US20020155265A1 - Antireflection film - Google Patents

Antireflection film Download PDF

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Publication number
US20020155265A1
US20020155265A1 US09/026,271 US2627198D US2002155265A1 US 20020155265 A1 US20020155265 A1 US 20020155265A1 US 2627198 D US2627198 D US 2627198D US 2002155265 A1 US2002155265 A1 US 2002155265A1
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layer
thickness
metal oxide
polymer
silica
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US6464822B1 (en
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Hyung-Chul Choi
Robert L. Jones
Pradnya V Nagarkar
William K Smyth
Xiaojia Z Wang
Yee Ho Chia
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3M Innovative Properties Co
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Assigned to POLAROID CORPORATION reassignment POLAROID CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHOI, HYUNG-CHUL, JONES, ROBERT L., NAGARKAR, PRADNYA V., SMYTH, WILLIAM K., WANG, XIAOJIA Z.
Assigned to POLAROID CORPORATION reassignment POLAROID CORPORATION ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: CHIA, YEE HO
Assigned to 3M INNOVATIVE PROPERTIES COMPANY reassignment 3M INNOVATIVE PROPERTIES COMPANY ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: POLAROID CORPORATION
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    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G02B1/105—
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/14—Protective coatings, e.g. hard coatings
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06F—ELECTRIC DIGITAL DATA PROCESSING
    • G06F3/00—Input arrangements for transferring data to be processed into a form capable of being handled by the computer; Output arrangements for transferring data from processing unit to output unit, e.g. interface arrangements
    • G06F3/01—Input arrangements or combined input and output arrangements for interaction between user and computer
    • G06F3/03—Arrangements for converting the position or the displacement of a member into a coded form
    • G06F3/041—Digitisers, e.g. for touch screens or touch pads, characterised by the transducing means
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/0006—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00 with means to keep optical surfaces clean, e.g. by preventing or removing dirt, stains, contamination, condensation
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/942—Masking
    • Y10S438/948—Radiation resist
    • Y10S438/952—Utilizing antireflective layer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/269—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension including synthetic resin or polymer layer or component

