WO2018190074A1 - Vaporization device and vaporization system - Google Patents
Vaporization device and vaporization system Download PDFInfo
- Publication number
- WO2018190074A1 WO2018190074A1 PCT/JP2018/010421 JP2018010421W WO2018190074A1 WO 2018190074 A1 WO2018190074 A1 WO 2018190074A1 JP 2018010421 W JP2018010421 W JP 2018010421W WO 2018190074 A1 WO2018190074 A1 WO 2018190074A1
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- container
- liquid level
- liquid
- region
- vaporization
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F22—STEAM GENERATION
- F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
- F22B1/00—Methods of steam generation characterised by form of heating method
- F22B1/28—Methods of steam generation characterised by form of heating method in boilers heated electrically
- F22B1/284—Methods of steam generation characterised by form of heating method in boilers heated electrically with water in reservoirs
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F22—STEAM GENERATION
- F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
- F22B3/00—Other methods of steam generation; Steam boilers not provided for in other groups of this subclass
- F22B3/02—Other methods of steam generation; Steam boilers not provided for in other groups of this subclass involving the use of working media other than water
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01B—BOILING; BOILING APPARATUS ; EVAPORATION; EVAPORATION APPARATUS
- B01B1/00—Boiling; Boiling apparatus for physical or chemical purposes ; Evaporation in general
- B01B1/005—Evaporation for physical or chemical purposes; Evaporation apparatus therefor, e.g. evaporation of liquids for gas phase reactions
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J7/00—Apparatus for generating gases
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F22—STEAM GENERATION
- F22B—METHODS OF STEAM GENERATION; STEAM BOILERS
- F22B37/00—Component parts or details of steam boilers
- F22B37/78—Adaptations or mounting of level indicators
Definitions
- the present invention relates to a vaporizer for vaporizing a liquid material and a vaporization system using the vaporizer.
- this type of vaporization apparatus includes a container into which a liquid material is introduced and a heater that heats the liquid material in the container.
- the liquid material is heated to vaporize and vaporize.
- Some are configured to lead gas out of the container and into various devices.
- the vaporizer further includes a liquid level sensor inserted into the container so that the remaining amount of the liquid material in the container can be checked.
- the present invention has been made to solve the above-described problems, and its main object is to provide a vaporizer that can accurately detect the liquid level of the liquid material in the container. .
- the vaporization apparatus of the present invention includes a container that stores a liquid material, a heater that heats the liquid material in the container, and a liquid level sensor that detects a liquid level of the liquid material in the container.
- a vaporization region in which the liquid material is vaporized and a liquid level stable region are formed when the inside of the container is viewed from above, and the liquid level sensor is configured such that the liquid level of the liquid material in the liquid level stable region is formed. Is detected.
- the vaporization region and the liquid level stable region are formed when the inside of the container is viewed from above, and the liquid level in the liquid level stable region is detected by the liquid level sensor. Therefore, the liquid level of the liquid material in the container can be detected with high accuracy.
- the liquid level stable region here is not limited to a region where the liquid level is not shaken at all, and the liquid level may be shaken as long as the detection accuracy by the liquid level sensor can be improved as compared with the conventional case.
- the heater is provided in a part of the side wall of the container or in the vicinity thereof.
- the side on which the heater is disposed in the container can be positively heated, and a vaporization region is formed on the heater side and a liquid level stable region is formed on the opposite side of the heater. be able to.
- partition member that partitions the vaporization region and the liquid level stable region so that the liquid material can flow between these regions.
- the partition member can more reliably prevent the liquid material in the vaporization region from shaking and the liquid material scattered from the liquid surface in the vaporization region from reaching the liquid surface stable region.
- the partition member is a material formed by vaporizing the liquid material between the vaporization region and the liquid level stable region between these regions. It is preferable to partition the gas so that it can flow.
- the amount of heat given per unit time per unit volume is higher in the liquid surface stability region than in the vaporization region.
- the thing constituted so that there may be few is mentioned.
- the liquid material is led out from the container together with the material gas, and for example, the flow rate of the material gas may not be accurately controlled. There is. Therefore, in order to suppress the liquefaction of the material gas, it is preferable to include a heater provided on the upper portion of the container for heating the material gas obtained by vaporizing the liquid material.
- the outlet for leading out the material gas obtained by vaporizing the liquid material from the container it is preferable to be provided on the vaporization region side of the container.
- an inlet for introducing the liquid material into the container is formed on the liquid surface stable region side of the container.
