TWI756375B - 具有電荷分布結構之開關裝置 - Google Patents

具有電荷分布結構之開關裝置 Download PDF

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Publication number
TWI756375B
TWI756375B TW107107056A TW107107056A TWI756375B TW I756375 B TWI756375 B TW I756375B TW 107107056 A TW107107056 A TW 107107056A TW 107107056 A TW107107056 A TW 107107056A TW I756375 B TWI756375 B TW I756375B
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TW
Taiwan
Prior art keywords
conductive
active layer
distribution structure
charge distribution
charge
Prior art date
Application number
TW107107056A
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English (en)
Chinese (zh)
Other versions
TW201836149A (zh
Inventor
阿列克謝 庫迪莫夫
賈邁爾 拉馬達尼
Original Assignee
美商電源整合公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from US15/448,724 external-priority patent/US10192981B2/en
Application filed by 美商電源整合公司 filed Critical 美商電源整合公司
Publication of TW201836149A publication Critical patent/TW201836149A/zh
Application granted granted Critical
Publication of TWI756375B publication Critical patent/TWI756375B/zh

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    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/60Insulated-gate field-effect transistors [IGFET]
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D30/00Field-effect transistors [FET]
    • H10D30/40FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels
    • H10D30/47FETs having zero-dimensional [0D], one-dimensional [1D] or two-dimensional [2D] charge carrier gas channels having 2D charge carrier gas channels, e.g. nanoribbon FETs or high electron mobility transistors [HEMT]
    • H10D30/471High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT]
    • H10D30/475High electron mobility transistors [HEMT] or high hole mobility transistors [HHMT] having wider bandgap layer formed on top of lower bandgap active layer, e.g. undoped barrier HEMTs such as i-AlGaN/GaN HEMTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/17Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
    • H10D62/213Channel regions of field-effect devices
    • H10D62/221Channel regions of field-effect devices of FETs
    • H10D62/235Channel regions of field-effect devices of FETs of IGFETs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/111Field plates
    • H10D64/112Field plates comprising multiple field plate segments
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/80Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials
    • H10D62/85Semiconductor bodies, or regions thereof, of devices having potential barriers characterised by the materials being Group III-V materials, e.g. GaAs
    • H10D62/8503Nitride Group III-V materials, e.g. AlN or GaN

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  • Junction Field-Effect Transistors (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
TW107107056A 2017-03-03 2018-03-02 具有電荷分布結構之開關裝置 TWI756375B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US15/448,724 2017-03-03
US15/448,724 US10192981B2 (en) 2012-06-29 2017-03-03 Switching device with charge distribution structure

Publications (2)

Publication Number Publication Date
TW201836149A TW201836149A (zh) 2018-10-01
TWI756375B true TWI756375B (zh) 2022-03-01

Family

ID=61563158

Family Applications (1)

Application Number Title Priority Date Filing Date
TW107107056A TWI756375B (zh) 2017-03-03 2018-03-02 具有電荷分布結構之開關裝置

Country Status (4)

Country Link
EP (1) EP3370260A1 (enExample)
JP (1) JP7154015B2 (enExample)
CN (1) CN108538917A (enExample)
TW (1) TWI756375B (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20250046345A (ko) 2019-07-12 2025-04-02 파워 인티그레이션즈, 인크. 고 전자 이동도 트랜지스터의 고 전압 동작을 향상시키기 위한 정전용량 네트워크 및 그 방법
CN112768358B (zh) * 2020-12-31 2024-08-09 扬州扬杰电子科技股份有限公司 一种氮化镓高电子迁移率晶体管及其制备方法
US11774296B2 (en) * 2021-11-11 2023-10-03 Alpha And Omega Semiconductor International Lp Method and circuit for sensing MOSFET temperature for load switch application

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014004764A1 (en) * 2012-06-29 2014-01-03 Power Integrations, Inc. Switching device with charge distribution structure

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008034522A (ja) 2006-07-27 2008-02-14 Oki Electric Ind Co Ltd 電界効果トランジスタ
JP5609083B2 (ja) * 2009-12-01 2014-10-22 日本電気株式会社 半導体装置、電子装置、半導体装置の製造方法および使用方法
US10002957B2 (en) * 2011-12-21 2018-06-19 Power Integrations, Inc. Shield wrap for a heterostructure field effect transistor
US20140001479A1 (en) 2012-06-29 2014-01-02 Power Integrations, Inc. Switching device with charge distribution structure
JP6270572B2 (ja) 2014-03-19 2018-01-31 株式会社東芝 半導体装置及びその製造方法
WO2016100805A1 (en) * 2014-12-19 2016-06-23 Sensor Electronic Technology, Inc. Semiconductor device with multiple space-charge control electrodes

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2014004764A1 (en) * 2012-06-29 2014-01-03 Power Integrations, Inc. Switching device with charge distribution structure

Also Published As

Publication number Publication date
EP3370260A1 (en) 2018-09-05
TW201836149A (zh) 2018-10-01
JP2018152555A (ja) 2018-09-27
CN108538917A (zh) 2018-09-14
JP7154015B2 (ja) 2022-10-17

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