US20150337228A1 - Fluorinated ether composition, surface modifier, surfactant, liquid composition, and article - Google Patents

Fluorinated ether composition, surface modifier, surfactant, liquid composition, and article Download PDF

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Publication number
US20150337228A1
US20150337228A1 US14/818,826 US201514818826A US2015337228A1 US 20150337228 A1 US20150337228 A1 US 20150337228A1 US 201514818826 A US201514818826 A US 201514818826A US 2015337228 A1 US2015337228 A1 US 2015337228A1
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Prior art keywords
group
fluorinated ether
compound
integer
fluorinated
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US14/818,826
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English (en)
Inventor
Akira Isobe
Kenji Ishizeki
Yoshiyuki Gozu
Yoji Nakajima
Toshifumi Kakiuchi
Yuko Tachibana
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AGC Inc
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Asahi Glass Co Ltd
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Assigned to ASAHI GLASS COMPANY, LIMITED reassignment ASAHI GLASS COMPANY, LIMITED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: NAKAJIMA, YOJI, TACHIBANA, YUKO, GOZU, YOSHIYUKI, ISHIZEKI, KENJI, ISOBE, AKIRA, KAKIUCHI, Toshifumi
Publication of US20150337228A1 publication Critical patent/US20150337228A1/en
Abandoned legal-status Critical Current

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    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M105/00Lubricating compositions characterised by the base-material being a non-macromolecular organic compound
    • C10M105/50Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing halogen
    • C10M105/54Lubricating compositions characterised by the base-material being a non-macromolecular organic compound containing halogen containing carbon, hydrogen, halogen and oxygen
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G65/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G65/002Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds
    • C08G65/005Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens
    • C08G65/007Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from unsaturated compounds containing halogens containing fluorine
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L71/00Compositions of polyethers obtained by reactions forming an ether link in the main chain; Compositions of derivatives of such polymers
    • C08L71/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09DCOATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D171/00Coating compositions based on polyethers obtained by reactions forming an ether link in the main chain; Coating compositions based on derivatives of such polymers
    • C09D171/02Polyalkylene oxides
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M107/00Lubricating compositions characterised by the base-material being a macromolecular compound
    • C10M107/38Lubricating compositions characterised by the base-material being a macromolecular compound containing halogen
    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62Record carriers characterised by the selection of the material
    • G11B5/72Protective coatings, e.g. anti-static or antifriction
    • G11B5/725Protective coatings, e.g. anti-static or antifriction containing a lubricant, e.g. organic compounds
    • G11B5/7253Fluorocarbon lubricant
    • G11B5/7257Perfluoropolyether lubricant
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07CACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C43/00Ethers; Compounds having groups, groups or groups
    • C07C43/02Ethers
    • C07C43/03Ethers having all ether-oxygen atoms bound to acyclic carbon atoms
    • C07C43/04Saturated ethers
    • C07C43/13Saturated ethers containing hydroxy or O-metal groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G2650/00Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
    • C08G2650/28Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
    • C08G2650/46Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen
    • C08G2650/48Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing halogen containing fluorine, e.g. perfluropolyethers
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2207/00Organic non-macromolecular hydrocarbon compounds containing hydrogen, carbon and oxygen as ingredients in lubricant compositions
    • C10M2207/02Hydroxy compounds
    • C10M2207/021Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms
    • C10M2207/022Hydroxy compounds having hydroxy groups bound to acyclic or cycloaliphatic carbon atoms containing at least two hydroxy groups
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10MLUBRICATING COMPOSITIONS; USE OF CHEMICAL SUBSTANCES EITHER ALONE OR AS LUBRICATING INGREDIENTS IN A LUBRICATING COMPOSITION
    • C10M2211/00Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions
    • C10M2211/04Organic non-macromolecular compounds containing halogen as ingredients in lubricant compositions containing carbon, hydrogen, halogen, and oxygen
    • C10M2211/042Alcohols; Ethers; Aldehydes; Ketones
    • C10M2211/0425Alcohols; Ethers; Aldehydes; Ketones used as base material
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2030/00Specified physical or chemical properties which is improved by the additive characterising the lubricating composition, e.g. multifunctional additives
    • C10N2030/06Oiliness; Film-strength; Anti-wear; Resistance to extreme pressure
    • CCHEMISTRY; METALLURGY
    • C10PETROLEUM, GAS OR COKE INDUSTRIES; TECHNICAL GASES CONTAINING CARBON MONOXIDE; FUELS; LUBRICANTS; PEAT
    • C10NINDEXING SCHEME ASSOCIATED WITH SUBCLASS C10M RELATING TO LUBRICATING COMPOSITIONS
    • C10N2040/00Specified use or application for which the lubricating composition is intended
    • C10N2040/14Electric or magnetic purposes
    • C10N2040/18Electric or magnetic purposes in connection with recordings on magnetic tape or disc

Definitions

  • the present invention relates to a fluorinated ether composition useful as a surface modifier, surfactant, etc.; a surface modifier or surfactant containing the fluorinated ether composition; a liquid composition comprising the fluorinated ether composition and a solvent; and an article having a film made of the fluorinated ether composition, on a substrate.
  • a carbon protective film is formed on a magnetic recording layer for recording information, for the purpose of protecting a recorded information. Further, it is common to further form, thereon, a coating film (hereinafter referred to also as a “surface layer”) by applying a lubricant, for the purpose of protecting the magnetic disk and a reading head.
  • a lubricant a compound having a modified perfluoropolyether structure has heretofore been used.
  • HDD hard disk drive
  • the distance between a magnetic disk as a recording medium and a reading head has been reduced so close as to bring them almost in contact each other.
  • the magnetic disk is rotated at a speed exceeding 10,000 rpm. Due to such a high rotational speed and closeness in distance between the magnetic disk and the reading head, the performance required for the surface layer has become higher. For example, in order to let the disk and the head be closer to each other, it becomes important to make the thickness of the surface layer to be thinner. Further, due to such closeness in distance, the frequency in contact increases, and therefore, a surface layer having higher lubricity is required. On the other hand, the surface layer is required to have higher adhesion to the magnetic disk so that the surface layer will not scatter from the top of the magnetic disk due to the high speed rotation.
  • a method to increase lubricity of the surface layer there may, for example, be a method of using a lubricant which has a low molecular weight and a low viscosity, or a method of using a lubricant with low polarity which has no or little polar functional groups.
  • a lubricant which has a low molecular weight and a low viscosity the vapor pressure is high, so that the lubricant tends to volatilize, and adhesion between the surface layer and the carbon protective layer tends to be low.
  • the polarity is low, so that its adhesion to the magnetic disk tends to be low, and the durability of the surface layer tends to be remarkably low, whereby the lubricant is likely to scatter due to rotation of the magnetic disk.
  • a method to increase adhesion of the surface layer to the magnetic disk there may be a method of using a lubricant which has a large content of polar functional groups.
  • a lubricant which has a large content of polar functional groups.
  • the viscosity of the surface layer tends to be high, and the lubricity tends to be remarkably low, whereby the magnetic disk is likely to be abraded.
  • Patent Documents 1 and 2 propose to use specific fluorinated ether compounds as lubricants.