- the vaporization system is configured to control the supply amount of the liquid material based on the vaporization device described above, a liquid material supply device that supplies the liquid material to the vaporization device, and a detection signal of the liquid level sensor. And a control device for controlling.
- the liquid level of the liquid material can be detected with high accuracy by the liquid level sensor, so that the control of the supply amount of the liquid material by the control device can be improved.
- the liquid level of the liquid material in the container can be detected with high accuracy.
- the vaporization apparatus 100 constitutes a part of a vaporization system Z used in, for example, a semiconductor manufacturing process, and the liquid material X from the liquid material supply apparatus 200 is introduced as shown in FIG.
- the liquid material X is supplied through the path L1 to generate a material gas.
- the material gas generated by the vaporizer 100 is sent to the target device via the lead-out path L2.
- the introduction path L1 and the lead-out path L2 are provided with on-off valves V1 and V2, respectively.
- the liquid material X is introduced into the vaporizer 100.
- the material gas is led out from the vaporizer 100.
- Both the on-off valves V1 and V2 can be opened, or both can be closed.
- a liquid level sensor 20 detects the liquid level of the liquid material X in the vaporizer 100, and a control device (not shown) of the on-off valve V1 provided in the introduction path L1 based on the detection signal.
- the supply amount of the liquid material X can be controlled by adjusting the opening degree.
- a flow rate control device MFC such as a differential pressure type or a thermal type mass flow controller is provided in the lead-out path L2, so that the flow rate of the material gas flowing through the lead-out path L2 can be controlled to a preset target flow rate, for example. It is.
- the control valve which comprises the flow control apparatus MFC can be provided with the function as the above-mentioned on-off valve V2, and in that case, it is not necessary to provide the on-off valve V2.
- the vaporization apparatus 100 includes a container 10 that stores the liquid material X, a liquid level sensor 20 that detects the liquid level of the liquid material X in the container 10, and a liquid in the container 10. And a heater 30 for heating the material X.
- the container 10 has, for example, a housing shape formed as a vaporizing chamber S in which the liquid material X is vaporized.
- the container 10 here is of a vertically long type, and is formed with an introduction port P1 to which the above-described introduction path L1 is connected and a lead-out port P2 to which the above-described lead-out path L2 is connected.
- the introduction port P1 is located at the lower part of the container 10, and specifically, is formed at the lower end of the side wall 11 of the container 10.
- the introduction port P1 may be formed in the bottom wall 12 of the container 10 or may be provided in the upper part of the container 10.
- the outlet P2 is located at the upper part of the container 10 and is specifically formed at the upper end of the side wall 11 of the container 10.
- the outlet P2 may be formed in the upper wall 13 of the container 10.
- the liquid level sensor 20 is a contact type that detects the liquid level while a sensor unit (not shown) is in contact with the liquid material X, or a non-contact type that detects the liquid level when the sensor unit is not in contact with the liquid material X.
- Various types such as a contact type, a type having a movable part such as a float type, and a type having no movable part such as an electrode type can be used.
- the liquid level sensor 20 having no movable portion is used here.
- the liquid level sensor 20 is a contact type that is inserted into the container 10 through an insertion hole provided in the upper wall 13 of the container 10, and includes a resistance temperature detector (not shown) such as a thermistor.
- the liquid level can be detected by utilizing the fact that the heat dissipation constant is different between the liquid phase and the gas phase.
- the heater 30 can be various ones such as one using a cartridge heater or a heating wire heater, and is a rubber heater made of, for example, silicon. The detailed arrangement of the heater 30 will be described later.
- the vaporization apparatus 100 of the present embodiment has a liquid level surface that is stable in the container 10 as viewed from above (in the direction of arrow R in FIG. 2). As viewed from the direction), a vaporization region S1 in which the liquid material X is vaporized in the container 10 and a liquid level stable region S2 in which the liquid level is stable unlike the vaporization region S1 are formed.
- the liquid level sensor 20 described above is arranged so as to detect the liquid level in the liquid level stable region S2.
- the vaporization region S1 and the liquid surface stability region S2 do not have to be strictly distinguished from each other. For example, when these regions S1 and S2 are continuously formed, the vaporization region S1 and the liquid surface stabilization region S2 are not separated. A part of the surface stable region S2 may overlap.
- the vaporization region S1 is a region on the side where the above-described heater 30 is provided in the container 10, and is a region where the liquid material X is positively heated.
