UA82852C2 - Method for application of material for settling on part and device for deposition of material on blank - Google Patents
Method for application of material for settling on part and device for deposition of material on blank Download PDFInfo
- Publication number
- UA82852C2 UA82852C2 UAA200502537A UAA200502537A UA82852C2 UA 82852 C2 UA82852 C2 UA 82852C2 UA A200502537 A UAA200502537 A UA A200502537A UA A200502537 A UAA200502537 A UA A200502537A UA 82852 C2 UA82852 C2 UA 82852C2
- Authority
- UA
- Ukraine
- Prior art keywords
- components
- deposition
- sputtering
- workpiece
- spraying
- Prior art date
Links
- 239000000463 material Substances 0.000 title claims abstract description 116
- 238000000034 method Methods 0.000 title claims abstract description 48
- 230000008021 deposition Effects 0.000 title claims description 66
- 238000004544 sputter deposition Methods 0.000 claims abstract description 69
- 229910001069 Ti alloy Inorganic materials 0.000 claims abstract description 5
- 238000000151 deposition Methods 0.000 claims description 67
- 150000002500 ions Chemical class 0.000 claims description 46
- 238000005507 spraying Methods 0.000 claims description 18
- 239000000956 alloy Substances 0.000 claims description 13
- 229910045601 alloy Inorganic materials 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 13
- 238000005477 sputtering target Methods 0.000 claims description 10
- 239000010936 titanium Substances 0.000 claims description 10
- 239000002689 soil Substances 0.000 claims description 9
- 239000007921 spray Substances 0.000 claims description 9
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 8
- 229910052719 titanium Inorganic materials 0.000 claims description 8
- 229910000601 superalloy Inorganic materials 0.000 claims description 4
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052750 molybdenum Inorganic materials 0.000 claims description 3
- 239000011733 molybdenum Substances 0.000 claims description 3
- 230000008016 vaporization Effects 0.000 claims description 3
- 230000008569 process Effects 0.000 abstract description 16
- 230000008439 repair process Effects 0.000 abstract description 6
- 238000005240 physical vapour deposition Methods 0.000 abstract 2
- 230000003190 augmentative effect Effects 0.000 abstract 1
- 229910001423 beryllium ion Inorganic materials 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 238000005328 electron beam physical vapour deposition Methods 0.000 abstract 1
- 229910052751 metal Inorganic materials 0.000 description 13
- 239000002184 metal Substances 0.000 description 13
- 238000010894 electron beam technology Methods 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- 239000000523 sample Substances 0.000 description 12
- 238000009826 distribution Methods 0.000 description 9
- 239000004020 conductor Substances 0.000 description 8
- 230000008020 evaporation Effects 0.000 description 8
- 238000001704 evaporation Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 238000003754 machining Methods 0.000 description 8
- 238000010849 ion bombardment Methods 0.000 description 7
- 230000036961 partial effect Effects 0.000 description 7
- 238000009833 condensation Methods 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- 238000011084 recovery Methods 0.000 description 6
- 230000035882 stress Effects 0.000 description 6
- 239000000126 substance Substances 0.000 description 5
- 239000012808 vapor phase Substances 0.000 description 5
- 238000003466 welding Methods 0.000 description 5
- 238000004804 winding Methods 0.000 description 5
- 238000011109 contamination Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 230000002829 reductive effect Effects 0.000 description 4
- 239000011819 refractory material Substances 0.000 description 4
- 230000003014 reinforcing effect Effects 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000015556 catabolic process Effects 0.000 description 3
