UA101607C2 - СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ - Google Patents

СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ

Info

Publication number
UA101607C2
UA101607C2 UAA200908469A UAA200908469A UA101607C2 UA 101607 C2 UA101607 C2 UA 101607C2 UA A200908469 A UAA200908469 A UA A200908469A UA A200908469 A UAA200908469 A UA A200908469A UA 101607 C2 UA101607 C2 UA 101607C2
Authority
UA
Ukraine
Prior art keywords
unit
substrate
metal
realization
coating
Prior art date
Application number
UAA200908469A
Other languages
English (en)
Ukrainian (uk)
Inventor
Даниэль Шале
Даниэль Жак
Флоран Спонэм
Original Assignee
Арселормиттал Франс
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38118569&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=UA101607(C2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Арселормиттал Франс filed Critical Арселормиттал Франс
Publication of UA101607C2 publication Critical patent/UA101607C2/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3457—Sputtering using other particles than noble gas ions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Объектом настоящего изобретения является способ нанесения покрытия минимум на одну сторону основания, которую перемещают путем вакуумного напыления слоя металла или металлического сплава, который может сублимироваться, согласно которому в указанный металл или металлический сплав размещают напротив указанной стороны основания в размере не менее двух слитков, которые находятся в контакте друг с другом, при этом во время нанесения покрытия поверхность указанных слитков, обращенную к указанной стороне основания, удерживают параллельно основанию и на постоянном от него расстоянии, объектом изобретения является также установка нанесения покрытия для осуществления указанного способа, а также устройство подачи (1) металла для этой установки.
UAA200908469A 2007-01-16 2008-01-16 СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ UA101607C2 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07290054A EP1947210A1 (fr) 2007-01-16 2007-01-16 Procede de revetement d'un substrat, installation de mise en oeuvre du procede et dispositif d'alimentation en metal d'une telle installation
PCT/FR2008/000046 WO2008107538A2 (fr) 2007-01-16 2008-01-16 Procédé de revêtement d'un substrat, installation de mise en oeuvre du procédé et dispositif d'alimentation en métal d'une telle installation

Publications (1)

Publication Number Publication Date
UA101607C2 true UA101607C2 (ru) 2013-04-25

Family

ID=38118569

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA200908469A UA101607C2 (ru) 2007-01-16 2008-01-16 СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ

Country Status (17)

Country Link
US (1) US9051642B2 (ru)
EP (2) EP1947210A1 (ru)
JP (1) JP5276013B2 (ru)
KR (1) KR101472605B1 (ru)
CN (1) CN101622371B (ru)
BR (1) BRPI0806610B8 (ru)
CA (1) CA2675271C (ru)
ES (1) ES2730837T3 (ru)
HU (1) HUE043907T2 (ru)
MA (1) MA31095B1 (ru)
MX (1) MX2009007512A (ru)
PL (1) PL2111477T3 (ru)
RU (1) RU2458180C2 (ru)
TR (1) TR201908607T4 (ru)
UA (1) UA101607C2 (ru)
WO (1) WO2008107538A2 (ru)
ZA (1) ZA200904774B (ru)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017017484A1 (en) * 2015-07-30 2017-02-02 Arcelormittal Method for the manufacture of a hardened part which does not have lme issues
CN106399945B (zh) * 2016-09-30 2020-09-18 中国科学院合肥物质科学研究院 一种生物多孔镁表面生长锌合金镀层的制备方法
CN111934645B (zh) * 2020-08-13 2023-03-24 厦门市三安集成电路有限公司 铝铜合金膜层的制备方法、声表面波滤波器以及双工器

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3020177A (en) * 1959-05-13 1962-02-06 Continental Can Co Art of vaporizing materials
US3329524A (en) * 1963-06-12 1967-07-04 Temescal Metallurgical Corp Centrifugal-type vapor source
JPS60221566A (ja) * 1984-04-18 1985-11-06 Agency Of Ind Science & Technol 薄膜形成装置
JPH0740148B2 (ja) 1984-12-20 1995-05-01 キヤノン株式会社 静電荷像現像用正荷電性非磁性トナー
JPS61147260U (ru) * 1985-02-28 1986-09-11
JPS61263008A (ja) 1985-05-16 1986-11-21 大阪特殊合金株式会社 透明導電膜の製造方法及びその装置
JPS62238358A (ja) * 1986-04-10 1987-10-19 Nippon Kokan Kk <Nkk> メツキ槽内へのインゴツト供給方法
JPS6350472A (ja) * 1986-08-19 1988-03-03 Hitachi Maxell Ltd 真空蒸着装置
JPS6473074A (en) * 1987-09-16 1989-03-17 Matsushita Electric Ind Co Ltd Sputtering device
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
US5135817A (en) * 1988-07-06 1992-08-04 Kabushiki Kaisha Kobe Seiko Sho Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them
JPH05179424A (ja) 1991-12-26 1993-07-20 Nisshin Steel Co Ltd 表裏異種めっき鋼板
JP3060710B2 (ja) 1992-03-11 2000-07-10 住友電装株式会社 電気接点用材料の製造方法および製造装置
US5962923A (en) * 1995-08-07 1999-10-05 Applied Materials, Inc. Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches
BE1009838A3 (fr) 1995-12-20 1997-10-07 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat.
EP0794266B1 (de) * 1996-03-06 2000-12-06 Alusuisse Technology &amp; Management AG Vorrichtung zum Beschichten einer Substratfläche
CN1074689C (zh) * 1996-04-04 2001-11-14 E·O·帕通电子焊接研究院电子束工艺国际中心 基体上制备有跨厚度化学组成和结构梯度并陶瓷外层方法
US5983976A (en) * 1998-03-31 1999-11-16 Takata Corporation Method and apparatus for manufacturing metallic parts by fine die casting
JP2001207255A (ja) 2000-01-27 2001-07-31 Akihisa Inoue マグネシウム合金及びその製造装置ならびにその製造方法
US7062348B1 (en) * 2000-07-13 2006-06-13 The Extreme Ultaviolet Lithography Llc Dynamic mask for producing uniform or graded-thickness thin films
CN1226447C (zh) 2003-08-26 2005-11-09 孙伟成 一种泡沫铝卷毯的生产装置及其制备方法
US6923868B2 (en) * 2003-09-23 2005-08-02 Gba S.A. Installation for electron-ray coatication of coatings
EP1518941A1 (en) 2003-09-24 2005-03-30 Sidmar N.V. A method and apparatus for the production of metal coated steel products
JP4475968B2 (ja) 2004-01-29 2010-06-09 三菱重工業株式会社 真空蒸着機
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
UA17473U (en) 2006-04-25 2006-09-15 Andrii Volodymyrovych Pantus Method for stereotopometric assessment of face proportionality

