US20160204714A1 - Variable-Voltage Self-Synchronizing Rectifier Circuits, Methods, and Systems - Google Patents

Variable-Voltage Self-Synchronizing Rectifier Circuits, Methods, and Systems Download PDF

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US20160204714A1
US20160204714A1 US14/935,336 US201514935336A US2016204714A1 US 20160204714 A1 US20160204714 A1 US 20160204714A1 US 201514935336 A US201514935336 A US 201514935336A US 2016204714 A1 US2016204714 A1 US 2016204714A1
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base
voltage
collector
drive
emitter
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William C. Alexander
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Ideal Power Inc
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Ideal Power Inc
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    • HELECTRICITY
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    • H03K17/00Electronic switching or gating, i.e. not by contact-making and –breaking
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    • H03K17/56Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
    • H03K17/60Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being bipolar transistors
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    • H03K17/66Switching arrangements for passing the current in either direction at will; Switching arrangements for reversing the current at will
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    • H03K17/687Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices the devices being field-effect transistors
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Definitions

  • the present application relates to power switching methods, and particularly to circuits and methods for operation of bipolar power switching transistors which have two distinct and independent base connections.
  • B-TRANs Such transistors are referred to as “B-TRANs.”
  • the transistor preferably uses the bulk of a semiconductor die as a base region, and has two emitter/collector regions on opposite faces of the die. Two distinct base contact regions are also provided—one on each face of the die. Thus, for example, with a p-type semiconductor die, each face would include an n+ emitter/collector region and a p-type base contact region. Isolation trenches and peripheral field-limiting rings are preferably also included, but in essence this is a four-terminal three-layer device.
  • FIG. 6 An example of this published structure is generally illustrated in FIG. 6 .
  • both faces of a semiconductor die 610 carry emitter/collector regions 622 which form a junction with the bulk substrate 610 .
  • Base contact regions 632 are also present on both faces.
  • This example shows an npn structure, so the emitter/collector regions 622 are n-type, and the base contact regions 632 are p-type.
  • a shallow n+ contact doping 624 provides ohmic contact from separate terminals EC 1 and EC 2 (on the two opposite faces of the semiconductor die, in this example) to regions 622
  • a shallow p+ contact doping 634 provides ohmic contact from separate terminals B 1 and B 2 (on the two opposite faces of the die) to regions 632 .
  • dielectric-filled trenches 640 provide lateral separation between base contact regions 632 and emitter/collector regions 622 .
  • a p-type diffused region may be added to reduce the series resistance between the emitter-to-base junction and the base contact.
  • B-TRANs can provide significantly better efficiency than is conventionally available for existing static transfer switches; for example, a 1200V B-TRAN has an expected system efficiency of 99.9%.
  • Application US 2014-0375287 also describes some surprising aspects of operation of this kind of device. Notably: 1) when the device is turned on, it is preferably first operated merely as a diode, and base drive is then applied to reduce the on-state voltage drop. 2) Base drive is preferably applied to the base nearest whichever emitter/collector region will be acting as the collector (as determined by the external voltage seen at the device terminals). This is very different from typical bipolar transistor operation, where the base contact is (typically) closely connected to the emitter-base junction. 3) A two-stage turnoff sequence is preferably used.
  • the transistor In the first stage of turnoff, the transistor is brought out of full bipolar conduction, but still is connected to operate as a diode; in the final state of turnoff diode conduction is blocked too. 4) In the off state, base-emitter voltage (on each side) is limited by an external low-voltage diode which parallels that base-emitter junction. This prevents either of the base-emitter junctions from getting anywhere close to forward bias, and avoids the degradation of breakdown voltage which can occur otherwise.
  • the B-TRAN is a fully symmetric device, there is no difference between the two emitter/collector regions.
  • the externally applied voltage will determine which side is (instantaneously) acting as the emitter, and which is acting as the collector.
  • the two base contact terminals are accordingly referred as the “e-base” and “c-base”, where the c-base terminal is on the side of the device which happens to be the collector side at a given moment.
  • FIGS. 3A-3F (taken from published application 2014-0375287) show an example of the operating sequence as disclosed in that application.
  • FIG. 3A shows a sample equivalent circuit for one exemplary NPN BTRAN.
  • Body diodes 312 A and 312 B can correspond to e.g. the upper and lower P-N junctions, respectively. In, for example, the sample embodiment of FIG. 1A , these can correspond to the junctions between emitter/collector regions 104 A and base regions 102 A.
  • Switches 314 A and 314 B can short respective base terminals 108 A and 108 B to respective emitter/collector terminals 106 A and 106 B.
  • a BTRAN can have six phases of operation in each direction, as follows.
