US20020122450A1 - High repetition rate UV excimer laser - Google Patents

High repetition rate UV excimer laser Download PDF

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Publication number
US20020122450A1
US20020122450A1 US10/087,265 US8726502A US2002122450A1 US 20020122450 A1 US20020122450 A1 US 20020122450A1 US 8726502 A US8726502 A US 8726502A US 2002122450 A1 US2002122450 A1 US 2002122450A1
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United States
Prior art keywords
laser beam
excimer laser
repetition rate
window
windows
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
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US10/087,265
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English (en)
Inventor
Robert Sparrow
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Corning Inc
Original Assignee
Corning Inc
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Filing date
Publication date
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Priority to US10/087,265 priority Critical patent/US20020122450A1/en
Assigned to CORNING INCORPORATED reassignment CORNING INCORPORATED ASSIGNMENT OF ASSIGNORS INTEREST (SEE DOCUMENT FOR DETAILS). Assignors: SPARROW, ROBERT W.
Publication of US20020122450A1 publication Critical patent/US20020122450A1/en
Priority to US10/459,012 priority patent/US6768762B2/en
Abandoned legal-status Critical Current

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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/14—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range characterised by the material used as the active medium
    • H01S3/22—Gases
    • H01S3/223—Gases the active gas being polyatomic, i.e. containing two or more atoms
    • H01S3/225—Gases the active gas being polyatomic, i.e. containing two or more atoms comprising an excimer or exciplex
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B11/00—Single-crystal growth by normal freezing or freezing under temperature gradient, e.g. Bridgman-Stockbarger method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/10—Inorganic compounds or compositions
    • C30B29/12—Halides
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/02—Constructional details
    • H01S3/03—Constructional details of gas laser discharge tubes
    • H01S3/034—Optical devices within, or forming part of, the tube, e.g. windows, mirrors
    • H01S3/0346—Protection of windows or mirrors against deleterious effects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05—Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/08—Construction or shape of optical resonators or components thereof
    • H01S3/08004—Construction or shape of optical resonators or components thereof incorporating a dispersive element, e.g. a prism for wavelength selection
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/105—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length
    • H01S3/1055—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling the mutual position or the reflecting properties of the reflectors of the cavity, e.g. by controlling the cavity length one of the reflectors being constituted by a diffraction grating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00—Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/106—Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating by controlling devices placed within the cavity