- 230000008859 change Effects 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000006073 displacement reaction Methods 0.000 description 3
- 229910021645 metal ion Inorganic materials 0.000 description 3
- 150000002739 metals Chemical class 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000004913 activation Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 238000000227 grinding Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 230000003993 interaction Effects 0.000 description 2
- 239000007791 liquid phase Substances 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229910052759 nickel Inorganic materials 0.000 description 2
- 230000005855 radiation Effects 0.000 description 2
- 210000001991 scapula Anatomy 0.000 description 2
- 230000006641 stabilisation Effects 0.000 description 2
- 238000011105 stabilization Methods 0.000 description 2
- ZKXDGKXYMTYWTB-UHFFFAOYSA-N N-nitrosomorpholine Chemical compound O=NN1CCOCC1 ZKXDGKXYMTYWTB-UHFFFAOYSA-N 0.000 description 1
- 241000047703 Nonion Species 0.000 description 1
- 229910000756 V alloy Inorganic materials 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 230000009471 action Effects 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 238000005266 casting Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000012809 cooling fluid Substances 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000003795 desorption Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000009429 distress Effects 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000000284 extract Substances 0.000 description 1
- 239000000446 fuel Substances 0.000 description 1
- 238000002513 implantation Methods 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 230000000670 limiting effect Effects 0.000 description 1
- 229910001338 liquidmetal Inorganic materials 0.000 description 1
- 238000011068 loading method Methods 0.000 description 1
- 230000000873 masking effect Effects 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 230000007935 neutral effect Effects 0.000 description 1
- 238000013021 overheating Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 238000007750 plasma spraying Methods 0.000 description 1
- 238000002294 plasma sputter deposition Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 239000011253 protective coating Substances 0.000 description 1
- 238000000197 pyrolysis Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- -1 titanium-aluminum-vanadium Chemical compound 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 230000007704 transition Effects 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/14—Metallic material, boron or silicon
- C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23P—METAL-WORKING NOT OTHERWISE PROVIDED FOR; COMBINED OPERATIONS; UNIVERSAL MACHINE TOOLS
- B23P6/00—Restoring or reconditioning objects
- B23P6/002—Repairing turbine components, e.g. moving or stationary blades, rotors
- B23P6/007—Repairing turbine components, e.g. moving or stationary blades, rotors using only additive methods, e.g. build-up welding
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/225—Oblique incidence of vaporised material on substrate
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
- C23C14/548—Controlling the composition
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F01—MACHINES OR ENGINES IN GENERAL; ENGINE PLANTS IN GENERAL; STEAM ENGINES
- F01D—NON-POSITIVE DISPLACEMENT MACHINES OR ENGINES, e.g. STEAM TURBINES
- F01D5/00—Blades; Blade-carrying members; Heating, heat-insulating, cooling or antivibration means on the blades or the members
- F01D5/005—Repairing methods or devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32917—Plasma diagnostics
- H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
- F05D2230/30—Manufacture with deposition of material
- F05D2230/31—Layer deposition
- F05D2230/313—Layer deposition by physical vapour deposition
