TWI737491B - 包含多個可個別控制之寫入頭的微影裝置 - Google Patents

包含多個可個別控制之寫入頭的微影裝置 Download PDF

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Publication number
TWI737491B
TWI737491B TW109131151A TW109131151A TWI737491B TW I737491 B TWI737491 B TW I737491B TW 109131151 A TW109131151 A TW 109131151A TW 109131151 A TW109131151 A TW 109131151A TW I737491 B TWI737491 B TW I737491B
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Taiwan
Prior art keywords
light
individual
writing
substrate wafer
scanning
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TW109131151A
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English (en)
Chinese (zh)
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TW202105084A (zh
Inventor
史蒂芬 里奇特
安里柯 傑斯勒
德克 朵林
庫瑪 拉斯曼儂 森希爾
古特 魯道夫
馬丁 佛克
馬庫斯 狄君特
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德商卡爾蔡司Ｓｍｔ有限公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optics & Photonics (AREA)
  • Plasma & Fusion (AREA)
  • Mechanical Engineering (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Optical Integrated Circuits (AREA)
TW109131151A 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置 TWI737491B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102014224314 2014-11-27
DE102014224314.9 2014-11-27

Publications (2)

Publication Number Publication Date
TW202105084A TW202105084A (zh) 2021-02-01
TWI737491B true TWI737491B (zh) 2021-08-21

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ID=53039409

Family Applications (2)

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TW109131151A TWI737491B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置
TW104113490A TWI707207B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置

Family Applications After (1)

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TW104113490A TWI707207B (zh) 2014-11-27 2015-04-28 包含多個可個別控制之寫入頭的微影裝置

Country Status (7)

Country Link
US (2) US20170255110A1 (enExample)
EP (1) EP3224675A1 (enExample)
JP (2) JP2017535821A (enExample)
KR (2) KR102595081B1 (enExample)
CN (1) CN107003616B (enExample)
TW (2) TWI737491B (enExample)
WO (1) WO2016082941A1 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017535821A (ja) 2014-11-27 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置
US10288808B1 (en) 2016-01-22 2019-05-14 Seagate Technology Llc Laser direct writing for non-linear waveguides
US9864139B1 (en) * 2016-01-22 2018-01-09 Seagate Technology Llc Uniform laser direct writing for waveguides
US10684555B2 (en) * 2018-03-22 2020-06-16 Applied Materials, Inc. Spatial light modulator with variable intensity diodes
CN117242403A (zh) * 2021-04-27 2023-12-15 株式会社尼康 照明光学系统、曝光装置及平板显示器的制造方法
JP7626207B2 (ja) * 2021-04-27 2025-02-04 株式会社ニコン 照明光学系、露光装置、照明方法、デバイス製造方法及びフラットパネルディスプレイの製造方法
TWI905274B (zh) * 2021-09-24 2025-11-21 日商信越化學工業股份有限公司 掃描型縮小投影光學系統、雷射加工裝置、雷射誘導正向轉移裝置、雷射加工方法、雷射誘導正向轉移方法、封裝有照射對象物的基板的製造方法、封裝有微小元件的基板的製造方法、不良部位的去除方法以及再轉印方法
EP4180871A1 (en) * 2021-11-16 2023-05-17 Mycronic Ab Multi head scanning lithographic laser writer
CN116360221B (zh) * 2021-12-28 2026-06-30 上海芯上微装科技股份有限公司 曝光系统和曝光系统的剂量控制方法
CN117192913B (zh) * 2023-09-11 2025-05-16 安徽工程大学 一种基于三维移动曝光提高光刻分辨率的系统及方法
US12704409B1 (en) * 2025-08-06 2026-08-11 Beijing Transcend Vivoscope Bio-Technology Co., Ltd. Multi-wavelength fiber-optic imaging device and system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040037487A1 (en) * 2002-06-07 2004-02-26 Fuji Photo Film Co., Ltd. Optical wiring substrate fabrication process and optical wiring substrate device
US20040240813A1 (en) * 2003-05-29 2004-12-02 Dainippon Screen Mfg. Co., Ltd. Pattern writing apparatus
US20080226034A1 (en) * 2007-03-12 2008-09-18 Weir Michael P Power modulation of a scanning beam for imaging, therapy, and/or diagnosis

