BRPI0806610B8 - Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato - Google Patents
Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substratoInfo
- Publication number
- BRPI0806610B8 BRPI0806610B8 BRPI0806610A BRPI0806610A BRPI0806610B8 BR PI0806610 B8 BRPI0806610 B8 BR PI0806610B8 BR PI0806610 A BRPI0806610 A BR PI0806610A BR PI0806610 A BRPI0806610 A BR PI0806610A BR PI0806610 B8 BRPI0806610 B8 BR PI0806610B8
- Authority
- BR
- Brazil
- Prior art keywords
- substrate
- coating
- face
- metal
- installing continuous
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title abstract 8
- 239000011248 coating agent Substances 0.000 title abstract 7
- 238000000576 coating method Methods 0.000 title abstract 7
- 238000000034 method Methods 0.000 title abstract 4
- 229910001092 metal group alloy Inorganic materials 0.000 abstract 4
- 239000002184 metal Substances 0.000 abstract 3
- 238000009434 installation Methods 0.000 abstract 2
- 238000006073 displacement reaction Methods 0.000 abstract 1
- 230000008020 evaporation Effects 0.000 abstract 1
- 238000001704 evaporation Methods 0.000 abstract 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/246—Replenishment of source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3457—Sputtering using other particles than noble gas ions
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32733—Means for moving the material to be treated
- H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
- H01J37/32761—Continuous moving
- H01J37/3277—Continuous moving of continuous material
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
- H01J37/3405—Magnetron sputtering
- H01J37/3408—Planar magnetron sputtering
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Abstract
processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato" a presente invenção refere-se a um processo de revestimento de pelo menos uma face de um substrato em deslocamento, por evaporação sob vácuo de uma camada de metal ou de liga metálica suscetível de ser sublimado(a), de acordo com o qual o metal ou liga metálica é disposto em frente à face do substrato sob a forma de pelo menos dois lingotes colocados em contato um com o outro, a superfície dos lingotes voltada na direção da dita face do substrato sendo mantida paralela ao substrato e a uma distância constante desse último, no decorrer do revestimento, assim como a uma instalação de revestimento de execução do processo e a um dispositivo de alimentação em metal (1) para uma tal instalação.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP07290054A EP1947210A1 (fr) | 2007-01-16 | 2007-01-16 | Procede de revetement d'un substrat, installation de mise en oeuvre du procede et dispositif d'alimentation en metal d'une telle installation |
EP07290054.1 | 2007-01-16 | ||
PCT/FR2008/000046 WO2008107538A2 (fr) | 2007-01-16 | 2008-01-16 | Procédé de revêtement d'un substrat, installation de mise en oeuvre du procédé et dispositif d'alimentation en métal d'une telle installation |
Publications (3)
Publication Number | Publication Date |
---|---|
BRPI0806610A2 BRPI0806610A2 (pt) | 2011-09-20 |
BRPI0806610B1 BRPI0806610B1 (pt) | 2023-09-26 |
BRPI0806610B8 true BRPI0806610B8 (pt) | 2024-01-09 |
Family
ID=38118569
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
BRPI0806610A BRPI0806610B8 (pt) | 2007-01-16 | 2008-01-16 | Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato |
Country Status (17)
Country | Link |
---|---|
US (1) | US9051642B2 (pt) |
EP (2) | EP1947210A1 (pt) |
JP (1) | JP5276013B2 (pt) |
KR (1) | KR101472605B1 (pt) |
CN (1) | CN101622371B (pt) |
BR (1) | BRPI0806610B8 (pt) |
CA (1) | CA2675271C (pt) |
ES (1) | ES2730837T3 (pt) |
HU (1) | HUE043907T2 (pt) |
MA (1) | MA31095B1 (pt) |
MX (1) | MX2009007512A (pt) |
PL (1) | PL2111477T3 (pt) |
RU (1) | RU2458180C2 (pt) |
TR (1) | TR201908607T4 (pt) |
UA (1) | UA101607C2 (pt) |
WO (1) | WO2008107538A2 (pt) |
ZA (1) | ZA200904774B (pt) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2017017484A1 (en) * | 2015-07-30 | 2017-02-02 | Arcelormittal | Method for the manufacture of a hardened part which does not have lme issues |
CN106399945B (zh) * | 2016-09-30 | 2020-09-18 | 中国科学院合肥物质科学研究院 | 一种生物多孔镁表面生长锌合金镀层的制备方法 |
CN111934645B (zh) * | 2020-08-13 | 2023-03-24 | 厦门市三安集成电路有限公司 | 铝铜合金膜层的制备方法、声表面波滤波器以及双工器 |
Family Cites Families (26)
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US3020177A (en) * | 1959-05-13 | 1962-02-06 | Continental Can Co | Art of vaporizing materials |
US3329524A (en) * | 1963-06-12 | 1967-07-04 | Temescal Metallurgical Corp | Centrifugal-type vapor source |
JPS60221566A (ja) * | 1984-04-18 | 1985-11-06 | Agency Of Ind Science & Technol | 薄膜形成装置 |
JPH0740148B2 (ja) | 1984-12-20 | 1995-05-01 | キヤノン株式会社 | 静電荷像現像用正荷電性非磁性トナー |
JPS61147260U (pt) * | 1985-02-28 | 1986-09-11 | ||
JPS61263008A (ja) | 1985-05-16 | 1986-11-21 | 大阪特殊合金株式会社 | 透明導電膜の製造方法及びその装置 |
JPS62238358A (ja) * | 1986-04-10 | 1987-10-19 | Nippon Kokan Kk <Nkk> | メツキ槽内へのインゴツト供給方法 |
JPS6350472A (ja) * | 1986-08-19 | 1988-03-03 | Hitachi Maxell Ltd | 真空蒸着装置 |
JPS6473074A (en) * | 1987-09-16 | 1989-03-17 | Matsushita Electric Ind Co Ltd | Sputtering device |
US5230923A (en) * | 1987-12-17 | 1993-07-27 | Toyo Ink Manufacturing Co., Ltd. | Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film |
US5135817A (en) * | 1988-07-06 | 1992-08-04 | Kabushiki Kaisha Kobe Seiko Sho | Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them |
JPH05179424A (ja) | 1991-12-26 | 1993-07-20 | Nisshin Steel Co Ltd | 表裏異種めっき鋼板 |
JP3060710B2 (ja) | 1992-03-11 | 2000-07-10 | 住友電装株式会社 | 電気接点用材料の製造方法および製造装置 |
US5962923A (en) * | 1995-08-07 | 1999-10-05 | Applied Materials, Inc. | Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches |
BE1009838A3 (fr) | 1995-12-20 | 1997-10-07 | Cockerill Rech & Dev | Procede et dispositif pour la formation d'un revetement sur un substrat. |
EP0794266B1 (de) * | 1996-03-06 | 2000-12-06 | Alusuisse Technology & Management AG | Vorrichtung zum Beschichten einer Substratfläche |
CN1074689C (zh) * | 1996-04-04 | 2001-11-14 | E·O·帕通电子焊接研究院电子束工艺国际中心 | 基体上制备有跨厚度化学组成和结构梯度并陶瓷外层方法 |
US5983976A (en) * | 1998-03-31 | 1999-11-16 | Takata Corporation | Method and apparatus for manufacturing metallic parts by fine die casting |
JP2001207255A (ja) | 2000-01-27 | 2001-07-31 | Akihisa Inoue | マグネシウム合金及びその製造装置ならびにその製造方法 |
US7062348B1 (en) * | 2000-07-13 | 2006-06-13 | The Extreme Ultaviolet Lithography Llc | Dynamic mask for producing uniform or graded-thickness thin films |
CN1226447C (zh) * | 2003-08-26 | 2005-11-09 | 孙伟成 | 一种泡沫铝卷毯的生产装置及其制备方法 |
US6923868B2 (en) * | 2003-09-23 | 2005-08-02 | Gba S.A. | Installation for electron-ray coatication of coatings |
