US20050025634A1 - Controlling pressure in a process chamber by variying pump speed and a regulator valve, and by injecting inert gas - Google Patents

Controlling pressure in a process chamber by variying pump speed and a regulator valve, and by injecting inert gas Download PDF

Info

Publication number
US20050025634A1
US20050025634A1 US10/840,288 US84028804A US2005025634A1 US 20050025634 A1 US20050025634 A1 US 20050025634A1 US 84028804 A US84028804 A US 84028804A US 2005025634 A1 US2005025634 A1 US 2005025634A1
Authority
US
United States
Prior art keywords
regulator valve
process chamber
inert gas
gas injection
primary
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
US10/840,288
Other languages
English (en)
Inventor
Roland Bernard
Jean-Pierre Desbiolles
Sebastien Munari
Claude Rousseau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Alcatel Lucent SAS
Original Assignee
Alcatel SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Alcatel SA filed Critical Alcatel SA
Assigned to ALCATEL reassignment ALCATEL ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: BERNARD, ROLAND, DESBIOLLES, JEAN-PIERRE, MUNARI, SEBASTIAN, ROUSSEAU, CLAUDE
Publication of US20050025634A1 publication Critical patent/US20050025634A1/en
Abandoned legal-status Critical Current

Links

Images

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B41/00—Pumping installations or systems specially adapted for elastic fluids
    • F04B41/06—Combinations of two or more pumps
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/08—Regulating by delivery pressure
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04D—NON-POSITIVE-DISPLACEMENT PUMPS
    • F04D19/00—Axial-flow pumps
    • F04D19/02—Multi-stage pumps
    • F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
    • F04D19/046—Combinations of two or more different types of pumps
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D16/00—Control of fluid pressure
    • G05D16/20—Control of fluid pressure characterised by the use of electric means
    • G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
    • G05D16/208—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using a combination of controlling means as defined in G05D16/2013 and G05D16/2066

Definitions

  • FIG. 1 c shows a curve for variation in the opening of a valve in order to follow small-amplitude pressure and flow rate variations in the process chamber;
  • the inert gas injection means 6 are programmed to inject a quantity of inert gas that enables an appropriate mean gas pressure to be achieved downstream from the secondary pump 8 , thereby determining a mean pressure in the process chamber 1 that corresponds to the mean pressure required by the current step of the method, for a mean position of the regulator valve which is intermediate being in a zone of sensitivity that is appropriate for the adjustment.
  • FIGS. 1 a to 1 e show an example of how operating conditions in a system for controlling pressure in a process chamber can vary as a function of time in an embodiment of the invention.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • General Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Drying Of Semiconductors (AREA)
  • Control Of Fluid Pressure (AREA)
  • Flow Control (AREA)
  • Air Transport Of Granular Materials (AREA)
  • Fluid-Damping Devices (AREA)
  • Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
US10/840,288 2003-05-09 2004-05-07 Controlling pressure in a process chamber by variying pump speed and a regulator valve, and by injecting inert gas Abandoned US20050025634A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR0305615A FR2854667B1 (fr) 2003-05-09 2003-05-09 Controle de pression dans la chambre de procedes par variation de vitesse de pompes, vanne de regulation et injection de gaz neutre
FR0305615 2003-05-09

Publications (1)

Publication Number Publication Date
US20050025634A1 true US20050025634A1 (en) 2005-02-03

Family

ID=32982389

Family Applications (1)

Application Number Title Priority Date Filing Date
US10/840,288 Abandoned US20050025634A1 (en) 2003-05-09 2004-05-07 Controlling pressure in a process chamber by variying pump speed and a regulator valve, and by injecting inert gas

Country Status (6)

Country Link
US (1) US20050025634A1 (ja)
EP (1) EP1475535B1 (ja)
JP (1) JP4516352B2 (ja)
AT (1) ATE483911T1 (ja)
DE (1) DE602004029416D1 (ja)
FR (1) FR2854667B1 (ja)

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20070104586A1 (en) * 1998-11-23 2007-05-10 James Cedrone System and method for correcting for pressure variations using a motor
US20070128048A1 (en) * 2005-12-02 2007-06-07 George Gonnella System and method for position control of a mechanical piston in a pump
US20080131290A1 (en) * 2006-11-30 2008-06-05 Entegris, Inc. System and method for operation of a pump
EP1960670A2 (en) * 2005-12-02 2008-08-27 Entegris, Inc. System and method for operation of a pump
US20090004610A1 (en) * 2007-06-29 2009-01-01 Hak Joon Kim Method and apparatus for manufacturing semiconductor device
US20090047143A1 (en) * 2005-11-21 2009-02-19 Entegris, Inc. Method and system for high viscosity pump
US20090132094A1 (en) * 2004-11-23 2009-05-21 Entegris, Inc. System and Method for a Variable Home Position Dispense System
US8651823B2 (en) 2005-11-21 2014-02-18 Entegris, Inc. System and method for a pump with reduced form factor
US8870548B2 (en) 2005-12-02 2014-10-28 Entegris, Inc. System and method for pressure compensation in a pump