Definitions

  • the subject invention is directed generally to an High Repetition Rate UV Excimer Laser.
  • U.S. Pat. No. 6,181,724 discloses an excimer laser.
  • Laser gas is sealed in a laser chamber and energy is supplied as a result of an electrical discharge in a discharge electrode, causing the laser beam to oscillate.
  • the oscillating laser beam exits through a rear window, the beam size is widened while passing through a first prism and a second prism, and then the laser beam enters a grating.
  • an angle relative to the light path of the laser beam is controlled by an actuator and by oscillating the laser beam at a predetermined wavelength, a narrow band is achieved.
  • a group of optical components, which are the first prism, the second prism, and the grating, is collectively called the narrow-band optics.
  • the laser beam with the wavelength being controlled by the narrow-band optics, passes through a front window and a front mirror, which is a partial reflecting mirror, and part of the laser beam exits the laser chamber.
  • optical components of synthetic fused silica or calcium fluoride are insufficient in durability when the power of an excimer laser is increased, and a highly accurate control of the wavelength of an High Repetition Rate UV Excimer Laser is difficult when these optical components are used.
  • the present invention relates to an High Repetition Rate ( ⁇ 4 kilohertz) UV Excimer Laser which includes a source of a laser beam and one or more windows which include magnesium fluoride.
  • Another aspect of the present invention includes an High Repetition Rate UV Excimer Laser which includes a source for a laser beam, one or more windows which include magnesium fluoride, and a source for annealing the one or more windows.
  • Yet another aspect of the present invention includes an High Repetition Rate UV Excimer Laser window which includes magnesium fluoride.
  • Yet another aspect of the present invention includes a method of producing a predetermined narrow width laser beam.
  • the method includes oscillating a laser beam whereby the laser beam exits a first window of a chamber, widening the laser beam through one or more prisms, controlling the laser beam to a predetermined narrow width, and passing the predetermined narrow width laser beam through a second window of the chamber, where the first and second windows of the chamber include magnesium fluoride.
  • FIG. 1 illustrates an High Repetition Rate UV Excimer Laser according to one embodiment of the present invention.
  • FIG. 2 illustrates an High Repetition Rate UV Excimer Laser according to an alternative embodiment of the present invention.
  • FIG. 3 illustrates an High Repetition Rate UV Excimer Laser according to an alternative embodiment of the present invention.
  • the present invention relates to an excimer laser which includes a source of a laser beam and one or more windows which include magnesium fluoride.
  • an excimer laser operates as follows.
  • Laser gas is sealed in a laser chamber and energy is supplied to the gas by an electrical discharge in a discharge electrode. This causes the laser beam to oscillate.
  • the oscillating laser beam exits the laser chamber through a rear window, the size of the laser beam is widened while passing through prisms, and the laser beam enters a grating.
  • an angle relative to the light path of the laser beam is controlled by an actuator and by oscillating a predetermined wavelength a narrow band width is achieved.
  • the laser beam, with the controlled wavelength passes through a front window and a front mirror and part of the laser beam exits the laser chamber.
  • FIG. 1 illustrates one embodiment of an High Repetition Rate UV Excimer Laser of the present invention.
  • High Repetition Rate UV Excimer Laser device 10 includes a plurality of prisms such as first and second (and optionally third) prisms 12 , first mirror 13 , second mirror 15 , a grating 14 , and first 16 and second 18 windows.
  • First window 16 and second window 18 in laser chamber 17 form an ordinary Brewster angle relative to a laser beam 11 in order to reduce energy loss.
  • Components such as plurality of prisms 12 , first mirror 13 and second mirror 15 , and first window 16 and second window 18 are made of a fluoride optical material, such as calcium fluoride, barium fluoride or magnesium fluoride. In one embodiment, these components are made of magnesium fluoride. In an alternative embodiment, first window 16 and second window 18 are made of magnesium fluoride and other components, such as plurality of prisms 12 , first mirror 13 and second mirror 15 are made of other materials, such as calcium fluoride.
  • Another aspect of the present invention includes a method of producing a predetermined narrow width laser beam.
  • the method includes oscillating a laser beam where the laser beam exits a first window of a chamber, widening the laser beam through one or more prisms, controlling the laser beam to a predetermined narrow width, and passing the predetermined narrow width laser beam through a second window of the chamber, where the first and second windows of the chamber include magnesium fluoride.
  • laser gases such as Ar, Kr, Ne and/or F
  • laser gases are sealed in laser chamber 17 and energy is supplied to the laser gas by an electrical discharge in a discharge electrode (not shown). This causes laser beam 11 to oscillate.