  • a typical forward voltage drop (Vf) at a typical current density of e.g. 200 A/cm 2 can have a magnitude of e.g. 1.0 V.
  • the conductivity of the drift region is increased, as in e.g. FIG. 3D .
  • base terminal B 2 is disconnected from terminal T 2 by opening switch 314 B.
  • Base terminal B 2 is then connected to a source of positive charge by switch 316 B.
  • the source of positive charge can be, e.g., a capacitor charged to +1.5 VDC.
  • base terminal B 2 is disconnected from the positive power supply and connected instead to emitter terminal T 2 , opening switch 316 B and closing switch 314 B.
  • This causes a large current to flow out of the drift region, which in turn rapidly takes the device out of saturation.
  • Closing switch 314 A connects base terminal B 1 to collector terminal T 1 , stopping electron injection at upper P-N junction 312 A. Both of these actions rapidly remove charge carriers from the drift region while only slightly increasing forward voltage drop Vf.
  • body diodes 312 A and 312 B are both functionally bypassed.
  • full turn-off can occur, as seen in e.g. FIG. 3F .
  • Full turn-off can begin by opening switch 314 B, disconnecting base terminal B 2 from corresponding terminal T 2 . This causes a depletion region to form from lower P-N diode junction 312 B as it goes into reverse bias. Any remaining charge carriers recombine, or are collected at the upper base. The device stops conducting and blocks forward voltage.
  • steps 1 - 6 can, when modified appropriately, used to operate the device in the opposite direction.
  • Steps 1 - 6 can also be modified to operate a PNP BTRAN (e.g. by inverting all relevant polarities).
  • the present application teaches, among other innovations, methods and circuits for operating a B-TRAN, and modules and systems incorporating some or all of these innovations.
  • the present inventor has discovered, surprisingly, that when a B-TRAN is being operated in full-ON transistor mode (i.e. with low voltage drop and high current flow) the collector-side base contact (i.e. the “c-base”) has a high impedance, up to the point where the current flow on the c-base starts to increase significantly. At that point the transistor is already operating with a very low voltage drop, and increased c-base current will degrade gain without much improvement in voltage drop.
  • the preferred base drive circuit operates as a voltage-source drive to the c-base (i.e. to the base contact on whichever side of the device is operating as the collector at a given moment).
  • the preferred implementation of the drive circuit is operated by control signals to also provide diode-mode turn-on and pre-turnoff operation.
  • two separate subcircuits are used, on each of the bases, for drive in different modes: one subcircuit provides an adjustable voltage for c-base drive in full-ON transistor mode, and the other subcircuit clamps one or both bases to the corresponding emitter/collector regions in diode-on mode or in pre-turnoff mode.
  • power for the base drive circuit is provided by a self-synchronizing rectifier circuit.
  • the base drive voltage used to drive the c-base region (on the collector side) is varied while the base current at that terminal is monitored, so that no more base current than necessary is applied. This avoids reduced gain, and solves the difficult challenge of optimizing base drive in a B-TRAN.
  • FIG. 1A shows one exemplary embodiment of a base drive circuit according to the present inventions.
  • FIG. 1B shows one sample embodiment of a base drive circuit according to the present inventions.
  • FIG. 1C shows exemplary waveforms during operation of the embodiment of FIG. 1A .
  • FIG. 2 shows one sample embodiment of a variable-voltage self-synchronous rectifier.
  • FIGS. 3A, 3B, 3C, 3D, 3E, and 3F show sample equivalent circuits for an exemplary B-TRAN in various stages of operation.
  • FIG. 4 shows a partial device model according to one sample embodiment of the present inventions.
  • FIG. 5 shows how the base current I CB on the c-base varies with c-base bias V CB under operating conditions.
  • FIG. 6 shows one sample embodiment of a B-TRAN.
  • B-TRANs novel bidirectional bipolar transistors known as “B-TRANs.”
  • the operating cycle of a B-TRAN includes, in succession, a “diode turn-on” (or “diode-ON”) state, a low-V ce or “transistor-ON” state, a “pre-turnoff” state, and an “active OFF” state.
  • the B-TRAN also has a “passive-OFF” state, which keeps its blocking voltage high when normal operation is not happening.
  • the present application describes improvements in the operation of these devices.
  • One area of improvement has been in the fully ON state (the “transistor-ON” state).
  • An important advantage of the B-TRAN is its low voltage drop V CE when fully on. However, it is desirable to maintain a high value for device gain. It is also desirable to keep the device's switching speed and reverse recovery fast. These improvements have been achieved by a better understanding of the device's behavior in the fully ON state.
  • NPN B-TRAN NPN B-TRAN
  • the physical base is provided by the bulk of the p-type semiconductor die, and the base contact regions are p-type (with p+ contact doping).
