TWI872140B - 光學測定裝置、波長校正方法及標準試料 - Google Patents
光學測定裝置、波長校正方法及標準試料 Download PDFInfo
- Publication number
- TWI872140B TWI872140B TW109136443A TW109136443A TWI872140B TW I872140 B TWI872140 B TW I872140B TW 109136443 A TW109136443 A TW 109136443A TW 109136443 A TW109136443 A TW 109136443A TW I872140 B TWI872140 B TW I872140B
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- Prior art keywords
- interference spectrum
- wavelength
- light
- theoretical
- measured
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
- G01J3/32—Investigating bands of a spectrum in sequence by a single detector
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/02—Details
- G01J3/0297—Constructional arrangements for removing other types of optical noise or for performing calibration
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/12—Generating the spectrum; Monochromators
- G01J3/18—Generating the spectrum; Monochromators using diffraction elements, e.g. grating
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/45—Interferometric spectrometry
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J2003/283—Investigating the spectrum computer-interfaced
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J2003/2859—Peak detecting in spectrum
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J2003/2866—Markers; Calibrating of scan
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
- G01J3/00—Spectrometry; Spectrophotometry; Monochromators; Measuring colours
- G01J3/28—Investigating the spectrum
- G01J3/30—Measuring the intensity of spectral lines directly on the spectrum itself
- G01J3/32—Investigating bands of a spectrum in sequence by a single detector
- G01J2003/323—Comparing line:background
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
- Spectrometry And Color Measurement (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2019194654A JP7382629B2 (ja) | 2019-10-25 | 2019-10-25 | 光学測定装置および波長校正方法 |
| JP2019-194654 | 2019-10-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202138747A TW202138747A (zh) | 2021-10-16 |
| TWI872140B true TWI872140B (zh) | 2025-02-11 |
Family
ID=75543071
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW109136443A TWI872140B (zh) | 2019-10-25 | 2020-10-21 | 光學測定裝置、波長校正方法及標準試料 |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP7382629B2 (enExample) |
| KR (1) | KR102859530B1 (enExample) |
| CN (1) | CN112710393B (enExample) |
| TW (1) | TWI872140B (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN115372270A (zh) * | 2021-05-20 | 2022-11-22 | 智谱科技有限公司 | 光谱整合校正方法及多光谱光谱仪 |
| CN113514425B (zh) * | 2021-09-14 | 2021-12-14 | 苏州高视半导体技术有限公司 | 一种平面等厚介质折射率的校准装置及校准方法 |
| CN117990211B (zh) * | 2022-11-02 | 2025-11-28 | 华为技术有限公司 | 光谱仪和电子设备 |
| CN117249773B (zh) * | 2023-11-08 | 2024-02-06 | 南通元激发科技有限公司 | 一种近退相干厚膜的膜层厚度及其折射率的测量方法 |
| CN120558391A (zh) * | 2025-07-31 | 2025-08-29 | 杭州高谱成像技术有限公司 | 一种基于薄膜干涉多峰特征的光谱定标方法及系统 |
Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10122824A (ja) * | 1996-10-24 | 1998-05-15 | Dainippon Screen Mfg Co Ltd | 膜厚測定方法 |
| JP2011117777A (ja) * | 2009-12-01 | 2011-06-16 | Canon Inc | 校正手段、校正方法、及びプログラム |
| JP2019020419A (ja) * | 2017-07-20 | 2019-02-07 | Jfeテクノリサーチ株式会社 | 膜厚計算方法、膜厚計算プログラム及び膜厚計算装置 |
| TW201923305A (zh) * | 2017-10-25 | 2019-06-16 | 德商聯合半導體股份有限公司 | 藉由干涉距離測量手段來偵測物體表面輪廓之組件 |
| CN110062952A (zh) * | 2016-06-11 | 2019-07-26 | 科磊股份有限公司 | 同时多重角度光谱 |
| US20190302083A1 (en) * | 2018-03-27 | 2019-10-03 | Gybe, LLC | Hyperspectral sensing system |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE69608252T2 (de) * | 1995-02-09 | 2000-11-02 | Foss Electric A S Hillerod | Verfahren zum eichen mehrerer spektrometer |
| JP2001356050A (ja) | 2000-06-14 | 2001-12-26 | Toray Ind Inc | 分光方法及びフィルムの製造方法 |
| EP1998155A1 (de) | 2007-05-30 | 2008-12-03 | Roche Diagnostics GmbH | Verfahren zur Wellenlängenkalibration eines Spektrometers |
| JP5328437B2 (ja) * | 2009-03-25 | 2013-10-30 | キヤノン株式会社 | 透過波面測定方法、屈折率分布測定方法、光学素子の製造方法、及び透過波面測定装置 |
| JP5947502B2 (ja) | 2011-08-11 | 2016-07-06 | キヤノン株式会社 | 分光測色器、および画像形成装置 |
| JP5721586B2 (ja) * | 2011-08-12 | 2015-05-20 | 大塚電子株式会社 | 光学特性測定装置および光学特性測定方法 |
| JP5484537B2 (ja) * | 2012-09-03 | 2014-05-07 | 大塚電子株式会社 | 分光特性測定装置および分光特性測定方法 |
| JP2014228281A (ja) | 2013-05-17 | 2014-12-08 | コニカミノルタ株式会社 | フーリエ変換型分光計およびフーリエ変換型分光計の校正方法 |
| JP6285597B1 (ja) * | 2017-06-05 | 2018-02-28 | 大塚電子株式会社 | 光学測定装置および光学測定方法 |
| JP6402273B1 (ja) * | 2018-05-18 | 2018-10-10 | 大塚電子株式会社 | 光学測定装置及び光学測定方法 |
-
2019
- 2019-10-25 JP JP2019194654A patent/JP7382629B2/ja active Active
-
2020
- 2020-10-19 KR KR1020200135083A patent/KR102859530B1/ko active Active
- 2020-10-21 TW TW109136443A patent/TWI872140B/zh active
- 2020-10-23 CN CN202011149855.2A patent/CN112710393B/zh active Active
Patent Citations (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10122824A (ja) * | 1996-10-24 | 1998-05-15 | Dainippon Screen Mfg Co Ltd | 膜厚測定方法 |
| JP2011117777A (ja) * | 2009-12-01 | 2011-06-16 | Canon Inc | 校正手段、校正方法、及びプログラム |
| CN110062952A (zh) * | 2016-06-11 | 2019-07-26 | 科磊股份有限公司 | 同时多重角度光谱 |
| JP2019020419A (ja) * | 2017-07-20 | 2019-02-07 | Jfeテクノリサーチ株式会社 | 膜厚計算方法、膜厚計算プログラム及び膜厚計算装置 |
| TW201923305A (zh) * | 2017-10-25 | 2019-06-16 | 德商聯合半導體股份有限公司 | 藉由干涉距離測量手段來偵測物體表面輪廓之組件 |
| US20190302083A1 (en) * | 2018-03-27 | 2019-10-03 | Gybe, LLC | Hyperspectral sensing system |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20210049679A (ko) | 2021-05-06 |
| CN112710393A (zh) | 2021-04-27 |
| JP2021067611A (ja) | 2021-04-30 |
| TW202138747A (zh) | 2021-10-16 |
| JP7382629B2 (ja) | 2023-11-17 |
| KR102859530B1 (ko) | 2025-09-12 |
| CN112710393B (zh) | 2025-07-01 |
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