TWI800509B - 器件晶片的製造方法 - Google Patents
器件晶片的製造方法 Download PDFInfo
- Publication number
- TWI800509B TWI800509B TW107114468A TW107114468A TWI800509B TW I800509 B TWI800509 B TW I800509B TW 107114468 A TW107114468 A TW 107114468A TW 107114468 A TW107114468 A TW 107114468A TW I800509 B TWI800509 B TW I800509B
- Authority
- TW
- Taiwan
- Prior art keywords
- device wafer
- wafer manufacturing
- manufacturing
- wafer
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Dicing (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017112711A JP2018207010A (ja) | 2017-06-07 | 2017-06-07 | デバイスチップの製造方法 |
JP2017-112711 | 2017-06-07 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW201903877A TW201903877A (zh) | 2019-01-16 |
TWI800509B true TWI800509B (zh) | 2023-05-01 |
Family
ID=64573303
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW107114468A TWI800509B (zh) | 2017-06-07 | 2018-04-27 | 器件晶片的製造方法 |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP2018207010A (zh) |
KR (1) | KR20180133808A (zh) |
CN (1) | CN109003942A (zh) |
TW (1) | TWI800509B (zh) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7319134B2 (ja) * | 2019-08-01 | 2023-08-01 | リンテック株式会社 | 半導体素子の製造方法 |
JP7500128B2 (ja) | 2020-05-29 | 2024-06-17 | 株式会社ディスコ | ウェーハの加工方法 |
KR102580321B1 (ko) * | 2021-04-14 | 2023-09-19 | 주식회사 루츠 | 형광체 제조방법 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1581443A (zh) * | 2003-08-12 | 2005-02-16 | 株式会社迪斯科 | 晶片加工方法 |
JP2015023135A (ja) * | 2013-07-18 | 2015-02-02 | 株式会社ディスコ | ウエーハの加工方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2003158097A (ja) * | 2001-11-22 | 2003-05-30 | Murata Mfg Co Ltd | 半導体装置及びその製造方法 |
JP2006344816A (ja) * | 2005-06-09 | 2006-12-21 | Matsushita Electric Ind Co Ltd | 半導体チップの製造方法 |
JP2012089721A (ja) * | 2010-10-21 | 2012-05-10 | Toshiba Corp | 半導体装置の製造方法、半導体装置 |
-
2017
- 2017-06-07 JP JP2017112711A patent/JP2018207010A/ja active Pending
-
2018
- 2018-04-27 TW TW107114468A patent/TWI800509B/zh active
- 2018-06-04 CN CN201810562014.0A patent/CN109003942A/zh active Pending
- 2018-06-05 KR KR1020180064865A patent/KR20180133808A/ko not_active Application Discontinuation
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN1581443A (zh) * | 2003-08-12 | 2005-02-16 | 株式会社迪斯科 | 晶片加工方法 |
JP2015023135A (ja) * | 2013-07-18 | 2015-02-02 | 株式会社ディスコ | ウエーハの加工方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20180133808A (ko) | 2018-12-17 |
TW201903877A (zh) | 2019-01-16 |
JP2018207010A (ja) | 2018-12-27 |
CN109003942A (zh) | 2018-12-14 |
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