TWI748034B - 用於缺陷材料分類之系統及方法 - Google Patents
用於缺陷材料分類之系統及方法 Download PDFInfo
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- TWI748034B TWI748034B TW107100280A TW107100280A TWI748034B TW I748034 B TWI748034 B TW I748034B TW 107100280 A TW107100280 A TW 107100280A TW 107100280 A TW107100280 A TW 107100280A TW I748034 B TWI748034 B TW I748034B
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Images
Classifications
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- H—ELECTRICITY
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- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/30—Structural arrangements specially adapted for testing or measuring during manufacture or treatment, or specially adapted for reliability measurements
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- G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
- G01N21/64—Fluorescence; Phosphorescence
- G01N21/6428—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes"
- G01N21/643—Measuring fluorescence of fluorescent products of reactions or of fluorochrome labelled reactive substances, e.g. measuring quenching effects, using measuring "optrodes" non-biological material
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
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- H—ELECTRICITY
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- H01L22/10—Measuring as part of the manufacturing process
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- H—ELECTRICITY
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- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
- H01L22/24—Optical enhancement of defects or not directly visible states, e.g. selective electrolytic deposition, bubbles in liquids, light emission, colour change
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- G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
- G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
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- G01N21/645—Specially adapted constructive features of fluorimeters
- G01N21/6456—Spatial resolved fluorescence measurements; Imaging
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- G01N21/84—Systems specially adapted for particular applications
- G01N21/88—Investigating the presence of flaws or contamination
- G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
- G01N2021/8854—Grading and classifying of flaws
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- Health & Medical Sciences (AREA)
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- Immunology (AREA)
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- General Health & Medical Sciences (AREA)
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- Molecular Biology (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Optics & Photonics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Investigating Or Analysing Materials By Optical Means (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US201762442838P | 2017-01-05 | 2017-01-05 | |
| US62/442,838 | 2017-01-05 | ||
| US15/480,206 | 2017-04-05 | ||
| US15/480,206 US10234402B2 (en) | 2017-01-05 | 2017-04-05 | Systems and methods for defect material classification |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201831886A TW201831886A (zh) | 2018-09-01 |
| TWI748034B true TWI748034B (zh) | 2021-12-01 |
Family
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW107100280A TWI748034B (zh) | 2017-01-05 | 2018-01-04 | 用於缺陷材料分類之系統及方法 |
Country Status (8)
| Country | Link |
|---|---|
| US (2) | US10234402B2 (enExample) |
| JP (1) | JP6906614B2 (enExample) |
| KR (1) | KR102313412B1 (enExample) |
| CN (1) | CN110301038B (enExample) |
| DE (1) | DE112018000314T5 (enExample) |
| IL (2) | IL267771B (enExample) |
| TW (1) | TWI748034B (enExample) |
| WO (1) | WO2018128995A1 (enExample) |
Families Citing this family (34)
