TWI779702B - Die ejector and die bonding apparatus including the same - Google Patents
Die ejector and die bonding apparatus including the same Download PDFInfo
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- TWI779702B TWI779702B TW110124669A TW110124669A TWI779702B TW I779702 B TWI779702 B TW I779702B TW 110124669 A TW110124669 A TW 110124669A TW 110124669 A TW110124669 A TW 110124669A TW I779702 B TWI779702 B TW I779702B
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68742—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a lifting arrangement, e.g. lift pins
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67132—Apparatus for placing on an insulating substrate, e.g. tape
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67144—Apparatus for mounting on conductive members, e.g. leadframes or conductors on insulating substrates
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6835—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L21/6836—Wafer tapes, e.g. grinding or dicing support tapes
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68327—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding
- H01L2221/68336—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support used during dicing or grinding involving stretching of the auxiliary support post dicing
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
- H01L2221/683—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L2221/68304—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere for supporting or gripping using temporarily an auxiliary support
- H01L2221/68381—Details of chemical or physical process used for separating the auxiliary support from a device or wafer
- H01L2221/68386—Separation by peeling
- H01L2221/6839—Separation by peeling using peeling wedge or knife or bar
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Abstract
本發明公開了晶片頂出器和包括該晶片頂出器的晶片接合裝置。該晶片頂出器包括設置在切割帶下方的罩、配置為升高穿過罩以將附接在切割帶上的晶片與切割帶分離的頂出器單元、配置為提升頂出器單元的頂出器驅動部,以及設置在頂出器單元下方並配置為限制頂出器單元向下移動的止動構件。頂出器單元包括沿升高方向延伸並具有伸縮結構的多個頂出器構件,頂出器構件同時被頂出器驅動部提升,然後由頂出器驅動部和止動構件從外到內依序降低。The invention discloses a wafer ejector and a wafer bonding device comprising the wafer ejector. The wafer ejector includes a hood disposed below the dicing tape, an ejector unit configured to be raised through the hood to separate wafers attached to the dicing tape from the dicing tape, a top of the ejector unit configured to lift. an ejector driving part, and a stopper member disposed below the ejector unit and configured to restrict downward movement of the ejector unit. The ejector unit includes a plurality of ejector members extending in the lifting direction and having a telescopic structure, the ejector members are simultaneously lifted by the ejector driving part, and then from outside to inside by the ejector driving part and the stopper member Decrease in sequence.
Description
本發明是關於晶片頂出器及包含晶片頂出器的晶片接合裝置。更具體地說,本發明是關於用於在晶片接合程序中將晶片從切割帶中分離出來的晶片頂出器以及包括該晶片頂出器的晶片接合裝置。The present invention relates to a wafer ejector and a wafer bonding device including the wafer ejector. More particularly, the present invention relates to a wafer ejector for separating a wafer from a dicing tape in a wafer bonding process and a wafer bonding apparatus including the wafer ejector.
通常,藉由重複執行一系列之製造程序,半導體設備可以在用作半導體基板的矽晶圓上形成。如上述所形成的半導體設備可以藉由切割程序被個體化並且可以藉由晶片接合程序被接合到基板。Generally, semiconductor devices can be formed on silicon wafers used as semiconductor substrates by repeatedly performing a series of manufacturing processes. The semiconductor device formed as above can be individualized by a dicing process and can be bonded to a substrate by a wafer bonding process.
晶片接合裝置包括用於從由切割程序分成多個晶片的晶圓上拾取晶片的晶片拾取模組,以及用於將晶片接合到諸如印刷電路板或引線框架的基板上的晶片接合模組。晶片拾取模組可包括用於支承附接晶圓的切割帶的台架單元,用於將晶片自切割帶分離的晶片頂出器,以及用於從切割帶上拾取晶片的真空拾取器。The die bonding apparatus includes a die pickup module for picking up a die from a wafer divided into a plurality of dies by a dicing process, and a die bonding module for bonding the die to a substrate such as a printed circuit board or a lead frame. The wafer pickup module may include a stage unit for supporting a dicing tape to which a wafer is attached, a wafer ejector for separating the wafer from the dicing tape, and a vacuum picker for picking up the wafer from the dicing tape.
晶片頂出器可包括具有用於真空吸附切割帶的下表面的真空孔的罩,以及設置在該罩中、配置為可沿垂直方向移動穿過該罩的上部的頂出器單元。具體地,頂出器單元可提升晶片,使切割帶上的晶片與切割帶分離。例如,韓國專利No. 10-2009922公開了一種晶片頂出器,其包括多個布置成伸縮狀的頂出器構件。The wafer ejector may include a cover having a vacuum hole for vacuum absorbing a lower surface of the dicing tape, and an ejector unit provided in the cover and configured to be movable in a vertical direction through an upper portion of the cover. Specifically, the ejector unit may lift the wafer to separate the wafer on the dicing tape from the dicing tape. For example, Korean Patent No. 10-2009922 discloses a wafer ejector including a plurality of ejector members arranged in a telescopic shape.
具體地,具有板狀(例如圓盤狀)的支承構件可分別設置在頂出器構件的下端部分,並且可以在支承構件之間設置彈性構件。當頂出器構件被頂出器驅動部升起時,頂出器構件可藉由彈性構件從外到內依序升起。然而,當頂出器構件從外向內依序升起時,晶片可能被過度升起,這可能導致對晶片的損壞。Specifically, support members having a plate shape (for example, a disc shape) may be provided at lower end portions of the ejector members, respectively, and elastic members may be provided between the support members. When the ejector member is lifted by the ejector driving part, the ejector member can be sequentially raised from the outside to the inside by the elastic member. However, when the ejector member is sequentially lifted from the outside to the inside, the wafer may be lifted excessively, which may cause damage to the wafer.
本發明的實施方式提供了能夠在將晶片與切割帶分離的同時防止晶片損壞的晶片頂出器以及包括該晶片頂出器的晶片接合裝置。Embodiments of the present invention provide a wafer ejector capable of preventing damage to a wafer while separating a wafer from a dicing tape, and a wafer bonding apparatus including the wafer ejector.
根據本發明的方面,晶片頂出器可以包括罩,其設置在切割帶下方;頂出器單元,其配置為升高穿過罩以將附接在切割帶上的晶片與切割帶分離;頂出器驅動部,其配置為升高頂出器單元;以及止動構件,其設置在頂出器單元下方並配置為限制頂出器單元向下運動。具體地,頂出器單元可以包括多個頂出器構件,這些頂出器構件在升高方向上延伸並配置為具有伸縮結構,並且頂出器構件可以配置為同時被頂出器驅動部提升,然後由頂出器驅動部和止動構件從外到內依序降低。According to aspects of the present invention, the wafer ejector may include a hood disposed below the dicing tape; an ejector unit configured to rise through the hood to separate wafers attached to the dicing tape from the dicing tape; an ejector driving portion configured to raise the ejector unit; and a stopper member disposed below the ejector unit and configured to restrict downward movement of the ejector unit. Specifically, the ejector unit may include a plurality of ejector members extending in the raising direction and configured to have a telescopic structure, and the ejector members may be configured to be simultaneously lifted by the ejector driving part , and then lowered sequentially from the outside to the inside by the ejector driving part and the stop member.