  • Oscillating laser beam 11 exits the laser chamber 17 through a rear window 16 .
  • Laser beam 11 passes through prisms 12 , is reflected by second mirror 15 and grating 14 .
  • first mirror 15 an angle relative to the light path of laser beam 11 is controlled by an actuator.
  • oscillating laser beam 11 at predetermined wavelength a narrow band width is achieved for laser beam 11 .
  • Laser beam 11 is totally reflected by grating 14 and second mirror 15 causing laser beam 11 to reverse its original path and exit chamber 17 from front window 18 and exit from first mirror 13 .
  • FIG. 2 is a second embodiment of the present invention.
  • High Repetition Rate UV Excimer Laser device 20 includes a plurality of prisms such as first and second prisms 22 , mirror 25 , grating 24 , and first 26 and second 28 windows.
  • First window 26 and second window 28 in laser chamber 27 form an ordinary Brewster angle relative to a laser beam 21 in order to reduce energy loss.
  • laser beam 21 is partially reflected by mirror 25 , which is a partially reflecting mirror, and part of laser beam 21 exits laser chamber 27 .
  • Components such as plurality of prisms 22 , second mirror 25 , and first window 26 and second window 28 are made of a fluoride optical material, such as calcium fluoride, barium fluoride or magnesium fluoride. In one embodiment, these components are made of magnesium fluoride. In an alternative embodiment, first window 26 and second window 28 are made of magnesium fluoride and other components, such as plurality of prisms 22 and mirror 25 are made of other materials, such as calcium fluoride.
  • Another aspect of the present invention includes an High Repetition Rate UV Excimer Laser window made of magnesium fluoride.
  • the laser windows of the present invention made of magnesium fluoride maintain durability over a long operational life of the High Repetition Rate UV Excimer Laser.
  • “maintain durability” means that the magnesium fluoride windows have no perceptible induced absorption.
  • the magnesium fluoride windows maintain durability for a laser having a output of greater than or equal to 10 mJ and a repetition rate of greater than or about 4 KHz.
  • the magnesium fluoride windows of the present invention maintain durability for a laser having a output of greater than or equal to 10 mJ and a repetition rate of greater than or about 4 KHz for over 500 million pulses and, optionally, for over 900 million pulses.
  • Another aspect of the present invention includes an excimer laser which includes a source for a laser beam, one or more windows which include magnesium fluoride, and a source for annealing the one or more windows.
  • FIG. 3 shows an embodiment of the present invention which includes a source for annealing the windows of the laser chamber.
  • excimer laser device 30 includes a plurality of prisms such as first and second (and optionally third) prisms 32 , first mirror 33 , second mirror 35 , a grating 14 , and first 16 and second 18 windows.
  • First window 36 and second window 38 in laser chamber 37 form an ordinary Brewster angle relative to a laser beam 31 in order to reduce energy loss.
  • Components, such as plurality of prisms 32 , first mirror 33 and second mirror 35 , and first window 36 and second window 38 are made of a fluoride optical material, such as calcium fluoride, barium fluoride or magnesium fluoride.
  • first window 36 and second window 38 are made of magnesium fluoride and other components, such as plurality of prisms 32 , first mirror 33 and second mirror 35 are made of other materials, such as calcium fluoride.
  • a first laser beam (as described above) and a second laser beam are generated by discharge electrode in laser chamber 37 .
  • a second laser gas such as Ar, Kr, Ne and/or F
  • Ar, Kr, Ne and/or F is sealed in laser chamber 37 and energy is supplied to the second laser gas by a second electrical discharge in a second discharge electrode (not shown).
  • Oscillating laser beam 31 exits the laser chamber 37 through a rear window 36 .
  • Laser beam 31 passes through prisms 32 , is reflected by second mirror 35 and grating 34 . In second mirror 35 , an angle relative to the light path of laser beam 31 is controlled by an actuator.
  • laser beam 31 By oscillating laser beam 31 at predetermined wavelength, a narrow band width is achieved for laser beam 31 .
  • Laser beam 31 is totally reflected by grating 34 and second mirror 35 causing laser beam 31 to reverse its original path and exit chamber 37 from front window 38 and exit from first mirror 33 .
  • Second laser beam 31 is used to anneal first and second windows 38 and 36 concurrently with operation of the excimer laser.
  • the windows are irradiated with second laser beam 31 with light having a wavelength of about 250 nm. This wavelength corresponds to the wavelength of the induced absorption band.
  • second laser beam 31 is used either before or after operation of the excimer laser to anneal first and second windows 36 and 38 while the eximer laser is not in use.
  • windows 36 and 38 are thermally annealed. Thermal annealing is accomplished by heating first and/or second windows in an environment such as an inert gas or under vacuum. Although the temperature to which the windows are heated is dependent on the level of induced absorption, a temperature of from about 200 to about 800° C. is typical.

