US20200018476A1 - Vaporization device and vaporization system - Google Patents

Vaporization device and vaporization system Download PDF

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Publication number
US20200018476A1
US20200018476A1 US16/490,740 US201816490740A US2020018476A1 US 20200018476 A1 US20200018476 A1 US 20200018476A1 US 201816490740 A US201816490740 A US 201816490740A US 2020018476 A1 US2020018476 A1 US 2020018476A1
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Prior art keywords
vaporization
liquid level
container
region
liquid
Prior art date
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Abandoned
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US16/490,740
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English (en)
Inventor
Akihiro Taguchi
Ryoichi Kyoyama
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Horiba Stec Co Ltd
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Horiba Stec Co Ltd
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Assigned to HORIBA STEC, CO., LTD. reassignment HORIBA STEC, CO., LTD. ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: KYOYAMA, Ryoichi, TAGUCHI, AKIHIRO
Publication of US20200018476A1 publication Critical patent/US20200018476A1/en
Abandoned legal-status Critical Current

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    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B1/00—Methods of steam generation characterised by form of heating method
    • F22B1/28—Methods of steam generation characterised by form of heating method in boilers heated electrically
    • F22B1/284—Methods of steam generation characterised by form of heating method in boilers heated electrically with water in reservoirs
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B3/00—Other methods of steam generation; Steam boilers not provided for in other groups of this subclass
    • F22B3/02—Other methods of steam generation; Steam boilers not provided for in other groups of this subclass involving the use of working media other than water
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
    • B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
    • B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J7/00—Apparatus for generating gases
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F22—STEAM GENERATION
    • F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
    • F22B37/00—Component parts or details of steam boilers
    • F22B37/78—Adaptations or mounting of level indicators

Definitions

  • the present invention relates to a vaporization device that vaporizes a liquid material, and to a vaporization system using the vaporization device.
  • Patent Literature 1 As this sort of vaporization device, as disclosed in Patent Literature 1, there is one including: a container into which a liquid material is introduced; and a heater for heating the liquid material in the container and configured to heat the liquid material to vaporize it and lead the resulting gas out of the container to introduce it into various equipment.
  • This vaporization device further includes a liquid level sensor inserted into the container in order to make it possible to check the remaining amount of the liquid material in the container.
  • the present invention has been made in order to solve the above-described problem, and the main object thereof is to provide a vaporization device capable of accurately detecting the liquid level of a liquid material in a container.
  • the vaporization device of the present invention is one including: a container that contains a liquid material; a heater that heats the liquid material in the container; and a liquid level sensor that detects the liquid level of the liquid material in the container, in which when viewing the inside of the container from above, a vaporization region in which the liquid material is vaporized, and a liquid level stable region are formed, and the liquid level sensor detects the liquid level of the liquid material in the liquid level stable region.
  • the liquid level sensor detects the liquid level in the liquid level stable region, thus making it possible to accurately detect the liquid level of the liquid material in the container.
  • the liquid level stable region here is not limited to a region in which the liquid level does not fluctuate at all, and to the extent that detection accuracy by the liquid level sensor can be improved more than before, the liquid level may fluctuate.
  • a configuration in which the heater is provided to part of a side wall of the container or to the vicinity of it can be cited.
  • a side where the heater is arranged in the container can be actively heated to form the vaporization region on the heater side and also form the liquid level stable region on a side opposite to the heater.
  • fluctuation occurring on a liquid surface in the vaporization region can be reduced until reaching the liquid level stable region, and the liquid material scattered from the liquid surface in the vaporization region can be prevented from reaching the liquid level sensor, thus making it possible to accurately detect the liquid level of the liquid material.
  • the separation member can surely prevent the liquid level in the vaporization region from fluctuating and the liquid material scattered from the liquid surface in the vaporization region from reaching the liquid level stable region.
  • the separation member separates between the vaporization region and the liquid level stable region so as to enable material gas resulting from vaporization of the liquid material to be circulated between these regions.
  • the liquid material may be led out of the container together with the material gas to make it impossible to accurately control, for example, the flow rate of the material gas, or the like.
  • a heater that is provided in an upper part of the container and heats material gas resulting from vaporization of the liquid material.
  • a lead-out port for leading material gas resulting from vaporization of the liquid material out of the container is provided on a vaporization region side of the container.
