TWI747100B - 附有流路之板件 - Google Patents
附有流路之板件 Download PDFInfo
- Publication number
- TWI747100B TWI747100B TW108145427A TW108145427A TWI747100B TW I747100 B TWI747100 B TW I747100B TW 108145427 A TW108145427 A TW 108145427A TW 108145427 A TW108145427 A TW 108145427A TW I747100 B TWI747100 B TW I747100B
- Authority
- TW
- Taiwan
- Prior art keywords
- flow path
- embedded
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- buried
- shape
- Prior art date
Links
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Classifications
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- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
- F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
- F28D1/0246—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid heat-exchange elements having several adjacent conduits forming a whole, e.g. blocks
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/04—Apparatus for manufacture or treatment
- H10P72/0431—Apparatus for thermal treatment
- H10P72/0434—Apparatus for thermal treatment mainly by convection
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
- F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
- F28D1/0233—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with air flow channels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28D—HEAT-EXCHANGE APPARATUS, NOT PROVIDED FOR IN ANOTHER SUBCLASS, IN WHICH THE HEAT-EXCHANGE MEDIA DO NOT COME INTO DIRECT CONTACT
- F28D1/00—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators
- F28D1/02—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid
- F28D1/04—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits
- F28D1/053—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits the conduits being straight
- F28D1/0535—Heat-exchange apparatus having stationary conduit assemblies for one heat-exchange medium only, the media being in contact with different sides of the conduit wall, in which the other heat-exchange medium is a large body of fluid, e.g. domestic or motor car radiators with heat-exchange conduits immersed in the body of fluid with tubular conduits the conduits being straight the conduits having a non-circular cross-section
- F28D1/05358—Assemblies of conduits connected side by side or with individual headers, e.g. section type radiators
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F1/00—Tubular elements; Assemblies of tubular elements
- F28F1/02—Tubular elements of cross-section which is non-circular
- F28F1/025—Tubular elements of cross-section which is non-circular with variable shape, e.g. with modified tube ends, with different geometrical features
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F1/00—Tubular elements; Assemblies of tubular elements
- F28F1/02—Tubular elements of cross-section which is non-circular
- F28F1/04—Tubular elements of cross-section which is non-circular polygonal, e.g. rectangular
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F28—HEAT EXCHANGE IN GENERAL
- F28F—DETAILS OF HEAT-EXCHANGE AND HEAT-TRANSFER APPARATUS, OF GENERAL APPLICATION
- F28F9/00—Casings; Header boxes; Auxiliary supports for elements; Auxiliary members within casings
- F28F9/02—Header boxes; End plates
- F28F9/026—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits
- F28F9/0282—Header boxes; End plates with static flow control means, e.g. with means for uniformly distributing heat exchange media into conduits by varying the geometry of conduit ends, e.g. by using inserts or attachments for modifying the pattern of flow at the conduit inlet or outlet
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- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P72/00—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
- H10P72/70—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
- H10P72/76—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
- H10P72/7604—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
- H10P72/7624—Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Geometry (AREA)
- Drying Of Semiconductors (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2018234929 | 2018-12-14 | ||
| JP2018-234929 | 2018-12-14 | ||
| JP2019-184146 | 2019-10-04 | ||
| JP2019184146 | 2019-10-04 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW202025414A TW202025414A (zh) | 2020-07-01 |