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57142603A (en) * 1981-02-27 1982-09-03 Canon Inc Optical scanner
US5015066A (en) * 1990-05-29 1991-05-14 Eastman Kodak Company Multichannel waveguide print head with symmetric output
JPH08272104A (ja) * 1995-03-31 1996-10-18 Sony Corp フォトレジストの露光方法及び装置
CN1159628C (zh) 1997-04-14 2004-07-28 迪科公司 用于点照明介质的照明装置和照明方法
US5930433A (en) * 1997-07-23 1999-07-27 Hewlett-Packard Company Waveguide array document scanner
US6731843B2 (en) 2000-12-29 2004-05-04 Intel Corporation Multi-level waveguide
US20020115742A1 (en) * 2001-02-22 2002-08-22 Trieu Hai H. Bioactive nanocomposites and methods for their use
IL142773A (en) * 2001-03-08 2007-10-31 Xtellus Inc Fiber optic damper
JP2002351086A (ja) 2001-03-22 2002-12-04 Fuji Photo Film Co Ltd 露光装置
US6573975B2 (en) * 2001-04-04 2003-06-03 Pradeep K. Govil DUV scanner linewidth control by mask error factor compensation
DE10122484A1 (de) * 2001-05-09 2002-11-28 Heidelberger Druckmasch Ag Verfahren und Vorrichtung zur Belichtung von Druckformen
JP2003022961A (ja) * 2001-07-10 2003-01-24 Nikon Corp アライメントマーク、荷電粒子線露光装置用レチクル及び荷電粒子線露光方法
US7057151B2 (en) 2001-08-31 2006-06-06 Universite Louis Pasteur Optical transmission apparatus with directionality and divergence control
US6960035B2 (en) * 2002-04-10 2005-11-01 Fuji Photo Film Co., Ltd. Laser apparatus, exposure head, exposure apparatus, and optical fiber connection method
JP2004062157A (ja) * 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd 光配線回路の製造方法、及びその光配線回路を備えた光配線基板
AT5708U3 (de) * 2002-07-17 2003-09-25 Plasser Bahnbaumasch Franz Maschine zur aufnahme von schwellen eines gleises
KR101368027B1 (ko) 2002-10-25 2014-02-26 마퍼 리쏘그라피 아이피 비.브이. 리소그라피 장치
DE10309084A1 (de) 2003-03-03 2004-09-16 Carl Zeiss Smt Ag Reflektives optisches Element und EUV-Lithographiegerät
US7448995B2 (en) * 2003-06-23 2008-11-11 Microvision, Inc. Scanning endoscope
US6936810B2 (en) * 2003-07-21 2005-08-30 Thomas Hiramatsu-Tie Method and apparatus for scanning an optical beam using an optical conduit
TW200602814A (en) * 2004-03-29 2006-01-16 Fuji Photo Film Co Ltd Exposure device
JP2006085072A (ja) * 2004-09-17 2006-03-30 Fuji Photo Film Co Ltd マルチビーム露光装置
US20060134535A1 (en) * 2004-12-22 2006-06-22 3M Innovative Properties Company Lensed fiber array for sub-micron optical lithography patterning
WO2007037394A1 (ja) * 2005-09-30 2007-04-05 Fujifilm Corporation 描画装置及び画像データの作成方法
DE102006008080A1 (de) 2006-02-22 2007-08-30 Kleo Maschinenbau Ag Belichtungsanlage
JP2008065306A (ja) * 2006-08-10 2008-03-21 Ricoh Printing Systems Ltd マルチビーム発生素子、マルチビームを用いた光記録装置
DE102006059818B4 (de) * 2006-12-11 2017-09-14 Kleo Ag Belichtungsanlage
FR2921501B1 (fr) * 2007-09-24 2009-12-18 Commissariat Energie Atomique Dispositif d'enregistrement et de lecture de donnees sur un support de stockage holographique
EP2208354A4 (en) * 2007-10-10 2010-12-22 Gerard Dirk Smits IMAGE PROJECTOR WITH REFLECTIVE LIGHT TRACKING
JP5267029B2 (ja) * 2007-10-12 2013-08-21 株式会社ニコン 照明光学装置、露光装置及びデバイスの製造方法
JP5554245B2 (ja) * 2007-12-21 2014-07-23 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ露光装置のマスク照明用の照明系
US8194301B2 (en) * 2008-03-04 2012-06-05 Kla-Tencor Corporation Multi-spot scanning system and method
US9561622B2 (en) * 2008-05-05 2017-02-07 Georgia Tech Research Corporation Systems and methods for fabricating three-dimensional objects
EP2389606B1 (en) * 2009-01-24 2019-08-28 Ecole Polytechnique Federale De Lausanne (EPFL) EPFL-TTO High-resolution microscopy and photolithography devices using focusing micromirrors
EP2369413B1 (en) * 2010-03-22 2021-04-07 ASML Netherlands BV Illumination system and lithographic apparatus
JP5408792B2 (ja) 2010-03-29 2014-02-05 西日本旅客鉄道株式会社 特殊信号発光機用カバー
EP2823360B1 (de) * 2012-03-09 2022-06-22 Carl Zeiss SMT GmbH Beleuchtungsoptik für die euv-projektionslithografie sowie optisches system mit einer derartigen beleuchtungsoptik
US9034720B2 (en) * 2012-08-17 2015-05-19 Globalfoundries Singapore Pte. Ltd. Litho scanner alignment signal improvement
JP5944876B2 (ja) * 2013-10-18 2016-07-05 増田　麻言 レーザ光を用いた距離測定装置
JP2017535821A (ja) 2014-11-27 2017-11-30 カール・ツァイス・エスエムティー・ゲーエムベーハー 複数の個々に制御可能な書込ヘッドを含むリソグラフィ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20040037487A1 (en) * 2002-06-07 2004-02-26 Fuji Photo Film Co., Ltd. Optical wiring substrate fabrication process and optical wiring substrate device
US20040240813A1 (en) * 2003-05-29 2004-12-02 Dainippon Screen Mfg. Co., Ltd. Pattern writing apparatus
US20080226034A1 (en) * 2007-03-12 2008-09-18 Weir Michael P Power modulation of a scanning beam for imaging, therapy, and/or diagnosis

Also Published As

Publication number Publication date
TW202105084A (zh) 2021-02-01
TWI707207B (zh) 2020-10-11
CN107003616A (zh) 2017-08-01
EP3224675A1 (en) 2017-10-04
JP2017535821A (ja) 2017-11-30
KR20220098039A (ko) 2022-07-08
US20200166852A1 (en) 2020-05-28
US20170255110A1 (en) 2017-09-07
WO2016082941A1 (en) 2016-06-02
KR102415072B1 (ko) 2022-06-30
KR102595081B1 (ko) 2023-10-27
JP7235808B2 (ja) 2023-03-08
TW201619716A (zh) 2016-06-01
KR20170093168A (ko) 2017-08-14
CN107003616B (zh) 2021-11-30
US11003090B2 (en) 2021-05-11
JP2021152683A (ja) 2021-09-30

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