| Publication number | Priority date | Publication date | Assignee | Title |
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| US9995850B2 (en) | 2013-06-06 | 2018-06-12 | Kla-Tencor Corporation | System, method and apparatus for polarization control |
| US10234402B2 (en) * | 2017-01-05 | 2019-03-19 | Kla-Tencor Corporation | Systems and methods for defect material classification |
| US10192301B1 (en) * | 2017-08-16 | 2019-01-29 | Siemens Energy, Inc. | Method and system for detecting line defects on surface of object |
| US10215714B1 (en) * | 2017-08-16 | 2019-02-26 | Siemens Energy, Inc. | Method and system for detecting defects on surface of object |
| US11017520B2 (en) * | 2018-09-04 | 2021-05-25 | Kla Corporation | Multi-wavelength interferometry for defect classification |
| TWI705242B (zh) * | 2018-10-08 | 2020-09-21 | 銓發科技股份有限公司 | 光學檢測設備及方法 |
| US11262591B2 (en) | 2018-11-09 | 2022-03-01 | Kla Corporation | System and method for pumping laser sustained plasma with an illumination source having modified pupil power distribution |
| US10942135B2 (en) * | 2018-11-14 | 2021-03-09 | Kla Corporation | Radial polarizer for particle detection |
| TWI689722B (zh) * | 2018-12-04 | 2020-04-01 | 台灣積體電路製造股份有限公司 | 辨識晶圓上微塵顆粒的方法、電子裝置及電腦可讀取記錄媒體 |
| KR102324622B1 (ko) * | 2018-12-12 | 2021-11-12 | 어플라이드 머티리얼즈 이스라엘 리미티드 | 프로세스 모니터링 |
| US11137350B2 (en) * | 2019-01-28 | 2021-10-05 | Kla Corporation | Mid-infrared spectroscopy for measurement of high aspect ratio structures |
| US11294162B2 (en) * | 2019-02-07 | 2022-04-05 | Nanotronics Imaging, Inc. | Fluorescence microscopy inspection systems, apparatus and methods with darkfield channel |
| US10948423B2 (en) | 2019-02-17 | 2021-03-16 | Kla Corporation | Sensitive particle detection with spatially-varying polarization rotator and polarizer |
| US11703460B2 (en) * | 2019-07-09 | 2023-07-18 | Kla Corporation | Methods and systems for optical surface defect material characterization |
| CN111007016A (zh) * | 2019-12-09 | 2020-04-14 | 暨南大学 | 一种检测透明材料表面微小颗粒杂质的装置及使用方法 |
| CN111386441B (zh) * | 2020-02-24 | 2021-02-19 | 长江存储科技有限责任公司 | 用于半导体芯片表面形貌计量的系统 |
| CN111356896B (zh) | 2020-02-24 | 2021-01-12 | 长江存储科技有限责任公司 | 用于半导体芯片表面形貌计量的系统和方法 |
| WO2021168612A1 (en) | 2020-02-24 | 2021-09-02 | Yangtze Memory Technologies Co., Ltd. | Systems and methods for semiconductor chip surface topography metrology |
| CN111356897B (zh) | 2020-02-24 | 2021-02-19 | 长江存储科技有限责任公司 | 用于半导体芯片表面形貌计量的系统和方法 |
| CN115461683A (zh) * | 2020-04-24 | 2022-12-09 | Asml控股股份有限公司 | 污染物标识量测系统、光刻设备及其方法 |
| CN111879789A (zh) * | 2020-07-15 | 2020-11-03 | 深圳科瑞技术股份有限公司 | 金属表面缺陷检测方法及系统 |
| US12072267B2 (en) * | 2020-08-31 | 2024-08-27 | Applied Materials, Inc. | Method and hardware for post maintenance vacuum recovery system |
| CN111929310B (zh) * | 2020-09-25 | 2021-02-05 | 歌尔股份有限公司 | 表面缺陷检测方法、装置、设备及存储介质 |
| US20220139743A1 (en) * | 2020-11-04 | 2022-05-05 | Tokyo Electron Limited | Optical Sensor for Inspecting Pattern Collapse Defects |
| CN115248531A (zh) * | 2021-04-26 | 2022-10-28 | 上海微电子装备（集团）股份有限公司 | 颗粒度检测装置及其检测方法、光刻机 |
| US11664283B2 (en) * | 2021-08-20 | 2023-05-30 | Tokyo Electron Limited | Raman sensor for supercritical fluids metrology |
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| IL284286A (en) | 2021-07-29 |
| KR102313412B1 (ko) | 2021-10-14 |
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| CN110301038B (zh) | 2021-07-09 |
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| US20190212277A1 (en) | 2019-07-11 |
| KR20190095519A (ko) | 2019-08-14 |
| IL267771A (en) | 2019-09-26 |
| IL267771B (en) | 2021-07-29 |
| US10670537B2 (en) | 2020-06-02 |
| JP2020504304A (ja) | 2020-02-06 |
| DE112018000314T5 (de) | 2019-09-26 |
| IL284286B (en) | 2022-03-01 |
| WO2018128995A1 (en) | 2018-07-12 |
| CN110301038A (zh) | 2019-10-01 |
| US10234402B2 (en) | 2019-03-19 |
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