TWI796400B - 厚膜導體形成用粉末組成物及厚膜導體形成用糊料 - Google Patents
厚膜導體形成用粉末組成物及厚膜導體形成用糊料 Download PDFInfo
- Publication number
- TWI796400B TWI796400B TW107144766A TW107144766A TWI796400B TW I796400 B TWI796400 B TW I796400B TW 107144766 A TW107144766 A TW 107144766A TW 107144766 A TW107144766 A TW 107144766A TW I796400 B TWI796400 B TW I796400B
- Authority
- TW
- Taiwan
- Prior art keywords
- powder
- mass
- thick
- parts
- film conductor
- Prior art date
Links
- 239000000843 powder Substances 0.000 title claims abstract description 214
- 239000004020 conductor Substances 0.000 title claims abstract description 146
- 239000000203 mixture Substances 0.000 title claims abstract description 56
- AMWRITDGCCNYAT-UHFFFAOYSA-L hydroxy(oxo)manganese;manganese Chemical compound [Mn].O[Mn]=O.O[Mn]=O AMWRITDGCCNYAT-UHFFFAOYSA-L 0.000 claims abstract description 114
- 239000011521 glass Substances 0.000 claims abstract description 109
- 239000002245 particle Substances 0.000 claims description 68
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 16
- 239000002904 solvent Substances 0.000 claims description 14
- 239000011572 manganese Substances 0.000 claims description 13
- 239000011347 resin Substances 0.000 claims description 13
- 229920005989 resin Polymers 0.000 claims description 13
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 7
- QPLDLSVMHZLSFG-UHFFFAOYSA-N CuO Inorganic materials [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 claims description 5
- 230000015572 biosynthetic process Effects 0.000 claims description 5
- 229910052797 bismuth Inorganic materials 0.000 claims description 5
- JCXGWMGPZLAOME-UHFFFAOYSA-N bismuth atom Chemical compound [Bi] JCXGWMGPZLAOME-UHFFFAOYSA-N 0.000 claims description 5
- 230000009477 glass transition Effects 0.000 claims description 5
- XLOMVQKBTHCTTD-UHFFFAOYSA-N zinc oxide Inorganic materials [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 claims description 5
- 229910015902 Bi 2 O 3 Inorganic materials 0.000 claims description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- NUJOXMJBOLGQSY-UHFFFAOYSA-N manganese dioxide Chemical compound O=[Mn]=O NUJOXMJBOLGQSY-UHFFFAOYSA-N 0.000 claims description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims description 4
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 3
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 claims description 3
- 229910052681 coesite Inorganic materials 0.000 claims description 2
- 229910052906 cristobalite Inorganic materials 0.000 claims description 2
- 239000000377 silicon dioxide Substances 0.000 claims description 2
- 235000012239 silicon dioxide Nutrition 0.000 claims description 2
- 229910052682 stishovite Inorganic materials 0.000 claims description 2
- 229910052905 tridymite Inorganic materials 0.000 claims description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 claims 2
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims 2
- WMWLMWRWZQELOS-UHFFFAOYSA-N bismuth(iii) oxide Chemical compound O=[Bi]O[Bi]=O WMWLMWRWZQELOS-UHFFFAOYSA-N 0.000 claims 2
- 238000007747 plating Methods 0.000 description 37
- 239000000758 substrate Substances 0.000 description 37
- 238000010304 firing Methods 0.000 description 25
- 230000000694 effects Effects 0.000 description 18
- 239000000919 ceramic Substances 0.000 description 17
- 238000007667 floating Methods 0.000 description 16
- 238000001035 drying Methods 0.000 description 15
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 14
- 230000000052 comparative effect Effects 0.000 description 14
- PXHVJJICTQNCMI-UHFFFAOYSA-N nickel Substances [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 13
- 238000000034 method Methods 0.000 description 12
- 238000011156 evaluation Methods 0.000 description 9
- 238000004519 manufacturing process Methods 0.000 description 9
- PWHULOQIROXLJO-UHFFFAOYSA-N Manganese Chemical compound [Mn] PWHULOQIROXLJO-UHFFFAOYSA-N 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 8