  • the two emitter/collector regions are n+, and whichever emitter/collector region sees a more positive external voltage will be the collector side. (The principles of operation are the same for PNP B-TRAN devices, with opposite polarity; in such devices the side which sees the more negative external voltage will be the collector side.)
  • the base contact region on the collector side will be referred to as the “c-base,” and the other base contact region (on the emitter side) will be referred to as the “e-base.” These base contact regions are not physically different, but behave very differently when an externally applied voltage is present.
  • the fully ON state is reached by applying elevated drive voltage to the c-base.
  • This provides a low on-state voltage drop with good gain, without reducing the breakdown voltage.
  • Device gain is measured as beta, i.e. the ratio of emitter current to base current, but the behavior of the transistor under c-base drive is very different from that of other power bipolar junction transistors.
  • FIG. 4 shows a partial device model, with a table of values for c-base bias V CB and corresponding voltage drop V CE across the external terminals.
  • the collector/emitter terminal at the top of the figure is assumed to be the collector (i.e. connected to the more positive external voltage), so the base contact which is shown connected to the variable voltage source is the c-base.
  • FIG. 5 shows how the base current I CB on the c-base varies with c-base bias V CB under operating conditions. It should be noted that current I CB is nearly flat over a wide range of values for V CB .
  • FIGS. 4 and 5 shows important features of operation.
  • the device's voltage drop V CE will come down to its desired low value when c-base bias V CB gets up to its optimal operating point (defined as described below), but the current on the c-base stays nearly constant as c-base bias is increased to this point.
  • the c-base terminal has a very high impedance until its bias is increased to the point where the impedance drops. At this point, the device's series resistance is low, as desired.
  • the e-base In the transistor-on state, the e-base is essentially at a constant voltage—it varies only about 0.1 V from a low drive to a high drive condition.
  • the c-base in contrast, is a nearly constant current drive, even as the voltage is varied from 0 V above the collector to about 0.6V above the collector.
  • V CE instead of the c-base current changing with c-base voltage, V CE changes.
  • a c-base bias of 0V c-base shorted to collector
  • Vce is nominally 0.9 V over a large range of current density.
  • Raising the c-base bias to 0.1 V above the collector does not change the gain, but it lowers Vce by nominally 0.1 V.
  • Raising c-base bias to 0.6V drops Vce to about 0.2 or 0.3 V.
  • a voltage source is advantageously used, as in the sample embodiment of FIG. 1A , not a current source.
  • the differential impedance, in terms of di/dv, of the c-base itself is high.
  • the c-base drive current changes very little with c-base to collector voltage V CB over a wide range of values, until V CB gets close to forward biasing the collector/base junction (over 0.6V at 25C in silicon). That is why a voltage-source-type drive is needed.
  • C-base current I CB changes with emitter current, increasing with increased emitter current even when V CB remains constant, but not much with changing V CB (up until a value of V CB where I CB begins to increase undesirably).
  • the impedance of the e-base is very low, as it keeps a nearly constant voltage while the c-base current is varied.
  • FIG. 1A shows a first example of a complete switch 100 , including an NPN B-TRAN transistor 106 as well as diode-mode drive circuitry 110 and transistor-mode drive circuitry 130 .
  • the half at the top of the page will be assumed to be the collector side, i.e. to be seeing the positive side of the applied voltage.
  • FIG. 1C shows an example of waveforms during the operation of the circuit of FIG. 1A .
  • the gate of NMOS S 12 is low, and the gate of NMOS S 13 is high. This enables the diode-turn-on mode described e.g. in published application US2014-0375287.
  • NMOS transistors S 22 and S 23 remain off.
  • the current I T across the emitter/collector terminals turns on quickly, and voltage V CE across the emitter/collector terminals, which is assumed to have been ramping up under external drive, is brought down to approximately a diode drop (plus some ohmic drop, for a total of about 0.8V in silicon).
  • S 12 is turned on while S 13 is turned off S 12 is connected to a variable-voltage source 190 , which is derived from the collector terminal as described below.
  • This voltage at the c-base drives the transistor into its low-voltage-drop state, where the voltage drop V CE is 0.3V or less. This phase continues for as long as drive current is needed.
  • switch S 12 is turned off, and switches S 13 and S 23 are both turned on. This immediately bumps the voltage drop up to a diode drop, but the device current I T remains at a level determined by emitter current density. If this current is not enough to clamp the voltage of the external load, the applied voltage will increase as shown.
  • switch S 13 is turned off, but switch S 23 remains on. This cuts off device current I T , and the voltage on the device goes up to whatever is dictated by the external connections.
  • switch S 23 was never turned on during this sequence. This switch would be turned on to achieve the transistor-on mode when the external voltage has reversed (so that the emitter/collector terminal node at the top of the page is then the emitter side rather than the collector side).