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F05—INDEXING SCHEMES RELATING TO ENGINES OR PUMPS IN VARIOUS SUBCLASSES OF CLASSES F01-F04
- F05D—INDEXING SCHEME FOR ASPECTS RELATING TO NON-POSITIVE-DISPLACEMENT MACHINES OR ENGINES, GAS-TURBINES OR JET-PROPULSION PLANTS
- F05D2230/00—Manufacture
- F05D2230/80—Repairing, retrofitting or upgrading methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/30—Electron or ion beam tubes for processing objects
- H01J2237/31—Processing objects on a macro-scale
- H01J2237/3132—Evaporating
- H01J2237/3137—Plasma-assisted co-operation
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- General Engineering & Computer Science (AREA)
- Physical Vapour Deposition (AREA)
- Turbine Rotor Nozzle Sealing (AREA)
- Structures Of Non-Positive Displacement Pumps (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/804,754 US20050205415A1 (en) | 2004-03-19 | 2004-03-19 | Multi-component deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| UA82852C2 true UA82852C2 (en) | 2008-05-26 |
Family
ID=34838944
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| UAA200502537A UA82852C2 (en) | 2004-03-19 | 2005-03-21 | Method for application of material for settling on part and device for deposition of material on blank |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US20050205415A1 (de) |
| EP (1) | EP1577417B1 (de) |
| JP (1) | JP2005273016A (de) |
| CN (1) | CN1670253A (de) |
| CA (1) | CA2500933A1 (de) |
| SG (1) | SG115767A1 (de) |
| UA (1) | UA82852C2 (de) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7045015B2 (en) | 1998-09-30 | 2006-05-16 | Optomec Design Company | Apparatuses and method for maskless mesoscale material deposition |
| US7329436B2 (en) * | 2004-11-17 | 2008-02-12 | United Technologies Corporation | Vapor deposition of dissimilar materials |
| US20080013299A1 (en) * | 2004-12-13 | 2008-01-17 | Optomec, Inc. | Direct Patterning for EMI Shielding and Interconnects Using Miniature Aerosol Jet and Aerosol Jet Array |
| US7674671B2 (en) | 2004-12-13 | 2010-03-09 | Optomec Design Company | Aerodynamic jetting of aerosolized fluids for fabrication of passive structures |
| US7938341B2 (en) | 2004-12-13 | 2011-05-10 | Optomec Design Company | Miniature aerosol jet and aerosol jet array |
| US8084086B2 (en) * | 2005-06-30 | 2011-12-27 | University Of Virginia Patent Foundation | Reliant thermal barrier coating system and related methods and apparatus of making the same |
| US20070289869A1 (en) * | 2006-06-15 | 2007-12-20 | Zhifei Ye | Large Area Sputtering Target |
| US7847208B2 (en) * | 2007-07-25 | 2010-12-07 | United Technologies Corporation | Methods for performing manual laser deposition |
| TWI482662B (zh) | 2007-08-30 | 2015-05-01 | 阿普托麥克股份有限公司 | 機械上一體式及緊密式耦合之列印頭以及噴霧源 |
| US20110223317A1 (en) * | 2010-03-12 | 2011-09-15 | United Technologies Corporation | Direct thermal stabilization for coating application |
| US20120196051A1 (en) * | 2011-01-28 | 2012-08-02 | United Technologies Corporation | Deposition Apparatus and Methods |
| US20130082446A1 (en) * | 2011-09-30 | 2013-04-04 | General Electric Company | Method of repairing rotating machine components |
| US9145602B2 (en) * | 2011-11-01 | 2015-09-29 | The Boeing Company | Open air plasma deposition system |
| US20130277203A1 (en) * | 2012-04-24 | 2013-10-24 | Applied Materials, Inc. | Process kit shield and physical vapor deposition chamber having same |
| US9023437B2 (en) * | 2012-05-15 | 2015-05-05 | United Technologies Corporation | Ceramic coating deposition |
| DE102013206598B4 (de) * | 2013-04-12 | 2019-06-27 | VON ARDENNE Asset GmbH & Co. KG | Vakuumbeschichtungsanlage |
| US20160282532A1 (en) * | 2013-10-30 | 2016-09-29 | Tecport Optics, Inc. | Ophthalmic optical filters for prevention and reduction of photophobic effects and responses |
| CN103898468A (zh) * | 2014-04-23 | 2014-07-02 | 安徽普威达真空科技有限公司 | 一种零件表面金属镀层缺陷的修复方法 |