Definitions

  • This invention relates to a process for providing an antireflection film on a substrate, and to the article formed by this process.
  • Antireflection coatings on a substrate typically comprise a plurality of inorganic layers, for example a metal or metal oxide layer and a silica layer.
  • a metal or metal oxide layer typically comprises a plurality of inorganic layers, for example a metal or metal oxide layer and a silica layer.
  • silica is used herein in accordance with its normal meaning in the antireflection art to mean a material of the formula SiO x where x is not necessarily equal to two.
  • silica layers are often deposited by chemical vacuum deposition or sputtering of silicon in an oxygen atmosphere, so that the material deposited does not precisely conform to the stoichiometric formula SiO 2 of pure silica.
  • one surface of a silica layer is exposed, and this exposed surface, which has a high surface energy, as shown by its low contact angle with water, is highly susceptible to fingerprints and other marks. Such marks are extremely difficult to clean, often requiring the use of chemical cleaners.
  • U.S. Pat. No. 4,765,729 (Taniguchi) describes an anti-reflection optical article, which comprises a substrate bearing a single-layer or multi-layer anti-reflection film having a surface film composed of an inorganic substance, and a coating of an organic substance containing a curing material formed on the surface of the anti-reflection film, wherein the surface reflectance of the optical article is lower than 3% and the stationary contact angle to water is at least 60°.
  • the inorganic substance is preferably silica and the preferred curing material is a silanol-terminated polysiloxane.
  • the thickness of the organic substance should be in the range of 0.0005 to 0.5 ⁇ m (0.5 to 500 nm), especially 0.001 to 0.3 ⁇ m (1 to 300 nm).
  • the provision of the layer of organic substance is stated to increase the scratch and stain resistance of the optical article.
  • This material comprises a 180 ⁇ m poly(ethylene terephthalate) substrate provided with an abrasion-resistant hard coat, and then successively with a 17 nm indium tin oxide (ITO) layer, a 23 nm silica layer, a 95 nm ITO layer, an 84 nm silica layer and finally a thin “lubrication” layer, which is formed from a fluoropolymer and is stated to improve the scratch resistance and the susceptibility of the surface to marking.
  • ITO indium tin oxide
  • This complex film possesses excellent antireflection characteristics, but is so expensive (approximately US$10 per square foot, US$100 m ⁇ 2 ) as to preclude its use in many applications where antireflection films are desirable.
  • Much of the high cost of this film can be attributed to the 95 nm ITO layer and 84 nm silica layer; since these layers are typically formed by sputtering, and the cost of a sputtered layer is directly proportional to its thickness.
  • the need for four separate sputtering stations, all of which must be maintained under high vacuum results in a complex and costly apparatus.
  • the thickness(es) of the inorganic layer(s) can be greatly reduced, thereby reducing the overall cost of the antireflection coating, especially when the inorganic layer(s) is/are applied by a process such as sputtering or chemical vapor deposition in which the residence time of the substrate within the coating apparatus is directly proportional to the thickness of the required layer.
  • an antireflection coating using such a thick polymer layer which can readily be applied with good uniformity by solution or other coating techniques, has good scratch and stain resistance.
  • this invention provides an article having an antireflection film.
  • This article comprises a substrate carrying an inorganic antireflection layer, and in contact with the antireflection film and forming the outer surface of the antireflection film, a polymer layer formed by curing a curable composition in situ on the inorganic antireflection layer, the polymer layer having a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm.
  • the curing of the curable composition may be effected by cross-linking of one or more polymers or oligomers, or by polymerization of one or more monomers or oligomers, or by a combination of both cross-linking and polymerization.
  • Such curing techniques are familiar to those skilled in polymer technology.
  • the article of the present invention is provided with an antireflection film comprising one or more inorganic antireflection layers and an outer polymer layer.
  • the polymer layer has a thickness of from about 20 to about 200 nm and a refractive index not greater than about 1.53 over the visible wavelength range of 400 to 700 nm, and is formed on the inorganic antireflection layer(s) by depositing a layer of a curable composition and then curing this layer in situ.