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2878913B1 (fr) 2004-12-03 2007-01-19 Cit Alcatel Controle des pressions partielles de gaz pour optimisation de procede
WO2007010851A1 (ja) * 2005-07-21 2007-01-25 Nabtesco Corporation 真空システム及びその運転方法
US7369920B2 (en) * 2006-03-21 2008-05-06 Mks Instruments, Inc. Pressure control system with optimized performance
FR2921444A1 (fr) 2007-09-26 2009-03-27 Alcatel Lucent Sas Pompe a vide a deux rotors helicoidaux.

Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5165864A (en) * 1989-09-27 1992-11-24 Alcatel Cit Vacuum pump unit
JPH0758032A (ja) * 1993-08-09 1995-03-03 Hitachi Electron Eng Co Ltd 圧力制御装置および圧力制御方法
US6419455B1 (en) * 1999-04-07 2002-07-16 Alcatel System for regulating pressure in a vacuum chamber, vacuum pumping unit equipped with same
US20020134439A1 (en) * 2001-03-22 2002-09-26 Hiroyuki Kawasaki Gas recirculation flow control method and apparatus for use in vacuum system
US6474949B1 (en) * 1998-05-20 2002-11-05 Ebara Corporation Evacuating unit with reduced diameter exhaust duct
US20030209513A1 (en) * 2002-05-08 2003-11-13 Taiwan Semiconductor Manufacturing Co., Ltd. Venting apparatus and method for vacuum system
US20050279731A1 (en) * 1999-10-13 2005-12-22 Tokyo Electron Limited Processing method for conservation of processing gases

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD262065A1 (de) * 1987-07-07 1988-11-16 Univ Dresden Tech Vorrichtung zur druckregelung im feinvakuumbereich
US5944049A (en) * 1997-07-15 1999-08-31 Applied Materials, Inc. Apparatus and method for regulating a pressure in a chamber
DE10043783A1 (de) * 2000-09-06 2002-03-14 Leybold Vakuum Gmbh Verfahren und Vorrichtung zur Regelung des Vakuums in einer Kammer

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5165864A (en) * 1989-09-27 1992-11-24 Alcatel Cit Vacuum pump unit
JPH0758032A (ja) * 1993-08-09 1995-03-03 Hitachi Electron Eng Co Ltd 圧力制御装置および圧力制御方法
US6474949B1 (en) * 1998-05-20 2002-11-05 Ebara Corporation Evacuating unit with reduced diameter exhaust duct
US6419455B1 (en) * 1999-04-07 2002-07-16 Alcatel System for regulating pressure in a vacuum chamber, vacuum pumping unit equipped with same
US20050279731A1 (en) * 1999-10-13 2005-12-22 Tokyo Electron Limited Processing method for conservation of processing gases
US20020134439A1 (en) * 2001-03-22 2002-09-26 Hiroyuki Kawasaki Gas recirculation flow control method and apparatus for use in vacuum system
US20030209513A1 (en) * 2002-05-08 2003-11-13 Taiwan Semiconductor Manufacturing Co., Ltd. Venting apparatus and method for vacuum system