| CN107548346B (zh) | 2015-02-10 | 2021-01-05 | 奥普托美克公司 | 通过气溶胶的飞行中固化制造三维结构 |
| EP3682046B1 (de) * | 2017-09-15 | 2023-06-21 | Oerlikon Surface Solutions AG, Pfäffikon | Verfahren zur herstellung einer beschichtung mit farbiger oberfläche |
| TWI767087B (zh) | 2017-11-13 | 2022-06-11 | 美商阿普托麥克股份有限公司 | 用於控制氣溶膠噴注列印系統的列印頭中之氣溶膠的流之方法以及用於沉積氣溶膠之裝備 |
| CN113808935B (zh) * | 2020-06-16 | 2023-12-15 | 中微半导体设备(上海)股份有限公司 | 耐腐蚀涂层形成方法和装置、等离子体零部件和反应装置 |
| TW202247905A (zh) | 2021-04-29 | 2022-12-16 | 美商阿普托麥克股份有限公司 | 用於氣溶膠噴射裝置之高可靠性鞘護輸送路徑 |
Family Cites Families (63)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2088659A5 (de) * | 1970-04-21 | 1972-01-07 | Progil | |
| US4008844A (en) * | 1975-01-06 | 1977-02-22 | United Technologies Corporation | Method of repairing surface defects using metallic filler material |
| US4073639A (en) * | 1975-01-06 | 1978-02-14 | United Technologies Corporation | Metallic filler material |
| JPS5845375A (ja) * | 1981-09-11 | 1983-03-16 | Matsushita Electric Ind Co Ltd | 蒸着による薄膜形成方法 |
| US4415375A (en) * | 1982-06-10 | 1983-11-15 | Mcdonnell Douglas Corporation | Transient titanium alloys |
| JPS5925975A (ja) | 1982-08-02 | 1984-02-10 | Fuji Photo Film Co Ltd | 合金薄膜の製造法 |
| JPS5955016A (ja) * | 1982-09-22 | 1984-03-29 | Fujitsu Ltd | 高融点金属窒化膜の形成方法 |
| US4652795A (en) * | 1985-03-14 | 1987-03-24 | Denton Vacuum Inc. | External plasma gun |
| US4716340A (en) * | 1985-12-10 | 1987-12-29 | Denton Vacuum Inc | Pre-ionization aided sputter gun |
| DE3700633C2 (de) * | 1987-01-12 | 1997-02-20 | Reinar Dr Gruen | Verfahren und Vorrichtung zum schonenden Beschichten elektrisch leitender Gegenstände mittels Plasma |
| US4805833A (en) * | 1987-02-25 | 1989-02-21 | General Electric Company | Method of forming compacts with integral consolidation containers |
| DE3881256D1 (de) * | 1987-03-06 | 1993-07-01 | Balzers Hochvakuum | Verfahren und vorrichtungen zum vakuumbeschichten mittels einer elektrischen bogenentladung. |
| US4822248A (en) * | 1987-04-15 | 1989-04-18 | Metallurgical Industries, Inc. | Rebuilt shrouded turbine blade and method of rebuilding the same |
| US4885070A (en) * | 1988-02-12 | 1989-12-05 | Leybold Aktiengesellschaft | Method and apparatus for the application of materials |
| US5439575A (en) * | 1988-06-30 | 1995-08-08 | Board Of Trustees Of The University Of Illinois | Hybrid method for depositing semi-conductive materials |
| US4992153A (en) * | 1989-04-26 | 1991-02-12 | Balzers Aktiengesellschaft | Sputter-CVD process for at least partially coating a workpiece |
| US5841236A (en) * | 1989-10-02 | 1998-11-24 | The Regents Of The University Of California | Miniature pulsed vacuum arc plasma gun and apparatus for thin-film fabrication |
| CH680369A5 (de) * | 1989-11-22 | 1992-08-14 | Balzers Hochvakuum | |
| US5120567A (en) * | 1990-05-17 | 1992-06-09 | General Electric Company | Low frequency plasma spray method in which a stable plasma is created by operating a spray gun at less than 1 mhz in a mixture of argon and helium gas |
| DE4026367A1 (de) * | 1990-06-25 | 1992-03-12 | Leybold Ag | Vorrichtung zum beschichten von substraten |
| US5145739A (en) * | 1990-07-12 | 1992-09-08 | Sarin Vinod K | Abrasion resistant coated articles |
| US5084090A (en) * | 1990-07-19 | 1992-01-28 | Axel Johnson Metals, Inc. | Vacuum processing of reactive metal |
| US5106010A (en) * | 1990-09-28 | 1992-04-21 | Chromalloy Gas Turbine Corporation | Welding high-strength nickel base superalloys |
| US5310607A (en) * | 1991-05-16 | 1994-05-10 | Balzers Aktiengesellschaft | Hard coating; a workpiece coated by such hard coating and a method of coating such workpiece by such hard coating |
| US5334302A (en) * | 1991-11-15 | 1994-08-02 | Tokyo Electron Limited | Magnetron sputtering apparatus and sputtering gun for use in the same |
| DE69330018T2 (de) * | 1992-05-06 | 2001-06-21 | United Technologies Corp., Hartford | Wärmebehandlung und verfahren zum reparieren eines superlegierungskörpers auf kobalt-basis |