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Materials Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Lasers (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
US10/087,265 2001-03-02 2002-03-01 High repetition rate UV excimer laser Abandoned US20020122450A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
US10/087,265 US20020122450A1 (en) 2001-03-02 2002-03-01 High repetition rate UV excimer laser
US10/459,012 US6768762B2 (en) 2001-03-02 2003-06-10 High repetition rate UV excimer laser

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US27281401P 2001-03-02 2001-03-02
US10/087,265 US20020122450A1 (en) 2001-03-02 2002-03-01 High repetition rate UV excimer laser

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US10/459,012 Continuation US6768762B2 (en) 2001-03-02 2003-06-10 High repetition rate UV excimer laser

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US10/087,265 Abandoned US20020122450A1 (en) 2001-03-02 2002-03-01 High repetition rate UV excimer laser
US10/459,012 Expired - Fee Related US6768762B2 (en) 2001-03-02 2003-06-10 High repetition rate UV excimer laser

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Country Status (8)

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US (2) US20020122450A1 (de)
EP (3) EP1371119A4 (de)
JP (3) JP3857236B2 (de)
KR (2) KR20030081482A (de)
CN (2) CN1507682A (de)
AU (2) AU2002258435A1 (de)
TW (1) TW569510B (de)
WO (3) WO2002071558A1 (de)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030174754A1 (en) * 2002-02-13 2003-09-18 Pell Michael A. High repetition rate excimer laser system
US20030219056A1 (en) * 2001-01-29 2003-11-27 Yager Thomas A. High power deep ultraviolet laser with long life optics
US20030231687A1 (en) * 2002-05-29 2003-12-18 Osamu Wakabayashi Ultraviolet laser device
US6801562B2 (en) * 2001-03-02 2004-10-05 Corning Incorporated High repetition rate excimer laser system
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
CN108183383A (zh) * 2018-01-22 2018-06-19 中国科学院合肥物质科学研究院 一种应用于白癜风治疗的准分子激光器

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080043835A (ko) * 2005-09-14 2008-05-19 칼 짜이스 에스엠테 아게 마이크로리소그래피용 노광 시스템의 광학 시스템
JP5352321B2 (ja) * 2009-04-06 2013-11-27 ギガフォトン株式会社 露光用ガスレーザ装置
KR101810062B1 (ko) 2011-10-14 2017-12-19 삼성디스플레이 주식회사 레이저 결정화 장치 및 레이저 결정화 방법
CN106181073A (zh) * 2016-08-25 2016-12-07 张美华 一种镭射激光钻孔机

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59227183A (ja) * 1983-06-07 1984-12-20 Hamamatsu Photonics Kk 希ガス・ハロゲン・エキシマレ−ザ装置
JPH01115897A (ja) * 1987-10-30 1989-05-09 Nippon Mining Co Ltd フッ化マグネシウム単結晶の製造方法
US5134518A (en) * 1990-07-11 1992-07-28 Bausch & Lomb Incorporated Missile windows
US5272710A (en) * 1992-09-08 1993-12-21 Hughes Aircraft Company Stress-free mounting and protection of liquid-cooled solid-state laser media
RU2041298C1 (ru) 1993-08-17 1995-08-09 Акционерное общество "Инкром" Способ выращивания кристаллов из паровой фазы
JP3071694B2 (ja) * 1996-07-30 2000-07-31 日本電気株式会社 狭帯域エキシマレーザ装置
JPH10324571A (ja) * 1997-05-23 1998-12-08 Riken Corp 二珪化モリブデン系セラミックス発熱体及びその製造方法
US6137821A (en) * 1997-06-04 2000-10-24 Cymer, Inc. Durable etalon based output coupler
JP3969865B2 (ja) * 1997-10-24 2007-09-05 キヤノン株式会社 フッ化物結晶の製造方法
US6238479B1 (en) * 1997-10-24 2001-05-29 Canon Kabushiki Kaisha Raw material for manufacturing fluoride crystal, refining method of the same, fluoride crystal, manufacturing method of the same, and optical part
JP3657800B2 (ja) * 1998-02-20 2005-06-08 株式会社リケン 二珪化モリブデン系複合セラミックス発熱体及びその製造方法
US6345065B1 (en) * 1998-06-04 2002-02-05 Lambda Physik Ag F2-laser with line selection
US6163559A (en) * 1998-06-22 2000-12-19 Cymer, Inc. Beam expander for ultraviolet lasers
JP2000034193A (ja) * 1998-07-16 2000-02-02 Nikon Corp フッ化物単結晶の熱処理方法及び製造方法
US6567450B2 (en) * 1999-12-10 2003-05-20 Cymer, Inc. Very narrow band, two chamber, high rep rate gas discharge laser system
JP2000124534A (ja) * 1998-10-12 2000-04-28 Komatsu Ltd ＡｒＦエキシマレーザ装置及びその狭帯域化モジュール
JP3631063B2 (ja) * 1998-10-21 2005-03-23 キヤノン株式会社 フッ化物の精製方法及びフッ化物結晶の製造方法
US6242136B1 (en) * 1999-02-12 2001-06-05 Corning Incorporated Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass
US6587202B2 (en) * 2000-01-28 2003-07-01 Lambda Physik Ag Optical materials testing method
US6330256B1 (en) * 2000-02-01 2001-12-11 Raytheon Company Method and apparatus for non-dispersive face-cooling of multi-crystal nonlinear optical devices