根據本發明的一些實施方式,頂出器單元進一步包含多個凸緣,其分別設置在頂出器構件的下端部分,並且沿頂出器構件的升高方向布置;至少一個彈性構件,其設置在凸緣中除了最上凸緣之外的剩餘凸緣之間;升降頭,其設置在凸緣中的最下凸緣的下方;以及連接構件,其連接最上凸緣和升降頭。在這種情況下,頂出器驅動部可與升降頭連接。According to some embodiments of the present invention, the ejector unit further includes a plurality of flanges, which are respectively arranged on the lower end portion of the ejector member, and arranged along the rising direction of the ejector member; at least one elastic member, which is arranged Between the remaining flanges except the uppermost flange of the flanges; a lifting head disposed below a lowermost flange of the flanges; and a connecting member connecting the uppermost flange and the lifting head. In this case, the ejector drive can be connected to the lifting head.
根據本發明的一些實施方式,頂出器單元可以進一步包括至少一個第二止動構件,該止動構件限制了凸緣中除最上凸緣和最下凸緣之外的至少一個剩餘凸緣被至少一個彈性構件提升的高度。According to some embodiments of the present invention, the ejector unit may further include at least one second stop member, which restricts at least one remaining flange except the uppermost flange and the lowermost flange from being The elevated height of at least one elastic member.
根據本發明的一些實施方式,晶片頂出器可以進一步包括止動驅動部,在頂出器驅動部提升頂出器構件之後,止動驅動部升高止動構件以調節止動構件的高度。According to some embodiments of the present invention, the wafer ejector may further include a stop driving part that lifts the stop member to adjust a height of the stop member after the ejector drive part lifts the ejector member.
根據本發明的另一個方面,晶片頂出器可以包括罩,其設置為與切割帶的下表面接觸;多個頂出器構件,其配置為升高穿過罩,以便將附接在切割帶的上表面的晶片與切割帶分離,並且具有沿升高方向延伸的伸縮結構;多個凸緣,其分別設置在頂出器構件的下端部分並沿頂出器構件的升高方向布置;多個彈性構件,其設置在凸緣中除最上凸緣之外的剩餘凸緣之間;升降頭,其設置在凸緣中的最下凸緣的下方;多個連接銷,其穿過凸緣中除最上凸緣之外的剩餘凸緣,並連接最上凸緣和升降頭;頂出器驅動部,其與升降頭連接,並配置為升高頂出器構件;止動構件,其設置在最下凸緣的下方,並配置為限制最下凸緣的向下運動;以及止動驅動部,在頂出器驅動部提升頂出器構件之後,止動驅動部升高止動構件以調節止動構件的高度。According to another aspect of the present invention, a wafer ejector may include a hood disposed in contact with the lower surface of the dicing tape; a plurality of ejector members configured to rise through the hood so as to be attached to the dicing tape The wafer on the upper surface of the upper surface is separated from the dicing belt, and has a telescopic structure extending along the rising direction; a plurality of flanges, which are respectively arranged on the lower end portion of the ejector member and arranged along the raising direction of the ejector member; an elastic member disposed between the remaining flanges except the uppermost flange among the flanges; a lifting head disposed under the lowermost flange among the flanges; a plurality of connecting pins passing through the flanges The remaining flanges except the uppermost flange, and connect the uppermost flange and the lifting head; the ejector driving part, which is connected with the lifting head, and is configured to raise the ejector member; the stop member, which is arranged on the bottom of the lowermost flange, and configured to limit the downward movement of the lowermost flange; and a stop drive, after the ejector drive lifts the ejector member, the stop drive raises the stop member to adjust The height of the stop member.
根據本發明的一些實施方式,罩可以具有頂出器構件插入其中的開口,並且頂出器構件插入開口,使得頂出器構件的上表面與罩的上表面齊平。According to some embodiments of the present invention, the cover may have an opening into which the ejector member is inserted, and the ejector member is inserted into the opening such that an upper surface of the ejector member is flush with an upper surface of the cover.
根據本發明的一些實施方式,頂出器構件可同時被頂出器驅動部提升。According to some embodiments of the invention, the ejector member may be simultaneously lifted by the ejector drive.
根據本發明的一些實施方式,彈性構件可以具有向下逐漸增加的彈力,使得頂出器構件中除最內側頂出器構件之外的剩餘頂出器構件從外到內依序降低。According to some embodiments of the present invention, the elastic member may have an elastic force gradually increasing downward, so that the remaining ejector members except the innermost ejector member among the ejector members are sequentially lowered from outside to inside.
根據本發明的一些實施方式,頂出器驅動部可以包括連接到升降頭並向下延伸的第一驅動軸;以及配置為升高第一驅動軸的第一驅動單元。According to some embodiments of the present invention, the ejector driving part may include a first driving shaft connected to the lift head and extending downward; and a first driving unit configured to lift the first driving shaft.
根據本發明的一些實施方式,止動驅動部可以包括連接到止動構件並向下延伸的第二驅動軸;以及配置為升高第二驅動軸的第二驅動單元。According to some embodiments of the present invention, the stop driving part may include a second drive shaft connected to the stop member and extending downward; and a second drive unit configured to raise the second drive shaft.
根據本發明的一些實施方式,第二驅動軸可以具有圍繞第一驅動軸的管狀形狀。According to some embodiments of the invention, the second drive shaft may have a tubular shape surrounding the first drive shaft.
根據本發明的一些實施方式,頂出器驅動部可進一步包括第一引導構件,其設置在第一驅動軸和第二驅動軸之間,並配置為沿升高方向引導第一驅動軸。According to some embodiments of the present invention, the ejector driving part may further include a first guide member disposed between the first driving shaft and the second driving shaft and configured to guide the first driving shaft in a lifting direction.
根據本發明的一些實施方式,晶片頂出器可進一步包括頂出器主體,其與罩的下部連接,並具有圍繞第二驅動軸的管狀形狀。According to some embodiments of the present invention, the wafer ejector may further include an ejector body connected to a lower portion of the cover and having a tubular shape surrounding the second driving shaft.
根據本發明的一些實施方式,止動驅動部可以進一步包括第二引導構件,其設置在第二驅動軸和頂出器主體之間,並配置為沿升高方向引導第二驅動軸。According to some embodiments of the present invention, the stop driving part may further include a second guide member disposed between the second drive shaft and the ejector main body and configured to guide the second drive shaft in a rising direction.
根據本發明的一些實施方式,第一驅動單元可以包括用於升高第一驅動軸的第一凸輪構件;用於旋轉第一凸輪構件的第一馬達;安裝在第一驅動軸的下部上的第一支架;以及安裝在第一支架上並設置在第一凸輪構件上的第一凸輪從動件。According to some embodiments of the present invention, the first drive unit may include a first cam member for raising the first drive shaft; a first motor for rotating the first cam member; a first bracket; and a first cam follower mounted on the first bracket and disposed on the first cam member.
根據本發明的一些實施方式,頂出器驅動部可以進一步包括第三引導構件,其配置為沿升高方向引導第一支架。According to some embodiments of the present invention, the ejector driving part may further include a third guide member configured to guide the first bracket in a rising direction.
