SG10201912816UA - Topographic phase control for overlay measurement - Google Patents

Topographic phase control for overlay measurement

Info

Publication number
SG10201912816UA
SG10201912816UA SG10201912816UA SG10201912816UA SG10201912816UA SG 10201912816U A SG10201912816U A SG 10201912816UA SG 10201912816U A SG10201912816U A SG 10201912816UA SG 10201912816U A SG10201912816U A SG 10201912816UA SG 10201912816U A SG10201912816U A SG 10201912816UA
Authority
SG
Singapore
Prior art keywords
phase control
overlay measurement
topographic phase
topographic
overlay
Prior art date
Application number
SG10201912816UA
Other languages
English (en)
Inventor
Vladimir Levinski
Yuri Paskover
Amnon Manassen
Yoni Shalibo
Original Assignee
Kla Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kla Tencor Corp filed Critical Kla Tencor Corp
Publication of SG10201912816UA publication Critical patent/SG10201912816UA/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70616—Monitoring the printed patterns
    • G03F7/70633—Overlay, i.e. relative alignment between patterns printed by separate exposures in different layers, or in the same layer in multiple exposures or stitching
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
    • G02B27/32—Fiducial marks and measuring scales within the optical system
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/28—Systems for automatic generation of focusing signals
    • G02B7/36—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals
    • G02B7/38—Systems for automatic generation of focusing signals using image sharpness techniques, e.g. image processing techniques for generating autofocus signals measured at different points on the optical axis, e.g. focussing on two or more planes and comparing image data
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06T—IMAGE DATA PROCESSING OR GENERATION, IN GENERAL
    • G06T7/00—Image analysis
    • G06T7/80—Analysis of captured images to determine intrinsic or extrinsic camera parameters, i.e. camera calibration
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • H04N23/672—Focus control based on electronic image sensor signals based on the phase difference signals
    • H—ELECTRICITY
    • H04—ELECTRIC COMMUNICATION TECHNIQUE
    • H04N—PICTORIAL COMMUNICATION, e.g. TELEVISION
    • H04N23/00—Cameras or camera modules comprising electronic image sensors; Control thereof
    • H04N23/60—Control of cameras or camera modules
    • H04N23/67—Focus control based on electronic image sensor signals
    • H04N23/673—Focus control based on electronic image sensor signals based on contrast or high frequency components of image signals, e.g. hill climbing method
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/62—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light
    • G01N21/63—Systems in which the material investigated is excited whereby it emits light or causes a change in wavelength of the incident light optically excited
    • G01N21/65—Raman scattering
    • G01N2021/653—Coherent methods [CARS]

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Signal Processing (AREA)
  • Computer Vision & Pattern Recognition (AREA)
  • Multimedia (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Microscoopes, Condenser (AREA)
SG10201912816UA 2015-05-19 2016-05-19 Topographic phase control for overlay measurement SG10201912816UA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US201562163783P 2015-05-19 2015-05-19
US201562222724P 2015-09-23 2015-09-23

Publications (1)

Publication Number Publication Date
SG10201912816UA true SG10201912816UA (en) 2020-02-27

Family

ID=57320785

Family Applications (3)

Application Number Title Priority Date Filing Date
SG10201912816UA SG10201912816UA (en) 2015-05-19 2016-05-19 Topographic phase control for overlay measurement
SG10201912822UA SG10201912822UA (en) 2015-05-19 2016-05-19 Topographic phase control for overlay measurement
SG10201912818WA SG10201912818WA (en) 2015-05-19 2016-05-19 Topographic phase control for overlay measurement

Family Applications After (2)

Application Number Title Priority Date Filing Date
SG10201912822UA SG10201912822UA (en) 2015-05-19 2016-05-19 Topographic phase control for overlay measurement
SG10201912818WA SG10201912818WA (en) 2015-05-19 2016-05-19 Topographic phase control for overlay measurement

Country Status (7)

Country Link
US (5) US10520832B2 (https=)
JP (4) JP6879939B2 (https=)
KR (4) KR102678955B1 (https=)
CN (4) CN112859542A (https=)
SG (3) SG10201912816UA (https=)
TW (4) TWI715582B (https=)
WO (1) WO2016187468A1 (https=)

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Also Published As

Publication number Publication date
US20210255551A1 (en) 2021-08-19
CN112859542A (zh) 2021-05-28
JP2021128169A (ja) 2021-09-02
TWI752764B (zh) 2022-01-11
TW202122930A (zh) 2021-06-16
WO2016187468A1 (en) 2016-11-24
JP7250064B2 (ja) 2023-03-31
KR102665579B1 (ko) 2024-05-10
KR102678955B1 (ko) 2024-06-26
JP6879939B2 (ja) 2021-06-02
JP2021128170A (ja) 2021-09-02
KR20210149886A (ko) 2021-12-09
US10520832B2 (en) 2019-12-31
US11314173B2 (en) 2022-04-26
KR20210149885A (ko) 2021-12-09
TW201712435A (zh) 2017-04-01
TWI715582B (zh) 2021-01-11
CN112859540B (zh) 2024-10-18
TW202113505A (zh) 2021-04-01
JP2018515782A (ja) 2018-06-14
CN112859540A (zh) 2021-05-28
KR102334168B1 (ko) 2021-12-06
CN107636538A (zh) 2018-01-26
JP7253006B2 (ja) 2023-04-05
SG10201912822UA (en) 2020-02-27
TWI755987B (zh) 2022-02-21
CN107636538B (zh) 2021-02-19
SG10201912818WA (en) 2020-02-27
US20200142322A1 (en) 2020-05-07
KR20180000730A (ko) 2018-01-03
CN112859541A (zh) 2021-05-28
JP7250063B2 (ja) 2023-03-31
KR102607646B1 (ko) 2023-11-29
US20200142321A1 (en) 2020-05-07
US20170146915A1 (en) 2017-05-25
KR20210149884A (ko) 2021-12-09
US20200142323A1 (en) 2020-05-07
TW202113504A (zh) 2021-04-01
TWI760984B (zh) 2022-04-11
JP2021128168A (ja) 2021-09-02

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