TWI774640B - 凸塊形成用膜、半導體裝置及其製造方法、以及連接構造體 - Google Patents

凸塊形成用膜、半導體裝置及其製造方法、以及連接構造體 Download PDF

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TWI774640B
TWI774640B TW105101040A TW105101040A TWI774640B TW I774640 B TWI774640 B TW I774640B TW 105101040 A TW105101040 A TW 105101040A TW 105101040 A TW105101040 A TW 105101040A TW I774640 B TWI774640 B TW I774640B
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bumps
bump
film
forming
conductive filler
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TW105101040A
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English (en)
Chinese (zh)
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TW201639090A (zh
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阿久津恭志
石松朋之
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日商迪睿合股份有限公司
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Publication of TW201639090A publication Critical patent/TW201639090A/zh
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Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7000685B2 (ja) * 2017-02-07 2022-01-20 昭和電工マテリアルズ株式会社 接続構造体の製造方法、及び、端子付き電極の製造方法並びにこれに用いられる導電粒子
CN112166529A (zh) * 2018-06-06 2021-01-01 迪睿合株式会社 连接体、连接体的制造方法、连接方法
WO2019235596A1 (ja) * 2018-06-06 2019-12-12 デクセリアルズ株式会社 接続体、接続体の製造方法、接続方法
JP7452418B2 (ja) * 2018-06-26 2024-03-19 株式会社レゾナック 異方性導電フィルム及びその製造方法並びに接続構造体の製造方法
KR102786343B1 (ko) * 2018-06-26 2025-03-26 가부시끼가이샤 레조낙 땜납 입자 및 땜납 입자의 제조 방법
KR102856173B1 (ko) 2018-06-26 2025-09-04 가부시끼가이샤 레조낙 땜납 입자
US12246398B2 (en) 2019-12-27 2025-03-11 Resonac Corporation Solder bump forming member, method for manufacturing solder bump forming member, and method for manufacturing electrode substrate provided with solder bump
JP7661891B2 (ja) * 2019-12-27 2025-04-15 株式会社レゾナック はんだバンプ形成用部材、はんだバンプ形成用部材の製造方法、及びはんだバンプ付き電極基板の製造方法
EP4191644A4 (en) * 2020-07-27 2024-02-07 Sony Semiconductor Solutions Corporation ELECTRONIC DEVICE
KR20220155139A (ko) 2021-05-14 2022-11-22 삼성전자주식회사 반도체 패키지
JP7697292B2 (ja) * 2021-06-30 2025-06-24 株式会社レゾナック はんだバンプ形成装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3362370B2 (ja) * 1998-05-14 2003-01-07 住友ベークライト株式会社 導電性ボール配列シートおよび導電性ボール配列シート製造装置
JP2003220669A (ja) * 2002-01-29 2003-08-05 Asahi Kasei Corp 異方性を有する導電性接着シートおよびその製造方法
JP2004080024A (ja) * 2002-08-02 2004-03-11 Senju Metal Ind Co Ltd はんだボール配置シート、その製造方法およびはんだバンプ形成方法
TW200849506A (en) * 2007-03-30 2008-12-16 Sumitomo Bakelite Co Connection structure for flip-chip semiconductor package, build-up layer material, sealing resin composition, and circuit substrate
US20090090545A1 (en) * 2006-04-27 2009-04-09 Taketoshi Usui Electroconductive Particle Placement Sheet and Anisotropic Electroconductive Film
TW201101399A (en) * 2009-06-02 2011-01-01 Stats Chippac Ltd Semiconductor device and method of forming UBM fixed relative to interconnect structure for alignment of semiconductor die

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62229714A (ja) 1986-03-31 1987-10-08 日東電工株式会社 異方導電性シ−ト
JPH0574512A (ja) 1991-09-12 1993-03-26 Japan Aviation Electron Ind Ltd 電気接続用コネクタ
JP3812682B2 (ja) 1994-05-10 2006-08-23 日立化成工業株式会社 異方導電性樹脂フィルム状成形物の製造法
JP4032439B2 (ja) 1996-05-23 2008-01-16 日立化成工業株式会社 接続部材および該接続部材を用いた電極の接続構造並びに接続方法
JPH09320345A (ja) 1996-05-31 1997-12-12 Whitaker Corp:The 異方導電性フィルム
JPH10135224A (ja) 1996-11-01 1998-05-22 Citizen Watch Co Ltd 半導体素子のバンプ形成方法
US7842599B2 (en) * 1997-05-27 2010-11-30 Wstp, Llc Bumping electronic components using transfer substrates
CN1477703A (zh) 2002-08-02 2004-02-25 ǧס������ҵ��ʽ���� 焊球组件及其生产方法,形成焊块的方法
JP3582654B2 (ja) 2002-10-04 2004-10-27 日立化成工業株式会社 接続部材
JP2004256788A (ja) * 2002-11-29 2004-09-16 Sekisui Chem Co Ltd 加熱消滅性材料
JP2005286349A (ja) 2005-05-23 2005-10-13 Sony Chem Corp バンプレス半導体装置
JPWO2007023834A1 (ja) * 2005-08-23 2009-02-26 株式会社ブリヂストン 接着剤組成物
US20070063344A1 (en) * 2005-09-22 2007-03-22 Chun-Hung Lin Chip package structure and bumping process
KR100772454B1 (ko) 2006-04-24 2007-11-01 엘지전자 주식회사 이방성 도전 필름 및 그 제조방법
US9123835B2 (en) * 2006-10-10 2015-09-01 Hitachi Chemical Company, Ltd. Connected structure and method for manufacture thereof
JP2008031483A (ja) 2007-09-03 2008-02-14 Hitachi Chem Co Ltd 接続部材および該接続部材を用いた電極の接続構造並びに接続方法
JP5291917B2 (ja) * 2007-11-09 2013-09-18 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
JP6061443B2 (ja) 2010-12-24 2017-01-18 デクセリアルズ株式会社 異方性導電接着フィルム、接続構造体及びその製造方法
JP2012190871A (ja) * 2011-03-09 2012-10-04 Teramikros Inc 半導体装置およびその製造方法
CN109334132B (zh) 2012-08-24 2022-02-25 迪睿合电子材料有限公司 各向异性导电膜及其制造方法
JP6024623B2 (ja) 2012-08-29 2016-11-16 デクセリアルズ株式会社 異方性導電フィルム及びその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3362370B2 (ja) * 1998-05-14 2003-01-07 住友ベークライト株式会社 導電性ボール配列シートおよび導電性ボール配列シート製造装置
JP2003220669A (ja) * 2002-01-29 2003-08-05 Asahi Kasei Corp 異方性を有する導電性接着シートおよびその製造方法
JP2004080024A (ja) * 2002-08-02 2004-03-11 Senju Metal Ind Co Ltd はんだボール配置シート、その製造方法およびはんだバンプ形成方法
US20090090545A1 (en) * 2006-04-27 2009-04-09 Taketoshi Usui Electroconductive Particle Placement Sheet and Anisotropic Electroconductive Film
TW200849506A (en) * 2007-03-30 2008-12-16 Sumitomo Bakelite Co Connection structure for flip-chip semiconductor package, build-up layer material, sealing resin composition, and circuit substrate
TW201101399A (en) * 2009-06-02 2011-01-01 Stats Chippac Ltd Semiconductor device and method of forming UBM fixed relative to interconnect structure for alignment of semiconductor die

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CN107112253B (zh) 2021-04-20
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