FR2088659A5 - - Google Patents

Info

Publication number
FR2088659A5
FR2088659A5 FR7014327A FR7014327A FR2088659A5 FR 2088659 A5 FR2088659 A5 FR 2088659A5 FR 7014327 A FR7014327 A FR 7014327A FR 7014327 A FR7014327 A FR 7014327A FR 2088659 A5 FR2088659 A5 FR 2088659A5
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7014327A
Other languages
French (fr)
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Progil SARL
Original Assignee
Progil SARL
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Progil SARL filed Critical Progil SARL
Priority to FR7014327A priority Critical patent/FR2088659A5/fr
Priority to CH372571A priority patent/CH524690A/fr
Priority to SE03345/71A priority patent/SE366345B/xx
Priority to US00131497A priority patent/US3773639A/en
Priority to RO66501D priority patent/RO61059A/ro
Priority to NL7105157A priority patent/NL7105157A/xx
Priority to GB2665571*A priority patent/GB1307956A/en
Priority to CA110757A priority patent/CA933881A/en
Priority to ES390345A priority patent/ES390345A1/es
Priority to JP2520271A priority patent/JPS5324914B1/ja
Priority to PL1971147635A priority patent/PL83268B1/pl
Priority to BE766023A priority patent/BE766023A/xx
Priority to LU63024D priority patent/LU63024A1/xx
Priority to DE19712119066 priority patent/DE2119066A1/de
Priority to IL36656A priority patent/IL36656A/xx
Priority to AT342371A priority patent/AT304990B/de
Priority to BR2391/71A priority patent/BR7102391D0/pt
Application granted granted Critical
Publication of FR2088659A5 publication Critical patent/FR2088659A5/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J49/00—Particle spectrometers or separator tubes
    • H01J49/44—Energy spectrometers, e.g. alpha-, beta-spectrometers
    • H01J49/46—Static spectrometers
    • H01J49/48—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter
    • H01J49/488—Static spectrometers using electrostatic analysers, e.g. cylindrical sector, Wien filter with retarding grids
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/14—Metallic material, boron or silicon
    • C23C14/16—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon
    • C23C14/165—Metallic material, boron or silicon on metallic substrates or on substrates of boron or silicon by cathodic sputtering
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25B—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES FOR THE PRODUCTION OF COMPOUNDS OR NON-METALS; APPARATUS THEREFOR
    • C25B11/00—Electrodes; Manufacture thereof not otherwise provided for
    • C25B11/04—Electrodes; Manufacture thereof not otherwise provided for characterised by the material
    • C25B11/051—Electrodes formed of electrocatalysts on a substrate or carrier
    • C25B11/073—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material
    • C25B11/075—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound
    • C25B11/081—Electrodes formed of electrocatalysts on a substrate or carrier characterised by the electrocatalyst material consisting of a single catalytic element or catalytic compound the element being a noble metal

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Electrochemistry (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Inert Electrodes (AREA)
FR7014327A 1970-04-21 1970-04-21 Expired FR2088659A5 (de)

Priority Applications (17)