- the vaporization region S1 here is a region in which the amount of heat given per unit time per unit volume is larger than that in the liquid surface stability region S2, and bubbles of various sizes are generated.
- the liquid level stable region S2 is a region on the side where the above-described liquid level sensor 20 is provided in the container 10, and is a region where the fluctuation of the liquid level is smaller than that of the vaporization region S1.
- the liquid surface stability region S2 here is a region that is cooler than the vaporization region S1, but the temperature of the liquid surface stabilization region S2 and the vaporization region S1 may be substantially the same when the container 10 is small. .
- the liquid level stable region S2 does not have to be a region where the liquid level is not shaken at all, and the liquid level is shaken as long as the detection accuracy of the liquid level sensor 20 can be improved as compared with the conventional case. Alternatively, bubbles may be generated, or the liquid material X may be vaporized.
- the vaporization region S1 and the liquid surface stability region S2 of the present embodiment are formed by the arrangement of the heater 30 described above.
- the vaporization region S1 and the liquid surface stability region S2 are further divided.
- a partition member 40 for partitioning is provided in the vaporizer 100.
- the heater 30 is provided around a part of the vaporizing chamber S without surrounding the entire vaporizing chamber S.
- a region near the heater 30 and having a large amount of heat transfer becomes the vaporization region S1
- a region far from the heater 30 and a small amount of heat transfer becomes the liquid level stable region S2.
- the heater 30 is provided on a part of the side wall 11 of the container 10 and is disposed so as to partially heat the liquid material X.
- the heater 30 is not necessarily provided on the side wall 11, and may be provided near the side wall 11, or may be separated from the side wall 11 as long as the liquid material X can be vaporized. That is, the heater 30 may be provided integrally with the side wall 11, or may be formed separately from the side wall 11 and provided away from the side wall 11.
- the container 10 of the present embodiment has a rectangular parallelepiped shape, and as shown in FIG. 3, a first side wall 111 and a second side wall 112 facing each other, and a third side wall interposed between them and facing each other. 113 has a fourth side wall 114. Therefore, in the present embodiment, the heater 30 is provided on the second side wall 112 without being provided on the first side wall 111. Whether or not the heater 30 is provided on the third side wall 113 or the fourth side wall 114 may be appropriately selected. However, in the case where it is provided, at least the first side wall of the third side wall 113 or the fourth side wall 114 is provided. It is preferable to provide it on the second side wall 112 side without providing it on the 111 side.
- a second heater 32 that heats the material gas vaporized from the liquid material X is provided above the container 10.
- the third heater 33 for improving the efficiency of vaporization of the liquid material X is provided in the lower part of the container 10.
- the 1st heater 31, the 2nd heater 32, and the 3rd heater 33 may each be a separate thing, and a part or all may be formed integrally.
- the second heater 32 suppresses liquefaction of the material gas, and is provided at least on the vaporization region S1 side of the upper wall 13 of the container 10.
- the second heater 32 may be provided from the vaporization region S1 side to the liquid surface stability region S2 side of the upper wall 13 or from the upper wall 13 to the upper part of the first side wall 111. May be. Further, the second heater 32 is not necessarily provided on the upper wall 13 and may be provided in the vicinity of the upper wall 13 as long as the liquefaction of the material gas can be suppressed. It may be away from 13.
- the third heater 33 heats the liquid material X and is provided on the vaporization region S1 side of the bottom wall 12 of the container 10.
- the third heater 33 is not necessarily provided on the bottom wall 12 and may be provided in the vicinity of the bottom wall 12.
- the third heater 33 is separated from the bottom wall 12 as long as the liquid material X can be heated. It doesn't matter.
- the partition member 40 is interposed between the vaporization region S1 and the liquid level stable region S2 in the container 10, and is liquid between the vaporization region S1 and the liquid level stable region S2.
- the material X is allowed to flow, and here, the material gas is also allowed to flow between the vaporization region S1 and the liquid level stable region S2.
- the partition member 40 is provided substantially parallel to the first side wall 111 and the second side wall 112, and here, provided between the third side wall 113 and the fourth side wall 114.
- it is a rectangular flat plate.
- the partition member 40 partitions these regions S1 and S2 so that the volumes of the vaporization region S1 and the liquid level stable region S2 are substantially the same.
- the shape and arrangement of the partition member 40, the volume ratio of the vaporization region S1 and the liquid surface stability region S2 partitioned by the partition member 40, and the like may be changed as appropriate.