  • a tri-functional fluorinated ether compound having three —CF 2 CH 2 OH terminals, and a hexa-functional fluorinated ether compound having three —CH 2 CH(OH)CH 2 OH terminals are disclosed.
  • Patent Document 2 a di- to tetra-functional fluorinated ether compound having two, three or four —CF 2 CH 2 OH terminals, is disclosed.
  • the di- to tetra-functional fluorinated ether compound having —CF 2 CH 2 OH terminals is excellent in lubricity, but its adhesion cannot be said to be sufficient.
  • the hexa-functional fluorinated ether compound having three —CH 2 CH(OH)CH 2 OH terminals has a problem that the viscosity of the surface layer to be formed, tends to be high, whereby the lubricity tends to be low. Further, there is a problem that it is difficult to form a thin film of the surface layer.
  • the present invention has been made under these circumstances, and it is an object of the present invention to provide a fluorinated ether composition capable of satisfying both high lubricity and high adhesive property, and a surface modifier, surfactant, liquid composition and article using such a fluorinated ether composition.
  • the present invention provides a fluorinated ether composition, surface modifier, surfactant, liquid composition and article having the following constructions [1] to [15].
  • a fluorinated ether composition comprising a fluorinated ether compound (A) represented by the following formula (A) and a fluorinated ether compound (B) represented by the following formula (B), wherein the content of the fluorinated ether compound (A) is from 15 to 80 mass % to the total amount of the fluorinated ether compound (A) and the fluorinated ether compound (B):
  • X is a group represented by the following formula (X)
  • Z is a group represented by the following formula (Z)
  • n is 5 or 6
  • m is an integer of from 0 to 10
  • n+m is an integer of from 5 to 16
  • Y A is a (n+m) valent linking group
  • X and Z have the same meanings as above, respectively, s is an integer of from 0 to 4, t is an integer of from 0 to 10, s+t is an integer of from 2 to 14, and Y B is a (s+t) valent linking group:
  • a is an integer of from 1 to 5
  • b is an integer of from 1 to 100
  • c is an integer of from 0 to 100
  • P 1 is a bivalent linking group containing neither hydroxy group nor alkoxy group, or a single bond
  • Q 1 is a halogen atom other than a fluorine atom, a hydrogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms, provided that when b is 2 or more, the plurality of a corresponding to b present in the same molecule may be the same or different from one another, when c is 2 or more, the plurality of Q 1 corresponding to c present in the same molecule may be the same or different from one another, and alignment sequence of b number of (C a F 2a O) units and c number of (CFQ 1 CF 2 O) units in a molecule may be any sequence,
  • d is an integer of from 1 to 5
  • e is an integer of from 1 to 100
  • f is an integer of from 0 to 100
  • P 2 is a bivalent linking group containing neither hydroxyl group nor alkoxy group, or a single bond
  • Q 2 is a halogen atom other than a fluorine atom, a hydrogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms
  • R is a hydrogen atom, a halogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms, provided that when e is 2 or more, the plurality of d corresponding to e present in the same molecule may be the same or different from one another, when f is 2 or more, the plurality of Q 2
  • b is an integer of from 1 to 100
  • e is an integer of from 1 to 100, and R is as defined above.
  • b is an integer of from 1 to 100
  • e is an integer of from 1 to 100, and R is as defined above.
  • a coating method which comprises applying the liquid composition as defined in any one of [11] to [13] to a substrate surface and then, removing the liquid medium to form a film made of the fluorinated ether composition on the substrate surface.
  • a fluorinated ether composition capable of satisfying both high lubricity and high adhesive property, and a surface modifier, surfactant, liquid composition and article using such a fluorinated ether composition.
  • a compound represented by the formula (A) may be referred to as a compound (A).
  • Compounds represented by other formulae may be referred to in the same manner.
  • a group represented by the formula (X) may be referred to as a group (X).
  • Groups represented by other formulae may be referred to in the same manner.
  • a fluorinated ether composition is a composition composed of at least two fluorinated ether compounds. Composed of fluorinated ether compounds means containing no components other than fluorinated ether compounds except for inevitable impurities.
  • a fluorinated ether compound is an ether compound having a poly(oxyperfluoroalkylene) chain.
  • a fluoroalkyl group is a group having some or all of hydrogen atoms in an alkyl group substituted by fluorine atoms
  • a perfluoroalkyl group is a group having all of hydrogen atoms in an alkyl group substituted by fluorine atoms.
  • a fluoroalkylene group is a group having some or all of hydrogen atoms in an alkylene group substituted by fluorine atoms
  • a perfluoroalkylene group is a group having all of hydrogen atoms in an alkylene group substituted by fluorine atoms.
  • a number average molecular weight and a molecular weight distribution are values to be measured by gel permeation chromatography.
  • measuring conditions it is possible to employ the conditions described in Examples given hereinafter.
  • the fluorinated ether composition of the present invention is characterized by comprising a fluorinated ether compound (A) (hereinafter referred to also as a “compound (A)”) and a fluorinated ether compound (B) represented by the following formula (B) (hereinafter referred to also as a “compound (B)”), wherein the content of the compound (A) is from 15 to 80 mass % to the total amount of the compound (A) and the compound (B).
  • the compound (A) is a compound having n monovalent groups (X) and m monovalent groups (Z) bonded to Y A .
  • X is a group represented by the following formula (X).
  • a is an integer of from 1 to 5, preferably an integer of from 2 to 4, particularly preferably 2.
  • C a F 2a may have a linear chain structure or a branched chain structure.
  • b represents the number of (C a F 2a O) units and is an integer of from 1 to 100, preferably an integer of from 5 to 50, particularly preferably an integer of from 5 to 30.
  • c represents the number of (CFQ 1 CF 2 O) units and is an integer of from 0 to 100, preferably an integer of from 0 to 50, particularly preferably from 0 to 10.
  • the plurality of a corresponding to b present in the same molecule may be the same or different from one another. That is, b number of (C a F 2a O) units may be the same or different from one another.
  • the plurality of Q 1 corresponding to c present in the same molecule may be the same or different from one another. That is, c number of (CFQ 1 CF 2 O) units may be the same or different from one another.
  • alignment sequence of b number of (C a F 2a O) units and c number of (CFQ 1 CF 2 O) units in —[(C a F 2a O) b (CFQ 1 CF 2 O) c ]— in a molecule may be any sequence.
  • the unit bonded to HO—CH 2 —P 1 — may be the (C a F 2a O) unit or the (CFQ 1 CF 2 O) unit.
  • alignment sequence of these units may be in a block form or a random form.
  • P 1 is a bivalent linking group containing neither hydroxy group nor alkoxy group, or a single bond.
  • the bivalent linking group containing neither hydroxy group nor alkoxy group is preferably a bivalent organic group containing neither hydroxy group nor alkoxy group, and specific examples may be an alkylene group, an alkylene group having an etheric oxygen atom inserted between carbon-carbon atoms, a fluoro-alkylene group, a fluoro-alkylene group having an etheric oxygen atom inserted between carbon-carbon atoms, one having a hetero atom such as phosphazene, an unsaturated hydrocarbon group, etc.