  • the relatively thick layer of curable composition required can be applied with good uniformity by solution coating or other conventional coating techniques. Also, the provision of the thick polymer layer enables the thickness, and thus the cost, of the inorganic antireflection layers to be reduced.
  • one embodiment of the invention described below comprises a 19 nm indium tin oxide layer, a 20 nm silica layer and an 85 nm polymer layer; as compared to the Southwall Technology antireflection film described above, this embodiment of the invention reduces the amount of material which needs to be sputtered per unit area of the film by about 80 percent, thus reducing the cost of the film by more than 50 percent.
  • the substrate of the present article can be any material on which an antireflection coating is desired, provided of course that the substrate can withstand the (relatively mild) conditions needed for deposition of the various layers and the curing of the curable composition.
  • the substrate may be a finished optical article, for example a lens, the display surface of a cathode ray tube, or an automobile windshield.
  • the substrate be a plastic film, typically a polyester film; the plastic film has the antireflection coating formed thereon, and the resultant antireflection film may be applied to, for example, a cathode ray tube, a flat panel display, window glass or a windshield, which it is desired to provide with antireflection characteristics.
  • Suitable polyester films are readily available commercially, for example the 4 to 7 mil (101 to 177 ⁇ m) poly(ethylene terephthalate) films sold under the trademark “MELINEX” by ICI Americas Inc., Wilmington, Del.
  • the substrate when it is a plastic film, it may be provided with coatings on one or both surfaces to improve its hardness and scratch resistance, to improve the adhesion of the inorganic antireflection layer to the substrate, or to provide any other desired properties, for example filtration of ultra-violet radiation or provision of a gas and/or moisture barrier.
  • a hard coating on the substrate will typically have a thickness of about 1 to about 15 ⁇ m, preferably from about 2 to about 3 ⁇ m, and such a hard coating may be provided by free radical polymerization (initiated either thermally or by ultra-violet radiation) of an appropriate polymerizable material.
  • An especially preferred hard coat for use in the present invention is the acrylic polymer coating sold under the trademark “TERRAPIN” by Tekra Corporation, 6700 West Lincoln Avenue, New Berlin, Wis. 53151.
  • the article of the present invention may include one or more than one inorganic antireflection layers. These layers may be formed from any of the inorganic materials hitherto used in antireflection coatings.
  • the preferred materials for forming the inorganic antireflection layer on which the curable composition is deposited are metal oxides and silica layer. Preferred metal oxides are indium oxide, titanium dioxide, cadmium oxide, gallium indium oxide, niobium pentoxide, indium tin oxide and tin dioxide, with indium tin oxide being especially preferred.
  • the thicknesses of the inorganic antireflection layer(s) and the polymer layer in the present article should be correlated so that the total thickness of these layers is approximately ⁇ /4 of the center of the wavelength range for which antireflection characteristics are desired, e.g., the total thickness should be approximately 135-145 nm when antireflection characteristics are desired over the entire visible range of 400 to 700 nm. Also, the thicknesses of the inorganic antireflection layer(s) and the polymer layer can be adjusted relative to one another to produce minimum reflectivity from the composite film.
  • this metal oxide layer is the sole inorganic antireflection layer and has a thickness of about 10 to about 30 nm, desirably about 17 to about 23 nm, while the accompanying polymer layer has a thickness of about 80 to about 150 nm, desirably about 110 to about 130 nm.
  • This preferred article combines low production cost with good antireflection properties.
  • a second preferred article of the present invention having a metal oxide layer in contact with the polymer layer comprises a first metal oxide layer, a silica layer superposed over the first metal oxide layer, and a second metal oxide layer superposed on the silica layer, the polymer layer being superposed on the second metal oxide layer.
  • the first metal oxide layer desirably has a thickness of from about 20 to about 35 nm, preferably about 25 to 30 nm
  • the silica layer desirably has a thickness of from about 10 to about 25 nm, preferably about 15 to about 20 nm
  • the second metal oxide layer desirably has a thickness of from about 50 to about 100 nm, preferably about 65 to about 80 nm
  • the polymer layer desirably has a thickness of from about 70 to about 120 nm, preferably about 85 to about 100 nm.
