TWI881169B - 研磨裝置、及研磨墊之交換時期之決定方法 - Google Patents

研磨裝置、及研磨墊之交換時期之決定方法 Download PDF

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Publication number
TWI881169B
TWI881169B TW110135246A TW110135246A TWI881169B TW I881169 B TWI881169 B TW I881169B TW 110135246 A TW110135246 A TW 110135246A TW 110135246 A TW110135246 A TW 110135246A TW I881169 B TWI881169 B TW I881169B
Authority
TW
Taiwan
Prior art keywords
grinding
polishing
index value
dresser
pad
Prior art date
Application number
TW110135246A
Other languages
English (en)
Chinese (zh)
Other versions
TW202215521A (zh
Inventor
鈴木佑多
高橋太郎
大滝裕史
鳥越恒男
西田弘明
Original Assignee
日商荏原製作所股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商荏原製作所股份有限公司 filed Critical 日商荏原製作所股份有限公司
Publication of TW202215521A publication Critical patent/TW202215521A/zh
Application granted granted Critical
Publication of TWI881169B publication Critical patent/TWI881169B/zh

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Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/005Control means for lapping machines or devices
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/003Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving acoustic means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/10Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation involving electrical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/16Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the load
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B49/00Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation
    • B24B49/18Measuring or gauging equipment for controlling the feed movement of the grinding tool or work; Arrangements of indicating or measuring equipment, e.g. for indicating the start of the grinding operation taking regard of the presence of dressing tools
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B53/00Devices or means for dressing or conditioning abrasive surfaces
    • B24B53/017Devices or means for dressing, cleaning or otherwise conditioning lapping tools
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P52/00Grinding, lapping or polishing of wafers, substrates or parts of devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0428Apparatus for mechanical treatment or grinding or cutting

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
  • Constituent Portions Of Griding Lathes, Driving, Sensing And Control (AREA)
  • Grinding-Machine Dressing And Accessory Apparatuses (AREA)
  • Mechanical Treatment Of Semiconductor (AREA)
TW110135246A 2020-09-29 2021-09-23 研磨裝置、及研磨墊之交換時期之決定方法 TWI881169B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2020-163274 2020-09-29
JP2020163274A JP7421460B2 (ja) 2020-09-29 2020-09-29 研磨装置、および研磨パッドの交換時期を決定する方法

Publications (2)

Publication Number Publication Date
TW202215521A TW202215521A (zh) 2022-04-16
TWI881169B true TWI881169B (zh) 2025-04-21

Family

ID=80951343

Family Applications (1)

Application Number Title Priority Date Filing Date
TW110135246A TWI881169B (zh) 2020-09-29 2021-09-23 研磨裝置、及研磨墊之交換時期之決定方法

Country Status (6)

Country Link
US (1) US20230356350A1 (https=)
JP (1) JP7421460B2 (https=)
KR (1) KR102772031B1 (https=)
CN (1) CN116209543A (https=)
TW (1) TWI881169B (https=)
WO (1) WO2022070607A1 (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR102909307B1 (ko) * 2020-10-26 2026-01-08 주식회사 케이씨텍 연마 패드 모니터링 장치 및 이를 포함하는 기판 연마 시스템
CN115541703B (zh) * 2022-09-27 2025-07-18 厦门理工学院 一种风电叶片连接处细小缺陷的检测方法和装置以及设备
KR102748383B1 (ko) * 2022-10-26 2024-12-31 주식회사 슈텍 화학기계적 연마장비용 검사 모니터링 장치, 이를 포함하는 화학기계적 연마장비 및 이의 제어방법
JP2024067256A (ja) * 2022-11-04 2024-05-17 株式会社荏原製作所 研磨装置、情報処理装置及びプログラム
CN117718876B (zh) 2024-02-07 2024-06-18 华海清科股份有限公司 用于化学机械抛光的监测方法和化学机械抛光设备
CN119141329A (zh) * 2024-09-30 2024-12-17 东风汽车集团股份有限公司 一种汽车车身自动化精饰方法及系统