  • Q 1 is a halogen atom other than a fluorine atom, a hydrogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • the halogen atom other than a fluorine atom may, for example, be a chlorine atom, an iodine atom or a bromine atom, and from the viewpoint of the production efficiency, a chlorine atom is preferred.
  • the monovalent hydrocarbon group may be saturated or unsaturated and is preferably a saturated hydrocarbon group (an alkyl group).
  • the structure of the hydrocarbon group may be any of a linear chain structure, a branched chain structure, a ring structure or a structure having a partially ring structure, preferably a linear chain structure or a branched chain structure, particularly preferably a linear chain structure.
  • the number of carbon atoms in the hydrocarbon group is preferably from 1 to 10.
  • the fluoroalkyl group may be a fluoroalkyl group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoroalkyl group.
  • the number of carbon atoms in the fluoroalkyl group is preferably from 1 to 100, particularly preferably from 1 to 20.
  • the fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms may be a fluoroalkyl group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoroalkyl group.
  • the number of carbon atoms in the fluoroalkyl group is preferably from 2 to 100, particularly preferably from 2 to 20.
  • the following group (Q ⁇ 1) may, for example, be mentioned as a specific example of the fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • R 1 is a fluoroalkyl group
  • h is an integer of from 1 to 5
  • j is from 1 to 100 and is an integer whereby the number of carbon atoms in the entire group (Q-1) becomes at most 100.
  • C h F 2h may have a linear chain structure or a branched chain structure.
  • R 1 may be a fluoroalkyl group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoroalkyl group.
  • the number of carbon atoms in the fluoroalkyl group is at least 1 and an integer whereby the number of carbon atoms in the entire group (Q-1) becomes at most 100, and it is preferably from 1 to 6.
  • the group (X) is preferably a group of the formula (X) wherein a is 2 (provided that only in (C a F 2a O) bonded to P 1 , a is 1), b is an integer of from 1 to 100, c is from 0 to 10, and P 1 is a single bond or —CH 2 OCH 2 —.
  • the group (X) is more preferably the following group (X-1) or (X-2).
  • b is an integer of from 1 to 100, preferably an integer of from 5 to 50, particularly preferably an integer of from 5 to 30.
  • the group (X) is the group (X-1), whereby the production will be easy, and the compound will be stable and scarcely decomposable.
  • Z is a group represented by the following formula (Z).
  • d is an integer of from 1 to 5, preferably an integer of from 2 to 4, particularly preferably 2.
  • C d F 2d may have a linear chain structure or a branched chain structure.
  • e represents the number of (C d F 2d O) units and is an integer of from 1 to 100, preferably an integer of from 5 to 50, particularly preferably an integer of from 5 to 30.
  • f represents the number of (CFQ 2 CF 2 O) units and is an integer of from 0 to 100, preferably an integer of from 0 to 50, particularly preferably from 0 to 10.
  • the plurality of d corresponding to e present in the same molecule may be the same or different from one another. That is, e number of (C d F 2d O) units may be the same or different from one another.
  • the plurality of Q 2 corresponding to f present in the same molecule may be the same or different from one another. That is, f number of (CFQ 2 CF 2 O) units may be the same or different from one another.
  • alignment sequence of e number of (C d F 2d O) units and f number of (CFQ 2 CF 2 O) units in —[(C d F 2d O) e (CFQ 2 CF 2 O) f ]— in a molecule may be any sequence.
  • the unit bonded to R—P 2 — may be the (C d F 2d O) unit or the (CFQ 2 CF 2 O) unit.
  • alignment sequence of these units may be in a block form or a random form.
  • P 2 is a bivalent linking group containing neither hydroxyl group nor alkoxy group, or a single bond.
  • the bivalent linking group containing neither hydroxyl group nor alkoxy group may, for example, be a bivalent organic group containing neither hydroxyl group nor alkoxy group, or —O—.
  • P 2 is preferably —O—.
  • Q 2 is a halogen atom other than a fluorine atom, a hydrogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • the halogen atom other than a fluorine atom, the monovalent hydrocarbon group, the fluoroalkyl group, and the fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms may, respectively, be the same ones as mentioned above for Q 1 .
  • R is a hydrogen atom, a halogen atom, a monovalent hydrocarbon group, a fluoroalkyl group, or a fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • the halogen atom may, for example, be a fluorine atom, a chlorine atom, an iodine atom or a bromine atom, and is preferably a fluorine atom.
  • the monovalent hydrocarbon group may be saturated or unsaturated, and is preferably a saturated hydrocarbon group (an alkyl group).
  • the structure of the hydrocarbon group may be any of a linear chain structure, a branched chain structure, a ring structure, or a structure having a partially ring structure, and is preferably a linear chain structure or a branched chain structure, particularly preferably a linear chain structure.
  • the number of carbon atoms in the hydrocarbon group is preferably from 1 to 20.
  • an alkyl group is preferred.
  • the fluoroalkyl group may be a fluoroalkyl group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoroalkyl group.
  • the structure of the fluoroalkyl group may be any of a linear chain structure, a branched chain structure, a ring structure and a structure having a partially ring structure, and is preferably a linear chain structure or a branched chain structure, particularly preferably a linear chain structure.
  • the number of carbon atoms in the fluoroalkyl group is preferably from 1 to 100, particularly preferably from 1 to 10.
  • the fluoroalkyl group in the fluoroalkyl group having an etheric oxygen atom inserted between carbon-carbon atoms may be a fluoroalkyl group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoroalkyl group.
  • the number of carbon atoms in the fluoroalkyl group is preferably from 2 to 100, particularly preferably from 2 to 10.
  • p is an integer of from 0 to 15 (preferably an integer of from 0 to 9)
  • C y F is a perfluorocyclohexyl group
  • q is an integer of from 0 to 15
  • a d F is a perfluoroadamantyl group
  • r is an integer of from 0 to 15.
  • d is 2
  • e is an integer of from 1 to 100
  • f is from 0 to 10
  • P 2 is —O—. That is, the group (Z) is preferably the following group (Z-1).
  • e is an integer of from 1 to 100, preferably an integer of from 5 to 50, particularly preferably an integer of from 5 to 30.
  • R is as defined above, preferably any one of groups (R-1) to (R-4), particularly preferably group (R-1).
  • the group (Z-1) is particularly preferably any one of the following groups (Z-11) to (Z-14).
  • n 5 or 6.
  • n is an integer of from 0 to 10, preferably an integer of from 0 to 3, particularly preferably 0 or 1.
  • n+m is an integer of from 5 to 16, preferably an integer of from 5 to 9, particularly preferably an integer of from 5 to 7.
  • n+m valence of Y A
  • n groups (X) may be the same or different from one another.
  • m groups (Z) in the compound (A) may be the same or different from one another.
  • Y A is a (n+m) valent linking group.
  • Y A may, for example, be a (n+m) valent fluoro-saturated hydrocarbon group, a (n+m) valent fluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms, or a (n+m) valent cyclophosphazene group.