  • This preferred three inorganic layer structure provides antireflection performance substantially equal to that of the Southwall Technology four inorganic layer structure discussed above, while still providing a substantial reduction in production costs, since the thick silica layer and the thin lubrication layer of the four inorganic layer structure are eliminated.
  • a preferred article of the invention comprises a metal oxide layer on the substrate and a silica layer superposed on the metal oxide layer, the polymer layer being superposed on the silica layer.
  • the metal oxide layer has a thickness of from about 10 to about 30 nm, preferably about 10 to about 20 nm
  • the silica layer desirably has a thickness of from about 10 to about 120 nm, preferably about 10 to about 50 nm
  • the polymer layer desirably has a thickness of from about 50 to about 130 nm, preferably about 60 to about 100 nm.
  • these layers are preferably deposited by sputtering or by chemical vapor deposition, with dc sputtering being especially preferred, although RF, magnetron and reactive sputtering and low-pressure, plasma-enhanced and laser-enhanced chemical vapor deposition may also be used.
  • dc sputtering being especially preferred
  • RF, magnetron and reactive sputtering and low-pressure, plasma-enhanced and laser-enhanced chemical vapor deposition may also be used.
  • the deposition of each of these layers should of course be effected at a temperature which does not cause damage to the plastic substrate; this temperature limit of course varies with the exact plastic substrate employed.
  • the polymer layer of the present antireflection coating has a refractive index not greater than about 1.53 over the wavelength range of 400 to 700 nm and a thickness of from about 20 to about 200 nm.
  • the preferred thickness range for this layer is about 50 to about 130 nm, preferably about 60 to about 100 nm.
  • Polymer layers having thicknesses within these ranges are readily prepared by depositing a solution of an appropriate curable material in an organic solvent using conventional solution coating techniques, for example slot coating, removing the solvent and curing the resultant layer of curable material.
  • the refractive index of the polymer layer is desirable to keep the refractive index of the polymer layer as low as possible consistent with other acceptable properties for this layer, especially hardness and scratch and stain resistance.
  • the polymer should also be resistant to cleaning solvents which may be used on the film, for example ethyl alcohol, aqueous ammonia, acetone, gasoline and isopropanol, and food and cosmetic items, for example peanut butter and lipstick with which it may come into contact.
  • the polymer should also have good durability, as measured, for example by its ability to withstand rubbing with steel wool.
  • the polymer layer has a refractive index below about 1.50 over the entire visible range of 400 to 700 nm.
  • the curable composition used to form the polymer layers desirably comprises a polymer of a fluoroalkene, for example poly(vinylidene fluoride) or a vinylidene fluoride/tetrafluoroethylene copolymer, such as the material sold under the trademark “KYNAR” by San Diego Plastics, Inc., 2220 McKinley Avenue, National City, Calif. 91950.
  • a fluoroalkene for example poly(vinylidene fluoride) or a vinylidene fluoride/tetrafluoroethylene copolymer, such as the material sold under the trademark “KYNAR” by San Diego Plastics, Inc., 2220 McKinley Avenue, National City, Calif. 91950.
  • the curable composition include an alkyl acrylate or methacrylate polymer, such as the material sold under the trademark “ELVACITE 2041” by ICI Acrylics, Inc., 3411 Silverside Road-McKean 2nd, Wilmington, Del. 19850-5391, or that sold under the trademark “ACRYLOID A21” by Rohm and Haas, 100 Independence Mall West, Philadelphia, Pa. 19106-2399.
  • an alkyl acrylate or methacrylate polymer such as the material sold under the trademark “ELVACITE 2041” by ICI Acrylics, Inc., 3411 Silverside Road-McKean 2nd, Wilmington, Del. 19850-5391, or that sold under the trademark “ACRYLOID A21” by Rohm and Haas, 100 Independence Mall West, Philadelphia, Pa. 19106-2399.
  • polyfunctional being used herein in its conventional sense to denote a material having a functionality of 3 or higher
  • a specific preferred polyfunctional acrylate monomer is that sold under the trademark “SR 399” by Sartomer, Inc., 502 Thomas Jones Way, Exton, Pa. 19341; this material is stated by the manufacturer to be dipentaerythritol pentaacrylate.
  • An additional benefit of such segregation of acrylate or methacrylate polymer material during curing is that it enables the cross-linking to occur in an oxygen-containing atmosphere, such as air, thereby avoiding the need for a nitrogen blanket as is customary during thin film ultra-violet curing, and thus reducing the cost of manufacture of the antireflection film.
  • the curable composition may be cured by any conventional method, but is desirably cured by a free radical curing, which may be initiated either thermally or by ultra-violet radiation, although the latter is generally preferred.