| CH686253A5 (de) * | 1992-08-28 | 1996-02-15 | Balzers Hochvakuum | Verfahren zur Regelung des Reaktionsgrades sowie Beschichtungsanlage. |
| JPH06306588A (ja) | 1993-04-27 | 1994-11-01 | Nikon Corp | 成膜装置及びそれを用いた複数の物質からなる 膜の製造方法 |
| DE69419310T2 (de) * | 1993-12-28 | 1999-12-16 | Citizen Watch Co., Ltd. | Weisses dekoratives teil und verfahren zu dessen herstellung |
| US5451142A (en) * | 1994-03-29 | 1995-09-19 | United Technologies Corporation | Turbine engine blade having a zone of fine grains of a high strength composition at the blade root surface |
| DE4412906C1 (de) * | 1994-04-14 | 1995-07-13 | Fraunhofer Ges Forschung | Verfahren und Einrichtung für die ionengestützte Vakuumbeschichtung |
| US5783318A (en) * | 1994-06-22 | 1998-07-21 | United Technologies Corporation | Repaired nickel based superalloy |
| DE19505258C2 (de) * | 1995-02-16 | 1998-08-06 | Samsung Electronics Co Ltd | Beschichtungsvorrichtung |
| US5525429A (en) * | 1995-03-06 | 1996-06-11 | General Electric Company | Laser shock peening surface enhancement for gas turbine engine high strength rotor alloy repair |
| USH1933H1 (en) * | 1996-04-08 | 2001-01-02 | The United States Of America As Represented By The Secretary Of The Air Force | Magnetron sputter-pulsed laser deposition system and method |
| US5732467A (en) * | 1996-11-14 | 1998-03-31 | General Electric Company | Method of repairing directionally solidified and single crystal alloy parts |
| JP3070004B2 (ja) * | 1996-11-19 | 2000-07-24 | 株式会社ランドマークテクノロジー | プラズマ・プロセス監視装置 |
| US6049978A (en) * | 1996-12-23 | 2000-04-18 | Recast Airfoil Group | Methods for repairing and reclassifying gas turbine engine airfoil parts |
| US5794338A (en) * | 1997-04-04 | 1998-08-18 | General Electric Company | Method for repairing a turbine engine member damaged tip |
| US5851737A (en) * | 1997-05-27 | 1998-12-22 | The United States Of America As Represented By The Secretary Of The Air Force | Spatially varied interfaces for composite materials |
| US20030052000A1 (en) * | 1997-07-11 | 2003-03-20 | Vladimir Segal | Fine grain size material, sputtering target, methods of forming, and micro-arc reduction method |
| US6090457A (en) * | 1997-10-21 | 2000-07-18 | Sanyo Vaccum Industries Co. Ltd. | Process of making a thin film |
| US6231725B1 (en) * | 1998-08-04 | 2001-05-15 | Applied Materials, Inc. | Apparatus for sputtering material onto a workpiece with the aid of a plasma |
| WO2000009777A1 (en) * | 1998-08-17 | 2000-02-24 | Coltec Industries Inc. | Vapor phase co-deposition coating for superalloy applications |
| US6153313A (en) * | 1998-10-06 | 2000-11-28 | General Electric Company | Nickel aluminide coating and coating systems formed therewith |
| US6302625B1 (en) * | 1999-10-15 | 2001-10-16 | United Technologies Corporation | Method and apparatus for refurbishing a gas turbine airfoil |
| WO2001065590A2 (en) * | 2000-03-02 | 2001-09-07 | Tokyo Electron Limited | Esrf source for ion plating epitaxial deposition |
| CA2305938C (en) * | 2000-04-10 | 2007-07-03 | Vladimir I. Gorokhovsky | Filtered cathodic arc deposition method and apparatus |
| US6875318B1 (en) * | 2000-04-11 | 2005-04-05 | Metalbond Technologies, Llc | Method for leveling and coating a substrate and an article formed thereby |
| US6911129B1 (en) * | 2000-05-08 | 2005-06-28 | Intematix Corporation | Combinatorial synthesis of material chips |
| US6352629B1 (en) * | 2000-07-10 | 2002-03-05 | Applied Materials, Inc. | Coaxial electromagnet in a magnetron sputtering reactor |
| US6627050B2 (en) * | 2000-07-28 | 2003-09-30 | Applied Materials, Inc. | Method and apparatus for depositing a tantalum-containing layer on a substrate |
| US20020076573A1 (en) * | 2000-12-19 | 2002-06-20 | Neal James Wesley | Vapor deposition repair of superalloy articles |