  • a (n+m) valent fluoro-saturated hydrocarbon group or a (n+m) valent fluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • the fluoro-saturated hydrocarbon group may be a fluoro-saturated hydrocarbon group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoro-saturated hydrocarbon group, and is preferably a perfluoro-saturated hydrocarbon group.
  • the structure of the perfluoro-saturated hydrocarbon group may be any of a branched chain structure, a ring structure or a structure having a partially ring structure, and is preferably a branched chain structure.
  • the number of carbon atoms in the perfluoro-saturated hydrocarbon group is preferably from 2 to 50, more preferably from 2 to 20, particularly preferably from 5 to 20.
  • the perfluoro-saturated hydrocarbon group in a perfluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms may be the same as mentioned above.
  • the number of etheric oxygen atoms in the perfluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms is not particularly limited, but is preferably from 1 to 3.
  • the etheric oxygen atom is present between carbon-carbon atoms, and therefore, no etheric oxygen atom is present at a terminal portion of Y A bonded to each of group (X) and group (Z).
  • Y A is a (n+m) valent fluoro-saturated hydrocarbon group, or a (n+m) valent fluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms
  • no —OCF 2 O— structure is present means that the presence of such a structure cannot be detected by a usual analytical method (such as 19 F-NMR).
  • Y A may, for example, be a group obtained by fluorinating a group of a structure having hydroxy groups removed from a (n+m) valent polyhydric alcohol, a group of a structure having substituents bonded to phosphorus atoms removed from a cyclophosphazene compound, etc.
  • the (n+m) valent polyhydric alcohol may have an etheric oxygen atom.
  • a perfluoro-organic group is preferred.
  • the (n+m) valent polyhydric alcohol may, for example, be a sugar alcohol such as glucose, dipentaerythritol or sorbitol.
  • the following groups (Y5-1), (Y6-1), etc. may be mentioned as specific examples of the group obtained by fluorinating a group of a structure having hydroxy groups removed from a (n+m) valent polyhydric alcohol.
  • the compound (A) is preferably a compound of the formula (A) wherein m is an integer of from 0 to 3, X is group (X-1) and Z is group (Z-1), i.e. the following compound (A-1).
  • b is an integer of from 1 to 100, preferably an integer of from 5 to 50, particularly preferably an integer of from 5 to 30.
  • e is an integer of from 1 to 100, preferably an integer of from 5 to 50, particularly preferably an integer of from 5 to 30.
  • R is as defined above.
  • X 1 is group (X-1)
  • Z 1 is group (Z-1)
  • n is as defined above
  • m1 is an integer of from 0 to 3 (preferably 0 or 1)
  • Y A1 is a (n+m1) valent linking group.
  • n groups (X-1) may be the same or different from one another.
  • m1 groups (Z-1) in the formula may be the same or different from one another.
  • the (n+m1) valent linking group for Y A1 may be the same one as mentioned above for Y A .
  • X 1 and Z 1 are, respectively, as defined above, and their preferred ranges are also the same.
  • Y 5 is a penta-valent linking group
  • Y 6 is a hexa-valent linking group
  • Y 7 is a hepta-valent linking group.
  • Each of Y 5 , Y 6 and Y 7 may be the same as the penta-, hexa- or hepta-valent one among the linking groups mentioned above for Y A .
  • group (Y5-1) may, for example, be mentioned.
  • group (Y6-1) or group (Y6-2) may, for example, be mentioned.
  • the number average molecular weight (Mn) of the compound (A) is preferably from 500 to 50,000, particularly preferably from 2,000 to 20,000.
  • the molecular weight distribution (Mw/Mn) of the compound (A) is preferably from 1.00 to 1.65, particularly preferably from 1.00 to 1.50.
  • the adhesion to a substrate and the durability will be excellent, and the volatility will be low.
  • the compound (A) contained in the fluorinated ether composition of the present invention may be one type alone, or two or more types in combination.
  • the content of the compound (A) in the fluorinated ether composition of the present is from 15 to 80 mass %, preferably from 40 to 60 mass %, to the total amount of the compound (A) and the compound (B).
  • the content is at least the lower limit value in the above range, the fluorinated ether composition of the present invention will be excellent in adhesion to e.g. a magnetic disk.
  • the ratio of the compound (B) will be high, so that the fluorinated ether composition of the present invention will be excellent in lubricity.
  • the compound (B) is a compound having s monovalent groups (X) and t monovalent groups (Z) bonded to Y B .
  • Group (X) and group (Z) are, respectively, the same as group (X) and group (Z) mentioned above in the description of the compound (A).
  • Group (X) and group (Z) in the compound (B) may, respectively, be the same or different from group (X) and group (Z) in the compound (A).
  • s is an integer of from 0 to 4, preferably an integer of from 2 to 4, particularly preferably 3 or 4.
  • t is an integer of from 0 to 10, preferably from 0 to 3.
  • s+t is an integer of from 2 to 14, preferably an integer of from 2 to 10, particularly preferably an integer of from 3 to 6.
  • s+t valence of Y B
  • the production will be easy, the boiling point will be suitable, and the lubricity will be excellent.
  • s groups (X) in the compound (B) may be the same or different from one another.
  • t groups (Z) in the compound (B) may be the same or different from one another.
  • Y B is a (s+t) valent linking group.
  • Y B may, for example, be a (s+t) valent fluoro-saturated hydrocarbon group, a (s+t) valent fluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms, or a (s+t) valent cyclophosphazene group.
  • a (s+t) valent fluoro-saturated hydrocarbon group or a (s+t) valent fluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • the fluoro-saturated hydrocarbon group may be a fluoro-saturated hydrocarbon group having some of hydrogen atoms in an alkyl group substituted by fluorine atoms, or a perfluoro-saturated hydrocarbon group, and is preferably a perfluoro-saturated hydrocarbon group.
  • the structure of the perfluoro-saturated hydrocarbon group may be any of a branched chain structure, a ring structure or a structure having a partially ring structure, and is preferably a branched chain structure.
  • the number of carbon atoms in the perfluoro-saturated hydrocarbon group is preferably from 2 to 50, more preferably from 2 to 20, particularly preferably from 5 to 20.
  • the perfluoro-saturated hydrocarbon group in a perfluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms may be the same as mentioned above.
  • the number of etheric oxygen atoms in the perfluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms is not particularly limited, but is preferably from 1 to 3.
  • the etheric oxygen atom is present between carbon-carbon atoms, and therefore, no etheric oxygen atom is present at a terminal portion of Y B bonded to each of group (X) and group (Z).
  • Y B is a (s+t) valent fluoro-saturated hydrocarbon group, or a (s+t) valent fluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms
  • Y B is preferably a perfluoroalkane-triyl group.
  • the number of carbon atoms in the perfluoroalkane-triyl group is preferably from 1 to 20, particularly preferably from 3 to 5.
  • a perfluoro-organic group obtained by perfluorinating a group of a structure having hydroxy groups removed from a trihydric alcohol such as glycerol may be mentioned.
  • k is an integer of from 1 to 10, and 3 k present in the same molecule may be the same or different from one another.
  • Y B is a tetravalent linking group
  • Y B is preferably a perfluoroalkane-tetrayl group, or a perfluoroalkane-tetrayl group having an etheric oxygen atom inserted between carbon-carbon atoms.