  • the introduced liquid material may be vaporized at once to rapidly raise the pressure inside the container, possibly making it impossible to accurately control, for example, the flow rate of the material gas.
  • an introduction port for introducing the liquid material into the container is formed on a liquid level stable region side of the container.
  • the vaporization system according to the present invention is one including: the above-described vaporization device; a liquid material supply device that supplies the liquid material to the vaporization device; and a control device that controls the supply amount of the liquid material on the basis of a detection signal of the liquid level sensor.
  • the liquid level sensor can accurately detect the liquid level of the liquid material, thus making it possible to improve control of the supply amount of the liquid material by the control device.
  • the liquid surface of the liquid material in the container can be accurately detected.
  • FIG. 1 is a diagram schematically illustrating the configuration of a vaporization system in one embodiment of the present invention.
  • FIG. 2 is a diagram schematically illustrating the configuration of a vaporization device in the same embodiment.
  • FIG. 3 is a diagram when viewing the vaporization device in the same embodiment from a level direction of a liquid level.
  • FIG. 4 is a diagram when viewing a vaporization device in another embodiment from a level direction of a liquid level.
  • FIG. 5 is a diagram schematically illustrating the configuration of a vaporization device in another embodiment.
  • FIG. 6 is a diagram schematically illustrating the configuration of a vaporization device in another embodiment.
  • FIG. 7 is a diagram schematically illustrating the configuration of a vaporization device in another embodiment.
  • a vaporization device 100 of the present embodiment is one constituting part of a vaporization system Z used in a manufacturing process of, for example, semiconductors or the like, and as illustrated in FIG. 1 , is introduced with a liquid material X from a liquid material supply device 200 through an introduction path L 1 and vaporizes the liquid material X to produce material gas.
  • the material gas produced by the vaporization device 100 is sent to target equipment through a lead-out path L 2 as illustrated in FIG. 1 .
  • the introduction path L 1 and the lead-out path L 2 are respectively provided with on-off valves V 1 , V 2 , and adapted to be switchable to any one, for example, whether introducing the liquid material X into the vaporization device 100 or leading the material gas out of the vaporization device 100 by opening/closing these on-off valves V 1 , V 2 appropriately depending on circumstances.
  • the supply amount of the liquid material X is adapted to be controllable in such a manner that the below-described liquid level sensor 20 detects the liquid level of the liquid material X in the vaporization device 100 and on the basis of the resulting detection signal, an unillustrated control device adjusts the opening level of the on-off valve V 1 provided in the introduction path L 1 .
  • the lead-out path L 2 is provided with a flow rate controller MFC such as a differential pressure type or thermal type mass flow controller, and adapted to be able to control the flow rate of the material gas flowing through the lead-out path L 2 to, for example, a preset target flow rate.
  • a control valve constituting the flow rate controller MFC can be provided with a function as the above-described on-off valve V 2 , and in such a case, the on-off valve V 2 is not necessarily required to be provided.
  • the vaporization device 100 of the present embodiment includes: a container 10 that contains the liquid material X; the liquid level sensor 20 that detects the liquid level of the liquid material X in the container 10 ; and a heater 30 that heats the liquid material X in the container 10 .
  • the container 10 is one whose inside is formed as a vaporization chamber S for vaporizing the liquid material X and that is, for example, of a casing shape.
  • the container 10 here is one of a vertically-long vertically-mounted type, and formed with an introduction port P 1 connected with the above-described introduction path L 1 and a lead-out port P 2 connected with the above-described lead-out path L 2 .
  • the introduction port P 1 is positioned in the lower part of the container 10 , and specifically, formed in the lower end part of a side wall 11 of the container 10 .
  • the introduction port P 1 may be formed in the bottom wall 12 of the container 10 or may be provided in the upper part of the container 10 .
  • the lead-out port P 2 is positioned in the upper part of the container 10 , and specifically, formed in the upper end part of a side wall 11 of the container 10 .
  • the lead-out port P 2 may be formed in the upper wall 13 of the container 10 .
  • the liquid level sensor 20 can use various types, such as a contact-type that detects the liquid level with a sensor part (not illustrated) in contact with the liquid material X, a noncontact-type that detects the liquid level with a sensor part not in contact with the liquid material X, a type having a movable part like a float type, and a type not having a movable part like an electrode type. Note that in the case of having a movable part, particles may be produced in the container 10 , and therefore the liquid level sensor 2 not having a movable part is used here.