  • FIG. 2 shows one sample embodiment of a variable-voltage self-synchronous rectifier, which can be advantageously used in the sample embodiment of FIG. 1A .
  • a variable-voltage supply 210 (which in the example shown is a simple buck converter) provides an adjustable supply voltage to oscillator 220 .
  • Oscillator 220 drives a first winding 232 of a transformer 230 .
  • a first secondary winding 234 provides complementary outputs A and B, which are synchronous with the transitions of oscillator 220 , plus the phase shift due to coupling through the transformer 230 .
  • Another secondary winding 236 provides a higher-current and lower-voltage waveform, corresponding to the output of oscillator 220 (with voltage shifted).
  • the output of the two secondary windings is synchronous, so that the control signals A and B can be used to drive the synchronous inverter 240 .
  • the control signals A and B are preferably scaled to provide appropriate gate voltages for the four transistors of the synchronous inverter, e.g. 5V.
  • a 24V DC supply has been efficiently translated into a very-low-voltage DC output whose voltage can be varied.
  • the voltage applied to the c-base terminal can be adjusted.
  • the bias on the c-base terminal is optimized by adjusting it to the point where base current is no longer constant.
  • the c-base contact is high impedance, meaning that the current I CB going into the c-base is nominally constant, when the device is on, until V CB gets close to forward biasing the base-collector junction.
  • V CE is well below a diode drop (nominally 0.2V), and I CB starts increasing rapidly with small additional increases in V CB , as shown below.
  • V CB is dynamically varied, or “dithered”, to find the Optimal Operating Point.
  • the Optimal Operating Point should fall where I CB has increased some small but measurable amount above the flat portion of the I CB /V CB curve. This is done by finding a V CB where the slope of the curve is some optimal value.
  • V CB the optimal value for the “transconductance”
  • a baseline value for I CB can be found in diode mode, and then a target value is calculated, e.g. by increasing the baseline current value by 10% or 20% or 30%.
  • Voltage V CB is then increased in small steps, e.g. in 1% increments, until the measured collector current reaches the target value.
  • two limit values can be calculated, and the control voltage V CB ramped back down when the upper limit value for I CB is reached during operation.
  • this dithering process can be repeated at short intervals when the transistor is in the ON state for long periods of time.
  • FIG. 1B shows an example of a more complete base drive circuit. This is slightly different from the drive circuit of FIG. 1A in that antiparallel diodes are connected with the body diodes in two of the MOS transistors in the diode-mode drive circuitry 110 . Moreover, FIG. 1B also shows the JFET plus Schottky branches which form the passive-off protection circuitry 120 .
  • a B-TRAN is in the “active off-state” when the e-base (base on emitter side) is shorted to the emitter, and the c-base (base on the collector side) is open.
  • the collector is the anode (high voltage side)
  • the emitter is the cathode (low voltage side).
  • the B-TRAN is also off when both bases are open, but due to the high gain of the B-TRAN in this state, the breakdown voltage is low.
  • the series combination of a normally-ON JFET and a Schottky diode attached between each base on its respective emitter/collector, as previously disclosed, will significantly increase the blocking voltage in this “passive off-state”.
  • the JFETs are turned off during normal operation.
  • B-TRAN turn-on is to simultaneously, from the active off-state and blocking forward voltage, open the e-base to emitter short while shorting the c-base to the collector. This immediately introduces charge carriers into the highest field region of the depletion zone around the collector/base junction, so as to achieve very fast, forward biased turn-on for hard switching, very similar to IGBT turn-on.
  • the e-base is disconnected from the emitter, and connected to a current or voltage source of sufficient voltage to inject charge carriers into the base region. This method is likely slower, since the charge carriers go into the base just below the depletion zone. Also, it is known that carrier injection into the e-base results in inferior gain relative to carrier injection into the c-base.
  • Vce is more than a diode drop.
  • turn-on goes to the second stage of increased charge injection into the c-base via a voltage or current source.
  • the amount of increased charge injection determines how much V CE is reduced below a diode drop. Injection into the e-base will also reduce V CE , but the gain is much lower than with c-base injection.
  • Turn-off can be achieved by any of several methods.
  • the most advantageous method is a two-step process.
  • the first step the c-base is disconnected from the carrier injection power supply and shorted to the collector, while the previously open e-base is shorted to the emitter. This results in a large current flow between each base and its emitter/collector, which rapidly removes charge carriers from the drift region. This in turn results in a rising Vce as the resistivity of the drift region increases.
  • the connection between the c-base and the collector is opened, after which Vce increases rapidly as the depletion region forms around the collector/base junction.
