JPS6483666A - Liquid raw material evaporating device - Google Patents

Liquid raw material evaporating device

Info

Publication number
JPS6483666A
JPS6483666A JP24010787A JP24010787A JPS6483666A JP S6483666 A JPS6483666 A JP S6483666A JP 24010787 A JP24010787 A JP 24010787A JP 24010787 A JP24010787 A JP 24010787A JP S6483666 A JPS6483666 A JP S6483666A
Authority
JP
Japan
Prior art keywords
raw material
liquid
gaseous phase
heating
phase part
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24010787A
Other languages
Japanese (ja)
Inventor
Masatoshi Mikami
Kunihiro Matsubara
Shigeo Iino
Masayuki Sakamoto
Mitsuzo Shimomura
Hiroshi Mihira
Kazuhiro Oya
Koji Hatta
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Furukawa Electric Co Ltd
S Tec Inc
Original Assignee
Furukawa Electric Co Ltd
S Tec Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Furukawa Electric Co Ltd, S Tec Inc filed Critical Furukawa Electric Co Ltd
Priority to JP24010787A priority Critical patent/JPS6483666A/en
Publication of JPS6483666A publication Critical patent/JPS6483666A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
    • C03B37/01—Manufacture of glass fibres or filaments
    • C03B37/012—Manufacture of preforms for drawing fibres or filaments
    • C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
    • C03B37/01413—Reactant delivery systems
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D1/00—Evaporating
    • B01D1/0082—Regulation; Control
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4485—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation without using carrier gas in contact with the source material
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/87—Controlling the temperature
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/85—Feeding the burner or the burner-heated deposition site with vapour generated from liquid glass precursors, e.g. directly by heating the liquid
    • C03B2207/89—Controlling the liquid level in or supply to the tank
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2207/00—Glass deposition burners
    • C03B2207/80—Feeding the burner or the burner-heated deposition site
    • C03B2207/90—Feeding the burner or the burner-heated deposition site with vapour generated from solid glass precursors, i.e. by sublimation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Manufacturing & Machinery (AREA)
  • Manufacture, Treatment Of Glass Fibers (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
  • Chemical Vapour Deposition (AREA)

Abstract

PURPOSE:To efficiently heat a liquid raw material and to stably evaporate said material by disposing plural heaters for heating a raw material liquid surface to a raw material evaporating vessel, measuring the temp. of the gaseous phase part and the liquid level of the liquid phase part and controlling the above-mentioned heaters. CONSTITUTION:The liquid raw material 30 is evaporated in the gaseous phase part 4 in the lower position in the raw material evaporating vessel 1 which can be heated. The evaporated raw material obtd. in such a manner is fed from the gaseous phase part 4 in the upper position through a piping system 5 and a flow rate controller 12 to a reaction system 14. The heaters 2A, 2B for heating the liquid phase and the gaseous phase as well as the plural heaters 2C1-2Cn for heating the raw material liquid surface arranged along the directions where the raw material liquid surface fluctuates are disposed to the vessel 1 of the above-mentioned liquid raw material evaporating device 1. A temp. sensor 17 and a liquid level gage 19 for measuring the raw material liquid surface are disposed to the gaseous phase part 4. At least a power supply part 15C for heating the raw material liquid surface is controlled by a temp. control apparatus 16 in accordance with the information from these sensors.
JP24010787A 1987-09-25 1987-09-25 Liquid raw material evaporating device Pending JPS6483666A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24010787A JPS6483666A (en) 1987-09-25 1987-09-25 Liquid raw material evaporating device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24010787A JPS6483666A (en) 1987-09-25 1987-09-25 Liquid raw material evaporating device

Publications (1)

Publication Number Publication Date
JPS6483666A true JPS6483666A (en) 1989-03-29

Family

ID=17054593

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24010787A Pending JPS6483666A (en) 1987-09-25 1987-09-25 Liquid raw material evaporating device

Country Status (1)

Country Link
JP (1) JPS6483666A (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0494701A (en) * 1990-08-10 1992-03-26 Furukawa Electric Co Ltd:The Apparatus for feeding evaporated gas
JPH052701U (en) * 1991-06-29 1993-01-19 株式会社エステツク Liquid material vaporizer
EP1369903A2 (en) * 2002-06-03 2003-12-10 Aera Japan Ltd. Liquid vaporizing and gas feeding apparatus
JP2014007289A (en) * 2012-06-25 2014-01-16 Tokyo Electron Ltd Gas supply device and film forming device
WO2018190074A1 (en) * 2017-04-13 2018-10-18 株式会社堀場エステック Vaporization device and vaporization system
WO2020116523A1 (en) * 2018-12-04 2020-06-11 住友電気工業株式会社 Device and method for producing fine glass particle deposited body

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0494701A (en) * 1990-08-10 1992-03-26 Furukawa Electric Co Ltd:The Apparatus for feeding evaporated gas
JPH052701U (en) * 1991-06-29 1993-01-19 株式会社エステツク Liquid material vaporizer
EP1369903A2 (en) * 2002-06-03 2003-12-10 Aera Japan Ltd. Liquid vaporizing and gas feeding apparatus
JP2014007289A (en) * 2012-06-25 2014-01-16 Tokyo Electron Ltd Gas supply device and film forming device
WO2018190074A1 (en) * 2017-04-13 2018-10-18 株式会社堀場エステック Vaporization device and vaporization system
JPWO2018190074A1 (en) * 2017-04-13 2020-02-27 株式会社堀場エステック Vaporization device and vaporization system
WO2020116523A1 (en) * 2018-12-04 2020-06-11 住友電気工業株式会社 Device and method for producing fine glass particle deposited body
JPWO2020116523A1 (en) * 2018-12-04 2021-10-14 住友電気工業株式会社 Manufacturing equipment and manufacturing method for glass fine particle deposits

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