Also Published As

Publication number Publication date
RU2458180C2 (ru) 2012-08-10
EP2111477A2 (fr) 2009-10-28
JP5276013B2 (ja) 2013-08-28
ZA200904774B (en) 2010-04-28
EP1947210A1 (fr) 2008-07-23
EP2111477B1 (fr) 2019-03-13
HUE043907T2 (hu) 2019-09-30
CN101622371A (zh) 2010-01-06
MX2009007512A (es) 2009-08-13
RU2009131034A (ru) 2011-02-27
CN101622371B (zh) 2011-09-07
PL2111477T3 (pl) 2019-09-30
TR201908607T4 (tr) 2019-07-22
KR101472605B1 (ko) 2014-12-15
JP2010515830A (ja) 2010-05-13
BRPI0806610A2 (pt) 2011-09-20
US20100068412A1 (en) 2010-03-18
WO2008107538A3 (fr) 2008-10-30
WO2008107538A2 (fr) 2008-09-12
BRPI0806610B1 (pt) 2023-09-26
CA2675271C (fr) 2012-04-10
ES2730837T3 (es) 2019-11-12
CA2675271A1 (fr) 2008-09-12
BRPI0806610B8 (pt) 2024-01-09
KR20090101461A (ko) 2009-09-28
US9051642B2 (en) 2015-06-09
MA31095B1 (fr) 2010-01-04

Similar Documents

Publication Publication Date Title
UA122540C2 (uk) Пристрій та спосіб для вакуумного нанесення покриття
MX2009009914A (es) Metodo de revestimiento de un substrato e instalacion de deposicion al vacio de la aleacion metalica.
MY158939A (en) Method to form solder deposits on substrates
Gunes Wear behaviour of plasma paste boronized of AISI 8620 steel with borax and B2O3 paste mixtures
FR2889186B1 (fr) Procede anti-oxydation de pieces en un materiau composite contenant du carbone
SG134217A1 (en) Thermal barrier coating compositions, processes for applying same and articles coated with same
TW200739710A (en) Substrate processing method and substrate processing apparatus
TW200738052A (en) Film forming apparatus and method of manufacturing light-emitting element
TW200638566A (en) Apparatus for depositing a multilayer coating on discrete sheets
TW200729311A (en) Liquid processing method and liquid processing apparatus
WO2011119944A3 (en) Method of attaching a thin die using sacrificial material to inhibit die warpage and corresponding device
MX2014013370A (es) Componentes automotrices formados de lamina de metal recubierta con un revestimiento no metalico.
RU2016103250A (ru) СЛОИ TiB2 И ИХ ИЗГОТОВЛЕНИЕ
WO2010086151A8 (de) Zinkdiffusionsbeschichtungsverfahren
UA101607C2 (ru) СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ
WO2012091390A3 (en) Dry coating apparatus
SG162751A1 (en) Process for making a metal seed layer
WO2014169222A3 (en) Corrosion resistant metal and metal alloy coatings containing supersaturated concentrations of corrosion inhibiting elements and methods and systems for making the same
MY138591A (en) Vapor detecting method and vapor detecting device
GB2507896A (en) Electronic device
WO2018017379A3 (en) Apparatus and method of contact electroplating of isolated structures
MX2020012402A (es) Revestimiento de autodeposicion de ba?o simple para combinacion de sustratos de metal y metodos para el mismo.
MY161932A (en) Hot-dip zinc-aluminium alloy coated steel sheet having high corrosion resistance and formability and method for producing the same
UA91995C2 (ru) Способы нанесения покрытия металла на подкладку автокаталитическим осажденимем, ванна для осуществления способов и изделие с нанесенным покрытием
SG150417A1 (en) Shielding member of processing system