  • the number of carbon atoms in the perfluoroalkane-tetrayl group is preferably from 1 to 20, particularly preferably from 3 to 5.
  • a perfluoro-organic group obtained by perfluorinating a group of a structure having hydroxy groups removed from a tetrahydric alcohol such as erythritol, pentaerythritol or diglycerol may be mentioned.
  • Y B is a penta-valent linking group
  • the above group (Y5-1) may be mentioned as a specific example of such a linking group.
  • Y B is a hexa-valent linking group
  • the above group (Y6-1) or group (Y6-2) may be mentioned as a specific example of such a linking group.
  • the compound (B) is preferably a compound of the formula (B) wherein s is 4, X is group (X-1) and Z is group (Z-1), i.e. the following compound (B-1).
  • Group (X-1) and group (Z-1) are, respectively, the same as group (X-1) and group (Z-1) in the above compound (A-1).
  • Group (X-1) and group (Z-1) in the compound (B-1) may, respectively, be the same as or different from group (X-1) and group (Z-1) in the above compound (A-1).
  • X 1 is group (X-1)
  • Z 1 is group (Z-1)
  • t is as defined above
  • Y B1 is a (4+t) valent linking group.
  • t is preferably from 0 to 2.
  • 4 groups (X-1) may be the same or different from one another.
  • t groups (Z-1) in the formula may be the same or different from one another.
  • the (4+t) valent linking group for Y B1 may be the same one as mentioned above for Y B .
  • Particularly preferred is the above-mentioned perfluoro-organic group obtained by fluorinating a group of a structure having hydroxy groups removed from a tetra- to hexa-polyhydric alcohol.
  • X 1 and Z 1 are, respectively, as defined above, Y 4 is a tetra-valent linking group, and Y 5 is a penta-valent linking group.
  • Each of Y 4 and Y 5 may be the same one as the tetra- or penta-valent linking group mentioned above for Y B .
  • the number average molecular weight (Mn) of the compound (B) is preferably from 500 to 10,000, particularly preferably from 1,000 to 10,000.
  • the molecular weight distribution (Mw/Mn) of the compound (B) is preferably from 1.00 to 1.65, particularly preferably from 1.00 to 1.50.
  • the adhesion to a substrate will be excellent, and the volatility will be low.
  • the compound (B) contained in the fluorinated ether composition of the present invention may be one type alone, or two or more types in combination.
  • the content of the compound (B) in the fluorinated ether composition of the present invention is from 20 to 85 mass %, preferably from 40 to 60 mass %, to the total amount of the compound (A) and the compound (B).
  • the total content of the compound (A) and the compound (B) in the fluorinated ether composition of the present invention is preferably from 80 to 100 mass %, more preferably from 90 to 100 mass %, particularly preferably 100 mass %, to the total mass of the fluorinated ether composition.
  • the fluorinated ether composition of the present invention will be excellent in adhesion to a substrate and in lubricity.
  • the number average molecular weight in total of the compound (A) and the compound (B) is preferably from 500 to 50,000, particularly preferably from 1,000 to 20,000.
  • the number average molecular weight in such total is within the above range, the adhesion to a substrate and the lubricity will be excellent, the volatility will be low, and the durability for a long period of time will be excellent.
  • the number average molecular weight in such total can be confirmed by mixing the compound (A) and the compound (B) at the content ratio between the compound (A) and the compound (B) in the fluorinated ether composition, and measuring the number average molecular weight with respect to the obtained mixture.
  • the number average molecular weight in such total is the same as the number average molecular weight which is measured with respect to the fluorinated ether composition.
  • the fluorinated ether composition of the present invention may be one composed of the compound (A) and the compound (B), or may further contain another fluorinated ether compound (hereinafter referred to also as “compound (C)”) other than the compound (A) and the compound (B).
  • compound (C) another fluorinated ether compound
  • the compound (C) it is possible to use a conventional one known as a fluorinated ether compound which may be used as e.g. a lubricant.
  • a fluorinated ether compound which may be used as e.g. a lubricant.
  • FONBLIN ZTETRAOL manufactured by Solvay
  • A-20H manufactured by MORESCO
  • MORESCO manufactured by MORESCO
  • the fluorinated ether composition of the present invention may be produced, for example, by mixing the compound (A) and the compound (B) (and, as the case requires, the compound (C)) at a prescribed mass ratio.
  • the respective commercial products may be used, or ones produced by using known production methods may be used.
  • the compound (B) may be produced by the same production method except that the raw materials for the production are changed to raw materials having chemical structures corresponding to the compound (B).
  • the compound (A) may be produced, for example, by changing the raw materials for the production in the method disclosed in e.g. WO 2005/068534 or WO 2010/027096 to raw materials having chemical structures corresponding to the compound (A).
  • a compound wherein Y A is a (n+m) valent perfluoro-saturated hydrocarbon group, or a (n+m) valent perfluoro-saturated hydrocarbon group having an etheric oxygen atom inserted between carbon-carbon atoms may be produced in the same manner as the method for obtaining compound (A-4) as disclosed in WO 2005/068534. Specifically, it may be produced by subjecting an ethylene oxide adduct of a polyhydric alcohol to esterification, liquid phase fluorination and ester-decomposition reaction to obtain a compound having COF at its terminal, and subjecting the compound to treatment by the following method 1-1 or 1-2.
  • Method 1-1 A method of reacting the compound having COF at its terminal with an alcohol or water to convert the terminal to an ester or carboxylic acid, followed by reduction.
  • Method 1-2 A method of subjecting the compound having COF at its terminal to ester-exchange with an alcohol to have the terminal esterified, followed by reduction.
  • ethylene oxide adduct of a polyhydric alcohol as the starting material, compounds having various structures and molecular weights are inexpensively and readily commercially available.
  • the fluorine gas concentration in the liquid phase fluorination reaction becomes high, the proportion for forming group (Z) tends to be high.
  • the fluorine gas concentration is preferably from 5.0 to 50 vol %, particularly preferably from 10 to 30 vol %.
  • the product formed by the reaction may be subjected to a purification step, as the case requires, to preferably remove unnecessary compounds by the purification.
  • the purification method may, for example, be a method for removing metal impurities, anionic impurities, etc. by an ion-adsorbing polymer, a supercritical fluid extraction method, or a column chromatography method. It is preferred to use these methods in combination.
  • the compound (A) is a penta- or hexa-functional compound having 5 or 6 hydroxy groups derived from group (X), and it is poor in lubricity, but is excellent in adhesion to e.g. a magnetic disk.
  • the compound (B) is a zero- to tetra-functional compound having 0 to 4 hydroxy groups derived from group (X), and it is poor in adhesion, but is excellent in lubricity.
  • the fluorinated ether composition of the present invention comprises the compound (A) and the compound (B) in such a ratio that the content of the compound (A) is from 15 to 80 mass % to the total amount of the compound (A) and the compound (B), whereby it is possible to attain both of excellent adhesion of the compound (A) and excellent lubricity of the compound (B).
  • a coating film (surface layer) containing the fluorinated ether composition of the present invention on a substrate of a magnetic disk, it is possible to impart excellent lubricity and excellent durability.
