JP5455371B2 - ターボポンプを使用する広範囲圧力制御 - Google Patents
ターボポンプを使用する広範囲圧力制御 Download PDFInfo
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- JP5455371B2 JP5455371B2 JP2008534596A JP2008534596A JP5455371B2 JP 5455371 B2 JP5455371 B2 JP 5455371B2 JP 2008534596 A JP2008534596 A JP 2008534596A JP 2008534596 A JP2008534596 A JP 2008534596A JP 5455371 B2 JP5455371 B2 JP 5455371B2
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01C—ROTARY-PISTON OR OSCILLATING-PISTON MACHINES OR ENGINES
- F01C1/00—Rotary-piston machines or engines
- F01C1/24—Rotary-piston machines or engines of counter-engagement type, i.e. the movement of co-operating members at the points of engagement being in opposite directions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
- C23C16/45557—Pulsed pressure or control pressure
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D19/00—Axial-flow pumps
- F04D19/02—Multi-stage pumps
- F04D19/04—Multi-stage pumps specially adapted to the production of a high vacuum, e.g. molecular pumps
- F04D19/042—Turbomolecular vacuum pumps
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
- F04D—NON-POSITIVE-DISPLACEMENT PUMPS
- F04D27/00—Control, e.g. regulation, of pumps, pumping installations or pumping systems specially adapted for elastic fluids
- F04D27/02—Surge control
- F04D27/0253—Surge control by throttling
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
Description
Claims (19)
- 真空室内のプロセス圧力を維持するために上記真空室の排気ポートからガスを排気するための装置において、
上記真空室内の圧力を測定するための圧力センサと、
上記真空室の上記排気ポートに連通し、当該排気ポートからの流れを規制するためのスロットル弁と、
上記スロットル弁に連通するポンプ入口及び支援ポートを有する高真空ポンプと、
上記支援ポートに連通し、当該支援ポートからの流れを規制するための支援弁と、
上記真空室内のプロセス圧力を維持するために、上記圧力センサからの測定値に基づき上記スロットル弁及び上記支援弁の開度寸法を規制するための少なくとも1つのコントローラとを有し、
上記スロットル弁が、20−80%の開度の範囲で開くことができ、
上記装置は、上記高真空ポンプと上記支援弁との間から上記真空室へガスを循環させるための循環配管を有さない、装置。 - 上記少なくとも1つのコントローラが圧力測定値を受け取るための、上記圧力センサからの入力と、開度寸法の規制信号を送るための、上記支援弁及び上記スロットル弁への出力とを備えた少なくとも1つのプロセッサを有する、請求項1に記載の装置。
- 上記少なくとも1つのコントローラが、
上記圧力センサに接続され、少なくとも1つのプロセス流量及びプロセス圧力を通して上記真空室を順序化するための工具コントローラと、
上記スロットル弁に接続され、当該スロットル弁の開度を制御するためのスロットル弁コントローラと、
上記支援弁に接続され、当該支援弁の開度を制御するための支援弁コントローラと、
上記工具コントローラ、上記スロットル弁コントローラ及び上記支援弁コントローラに連通し、上記真空室内に上記少なくとも1つのプロセス流量及びプロセス圧力を維持するために、上記圧力センサからの測定値に基づき上記スロットル弁及び上記支援弁の開度寸法を規制するようにプロセッサにより実行可能なコンピュータで読み取り可能なインストラクションを記憶するための記憶媒体を有するプロセッサと、
を有する、請求項1に記載の装置。 - 上記圧力センサがキャパシタンスマノメータである、請求項1に記載の装置。
- 上記支援弁が蝶弁である、請求項1に記載の装置。
- 上記スロットル弁が振り子ゲート弁である、請求項1に記載の装置。
- 上記スロットル弁が更にステッピングモータ位置決め装置を有する、請求項1に記載の装置。
- 上記スロットル弁が有限数の別個の開度寸法に制御可能であり、上記コントローラが更に2つの隣接する別個のスロットル弁の開度寸法から由来するプロセス圧力間にある上記真空室内のプロセス圧力を達成するように上記支援弁の開度寸法を規制するようになっている、請求項1に記載の装置。
- 上記真空室内のプロセス流量及びプロセス圧力が上記高真空ポンプの回転速度を変更することなく維持される、請求項1に記載の装置。
