US20090000641A1 - Methods and apparatus for cleaning deposition chamber parts using selective spray etch - Google Patents
Methods and apparatus for cleaning deposition chamber parts using selective spray etch Download PDFInfo
- Publication number
- US20090000641A1 US20090000641A1 US12/146,676 US14667608A US2009000641A1 US 20090000641 A1 US20090000641 A1 US 20090000641A1 US 14667608 A US14667608 A US 14667608A US 2009000641 A1 US2009000641 A1 US 2009000641A1
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- United States
- Prior art keywords
- cleaning
- spray
- spraying
- temperature
- chamber component
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Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G3/00—Apparatus for cleaning or pickling metallic material
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
- B08B3/04—Cleaning involving contact with liquid
- B08B3/08—Cleaning involving contact with liquid the liquid having chemical or dissolving effect
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
- C23C16/4407—Cleaning of reactor or reactor parts by using wet or mechanical methods
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/26—Acidic compositions for etching refractory metals
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/44—Compositions for etching metallic material from a metallic material substrate of different composition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
- C23G1/14—Cleaning or pickling metallic material with solutions or molten salts with alkaline solutions
- C23G1/22—Light metals
Definitions
- FIGS. 1A-E are a schematic illustration of a method for cleaning or reclaiming a process film coated component according to one of the embodiments of the invention.
- FIG. 2 is a flow diagram of a cleaning method of the invention.
- FIG. 3 is a flow diagram of a method of controlling chamber component temperature during cleaning chemistry spraying.
- FIG. 4 is a schematic drawing of a chamber component spraying apparatus of the invention.
- FIG. 6 is a schematic drawing of another chamber component spraying apparatus of the invention.
- FIG. 7 is a schematic drawing of another chamber component spraying apparatus of the invention.
- the components may be dipped into an acid bath to remove an unintentional coating or film.
- the acid bath dip may result in a violent reaction which may be undesirable.
- a tremendous amount of heat may be produced by the reaction so that a chiller may be needed to cool the process to an operating temperature at which the equipment is not over heated.
- the unintentional coating on the equipment may not be even.
- PVD physical vapor deposition
- the top of the shields near the target or source may accumulate a thicker, denser coating than the bottom of the shields near the substrate.
- Over-etching may damage the shields and may cause future unintentional coatings to shed onto a substrate being processed. Shedding of particles onto a substrate may cause defects in the substrate that may render the substrate inoperative.
- contamination control is a major issue for manufacturers of semiconductor devices, flat panel displays and solar power panels.
- the present invention provides methods and apparatus for cleaning coatings from the surfaces of processing equipment.
- the applicants have discovered that by spraying a cleaning chemistry onto a part, rather than by dipping the part into the cleaning chemistry, enhanced cleaning of processing equipment parts may be obtained.
- the enhanced cleaning may be obtained with less etching of the parts themselves and with less etching of any intentional coating of the part.
- the part may then be pressure washed with DI water, for example, and then may be treated with potassium hydroxide. Finally, the part may be re-rinsed with the DI water.
- FIGS. 1A-1E are a schematic illustration of a method for cleaning (or reclaiming) a process-film coated component according to one of the embodiments of the invention.
- the starting point in FIG. 1A may be a chamber component 102 .
- a chamber component may be made from aluminum, stainless steel or a ceramic.
- the chamber components may be made from aluminum.
- new chamber components 102 may be intentionally covered with a coating 104 .
- This may be referred to herein as an “intentional coating.”
- the coating may, for example, be a protective layer, or a layer which gives the component proper electrical properties in order to be compatible with a plasma environment.
- the coating may minimize contamination of substrates within the chamber.
- One intentional coating 104 is a twin wire arc spray (“TWAS”) coating of aluminum, copper, nickel, molybdenum, or zinc, for example. Other intentional coatings may be used.
- TWAS coating process may include two wires which form an electric arc. Molten metal which results from the arcing metal wires may be atomized by compressed air and sprayed upon a component to form a coating.
- the resulting intentionally coated component may have a roughness which promotes adhesion of PVD materials to the component. This may help prevent unintentionally coated PVD materials from breaking off and contaminating the surface of a substrate.