  • the liquid level sensor 20 is a contact-type one inserted into the container 10 through an insertion hole provided in the upper wall 13 of the container 10 , and configured to include a resistance temperature detector (not illustrated) such as a thermistor and to be able to detect the liquid level using the difference in heat dissipation factor between a liquid phase and a gas phase.
  • a resistance temperature detector such as a thermistor
  • the heater 30 can use various types such as ones using a cartridge heater and a heating wire heater, and is a rubber heater constituted by, for example, silicon and the like. Note that the detailed arrangement of the heater 30 will be described below.
  • the vaporization device 100 of the present embodiment when viewing the inside of the container 10 from above (an arrow R direction in FIG. 2 ) (i.e., as viewed from a level direction of the liquid level stable in the container 10 ), the vaporization device 100 of the present embodiment is configured to form a vaporization region S 1 in which the liquid material X in the container 10 is vaporized and a liquid level stable region S 2 in which the liquid level is stable differently from the vaporization region S 1 , and the above-described liquid level sensor 20 is arranged so as to detect the liquid level in the liquid level stable region S 2 .
  • the vaporization region S 1 and the liquid level stable region S 2 are not required to be strictly distinct regions, but the vaporization region S 1 and the liquid level stable region S 2 may partially overlap each other in a boundary part in cases such as when these regions S 1 , S 2 are continuously formed.
  • the vaporization region S 1 is a region on a side where the above-described heater 30 is provided in the container 10 , and a region in which the liquid material X is actively heated.
  • the vaporization region S 1 here is a region in which a calorific value given per unit volume per unit time is higher than that in the liquid level stable region S 2 and bubbles of various sizes are generated.
  • the liquid level stable region S 2 is a region on a side where the above-described liquid level sensor 20 is provided in the container 10 , and a region in which a variation in liquid level is smaller than that in the vaporization region S 1 .
  • the liquid level stable region S 2 here is a region whose temperature is lower than that in the vaporization region; however, in cases such as when the container 10 is of a small size, the liquid level stable region S 2 and the vaporization region S 1 may become substantially equalized in temperature.
  • the liquid level stable region S 2 is not required to be a region in which the liquid level does not fluctuate at all, and to the extent that the detection accuracy of the liquid level sensor 20 can be improved more than before, the liquid level may fluctuate, bubbles may be generated, or the liquid material X may be vaporized.
  • the vaporization region S 1 and the liquid level stable region S 2 in the present embodiment are formed by arrangement of the above-described heater 30 , and here the vaporization device 10 is further provided with a separation member 40 separating between the vaporization region S 1 and the liquid level stable region S 2 .
  • the heater 30 is provided to part of the periphery of the vaporization chamber S without surrounding the whole of the vaporization chamber S. In doing so, in the vaporization chamber S, a region that is near to the heater 30 and in which the amount of heat transferred is large serves as the vaporization region S 1 , and a region that is far from the heater 30 and in which the amount of heat transferred is small serves as the liquid level stable region S 2 .
  • the heater 30 here is provided to part of the side wall of the container 10 , and arranged so as to partially heat the liquid material X.
  • the heater 30 is not necessarily required to be provided to the side wall 11 , but may be provided in the vicinity of the side wall 11 , or may be separated from the side wall 11 to the extent that the liquid material X can be vaporized. That is, the heater 30 may be provided integrally with the side wall 11 , or may be formed as a separate body from the side wall 11 and provided separately from the side wall 11 .
  • the container 10 in the present embodiment is of a rectangular parallelepiped shape, and as illustrated in FIG. 3 , has: a first side wall 111 and a second side wall 112 which are opposite to each other; and a third side wall 113 and a fourth side wall 114 which are interposed between them and opposite to each other.
  • the heater 30 is provided to the second side wall 112 without being provided to the first side wall 111 . It may be appropriately selected whether or not to provide the heater 30 to the third side wall 113 or to the fourth side wall 114 ; however, in the case of providing, without providing at least on the first side wall 111 side of the third side wall 113 or fourth side wall 114 , providing on the second side wall 112 side is preferable.