- the lower end of the partition member 40 is separated from the bottom wall 12 to allow the liquid material X to flow through the gap, and the upper end of the partition member 40 is separated from the upper wall 13,
- the material gas can be communicated with each other.
- the liquid phase in the vaporization region S1 and the liquid phase in the liquid surface stability region S2 communicate with each other through the gap between the lower end of the partition member 40 and the bottom wall 12, and the vaporization region S1 through the gap between the upper end of the partition member 40 and the upper wall 13.
- the gas phase in the liquid surface stability region S2 communicate with each other.
- the liquid phase is a region where a liquid is present
- the gas phase is a region where a gas is present.
- the above-described liquid level sensor 20 is provided in the liquid level stable region S ⁇ b> 2, and specifically, the lower end of the liquid level sensor 20 is disposed below the upper end of the partition member 40.
- the liquid level stable region S2 is provided with the introduction port P1 described above.
- the introduction port P1 is formed in a position facing the first heater 31, that is, in the first side wall 111.
- the above-described outlet P2 is provided in the vaporization region S1, and is formed above the first heater 31 in the second side wall 112 here.
- the vaporization chamber S is partitioned into the vaporization region S1 and the liquid level stable region S2 by the arrangement of the heater 30 and the partition member 40, and the liquid level sensor 20 is divided. Is configured to detect the liquid level in the liquid level stable region S2, so that the fluctuation of the liquid level due to bubbling generated in the vaporization region S1 reaches the liquid level stable region S2, or in the vaporization region S1.
- the liquid material X scattered from the liquid level can be prevented from adhering to the liquid level sensor 20.
- the liquid level sensor 20 can accurately detect the liquid level of the liquid material X, and for example, the supply amount of the liquid material X can be accurately controlled based on the detected liquid level height. The remaining amount of the liquid material X in the container 10 can be accurately grasped.
- Such an operational effect is more prominent as the vaporizer 100 becomes smaller, but it goes without saying that the same operational effect can be obtained even with the large vaporizer 100.
- the material gas can pass between the vaporization region S1 and the liquid surface stability region S2, the pressures of the gas phase in the vaporization region S1 and the gas phase in the liquid surface stability region S2 are substantially the same, and the vaporization region S1.
- the liquid level in the liquid level stable region S2 can be maintained at substantially the same height.
- the material gas is heated by the second heater 32, liquefaction of the material gas can be suppressed.
- the outlet P2 is formed in the vaporization region S1, even if the material gas is liquefied, it is possible to prevent the liquefied liquid material X from being led out from the container 10, for example, by a mass flow controller or the like. The accuracy of flow control can be guaranteed.
- the inlet P1 is formed in the liquid level stable region S2, it is possible to prevent the liquid material X introduced into the container 10 from the inlet P1 from being vaporized all at once. Can prevent a sudden increase in pressure.
- the present invention is not limited to the above embodiment.
- the heater 30 is provided on the second side wall 112, but the heater 30 is not provided on the second side wall 112, and the partition in the bottom wall 12, that is, the vaporization region S 1 side in the bottom wall 12. It may be provided closer to the first side wall 111 than the member 40 (near the first side wall 111). That is, a configuration in which the third heater 33 is provided without providing the first heater 31 in the first embodiment may be adopted.
- the heater 30 is provided on the entire circumference of the side wall 11 of the container 10 (that is, the first side wall 111, the second side wall 112, the third side wall 113, and the fourth side wall 114), or Even if the heater 30 is provided on the entire bottom wall 12 of the container 10, the liquid level stable region S2 only needs to be configured to have a lower temperature than the vaporization region S1. Specifically, the heater 30 is configured such that the heating capability for the liquid level stable region S2 is lower than the heating capability for the vaporization region S1, or the cooling mechanism is provided in the liquid level stable region S2. Etc.
- the partition member 40 does not have to extend over the third side wall 113 and the fourth side wall 114, and is separated from one or both of the third side wall 113 and the fourth side wall 114 as shown in FIG. For example, it may be attached to the bottom wall 12.
- the partition member 40 of the above embodiment partitions the vaporization region S1 and the liquid surface stability region S2 while allowing the material gas to flow between the vaporization region S1 and the liquid surface stability region S2. If the gas phase in the region S2 is opened to the atmosphere, the material gas may not be allowed to flow between the vaporization region S1 and the liquid level stable region S2.