  • a surface layer containing the fluorinated ether composition of the present invention as a lubricant on a carbon protective film of a magnetic disk it is possible to impart lubricity capable of sufficiently protecting the magnetic disk and a reading head even if the frequency in contact is increased by closeness in distance between the magnetic disk and the reading head.
  • a trouble of decrease or disappearance of the lubricity due to vaporization of the lubricant during rotation of the magnetic disk or due to scattering of the lubricant at the time of increasing the rotational speed of the magnetic disk e.g. to a level exceeding 10,000 rpm
  • a surface layer of a thin film e.g. a film thickness of at most 1 nm.
  • hydroxy groups in the compound (A) or (B), particularly in the compound (A), are derived from group (X). That is, as the hydroxy groups are derived from group (X), the length per one branched chain is short as compared with a case where, like the hexa-functional fluorinated ether compound disclosed in Patent Document 1, the compound has three —CH 2 CH(OH)CH 2 OH terminals.
  • the fluorinated ether composition of the present invention is useful as a surface modifier or a surfactant.
  • a surface modifier a lubricant may, for example, be mentioned.
  • the fluorinated ether composition of the present invention is useful also for other uses than above.
  • Other uses may, for example, be a wire coating material, an ink repellent (e.g. for coating, or for a printing machine such as an ink jet), an adhesive for semiconductors (such as an adhesive for LOC (lead on chip) tapes, a protective coating for semiconductors (such as a moisture-proof coating agent, or a flux creeping-up preventive agent for a solder), an additive to a thin film to be used in the optical field (such as a pellicle film), a lubricant for an anti-reflection film for display, or an anti-reflection film for a resist), etc.
  • an ink repellent e.g. for coating, or for a printing machine such as an ink jet
  • an adhesive for semiconductors such as an adhesive for LOC (lead on chip) tapes
  • a protective coating for semiconductors such as a moisture-proof coating agent, or a flux creeping-
  • the fluorinated ether composition of the present invention is useful for an application wherein a coating film (surface layer) containing the fluorinated ether composition is formed on a substrate.
  • the surface layer containing the fluorinated ether composition of the present invention contains a fluorinated ether compound (such as compound (A)) having —CH 2 —OH at its molecular terminals and thus maintains high lubricity. Therefore, by forming such a surface layer on a substrate, it is possible to impart a function such as lubricity. Further, the formed surface layer has high adhesion to the substrate and is excellent in durability.
  • a fluorinated ether compound such as compound (A) having —CH 2 —OH at its molecular terminals and thus maintains high lubricity. Therefore, by forming such a surface layer on a substrate, it is possible to impart a function such as lubricity. Further, the formed surface layer has high adhesion to the substrate and is excellent in durability.
  • Such a surface layer is transparent and has a low refractive index, or is excellent in heat resistance or chemical resistance.
  • the shape and material of the substrate on which the surface layer is to be formed are not particularly limited, and may be ones suitable for the application of the substrate provided with such a surface layer.
  • the application of the substrate provided with such a surface layer may, for example, be a magnetic disk, an optical fiber, a mirror, a solar cell, an optical disk, a touch panel, an exposure and fixing drum, a film condenser, various films such as an antireflection film for glass windows, etc.
  • the magnetic disk may, for example, be one having a primer layer, a recording layer and a diamond-like carbon protective film (DLC film) formed sequentially on a NiP-plated substrate (such as aluminum or glass).
  • the thickness of the DLC film is preferably at most 5.0 nm.
  • the average surface roughness (Ra) of the DLC film is preferably at most 2.0 nm.
  • the thickness of the surface layer is suitably set depending upon the particular application.
  • the thickness is preferably from 0.1 to 2 nm, particularly preferably from 0.5 to 1 nm.
  • the thickness of the surface layer is at least the lower limit value in the above range, the lubricating effects, etc. by the surface layer can be obtained sufficiently.
  • it is at most the upper limit value within the above range such can highly contribute to high density recording of the magnetic recording medium.
  • the fluorinated ether composition of the present invention it is possible to form a surface layer which exhibits sufficient lubricity even when its thickness is made thin. Therefore, the thinner the thickness of the surface layer, the higher the usefulness of the present invention.
  • the thickness of the surface layer may, for example, be calculated from the oscillation period of interference patterns of reflected X-rays obtained by X-ray reflectivity technique by means of an X-ray diffraction meter for thin film analysis ATX-G (manufactured by RIGAKU CORPORATION).
  • a liquid composition may be prepared by adding a liquid medium to the fluorinated ether composition of the present invention.
  • the fluorinated ether composition of the present invention is to be used as a surface modifier in an application to form a surface layer on a substrate, it is preferred to use it as a liquid composition by adding a liquid medium to the fluorinated ether composition of the present invention.
  • the surface modifier or surfactant (which may collectively be referred to also as “the surface modifier or the like”) of the present invention is one containing the fluorinated ether composition of the present invention.
  • the surface modifier or the like of the present invention may be one which is composed solely of the fluorinated ether composition of the present invention, or one which may further contain other components.
  • the content of the fluorinated ether composition of the present invention in the surface modifier or the like of the present invention is preferably from 90 to 100 mass %, particularly preferably 100 mass %, to the total mass of the surface modifier or the like. That is, the surface modifier or the like of the present invention is particularly preferably composed of the fluorinated ether composition of the present invention.
  • optional compounds which are useful as surface modifiers or surfactants and which do not correspond to the fluorinated ether compounds may be used, and, for example, coupling agents of silane type, epoxy type, titanium type, aluminum type, etc. may be mentioned.
  • the fluorinated ether composition of the present invention is to be used as a surface modifier, by using such a coupling agent, it is possible to improve the adhesion between the substrate and the compound (A).
  • the surface modifier may be used in an application as a lubricant. Further, it may be used as applied on a film or sheet made of a resin, in an application to control the refractive index of the resin, or in an application to improve the chemical resistance of the resin.
  • the lubricant it is preferably used for a magnetic disk, particularly in an application to impart lubricity as applied on a diamond-like carbon protective film (DLC film) of a magnetic disk.
  • DLC film diamond-like carbon protective film
  • the surfactant it may, for example, be used as an additive or leveling agent to lower the surface tension of a coating material, or as a leveling agent for a polishing liquid.
  • the amount of the fluorinated ether composition of the present invention will be at a level of from 0.01 to 5 mass % to the coating material.
  • the liquid composition of the present invention comprises the fluorinated ether composition of the present invention and a liquid medium.
  • the liquid composition of the present invention may be any one of a solution, a suspension and an emulsion, and is preferably a solution.
  • the concentration of the fluorinated ether composition of the present invention in the liquid composition may suitably adjusted depending upon the particular application and is preferably from 0.005 to 50 mass %, more preferably from 0.05 to 5 mass %, particularly preferably from 0.01 to 1 mass %, to the total mass of the liquid composition.
  • concentration of the fluorinated ether composition is within the above range, a uniform surface layer can be formed.
  • the liquid medium may be any medium so long as it is capable of dissolving or dispersing the fluorinated ether composition of the present invention and is preferably an organic solvent.