| US6536110B2 (en) * | 2001-04-17 | 2003-03-25 | United Technologies Corporation | Integrally bladed rotor airfoil fabrication and repair techniques |
| EP1436441B2 (de) | 2001-09-10 | 2012-11-28 | University Of Virginia Patent Foundation | Verfahren zum aufbringen von metalllegierungsüberzügen und überzogene komponente |
| US6908288B2 (en) * | 2001-10-31 | 2005-06-21 | General Electric Company | Repair of advanced gas turbine blades |
| JP2003138371A (ja) * | 2001-11-01 | 2003-05-14 | Sanyo Shinku Kogyo Kk | 薄膜の製造方法および薄膜製造装置 |
| JP2003188115A (ja) * | 2001-12-17 | 2003-07-04 | Shin Meiwa Ind Co Ltd | 半導体配線形成方法及び装置、半導体デバイス製造方法及び装置、並びにウエハ |
| JP4167833B2 (ja) * | 2002-01-24 | 2008-10-22 | 株式会社ユーテック | 成膜装置、酸化物薄膜成膜用基板及びその製造方法 |
| US20050287296A1 (en) * | 2002-07-25 | 2005-12-29 | Wadley Haydn N G | Method and apparatus for dispersion strengthened bond coats for thermal barrier coatings |
| WO2004043691A1 (en) * | 2002-11-12 | 2004-05-27 | University Of Virginia Patent Foundation | Extremely strain tolerant thermal protection coating and related method and apparatus thereof |
| US6770353B1 (en) * | 2003-01-13 | 2004-08-03 | Hewlett-Packard Development Company, L.P. | Co-deposited films with nano-columnar structures and formation process |
| US6986381B2 (en) * | 2003-07-23 | 2006-01-17 | Santoku America, Inc. | Castings of metallic alloys with improved surface quality, structural integrity and mechanical properties fabricated in refractory metals and refractory metal carbides coated graphite molds under vacuum |
-
2004
- 2004-03-19 US US10/804,754 patent/US20050205415A1/en not_active Abandoned
-
2005
- 2005-03-15 CA CA 2500933 patent/CA2500933A1/en not_active Abandoned
- 2005-03-16 SG SG200501610A patent/SG115767A1/en unknown
- 2005-03-18 JP JP2005078756A patent/JP2005273016A/ja active Pending
- 2005-03-18 EP EP20050251682 patent/EP1577417B1/de not_active Expired - Lifetime
- 2005-03-19 CN CN 200510068530 patent/CN1670253A/zh active Pending
- 2005-03-21 UA UAA200502537A patent/UA82852C2/uk unknown
-
2009
- 2009-10-20 US US12/582,560 patent/US8864956B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JP2005273016A (ja) | 2005-10-06 |
| US8864956B2 (en) | 2014-10-21 |
| EP1577417A1 (de) | 2005-09-21 |
| US20050205415A1 (en) | 2005-09-22 |
| US20100155224A1 (en) | 2010-06-24 |
| EP1577417B1 (de) | 2012-09-19 |
| SG115767A1 (en) | 2005-10-28 |
| CN1670253A (zh) | 2005-09-21 |
| CA2500933A1 (en) | 2005-09-19 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US8864956B2 (en) | Multi-component deposition | |
| EP1505169B1 (de) | Ionenplattierungsverfahren und Vorrichtung | |
| US7879203B2 (en) | Method and apparatus for cathodic arc ion plasma deposition | |
| CN101151701B (zh) | 运行脉冲式电弧蒸发源的方法以及具有脉冲式电弧蒸发源的真空处理设备 | |
| EP2602354A1 (de) | Vakuumbogenablagerungsvorrichtung mit gefilterter Kathode und Verfahren | |
| JP6101238B2 (ja) | 基体を被覆するための被覆装置及び基体を被覆する方法 | |
| JPS6036468B2 (ja) | 真空ア−クプラズマ装置 | |
| US6602542B2 (en) | Device for cleaning an article | |
| US9211570B2 (en) | Ion bombardment treatment apparatus and method for cleaning of surface of base material using the same | |
| EP2482303B1 (de) | Abscheidungsvorrichtung und Verfahren | |
| US3639151A (en) | Vapor randomization in vacuum deposition of coatings | |
| JP4693002B2 (ja) | アークイオンプレーティング装置 | |
| US6391164B1 (en) | Deposition of coatings and thin films using a vacuum arc with a non-consumable hot anode | |
| EP2597174A1 (de) | Dampfabscheidung aus keramischen Beschichtungen | |
| WO2014022075A1 (en) | Device for the elimination of liquid droplets from a cathodic arc plasma source | |
| CN106460157B (zh) | 在阴极电弧物理气相沉积(pvd)中真空过滤宏观粒子的方法 | |
| RU179881U1 (ru) | Дуговой испаритель | |
| KR20060066632A (ko) | 기판에 재료를 캐소드 아크 증착시키기 위한 방법 및 장치 | |
| Aksyonov et al. | Rectilinear plasma filters and suppression of macroparticles emission in vacuum arcs; a review | |
| Hyde | Hollow-electrode pulsed plasma deposition of titanium and carbon thin films |