TWI882169B - 感放射線性樹脂組成物及圖案形成方法 - Google Patents

感放射線性樹脂組成物及圖案形成方法 Download PDF

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TWI882169B
TWI882169B TW110132690A TW110132690A TWI882169B TW I882169 B TWI882169 B TW I882169B TW 110132690 A TW110132690 A TW 110132690A TW 110132690 A TW110132690 A TW 110132690A TW I882169 B TWI882169 B TW I882169B
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radiation
acid
sensitive
carbon atoms
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TW110132690A
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TW202217449A (zh
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丸山研
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日商Ｊｓｒ股份有限公司
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  • Spectroscopy & Molecular Physics (AREA)
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  • Emergency Medicine (AREA)
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TW110132690A 2020-09-28 2021-09-02 感放射線性樹脂組成物及圖案形成方法 TWI882169B (zh)

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JP2023062898A (ja) * 2021-10-22 2023-05-09 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物及び酸拡散制御剤
CN118451368A (zh) * 2021-12-10 2024-08-06 富士胶片株式会社 感光化射线性或感放射线性树脂组合物、抗蚀剂膜、图案形成方法及电子器件的制造方法
JP2023168942A (ja) * 2022-05-16 2023-11-29 東京応化工業株式会社 レジスト組成物、レジストパターン形成方法、化合物及び酸拡散制御剤
US20230384677A1 (en) * 2022-05-24 2023-11-30 Shin-Etsu Chemical Co., Ltd. Onium salt compound, polymer, resist composition, and patterning process
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