TWI755648B - 氧化物燒結體、濺鍍靶及氧化物薄膜之製造方法 - Google Patents
氧化物燒結體、濺鍍靶及氧化物薄膜之製造方法 Download PDFInfo
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- TWI755648B TWI755648B TW108140105A TW108140105A TWI755648B TW I755648 B TWI755648 B TW I755648B TW 108140105 A TW108140105 A TW 108140105A TW 108140105 A TW108140105 A TW 108140105A TW I755648 B TWI755648 B TW I755648B
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- Prior art keywords
- sintered body
- oxide sintered
- sputtering target
- sputtering
- oxide
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- 238000005477 sputtering target Methods 0.000 title claims description 67
- 238000004519 manufacturing process Methods 0.000 title claims description 11
- 239000010409 thin film Substances 0.000 title claims description 11
- 239000011701 zinc Substances 0.000 claims abstract description 50
- 239000013078 crystal Substances 0.000 claims abstract description 36
- 239000002245 particle Substances 0.000 claims abstract description 31
- 229910052738 indium Inorganic materials 0.000 claims abstract description 11
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 claims abstract description 9
- 229910052733 gallium Inorganic materials 0.000 claims abstract description 8
- 229910052725 zinc Inorganic materials 0.000 claims abstract description 7
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 claims abstract description 6
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000004544 sputter deposition Methods 0.000 claims description 24
- 238000002441 X-ray diffraction Methods 0.000 claims description 15
- 238000005259 measurement Methods 0.000 claims description 13
- 230000003746 surface roughness Effects 0.000 claims description 7
- 239000010408 film Substances 0.000 claims description 3
- 230000005855 radiation Effects 0.000 claims 1
- 239000000843 powder Substances 0.000 description 31
- 238000000034 method Methods 0.000 description 21
- 230000000052 comparative effect Effects 0.000 description 18
- 239000002994 raw material Substances 0.000 description 18
- 239000011812 mixed powder Substances 0.000 description 14
- 239000002002 slurry Substances 0.000 description 12
- 230000002159 abnormal effect Effects 0.000 description 11
- 239000002612 dispersion medium Substances 0.000 description 9
- 238000010304 firing Methods 0.000 description 9
- 229910052751 metal Inorganic materials 0.000 description 9
- 238000002156 mixing Methods 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000005245 sintering Methods 0.000 description 7
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 7
- 238000009694 cold isostatic pressing Methods 0.000 description 6
- 239000006259 organic additive Substances 0.000 description 6
- 238000001878 scanning electron micrograph Methods 0.000 description 6
- 239000002131 composite material Substances 0.000 description 5
- 238000005520 cutting process Methods 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910005191 Ga 2 O 3 Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000005336 cracking Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000007580 dry-mixing Methods 0.000 description 4
- 238000011156 evaluation Methods 0.000 description 4
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- 239000000853 adhesive Substances 0.000 description 3
- 230000001070 adhesive effect Effects 0.000 description 3
- 229910052802 copper Inorganic materials 0.000 description 3
- 239000010949 copper Substances 0.000 description 3
- 239000002270 dispersing agent Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 3
- 230000004048 modification Effects 0.000 description 3
- 238000012986 modification Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000523 sample Substances 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 239000007864 aqueous solution Substances 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 238000003702 image correction Methods 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 238000000691 measurement method Methods 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 229910017604 nitric acid Inorganic materials 0.000 description 2
- 238000005498 polishing Methods 0.000 description 2
- 238000007788 roughening Methods 0.000 description 2
- 238000007569 slipcasting Methods 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- NAWXUBYGYWOOIX-SFHVURJKSA-N (2s)-2-[[4-[2-(2,4-diaminoquinazolin-6-yl)ethyl]benzoyl]amino]-4-methylidenepentanedioic acid Chemical compound C1=CC2=NC(N)=NC(N)=C2C=C1CCC1=CC=C(C(=O)N[C@@H](CC(=C)C(O)=O)C(O)=O)C=C1 NAWXUBYGYWOOIX-SFHVURJKSA-N 0.000 description 1
- 238000007088 Archimedes method Methods 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 230000005856 abnormality Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 229910021417 amorphous silicon Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910001651 emery Inorganic materials 0.000 description 1
- 238000007676 flexural strength test Methods 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 230000008595 infiltration Effects 0.000 description 1
- 238000001764 infiltration Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000011505 plaster Substances 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000010008 shearing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 229910052596 spinel Inorganic materials 0.000 description 1
- 239000011029 spinel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000009763 wire-cut EDM Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