EP1518941A1 (en) | 2003-09-24 | 2005-03-30 | Sidmar N.V. | A method and apparatus for the production of metal coated steel products |
JP4475968B2 (ja) * | 2004-01-29 | 2010-06-09 | 三菱重工業株式会社 | 真空蒸着機 |
US20050244580A1 (en) * | 2004-04-30 | 2005-11-03 | Eastman Kodak Company | Deposition apparatus for temperature sensitive materials |
UA17473U (en) | 2006-04-25 | 2006-09-15 | Andrii Volodymyrovych Pantus | Method for stereotopometric assessment of face proportionality |
-
2007
- 2007-01-16 EP EP07290054A patent/EP1947210A1/fr not_active Withdrawn
-
2008
- 2008-01-16 UA UAA200908469A patent/UA101607C2/ru unknown
- 2008-01-16 PL PL08761766T patent/PL2111477T3/pl unknown
- 2008-01-16 US US12/523,211 patent/US9051642B2/en active Active
- 2008-01-16 MX MX2009007512A patent/MX2009007512A/es active IP Right Grant
- 2008-01-16 HU HUE08761766A patent/HUE043907T2/hu unknown
- 2008-01-16 JP JP2009545971A patent/JP5276013B2/ja active Active
- 2008-01-16 KR KR1020097014753A patent/KR101472605B1/ko active IP Right Grant
- 2008-01-16 CA CA2675271A patent/CA2675271C/fr active Active
- 2008-01-16 RU RU2009131034/02A patent/RU2458180C2/ru active
- 2008-01-16 ES ES08761766T patent/ES2730837T3/es active Active
- 2008-01-16 CN CN200880005583XA patent/CN101622371B/zh active Active
- 2008-01-16 WO PCT/FR2008/000046 patent/WO2008107538A2/fr active Application Filing
- 2008-01-16 TR TR2019/08607T patent/TR201908607T4/tr unknown
- 2008-01-16 BR BRPI0806610A patent/BRPI0806610B8/pt active IP Right Grant
- 2008-01-16 EP EP08761766.8A patent/EP2111477B1/fr active Active
-
2009
- 2009-07-08 ZA ZA200904774A patent/ZA200904774B/xx unknown
- 2009-07-15 MA MA32092A patent/MA31095B1/fr unknown
Also Published As
Publication number | Publication date |
---|---|
CA2675271A1 (fr) | 2008-09-12 |
UA101607C2 (ru) | 2013-04-25 |
HUE043907T2 (hu) | 2019-09-30 |
EP1947210A1 (fr) | 2008-07-23 |
US9051642B2 (en) | 2015-06-09 |
BRPI0806610A2 (pt) | 2011-09-20 |
EP2111477A2 (fr) | 2009-10-28 |
KR20090101461A (ko) | 2009-09-28 |
CA2675271C (fr) | 2012-04-10 |
US20100068412A1 (en) | 2010-03-18 |
CN101622371A (zh) | 2010-01-06 |
ZA200904774B (en) | 2010-04-28 |
BRPI0806610B1 (pt) | 2023-09-26 |
MA31095B1 (fr) | 2010-01-04 |
WO2008107538A2 (fr) | 2008-09-12 |
MX2009007512A (es) | 2009-08-13 |
CN101622371B (zh) | 2011-09-07 |
PL2111477T3 (pl) | 2019-09-30 |
RU2009131034A (ru) | 2011-02-27 |
ES2730837T3 (es) | 2019-11-12 |
JP2010515830A (ja) | 2010-05-13 |
JP5276013B2 (ja) | 2013-08-28 |
WO2008107538A3 (fr) | 2008-10-30 |
KR101472605B1 (ko) | 2014-12-15 |
EP2111477B1 (fr) | 2019-03-13 |
TR201908607T4 (tr) | 2019-07-22 |
RU2458180C2 (ru) | 2012-08-10 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
B07A | Application suspended after technical examination (opinion) [chapter 7.1 patent gazette] | ||
B09B | Patent application refused [chapter 9.2 patent gazette] | ||
B12B | Appeal against refusal [chapter 12.2 patent gazette] | ||
B16A | Patent or certificate of addition of invention granted [chapter 16.1 patent gazette] |
Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 16/01/2008, OBSERVADAS AS CONDICOES LEGAIS. PATENTE CONCEDIDA CONFORME ADI 5.529/DF, QUE DETERMINA A ALTERACAO DO PRAZO DE CONCESSAO. |
|
B16C | Correction of notification of the grant [chapter 16.3 patent gazette] |
Free format text: REFERENTE A RPI 2751 DE 26/09/2023 QUANTO AO ITEM (54) TITULO. |