根據本發明的一些實施方式,第二驅動單元可以包括用於升高第二驅動軸的第二凸輪構件;用於旋轉第二凸輪構件的第二馬達;安裝在第二驅動軸的下部上的第二支架;以及安裝在第二支架上並設置在第二凸輪構件上的第二凸輪從動件。According to some embodiments of the present invention, the second drive unit may include a second cam member for raising the second drive shaft; a second motor for rotating the second cam member; a second bracket; and a second cam follower mounted on the second bracket and disposed on the second cam member.
根據本發明的一些實施方式,第一支架可以包括耦接到第一驅動軸的下部的連接塊;從連接塊向下延伸的一對延伸部分;以及安裝部分,其將延伸部分的下端相互連接,且第一凸輪從動件安裝在其上。在這種情況下,第二凸輪構件和第二凸輪從動件可以設置在延伸部分之間。According to some embodiments of the present invention, the first bracket may include a connection block coupled to a lower portion of the first drive shaft; a pair of extension parts extending downward from the connection block; and a mounting part that connects lower ends of the extension parts to each other. , with the first cam follower mounted thereon. In this case, the second cam member and the second cam follower may be disposed between the extension parts.
根據本發明的一些實施方式,罩可以包括罩主體,其具有圓管形狀並與頂出器主體耦接;蓋子,其與罩主體的上部耦接並具有用於真空吸附切割帶的下表面的真空孔;以及第三止動構件,其從罩主體的內表面突出以防止凸緣與罩主體分離。According to some embodiments of the present invention, the cover may include a cover main body, which has a circular tube shape and is coupled with the ejector main body; a cover, which is coupled with the upper part of the cover main body and has a lower surface for vacuum suction cutting tape a vacuum hole; and a third stopper member protruding from the inner surface of the cover main body to prevent the flange from being separated from the cover main body.
根據本發明的另一個方面,晶片接合裝置可以包括晶片頂出器,其用於將附接在切割帶上的晶片與切割帶分離;以及晶片接合模組,其用於將由晶片頂出器分離的晶片接合到基板上。在這種情況下,晶片頂出器可以包括罩,其設置在切割帶下方;頂出器單元,其配置為升高穿過罩以將晶片與切割帶分離;頂出器驅動部,其配置為升高頂出器單元;以及止動構件,其設置在頂出器單元的下方,並配置為限制頂出器單元向下運動。具體地,頂出器單元可以包括多個頂出器構件,其沿升高方向延伸,並配置為具有伸縮結構,而且頂出器構件可以配置為同時被頂出器驅動部提升,然後由頂出器驅動部和止動構件從外到內依序降低。According to another aspect of the present invention, the wafer bonding apparatus may include a wafer ejector for separating the wafer attached to the dicing tape from the dicing tape; and a wafer bonding module for separating the wafer attached by the wafer ejector. The wafer is bonded to the substrate. In this case, the wafer ejector may include a cover, which is disposed under the dicing tape; an ejector unit configured to rise through the cover to separate the wafer from the dicing tape; an ejector drive section, which configures for raising the ejector unit; and a stop member disposed below the ejector unit and configured to limit downward movement of the ejector unit. Specifically, the ejector unit may include a plurality of ejector members extending in the lifting direction and configured to have a telescopic structure, and the ejector members may be configured to be simultaneously lifted by the ejector driving part and then lifted by the ejector The ejector driving part and the stop member are lowered sequentially from outside to inside.
上述對本發明的概述並不旨在描述每個說明的實施方式或本發明的每種實施方式。後面的詳細描述和申請專利範圍更具體地例證了這些實施方式。The above summary of the present invention is not intended to describe each illustrated embodiment or every implementation of the present invention. The Detailed Description and Claims that follow more particularly exemplify these embodiments.
在下文中,參考圖式更詳細地描述本發明的實施方式。然而,本發明不限於下面描述的實施方式且以各種其他形式來進行實施。下面的實施方式並非完全用於完成本發明,而是用於將本發明的範圍完全傳達給本領域的技術人員。Hereinafter, embodiments of the present invention are described in more detail with reference to the drawings. However, the present invention is not limited to the embodiments described below and may be implemented in various other forms. The following embodiments are not intended to complete the present invention, but to fully convey the scope of the present invention to those skilled in the art.
在說明書中,當一個元件被稱為在......上或被連接至另一個元件或層時,能夠直接位於或被直接連接至另一個元件或層上,或者還可以存在中間元件或層。與此不同的是,是當一個元件被稱為直接在或被直接連接至另一個元件或層上時,理解為表示不存在中間元件。此外,儘管像第一、第二和第三的用語用於在本發明的各種實施方式中描述各種區域和層,但區域和層並不限於這些用語。In the specification, when an element is referred to as being on or connected to another element or layer, it can be directly on or directly connected to another element or layer, or intervening elements may also be present or layers. In contrast, when an element is referred to as being directly on or connected to another element or layer, it is understood that there are no intervening elements present. Also, although terms like first, second, and third are used to describe various regions and layers in various embodiments of the present invention, the regions and layers are not limited to these terms.
以下使用的用語僅用於描述具體實施方式,而非用於限制本發明。額外地,除非在此另有限定外,包括技術或科學用語的所有用語可以具有與本領域的技術人員通常所理解者相同的意義。The terms used below are only used to describe specific embodiments, and are not used to limit the present invention. Additionally, unless otherwise defined herein, all terms including technical or scientific terms may have the same meaning as commonly understood by those skilled in the art.
參考理想實施方式的示意圖來描述本發明的實施方式。相應地,可以根據圖式的形式來預期製造方法中的變化及/或容許誤差。相應地,本發明的實施方式不被描述為限於圖式中的具體形式或區域且包括形式的偏差。該區域可以完全是示意性的,且其形式可以不描述或描繪在任何給定區域中的準確形式或結構,且非旨在限制本發明的範圍。Embodiments of the invention are described with reference to schematic illustrations of idealized embodiments. Accordingly, variations and/or tolerances in manufacturing methods can be expected from the form of the drawings. Accordingly, the embodiments of the present invention have not been described as limited to the specific forms or regions in the drawings and include deviations in form. The regions may be purely schematic and their form may not describe or depict the exact form or structure in any given region and are not intended to limit the scope of the invention.
圖1是根據本發明的實施方式的晶片接合裝置的示意性俯視圖,圖2是如圖1所示的晶片拾取模組的示意性正視圖。FIG. 1 is a schematic top view of a wafer bonding apparatus according to an embodiment of the present invention, and FIG. 2 is a schematic front view of the wafer pickup module shown in FIG. 1 .