  • a second heater 32 for heating the material gas resulting from vaporization of the liquid material X is provided in the upper part of the container 10
  • a third heater 33 for making the vaporization of the liquid material X highly efficient is provided in the lower part of the container 10 .
  • first heater 31 , the second heater 32 , and the third heater 33 may be ones that are respectively separate bodies, or may be ones that are partially or wholly integrally formed.
  • the second heater 32 is one that suppresses the material gas from being liquefying, and provided at least on the vaporization region S 1 side in the upper wall 13 of the container 10 .
  • the second heater 32 may be provided from the vaporization region S 1 side to the liquid level stable region S 2 side in the upper wall 13 , or may be provided from the upper wall 13 to the upper part of the first side wall 111 .
  • the second heater 32 is not necessarily required to be provided to the upper wall 13 , but may be provided in the vicinity of the upper wall 13 , or may be separated from the upper wall 13 to the extent that the material gas can be suppressed from liquefying.
  • the third heater 33 is one that heats the liquid material X, and provided on the vaporization region S 1 side in the bottom wall 12 of the container 10 .
  • the third heater 33 is not necessarily required to be provided to the bottom wall 12 , but may be provided in the vicinity of the bottom wall 12 , or may be separated from the bottom wall 12 to the extent that the liquid material X can be heated.
  • the separation member 40 is one that, as illustrated in FIG. 2 and FIG. 3 , is interposed between the vaporization region S 1 and the liquid level stable region S 2 in the container 10 , and makes it possible to circulate the liquid material X between the vaporization region S 1 and the liquid level stable region S 2 , as well as to also here circulate the material gas between the vaporization region S 1 and the liquid level stable region S 2 .
  • the separation member 40 is one provided substantially parallel to the first side wall 111 and the second side wall 112 , and here, for example, a rectangular-shaped flat plate provided from the third side wall 113 to the fourth side wall 114 .
  • the separation member 40 separates between these regions S 1 , S 2 .
  • the shape and arrangement of the separation member 40 , the volume ratio between the vaporization region S 1 and the liquid level stable region S 2 separated by the separation member 40 , and the like may be appropriately changed.
  • the lower end of the separation member 40 is separated from the bottom wall 12 to make it possible to circulate the liquid material X through the resulting interval
  • the upper end of the separation member 40 is separated from the upper wall 13 to make it possible to circulate the material gas through the resulting interval.
  • the interval between the lower end of the separation member 40 and the bottom wall 12 allows a liquid phase in the vaporization region S 1 and a liquid phase in the liquid level stable region S 2 to communicate together
  • the interval between the upper end of the separation member 40 and the upper wall 13 allows a gas phase in the vaporization region S 1 and a gas phase in the liquid level stable region S 2 to communicate together.
  • the liquid phase here refers to a region in which liquid exists
  • the gas phase refers to a region in which gas exists.
  • the above-described liquid level sensor 20 is provided, and specifically, arranged so that the lower end of the liquid level sensor 20 is positioned lower than the upper end of the separation member 40 .
  • the above-described introduction port P 1 is provided, and here the introduction port P 1 is formed in a position opposite to the first heater 31 , i.e., in the first side wall 111 .
  • the above-described lead-out port P 2 is provided, and here formed above the first heater 31 in the second side wall 112 .
  • the vaporization device 100 since the arrangement of the heater 30 , and the separation member 40 allow the vaporization chamber S to be separated into the vaporization region S 1 and the liquid level stable region S 2 , and also the liquid level sensor 20 is configured to detect the liquid level in the liquid level stable region S 2 , it can be prevented that the fluctuation of the liquid level due to bubbling occurring in the vaporization region S 1 arrives at the liquid level stable region S 2 and that the liquid material X scattered from the liquid surface in the vaporization region S 1 is attached to the liquid level sensor 20 .
  • the liquid level of the liquid material X can be accurately detected by the liquid level sensor 20 , and on the basis of the detected liquid level, for example, it becomes possible to accurately control the supply amount of the liquid material X and accurately grasp the remaining amount of the liquid material X in the container 10 .
  • Such working effects are more noticeably produced as the vaporization device 100 is downsized; however, it goes without saying that even the vaporization device 100 of a large size can obtain the same working effects.