Application Number Priority Date Filing Date Title
FR7014327A FR2088659A5 (de) 1970-04-21 1970-04-21
CH372571A CH524690A (fr) 1970-04-21 1971-03-15 Nouveau procédé de dépôt par pulvérisation cathodique, de métaux ou oxydes sur un support métallique et application dudit procédé
SE03345/71A SE366345B (de) 1970-04-21 1971-03-16
US00131497A US3773639A (en) 1970-04-21 1971-04-05 Process for the deposition of metals or oxides on a metallic support by cathodic sputtering and applications thereof
RO66501D RO61059A (de) 1970-04-21 1971-04-06
NL7105157A NL7105157A (de) 1970-04-21 1971-04-16
JP2520271A JPS5324914B1 (de) 1970-04-21 1971-04-19
ES390345A ES390345A1 (es) 1970-04-21 1971-04-19 Procedimiento para depositar sobre un soporte metalico, porpulverizador catoica, un metal precioso o un oxido de este metal.
GB2665571*A GB1307956A (en) 1970-04-21 1971-04-19 Process for depositing precious metals on a metallic support
PL1971147635A PL83268B1 (de) 1970-04-21 1971-04-19
CA110757A CA933881A (en) 1970-04-21 1971-04-19 Depot de metaux precieux ou de leurs oxydes sur un support metallique par pulverisation cathodique
LU63024D LU63024A1 (de) 1970-04-21 1971-04-20
BE766023A BE766023A (fr) 1970-04-21 1971-04-20 Nouveau procede de depot par pulverisation cathodique, de metaux ou oxydes sur un support metallique et applications dudit procede
DE19712119066 DE2119066A1 (de) 1970-04-21 1971-04-20 Verfahren zum Herstellen von edel metall und/oder edelmetalloxid beschich teten Gegenstanden, insbesondere Elektro den
IL36656A IL36656A (en) 1970-04-21 1971-04-20 Process for depositing precious metals on a metallic support,metallic supports produced thereby and electrochemical cells containing said supports
AT342371A AT304990B (de) 1970-04-21 1971-04-21 Verfahren zur Ablagerung eines Edelmetalls oder eines Oxydes dieses Metalls auf einem Metallträger
BR2391/71A BR7102391D0 (pt) 1970-04-21 1971-04-22 Processo para deposicao de metal ou oxido de metal precioso sobre um suporte metalico por pulverizacao catodica

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7014327A FR2088659A5 (de) 1970-04-21 1970-04-21

Publications (1)

Publication Number Publication Date
FR2088659A5 true FR2088659A5 (de) 1972-01-07

Family

ID=9054289

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7014327A Expired FR2088659A5 (de) 1970-04-21 1970-04-21

Country Status (17)

Country Link
US (1) US3773639A (de)
JP (1) JPS5324914B1 (de)
AT (1) AT304990B (de)
BE (1) BE766023A (de)
BR (1) BR7102391D0 (de)
CA (1) CA933881A (de)
CH (1) CH524690A (de)
DE (1) DE2119066A1 (de)
ES (1) ES390345A1 (de)
FR (1) FR2088659A5 (de)
GB (1) GB1307956A (de)
IL (1) IL36656A (de)
LU (1) LU63024A1 (de)
NL (1) NL7105157A (de)
PL (1) PL83268B1 (de)
RO (1) RO61059A (de)
SE (1) SE366345B (de)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2357663A1 (fr) * 1976-07-09 1978-02-03 Basf Ag Cellule d'electrolyse
EP0068651A2 (de) * 1981-06-29 1983-01-05 General Motors Corporation Verfahren zum Zerstäuben einer Abgaselektrode auf einen Sauerstoffmessfühler für Abgase
EP0446657A1 (de) * 1990-03-02 1991-09-18 Applied Materials, Inc. Verfahren zur Vorbereitung einer Blende zur Verminderung von Teilchen in einer Kammer zur physikalischen Aufdampfung
US5202008A (en) * 1990-03-02 1993-04-13 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
EP0572673A1 (de) * 1991-11-21 1993-12-08 Nisshin Steel Co., Ltd. Verfahren zur bildung einer beschichtung mittels aufdampfen
US5391275A (en) * 1990-03-02 1995-02-21 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
WO1997004146A1 (en) * 1995-07-21 1997-02-06 Hydro Quebec ALLOYS OF Ti, Ru, Fe AND O AND USE THEREOF FOR THE MANUFACTURE OF CATHODES FOR THE ELECTROCHEMICAL SYNTHESIS OF SODIUM CHLORATE