- Other components such as the ones listed earlier, may also be coated by a TWAS processes.
- adhesion of other process materials such as, for example, CVD films, and etching by-products, etc., as discussed earlier may be enhanced by the TWAS or other intentional coating.
- the next layer may be the accumulated process material layer or unintentional coating 106 .
- the unintentional coating material may vary.
- Common accumulated process films in PVD equipment may include copper (Cu), ruthenium (Ru), aluminum (Al), titanium (Ti) and/or titanium nitride (TiN), titanium tungsten (TiW) and tantalum (Ta) and/or tantalum nitride (TaN).
- Unintentional coatings on etching equipment are usually polymeric.
- Unintentional coatings on CVD chambers may be silicon dioxide, silicon nitride, silicon oxynitride, silicon carbon, doped silicon oxides, oxygenated silicon carbon films (often referred to as SiCOH).
- the first cleaning or reclaiming step takes place.
- the chamber component 102 with intentional 104 and unintentional 106 coatings or films is exposed to a cleaning chemistry spray.
- This cleaning chemistry spray may preferentially remove or etch the unintentional coating 106 as compared to the intentional coating 104 and/or chamber component material itself.
- the unintentional coating 106 may be TaN/Ta and the intentional layer 104 may be a TWAS deposited aluminum layer on an aluminum chamber component 102 .
- Spraying the cleaning chemistry on the component, as opposed to dipping the component in the cleaning chemistry may have several advantages. First, with a spray, the direction of the chemical can be more readily controlled.
- areas with thick unintentional coating can be exposed to a chemical for a longer time than areas of thin unintentional coating. Accordingly, the thick areas of unintentional coating may be completely or substantially cleaned without over-etching the thin areas of unintentional coating. For example, it may take only 30 minutes to remove a thin unintentional coating, whereas it may take about 2 hours to remove a thick or dense unintentional coating.
- spraying a chemical may use less chemical than dipping into a chemical bath uses. For example, a spray process may use a few gallons of chemical (which can be collected and recycled via an automated spray system) whereas a bath may use 20 gallons of chemical. A spray process also generates less heat than a dipping bath process and therefore, the spray process may be safer and the use of a chiller may not be required in spray systems.
- portions of a chamber component which have not accumulated unintentional coating may be masked so that the cleaning chemistry spray will not etch the chamber component or the intentional coating.
- the spray chemistry may vary depending upon the identity of the unintentional film 106 , the intentional film 104 and the substrate 102 .
- an effective selective chemistry may be 15:85 ratio of hydrogen fluoride (HF) to nitric acid (HNO 3 ) or the same ratio of hydrogen chloride (HCl) to nitric acid (HNO 3 ).
- the nitric acid may be commercial grade which may provide a cost benefit.
- the ratio may vary somewhat, a 20:80 ratio of the same constituents may also be effective for selective stripping of TaN/Ta from an Al coating or component.
- the majority, if not all of the unintentional coating 106 may be removed from the thickly accumulated areas (top of the shield near a source/target, for example), while the thinly coated areas may not be over-etched.
- step 1 C the component is power washed with DI water to remove the cleaning chemistry and perhaps to remove some (if any exists) of the remaining unintentional coating 106 (TaN/Ta, for example).
- the pressure of the pressure washing step can vary widely, from 500 to 2000 p.s.i. However, it is expected that for most applications, 1000 p.s.i will suffice.
- the intentional coating 104 (TWAS Al, for example) is removed with a dilute potassium hydroxide (KOH) mixture.
- KOH potassium hydroxide
- the degree of dilution may vary from about 6% KOH up to 25% KOH.
- the KOH may be sprayed on the component, or the component may be dipped in a bath of KOH.
- any of the unintentional coating 106 remains on the chamber component 102 , it is expected that the KOH step will under-cut the fragmented unintentional coating 106 . Such undercutting may help to remove any remaining fragmented unintentional coating 106 .
- the size of a PVD shield it is expected to take about 60 to 90 minutes to remove the intentional coating 104 with a dilute KOH treatment.