- the introduction port P ⁇ b> 1 may be formed on the vaporization region S ⁇ b> 1 side, for example, on the vaporization region S ⁇ b> 1 side in the second sidewall 112, the third sidewall 113, or the fourth sidewall 114. It may be formed.
- the liquid material X since the liquid material X is not directly introduced into the liquid level stable region S2, it is possible to suppress the liquid level of the liquid level stable region S2 from being shaken by the introduction of the liquid material X.
- the outlet P ⁇ b> 2 may be formed on the liquid surface stability region S ⁇ b> 2 side, for example, the upper end of the first side wall 111, the third side wall 113, or the fourth side wall 114. May be formed at the upper end on the liquid level stable region S2 side.
- the outlet P2 can be moved away from the liquid level of the vaporization region S1, and even if the liquid material X is scattered on the liquid level in the vaporization region S1, the scattered liquid material X is directed to the outlet P2. It can suppress reaching.
- the vaporizer 100 has a first container 10 ⁇ / b> A in which a vaporized region S ⁇ b> 1 is formed, a liquid level stable region S ⁇ b> 2 formed in the interior, and communicates with the first container 10 ⁇ / b> A.
- the second container 10B may be provided, and the liquid level sensor 20 may be provided in the second container 10B.
- first container 10A and the second container 10B are spaced apart from each other via the space S3, and here are tubular members provided so that the tube axis directions are parallel to each other. is there.
- the first container 10A is provided with a heater 30 (rubber heater or winding heater) on the outer periphery thereof, and its upper end communicates with a lead-out port P2 through which material gas is derived.
- the liquid level sensor 20 is inserted, and the lower end of the second container 10B communicates with the introduction port P1 through which the liquid material X is introduced.
- the first container 10A and the second container 10B have their upper ends communicating with each other and their lower ends communicating with each other, so that the gas phase of the first container 10A and the gas phase of the second container 10B are While communicating, it is comprised so that the liquid phase of 1st container 10A and the liquid phase of 2nd container 10B may communicate.
- the partition member 40 may be inclined with respect to the first side wall 111 and the second side wall 112. Specifically, the partition member 40 is provided below the liquid level sensor 20, and is arranged so as to be separated from the liquid level sensor 20 when bubbles generated in the vaporization region S ⁇ b> 1 float along the partition member 40. Yes.
- the heater 30 is provided on the second side wall 112 side of the bottom wall 12, and the partition member 40 gradually increases from the first side wall 111 toward the second side wall 112. So as to be inclined. Even in such a configuration, the vaporization region S1 and the liquid surface stability region S2 can be formed in the container 10 when viewed from the direction of the surface of the water surface. It becomes possible to detect the liquid level with high accuracy.
- the vaporizer 100 may not include the partition member 40.
- the vaporizer 100 has a horizontally long container 10 with a heater 30 at one end in the longitudinal direction and a liquid level at the other end in the longitudinal direction.
- Examples include a configuration in which the sensor 20 is provided. With this configuration, the vaporization chamber S of the container 10 is formed such that one end portion in the longitudinal direction is formed as the vaporization region S1, and the other end portion in the longitudinal direction is formed as the liquid level stable region S2. It arrange
- the liquid level of the liquid material in the container can be detected with high accuracy.
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Abstract
Description
なお、ここでいう液面安定領域は、液面が全く揺れていない領域には限られず、液面センサによる検出精度が従来よりも向上できる程度であれば液面が揺れていても構わない。 In the case of the vaporization apparatus configured as described above, the vaporization region and the liquid level stable region are formed when the inside of the container is viewed from above, and the liquid level in the liquid level stable region is detected by the liquid level sensor. Therefore, the liquid level of the liquid material in the container can be detected with high accuracy.
The liquid level stable region here is not limited to a region where the liquid level is not shaken at all, and the liquid level may be shaken as long as the detection accuracy by the liquid level sensor can be improved as compared with the conventional case.
このような構成であれば、容器内においてヒータが配置されている側を積極的に加熱することができ、ヒータ側に気化領域を形成するとともに、ヒータの反対側に液面安定領域を形成することができる。その結果、気化領域の液面で生じた揺れを液面安定領域に到達するまでに低減させることができたり、気化領域の液面から飛散した液体材料を液面センサに到達させないようにすることができたりするので、液体材料の液面を精度良く検出することが可能になる。 As a more specific embodiment, there is a configuration in which the heater is provided in a part of the side wall of the container or in the vicinity thereof.