Cited By (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US20070104586A1 (en) * 1998-11-23 2007-05-10 James Cedrone System and method for correcting for pressure variations using a motor
US8292598B2 (en) 2004-11-23 2012-10-23 Entegris, Inc. System and method for a variable home position dispense system
US9617988B2 (en) 2004-11-23 2017-04-11 Entegris, Inc. System and method for variable dispense position
US20090132094A1 (en) * 2004-11-23 2009-05-21 Entegris, Inc. System and Method for a Variable Home Position Dispense System
US8814536B2 (en) 2004-11-23 2014-08-26 Entegris, Inc. System and method for a variable home position dispense system
US8651823B2 (en) 2005-11-21 2014-02-18 Entegris, Inc. System and method for a pump with reduced form factor
US20090047143A1 (en) * 2005-11-21 2009-02-19 Entegris, Inc. Method and system for high viscosity pump
US9399989B2 (en) 2005-11-21 2016-07-26 Entegris, Inc. System and method for a pump with onboard electronics
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US20110098864A1 (en) * 2005-12-02 2011-04-28 George Gonnella System and method for monitoring operation of a pump
US9309872B2 (en) 2005-12-02 2016-04-12 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US8382444B2 (en) 2005-12-02 2013-02-26 Entegris, Inc. System and method for monitoring operation of a pump
US9816502B2 (en) 2005-12-02 2017-11-14 Entegris, Inc. System and method for pressure compensation in a pump
US20070128048A1 (en) * 2005-12-02 2007-06-07 George Gonnella System and method for position control of a mechanical piston in a pump
US8662859B2 (en) 2005-12-02 2014-03-04 Entegris, Inc. System and method for monitoring operation of a pump
US8678775B2 (en) 2005-12-02 2014-03-25 Entegris, Inc. System and method for position control of a mechanical piston in a pump
EP1960670A4 (en) * 2005-12-02 2011-07-27 Entegris Inc SYSTEM AND METHOD FOR IMPLEMENTING A PUMP
EP1960670A2 (en) * 2005-12-02 2008-08-27 Entegris, Inc. System and method for operation of a pump
US8870548B2 (en) 2005-12-02 2014-10-28 Entegris, Inc. System and method for pressure compensation in a pump
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US20080131290A1 (en) * 2006-11-30 2008-06-05 Entegris, Inc. System and method for operation of a pump
US9631611B2 (en) 2006-11-30 2017-04-25 Entegris, Inc. System and method for operation of a pump
US7887323B2 (en) * 2007-06-29 2011-02-15 Hynix Semiconductor Inc. Method and apparatus for manufacturing semiconductor device
US20090004610A1 (en) * 2007-06-29 2009-01-01 Hak Joon Kim Method and apparatus for manufacturing semiconductor device

Also Published As

Publication number Publication date
JP4516352B2 (ja) 2010-08-04
JP2004332741A (ja) 2004-11-25
EP1475535A1 (fr) 2004-11-10
DE602004029416D1 (de) 2010-11-18
ATE483911T1 (de) 2010-10-15
FR2854667B1 (fr) 2006-07-28
FR2854667A1 (fr) 2004-11-12
EP1475535B1 (fr) 2010-10-06

Similar Documents

Publication Publication Date Title
US20050025634A1 (en) Controlling pressure in a process chamber by variying pump speed and a regulator valve, and by injecting inert gas
US6419455B1 (en) System for regulating pressure in a vacuum chamber, vacuum pumping unit equipped with same
JP5455371B2 (ja) ターボポンプを使用する広範囲圧力制御
AU632260B2 (en) Compressor control system to improve turndown and reduce incidents of surging
GB2386704A (en) Pressure-based mass flow controller system
CN108304005A (zh) 阀控制装置
CN100520657C (zh) 腔室气体供给装置及采用它的腔室内压控制方法
US8070459B2 (en) Pressure control method
JP5683697B2 (ja) プロセスチャンバの圧力制御システムおよび制御方法
KR101966720B1 (ko) 압력 제어 장치
CN115328226A (zh) 一种应用于气相沉积设备的压力调控装置及其方法
CN106762774B (zh) 多级离心式空气压缩机恒压供气的控制方法
JP2006319207A (ja) 流量制御装置、薄膜堆積装置および流量制御方法
CN112503861A (zh) 一种冻干机真空控制系统及控制方法
JPS5788210A (en) Controlling method of degree of superheat on working medium for turbine
JPS6323387B2 (ja)
JP2004068685A (ja) 親子弁の制御方法および制御システム
JPH07145928A (ja) 燃料ガス制御方法および装置
JPS5784924A (en) Gas flow rate control apparatus
JPS6479370A (en) Method and device for film formation by sputtering
JPH0117968B2 (ja)
JPS58217796A (ja) ポンプ運転制御装置
JPS63156093A (ja) ガスソ−ス分子線エピタキシヤル成長装置
JPS61160118A (ja) ガス流量制御装置
CS249047B1 (en) Pumping regulation connection

Legal Events

Date Code Title Description
AS Assignment

Owner name: ALCATEL, FRANCE

Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:BERNARD, ROLAND;DESBIOLLES, JEAN-PIERRE;MUNARI, SEBASTIAN;AND OTHERS;REEL/FRAME:015417/0312

Effective date: 20040430

STCB Information on status: application discontinuation

Free format text: ABANDONED -- FAILURE TO RESPOND TO AN OFFICE ACTION