, or with time. The ferrous ion does not inhibit the deposition reaction of Ni—Fe alloy from nickel ions and ferric ions.
- reduction of the deposition rate can be suppressed even when the amount of ferrous ions increases when continuous plating is performed while replenishing components constituting a plating bath consumed in a plating process.
- the electroless Ni—Fe alloy plating solution enables continuous plating to be performed in a stable manner and makes continuous operation possible.
- the components constituting a plating bath consumed may be replenished every time a plating process is performed or after several plating processes.
- the electroless Ni—Fe alloy plating solution of Example 1a shown in Table 2 was prepared.
- the plating solution was prepared by adding the first complexing agent, the second complexing agent, a nickel ion source and a ferric ion source to pure water in that order, and then adding other agents such as a reducing agent and mixing them.
- the electroless Ni—Fe alloy plating solution of Example 1a contains a nickel complex and a ferric (III) complex in a stable state at the time of the initial make-up of plating bath.
- a copper plate for Hull cell made of rolled copper (made by YAMAMOTO-MS Co., Ltd.) was prepared as an object to be plated, and the object was pretreated.
- the object to be plated was degreased by dipping the object in an alkaline degreasing agent (made by Meltex Inc.) for 3 minutes and then acid activated by dipping in 10% sulfuric acid for 1 minute, and subsequently Pd catalyst was applied thereto by dipping in an ion-type Pd catalyzer (Act-440 made by Meltex Inc.) for 3 minutes.
- the object to be plated which had been pretreated was subjected to continuous plating using the electroless Ni—Fe alloy plating solution of Example 1a. More specifically, a plating process was previously performed using the electroless Ni—Fe alloy plating solution for 30 minutes, and the concentrations of the nickel ion, the ferric ion and sodium hypophosphite and the pH were measured before and after the plating process. Then the amounts of the components constituting the plating bath consumed per plating process were calculated. Subsequently, a procedure was repeated, including performing an actual plating process for 30 minutes, replenishing the components constituting the plating bath in an amount corresponding to the above amount consumed and performing a plating process again. The bath volume was 1 L and the bath load was 1 dm 2 /L.
- the composition of the coating formed on the surface of the object plated by the respective plating processes was analyzed using Micro-XRF Spectrometer (M4 Tornado made by Bruker) in a quantitative analysis mode.
- the content of Ni was 65 to 95% by mass
- the content of Fe was 1 to 35% by mass
- the content of P was 0.1 to 7% by mass.
- the deposition rate was calculated from the film thickness of the resulting coating.
- FIG. 4 (a graph showing the relation among the “number of times of plating”, the “deposition rate” and the “content of Fe in the coating.”)
- the horizontal axis of FIG. 4 shows the number of times of plating
- the left vertical axis shows the deposition rate
- the right vertical axis shows the content of Fe in the coating.
- FIG. 4 shows that with the electroless Ni—Fe alloy plating solution of Example 1a, the decrease in deposition rate and the decrease in the content of Fe in the coating did not occur even when the number of times of plating increased.
- FIG. 4 Example 1a
- FIG. 1 Comparative Example 1
- Example 2a shown in Table 3 was prepared in the same manner as in Example la. Then 0.01 to 0.04 mol/L of FeSO 4 was added to the electroless Ni—Fe alloy plating solution of Example 2a as the ferrous ion source to prepare the electroless Ni—Fe alloy plating solutions of Examples 2b to 2e shown in Table 3. The same object to be plated as that used in Example 1a was dipped in the electroless Ni—Fe alloy plating solutions of Examples 2b to 2e for 30 minutes to perform a plating process.
- the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 2a to 2e was analyzed in the same manner as in Example 1a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass, and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated in the same manner as in Example 1a.
- the results are shown in FIG. 5 (a graph showing the relation among the “concentration of the ferrous ion,” the “deposition rate” and the “content of Fe in the coating.”)
- the horizontal axis of FIG. 5 shows the concentration of Fe 2+ added, i.e., the concentration of the ferrous ion source (FeSO 4 ) added, and the left vertical axis shows the deposition rate and the right vertical axis shows the content of Fe in the coating.
- the electroless Ni—Fe alloy plating solution of Example 2a contains a nickel complex and a ferric (III) complex but no ferrous ions at the time of the initial make-up of plating bath.
- the electroless Ni—Fe alloy plating solutions of Examples 2b to 2e contain a nickel complex and a ferric (III) complex, and also 0.01 to 0.04 mol/L of ferrous ions at the time of the initial make-up of plating bath.
- the ferrous ion in the electroless Ni—Fe alloy plating solutions of Examples 2b to 2e is considered to occur mainly as a ferrous (II) complex.
- the plating solutions of Examples 2b to 2e contain a ferrous ion
- the plating solutions provide a deposition rate and a content of Fe in the coating equivalent to those in the case of using the electroless Ni—Fe alloy plating solution of Example 2a which does not contain a ferrous ion. This suggests that the ferrous ion does not inhibit the deposition reaction of Ni—Fe alloy from nickel ions and ferric ions.