- C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
- C04B35/453—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on zinc, tin, or bismuth oxides or solid solutions thereof with other oxides, e.g. zincates, stannates or bismuthates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/08—Oxides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- H01L21/203—
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
- C04B2235/30—Constituents and secondary phases not being of a fibrous nature
- C04B2235/32—Metal oxides, mixed metal oxides, or oxide-forming salts thereof, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
- C04B2235/3286—Gallium oxides, gallates, indium oxides, indates, thallium oxides, thallates or oxide forming salts thereof, e.g. zinc gallate
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/76—Crystal structural characteristics, e.g. symmetry
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/77—Density
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/74—Physical characteristics
- C04B2235/78—Grain sizes and shapes, product microstructures, e.g. acicular grains, equiaxed grains, platelet-structures
- C04B2235/786—Micrometer sized grains, i.e. from 1 to 100 micron
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- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B2235/00—Aspects relating to ceramic starting mixtures or sintered ceramic products
- C04B2235/70—Aspects relating to sintered or melt-casted ceramic products
- C04B2235/96—Properties of ceramic products, e.g. mechanical properties such as strength, toughness, wear resistance
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Ceramic Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Structural Engineering (AREA)
- Physical Vapour Deposition (AREA)
- Compositions Of Oxide Ceramics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018080072 | 2018-04-18 | ||
| JP2018-080072 | 2018-04-18 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202006162A TW202006162A (zh) | 2020-02-01 |
| TWI755648B true TWI755648B (zh) | 2022-02-21 |
Family
ID=68239411
Family Applications (2)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108140105A TWI755648B (zh) | 2018-04-18 | 2018-10-02 | 氧化物燒結體、濺鍍靶及氧化物薄膜之製造方法 |
| TW107134810A TWI679292B (zh) | 2018-04-18 | 2018-10-02 | 氧化物燒結體、濺鍍靶及氧化物薄膜之製造方法 |
Family Applications After (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107134810A TWI679292B (zh) | 2018-04-18 | 2018-10-02 | 氧化物燒結體、濺鍍靶及氧化物薄膜之製造方法 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP6661041B2 (https=) |
| TW (2) | TWI755648B (https=) |
| WO (1) | WO2019202753A1 (https=) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2023102459A (ja) * | 2022-01-12 | 2023-07-25 | ケイブイマテリアルズ株式会社 | 酸化物スパッタリングターゲット、その製造方法、及び薄膜形成方法 |
| WO2025220274A1 (ja) * | 2024-04-17 | 2025-10-23 | Ｊｘ金属株式会社 | 焼結体及びスパッタリングターゲット並びに焼結体の製造方法 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20100300878A1 (en) * | 2008-06-10 | 2010-12-02 | Nippon Mining & Metals Co., Ltd. | Sintered Oxide Compact Target for Sputtering and Process for Producing the same |
| US20110306165A1 (en) * | 2007-12-27 | 2011-12-15 | Nippon Mining & Metals Co., Ltd. | METHOD FOR PRODUCING a-IGZO OXIDE THIN FILM |
| WO2013140838A1 (ja) * | 2012-03-22 | 2013-09-26 | 住友金属鉱山株式会社 | Ｉｎ－Ｇａ－Ｚｎ－Ｏ系酸化物焼結体とその製造方法およびスパッタリングターゲットと酸化物半導体膜 |
| TW201536936A (zh) * | 2014-03-28 | 2015-10-01 | Jx Nippon Mining & Metals Corp | 氧化物燒結體及由該氧化物燒結體構成之濺鍍靶 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3152108B2 (ja) * | 1994-06-13 | 2001-04-03 | 東ソー株式会社 | Ｉｔｏスパッタリングターゲット |
| JP3644647B2 (ja) * | 1995-04-25 | 2005-05-11 | Ｈｏｙａ株式会社 | 導電性酸化物およびそれを用いた電極 |
| CN102105619B (zh) * | 2008-06-06 | 2014-01-22 | 出光兴产株式会社 | 氧化物薄膜用溅射靶及其制造方法 |
| JP2012052227A (ja) * | 2010-08-05 | 2012-03-15 | Mitsubishi Materials Corp | スパッタリングターゲットの製造方法およびスパッタリングターゲット |
| JP5904056B2 (ja) * | 2012-08-22 | 2016-04-13 | 東ソー株式会社 | Ｉｇｚｏ焼結体、その製造方法及びスパッタリングターゲット |
| JP6264846B2 (ja) * | 2012-12-27 | 2018-01-24 | 東ソー株式会社 | 酸化物焼結体、スパッタリングターゲットおよびその製造方法 |
| JP6158129B2 (ja) * | 2014-03-28 | 2017-07-05 | 出光興産株式会社 | 酸化物焼結体及びスパッタリングターゲット |
| JP6398643B2 (ja) * | 2014-11-20 | 2018-10-03 | Tdk株式会社 | スパッタリングターゲット、透明導電性酸化物薄膜、及び導電性フィルム |
-
2018
- 2018-08-29 WO PCT/JP2018/032028 patent/WO2019202753A1/ja not_active Ceased
- 2018-10-02 TW TW108140105A patent/TWI755648B/zh active
- 2018-10-02 TW TW107134810A patent/TWI679292B/zh active
-
2019
- 2019-04-05 JP JP2019072693A patent/JP6661041B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20110306165A1 (en) * | 2007-12-27 | 2011-12-15 | Nippon Mining & Metals Co., Ltd. | METHOD FOR PRODUCING a-IGZO OXIDE THIN FILM |
| US20100300878A1 (en) * | 2008-06-10 | 2010-12-02 | Nippon Mining & Metals Co., Ltd. | Sintered Oxide Compact Target for Sputtering and Process for Producing the same |
| WO2013140838A1 (ja) * | 2012-03-22 | 2013-09-26 | 住友金属鉱山株式会社 | Ｉｎ－Ｇａ－Ｚｎ－Ｏ系酸化物焼結体とその製造方法およびスパッタリングターゲットと酸化物半導体膜 |
| TW201536936A (zh) * | 2014-03-28 | 2015-10-01 | Jx Nippon Mining & Metals Corp | 氧化物燒結體及由該氧化物燒結體構成之濺鍍靶 |
Also Published As
| Publication number | Publication date |
|---|---|
| TWI679292B (zh) | 2019-12-11 |
| TW202006162A (zh) | 2020-02-01 |
| JP6661041B2 (ja) | 2020-03-11 |
| TW201943876A (zh) | 2019-11-16 |
| WO2019202753A1 (ja) | 2019-10-24 |
| JP2019189517A (ja) | 2019-10-31 |
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