TWI790993B - 黑色組成物、硬化膜、濾色器、遮光膜、固態攝影元件及圖像顯示裝置 - Google Patents

黑色組成物、硬化膜、濾色器、遮光膜、固態攝影元件及圖像顯示裝置 Download PDF

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Publication number
TWI790993B
TWI790993B TW106108428A TW106108428A TWI790993B TW I790993 B TWI790993 B TW I790993B TW 106108428 A TW106108428 A TW 106108428A TW 106108428 A TW106108428 A TW 106108428A TW I790993 B TWI790993 B TW I790993B
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Taiwan
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group
titanium nitride
mass
containing particles
composition
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TW106108428A
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English (en)
Chinese (zh)
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TW201806853A (zh
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久保田誠
浜田大輔
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日商富士軟片股份有限公司
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    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/28—Nitrogen-containing compounds
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
    • H01L27/14—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/70—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data
    • C01P2002/72—Crystal-structural characteristics defined by measured X-ray, neutron or electron diffraction data by d-values or two theta-values, e.g. as X-ray diagram
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/12—Surface area
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/002—Physical properties
    • C08K2201/006—Additives being defined by their surface area
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K2201/00—Specific properties of additives
    • C08K2201/011—Nanostructured additives

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  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Optics & Photonics (AREA)
  • Nonlinear Science (AREA)
  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Inorganic Chemistry (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Materials For Photolithography (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)
TW106108428A 2016-03-31 2017-03-15 黑色組成物、硬化膜、濾色器、遮光膜、固態攝影元件及圖像顯示裝置 TWI790993B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2016072402 2016-03-31
JP2016-072402 2016-03-31

Publications (2)

Publication Number Publication Date
TW201806853A TW201806853A (zh) 2018-03-01
TWI790993B true TWI790993B (zh) 2023-02-01

Family

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Family Applications (1)

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TW106108428A TWI790993B (zh) 2016-03-31 2017-03-15 黑色組成物、硬化膜、濾色器、遮光膜、固態攝影元件及圖像顯示裝置

Country Status (5)

Country Link
JP (1) JP6698820B2 (ja)
KR (1) KR102160018B1 (ja)
CN (2) CN109073799B (ja)
TW (1) TWI790993B (ja)
WO (1) WO2017169584A1 (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6698820B2 (ja) * 2016-03-31 2020-05-27 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置
CN112189168A (zh) * 2018-07-20 2021-01-05 富士胶片株式会社 遮光性树脂组合物、固化膜、滤色器、遮光膜、固体摄像元件、图像显示装置
JP7330719B2 (ja) * 2019-03-01 2023-08-22 太陽ホールディングス株式会社 アルカリ現像型光硬化性熱硬化性樹脂組成物
WO2020203080A1 (ja) * 2019-03-29 2020-10-08 富士フイルム株式会社 組成物、遮光膜、カラーフィルタ、光学素子、センサ、固体撮像素子、ヘッドライトユニット
JP7301986B2 (ja) * 2019-09-06 2023-07-03 富士フイルム株式会社 組成物、膜、構造体、カラーフィルタ、固体撮像素子および画像表示装置

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137099A (en) * 1977-05-06 1978-11-30 Toyo Soda Mfg Co Ltd Production of titanium nitride
US4196178A (en) * 1978-05-08 1980-04-01 Ube Industries, Ltd. Process for producing metallic nitride powder
US4812301A (en) * 1986-04-24 1989-03-14 The United States Of America As Represented By The Secretary Of The Interior Production of titanium nitride, carbide, and carbonitride powders
TW200639124A (en) * 2004-12-28 2006-11-16 Dainippon Printing Co Ltd Black resin composition for display device, and display device member
CN102459084A (zh) * 2009-06-15 2012-05-16 东丽株式会社 黑色复合微粒、黑色树脂组合物、滤色片基板和液晶显示装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB787516A (en) * 1955-02-24 1957-12-11 British Titan Products Improvements in or relating to the preparation of titanium nitride
US3717851A (en) 1971-03-03 1973-02-20 Ibm Processing of compacted data
JPH02284643A (ja) * 1989-01-10 1990-11-22 Kawasaki Steel Corp 高純度の金属またはセラミックス微粉、超微粉の回収方法
DE3924300A1 (de) * 1989-01-21 1991-01-31 Basf Ag Verfahren zur herstellung von pulverfoermigen metallnitriden
CN101443707A (zh) * 2006-05-18 2009-05-27 三菱化学株式会社 电子照相感光体、成像装置和电子照相盒
US8329068B2 (en) * 2007-03-20 2012-12-11 Toray Industries, Inc. Black resin composition, resin black matrix, color filter and liquid crystal display
JP2010097214A (ja) * 2008-09-19 2010-04-30 Toray Ind Inc 液晶表示装置用カラーフィルター基板、および液晶表示装置
JP5153698B2 (ja) * 2009-03-19 2013-02-27 富士フイルム株式会社 分散組成物の製造方法、遮光性カラーフィルタ用感光性樹脂組成物の製造方法、及び遮光性カラーフィルタの製造方法
EP2510399A4 (en) * 2009-12-11 2014-01-22 Fujifilm Corp BLACK CURABLE COMPOSITION, COLORED FILTER, AND LIGHT PROTECTIVE FILM AND METHOD OF MANUFACTURE, LENGTH LENS AND SEMICONDUCTOR IMAGING DEVICE
JP5526821B2 (ja) * 2010-02-01 2014-06-18 Ｊｓｒ株式会社 着色組成物、カラーフィルタ及びカラー液晶表示素子
JP5689691B2 (ja) * 2010-03-30 2015-03-25 富士フイルム株式会社 チタンブラック分散物、感光性樹脂組成物、遮光膜及びその製造方法、並びに固体撮像素子
CN104272145B (zh) * 2012-05-11 2018-01-23 日产化学工业株式会社 膜形成用组合物
JP6698820B2 (ja) * 2016-03-31 2020-05-27 富士フイルム株式会社 組成物、硬化膜、カラーフィルタ、遮光膜、固体撮像素子および画像表示装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53137099A (en) * 1977-05-06 1978-11-30 Toyo Soda Mfg Co Ltd Production of titanium nitride
US4196178A (en) * 1978-05-08 1980-04-01 Ube Industries, Ltd. Process for producing metallic nitride powder
US4812301A (en) * 1986-04-24 1989-03-14 The United States Of America As Represented By The Secretary Of The Interior Production of titanium nitride, carbide, and carbonitride powders
TW200639124A (en) * 2004-12-28 2006-11-16 Dainippon Printing Co Ltd Black resin composition for display device, and display device member
CN102459084A (zh) * 2009-06-15 2012-05-16 东丽株式会社 黑色复合微粒、黑色树脂组合物、滤色片基板和液晶显示装置

Also Published As

Publication number Publication date
KR102160018B1 (ko) 2020-09-25
CN113031398A (zh) 2021-06-25
JP6698820B2 (ja) 2020-05-27
WO2017169584A1 (ja) 2017-10-05
CN109073799B (zh) 2021-03-09
TW201806853A (zh) 2018-03-01
KR20180116354A (ko) 2018-10-24
CN109073799A (zh) 2018-12-21
JPWO2017169584A1 (ja) 2019-01-17

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