With such a configuration, the side on which the heater is disposed in the container can be positively heated, and a vaporization region is formed on the heater side and a liquid level stable region is formed on the opposite side of the heater. be able to. As a result, it is possible to reduce the fluctuation generated at the liquid level in the vaporization area before reaching the liquid level stable area, or to prevent the liquid material scattered from the liquid level in the vaporization area from reaching the liquid level sensor. Therefore, it is possible to detect the liquid level of the liquid material with high accuracy.
このような構成であれば、気化領域の液面の揺れや気化領域の液面から飛散した液体材料が液面安定領域に到達してしまうことを仕切部材によってより確実に防ぐことができる。 It is preferable to further comprise a partition member that partitions the vaporization region and the liquid level stable region so that the liquid material can flow between these regions.
With such a configuration, the partition member can more reliably prevent the liquid material in the vaporization region from shaking and the liquid material scattered from the liquid surface in the vaporization region from reaching the liquid surface stable region.
そこで、材料ガスの液化を抑えるためには、前記容器の上部に設けられて、前記液体材料が気化されてなる材料ガスを加熱するヒータを具備することが好ましい。 By the way, when the material gas obtained by vaporizing the liquid material condenses and liquefies in the container, the liquid material is led out from the container together with the material gas, and for example, the flow rate of the material gas may not be accurately controlled. There is.
Therefore, in order to suppress the liquefaction of the material gas, it is preferable to include a heater provided on the upper portion of the container for heating the material gas obtained by vaporizing the liquid material.
そこで、容器内の急激な圧力上昇を避けるためには、前記液体材料を前記容器内に導入する導入口が、前記容器の前記液面安定領域側に形成されていることが好ましい。 When the liquid material is introduced into the vaporization region, the introduced liquid material is vaporized all at once, and the pressure in the container rapidly increases. For example, the flow rate of the material gas cannot be accurately controlled. There is a fear.
Therefore, in order to avoid a sudden increase in pressure in the container, it is preferable that an inlet for introducing the liquid material into the container is formed on the liquid surface stable region side of the container.
このような気化システムであれば、液面センサによって液体材料の液面を精度良く検出することができるので、制御装置による液体材料の供給量の制御を向上させることができる。 Further, the vaporization system according to the present invention is configured to control the supply amount of the liquid material based on the vaporization device described above, a liquid material supply device that supplies the liquid material to the vaporization device, and a detection signal of the liquid level sensor. And a control device for controlling.
With such a vaporization system, the liquid level of the liquid material can be detected with high accuracy by the liquid level sensor, so that the control of the supply amount of the liquid material by the control device can be improved.
X ・・・液体材料
10 ・・・容器
20 ・・・液面センサ
30 ・・・ヒータ
P1 ・・・導入口
P2 ・・・導出口
11 ・・・側壁
S1 ・・・気化領域
S2 ・・・液面安定領域
40 ・・・仕切部材 DESCRIPTION OF
具体的には、気化装置100内の液体材料Xの液面を後述する液面センサ20が検出して、その検出信号に基づいて図示しない制御装置が導入路L1に設けられた開閉弁V1の開度を調整することで、液体材料Xの供給量を制御できるようにしてある。
また、導出路L2には、例えば差圧式又は熱式のマスフローコントローラ等の流量制御装置MFCが設けられており、導出路L2を流れる材料ガスの流量を例えば予め設定した目標流量に制御できるようにしてある。なお、流量制御装置MFCを構成する制御弁に上述した開閉弁V2としての機能を備えさせることができ、その場合は必ずしも開閉弁V2を設ける必要はない。 The introduction path L1 and the lead-out path L2 are provided with on-off valves V1 and V2, respectively. By opening and closing these on-off valves V1 and V2 according to circumstances, for example, the liquid material X is introduced into the
Specifically, a liquid level sensor 20 (to be described later) detects the liquid level of the liquid material X in the
In addition, a flow rate control device MFC such as a differential pressure type or a thermal type mass flow controller is provided in the lead-out path L2, so that the flow rate of the material gas flowing through the lead-out path L2 can be controlled to a preset target flow rate, for example. It is. In addition, the control valve which comprises the flow control apparatus MFC can be provided with the function as the above-mentioned on-off valve V2, and in that case, it is not necessary to provide the on-off valve V2.