參照圖1和圖2,根據本發明的實施方式,可使用晶片接合裝置10將藉由切割程序個體化的晶片22接合到諸如印刷電路板或引線框架的基板30上。Referring to FIGS. 1 and 2 , according to an embodiment of the present invention, a
晶片接合裝置10可包括晶片拾取模組300,其用於從分成晶片22的晶圓20上拾取晶片22,以及晶片接合模組400,其用於將由晶片拾取模組300拾取的晶片22接合在基板30上。例如,晶片拾取模組300可以將拾取的晶片22轉移到晶片台架310上,而晶片接合模組400可以拾取晶片台架310上的晶片22並將晶片22接合到基板30上。The
晶圓20可以包括切割帶24以及具有基本圓環形狀的安裝框架26,晶片22附接到該切割帶24上,切割帶24安裝到該安裝框架26上。例如,切割帶24可以附接到安裝框架26的下表面,並且晶片22可以附接到切割帶24的上表面。
晶片拾取模組300可以包括用於支承晶圓20的晶圓台架320。用於支承切割帶24的支承環322、用於保持安裝框架26的夾具324以及用於在垂直方向上移動夾具324的夾具驅動單元326可以設置在晶圓台架320上。具體地,如圖2所示,支承環322可以在晶片22和安裝框架26之間支承切割帶24,而夾具驅動部326可以藉由降低夾具324來擴張切割帶24,安裝框架26被夾具324夾持。The
用於選擇性地將晶片22與切割帶24分離的晶片頂出器100可以設置在由支承環322支承的切割帶24的下方。晶片頂出器100可真空吸附切割帶24的下表面,且可包括頂出器單元110,該頂出器單元110用於提升晶片22中待拾起的晶片22,從而使得晶片22與切割帶24分離。A
晶片拾取模組300可以包括設置在晶圓台架320上方的真空拾取器330,以拾取由晶片頂出器100從切割帶24分離的晶片22,以及用於沿垂直方向和水平方向移動真空拾取器330的拾取器驅動部332。例如,雖然圖中未示出,但真空拾取器330可以包括具有用於真空吸附晶片22的真空孔的夾頭。晶片台架310可以布置成與晶圓台架320水平間隔開,由真空拾取器330拾取的晶片22可以由拾取器驅動部332轉移到晶片台架310上。此外,用於檢測晶片22中待拾取的晶片22的攝像單元340可以設置在晶圓台架320的上方。The
儘管在圖中未示出,但晶片接合裝置10可以包括用於水平移動晶圓台架320的台架驅動部(未示出)。台架驅動部可以調節晶圓台架320的位置,以使晶片22中待拾取的晶片22位於晶片頂出器100上。Although not shown in the drawings, the
進一步地,如圖1所示,晶片接合裝置10可以包括匣式裝載埠(cassette load port)42,在該匣式裝載埠上放置包含多個晶圓20的卡匣40;晶圓轉移單元44,其用於將晶圓20從卡匣40轉移到晶圓台架320上;以及晶圓導軌46,其用於引導晶圓20的轉移。具體地,台架驅動部可以移動晶圓台架320,使其與晶圓導軌46的端部相鄰,然後晶圓轉移單元44可以將晶圓20從卡匣40轉移到晶圓台架320上。儘管沒有詳細示出,但晶圓轉移單元44可以包括用於夾持安裝框架26的夾持器以及用於水平移動夾持器的夾持驅動部。Further, as shown in FIG. 1 , the
晶片接合模組400可以拾取轉移到晶片台架310上的晶片22,並將晶片22接合到基板30上。例如,晶片接合模組400可以包括用於拾取和接合晶片22的接合頭410、用於沿垂直方向和水平方向移動接合頭410的頭驅動部412以及用於支承基板30的基板台架420。雖然圖中未示出,但接合頭410可以包括具有用於真空吸附晶片22的真空孔和將晶片22壓到基板30上的接合工具(未示出)。基板台架420可以包括加熱器(未示出),其用於將基板30加熱到預定的接合溫度。The
基板30可以從第一箱盒(magazine)50供應,並且可以在執行晶片接合過程之後容納在第二箱盒60中。例如,晶片接合裝置10可以包括用於處理第一箱盒50的第一箱盒處理單元52和用於處理第二箱盒60的第二箱盒處理單元62。此外,晶片接合裝置10可以包括第一箱盒50放置在其上的第一箱盒裝載埠54、第二箱盒60放置在其上的第二箱盒裝載埠64、用於在第一箱盒裝載埠54和第一箱盒處理單元52之間轉移第一箱盒50的第一箱盒轉移單元56,以及用於在第二箱盒裝載埠64和第二箱盒處理單元62之間轉移第二箱盒60的第二箱盒轉移單元66。The
此外,晶片接合裝置10可以包括基板轉移單元70。基板轉移單元70可以將基板30從第一箱盒50轉移到基板台架420上,並在執行晶片接合程序後將基板30從基板台架420轉移到第二箱盒60。基板轉移單元70可以包括用於引導基板30轉移的基板導軌72、用於夾持基板30的夾持器74、用於移動夾持器74的夾持器驅動部76、用於將基板30移動到基板導軌72上的第一推桿78,以及用於將基板30移入第二箱盒60的第二推桿80。In addition, the
圖3是如圖2所示的晶片頂出器的示意性剖視圖,圖4是如圖2所示的晶片頂出器的頂出器驅動部和止動驅動部的示意性剖視圖,圖5是如圖4所示的頂出器驅動部和止動驅動部的示意性側視圖。Fig. 3 is a schematic sectional view of the wafer ejector as shown in Fig. 2, Fig. 4 is a schematic sectional view of the ejector driving part and the stop driving part of the wafer ejector as shown in Fig. 2, and Fig. 5 is A schematic side view of the ejector driving part and the stop driving part as shown in FIG. 4 .