- the component may be washed with DI water at about 40 p.s.i following the KOH treatment.
- the cleaned component (PVD shield, for example) is ready for grit-blasting and an application of a new intentional layer 106 (TWAS Al, in the example of a PVD shield) so that the component can be re-installed in a processing chamber.
- TWAS Al a new intentional layer 106
- Details of the grit-blasting process and deposition of the intentional layer can be found in commonly owned U.S. Pat. No. 6,812,471 by Popiolkokwski et al., filed on Jul. 17, 2003, and U.S. Pat. No. 6,933,508 also by Popiolkokwski et al., filed on Mar. 13, 2002, which are incorporated herein in their entireties for all purposes.
- FIGS. 1A-1E illustrate a cleaning method of the invention and its effect on a surface of a component.
- FIG. 2 is a flow diagram of one embodiment of the cleaning method 200 of the invention.
- Method 200 begins in step 202 .
- a component to be cleaned is provided wherein the component has an unintentional coating.
- the unintentional coating corresponds to layer 106 of FIGS. 1A-E .
- the cleaning process may also be thought of as a reclaiming process or a stripping process.
- the component may also have an intentional coating on it located on the component but beneath the unintentional coating. The intentional coating corresponds to layer 104 as discussed with reference to FIGS. 1A-E .
- the component having an unintentional coating is sprayed with a cleaning chemistry.
- the cleaning chemistry may be a selective chemistry whereby the cleaning chemistry may etch the unintentional coating 106 faster than it etches the intentional coating 104 .
- the selective chemistry may etch the unintentional coating faster than it etches the component.
- the chemistry used would be the same as explained in conjunction with FIG. 1B .
- step 208 the component is sprayed with high pressure DI water.
- the pressure washing removes the chemicals from step 206 and may loosen and remove any unintentional coating material remaining after step 206 .
- step 210 the component is exposed to a dilute KOH mixture.
- the mixture concentration is as explained in conjunction with FIG. 1D .
- the mixture may be sprayed on the component or the component may be dipped in a bath of KOH. If the spray method is used, the KOH treatment may occur in the same apparatus. Alternatively, the component may be moved to a separate apparatus to receive KOH treatment (either spray or bath). The KOH treatment may strip the intentional coating from the component. If the component does not have an intentional coating ( 104 of FIG. 1 ), then step 4 may be omitted.
- the component may be rinsed with DI water following the treatment with KOH.
- the newly cleaned component is ready to be reconditioned.
- the reconditioning process may include grit blasting the component and the application of a new intentional coating. Reconditioning processes are discussed in more detail in commonly owned U.S. Pat. No. 6,812,471 by Popiolkokwski et al., filed on Jul. 17, 2003, and U.S. Pat. No. 6,933,508 also by Popiolkokwski et al., filed on Mar. 13, 2002, which have been previously incorporated herein by reference.
- step 308 the method may pass to step 310 in which the flow rate of the cleaning chemistry is decreased, and the spraying of the chamber component is continued. The method then passes back to step 306 where the temperature is re-measured.
- FIG. 4 is a schematic drawing of a chamber component spraying apparatus 400 of the invention.
- Spraying apparatus 400 may be used to perform any spraying step described herein.
- the spraying apparatus 400 may be a tank 402 or the like which completely encloses a component to be cleaned 404 as shown in FIG. 4 .
- the apparatus may appear to be an open tank with a fume hood above it.
- the tank 402 may be used to clean one chamber component 404 at a time if the chamber component 404 is a large component.
- Spraying apparatus 400 may include spray nozzles 408 which are depicted in FIG. 4 as located along the left and right sides of the tank 402 . It will be understood that spray nozzles 408 may be located on any interior surface of tank 402 or alternatively spray nozzles 408 may be suspended within tank 402 . Spray nozzles 408 may be connected to cleaning chemistry supplies 410 , which may in turn be connected to cleaning chemistry recycle conduit 412 . Although conduit 412 is shown as connected to only one cleaning chemistry supply 410 , it will be understood that a similar connection may be made with the other depicted cleaning chemistry supply 410 . One or more cleaning chemistry supplies 410 may be used.