- FIG. 3 shows that in the case of using the electroless Ni—Fe alloy plating solution which contains a nickel complex and a ferrous (II) complex at the time of the initial make-up of plating bath and to which a ferric ion is added (corresponding to Comparative Example 2 described above), the deposition rate decreases as the amount of ferric ions is increased. This suggests that the ferric ion has inhibited the deposition reaction of Ni—Fe alloy from nickel ions and ferrous ions.
- electroless Ni—Fe alloy plating solutions prepared by changing the type and the content of the components constituting the plating bath are evaluated.
- the electroless Ni—Fe alloy plating solutions of Examples 3a and 3b shown in Table 4 were prepared in the same manner as in Example 2a and a plating process was performed.
- the electroless Ni—Fe alloy plating solutions of Examples 3a and 3b are the same except that the type of the nickel ion source and the type and concentration of the ferric ion source are different.
- Example 2a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 3a and 3b was analyzed in the same manner as in Example 2a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated in the same manner as in Example 2a and bath stability was visually evaluated. The results are shown in Table 4. Symbol “-” in tables (Tables 4 to 13) means that the corresponding component was not added. Symbol “ ⁇ ” means that bath stability is excellent without deposition on the object other than the object to be plated (e.g., the plating bath and stirrer) or precipitation after the completion of plating. Symbol “ ⁇ ” means that bath stability is substantially good and plating have been performed well though deposition of alloy was found on the stirrer at the completion of plating.
- Table 4 shows that nickel chloride and nickel sulfate may be used as a nickel ion source, and iron (III) chloride and iron (III) sulfate may be used as a ferric ion source for the electroless Ni—Fe alloy plating solution.
- the table also shows that the electroless Ni-Fe alloy plating solutions of Examples 3a and 3b have excellent bath stability. Furthermore, since the electroless Ni—Fe alloy plating solutions of Examples 3a and 3b have excellent bath stability, continuous plating can be performed in a stable manner.
- the electroless Ni—Fe alloy plating solutions of Examples 4a to 4d shown in Table 5 were prepared in the same manner as in Example 3a, and a plating process was performed.
- the electroless Ni—Fe alloy plating solutions of Examples 4a to 4d are the same except that the concentration of the ferric ion source, i.e., iron (III) sulfate is different.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 4a to 4d was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass, and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 5.
- Table 5 shows that a content of iron (III) sulfate of 0.006 to 0.012 mol/L in the electroless Ni—Fe alloy plating solutions provides excellent bath stability. This suggests that continuous plating can be performed in a stable manner with the electroless Ni—Fe alloy plating solutions of Examples 4a to 4d.
- the electroless Ni—Fe alloy plating solutions of Examples 5a to 5k shown in Table 6 were prepared in the same manner as in Example 3a and a plating process was performed.
- the electroless Ni—Fe alloy plating solutions of Examples 5a to 5k are the same except that the type of the complexing agent is different.
- any of trisodium citrate, sodium gluconate, potassium pyrophosphate and etidronic acid (1-hydroxyethane-1,1-diphosphonic acid, sodium salt, HEDP) was used alone as a complexing agent. These complexing agents act on both of the nickel ion and the ferric ion.
- the complexing agents used in Examples 5a to 5k are listed in the column of the second complexing agent.
- any of alanine, glycine and glutamic acid was used for the electroless Ni—Fe alloy plating solutions of Examples 5e to 5g as the first complexing agent, and Rochelle salt was used as the second complexing agent.
- any of alanine, glycine, glutamic acid and taurine was used for the electroless Ni—Fe alloy plating solutions of Examples 5h to 5k as the first complexing agent, and sodium gluconate was used as the second complexing agent.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 5a to 5k was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 6.
- Table 6 shows that the combination of complexing agents described in Table 6 can be used for the electroless Ni—Fe alloy plating solution and the combination provides excellent bath stability in all cases. This suggests that continuous plating can be performed in a stable manner with the electroless Ni—Fe alloy plating solutions of Examples 5a to 5k.
- the electroless Ni—Fe alloy plating solutions of Examples 6a to 6e shown in Table 7 were prepared in the same manner as in Example 3a.
- the electroless Ni—Fe alloy plating solutions of Examples 6a and 6b are the same except that the content of the first complexing agent is different, and the electroless Ni—Fe alloy plating solutions of Examples 6c to 6e are the same except that the content of the second complexing agent is different.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 6a to 6e was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 7.
- Table 7 shows that the electroless Ni—Fe alloy plating solutions in which the contents of the nickel ion source and the ferric ion source are 0.06 mol/L, respectively, the content of the first complexing agent is 0.05 to 0.15 mol/L, and the content of the second complexing agent is 0.3 mol/L provide excellent bath stability.