  • the material gas is heated by the second heater 32 , the material gas can be suppressed from liquefying. Still further, since the lead-out port P 2 is formed in the vaporization region S 1 , even if the material gas liquefies, the liquid material X resulting from the liquefaction can be prevented from being led out of the container 10 , and for example, the accuracy of flow rate control by, for example, the mass flow controller or the like can be ensured.
  • the introduction port P 1 is formed in the liquid level stable region S 2 , the liquid material X introduced into the container 10 through the introduction port P 1 can be prevented from being vaporized at once, making it possible to prevent a rapid pressure rise in the container 10 .
  • the second side wall 112 is provided with the heater 30 ; however, the heater 30 may be provided on the vaporization region S 1 side in the bottom wall 12 , i.e., nearer to the first side wall 111 side (in the vicinity of the first side wall 111 ) than the separation member 40 in the bottom wall 12 without being provided to the second side wall 112 . That is, it may be configured to provide the third heater 33 without providing the first heater 31 in the first embodiment.
  • the vaporization device 100 only has to be configured to make the liquid level stable region S 2 lower in temperature than the vaporization region S 1 even in a configuration in which the entire periphery of the side walls 11 (i.e., the first side wall 111 , second side wall 112 , third side wall 113 , and fourth side wall 114 ) of the container 10 is provided with the heater 30 or the entire bottom wall 12 of the container 10 is provided with the heater 30 .
  • the entire periphery of the side walls 11 i.e., the first side wall 111 , second side wall 112 , third side wall 113 , and fourth side wall 114
  • the heater 30 is configured so as to make a heating capacity for the liquid level stable region S 2 lower than a heating capacity for the vaporization region S 1
  • a configuration in which the liquid level stable region S 2 is provided with a cooling mechanism, or the like can be cited.
  • the separation member 40 is not required to be provided from the third side wall 113 to the fourth side wall 114 , but as illustrated in FIG. 4 , may be attached to, for example, the bottom wall 12 in such a way as to be separated from one or both of the third side wall 113 and the fourth side wall 114 .
  • the separation member 40 in the above-described embodiment separates between the vaporization region S 1 and the liquid level stable region S 2 while making it possible to circulate the material gas between the vaporization region S 1 and the liquid level stable region S 2 ; however, for example, if the gas phase in the liquid level stable region S 2 is opened to the atmosphere, or by other means, the material gas may be unable to be circulated between the vaporization region S 1 and the liquid level stable region S 2 .
  • the introduction port P 1 may be formed on the vaporization region S 1 side, and for example, may be formed on the vaporization region S 1 side in the second side wall 112 , third side wall 113 , or fourth side wall 114 .
  • the liquid material X is not directly introduced into the liquid level stable region S 2 , and therefore the liquid level in the liquid level stable region S 2 can be suppressed from being fluctuated by introduction of the liquid material X.
  • the lead-out port P 2 may be formed on the liquid level stable region S 2 side, and for example, may be formed in the upper end part of the first side wall 111 , or in the upper end part on the liquid level stable region S 2 side in the third side wall 113 or the fourth side wall 114 .
  • the lead-out port P 2 can be kept away from the liquid surface in the vaporization region S 1 , and even when the liquid material X is scattered on the liquid surface in the vaporization region S 1 , the scattered liquid material X can be suppressed from arriving at the lead-out port P 2 .
  • the vaporization device 100 may be configured to include: a first container 10 A inside which a vaporization region S 1 is formed; and a second container 10 B inside which a liquid level stable region S 2 is formed and that communicates with the first container 10 A, in which the second container 10 B is provided with a liquid level sensor 20 .
  • first container 10 A and the second container 10 B are arranged mutually separated via a space S 3 , and here tubular members provided so that tube axis directions are parallel to each other.
  • the first container 10 A is such that the outer circumferential part thereof is provided with a heater 30 (a rubber heater or a winding heater) and the upper end part thereof communicates with a lead-out port P 2 for leading out material gas.
  • a heater 30 a rubber heater or a winding heater
  • the second container 10 B is such that the inside thereof is inserted with the liquid level sensor 20 and the lower end part thereof communicates with an introduction port Pb for introducing a liquid material X.
