TWI723099B - 放電燈及其交換方法、以及曝光方法及裝置 - Google Patents

放電燈及其交換方法、以及曝光方法及裝置 Download PDF

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Publication number
TWI723099B
TWI723099B TW105140829A TW105140829A TWI723099B TW I723099 B TWI723099 B TW I723099B TW 105140829 A TW105140829 A TW 105140829A TW 105140829 A TW105140829 A TW 105140829A TW I723099 B TWI723099 B TW I723099B
Authority
TW
Taiwan
Prior art keywords
discharge lamp
lamp
light
opening
light beam
Prior art date
Application number
TW105140829A
Other languages
English (en)
Chinese (zh)
Other versions
TW201734654A (zh
Inventor
青木保夫
Original Assignee
日商尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日商尼康股份有限公司 filed Critical 日商尼康股份有限公司
Publication of TW201734654A publication Critical patent/TW201734654A/zh
Application granted granted Critical
Publication of TWI723099B publication Critical patent/TWI723099B/zh

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J61/00—Gas-discharge or vapour-discharge lamps
    • H01J61/02—Details
    • H01J61/50—Auxiliary parts or solid material within the envelope for reducing risk of explosion upon breakage of the envelope, e.g. for use in mines
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2002—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • G03F7/2004—Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image characterised by the use of a particular light source, e.g. fluorescent lamps or deep UV light
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
TW105140829A 2015-12-09 2016-12-09 放電燈及其交換方法、以及曝光方法及裝置 TWI723099B (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2015240101 2015-12-09
JPJP2015-240101 2015-12-09

Publications (2)

Publication Number Publication Date
TW201734654A TW201734654A (zh) 2017-10-01
TWI723099B true TWI723099B (zh) 2021-04-01

Family

ID=59014254

Family Applications (2)

Application Number Title Priority Date Filing Date
TW105140829A TWI723099B (zh) 2015-12-09 2016-12-09 放電燈及其交換方法、以及曝光方法及裝置
TW110106482A TW202122931A (zh) 2015-12-09 2016-12-09 放電燈

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW110106482A TW202122931A (zh) 2015-12-09 2016-12-09 放電燈

Country Status (5)

Country Link
JP (2) JP6859957B2 (ja)
KR (1) KR20180091052A (ja)
CN (2) CN108780280B (ja)
TW (2) TWI723099B (ja)
WO (1) WO2017099221A1 (ja)

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012114390A (ja) * 2010-11-29 2012-06-14 Nsk Technology Co Ltd 露光装置用光照射装置
TW201537310A (zh) * 2014-03-28 2015-10-01 尼康股份有限公司 光源裝置、放電燈及其製造方法、以及曝光裝置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1395092B1 (en) * 1996-04-10 2006-05-31 Seiko Epson Corporation Light-source lamp unit, light-source device and projection-type display apparatus
JP3951051B2 (ja) * 1996-04-10 2007-08-01 セイコーエプソン株式会社 投写型表示装置
JPH1154090A (ja) * 1997-07-30 1999-02-26 Matsushita Electric Works Ltd 無電極放電灯装置
JP3843556B2 (ja) * 1997-09-30 2006-11-08 東芝ライテック株式会社 蛍光ランプおよび照明装置
WO2007066947A2 (en) 2005-12-08 2007-06-14 Electronics And Telecommunications Research Institute Mobile wireless access router for separately controlling traffic signal and control signal
JP4101269B2 (ja) * 2006-03-31 2008-06-18 株式会社オーク製作所 光源装置
JP4031508B1 (ja) * 2006-08-23 2008-01-09 株式会社オーク製作所 光源装置
JP5272481B2 (ja) * 2008-04-04 2013-08-28 カシオ計算機株式会社 投影装置及び光源制御方法
JP6127348B2 (ja) * 2013-09-12 2017-05-17 パナソニックＩｐマネジメント株式会社 点灯装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012114390A (ja) * 2010-11-29 2012-06-14 Nsk Technology Co Ltd 露光装置用光照射装置
TW201537310A (zh) * 2014-03-28 2015-10-01 尼康股份有限公司 光源裝置、放電燈及其製造方法、以及曝光裝置

Also Published As

Publication number Publication date
CN112684664A (zh) 2021-04-20
TW202122931A (zh) 2021-06-16
KR20180091052A (ko) 2018-08-14
JP6859957B2 (ja) 2021-04-14
WO2017099221A1 (ja) 2017-06-15
JPWO2017099221A1 (ja) 2018-10-04
JP2021107931A (ja) 2021-07-29
CN108780280B (zh) 2020-10-30
CN108780280A (zh) 2018-11-09
TW201734654A (zh) 2017-10-01

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