- 真空室の排気ポートからターボ分子ポンプを通って流れる排気ガスを規制することにより上記真空室内のプロセス圧力を制御するための方法において、
上記真空室内の圧力を読み取る工程と、
圧力読み取り値に少なくとも部分的に基づいて、上記排気ポートから上記ターボ分子ポンプへの流れを規制するように、好ましい作動範囲を有するスロットル弁の開度を制御する工程と、
上記スロットル弁の開度を上記好ましい作動範囲内に維持するように上記ターボ分子ポンプの下流側の支援弁を制御する工程とを有し、
上記スロットル弁が、20−80%の開度の範囲で開くことができ、
上記方法は、上記ターボ分子ポンプと上記支援弁との間から上記真空室へ排気ガスを循環させる工程を有さない、方法。 - 上記方法の少なくとも一部を遂行するための、コンピュータで実行可能なインストラクションを、記憶媒体から読み取る工程を更に有する、請求項10に記載の方法。
- 圧力を読み取る上記工程がキャパシタンスマノメータから受け取った信号を読み取る工程を有する、請求項10に記載の方法。
- 支援弁を制御する上記工程が蝶弁を回転させる工程を有する、請求項10に記載の方法。
- 上記スロットル弁の開度を制御する上記工程が振り子ゲート弁を前進及び後退させる工程を有する、請求項10に記載の方法。
- 上記スロットル弁の開度を制御する上記工程がステッピングモータ位置決め装置を作動させる工程を有する、請求項10に記載の方法。
- 上記スロットル弁が有限数の別個の開度寸法に制御可能であり、上記支援弁を制御する上記工程が2つの隣接する別個のスロットル弁の開度寸法から由来するプロセス圧力間にある上記真空室内のプロセス圧力を達成するように当該支援弁の開度寸法を規制する工程を有する、請求項10に記載の方法。
- 上記真空室内のプロセス流量及びプロセス圧力が上記ターボポンプの回転速度を変更することなく制御される、請求項10に記載の方法。
- 真空室内のプロセス圧力を維持するために、上記真空室の排気ポートからのターボ分子ポンプを通るガスを排気するための方法において、
上記真空室内の圧力を測定する工程と、
上記真空室の上記排気ポートと上記ターボ分子ポンプとの間で連通するスロットル弁の開度寸法を規制する工程と、
上記ターボ分子ポンプの圧縮率を規制するための当該ターボ分子ポンプの支援ポートに連通する支援弁の開度寸法を規制する工程とを有し、
それによって、上記真空室内のプロセス圧力を維持するように上記スロットル弁及び上記支援弁の開度寸法を規制し、
上記スロットル弁が、20−80%の開度の範囲で開くことができ、
上記方法は、上記ターボ分子ポンプと上記支援弁との間から上記真空室へガスを循環させる工程を有さない、方法。 - 上記スロットル弁が有限数の別個の開度寸法に制御可能であり、上記支援弁を制御する上記工程が更に2つの隣接する別個のスロットル弁の開度寸法から由来するプロセス圧力間にある上記真空室内のプロセス圧力を達成するように当該支援弁の開度寸法を規制する工程を有する、請求項18に記載の方法。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
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US11/245,797 | 2005-10-07 | ||
US11/245,797 US7438534B2 (en) | 2005-10-07 | 2005-10-07 | Wide range pressure control using turbo pump |
PCT/US2006/038448 WO2007044298A2 (en) | 2005-10-07 | 2006-09-29 | Wide range pressure control using turbo pump |
Publications (2)
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JP2009511248A JP2009511248A (ja) | 2009-03-19 |
JP5455371B2 true JP5455371B2 (ja) | 2014-03-26 |
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JP2008534596A Expired - Fee Related JP5455371B2 (ja) | 2005-10-07 | 2006-09-29 | ターボポンプを使用する広範囲圧力制御 |
Country Status (7)
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US (1) | US7438534B2 (ja) |
EP (1) | EP1934043B1 (ja) |
JP (1) | JP5455371B2 (ja) |
KR (1) | KR101342309B1 (ja) |
CN (1) | CN101282836B (ja) |
TW (1) | TW200730731A (ja) |
WO (1) | WO2007044298A2 (ja) |
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EP1934043A2 (en) | 2008-06-25 |
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WO2007044298A2 (en) | 2007-04-19 |
WO2007044298A3 (en) | 2008-01-31 |
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US7438534B2 (en) | 2008-10-21 |
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