- FIG. 5 is a schematic drawing of another spraying apparatus 500 of the present invention.
- Spraying apparatus 500 may be substantially similar to spraying apparatus 400 of FIG. 4 , with the following differences.
- the chamber component 404 is not suspended and/or raised by component holding devices 406 . Instead, chamber component 404 may be placed upon turntable 502 .
- Turntable 502 may be used to rotate the chamber component 404 .
- FIG. 6 is a schematic drawing of yet another spraying apparatus 600 of the present invention.
- Spraying apparatus 600 may be substantially similar to the spraying apparatus 500 of FIG. 5 , with the following exceptions.
- Spraying apparatus 600 may have an interior spray assembly 602 .
- the interior spray assembly 602 may include a cleaning chemistry source 604 connected through a conduit/support member 606 to a nozzle 608 .
- Nozzle 608 may be similar to nozzle 408 .
- the nozzle 608 may be movably and/or rotatably mounted on conduit/support member 606 .
- the conduit/support member 606 may be adapted to move the nozzle 608 vertically and or rotationally. Although only one nozzle 608 is shown, it is to be understood that a plurality of nozzles 608 may be used and attached to conduit/support member 606 .
- the spraying apparatus 600 may be operated similarly to the spraying apparatus 400 of FIG. 4 and the spraying apparatus 500 of FIG. 5 , with the additional functionality described herein.
- the spraying apparatus 600 of FIG. 6 may spray cleaning chemistry on the interior portions of chamber component 404 through the nozzle 608 .
- Cleaning chemistry may flow from cleaning chemistry source 604 through the conduit 606 to the nozzle 608 .
- the interior spray assembly 602 may be operated independently of the nozzles 408 . Alternatively, the interior spray assembly 602 may be operated in conjunction with the nozzles 408 .
- the nozzle 608 may rotate so that all interior portions of the chamber component 404 may be sprayed with cleaning composition.
- the rotation of the nozzle 608 may be accomplished by rotating the conduit/support member 606 or by any other suitable method.
- the nozzle 608 may be moved in the vertical direction by raising or lowering the conduit/support member 606 , or by any other suitable method.
- the spraying apparatus 700 of FIG. 7 may be operated similarly to the spraying apparatus 400 of FIG. 4 , with the following differences.
- the chamber component 404 may be rotated so that the nozzles 408 may reach all portions of the exterior of the chamber component 404 .
- the chamber component 404 may be held stationary by component holding devices 406 and the nozzles 408 , which may be mounted on arm 702 , may be moved laterally, vertically and/or rotationally to reach all exterior portions of the chamber component 404 .
- the nozzles 408 may be independently controlled so that more or less cleaning chemistry may be sprayed on portions of the chamber component 404 which have more or less unintentional coating 106 there on.