  • turn-off can be achieved by simply opening the c-base and shorting the e-base to the emitter, but this will result in higher turn-off losses since the drift region (base) will have a high level of charge carriers at the start of depletion zone formation.
  • turn-off can be achieved by simply opening the c-base and leaving the e-base open, but this will result in the highest turn-off losses and also a low breakdown voltage.
  • the base drive uses only N-channel MOSFETs to drive the B-TRANs. This makes advantageous use of low MOSFET output voltage (less than 0.7V).
  • the input is most preferably variable voltage, which, with current sensing, can be used to determine the optimum base drive voltage.
  • Another sample embodiment can support higher voltages, but uses both N-channel and P-channel MOSFETs.
  • the present application teaches, among other innovations, methods and circuits for operating a B-TRAN (double-base bidirectional bipolar junction transistor).
  • a base drive circuit is described which provides high-impedance drive to the base contact region on whichever side of the device is operating as the collector (at a given moment).
  • the B-TRAN unlike other bipolar junction transistors, is controlled by applied voltage rather than applied current.
  • the preferred implementation of the drive circuit is operated by control signals to provide diode-mode turn-on and pre-turnoff operation, as well as a hard ON state with a low voltage drop (the “transistor-ON” state).
  • an adjustable low voltage for the gate drive circuit is provided by a self-synchronizing rectifier circuit.
  • the base drive voltage used to drive the c-base region (on the collector side) is varied while the base current at that terminal is monitored, so that no more base current than necessary is applied. This solves the difficult challenge of optimizing base drive in a B-TRAN.
  • a system for power switching comprising: a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations; and first and second transistor-mode drive circuits, separately connected to the first and second base contact regions respectively; wherein each drive circuit is configured, as a voltage source, to selectably apply an adjustable voltage between the corresponding base contact region and the emitter/collector region which is nearest to that base contact region; and first and second diode-mode drive circuits, separately connected to the first and second base contact regions respectively; wherein each drive circuit is configured to selectably connect the corresponding base contact region to the emitter/collector region which is nearest to that base contact region.
  • a system for power switching comprising: a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations; and a pair of transistor-mode drive circuits, separately connected to the first and second base contact regions respectively, wherein each transistor-mode drive circuit is a voltage-mode drive circuit; and a pair of diode-mode drive circuits, separately connected to the first and second base contact regions respectively; wherein each diode-mode drive circuit is configured to selectably connect the corresponding base contact region to the emitter/collector region which is nearest to that base contact region.
  • a system for power switching comprising: a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations; and a pair of transistor-mode drive circuits, separately connected to the first and second base contact regions respectively; wherein each drive circuit is configured, as a voltage source, to selectably apply an adjustable voltage at a selectable value between the corresponding base contact region and the emitter/collector region which is nearest to that base contact region.
  • a method for power switching comprising: driving a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions in distinct locations separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations, by in a transistor-ON mode, when minimal voltage drop is desired, using one of a pair of first drive circuits to supply a selected adjustable voltage to the one of the base contact regions which is closest to whichever of the emitter/collector regions is positioned to act as the collector, as defined by externally applied voltage polarity; and in a diode-ON mode, when a diode drop across the device is acceptable, using one of a pair of second drive circuits to clamp one of the base contact regions to the respectively nearest one of the emitter/collector regions; and in a preturnoff mode, using both of the pair of second drive circuits to clamp each of the base contact regions to the respectively nearest
  • a method for power switching comprising: driving a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions in distinct locations separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations, by in a transistor-ON mode, when minimal voltage drop is desired, using one of a pair of first drive circuits to supply a selected adjustable voltage to the one of the base contact regions which is closest to whichever of the emitter/collector regions is positioned to act as the collector, as defined by externally applied voltage polarity; and in a diode-ON mode, when a diode drop across the device is acceptable, using one of a pair of second drive circuits to clamp one of the base contact regions to the respectively nearest one of the emitter/collector regions.
  • a method for power switching comprising: driving a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions in distinct locations separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations, by in a transistor-ON mode, when minimal voltage drop is desired, using one of a pair of first drive circuits to supply a selected adjustable voltage to the one of the base contact regions which is closest to whichever of the emitter/collector regions is positioned to act as the collector, as defined by externally applied voltage polarity.
  • a method of providing a variable-voltage low-voltage output comprising the actions of: a) providing an adjustable voltage to supply an oscillator; b) using the oscillator to apply an AC waveform to a primary winding of a transformer; c) at one secondary winding of the transformer, generating complementary control signals; and d) using the complementary control signals to operate a synchronous rectifier which is connected to another secondary winding of the same transformer, to thereby provide a low-voltage output.