具体的にこの液面センサ20は、容器10の上壁13に設けられた挿通孔から容器10内に挿通された接触式のものであり、サーミスタ等の測温抵抗体(不図示)を備え、液相と気相とで熱放散定数が異なることを利用して液面を検出できるように構成されている。 The
Specifically, the
ここでのヒータ30は、容器10の側壁11の一部に設けられており、液体材料Xを部分的に加熱するように配置されている。なおヒータ30は、必ずしも側壁11に設けられている必要はなく、側壁11の近傍に設けられていても構わないし、液体材料Xを気化できる程度であれば側壁11から離れていても構わない。すなわち、ヒータ30は、側壁11と一体的に設けられていても良いし、側壁11とは別体として形成されて側壁11から離れて設けられていても良い。 More specifically, the
Here, the
なお、第1ヒータ31、第2ヒータ32及び第3ヒータ33は、それぞれ別体のものであっても良いし、一部又は全部が一体に形成されたものであっても良い。 In the present embodiment, as shown in FIG. 2, in addition to the above-described heater 30 (hereinafter also referred to as the first heater 31), a
In addition, the 1st heater 31, the
一方、気化領域S1には、上述した導出口P2が設けられており、ここでは第2の側壁112における第1ヒータ31の上方に形成されている。 Here, the above-described
On the other hand, the above-described outlet P2 is provided in the vaporization region S1, and is formed above the first heater 31 in the
その結果、液面センサ20によって液体材料Xの液面を精度良く検出することが可能となり、検出された液面高さに基づいて例えば液体材料Xの供給量を精度良く制御することができたり、容器10内の液体材料Xの残量を精度良く把握することができたりするようになる。かかる作用効果は、気化装置100が小型化するほどより顕著に発揮されるが、大型の気化装置100であっても同様の作用効果が得られることはいうまでもない。 According to the
As a result, the
具体的には、ヒータ30が、気化領域S1に対する加熱能力よりも、液面安定領域S2に対する加熱能力の方が低くなるように構成されたものや、液面安定領域S2に冷却機構を設ける構成などが挙げられる。 Further, as the
Specifically, the
このような構成であれば、液体材料Xが液面安定領域S2に直接導入されないので、液体材料Xの導入によって液面安定領域S2の液面が揺れてしまうことを抑えることができる。 Furthermore, as shown in FIG. 4, the introduction port P <b> 1 may be formed on the vaporization region S <b> 1 side, for example, on the vaporization region S <b> 1 side in the
With such a configuration, since the liquid material X is not directly introduced into the liquid level stable region S2, it is possible to suppress the liquid level of the liquid level stable region S2 from being shaken by the introduction of the liquid material X.
このような構成であれば、導出口P2を気化領域S1の液面から遠ざけることができ、気化領域S1における液面で液体材料Xが飛散したとしても、飛散した液体材料Xが導出口P2に到達してしまうことを抑えることができる。 On the other hand, as shown in FIG. 4, the outlet P <b> 2 may be formed on the liquid surface stability region S <b> 2 side, for example, the upper end of the
With such a configuration, the outlet P2 can be moved away from the liquid level of the vaporization region S1, and even if the liquid material X is scattered on the liquid level in the vaporization region S1, the scattered liquid material X is directed to the outlet P2. It can suppress reaching.
第1容器10Aは、その外周部にヒータ30(ラバーヒータや巻線ヒータ)が設けられており、その上端部が材料ガスを導出する導出口P2に連通している。
第2容器10Bは、その内部に液面センサ20が挿通されており、その下端部が液体材料Xを導入する導入口P1に連通している。 More specifically, the
The
In the
このような構成であっても、水面の面方方向から視て、容器10内に気化領域S1及び液面安定領域S2を形成することができるので、液面センサ20によって液面安定領域S2における液面を精度良く検出することが可能となる。 As yet another embodiment, as shown in FIG. 6, the
Even in such a configuration, the vaporization region S1 and the liquid surface stability region S2 can be formed in the
具体的にこのような気化装置100としては、図7に示すように、容器10が横長のものであって、その長手方向一端部にヒータ30が設けられるとともに、長手方向他端部に液面センサ20が設けられている構成が挙げられる。かかる構成により、容器10の気化室Sは、長手方向一端部側が気化領域S1として形成されるとともに、長手方向他端部側が液面安定領域S2として形成され、液面センサ20が液面安定領域S2の液面を検出するように配置されている。
このような構成であれば、気化領域S1における液面から飛散した液体材料Xが、液面センサ20に到達してしまうことを防ぐことができ、液体材料Xの液面を精度良く検出することが可能になる。 Moreover, the
Specifically, as shown in FIG. 7, the
With such a configuration, it is possible to prevent the liquid material X scattered from the liquid level in the vaporization region S1 from reaching the
According to the present invention, the liquid level of the liquid material in the container can be detected with high accuracy.