參照圖3至圖5,晶片頂出器100可以設置在由晶圓台架320支承的切割帶24的下方。根據本發明的實施方式,晶片頂出器100可以包括設置為與切割帶24的下表面接觸的罩110,以及配置為升高穿過罩110以使附接在切割帶24上的晶片22與切割帶24分離的頂出器單元120。Referring to FIGS. 3 to 5 , the
頂出器單元120可以包括多個頂出器構件122,這些頂出器構件122沿升高方向延伸並且被配置為具有伸縮結構。例如,頂出器構件122可以各自具有沿垂直方向延伸的矩形管形狀,並且可以布置成伸縮式結構。頂出器單元120可以從外到內包括第一頂出器構件122A、第二頂出器構件122B、第三頂出器構件122C和第四頂出器構件122D。罩110可以具有頂出器構件122插入其中的開口112A,以及多個用於真空吸附切割帶24的下表面的真空孔112B。The
晶片頂出器100可以包括設置在頂出器單元120下方並配置為沿垂直方向升高頂出器單元120的頂出器驅動部140,以及設置在頂出器單元120下方並配置為限制頂出器單元120向下運動的止動構件165。具體地,根據本發明的實施方式,頂出器構件122可以同時被頂出器驅動部140提升,然後藉由頂出器驅動部140和止動構件165從外到內依序降低。The
頂出器單元120可以包括分別設置在頂出器構件122的下端部分並沿頂出器構件122的升高方向(即垂直方向)布置的多個凸緣124、設置在除凸緣124中最上凸緣124A之外的剩餘凸緣124B、124C和124D之間的彈性構件126、設置在凸緣124中最下凸緣124D下方的升降頭128、以及連接最上凸緣124A和升降頭128的連接構件130。例如,螺旋彈簧可用作彈性構件126,而連接銷可用作連接構件130。The
凸緣124可以具有盤狀。例如,頂出器單元120可以包括圍繞第一頂出器構件122A的下部的第一凸緣124A,圍繞第二頂出器構件122B的下部的第二凸緣124B,圍繞第三頂出器構件122C的下部的第三凸緣124C,圍繞第四頂出器構件122D的下部的第四凸緣124D。如圖3所示,使用了四個頂出器構件122和四個凸緣124,但頂出器構件122和凸緣124的數量可以不同程度地改變,因此,本發明的範圍將不受頂出器構件122和凸緣124的數量限制。The
連接銷130可用於連接最上凸緣124A和升降頭128。連接銷130的下部可穿過除最上凸緣124A之外的剩餘凸緣124B、124C和124D,並且能夠以螺栓緊固的方法耦接到升降頭128,並且連接銷130的上部可以藉由緊固構件132(例如螺栓)安裝到最上凸緣124A。Connecting
頂出器單元120可以包括第二止動構件134,其用於限制剩餘凸緣,即除了最上凸緣124A和最下凸緣124D(即凸緣124中的第一凸緣124A和第四凸緣124D)之外的第二凸緣124B和第三凸緣124C,被彈性構件126提升的高度。例如,可以用螺栓作為第二止動構件134,第二止動構件134可以穿過除最上凸緣124A和最下凸緣124D之外的剩餘凸緣124B和124C,並可緊固至設置於剩餘凸緣124B和124C下方的凸緣124C和124D。即,第二止動構件134可以穿過第二凸緣124B和第三凸緣124C,並可緊固至第三凸緣124C和第四凸緣124D,如圖3所示。具體地,第二凸緣124B和第三凸緣124C可以有平底的沉頭孔,第二止動構件134的頭部插入其中,沉頭孔可以形成為比第二止動構件134的頭部高度更深,使得即使凸緣124彼此緊密接觸時,第二止動構件134的頭部也不會向上凸出。The
頂出器驅動部140可以設置在頂出器單元120的下方,並且可以與升降頭128的下部連接。例如,升降頭128可以具有盤狀,並且最下凸緣124D可以設置在升降頭128上。頂出器驅動部140可以提升升降頭128,並且最下凸緣124D可以因此被頂出器驅動部140提升。此外,最上凸緣124A可以藉由連接銷130與最下凸緣124D同時提升,而第二凸緣124B和第三凸緣124C可以藉由彈性構件126與最上凸緣124A和最下凸緣124D同時提升。因此,與凸緣124相連的頂出器構件122可以同時被頂出器驅動部140提升。The
最上凸緣124A的高度可由連接銷130的長度決定。此外,除最上凸緣124A之外的剩餘凸緣124B、124C和124D之間的距離可藉由彈性構件126和第二止動構件134持續保持。此時,最上凸緣124A和第二凸緣124B之間的距離可以與剩餘凸緣124B、124C和124D之間的距離相同。The height of the
頂出器驅動部140可以包括連接到升降頭128並向下延伸的第一驅動軸144,以及配置為使第一驅動軸144升高的第一驅動單元150。例如,具有盤狀的驅動頭142可以耦接到第一驅動軸144的上端部分,並且升降頭128可以耦接到驅動頭142的上表面。The
具體地,配置為圍繞第一驅動軸144的上部的電磁鐵146可以設置在驅動頭142的下方,並且可以提供電磁力以將升降頭128耦接到驅動頭142的上表面。作為另一個示例,永久磁鐵(未示出)可用於將升降頭128耦接到驅動頭142。在這種情況下,永久磁鐵可以設置在驅動頭142中。Specifically, an
根據本發明的實施方式,晶片頂出器100可以包括用於升高止動構件165的止動驅動部170,以在頂出器驅動部140提升頂出器構件122之後調節止動構件165的高度。According to an embodiment of the present invention, the
在頂出器構件122同時被頂出器驅動部140提升之後,止動驅動部170可以將止動構件165提升到預定的高度。其後,頂出器驅動部140可以降低頂出器單元120。在最下凸緣124D(即第四凸緣124D)置於止動構件165上之後,最上凸緣124A(即第一凸緣124A)可藉由連接銷130和頂出器驅動部140降低,然後第二凸緣124B和第三凸緣124C可以降低。在這種情況下,彈性構件126可以有向下逐漸增加的彈力。After the
例如,設置在第二凸緣124B和第三凸緣124C之間的第一彈性構件126A可以具有比設置在第三凸緣124C和第四凸緣124D之間的第二彈性構件126B更小的彈力。因此,在第一凸緣124A開始下降後,第二凸緣124B和第三凸緣124C可以依序下降。因此,除了最裡面的頂出器構件122D之外,剩餘頂出器構件122A、122B和122C可以從外到內依序下降。即,連接到第一凸緣124A的第一頂出器構件122A、連接到第二凸緣124B的第二頂出器構件122B和連接到第三凸緣124C的第三頂出器構件122C可以按順序降低。For example, the first
止動構件165可以具有圍繞升降頭128和驅動頭142的圓管形狀,並且止動驅動部170可以包括與止動構件165連接並且向下延伸的第二驅動軸174,以及用於升高第二驅動軸174的第二驅動單元180。例如,盤狀的止動頭172可以與第二驅動軸174的上端部分耦接,並且止動構件165可以藉由多個緊固構件176(例如多個螺栓)安裝到止動頭172的上表面。The
根據本發明的實施方式,第二驅動軸174可以具有圍繞第一驅動軸144的圓管形狀,並且用於沿升降方向(即垂直方向)引導第一驅動軸144的第一引導構件148可以設置在第一驅動軸144和第二驅動軸174之間。例如,在第一驅動軸144和第二驅動軸174之間可以設置第一線性球軸襯。According to an embodiment of the present invention, the
罩110可以包括盤狀的蓋子112(在蓋子112中形成有開口112A和真空孔112B),以及具有圓管形狀的罩主體114。在這種情況下,蓋子112可以耦接到罩主體114的上部。進一步地,晶片頂出器100可以包括頂出器主體200,其與罩110的下部連接,即與罩主體114的下部連接,並具有圍繞第二驅動軸174的管狀形狀。例如,頂出器主體200可以包括中間管202和下管204,並且第一驅動軸144和第二驅動軸174可以向下延伸穿過頂出器主體200。在這種情況下,用於在罩110和頂出器主體200之間進行耦接的永久磁鐵206可以安裝在中間管202上。The
根據本發明的實施方式,配置為在升高方向上引導第二驅動軸174的第二引導構件178可以設置在第二驅動軸174和頂出器主體200之間,例如,在第二驅動軸174和下管204之間。例如,第二線性球軸襯可以設置在第二驅動軸174和頂出器主體200之間。According to an embodiment of the present invention, the
第一驅動單元150可以包括用於升高第一驅動軸144的第一凸輪構件152、用於旋轉第一凸輪構件152的第一馬達154、安裝在第一驅動軸144的下部的第一支架156、以及安裝到第一支架156並設置在第一凸輪構件152上的第一凸輪從動件158。第二驅動單元180可以包括用於升高第二驅動軸174的第二凸輪構件182、用於旋轉第二凸輪構件182的第二馬達184、安裝在第二驅動軸174的下部的第二支架186、以及安裝到第二支架186並設置在第二凸輪構件182上的第二凸輪從動件188。在這種情況下,第一凸輪從動件158和第二凸輪從動件188可以有滾子形狀。The
晶片頂出器100可以包括底座支架230,頂出器主體200以及第一驅動單元150和第二驅動單元180安裝在該底座支架230上。例如,底座支架230可以包括水平支架232以及垂直支架234,頂出器主體200安裝在該水平支架232上,以及第一馬達154和第二馬達184安裝在該垂直支架234上。The
圖6是如圖4所示的第一驅動單元的示意性正視圖,圖7是如圖4所示的第一驅動單元的示意性側視圖。圖8是如圖4所示的第二驅動單元的示意性正視圖,圖9是如圖4所示的第二驅動單元的示意性側視圖。圖10是如圖5所示的第三引導構件的示意性後視圖。FIG. 6 is a schematic front view of the first driving unit shown in FIG. 4 , and FIG. 7 is a schematic side view of the first driving unit shown in FIG. 4 . FIG. 8 is a schematic front view of the second driving unit shown in FIG. 4 , and FIG. 9 is a schematic side view of the second driving unit shown in FIG. 4 . FIG. 10 is a schematic rear view of the third guide member shown in FIG. 5 .