  • the organic solvent may be a fluorinated organic solvent or a non-fluorinated organic solvent, or may contain both of such solvents.
  • the fluorinated organic solvent may, for example, be a fluoro-alkane, a fluoro-aromatic compound, a fluoro-alkyl ether, a fluoro-alkylamine, or a fluoro-alcohol.
  • the fluoro-alkane is preferably a C 4-8 compound.
  • C 6 F 13 H (trade name: AC-2000, manufactured by Asahi Glass Co., Ltd.), C 6 F 13 C 2 H 5 (trade name: AC-6000, manufactured by Asahi Glass Co., Ltd.), C 2 F 5 CHFCHFCF 3 (trade name: Vertrel-XF, manufactured by DuPont), etc. may be mentioned.
  • the fluoro-aromatic compound may, for example, be hexafluorobenzene, trifluoromethylbenzene, perfluorotoluene, or bis(trifluoromethyl)benzene.
  • the fluoro-alkyl ether is preferably a C 4-12 compound.
  • a hydrofluoroalkyl ether is preferred.
  • commercial products for example, CF 3 CH 2 OCF 2 CF 2 H (trade name: AE-3000, manufactured by Asahi Glass Co., Ltd.), C 4 F 9 OCH 3 (trade name: Novec-7100, manufactured by 3M), C 4 F 9 OC 2 H 5 (trade name: Novec-7200, manufactured by 3M), C 6 F 13 OCH 3 (trade name: Novec-7300, manufactured by 3M), etc. may be mentioned.
  • the fluoro-alkylamine is preferably a perfluoro-alkylamine, and, for example, perfluorotripropylamine or perfluorotributylamine may be mentioned.
  • the fluoro-alcohol may, for example, be 2,2,3,3-tetrafluoropropanol, 2,2,2-trifluoroethanol or hexafluoroisopropanol.
  • the fluorinated organic solvent is preferably a fluoro-alkane, a fluoro-aromatic compound, or a fluoro-alkyl ether.
  • a fluoro-alkane a fluoro-aromatic compound
  • a fluoro-alkyl ether particularly preferred is a hydrofluoro-alkyl ether in that the ozone depletion potential is low.
  • the non-fluorinated organic solvent is preferably a compound composed solely of hydrogen atoms and carbon atoms, or a compound composed solely of hydrogen atoms, carbon atoms and oxygen atoms, and may, for example, be a hydrocarbon type organic solvent, an alcohol type organic solvent, a ketone type organic solvent, an ether type organic solvent or an ester type organic solvent.
  • the hydrocarbon type organic solvent is preferably e.g. hexane, heptane or cyclohexane.
  • the alcohol type organic solvent is preferably e.g. methanol, ethanol, propanol or isopropanol.
  • the ketone type organic solvent is preferably e.g. acetone, methyl ethyl ketone, or methyl isobutyl ketone.
  • the ether type organic solvent is preferably e.g. diethyl ether, tetrahydrofuran, or tetraethylene glycol dimethyl ether.
  • the ester type organic solvent is preferably e.g. ethyl acetate or butyl acetate.
  • the non-fluorinated organic solvent is particularly preferably a ketone type organic solvent.
  • the liquid medium is preferably at least one organic solvent selected from the group consisting of a fluoro-alkane, a fluoro-aromatic compound, a fluoro-alkyl ether, a compound composed solely of hydrogen atoms and carbon atoms, and a compound composed solely of hydrogen atoms, carbon atoms and oxygen atoms.
  • a fluorinated organic solvent selected from a fluoro-alkane, a fluoro-aromatic compound and a fluoro-alkyl ether.
  • the liquid medium preferably contains at least one organic solvent selected from the group consisting of, as fluorinated organic solvents, a fluoro-alkane, a fluoro-aromatic compound and a fluoro-alkyl ether, and, as a non-fluorinated organic solvent, a compound composed solely of hydrogen atoms, carbon atoms and oxygen atoms, in an amount in total of at least 90 mass % of the entire liquid medium.
  • the liquid composition may further contain other components in addition to the fluorinated ether composition of the present invention and the solvent, within a range not to impair the effects of the present invention.
  • a radical scavenger e.g. trade name: X-1p, manufactured by Dow Chemicals, etc. may be mentioned as such other components.
  • the liquid composition should preferably not contain metal ions, anions, moisture, low molecular weight polar compounds, etc., since, otherwise, the desired performance may not be attained.
  • Metal ions such as Na, K, Ca, Al, etc.
  • Anions such as F, Cl, NO 2 , NO 3 , PO 4 , SO 4 , C 2 O 4 , etc.
  • the moisture content in the liquid composition is preferably at most 2,000 ppm.
  • Low molecular weight polar compounds such as alcohols, plasticizers eluting from resins, etc. are likely to lower the adhesion between the substrate and the surface layer.
  • the fluorinated ether composition of the present invention is to be used as a surface modifier, it is preferred that the liquid composition containing the fluorinated ether composition of the present invention is applied on a substrate and dried to form a coating film (surface layer) containing the fluorinated ether composition of the present invention, thereby to have the desired function exhibited.
  • the substrate on which the liquid composition of the present invention is to be applied is not particularly limited and may, for example, be the same one as mentioned above as the substrate on which the surface layer is to be formed. From the viewpoint of usefulness of the present invention, a magnetic disk is preferred as the substrate.
  • the coating method for the liquid composition may, for example, be a roll coating method, a casting method, a dip coating method, a spin coating method, a casting-on-water method, a die coating method, a Langmuir-Blodgett method, or a vacuum vapor deposition method, and is preferably a pin coating method, a dip coating method or a vacuum vapor deposition method.
  • the drying method may, for example, be natural drying, vacuum drying, centrifugal drying or heat drying.
  • adhesion treatment may be carried out in order to firmly bond the fluorinated ether composition on the substrate (e.g. on a carbon protective film of a magnetic disk).
  • Such adhesion treatment may, for example, be heat treatment, ultraviolet irradiation treatment or plasma treatment, and is preferably heat treatment or ultraviolet irradiation treatment, particularly preferably heat treatment. Drying treatment may serve also as adhesion treatment.
  • the substrate after the adhesion treatment may be cleaned by a fluorinated organic solvent for the purpose of removing fouling or removing excess fluorinated ether compounds.
  • the article of the present invention is one having a film made of the fluorinated ether composition of the present invention, on a substrate.
  • the substrate on which the liquid composition of the present invention is to be applied is not particularly limited and may, for example, be the same one as mentioned above as the substrate on which the surface layer is to be formed. From the viewpoint of usefulness of the present invention, a magnetic disk is preferred as the substrate.
  • a method known as a method for forming a film made of a fluorinated ether composition may be employed as the method for forming such a film on the substrate.
  • a film may be formed by e.g. the above mentioned method for forming a surface layer by applying the liquid composition of the present invention on a substrate.
  • Mn number average molecular weight
  • Mw/Mn molecular weight distribution
  • the measurement by GPC was in accordance with the method disclosed in JP-A-2001-208736 and was conducted under the following conditions.
  • Analytical column One having two PLgel MIXED-E columns (manufactured by Polymer Laboratories) connected in series.