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030219056A1 (en) * 2001-01-29 2003-11-27 Yager Thomas A. High power deep ultraviolet laser with long life optics
US6904073B2 (en) * 2001-01-29 2005-06-07 Cymer, Inc. High power deep ultraviolet laser with long life optics
US6801562B2 (en) * 2001-03-02 2004-10-05 Corning Incorporated High repetition rate excimer laser system
US20030174754A1 (en) * 2002-02-13 2003-09-18 Pell Michael A. High repetition rate excimer laser system
US20030231687A1 (en) * 2002-05-29 2003-12-18 Osamu Wakabayashi Ultraviolet laser device
US20060222034A1 (en) * 2005-03-31 2006-10-05 Cymer, Inc. 6 Khz and above gas discharge laser system
US20060233214A1 (en) * 2005-03-31 2006-10-19 Cymer, Inc. Hybrid electrode support bar
US8855166B2 (en) 2005-03-31 2014-10-07 Cymer, Llc 6 KHz and above gas discharge laser system
CN108183383A (zh) * 2018-01-22 2018-06-19 中国科学院合肥物质科学研究院 一种应用于白癜风治疗的准分子激光器

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CN1299406C (zh) 2007-02-07
KR20030081482A (ko) 2003-10-17
EP1371117A2 (de) 2003-12-17
EP1449013A2 (de) 2004-08-25
JP3857236B2 (ja) 2006-12-13
WO2002073244A2 (en) 2002-09-19
AU2002258427A1 (en) 2002-09-24
TW569510B (en) 2004-01-01
CN1524323A (zh) 2004-08-25
CN1507682A (zh) 2004-06-23
JP2004523122A (ja) 2004-07-29
WO2002071555A3 (en) 2002-11-21
WO2002071555A9 (en) 2003-12-18
WO2002073244A9 (en) 2003-02-13
EP1371119A4 (de) 2006-10-11
JP2004523913A (ja) 2004-08-05
EP1371119A1 (de) 2003-12-17
US6768762B2 (en) 2004-07-27
WO2002071558A1 (en) 2002-09-12
EP1371117A4 (de) 2006-10-11
AU2002258435A1 (en) 2002-09-19
WO2002073244A3 (en) 2004-06-24
EP1371117B1 (de) 2011-08-31
US20030210726A1 (en) 2003-11-13
KR20030084958A (ko) 2003-11-01
EP1449013A4 (de) 2006-09-20
WO2002071555A2 (en) 2002-09-12
JP2004534381A (ja) 2004-11-11
KR100870330B1 (ko) 2008-11-25

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