TWI715582B - 用於疊對測量之形貌相位控制 - Google Patents

用於疊對測量之形貌相位控制 Download PDF

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Publication number
TWI715582B
TWI715582B TW105115575A TW105115575A TWI715582B TW I715582 B TWI715582 B TW I715582B TW 105115575 A TW105115575 A TW 105115575A TW 105115575 A TW105115575 A TW 105115575A TW I715582 B TWI715582 B TW I715582B
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measurement
target
imaging
phase
optical system
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TW105115575A
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Chinese (zh)
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TW201712435A (zh
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維拉得摩 朗維司基
尤瑞 帕斯卡維爾
阿農 馬那森
尤尼 夏里波
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美商克萊譚克公司
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/32—Fiducial marks and measuring scales within the optical system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/36—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals
    • G02B7/38—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals measured at different points on the optical axis, e.g. focussing on two or more planes and comparing image data
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • H04N23/672—Focus control based on electronic image sensor signals based on the phase difference signals
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • H04N23/673—Focus control based on electronic image sensor signals based on contrast or high frequency components of image signals, e.g. hill climbing method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N2021/653—Coherent methods [CARS]

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Signal Processing (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
TW105115575A 2015-05-19 2016-05-19 用於疊對測量之形貌相位控制 TWI715582B (zh)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US201562163783P 2015-05-19 2015-05-19
US62/163,783 2015-05-19
US201562222724P 2015-09-23 2015-09-23
US62/222,724 2015-09-23

Publications (2)

Publication Number Publication Date
TW201712435A TW201712435A (zh) 2017-04-01
TWI715582B true TWI715582B (zh) 2021-01-11

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Family Applications (4)

Application Number Title Priority Date Filing Date
TW105115575A TWI715582B (zh) 2015-05-19 2016-05-19 用於疊對測量之形貌相位控制
TW109145523A TWI752764B (zh) 2015-05-19 2016-05-19 用於疊對測量之形貌相位控制
TW109145524A TWI755987B (zh) 2015-05-19 2016-05-19 具有用於疊對測量之形貌相位控制之光學系統
TW109145525A TWI760984B (zh) 2015-05-19 2016-05-19 用於疊對測量之方法

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TW109145523A TWI752764B (zh) 2015-05-19 2016-05-19 用於疊對測量之形貌相位控制
TW109145524A TWI755987B (zh) 2015-05-19 2016-05-19 具有用於疊對測量之形貌相位控制之光學系統
TW109145525A TWI760984B (zh) 2015-05-19 2016-05-19 用於疊對測量之方法

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US (5) US10520832B2 (https=)
JP (4) JP6879939B2 (https=)
KR (4) KR102678955B1 (https=)
CN (4) CN112859542A (https=)
SG (3) SG10201912816UA (https=)
TW (4) TWI715582B (https=)
WO (1) WO2016187468A1 (https=)

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CN112465694B (zh) * 2020-11-27 2024-10-15 中国科学院西安光学精密机械研究所 基于相位变化的医学图像数据增广方法
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CN117413221A (zh) * 2021-06-09 2024-01-16 Asml荷兰有限公司 用于使用具有孔径变迹的结构照射进行掩模版粒子检测的检查系统
CN113467033A (zh) * 2021-06-24 2021-10-01 南昌欧菲光电技术有限公司 一种摄像头模组及其透镜的定位方法
CN113777731A (zh) * 2021-08-11 2021-12-10 中国工程物理研究院应用电子学研究所 一种共轴反转环型连续变密度衰减器装置及其工作方法
CN113985711B (zh) * 2021-10-28 2024-02-02 无锡卓海科技股份有限公司 一种套刻测量装置
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US20210255551A1 (en) 2021-08-19
CN112859542A (zh) 2021-05-28
JP2021128169A (ja) 2021-09-02
TWI752764B (zh) 2022-01-11
TW202122930A (zh) 2021-06-16
SG10201912816UA (en) 2020-02-27
WO2016187468A1 (en) 2016-11-24
JP7250064B2 (ja) 2023-03-31
KR102665579B1 (ko) 2024-05-10
KR102678955B1 (ko) 2024-06-26
JP6879939B2 (ja) 2021-06-02
JP2021128170A (ja) 2021-09-02
KR20210149886A (ko) 2021-12-09
US10520832B2 (en) 2019-12-31
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TW201712435A (zh) 2017-04-01
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JP2018515782A (ja) 2018-06-14
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US20200142322A1 (en) 2020-05-07
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KR102607646B1 (ko) 2023-11-29
US20200142321A1 (en) 2020-05-07
US20170146915A1 (en) 2017-05-25
KR20210149884A (ko) 2021-12-09
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