  • a variable-voltage low-voltage power circuit comprising: an adjustable voltage supply circuit, connected to provide an adjustable voltage; an oscillator circuit, connected to receive the adjustable voltage as a supply voltage, and connected to drive a primary winding of a transformer with an AC waveform; a first secondary winding of the transformer, connected to output complementary control signals; and a second secondary winding of the transformer, having fewer turns than the first secondary winding; and a synchronous rectifier, including at least four transistors which are gated by the complementary control signals and are connected in a bridge configuration, which is connected to rectify the output of the secondary winding; wherein the output of the second secondary winding, after rectification by the synchronous rectifier, provides a substantially DC output which is smaller than a diode drop.
  • a method of operating a bidirectional bipolar transistor which has first and second first-conductivity-type emitter/collector regions in distinct locations separated by a bulk second-conductivity-type base region, and also has two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations, in respective proximity to first and second emitter/collector regions but not to each other, comprising the actions of: a) when low on-state resistance is desired, applying a base drive voltage to whichever of the base contact regions is then on the collector side of the device; and b) varying the base drive voltage while monitoring base current, to thereby find a target base drive voltage where base current begins to increase with base drive voltage; and operating the transistor at approximately the target base drive voltage.
  • a system for power switching comprising: a bidirectional bipolar transistor which has two first-conductivity-type emitter/collector regions separated by a bulk second-conductivity-type base region, and two distinct second-conductivity-type base contact regions which connect to the bulk base region in mutually separate locations; and a pair of transistor-mode drive circuits, separately connected to the first and second base contact regions respectively; wherein, during the transistor-ON state where low voltage drop is desired, one of the drive circuits, as determined by external voltage polarity, is configured to apply an adjustable voltage to a selected one of base contact regions, and dither the adjustable voltage, to thereby find an operating point voltage where the current at the selected base contact begins to increase with applied voltage, and then keep the adjustable voltage at approximately the operating point voltage.
  • the main embodiments described above use NPN B-TRAN transistors.
  • PNP B-TRAN transistors with appropriate inversion of voltages.
  • teachings here can be applied to B-TRAN devices of various sizes, depending on what blocking voltage and current capacity are required.
  • a single control module can optionally be connected to apply the appropriate control signals to each of the B-TRANs' drive circuits.
  • a single B-TRAN drive circuit can optionally be used to drive multiple B-TRANs in parallel. This is not practical with other bipolar junction transistors.

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11135936B2 (en) 2019-03-06 2021-10-05 Fermata, LLC Methods for using temperature data to protect electric vehicle battery health during use of bidirectional charger
US11958372B2 (en) 2019-11-26 2024-04-16 Fermata Energy Llc Device for bi-directional power conversion and charging for use with electric vehicles

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9729144B2 (en) * 2013-07-31 2017-08-08 Schneider Electric Solar Inverters Usa, Inc. Isolated uni-polar transistor gate drive
US11637016B2 (en) 2013-12-11 2023-04-25 Ideal Power Inc. Systems and methods for bidirectional device fabrication
US11069797B2 (en) 2016-05-25 2021-07-20 Ideal Power Inc. Ruggedized symmetrically bidirectional bipolar power transistor
US11335674B2 (en) 2019-06-27 2022-05-17 Globalfoundries U.S. Inc. Diode triggered silicon controlled rectifier (SCR) with hybrid diodes
US11430881B2 (en) * 2020-03-05 2022-08-30 Globalfoundries U.S. Inc. Diode triggered compact silicon controlled rectifier