參照圖6至圖10,第一支架156可以包括耦接到第一驅動軸144的下部的連接塊156A、從連接塊156A向下延伸的一對延伸部分156B,以及將延伸部分156B的下端彼此連接並且第一凸輪從動件158安裝到其上的安裝部分156C。第二支架186可以包括具有圓管形狀並與第二驅動軸174的下部耦接的連接構件186A、從連接構件186A向下延伸的一對連接桿186B、以及與連接桿186B的下端部分耦接並且第二凸輪從動件188安裝到其上的滾子塊186C。6 to 10, the
第二凸輪構件182和第二凸輪從動件188可以設置在第一支架156的延伸部分156B之間。具體地,第二凸輪從動件188可以沿升高方向(即垂直方向)由第一支架156的延伸部分156B的內表面引導,從而防止第二驅動軸174旋轉。即,第一支架156的延伸部分156B可以作為用於沿垂直方向引導第二驅動軸174的引導構件,從而能夠防止止動構件165旋轉。The
根據本發明的實施方式,晶片頂出器100可以包括用於沿升高方向(即垂直方向)引導第一支架156的第三引導構件208。例如,如圖5和圖10所示,第三引導構件208可以包括安裝在頂出器主體200的下部(即下管204的下部)的一對引導滾子210,以便與第一支架156的側面部分緊密接觸。具體地,引導滾子210可以與第一支架156的延伸部分156B的側表面緊密接觸,從而防止第一支架156旋轉。因此,能夠防止頂出器單元120和第一驅動軸144旋轉。According to an embodiment of the present invention, the
再次參考圖3至圖5,第二彈性構件160可以設置在第一引導構件148和第一支架156之間,以便第一凸輪從動件158與第一凸輪構件152緊密接觸,並且第三彈性構件190可以設置在第二引導構件178和第二支架186之間,以便第二凸輪從動件188與第二凸輪構件182緊密接觸。例如,可以使用螺旋彈簧作為第二彈性構件160和第三彈性構件190。3 to 5 again, the second
罩110可以包括從罩主體114的內表面突出的第三止動構件116,以防止凸緣124從罩主體114分離。例如,可使用卡環作為第三止動構件116。卡環116可以安裝在罩主體114的內表面上,並且頂出器單元120可以設置在卡環116的上方。當更換罩110和頂出器單元120時,第三止動構件116可用於同時將罩110和頂出器單元120與頂出器主體200和頂出器驅動部140分離。此時,可切斷對電磁鐵146的供電,因此,罩110和頂出器單元120可以很容易地與頂出器主體200和頂出器驅動部140分離。The
可以在罩110和頂出器主體200內部提供用於真空吸收切割帶24的下表面的真空壓力。例如,下管204可以連接到真空源220,例如真空泵或真空頂出器,並且可以具有用於在罩110和中間管202內部提供真空壓力的第二真空孔204A。此外,如圖3所示,用於防止真空洩漏的密封構件可以設置在罩110和中間管202之間、中間管202和下管204之間、下管204和第二驅動軸174之間、以及止動頭172和第一驅動軸144之間。Vacuum pressure for vacuum absorbing the lower surface of the cutting
進一步地,可以在頂出器構件122中最內側的頂出器構件122D(即第四頂出器構件122D)內部設置用於真空吸附切割帶24的下表面的真空壓力。例如,頂出器單元120可以包括具有圓管並從最下凸緣124D向下延伸的延伸部分124E,並且延伸部分124E的內部可以與最內側頂出器構件122D的內部連接。升降頭128可以有延伸部分124E插入其中的第一通孔128A。第一驅動軸144可具有圓管形狀,並可藉由第一支架156的連接塊156A連接到用於提供真空壓力的真空源222,例如,真空泵或真空頂出器,如圖5所示。第一支架156的連接塊156A可以有第三真空孔156D,其用於連接真空源222和第一驅動軸144。驅動頭142可以有第二通孔142A,其用於連接升降頭128的第一通孔128A和第一驅動軸144。真空壓力可藉由第一支架156的連接塊156A、第一驅動軸144、驅動頭142和升降頭128提供給最內側的頂出器構件122D。Further, a vacuum pressure for vacuum absorbing the lower surface of the cutting
具體地,如圖3所示,頂出器構件122可以插入到開口112A中,以便頂出器構件122的上表面與罩110的上表面(即蓋子112的上表面)齊平。因此,藉由真空孔112B和最內側頂出器構件122D提供的真空壓力,可以將切割帶24真空吸附到罩110和頂出器構件122上。Specifically, as shown in FIG. 3 , the
根據本發明的實施方式,用於使切割帶22充脹的壓縮空氣可以供應到最內側的頂出器構件122D中。例如,用於供應壓縮空氣的壓縮空氣源224,例如,儲存壓縮空氣的空氣罐,可以藉由第一支架156的連接塊156A連接到第一驅動軸144,如圖5所示。此外,如圖3所示,為了防止壓縮空氣洩漏,可以在升降頭128和驅動頭142之間、以及在第一通孔128A的內表面和延伸部分124E之間設置密封構件。According to an embodiment of the present invention, compressed air for inflating the cutting
圖11至17是說明如圖3和圖4中所示的晶片頂出器的操作的示意性剖視圖。11 to 17 are schematic sectional views illustrating the operation of the wafer ejector shown in FIGS. 3 and 4 .