  • a free radical curing which may be initiated either thermally or by ultra-violet radiation, although the latter is generally preferred.
  • Persons skilled in polymer technology will be familiar with appropriate initiators, oxygen scavengers and other components useful in such free radical curing.
  • the type and proportion of initiator(s) required may differ from typical formulations intended for production of thicker polymer layers.
  • a 4 mil (101 ⁇ m) poly(ethylene terephthalate) film was solvent coated on one surface with the aforementioned TERRAPIN acrylic polymer coating, the solvent was allowed to evaporate and the film was placed under an ultra-violet lamp to cure the polymer.
  • the coated surface of the film was then coated by direct current sputtering (chemical vapor deposition may alternatively be used) with a 19 nm layer of indium tin oxide and then with a 20 nm layer of silica.
  • a liquid curable composition was then prepared having the following composition (the proportions are by dry weight of the solution): % by weight Poly(vinylidene fluoride) (KYNAR) 46.8 Methyl methacrylate (ACRYLOID A21) 6.9 Dipentaerythritol pentaacrylate (Sartomer SR 399) 30.7 Multifunctional acrylate monomer (Sartomer CD9051) 3.0 Coating additive (COATOSIL 3503 1 ) 4.0 Adhesion promoter (SILANE A174 1 ) 1.0 Curing initiator (DARACURE 1173 2 ) 2.0 Curing initiator (QUANTACURE BMS 3 ) 4.0 Oxygen scavenger (DIDMA 4 ) 1.6
  • the various components were prepared as stock solutions in methyl ethyl ketone (MEK), at 20 percent w/w, except that the ACRYLOID A21 and QUANTACURE BMS were prepared at 10 percent w/w, and the DARACURE and DIDMA were prepared at 5 percent w/w.
  • MEK methyl ethyl ketone
  • the requisite quantities of the various stock solutions were then mixed, together with sufficient additional MEK to give 2000 g of a coating solution containing 2.75 percent solids w/w.
  • This coating solution was then coated via a slot coater on to the film bearing the metal oxide and silica layers, the solvent allowed to evaporate and the film placed under an ultra-violet lamp to produce a polymer coating approximately 85 nm thick.
  • the resultant antireflection article of the present invention had a low surface reflection, and exhibited good resistance to scratching with steel wool or fingerprinting.
  • the article had a contact angle with water of approximately 89°, in contrast to the contact angle of 14-26° for a bare silica surface with no polymer coating.
  • Example 1 was repeated, except that only a 20 nm layer of indium tin oxide was deposited on the substrate (provided with the hard coat) and that the thickness of the polymer layer formed was 120 nm.
  • Example 1 was repeated, except that there were deposited successively on the substrate (provided with the hard coat) a 27.5 nm layer of indium tin oxide, a 17.5 nm layer of silica, a 73 nm layer of indium tin oxide, and a 94 nm layer of the same polymer as in Example 1.
  • Curve A A two inorganic layer structure prepared in the same manner as in Example 1 but having a 19 nm indium tin oxide layer, a 40 nm silica layer and an 82.5 nm polymer layer.
  • Curve B The film prepared in Example 3 above.
  • the metal oxide layer might be replaced by a layer of a different material which can bond to and form an antireflection coating with silica.
  • the polymer layer described above could then be formed on the silica surface in the manner already described.

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  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
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US09/026,271 1998-02-19 1998-02-19 Antireflection film Granted US20020155265A1 (en)

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US09/026,271 Expired - Lifetime US6464822B1 (en) 1998-02-19 1998-02-19 Antireflection film
US10/252,257 Expired - Lifetime US6815056B2 (en) 1998-02-19 2002-09-23 Antireflection film

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US10/252,257 Expired - Lifetime US6815056B2 (en) 1998-02-19 2002-09-23 Antireflection film

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US (3) US20020155265A1 (enExample)
EP (1) EP1057048A1 (enExample)
JP (1) JP2002504697A (enExample)
KR (1) KR20010072551A (enExample)
WO (1) WO1999042860A1 (enExample)

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US7923114B2 (en) 2004-12-03 2011-04-12 Cardinal Cg Company Hydrophilic coatings, methods for depositing hydrophilic coatings, and improved deposition technology for thin films
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US6950236B2 (en) * 2001-04-10 2005-09-27 Fuji Photo Film Co., Ltd. Antireflection film, polarizing plate, and apparatus for displaying an image
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US20030021972A1 (en) 2003-01-30
WO1999042860A1 (en) 1999-08-26

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