  • Standard samples for measuring molecular weight Four types of perfluoropolyether having Mw/Mn of less than 1.1 and Mn of from 2,000 to 10,000, and one type of perfluoropolyether having Mw/Mn of at least 1.1 and Mn of 1,300
  • Detector evaporative light scattering detector
  • the coverage factor of the surface layer formed on a substrate was evaluated by F/Si measured under the following measurement conditions by an X-ray Photoelectron Spectroscopy (XPS).
  • XPS X-ray Photoelectron Spectroscopy
  • XPS is a method wherein characteristic X-rays of e.g. Al or Mg are applied to a sample, and the kinetic energy and intensity of photoelectrons emitted by photoelectric effects are measured, to know the types, amounts, chemical bonding states, etc. of atoms present at the solid surface.
  • the bonding energy Eb is a value depending on the types, electron orbitals and chemical bonding states of atoms by which photoelectrons were protected in the sample.
  • the incident X-ray energy hv and the work function W are already known. Therefore, if the kinetic energy Ek is measured, the bonding energy Eb can be obtained, and it is possible to know the types, electron orbitals and chemical bonding states of atoms in the sample.
  • the incident X-rays will penetrate at a depth of a few ⁇ m into the sample.
  • electrons emitted from atoms present at a deep location tend to lose energy by e.g. inelastic scattering with electrons constrained by other atoms in the sample and thus will not be emitted from the sample. Therefore, electrons emitted from the outermost surface at a depth of a few nm, determined by the inelastic mean free path (the distance where electrons can go forward without undergoing inelastic scattering), are observed as photoelectrons.
  • XPS is a method for measuring, at a high sensitivity, the type, amounts and chemical bonding states of atoms present at the outermost surface of the sample, whereby an extremely thin film applied on a substrate can be detected at a high sensitivity, and thus is a method effective for evaluating the coverage factor of a thin film.
  • the ratio of the F atom concentration and the Si atom concentration calculated, respectively, from the F1s peak intensity and the Si2p peak intensity obtained by the XPS measurement, is considered to be in a positive correlation with the coverage factor of the surface layer formed on the substrate.
  • PHI Quantera SXM manufactured by ULVAC-PHI, Inc.
  • AlK ⁇ ray (1486.6 eV) focused to a diameter of about 50 ⁇ m
  • the measurement was conducted at an irradiated X-ray intensity of 12.4 W, with a pass energy of the detector being 224 eV and at a photoelectron-takeoff angle of 45°.
  • the measurement was conducted by fixing the irradiated X-ray without scanning, and the outermost surface of the sample was measured, and no etching of the sample was conducted.
  • an electron beam and an Ar+ neutralizing gun provided as an accessory to the apparatus were used.
  • An integrated intensity of peaks having the background removed was used within an energy range of the bonding energy of from 682 to 691 eV in the calculation of the F1s peak intensity, and within an energy range of the bonding energy of from 96 to 107 eV in the calculation of the Si2p peak intensity. Further, using relative sensitivity coefficients of the respective elements specific to the apparatus, the F atom concentration and the Si atom concentration were calculated.
  • ethylene oxide was added by a known method to obtain an ethylene oxide adduct.
  • the ethylene oxide adduct was reacted with FCOCF(CF 3 )OCF 2 CF(CF 3 )O(CF 2 ) 3 F (hereinafter referred to also as “RfF”) to obtain an esterified derivative.
  • RfF FCOCF(CF 3 )OCF 2 CF(CF 3 )O(CF 2 ) 3 F
  • the esterified derivative (30 g) was dissolved in R-113 (270 g) and fluorinated by using fluorine gas diluted to 20% with nitrogen gas (hereinafter referred to also as “20% fluorine gas”). From the product, the solvent was distilled off under reduced pressure to obtain a fluorinated derivative which was liquid at room temperature.
  • the obtained crude product was purified by silica gel column (the method disclosed in Examples in JP-A-2009-197210) and then, subjected to supercritical purification (the method disclosed in Examples in JP-A-2009-197210).
  • the purified product had Mn of 5,867 (average value of b1 to b6: 7.1) and Mw/Mn of 1.10.
  • Diglycerin-initiated polyoxyethylene tetraol (“diglycerin-initiated polyoxyethylene glyceryl ether SC-E1500” manufactured by Sakamoto Yakuhin Kogyo Co., Ltd.) was reacted with RfF to obtain an esterified derivative.
  • the esterified derivative (30 g) was dissolved in R-113 (270 g) and fluorinated by using 20% fluorine gas. From the product, the solvent was distilled off under reduced pressure to obtain a fluorinated derivative which was liquid at room temperature.
  • the obtained crude product was purified by silica gel column (the method disclosed in Examples in JP-A-2009-197210) and then, subjected to supercritical purification (the method disclosed in Examples in JP-A-2009-197210).
  • the purified product had Mn of 2,593 (average value of b7 to b10: 3.9) and Mw/Mn of 1.07.
  • the fluorinated ether composition 1 was dissolved in Vertrel-XF (manufactured by DuPont) so that the concentration would be 0.05 mass %, to produce a liquid composition 1.
  • the liquid composition 1 was applied to a silicon wafer by dip coating to obtain an article (surface layer-equipped substrate) 1.
  • the silicon wafer was dipped at a dipping speed of 10 mm/sec. and after dipping for 60 seconds, withdrawn at a speed of 2 mm/sec.
  • the withdrawn silicon wafer was heated in an oven at 150° C. for 10 minutes to form a surface layer, whereby the article 1 was obtained.
  • the dynamic friction coefficient and F/Si of the outermost surface were measured. The results are shown in Table 1. Further, the outermost surface composition (atm %) of the article 1 measured by XPS is shown in Table 2.
  • Fluorinated ether compositions 2 to 6 were obtained in the same manner as in Ex. 1 except that the mass ratio of compound (A6-1) and compound (B4-1) was changed to the values as shown in Table 1.
  • Liquid compositions 2 to 6 were prepared in the same manner as in Ex. 1 except that the fluorinated ether compositions 2 to 6 were used instead of the fluorinated ether composition 1, and using them, articles 2 to 6 were obtained. With respect to the articles 2 to 4, dynamic friction coefficients and F/Si were measured. The results are shown in Table 1. Further, the outermost surface compositions (atm %) of the articles 2 to 4 measured by XPS are shown in Table 2.
  • the dynamic friction coefficient of the outermost surface was low, and the surface layer had high lubricity.
  • the outermost surface composition had a F atom concentration of 25.6 atm % and a Si atom concentration of 29.7 atm %, whereby the value of F/Si was significantly high as compared with in Ex. 2, and the coverage factor of the substrate surface by the surface layer was high.
  • the coverage factor was high, it was confirmed that the amount of the fluorinated ether composition 1 attached to the substrate surface was sufficient, and the adhesion to the substrate was excellent. From these results, it was confirmed that according to the fluorinated ether composition 1, it is possible to develop excellent lubricity and adhesion.
  • the fluorinated ether composition of the present invention is useful as a surface modifier or a surfactant and is particularly useful as a lubricant for a magnetic recording medium such as a hard disk.

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