參照圖11,頂出器構件122和凸緣144可以同時被頂出器驅動部140提升,並且頂出器構件122可以從罩110的上表面向上突出。雖然在圖中沒有示出,但晶片22可由頂出器構件122提升,因此,晶片22的邊緣部分可以與切割帶24分離。具體地,頂出器構件122提升的高度可以進行微調,以防止對晶片22的損壞。例如,頂出器構件122提升的高度可以在大約幾十微米和幾百微米之間調節,並且可以根據晶片22的尺寸適當調節,以防止對晶片22的損壞。Referring to FIG. 11 , the
參照圖12,止動構件165可由止動驅動部170提升。例如,止動驅動部170可以提升止動構件165,使得止動構件165與最下凸緣124D的下表面接觸。然而,止動構件165的高度可以不同地改變,因此本發明的範圍將不受止動構件165的提升高度限制。另外,止動構件165可以與頂出器單元120同時提升。Referring to FIG. 12 , the
參照圖13,頂出器驅動部140可以在止動構件165升起後降低頂出器單元120。具體地,在最內側頂出器構件122D和最下凸緣124D被止動構件165支承的狀態下,升降頭128可由頂出器驅動部140降低,因此,連接到升降頭128的最上凸緣124A和最外側頂出器構件122A可以被連接銷130降低。然後,如圖14和15所示,連接到第二凸緣124B的第二頂出器構件122B和連接到第三凸緣124C的第三頂出器構件122C可依序降低。因此,切割帶24可以沿邊緣部分向晶片22的中心部分的方向與晶片22分離。Referring to FIG. 13 , the
參照圖16,在除最內側頂出器構件122D之外的剩餘頂出器構件122A、122B和122C被降低之後,晶片22可以由最內側頂出器構件122D支承。切割帶24可以藉由罩110內提供的真空壓力和最內側頂出器構件122D與晶片22分離。然後,如圖17所示,壓縮空氣可從壓縮空氣源224供應到最內側頂出器構件122D的內部,因此,切割帶24可被壓縮空氣向上充脹。結果,晶片22可以與切割帶24充分分離。然後,晶片22可由真空拾取器330拾起並轉移到晶片台架310上。Referring to FIG. 16 , after the remaining
根據本發明的實施方式,頂出器構件122可以同時提升,然後從外到內依序降低。因此,與傳統的晶片頂出器相比,晶片22被提升的高度可以減小,並且在拾起晶片22時可以防止晶片22被頂出器構件122損壞。具體地,在頂出器構件122和凸緣124被提升後,止動構件165可以限制頂出器構件122的下降高度。即,可以根據晶片22的大小,不同程度地改變頂出器構件122的提升高度和下降高度,因此,可以更有效地執行各種類型的晶片22的拾取步驟。According to an embodiment of the present invention, the
儘管已參考特定實施方式描述了本發明的示例性實施方式,但其不限於此。因此,本領域的技術人員將容易理解的是,在不脫離由所附申請專利範圍限定的本發明的精神和範圍的情況下,能夠對其進行各種修改和變化。Although the exemplary embodiments of the present invention have been described with reference to specific embodiments, it is not limited thereto. Accordingly, it will be readily understood by those skilled in the art that various modifications and changes can be made thereto without departing from the spirit and scope of the present invention defined by the appended claims.
10:晶片接合裝置 20:晶圓 22:晶片 24:切割帶 26:安裝框架 30:基板 40:卡匣 42:匣式裝載埠 44:晶圓轉移單元 46:晶圓導軌 50:第一箱盒 52:第一箱盒處理單元 54:第一箱盒裝載埠 56:第一箱盒轉移單元 60:第二箱盒 62:第二箱盒處理單元 64:第二箱盒裝載埠 66:第二箱盒轉移單元 70:基板轉移單元 72:基板導軌 74:夾持器 76:夾持器驅動部 78:第一推桿 80:第二推桿 100:晶片頂出器 110:罩 112:開口 112A:開口 112B:真空孔 114:罩主體 116:第三止動構件 120:頂出器單元 122:頂出器構件 122A:第一頂出器構件 122B:第二頂出器構件 122C:第三頂出器構件 122D:第四頂出器構件 124、124A、124B、124C、124D:凸緣 124E:延伸部分 126:彈性構件 126A:第一彈性構件 126B:第二彈性構件 128:升降頭 128A:第一通孔 130:連接銷 132:緊固構件 134:第二止動構件 140:頂出器驅動部 142:驅動頭 142A:第二通孔 144:第一驅動軸 146:電磁鐵 148:第一引導構件 150:第一驅動單元 152:第一凸輪構件 154:第一馬達 156:第一支架 156A:連接塊 156B:延伸部分 156C:安裝部分 156D:第三真空孔 158:第一凸輪從動件 160:第二彈性構件 165:止動構件 170:止動驅動部 172:止動頭 174:第二驅動軸 176:緊固構件 178:第二引導構件 180:第二驅動單元 182:第二凸輪構件 184:第二馬達 186:第二支架 186A:連接構件 186B:連接桿 186C:滾子塊 188:第二凸輪從動件 190:第三彈性構件 200:頂出器主體 202:中間管 204:下管 204A:第二真空孔 206 :永久磁鐵 208:第三引導構件 210:引導滾子 220:真空源 222:真空源 224:壓縮空氣源 230:底座支架 232:水平支架 234:垂直支架 300:晶片拾取模組 310:晶片台架 320:晶圓台架 322:支承環 324:夾具 330:真空拾取器 332:拾取器驅動部 340:攝像單元 400:晶片接合模組 410:接合頭 412:頭驅動部 420:基板台架10: Wafer bonding device 20: Wafer 22: Wafer 24: Cutting tape 26: Install the frame 30: Substrate 40: Cassette 42: Cassette loading port 44:Wafer transfer unit 46:Wafer rail 50: First Box 52: First box handling unit 54: First box loading port 56: First Box Transfer Unit 60: The second box 62: Second box handling unit 64:Second box loading port 66:Second box transfer unit 70: substrate transfer unit 72: Substrate rail 74: Gripper 76: Gripper drive unit 78: First Putt 80: second putter 100: wafer ejector 110: cover 112: opening 112A: opening 112B: vacuum hole 114: Cover main body 116: the third stop member 120: ejector unit 122: Ejector component 122A: first ejector member 122B: Second ejector member 122C: The third ejector member 122D: The fourth ejector member 124, 124A, 124B, 124C, 124D: Flange 124E: Extension 126: Elastic member 126A: first elastic member 126B: second elastic member 128: lifting head 128A: the first through hole 130: connection pin 132: fastening member 134: second stop member 140: Ejector drive unit 142: drive head 142A: Second through hole 144: The first drive shaft 146: electromagnet 148: first guide member 150: The first drive unit 152: first cam member 154: The first motor 156: The first bracket 156A: Connection block 156B: Extension 156C: Installation part 156D: The third vacuum hole 158: 1st cam follower 160: second elastic member 165: stop member 170: stop drive unit 172: stop head 174: Second drive shaft 176: fastening member 178: second guide member 180: Second drive unit 182: second cam member 184:Second motor 186: second bracket 186A: Connecting member 186B: connecting rod 186C: Roller block 188: Second cam follower 190: the third elastic member 200: ejector body 202: middle pipe 204: down tube 204A: Second vacuum hole 206 : permanent magnet 208: The third guiding member 210: guide roller 220: vacuum source 222: vacuum source 224: compressed air source 230: Base bracket 232: horizontal bracket 234: vertical support 300: Wafer pickup module 310: wafer stand 320: wafer stand 322: support ring 324: fixture 330: vacuum pickup 332:Pickup drive unit 340: camera unit 400: Wafer Bonding Module 410: joint head 412: Head drive unit 420: substrate stand
根據以下結合圖式的描述,能夠更加詳細地理解本發明的實施方式,其中:According to the following description in conjunction with the drawings, the embodiments of the present invention can be understood in more detail, wherein:
圖1是根據本發明的實施方式的晶片接合裝置的示意性俯視圖;1 is a schematic top view of a wafer bonding apparatus according to an embodiment of the present invention;
圖2是如圖1所示的晶片拾取模組的示意性正視圖;Fig. 2 is a schematic front view of the wafer pick-up module shown in Fig. 1;
圖3是如圖2所示的晶片頂出器的示意性剖視圖;Fig. 3 is a schematic cross-sectional view of the wafer ejector shown in Fig. 2;
圖4是如圖2所示的晶片頂出器的頂出器驅動部和止動驅動部的示意性剖視圖;Fig. 4 is a schematic cross-sectional view of an ejector driving part and a stop driving part of the wafer ejector shown in Fig. 2;
圖5是如圖4中所示的頂出器驅動部和止動驅動部的示意性側視圖;Fig. 5 is a schematic side view of the ejector driving part and the stop driving part as shown in Fig. 4;
圖6是如圖4所示的第一驅動單元的示意性正視圖;Fig. 6 is a schematic front view of the first drive unit shown in Fig. 4;
圖7是如圖4所示的第一驅動單元的示意性側視圖;Fig. 7 is a schematic side view of the first drive unit shown in Fig. 4;
圖8是如圖4所示的第二驅動單元的示意性正視圖;Fig. 8 is a schematic front view of the second drive unit shown in Fig. 4;
圖9是如圖4所示的第二驅動單元的示意性側視圖;Fig. 9 is a schematic side view of the second drive unit shown in Fig. 4;
圖10是如圖5所示的第三引導構件的示意性後視圖;以及Figure 10 is a schematic rear view of the third guide member as shown in Figure 5; and
圖11至17是說明如圖3和圖4所示的晶片頂出器的操作的示意性剖視圖。11 to 17 are schematic sectional views illustrating the operation of the wafer ejector shown in FIGS. 3 and 4 .