US11411557B2 (en) * 2020-05-18 2022-08-09 Ideal Power Inc. Method and system of operating a bi-directional double-base bipolar junction transistor (B-TRAN)
US11496129B2 (en) 2020-06-08 2022-11-08 Ideal Power Inc. Method and system of current sharing among bidirectional double-base bipolar junction transistors
US11777018B2 (en) 2020-11-19 2023-10-03 Ideal Power Inc. Layout to reduce current crowding at endpoints
KR20230117430A (ko) 2020-12-10 2023-08-08 아이디얼 파워 인크. B-tran(양방향 이중-베이스 양극성 접합 트랜지스터)동작 방법 및 시스템
GB2623027A (en) 2021-08-10 2024-04-03 Ideal Power Inc System and method for bi-directional trench power switches

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20020110005A1 (en) * 2001-02-09 2002-08-15 Hengchun Mao Power converter including circuits for improved operational contol of synchronous rectifiers therein
US6961253B1 (en) * 1999-10-08 2005-11-01 Lambda Electronics Drive circuits for synchronous rectifiers
US20110090717A1 (en) * 2009-10-21 2011-04-21 Myongji University Industry And Academia Cooperation Foundation Two-stage insulated bidirectional DC/DC power converter using a constant duty ratio LLC resonant converter
US20150229225A1 (en) * 2014-02-12 2015-08-13 Delta Electronics, Inc. Resonant converters and control methods thereof

Family Cites Families (55)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3476993A (en) 1959-09-08 1969-11-04 Gen Electric Five layer and junction bridging terminal switching device
DE2231777A1 (de) 1971-08-27 1973-03-08 Halbleiterwerk Frankfurt Oder Symmetrisch schaltendes mehrschichtenbauelement und verfahren zu seiner herstellung
US3996601A (en) 1974-07-15 1976-12-07 Hutson Jerald L Shorting structure for multilayer semiconductor switching devices
CH609714A5 (en) 1974-07-15 1979-03-15 Agfa Gevaert Ag Process for the production of a hydrophilic surface on silicone rubber mouldings
US4131902A (en) 1977-09-30 1978-12-26 Westinghouse Electric Corp. Novel bipolar transistor with a dual-dielectric tunnel emitter
US4816892A (en) 1982-02-03 1989-03-28 General Electric Company Semiconductor device having turn-on and turn-off capabilities
JPS58218168A (ja) 1982-06-14 1983-12-19 Toshiba Corp 双方向トランジスタ
CA1200322A (en) 1982-12-13 1986-02-04 General Electric Company Bidirectional insulated-gate rectifier structures and method of operation
JPH0821713B2 (ja) 1987-02-26 1996-03-04 株式会社東芝 導電変調型mosfet
JP2703240B2 (ja) 1987-12-03 1998-01-26 株式会社東芝 導電変調型mosfet
DE58905355D1 (de) 1988-04-22 1993-09-30 Asea Brown Boveri Abschaltbares Leistungshalbleiterbauelement.
FR2635930B1 (fr) * 1988-08-31 1990-11-23 Sgs Thomson Microelectronics Commutateur bidirectionnel monolithique a transistors mos de puissance
EP0394859A1 (de) * 1989-04-28 1990-10-31 Asea Brown Boveri Ag Bidirektionals, abschaltbares Halbeiterbauelement
CH678245A5 (zh) 1989-06-07 1991-08-15 Asea Brown Boveri
JPH03147378A (ja) 1989-11-02 1991-06-24 Nec Corp ソリッド・ステート・リレー
EP0438700A1 (de) 1990-01-25 1991-07-31 Asea Brown Boveri Ag Abschaltbares, MOS-gesteuertes Leistungshalbleiter-Bauelement sowie Verfahren zu dessen Herstellung
JP3352840B2 (ja) * 1994-03-14 2002-12-03 株式会社東芝 逆並列接続型双方向性半導体スイッチ
US5793064A (en) 1996-09-24 1998-08-11 Allen Bradley Company, Llc Bidirectional lateral insulated gate bipolar transistor
US5852559A (en) 1996-09-24 1998-12-22 Allen Bradley Company, Llc Power application circuits utilizing bidirectional insulated gate bipolar transistor
US5910664A (en) 1996-11-05 1999-06-08 International Rectifier Corporation Emitter-switched transistor structures
SE9901410D0 (sv) 1999-04-21 1999-04-21 Abb Research Ltd Abipolar transistor
JP4635304B2 (ja) 2000-07-12 2011-02-23 富士電機システムズ株式会社 双方向超接合半導体素子およびその製造方法
EP1353385B1 (en) 2001-01-19 2014-09-24 Mitsubishi Denki Kabushiki Kaisha Semiconductor device
GB2380604B (en) 2001-06-01 2005-02-09 Fuji Electric Co Ltd Semiconductor switch
FR2830127B1 (fr) 2001-09-21 2004-12-24 St Microelectronics Sa Commutateur monolithique bidirectionnel vertical a commande en tension
AU2003237543A1 (en) 2002-05-20 2003-12-22 The Government Of The United States Of America, As Represented By The Secretary Of The Navy Double side igbt phase leg architecture and clocking method for reduced turn on loss
CA2427039C (en) * 2003-04-29 2013-08-13 Kinectrics Inc. High speed bi-directional solid state switch