| TWI747100B true TWI747100B (zh) | 2021-11-21 |
Family
ID=71075302
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW108145427A TWI747100B (zh) | 2018-12-14 | 2019-12-12 | 附有流路之板件 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20220026151A1 (https=) |
| EP (1) | EP3896722A4 (https=) |
| JP (1) | JP7324230B2 (https=) |
| KR (1) | KR102590641B1 (https=) |
| CN (1) | CN113169112B (https=) |
| TW (1) | TWI747100B (https=) |
| WO (1) | WO2020121898A1 (https=) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR102823387B1 (ko) | 2021-09-07 | 2025-06-23 | 선문대학교 산학협력단 | CYP154C3s 효소를 이용한 스테로이드의 하이드록시화 생물전환 방법 |
| KR20230036346A (ko) | 2021-09-07 | 2023-03-14 | 선문대학교 산학협력단 | Cyp125a13 효소를 이용한 스테로이드의 히드록시화 생물전환 방법 |
| KR20230036348A (ko) | 2021-09-07 | 2023-03-14 | 선문대학교 산학협력단 | 7α-히드록시스테로이드 탈수소 효소를 이용한 스테로이드의 탈수소화 생물전환 방법 |
| KR102638205B1 (ko) | 2021-09-13 | 2024-02-20 | 선문대학교 산학협력단 | Cyp105d18 효소를 이용한 이소퀴놀린 알칼로이드 화합물의 n-산화 생물전환 방법 |
| KR102902633B1 (ko) * | 2021-09-29 | 2025-12-22 | 삼성전자주식회사 | 복수의 전극을 포함하는 기판 처리 장치 |
| CN118077045A (zh) * | 2021-10-20 | 2024-05-24 | 日本特殊陶业株式会社 | 保持装置 |
| CN118280801A (zh) * | 2022-12-29 | 2024-07-02 | 中微半导体设备(上海)股份有限公司 | 一种多孔塞组件、静电吸盘及等离子体刻蚀装置 |
| KR102721433B1 (ko) * | 2023-02-27 | 2024-10-25 | 엔지케이 인슐레이터 엘티디 | 웨이퍼 적재대 |
| KR102685150B1 (ko) * | 2023-10-12 | 2024-07-16 | 주식회사 미코세라믹스 | 세라믹 서셉터 및 그 제조 방법 |
| JP7784470B2 (ja) * | 2024-04-08 | 2025-12-11 | 日本特殊陶業株式会社 | 保持装置 |
| KR102823869B1 (ko) | 2024-08-26 | 2025-06-23 | 주식회사 리더티앤디 | Mdf용 분체 도장 자동화 시스템 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040190215A1 (en) * | 1996-04-26 | 2004-09-30 | Applied Materials, Inc. | Electrostatic chuck having dielectric member with stacked layers and manufacture |
| TW201438141A (zh) * | 2013-03-29 | 2014-10-01 | Toto股份有限公司 | 靜電吸盤 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2559123Y2 (ja) * | 1992-03-31 | 1998-01-14 | 株式会社神戸製鋼所 | 真空アーク蒸着装置 |
| JP3965258B2 (ja) * | 1999-04-30 | 2007-08-29 | 日本碍子株式会社 | 半導体製造装置用のセラミックス製ガス供給構造 |
| US6490145B1 (en) * | 2001-07-18 | 2002-12-03 | Applied Materials, Inc. | Substrate support pedestal |
| JP2003338492A (ja) | 2002-05-21 | 2003-11-28 | Tokyo Electron Ltd | プラズマ処理装置 |
| JP4557814B2 (ja) * | 2005-06-09 | 2010-10-06 | パナソニック株式会社 | プラズマ処理装置 |
| JP5331519B2 (ja) * | 2008-03-11 | 2013-10-30 | 日本碍子株式会社 | 静電チャック |
| JP4590597B2 (ja) * | 2008-03-12 | 2010-12-01 | 国立大学法人東北大学 | シャワープレートの製造方法 |
| JP5449750B2 (ja) * | 2008-11-19 | 2014-03-19 | 株式会社日本セラテック | 静電チャックおよびその製造方法 |
| SG171420A1 (en) * | 2008-11-26 | 2011-07-28 | Nhk Spring Co Ltd | Probe-unit base member and probe unit |
| JP3154629U (ja) * | 2009-08-04 | 2009-10-22 | 日本碍子株式会社 | 静電チャック |
| JP6263484B2 (ja) * | 2015-01-30 | 2018-01-17 | 日本特殊陶業株式会社 | 静電チャックおよびその製造方法 |
| JP6257540B2 (ja) * | 2015-01-30 | 2018-01-10 | 日本特殊陶業株式会社 | 静電チャックおよびその製造方法 |
| JP6509139B2 (ja) * | 2016-01-29 | 2019-05-08 | 日本特殊陶業株式会社 | 基板支持装置及びその製造方法 |
| CN108649012B (zh) * | 2018-05-11 | 2021-10-01 | 北京华卓精科科技股份有限公司 | 新型陶瓷塞及具有该新型陶瓷塞的静电卡盘装置 |
-
2019
- 2019-12-03 KR KR1020217017681A patent/KR102590641B1/ko active Active
- 2019-12-03 JP JP2020559932A patent/JP7324230B2/ja active Active
- 2019-12-03 US US17/312,110 patent/US20220026151A1/en active Granted
- 2019-12-03 CN CN201980081476.3A patent/CN113169112B/zh active Active
- 2019-12-03 WO PCT/JP2019/047274 patent/WO2020121898A1/ja not_active Ceased
- 2019-12-03 EP EP19897308.3A patent/EP3896722A4/en active Pending
- 2019-12-12 TW TW108145427A patent/TWI747100B/zh active
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20040190215A1 (en) * | 1996-04-26 | 2004-09-30 | Applied Materials, Inc. | Electrostatic chuck having dielectric member with stacked layers and manufacture |
| TW201438141A (zh) * | 2013-03-29 | 2014-10-01 | Toto股份有限公司 | 靜電吸盤 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20210087536A (ko) | 2021-07-12 |
| TW202025414A (zh) | 2020-07-01 |
| JP7324230B2 (ja) | 2023-08-09 |
| CN113169112A (zh) | 2021-07-23 |
| KR102590641B1 (ko) | 2023-10-17 |
| JPWO2020121898A1 (ja) | 2021-11-25 |
| EP3896722A1 (en) | 2021-10-20 |
| US20220026151A1 (en) | 2022-01-27 |
| EP3896722A4 (en) | 2022-08-24 |
| CN113169112B (zh) | 2024-05-07 |
| WO2020121898A1 (ja) | 2020-06-18 |
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