雖然各種實施方式適合於各種修改和替代形式,但其具體細節已藉由示例的方式在圖式中示出且將更詳細地進行描述。然而,應理解的是其意圖並非將所要求保護的本發明限定於記載的特定實施方式。相反地,其意圖是涵蓋落入藉由申請專利範圍所限定的主題的精神和範圍內的所有修改、等同物和替代物。While various embodiments are susceptible to various modifications and alternative forms, specific details thereof have been shown in the drawings, by way of example, and will be described in more detail. It should be understood, however, that the intention is not to limit the invention as claimed to the particular embodiments described. On the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the subject matter defined by the claims.
100:晶片頂出器 100: wafer ejector
110:罩 110: cover
112:開口 112: opening
112A:開口 112A: opening
112B:真空孔 112B: vacuum hole
114:罩主體 114: Cover main body
116:第三止動構件 116: the third stop member
120:頂出器單元 120: ejector unit
122:頂出器構件 122: Ejector component
122A:第一頂出器構件 122A: first ejector member
122B:第二頂出器構件 122B: Second ejector member
122C:第三頂出器構件 122C: The third ejector member
122D:第四頂出器構件 122D: The fourth ejector member
124、124A、124B、124C、124D:凸緣 124, 124A, 124B, 124C, 124D: Flange
124E:延伸部分 124E: Extension
126:彈性構件 126: Elastic member
126A:第一彈性構件 126A: first elastic member
126B:第二彈性構件 126B: second elastic member
128:升降頭 128: lifting head
128A:第一通孔 128A: the first through hole
130:連接銷 130: connection pin
132:緊固構件 132: fastening member
134:第二止動構件 134: second stop member
140:頂出器驅動部 140: Ejector drive unit
142:驅動頭 142: drive head
142A:第二通孔 142A: Second through hole
144:第一驅動軸 144: The first drive shaft
146:電磁鐵 146: electromagnet
148:第一引導構件 148: first guide member
160:第二彈性構件 160: second elastic member
165:止動構件 165: stop member
170:止動驅動部 170: stop drive unit
172:止動頭 172: stop head
174:第二驅動軸 174: Second drive shaft
176:緊固構件 176: fastening member
178:第二引導構件 178: second guide member
190:第三彈性構件 190: the third elastic member
200:頂出器主體 200: ejector body
202:中間管 202: middle pipe
204:下管 204: down tube
204A:第二真空孔 204A: Second vacuum hole
206:永久磁鐵 206: permanent magnet
Claims (20)
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KR1020200084728A KR102617784B1 (en) | 2020-07-09 | 2020-07-09 | Die ejector and die bonding apparatus including the same |
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CN (1) | CN113921453A (en) |
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US20020069952A1 (en) * | 2000-12-11 | 2002-06-13 | Kabushiki Kaisha Toshiba | Semiconductor chip pickup device and pickup method |
TW200500284A (en) * | 2003-04-14 | 2005-01-01 | Texas Instruments Inc | Semiconductor chip pick and place process and equipment |
US20140238618A1 (en) * | 2013-02-28 | 2014-08-28 | Samsung Electronics Co., Ltd. | Die ejector and die separation method |
KR102009922B1 (en) * | 2018-03-19 | 2019-08-12 | 세메스 주식회사 | Apparatus for ejecting a die |
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JP3817894B2 (en) * | 1998-04-06 | 2006-09-06 | 三菱電機株式会社 | Chip push-up device and die bonding device using the same |
TWI463580B (en) * | 2007-06-19 | 2014-12-01 | Renesas Electronics Corp | Manufacturing method of semiconductor integrated circuit device |
JP5284144B2 (en) | 2009-03-11 | 2013-09-11 | 芝浦メカトロニクス株式会社 | Semiconductor chip pickup device and pickup method |
JP2013033850A (en) | 2011-08-02 | 2013-02-14 | Shibaura Mechatronics Corp | Pickup device and pickup method for semiconductor chip |
JP2018182278A (en) | 2017-04-07 | 2018-11-15 | 芝浦メカトロニクス株式会社 | Pick-up apparatus and implementation apparatus for semiconductor chip |
JP7217605B2 (en) * | 2018-09-21 | 2023-02-03 | ファスフォードテクノロジ株式会社 | Semiconductor manufacturing equipment, push-up jig, and semiconductor device manufacturing method |
KR102165569B1 (en) * | 2018-10-15 | 2020-10-14 | 세메스 주식회사 | A die ejecting apparatus |
KR102656718B1 (en) * | 2018-11-05 | 2024-04-12 | 세메스 주식회사 | Die ejecting apparatus |
KR102220340B1 (en) * | 2019-06-11 | 2021-02-25 | 세메스 주식회사 | Die ejecting apparatus |
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US20020069952A1 (en) * | 2000-12-11 | 2002-06-13 | Kabushiki Kaisha Toshiba | Semiconductor chip pickup device and pickup method |
TW200500284A (en) * | 2003-04-14 | 2005-01-01 | Texas Instruments Inc | Semiconductor chip pick and place process and equipment |
US20140238618A1 (en) * | 2013-02-28 | 2014-08-28 | Samsung Electronics Co., Ltd. | Die ejector and die separation method |
KR102009922B1 (en) * | 2018-03-19 | 2019-08-12 | 세메스 주식회사 | Apparatus for ejecting a die |
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KR20220006828A (en) | 2022-01-18 |
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