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US12/146,676 US20090000641A1 (en) | 2007-06-28 | 2008-06-26 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
US13/585,294 US8691023B2 (en) | 2007-06-28 | 2012-08-14 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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US94698307P | 2007-06-28 | 2007-06-28 | |
US12/146,676 US20090000641A1 (en) | 2007-06-28 | 2008-06-26 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
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US13/585,294 Division US8691023B2 (en) | 2007-06-28 | 2012-08-14 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
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US20090000641A1 true US20090000641A1 (en) | 2009-01-01 |
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Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
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US12/146,676 Abandoned US20090000641A1 (en) | 2007-06-28 | 2008-06-26 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
US13/585,294 Active US8691023B2 (en) | 2007-06-28 | 2012-08-14 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
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US13/585,294 Active US8691023B2 (en) | 2007-06-28 | 2012-08-14 | Methods and apparatus for cleaning deposition chamber parts using selective spray etch |
Country Status (9)
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US (2) | US20090000641A1 (de) |
EP (2) | EP2383049B1 (de) |
JP (2) | JP5596909B2 (de) |
KR (1) | KR101027612B1 (de) |
CN (2) | CN101342534B (de) |
AT (1) | ATE518018T1 (de) |
SG (2) | SG148975A1 (de) |
TW (1) | TWI479559B (de) |
WO (1) | WO2009005742A1 (de) |
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US20090218042A1 (en) * | 2006-03-03 | 2009-09-03 | Quantum Global Technologies, Llc. | Methods For Producing Quartz Parts With Low Defect And Impurity Densities For Use In Semiconductor Processing |
US7993470B2 (en) | 2003-09-02 | 2011-08-09 | Applied Materials, Inc. | Fabricating and cleaning chamber components having textured surfaces |
US20190295826A1 (en) * | 2010-10-15 | 2019-09-26 | Applied Materials, Inc. | Method and apparatus for reducing particle defects in plasma etch chambers |
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TWI479559B (zh) | 2007-06-28 | 2015-04-01 | Quantum Global Tech Llc | 以選擇性噴灑蝕刻來清潔腔室部件的方法和設備 |
JP5169669B2 (ja) | 2007-11-02 | 2013-03-27 | 株式会社デンソー | 燃圧検出装置、及び燃圧検出システム |
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US10283321B2 (en) | 2011-01-18 | 2019-05-07 | Applied Materials, Inc. | Semiconductor processing system and methods using capacitively coupled plasma |
US9064815B2 (en) | 2011-03-14 | 2015-06-23 | Applied Materials, Inc. | Methods for etch of metal and metal-oxide films |
US9267739B2 (en) | 2012-07-18 | 2016-02-23 | Applied Materials, Inc. | Pedestal with multi-zone temperature control and multiple purge capabilities |
US9373517B2 (en) | 2012-08-02 | 2016-06-21 | Applied Materials, Inc. | Semiconductor processing with DC assisted RF power for improved control |
US9132436B2 (en) | 2012-09-21 | 2015-09-15 | Applied Materials, Inc. | Chemical control features in wafer process equipment |
US10256079B2 (en) | 2013-02-08 | 2019-04-09 | Applied Materials, Inc. | Semiconductor processing systems having multiple plasma configurations |
US9362130B2 (en) | 2013-03-01 | 2016-06-07 | Applied Materials, Inc. | Enhanced etching processes using remote plasma sources |
KR102189874B1 (ko) * | 2013-10-07 | 2020-12-11 | 세메스 주식회사 | 기판 처리 장치, 그리고 기판 처리 장치를 이용한 기판 처리 방법 |
US9903020B2 (en) * | 2014-03-31 | 2018-02-27 | Applied Materials, Inc. | Generation of compact alumina passivation layers on aluminum plasma equipment components |
US9966240B2 (en) | 2014-10-14 | 2018-05-08 | Applied Materials, Inc. | Systems and methods for internal surface conditioning assessment in plasma processing equipment |
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Also Published As
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EP2011897A2 (de) | 2009-01-07 |
EP2011897A3 (de) | 2009-03-04 |
US8691023B2 (en) | 2014-04-08 |
SG148975A1 (en) | 2009-01-29 |
JP2009007674A (ja) | 2009-01-15 |
JP5935174B2 (ja) | 2016-06-15 |
CN101342534A (zh) | 2009-01-14 |
CN103406300B (zh) | 2017-11-03 |
WO2009005742A1 (en) | 2009-01-08 |
SG182970A1 (en) | 2012-08-30 |
JP5596909B2 (ja) | 2014-09-24 |
TWI479559B (zh) | 2015-04-01 |
KR101027612B1 (ko) | 2011-04-06 |
US20130037062A1 (en) | 2013-02-14 |
KR20090004598A (ko) | 2009-01-12 |
EP2383049A1 (de) | 2011-11-02 |
EP2011897B8 (de) | 2011-09-28 |
CN103406300A (zh) | 2013-11-27 |
EP2011897B1 (de) | 2011-07-27 |
EP2383049B1 (de) | 2013-08-07 |
JP2014210980A (ja) | 2014-11-13 |
CN101342534B (zh) | 2013-08-28 |
ATE518018T1 (de) | 2011-08-15 |
TW200908135A (en) | 2009-02-16 |
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