Claims (9)
- 液体材料を収容する容器と、
前記容器内の前記液体材料を加熱するヒータと、
前記容器内の前記液体材料の液面を検出する液面センサとを具備し、
前記容器内を上方から視て、前記液体材料が気化される気化領域と、液面安定領域とが形成されており、
前記液面センサが、前記液面安定領域における前記液体材料の液面を検出する気化装置。 A container containing a liquid material;
A heater for heating the liquid material in the container;
A liquid level sensor for detecting the liquid level of the liquid material in the container,
When the inside of the container is viewed from above, a vaporization region in which the liquid material is vaporized and a liquid level stable region are formed,
The vaporization device in which the liquid level sensor detects the liquid level of the liquid material in the liquid level stable region. - 前記ヒータが、前記容器の前記気化領域側の側壁又はその近傍に設けられている請求項1記載の気化装置。 The vaporizer according to claim 1, wherein the heater is provided on a side wall of the container on the vaporization region side or in the vicinity thereof.
- 前記気化領域及び前記液面安定領域を、これらの領域間で前記液体材料を流通可能に仕切る仕切部材をさらに具備する請求項1記載の気化装置。 The vaporizer according to claim 1, further comprising a partition member that partitions the liquid material and the liquid level stable region so that the liquid material can flow between these regions.
- 前記仕切部材が、前記気化領域及び前記液面安定領域を、これらの領域間で前記液体材料が気化されてなる材料ガスを流通可能に仕切る請求項3記載の気化装置。 4. The vaporizer according to claim 3, wherein the partitioning member partitions the gas region and the liquid level stable region so that a material gas obtained by vaporizing the liquid material can be circulated between these regions.
- 単位体積当たりの単位時間当たりに与えられる熱量が、前記気化領域よりも前記液面安定領域の方が少ないように構成されている請求項1記載の気化装置。 The vaporizer according to claim 1, wherein the amount of heat given per unit time per unit volume is configured to be smaller in the liquid level stable region than in the vaporized region.
- 前記容器の上部に設けられて、前記液体材料が気化されてなる材料ガスを加熱するヒータを具備する請求項1記載の気化装置。 The vaporizer according to claim 1, further comprising a heater provided on an upper portion of the container for heating a material gas obtained by vaporizing the liquid material.
- 前記液体材料が気化されてなる材料ガスを前記容器から導出する導出口が、前記容器の前記気化領域側に設けられている請求項1記載の気化装置。 The vaporization apparatus according to claim 1, wherein a lead-out port through which the material gas obtained by vaporizing the liquid material is led out from the container is provided on the vaporization region side of the container.
- 前記液体材料を前記容器内に導入する導入口が、前記容器の前記液面安定領域側に形成されている請求項1記載の気化装置。 The vaporizer according to claim 1, wherein an inlet for introducing the liquid material into the container is formed on the liquid surface stable region side of the container.
- 請求項1記載の気化装置と、
前記気化装置に前記液体材料を供給する液体材料供給装置と、
前記液面センサの検出信号に基づいて、前記液体材料の供給量を制御する制御装置とを具備する気化システム。 A vaporizer according to claim 1;
A liquid material supply device for supplying the liquid material to the vaporizer;
A vaporization system comprising: a control device that controls a supply amount of the liquid material based on a detection signal of the liquid level sensor.
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CN201880011617.XA CN110337326A (en) | 2017-04-13 | 2018-03-16 | Gasification installation and gasification system |
JP2019512396A JP7148497B2 (en) | 2017-04-13 | 2018-03-16 | Vaporizer and vaporization system |
US16/490,740 US20200018476A1 (en) | 2017-04-13 | 2018-03-16 | Vaporization device and vaporization system |
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JP2021030216A (en) * | 2019-08-23 | 2021-03-01 | 廣化科技股▲分▼有限公司 | Pure formic acid gas supplying device, pure-formic-acid-gas-supplied soldering system, and method for supplying pure formic acid gas |
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CN110337326A (en) | 2019-10-15 |
US20200018476A1 (en) | 2020-01-16 |
JP7148497B2 (en) | 2022-10-05 |
JPWO2018190074A1 (en) | 2020-02-27 |
KR20190132350A (en) | 2019-11-27 |
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