- 230000001070 adhesive effect Effects 0.000 description 8
- 238000000576 coating method Methods 0.000 description 8
- 238000004898 kneading Methods 0.000 description 8
- 229910052748 manganese Inorganic materials 0.000 description 8
- 230000006866 deterioration Effects 0.000 description 7
- 238000002844 melting Methods 0.000 description 7
- 230000008018 melting Effects 0.000 description 7
- 229910000679 solder Inorganic materials 0.000 description 7
- 239000011248 coating agent Substances 0.000 description 6
- 238000005259 measurement Methods 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 6
- 229910052709 silver Inorganic materials 0.000 description 6
- 238000004873 anchoring Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 5
- 238000010438 heat treatment Methods 0.000 description 5
- 229910052763 palladium Inorganic materials 0.000 description 5
- 239000001856 Ethyl cellulose Substances 0.000 description 4
- ZZSNKZQZMQGXPY-UHFFFAOYSA-N Ethyl cellulose Chemical compound CCOCC1OC(OC)C(OCC)C(OCC)C1OC1C(O)C(O)C(OC)C(CO)O1 ZZSNKZQZMQGXPY-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 229920001249 ethyl cellulose Polymers 0.000 description 4
- 235000019325 ethyl cellulose Nutrition 0.000 description 4
- 238000007650 screen-printing Methods 0.000 description 4
- 239000004332 silver Substances 0.000 description 4
- 238000012360 testing method Methods 0.000 description 4
- 229910052946 acanthite Inorganic materials 0.000 description 3
- WUOACPNHFRMFPN-UHFFFAOYSA-N alpha-terpineol Chemical compound CC1=CCC(C(C)(C)O)CC1 WUOACPNHFRMFPN-UHFFFAOYSA-N 0.000 description 3
- SQIFACVGCPWBQZ-UHFFFAOYSA-N delta-terpineol Natural products CC(C)(O)C1CCC(=C)CC1 SQIFACVGCPWBQZ-UHFFFAOYSA-N 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 239000007970 homogeneous dispersion Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- XUARKZBEFFVFRG-UHFFFAOYSA-N silver sulfide Chemical compound [S-2].[Ag+].[Ag+] XUARKZBEFFVFRG-UHFFFAOYSA-N 0.000 description 3
- 229940056910 silver sulfide Drugs 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 229940116411 terpineol Drugs 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 239000012298 atmosphere Substances 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- KVGMATYUUPJFQL-UHFFFAOYSA-N manganese(2+) oxygen(2-) Chemical compound [O--].[O--].[O--].[O--].[Mn++].[Mn++].[Mn++] KVGMATYUUPJFQL-UHFFFAOYSA-N 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 229910052697 platinum Inorganic materials 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 238000004062 sedimentation Methods 0.000 description 2
- 239000010944 silver (metal) Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 230000003746 surface roughness Effects 0.000 description 2
- 238000009864 tensile test Methods 0.000 description 2
- OAYXUHPQHDHDDZ-UHFFFAOYSA-N 2-(2-butoxyethoxy)ethanol Chemical compound CCCCOCCOCCO OAYXUHPQHDHDDZ-UHFFFAOYSA-N 0.000 description 1
- 229910016276 Bi2O3—SiO2—B2O3 Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 1
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 1
- 229910020816 Sn Pb Inorganic materials 0.000 description 1
- 229910001128 Sn alloy Inorganic materials 0.000 description 1
- 229910020922 Sn-Pb Inorganic materials 0.000 description 1
- 229910008783 Sn—Pb Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 229910000272 alkali metal oxide Inorganic materials 0.000 description 1
- 229910000287 alkaline earth metal oxide Inorganic materials 0.000 description 1
- 150000004645 aluminates Chemical class 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000001186 cumulative effect Effects 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000004455 differential thermal analysis Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 229910052839 forsterite Inorganic materials 0.000 description 1
- 230000004927 fusion Effects 0.000 description 1