US7279731B1 (en) * 2006-05-15 2007-10-09 Udt Sensors, Inc. Edge illuminated photodiodes
JP2004342718A (ja) * 2003-05-14 2004-12-02 Toshiba Corp 半導体装置及びコンバータ
US7064069B2 (en) 2003-10-21 2006-06-20 Micron Technology, Inc. Substrate thinning including planarization
DE102004005384B4 (de) 2004-02-03 2006-10-26 De Doncker, Rik W., Prof. Dr. ir. Bidirektionales, MOS-gesteuertes Halbleiterbauelement, Verfahren zu seinem Betreiben, Verfahren zu seiner Herstellung und seine Verwendung
JP4791704B2 (ja) 2004-04-28 2011-10-12 三菱電機株式会社 逆導通型半導体素子とその製造方法
US7129144B2 (en) * 2004-04-30 2006-10-31 Lite-On Semiconductor Corp. Overvoltage protection device and manufacturing process for the same
GB0417749D0 (en) 2004-08-10 2004-09-08 Eco Semiconductors Ltd Improved bipolar MOSFET devices and methods for their use
JP5011681B2 (ja) 2004-12-02 2012-08-29 日産自動車株式会社 半導体装置
KR100677816B1 (ko) 2005-03-28 2007-02-02 산요덴키가부시키가이샤 능동 소자 및 스위치 회로 장치
US20060261346A1 (en) 2005-05-18 2006-11-23 Sei-Hyung Ryu High voltage silicon carbide devices having bi-directional blocking capabilities and methods of fabricating the same
DE102005047101B3 (de) 2005-09-30 2007-01-04 Infineon Technologies Austria Ag Halbleiterschalteranordnung und Ansteuerverfahren
JP4695961B2 (ja) * 2005-10-20 2011-06-08 パナソニック株式会社 高耐圧半導体スイッチング素子及びそれを用いたスイッチング電源装置
US7354809B2 (en) 2006-02-13 2008-04-08 Wisconsin Alumi Research Foundation Method for double-sided processing of thin film transistors
US8796750B2 (en) * 2006-05-15 2014-08-05 Osi Optoelectronics, Inc. Edge illuminated photodiodes
JP4471967B2 (ja) 2006-12-28 2010-06-02 株式会社ルネサステクノロジ 双方向スイッチモジュール
JP5251102B2 (ja) 2007-12-10 2013-07-31 株式会社デンソー 半導体装置
JP4912353B2 (ja) 2008-05-16 2012-04-11 三菱電機株式会社 電力用半導体装置およびその製造方法
JP5245157B2 (ja) 2008-06-03 2013-07-24 独立行政法人産業技術総合研究所 半導体双方向スイッチング装置
US8163624B2 (en) 2008-07-30 2012-04-24 Bowman Ronald R Discrete semiconductor device and method of forming sealed trench junction termination
KR20120130158A (ko) * 2009-06-29 2012-11-29 아이디얼 파워 컨버터스, 인코포레이티드 에너지 전송 리액턴스를 단락시키는 크로바 스위치를 이용한 전력 전송 장치, 방법, 및 시스템
FR2953995B1 (fr) 2009-11-24 2012-02-10 St Microelectronics Tours Sas Interrupteur de puissance bidirectionnel commandable a la fermeture et a l'ouverture
US8576583B2 (en) * 2010-09-17 2013-11-05 Fairchild Semiconductor Corporation Sampled charge control for resonant converter
US8735289B2 (en) * 2010-11-29 2014-05-27 Infineon Technologies Ag Method of contacting a doping region in a semiconductor substrate
CN104145342B (zh) 2012-03-16 2017-05-24 富士电机株式会社 半导体装置
US8963253B2 (en) * 2012-10-23 2015-02-24 Macronix International Co., Ltd. Bi-directional bipolar junction transistor for high voltage electrostatic discharge protection
GB2510716A (en) * 2013-02-07 2014-08-13 John Wood Bi-polar junction transistor
US9082648B2 (en) 2013-02-27 2015-07-14 Pakal Technologies Llc Vertical insulated-gate turn-off device having a planar gate
JP6491201B2 (ja) * 2013-06-24 2019-03-27 アイディール パワー インコーポレイテッド 双方向バイポーラトランジスタを有するシステム、回路、素子、及び方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6961253B1 (en) * 1999-10-08 2005-11-01 Lambda Electronics Drive circuits for synchronous rectifiers
US20020110005A1 (en) * 2001-02-09 2002-08-15 Hengchun Mao Power converter including circuits for improved operational contol of synchronous rectifiers therein
US20110090717A1 (en) * 2009-10-21 2011-04-21 Myongji University Industry And Academia Cooperation Foundation Two-stage insulated bidirectional DC/DC power converter using a constant duty ratio LLC resonant converter
US20150229225A1 (en) * 2014-02-12 2015-08-13 Delta Electronics, Inc. Resonant converters and control methods thereof

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US11135936B2 (en) 2019-03-06 2021-10-05 Fermata, LLC Methods for using temperature data to protect electric vehicle battery health during use of bidirectional charger
US11958376B2 (en) 2019-03-06 2024-04-16 Fermata Energy Llc Methods for using cycle life data to protect electric vehicle battery health during use of bidirectional charger
US11958372B2 (en) 2019-11-26 2024-04-16 Fermata Energy Llc Device for bi-directional power conversion and charging for use with electric vehicles

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