  • the first container 10 A and the second container 10 B are configured such that the upper end parts thereof communicate with each other, while the lower end parts thereof communicate with each other, and a gas phase in the first container 10 A and a gas phase in the second container 10 B communicate together, while a liquid phase in the first container 10 A and a liquid phase in the second container 10 B communicate together.
  • the space S 3 interposed between the first container 10 A and the second container 10 B functions as the separation member 40 , the same working effects as in the first embodiment can be obtained without providing the separation member 40 separately from the respective containers 10 A, 10 B.
  • the separation member 40 may be tilted with respect to the first side wall 111 and the second side wall 112 .
  • this separation member 40 is provided below the liquid level sensor 20 , and arranged separated from the liquid level sensor 20 so that bubbles generated in the vaporization region S 1 float along the separation member 40 .
  • a heater 30 is provided on the second side wall 112 side of the bottom wall 12 , and the separation member 40 is tilted in such a manner as to gradually rise from the first side wall 111 toward the second side wall 112 .
  • the vaporization region S 1 and the liquid level stable region S 2 can be formed in the container 10 , thus making it possible for the liquid level sensor 2 to accurately detect the liquid level in the liquid level stable region S 2 .
  • the vaporization device 100 may be one not including the separation member 40 .
  • a configuration in which a container 10 is a horizontally long one of which one end part in its longer direction is provided with a heater 30 and the other end part in the longer direction is provided with a liquid level sensor 20 can be cited.
  • a vaporization chamber S of the container 10 one end part side in the longer direction is formed as a vaporization region S 1 , while the other end part side in the longer direction is formed as a liquid level stable region S 2 , and the liquid level sensor 20 is arranged so as to detect a liquid level in the liquid level stable region S 2 .
  • a liquid material X scattered from a liquid surface in the vaporization region S 1 can be prevented from arriving at the liquid level sensor 20 , making it possible to accurately detect the liquid level of the liquid material X.
  • the liquid level of the liquid material in the container can be accurately detected.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
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  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
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  • Filling Or Discharging Of Gas Storage Vessels (AREA)
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JP2017-079895 2017-04-13
JP2017079895 2017-04-13
PCT/JP2018/010421 WO2018190074A1 (ja) 2017-04-13 2018-03-16 気化装置及び気化システム

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TWI715161B (zh) * 2019-08-23 2021-01-01 廣化科技股份有限公司 純甲酸供酸焊接系統
JP2021089198A (ja) * 2019-12-04 2021-06-10 株式会社堀場エステック 液体材料気化装置

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0350446Y2 (zh) * 1985-02-12 1991-10-28
JPH0335433Y2 (zh) * 1987-06-17 1991-07-26
JPS6483666A (en) * 1987-09-25 1989-03-29 Furukawa Electric Co Ltd Liquid raw material evaporating device
JPS6483663A (en) * 1987-09-25 1989-03-29 Furukawa Electric Co Ltd Liquid raw material evaporating device
JPH07194961A (ja) 1994-01-11 1995-08-01 Hitachi Metals Ltd 原料供給装置
JP3259940B2 (ja) * 1995-02-17 2002-02-25 東京エレクトロン株式会社 処理ガスの供給装置
JPH115157A (ja) * 1997-06-16 1999-01-12 Chiyoda Kucho Kiki Kk ロウ付機用ガスフラックス供給装置
JP2000046631A (ja) * 1998-07-29 2000-02-18 Kaijo Corp 超音波による液面レベル測定装置
JP2006045637A (ja) * 2004-08-06 2006-02-16 Nuclear Fuel Ind Ltd パブリング式気化器
US7547005B2 (en) * 2006-02-16 2009-06-16 Advanced Energy Industries, Inc. System and method for delivering vapor
JP4900110B2 (ja) * 2007-07-20 2012-03-21 東京エレクトロン株式会社 薬液気化タンク及び薬液処理システム
JP5261073B2 (ja) * 2007-08-22 2013-08-14 荏原冷熱システム株式会社 気液分離器、高温再生器及び吸収冷凍機並びに吸収ヒートポンプ
JP4999605B2 (ja) * 2007-08-23 2012-08-15 日本エア・リキード株式会社 液化ガスの気化方法、気化装置およびこれを用いた液化ガス供給装置
JP2014007289A (ja) * 2012-06-25 2014-01-16 Tokyo Electron Ltd ガス供給装置及び成膜装置

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