ATE483911T1 - Druckregelungssystem für prozesskammer auf der basis der pumpengeschwindigkeit, der ventilöffnung und neutralgasinjektion - Google Patents
Druckregelungssystem für prozesskammer auf der basis der pumpengeschwindigkeit, der ventilöffnung und neutralgasinjektionInfo
- Publication number
- ATE483911T1 ATE483911T1 AT04291149T AT04291149T ATE483911T1 AT E483911 T1 ATE483911 T1 AT E483911T1 AT 04291149 T AT04291149 T AT 04291149T AT 04291149 T AT04291149 T AT 04291149T AT E483911 T1 ATE483911 T1 AT E483911T1
- Authority
- AT
- Austria
- Prior art keywords
- controlled
- inert gas
- control unit
- control system
- pressure control
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B41/00—Pumping installations or systems specially adapted for elastic fluids
- F04B41/06—Combinations of two or more pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
- F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
- F04B49/08—Regulating by delivery pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/046—Combinations of two or more different types of pumps
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
- G05D16/00—Control of fluid pressure
- G05D16/20—Control of fluid pressure characterised by the use of electric means
- G05D16/2006—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means
- G05D16/208—Control of fluid pressure characterised by the use of electric means with direct action of electric energy on controlling means using a combination of controlling means as defined in G05D16/2013 and G05D16/2066
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Automation & Control Theory (AREA)
- General Physics & Mathematics (AREA)
- Fluid Mechanics (AREA)
- Flow Control (AREA)
- Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
- Drying Of Semiconductors (AREA)
- Control Of Fluid Pressure (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Fluid-Damping Devices (AREA)
- Air Transport Of Granular Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0305615A FR2854667B1 (fr) | 2003-05-09 | 2003-05-09 | Controle de pression dans la chambre de procedes par variation de vitesse de pompes, vanne de regulation et injection de gaz neutre |
Publications (1)
Publication Number | Publication Date |
---|---|
ATE483911T1 true ATE483911T1 (de) | 2010-10-15 |
Family
ID=32982389
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AT04291149T ATE483911T1 (de) | 2003-05-09 | 2004-05-04 | Druckregelungssystem für prozesskammer auf der basis der pumpengeschwindigkeit, der ventilöffnung und neutralgasinjektion |
Country Status (6)
Country | Link |
---|---|
US (1) | US20050025634A1 (de) |
EP (1) | EP1475535B1 (de) |
JP (1) | JP4516352B2 (de) |
AT (1) | ATE483911T1 (de) |
DE (1) | DE602004029416D1 (de) |
FR (1) | FR2854667B1 (de) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8172546B2 (en) * | 1998-11-23 | 2012-05-08 | Entegris, Inc. | System and method for correcting for pressure variations using a motor |
US8292598B2 (en) * | 2004-11-23 | 2012-10-23 | Entegris, Inc. | System and method for a variable home position dispense system |
FR2878913B1 (fr) * | 2004-12-03 | 2007-01-19 | Cit Alcatel | Controle des pressions partielles de gaz pour optimisation de procede |
US20090112370A1 (en) * | 2005-07-21 | 2009-04-30 | Asm Japan K.K. | Vacuum system and method for operating the same |
US8753097B2 (en) * | 2005-11-21 | 2014-06-17 | Entegris, Inc. | Method and system for high viscosity pump |
WO2007061956A2 (en) | 2005-11-21 | 2007-05-31 | Entegris, Inc. | System and method for a pump with reduced form factor |
WO2007067358A2 (en) | 2005-12-02 | 2007-06-14 | Entegris, Inc. | System and method for pressure compensation in a pump |
US8083498B2 (en) | 2005-12-02 | 2011-12-27 | Entegris, Inc. | System and method for position control of a mechanical piston in a pump |
US7878765B2 (en) * | 2005-12-02 | 2011-02-01 | Entegris, Inc. | System and method for monitoring operation of a pump |
TWI402423B (zh) * | 2006-02-28 | 2013-07-21 | Entegris Inc | 用於一幫浦操作之系統及方法 |
US7369920B2 (en) * | 2006-03-21 | 2008-05-06 | Mks Instruments, Inc. | Pressure control system with optimized performance |
KR100876836B1 (ko) * | 2007-06-29 | 2009-01-07 | 주식회사 하이닉스반도체 | 반도체 소자의 제조 방법 |
FR2921444A1 (fr) | 2007-09-26 | 2009-03-27 | Alcatel Lucent Sas | Pompe a vide a deux rotors helicoidaux. |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DD262065A1 (de) * | 1987-07-07 | 1988-11-16 | Univ Dresden Tech | Vorrichtung zur druckregelung im feinvakuumbereich |
FR2652390B1 (fr) * | 1989-09-27 | 1991-11-29 | Cit Alcatel | Groupe de pompage a vide. |
JPH0758032A (ja) * | 1993-08-09 | 1995-03-03 | Hitachi Electron Eng Co Ltd | 圧力制御装置および圧力制御方法 |
US5944049A (en) * | 1997-07-15 | 1999-08-31 | Applied Materials, Inc. | Apparatus and method for regulating a pressure in a chamber |
JP3929185B2 (ja) * | 1998-05-20 | 2007-06-13 | 株式会社荏原製作所 | 真空排気装置及び方法 |
JP2002541541A (ja) * | 1999-04-07 | 2002-12-03 | アルカテル | 真空チャンバ内の圧力を調整するためのシステム、このシステムを装備した真空ポンピングユニット |
KR100733237B1 (ko) * | 1999-10-13 | 2007-06-27 | 동경 엘렉트론 주식회사 | 처리 장치 |
DE10043783A1 (de) * | 2000-09-06 | 2002-03-14 | Leybold Vakuum Gmbh | Verfahren und Vorrichtung zur Regelung des Vakuums in einer Kammer |
JP4335469B2 (ja) * | 2001-03-22 | 2009-09-30 | 株式会社荏原製作所 | 真空排気装置のガス循環量調整方法及び装置 |
US6733621B2 (en) * | 2002-05-08 | 2004-05-11 | Taiwan Semiconductor Manufacturing Co., Ltd. | Venting apparatus and method for vacuum system |
-
2003
- 2003-05-09 FR FR0305615A patent/FR2854667B1/fr not_active Expired - Fee Related
-
2004
- 2004-05-04 DE DE602004029416T patent/DE602004029416D1/de not_active Expired - Lifetime
- 2004-05-04 AT AT04291149T patent/ATE483911T1/de not_active IP Right Cessation
- 2004-05-04 EP EP04291149A patent/EP1475535B1/de not_active Expired - Lifetime
- 2004-05-07 US US10/840,288 patent/US20050025634A1/en not_active Abandoned
- 2004-05-07 JP JP2004138449A patent/JP4516352B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
FR2854667B1 (fr) | 2006-07-28 |
JP4516352B2 (ja) | 2010-08-04 |
EP1475535A1 (de) | 2004-11-10 |
DE602004029416D1 (de) | 2010-11-18 |
EP1475535B1 (de) | 2010-10-06 |
JP2004332741A (ja) | 2004-11-25 |
FR2854667A1 (fr) | 2004-11-12 |
US20050025634A1 (en) | 2005-02-03 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
RER | Ceased as to paragraph 5 lit. 3 law introducing patent treaties |