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2320565A1 (fr) * 1973-04-12 1977-03-04 Radiotechnique Compelec Plaque a transparence selective et son procede de fabrication
AU507748B2 (en) * 1976-06-10 1980-02-28 University Of Sydney, The Reactive sputtering
AU5889880A (en) * 1979-07-02 1981-01-15 Olin Corporation Manufacture of low overvoltage electrodes by cathodic sputtering
US4420385A (en) * 1983-04-15 1983-12-13 Gryphon Products Apparatus and process for sputter deposition of reacted thin films
EP0593372B1 (de) * 1992-10-14 2001-09-19 Daiki Engineering Co., Ltd. Hochfeste Elektroden für die Elektrolyse und ein Verfahren für die Herstellung derselben
FR2861219B1 (fr) * 2003-10-15 2006-04-07 Commissariat Energie Atomique Pile a combustible alcaline comportant une anode comprenant de l'aluminium et du zinc et procede de fabrication de l'anode
US20050205415A1 (en) * 2004-03-19 2005-09-22 Belousov Igor V Multi-component deposition
ITMI20091621A1 (it) * 2009-09-23 2011-03-24 Industrie De Nora Spa Elettrodo per processi elettrolitici con struttura cristallina controllata
JP4734664B1 (ja) * 2010-09-17 2011-07-27 田中貴金属工業株式会社 電解用電極、オゾン電解生成用陽極、過硫酸電解生成用陽極及びクロム電解酸化用陽極
US10654034B2 (en) 2014-05-30 2020-05-19 At Energy Llc Method of preparing platinum-based catalyst and platinum-based catalyst
RU2562462C1 (ru) * 2014-05-30 2015-09-10 Общество с ограниченной ответственностью "Эй Ти Энерджи", ООО "Эй Ти Энерджи" Способ изготовления катализатора на основе платины и катализатор на основе платины

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2357663A1 (fr) * 1976-07-09 1978-02-03 Basf Ag Cellule d'electrolyse
EP0068651A2 (de) * 1981-06-29 1983-01-05 General Motors Corporation Verfahren zum Zerstäuben einer Abgaselektrode auf einen Sauerstoffmessfühler für Abgase
EP0068651A3 (en) * 1981-06-29 1984-09-26 General Motors Corporation Method of sputtering an exhaust electrode on to an exhaust gas oxygen sensor
EP0446657A1 (de) * 1990-03-02 1991-09-18 Applied Materials, Inc. Verfahren zur Vorbereitung einer Blende zur Verminderung von Teilchen in einer Kammer zur physikalischen Aufdampfung
US5202008A (en) * 1990-03-02 1993-04-13 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
US5391275A (en) * 1990-03-02 1995-02-21 Applied Materials, Inc. Method for preparing a shield to reduce particles in a physical vapor deposition chamber
EP0572673A1 (de) * 1991-11-21 1993-12-08 Nisshin Steel Co., Ltd. Verfahren zur bildung einer beschichtung mittels aufdampfen
EP0572673A4 (de) * 1991-11-21 1995-03-01 Nisshin Steel Co Ltd Verfahren zur bildung einer beschichtung mittels aufdampfen.
WO1997004146A1 (en) * 1995-07-21 1997-02-06 Hydro Quebec ALLOYS OF Ti, Ru, Fe AND O AND USE THEREOF FOR THE MANUFACTURE OF CATHODES FOR THE ELECTROCHEMICAL SYNTHESIS OF SODIUM CHLORATE
US5662834A (en) * 1995-07-21 1997-09-02 Hydro-Quebec Alloys of Ti Ru Fe and O and use thereof for the manufacture of cathodes for the electrochemical synthesis of sodium chlorate

Also Published As

Publication number Publication date
GB1307956A (en) 1973-02-21
JPS5324914B1 (de) 1978-07-24
AT304990B (de) 1973-02-12
LU63024A1 (de) 1972-12-11
CH524690A (fr) 1972-06-30
PL83268B1 (de) 1975-12-31
US3773639A (en) 1973-11-20
IL36656A0 (en) 1971-06-23
BE766023A (fr) 1971-10-20
IL36656A (en) 1974-01-14
RO61059A (de) 1976-10-15
BR7102391D0 (pt) 1973-05-03
ES390345A1 (es) 1973-06-01
SE366345B (de) 1974-04-22
CA933881A (en) 1973-09-18
NL7105157A (de) 1971-10-25
DE2119066A1 (de) 1971-11-04

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Legal Events

Date Code Title Description
ST Notification of lapse