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005022028A (ja) * 2003-07-02 2005-01-27 Tokyo Seimitsu Co Ltd 研磨パッドのドレッシング装置及び該装置を有する加工装置
JP2010226007A (ja) * 2009-03-25 2010-10-07 Renesas Electronics Corp 研磨工程制御方法および半導体ウエハ研磨システム
TW201813770A (zh) * 2016-09-30 2018-04-16 日商荏原製作所股份有限公司 研磨裝置及研磨方法
TW201900334A (zh) * 2017-05-17 2019-01-01 日商荏原製作所股份有限公司 研磨裝置及研磨方法
JP2020028955A (ja) * 2018-08-23 2020-02-27 株式会社荏原製作所 研磨パッド高さを決定する方法、および研磨システム

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6191038B1 (en) * 1997-09-02 2001-02-20 Matsushita Electronics Corporation Apparatus and method for chemical/mechanical polishing
JP2001079752A (ja) * 1999-09-08 2001-03-27 Hitachi Ltd 化学的機械研磨装置およびこれを用いた半導体集積回路装置の製造方法
KR100877386B1 (ko) * 2001-11-13 2009-01-07 도요 고무 고교 가부시키가이샤 연마 패드 및 그 제조 방법
JP4817687B2 (ja) * 2005-03-18 2011-11-16 株式会社荏原製作所 研磨装置
JP5219600B2 (ja) * 2008-04-18 2013-06-26 株式会社東京精密 砥石成形状態判定装置及び砥石成形状態判定方法
JP5511600B2 (ja) 2010-09-09 2014-06-04 株式会社荏原製作所 研磨装置
CN102248486B (zh) * 2011-07-25 2013-01-30 清华大学 抛光垫修整方法
JP5927083B2 (ja) * 2012-08-28 2016-05-25 株式会社荏原製作所 ドレッシングプロセスの監視方法および研磨装置
JP6030041B2 (ja) * 2013-11-01 2016-11-24 株式会社荏原製作所 研磨装置および研磨方法
CN204954631U (zh) * 2015-09-21 2016-01-13 青岛理工大学 一种声发射和测力仪集成的砂轮堵塞检测清洗装置
JP6704244B2 (ja) * 2015-12-03 2020-06-03 株式会社ディスコ 研磨装置
JP6715153B2 (ja) * 2016-09-30 2020-07-01 株式会社荏原製作所 基板研磨装置
CN106826565B (zh) * 2017-03-16 2018-11-02 中国人民解放军装甲兵工程学院 一种利用磨削力监控砂轮磨损与磨削烧伤的方法
KR20200043216A (ko) * 2018-10-17 2020-04-27 주식회사 케이씨텍 화학 기계적 연마 장치의 컨디셔너
JP7420530B2 (ja) * 2018-10-31 2024-01-23 株式会社ノリタケカンパニーリミテド ドレッシング面評価装置、ドレッシング装置、および、研削加工装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005022028A (ja) * 2003-07-02 2005-01-27 Tokyo Seimitsu Co Ltd 研磨パッドのドレッシング装置及び該装置を有する加工装置
JP2010226007A (ja) * 2009-03-25 2010-10-07 Renesas Electronics Corp 研磨工程制御方法および半導体ウエハ研磨システム
TW201813770A (zh) * 2016-09-30 2018-04-16 日商荏原製作所股份有限公司 研磨裝置及研磨方法
TW201900334A (zh) * 2017-05-17 2019-01-01 日商荏原製作所股份有限公司 研磨裝置及研磨方法
JP2020028955A (ja) * 2018-08-23 2020-02-27 株式会社荏原製作所 研磨パッド高さを決定する方法、および研磨システム

Also Published As

Publication number Publication date
US20230356350A1 (en) 2023-11-09
JP7421460B2 (ja) 2024-01-24
CN116209543A (zh) 2023-06-02
TW202215521A (zh) 2022-04-16
WO2022070607A1 (ja) 2022-04-07
JP2022055703A (ja) 2022-04-08
KR20230078720A (ko) 2023-06-02
KR102772031B1 (ko) 2025-02-26

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