- the table also shows that the electroless Ni-Fe alloy plating solutions in which the contents of the nickel ion source and the ferric ion source are 0.06 mol/L, respectively, the content of the first complexing agent is 0.1 mol/L, and the content of the second complexing agent is 0.1 to 0.4 mol/L provide excellent bath stability. This suggests that continuous plating can be performed in a stable manner with the electroless Ni—Fe alloy plating solutions of Examples 6a to 6e.
- the electroless Ni—Fe alloy plating solutions of Examples 7a and 7b shown in Table 8 were prepared in the same manner as in Example 3a.
- the electroless Ni—Fe alloy plating solutions of Examples 7a and 7b are the same except that the concentration of the reducing agent, i.e., sodium hypophosphite is different.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 7a and 7b was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 8.
- Table 8 shows that the electroless Ni—Fe alloy plating solutions in which the content of sodium hypophosphite is 0.2 to 0.3 mol/L provide excellent bath stability. This suggests that continuous plating can be performed in a stable manner with the electroless Ni—Fe alloy plating solutions of Examples 7a and 7b.
- the electroless Ni—Fe alloy plating solutions of Examples 8a to 8i shown in Table 9 were prepared in the same manner as in Example 3a.
- the electroless Ni—Fe alloy plating solution of Example 8a does not contain stabilizer.
- the electroless Ni—Fe alloy plating solutions of Examples 8b to 8i are the same except for using any one of bismuth, lead, antimony, vanadium, thiourea, sodium thiocyanate, sodium nitrobenzenesulfonate and 2-propyn-1-ol as a stabilizer.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 8a to 8i was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 9.
- Table 9 shows that although the electroless Ni—Fe alloy plating solution substantially provides good bath stability even without a stabilizer (see Example 8a), using a stabilizer improves bath stability.
- the table also shows that antimony, thiourea, sodium thiocyanate and 2-propyn-1-ol are particularly preferred as a stabilizer. This suggests that continuous plating can be performed in a more stable manner with the electroless Ni—Fe alloy plating solutions of Examples 8b to 8i.
- the electroless Ni—Fe alloy plating solutions of Examples 9a to 9f shown in Table 10 were prepared in the same manner as in Example 3a.
- the electroless Ni—Fe alloy plating solutions of Examples 9a to 9f are the same except that the pH is different.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 9a to 9f was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 10.
- Table 10 shows that the electroless Ni—Fe alloy plating solutions having a pH of 9 to 11 provide excellent bath stability. This suggests that continuous plating can be performed in a stable manner with the electroless Ni—Fe alloy plating solutions of Examples 9 to 9f.
- the electroless Ni—Fe alloy plating solutions of Examples 10a to 10f shown in Table 11 were prepared in the same manner as in Example 3a, and plating operation was carried out in the same manner as in the case where the electroless Ni—Fe alloy plating solution of Example 2a was used.
- the composition of the bath of the electroless Ni—Fe alloy plating solutions of Examples 10a to 10f is the same, and the bath temperature is different.
- Example 3a the composition of the coating prepared using the electroless Ni—Fe alloy plating solution of Examples 10a to 10f was analyzed in the same manner as in Example 3a, and as a result, the content of Ni was 65 to 95% by mass, the content of Fe was 1 to 35% by mass and the content of P was 0.1 to 7% by mass in all cases. Furthermore, the deposition rate was calculated and bath stability was evaluated in the same manner as in Example 3a. The results are shown in Table 11.
- Table 11 shows that the electroless Ni—Fe alloy plating solutions provide excellent bath stability at a bath temperature of 60 to 80° C. This suggests that continuous plating can be performed in a stable manner with the electroless Ni—Fe alloy plating solutions of Examples 10a to 10d.
- electroless Ni—Fe alloy plating solutions having a composition different from that of the electroless Ni—Fe alloy plating solutions described above will be evaluated.
- the electroless Ni—Fe alloy plating solutions of Examples 11a to 11d shown in Table 12 and the electroless Ni—Fe alloy plating solutions of Examples 12a to 12e shown in Table 13 were prepared.
- the electroless Ni—Fe alloy plating solutions of Examples 11d contains three complexing agents, and ammonium sulfate mainly acts as the first complexing agent, and Rochelle salt and trisodium citrate mainly act as the second complexing agent.
- the electroless Ni—Fe alloy plating solution containing a nickel ion source and a ferric ion source of the present invention enables continuous plating to be performed in a stable manner, and thus productivity can be improved and production cost can be decreased.
- the electroless Ni—Fe alloy plating solution can be applied to various technical fields in which a conventional electroless Ni—Fe alloy plating solution containing a nickel ion source and a ferrous ion source is used, such as production of magnetic field shielding materials, magnetic heads and wound magnetic cores.
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JPH0766034A (ja) | 1993-08-26 | 1995-03-10 | Denki Kagaku Kogyo Kk | 軟磁性材料膜及びその製造方法 |
US20050095855A1 (en) | 2003-11-05 | 2005-05-05 | D'urso John J. | Compositions and methods for the electroless deposition of NiFe on a work piece |
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