- 239000003292 glue Substances 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- HCWCAKKEBCNQJP-UHFFFAOYSA-N magnesium orthosilicate Chemical compound [Mg+2].[Mg+2].[O-][Si]([O-])([O-])[O-] HCWCAKKEBCNQJP-UHFFFAOYSA-N 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 239000000075 oxide glass Substances 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229910052700 potassium Inorganic materials 0.000 description 1
- 238000007639 printing Methods 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 1
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 1
- 229910052708 sodium Inorganic materials 0.000 description 1
- 125000006850 spacer group Chemical group 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 238000004073 vulcanization Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Conductive Materials (AREA)
- Glass Compositions (AREA)
- Parts Printed On Printed Circuit Boards (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2017240609 | 2017-12-15 | ||
| JP2017-240609 | 2017-12-15 | ||
| JP2018-113784 | 2018-06-14 | ||
| JP2018113784A JP7187832B2 (ja) | 2017-12-15 | 2018-06-14 | 厚膜導体形成用粉末組成物および厚膜導体形成用ペースト |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201927927A TW201927927A (zh) | 2019-07-16 |
| TWI796400B true TWI796400B (zh) | 2023-03-21 |
Family
ID=67180028
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107144766A TWI796400B (zh) | 2017-12-15 | 2018-12-12 | 厚膜導體形成用粉末組成物及厚膜導體形成用糊料 |
Country Status (2)
| Country | Link |
|---|---|
| JP (1) | JP7187832B2 (enExample) |
| TW (1) | TWI796400B (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7581791B2 (ja) | 2020-11-20 | 2024-11-13 | 住友金属鉱山株式会社 | 厚膜導体形成用粉末組成物、厚膜導体形成用ペーストおよび厚膜導体 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0488067A (ja) * | 1990-07-31 | 1992-03-19 | Nippon Cement Co Ltd | 導体ペースト |
| CN106683744A (zh) * | 2016-12-16 | 2017-05-17 | 苏州博望新能源科技有限公司 | 低温烧结太阳能电池背电极银浆 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3209089B2 (ja) * | 1996-05-09 | 2001-09-17 | 昭栄化学工業株式会社 | 導電性ペースト |
| JP3637286B2 (ja) * | 2001-03-14 | 2005-04-13 | 株式会社ノリタケカンパニーリミテド | 焼成ジルコニア基材用導体ペースト |
| WO2013146239A1 (ja) * | 2012-03-28 | 2013-10-03 | 東レ株式会社 | 感光性導電ペーストおよび導電性配線付き基板の製造方法 |
| JP6869531B2 (ja) * | 2017-02-22 | 2021-05-12 | ナミックス株式会社 | 導電性ペースト、窒化アルミニウム回路基板及びその製造方法 |
-
2018
- 2018-06-14 JP JP2018113784A patent/JP7187832B2/ja active Active
- 2018-12-12 TW TW107144766A patent/TWI796400B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0488067A (ja) * | 1990-07-31 | 1992-03-19 | Nippon Cement Co Ltd | 導体ペースト |
| CN106683744A (zh) * | 2016-12-16 | 2017-05-17 | 苏州博望新能源科技有限公司 | 低温烧结太阳能电池背电极银浆 |
Also Published As
| Publication number | Publication date |
|---|---|
| TW201927927A (zh) | 2019-07-16 |
| JP2019110105A (ja) | 2019-07-04 |
| JP7187832B2 (ja) | 2022-12-13 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR102488165B1 (ko) | 도전성 조성물, 도체의 제조 방법 및 전자 부품의 배선의 형성 방법 | |
| US10403421B2 (en) | Thick film resistor and production method for same | |
| US11174193B2 (en) | Conductive composition and method for producing terminal electrode | |
| US10446290B2 (en) | Resistive composition | |
| JP2010287678A (ja) | チップ抵抗器の表電極および裏電極 | |
| JP6623919B2 (ja) | 導電性組成物、導体の製造方法及び電子部品の配線の形成方法 | |
| JP2000048642A (ja) | 導電性ペースト及びガラス回路基板 | |
| JP2006228572A (ja) | 厚膜導体形成用組成物 | |
| KR102639865B1 (ko) | 후막 도체 형성용 분말 조성물 및 후막 도체 형성용 페이스트 | |
| TWI647710B (zh) | 厚膜導體形成用組成物以及使用其獲得的厚膜導體 | |
| TWI796400B (zh) | 厚膜導體形成用粉末組成物及厚膜導體形成用糊料 | |
| JP5673515B2 (ja) | 厚膜導体形成用組成物およびこれを用いた厚膜導体とその製造方法 | |
| JP6623920B2 (ja) | 導電性組成物及び端子電極の製造方法 | |
| JP7322534B2 (ja) | 厚膜導体形成用粉末組成物および厚膜導体形成用ペースト | |
| JP2018055767A (ja) | 鉛フリー導電ペースト | |
| JP7581791B2 (ja) | 厚膜導体形成用粉末組成物、厚膜導体形成用ペーストおよび厚膜導体 | |
| JP2019110105A5 (enExample) | ||
| JP4630616B2 (ja) | Pbフリー導電性組成物 | |
| US20250074813A1 (en) | Conductive Paste | |
| JP2022089460A (ja) | 厚膜導体及びその形成用組成物並びに該形成用組成物を含んだ厚膜導体ペースト | |
| JP2021144961A (ja) | 厚膜抵抗体被覆用粉末組成物および厚膜抵抗体被覆用ガラスペースト | |
| JP2012238443A (ja) | 導電性組成物 | |
| JP2019032993A (ja) | 厚膜導体形成用組成物および厚膜導体の製造方法 |